Slit coating device based on direct current magnetron sputtering method

Abstract

The utility model relates to magnetron sputtering technical field and disclose the slit coating device based on direct current magnetron sputtering method, it includes: the coating box and the slit baffle between target material and base material, the slit baffle sets up in the coating box inside, adjusting assembly is connected with the slit baffle, is used for adjusting the angle of slit baffle, adjusting assembly sets up on the lateral wall of coating box. This scheme through setting adjustable angle slit baffle structure and its supporting adjusting assembly, realized the flexible adjustment and accurate control of slit baffle angle, can according to different substrate shape and process demand dynamic optimization sputtering particle incident path, significantly improved coating uniformity and film quality, cooperate the fixed mechanism that card block and double -end threaded rod constitute, ensure that the baffle angle is firm after adjusting unchangeable, prevent the deviation influence coating effect in operation, greatly enhanced the practicability and process adaptability of equipment.

Description

Technical Field

[0001] This utility model relates to the field of magnetron sputtering technology, and in particular to a slit coating apparatus based on a DC magnetron sputtering method. Background Technology

[0002] DC magnetron sputtering is a physical vapor deposition technique widely used to prepare thin films and coatings. It accelerates ions to bombard the target material in the plasma generated by gas discharge by applying an electric field in a vacuum environment, causing the target atoms or molecules to be sputtered out and deposited on the substrate to form a thin film. The slot coating device based on the DC magnetron sputtering method is a device specifically designed to improve the uniformity and efficiency of coating.

[0003] In existing DC magnetron sputtering technology, a slit baffle is typically a structural component fixedly installed between the target and the substrate, with slits of a specific shape and size. This slit design is mainly used to limit the travel path of sputtered particles to improve coating uniformity and control the deposition rate. However, traditional slit baffles have some limitations: First, because the angle of the slit baffle is fixed, it is difficult to achieve the best coating effect for substrates with different geometries or sizes. For example, when dealing with curved or complex-shaped substrates, the fixed slit baffle cannot be flexibly adjusted, which may lead to edge effects or uneven coating in certain areas. Second, when it is necessary to change process parameters such as sputtering gas pressure and power to adapt to different material or coating requirements, a fixed-angle slit baffle may not be able to provide the optimal particle incident angle, affecting the microstructure and properties of the thin film. Utility Model Content

[0004] The purpose of this invention is to solve the problems of poor flexibility and adaptability of slits in the prior art, and to propose a slit coating device based on DC magnetron sputtering method.

[0005] To achieve the above objectives, the present invention adopts the following technical solution:

[0006] A slit coating apparatus based on DC magnetron sputtering includes: a coating chamber and a slit baffle located between a target and a substrate, the slit baffle being disposed inside the coating chamber; and an adjustment component connected to the slit baffle for adjusting the angle of the slit baffle, the adjustment component being disposed on the side wall of the coating chamber.

[0007] As a preferred embodiment of this utility model, the adjustment assembly includes a mounting plate fixedly connected to one side of the slit baffle. An adjustment rod is fixed to the side wall of the mounting plate away from the slit baffle. An opening is provided on the side wall of the coating box. A locking block one and a locking block two are provided inside the opening. An adjustment groove is provided between the locking block one and the locking block two. An adjustment ball that can rotate freely is provided inside the adjustment groove. The free end of the adjustment rod is fixed to the adjustment ball.

[0008] As a preferred technical solution of this utility model, the adjustment component further includes a fixing member, which includes a control groove disposed on the top surface of the opening. The top surface of the control groove and the bottom surface of the opening are rotatably connected to two double-ended threaded rods. Both double-ended threaded rods pass through a locking block one and a locking block two, and both locking blocks one and two are threadedly connected to the double-ended threaded rods. A gear two is rotatably connected to the top surface of the control groove. Gear one is fixedly sleeved on the top of both double-ended threaded rods, and gear one meshes with gear two.

[0009] As a preferred embodiment of this utility model, a vacuum bellows is fixed between the mounting plate and the inner side of the coating box, and the opening is located inside the vacuum bellows.

[0010] As a preferred embodiment of this invention, the adjusting ball is fixed to the side wall facing the outside of the coating box with an adjusting handle.

[0011] As a preferred embodiment of this utility model, the inside of the adjustment groove is provided with an anti-slip pad.

[0012] This utility model has the following beneficial effects:

[0013] 1. Flexible adjustment of slit baffle angle: Traditional slit baffles have a fixed angle and cannot be dynamically adjusted according to substrate shape, target sputtering characteristics, or process requirements, resulting in uneven film deposition on the substrate surface, especially on substrates with complex shapes. This solution sets up an adjustment component to make the slit baffle angle adjustable, which can change the incident path and distribution range of sputtered particles according to actual needs. This flexibility enables the effective optimization of the angle and energy distribution of particles reaching the substrate when facing different substrate structures and different material deposition requirements, thereby significantly improving the uniformity and consistency of the film and enhancing the equipment's adaptability to different process conditions.

[0014] 2. Reasonable structural design, balancing adjustment accuracy and ease of operation: In this solution, the adjustment component achieves precise adjustment and visual control of the slit baffle angle through the adjustment handle, adjustment ball, and scale system. The adjustment ball is equipped with a scale, which allows operators to make quantitative adjustments according to process parameters, ensuring the repeatability and consistency of each adjustment. At the same time, the adjustment handle is located outside the coating chamber, making it easy for staff to operate and avoiding frequent opening of the vacuum chamber, thereby reducing interference with the vacuum environment. This design not only improves adjustment efficiency but also enhances the user-friendliness of the equipment, making it suitable for various application scenarios such as laboratories and industrial sites. Attached Figure Description

[0015] Figure 1 This is a schematic diagram of the slit coating device based on DC magnetron sputtering proposed in this utility model;

[0016] Figure 2 for Figure 1 Enlarged view of the structure at point A;

[0017] Figure 3 This is a schematic diagram of the internal structure of the opening;

[0018] Figure 4 This is a schematic diagram of the structure of the locking block one, the locking block two, and the double-ended threaded rod.

[0019] In the diagram: 1 Coating box, 2 Slit baffle, 3 Mounting plate, 4 Adjusting rod, 5 Opening, 6 Adjusting ball, 7 Locking block one, 8 Locking block two, 9 Adjusting groove, 10 Double-ended threaded rod, 11 Control groove, 12 Gear one, 13 Gear two, 14 Vacuum bellows, 15 Adjusting handle. Detailed Implementation

[0020] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present utility model. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments.

[0021] Reference Figures 1-4 A slit coating apparatus based on DC magnetron sputtering includes a coating chamber 1, a slit baffle 2, and an adjustment component. The slit baffle 2 is disposed inside the coating chamber 1 and located between the target and the substrate. The slits on the slit baffle 2 can limit the travel path of sputtered particles. The adjustment component is disposed on the side wall of the coating chamber 1 and connected to the slit baffle 2 for adjusting the angle of the slit baffle 2.

[0022] Specifically, the adjustment assembly includes a mounting plate 3 fixedly connected to one side of the slit baffle 2. An adjustment rod 4 is fixed to the side wall of the mounting plate 3 away from the slit baffle 2. A rectangular opening 5 is provided on the side wall of the coating chamber 1. A locking block 7 and a locking block 8 are provided inside the opening 5. The side walls of the locking blocks 7 and 8 are slidably connected to the inside of the opening 5. An adjustment groove 9 is provided between the locking blocks 7 and 8. An adjustment ball 6 that can rotate freely is provided inside the adjustment groove 9. The free end of the adjustment rod 4 is fixed to the adjustment ball 6. A T-shaped adjustment handle 15 is fixed to the side wall of the adjustment ball 6 facing the outside of the coating chamber 1. The adjustable ball 6 is designed to facilitate the rotation of the operator, and the adjustable ball 6 is marked with a scale to allow the operator to accurately change the angle of the slit baffle 2. The mounting plate 3 and the inner side of the coating chamber 1 are jointly fixed with a vacuum bellows 14. The opening 5 and the adjusting rod 4 are both located inside the vacuum bellows 14. The vacuum bellows 14 can ensure the vacuum environment inside the coating chamber 1 and prevent the opening 5 from affecting the device. In addition, the vacuum bellows 14 is composed of a series of wave-like pleats. These pleats give the structure a certain degree of flexibility and extensibility, thereby ensuring the normal adjustment of the angle of the adjusting rod 4.

[0023] Furthermore, the adjustment assembly also includes a fixing component. The interior of the adjustment groove 9 is provided with an anti-slip pad. When the fixing component fixes the adjustment ball 6, the anti-slip pad can increase the friction between the adjustment ball 6 and the adjustment groove 9, thereby improving the stability of the fixation. The fixing component includes a control groove 11 set on the inner top surface of the opening 5. The inner top surface of the control groove 11 and the inner bottom surface of the opening 5 are rotatably connected to two double-ended threaded rods 10. Both double-ended threaded rods 10 pass through the first locking block 7 and the second locking block 8, and both the first locking block 7 and the second locking block 8 are threadedly connected to the double-ended threaded rods 10. The thread directions of the two double-ended threaded rods 10 are opposite. When the two rotate in opposite directions, they can synchronously control the relative or opposite movement between the first locking block 7 and the second locking block 8. The inner top surface of the control groove 11 is rotatably connected to a gear 2 13. The top ends of the two double-ended threaded rods 10 are fixedly fitted with gear 1 12, and gear 1 12 meshes with gear 2 13. Gear 2 13 extends out of the control groove 11, making it convenient for operators to turn and control.

[0024] The specific working principle of this utility model is as follows:

[0025] During adjustment, the operator rotates the adjusting ball 6 by adjusting the handle 15, which changes the angle of the adjusting rod 4, the mounting plate 3, and the slit baffle 2. At this time, the angle of the slit on the slit baffle 2 between the substrate and the target changes, thereby adjusting the sputtering ion path or angle. After the adjustment is completed, the operator rotates the gear 13. Under the transmission action of the gear 12, the two double-headed threaded rods 10 rotate together, which causes the locking block 7 and the locking block 8 to move towards each other. At this time, the space in the adjusting groove 9 is reduced, and the inner side of the adjusting groove 9 can squeeze the adjusting ball 6, thereby fixing the position of the slit baffle 2.

[0026] The above description is only a preferred embodiment of the present utility model, but the protection scope of the present utility model is not limited thereto. Any equivalent substitutions or changes made by those skilled in the art within the technical scope disclosed in the present utility model, based on the technical solution and the inventive concept of the present utility model, should be included within the protection scope of the present utility model.

Claims

1. A slit coating apparatus based on DC magnetron sputtering, characterized in that, include: A coating chamber (1) and a slit baffle (2) located between the target and the substrate, the slit baffle (2) being disposed inside the coating chamber (1); An adjustment component, connected to the slit baffle (2), is used to adjust the angle of the slit baffle (2). The adjustment component is disposed on the side wall of the coating box (1). The adjustment assembly includes a mounting plate (3) fixedly connected to one side of the slit baffle (2). An adjustment rod (4) is fixed to the side wall of the mounting plate (3) away from the slit baffle (2). An opening (5) is provided on the side wall of the coating box (1). A locking block one (7) and a locking block two (8) are provided inside the opening (5). An adjustment groove (9) is provided between the locking block one (7) and the locking block two (8). An adjustment ball (6) that can rotate freely is provided inside the adjustment groove (9). The free end of the adjustment rod (4) is fixed to the adjustment ball (6). The adjustment groove (9) is equipped with an anti-slip pad inside.

2. The slit coating apparatus based on DC magnetron sputtering method according to claim 1, characterized in that, The adjustment assembly also includes a fixing component, which includes a control groove (11) disposed on the inner top surface of the opening (5). The inner top surface of the control groove (11) and the inner bottom surface of the opening (5) are rotatably connected to two double-ended threaded rods (10). Both double-ended threaded rods (10) pass through a locking block one (7) and a locking block two (8), and both locking blocks one (7) and two locking blocks two (8) are threadedly connected to the double-ended threaded rods (10). A gear two (13) is rotatably connected to the inner top surface of the control groove (11). A gear one (12) is fixedly sleeved on the top of both double-ended threaded rods (10), and gear one (12) meshes with gear two (13).

3. The slit coating apparatus based on DC magnetron sputtering method according to claim 1, characterized in that, A vacuum bellows (14) is fixed between the mounting plate (3) and the inner side of the coating box (1), and the opening (5) is located inside the vacuum bellows (14).

4. The slit coating apparatus based on DC magnetron sputtering method according to claim 1, characterized in that, The adjusting ball (6) is fixed with an adjusting handle (15) on the side wall facing the outside of the coating box (1).

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