A vacuum coating apparatus
Patent Information
- Application Number
- CN202521981311.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-09-15
- Publication Date
- 2026-09-15
- Estimated Expiration
- 2035-09-15
AI Technical Summary
由于腔室较多,占据空间较大,导致设备成本通常较高
[0016] This invention provides a slit channel between the feeding chamber and the process chamber, and arranges anti-contamination plates on the side walls of the slit channel, forming a transition structure that combines isolation and purification functions, effectively preventing mutual contamination between the feeding chamber and the process chamber.
Smart Images

Figure CN224754523U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of vacuum coating technology, and in particular to a vacuum coating equipment. Background Technology
[0002] Vacuum coating equipment is used for surface thin film deposition technology in a vacuum environment. It can be divided into PVD (physical vapor deposition), CVD (chemical vapor deposition), RPD (reactive plasma deposition), ALD (atomic layer deposition), and evaporation technology. Specifically, it refers to the deposition of a thin film of a specific material on a substrate such as silicon wafer or glass, so that the substrate has special optical, electrical, and other properties.
[0003] Current vacuum coating equipment typically consists of a loading / unloading platform, a feeding chamber, and a process chamber. Buffer chambers are located at both ends of the process chamber. During coating, the substrate to be coated is placed on a carrier tray, which is then fed into the feeding chamber via the loading / unloading platform. From there, it enters the buffer chamber before the process chamber, and then undergoes vacuum coating within the process chamber. After coating, it enters the buffer chamber at the rear of the process chamber, which has a discharge port for unloading the coated product. Due to the large number of chambers, the equipment occupies a significant amount of space, resulting in high equipment costs. Reducing the number of chambers, such as eliminating the buffer chamber between the feeding and process chambers, would allow plasma from the process chamber to easily enter the feeding chamber, or dust from the feeding chamber to enter the process chamber, causing contamination. Utility Model Content
[0004] To solve at least one of the above-mentioned technical problems, this utility model provides a vacuum coating equipment to prevent mutual contamination between the feeding chamber and the process chamber.
[0005] The technical solution adopted in this utility model is to design a vacuum coating equipment, including a feeding chamber and a process chamber. A slit channel for a carrier plate to pass through is provided between the feeding chamber and the process chamber. An anti-dust plate is provided on the side wall of the slit channel for adsorbing dust.
[0006] In some embodiments, the feed chamber is provided with a first gate valve located on the side of the slit channel away from the process chamber, and the first gate valve is used to open or close the slit channel.
[0007] In some embodiments, the anti-collision plate is provided with an adjustment groove extending toward the slit channel, and a locking member passes through the adjustment groove to lock the anti-collision plate into the feed chamber or the process chamber.
[0008] In some embodiments, the interior of the process chamber is provided with a coating device, and a process door panel is hinged to the side of the process chamber away from the coating device. The anti-stick plate with the adjustment groove and the process door panel are located on the same side of the slit channel.
[0009] In some embodiments, the vacuum coating equipment further includes a buffer chamber disposed on the side of the process chamber away from the feed chamber. The feed chamber, the process chamber, and the buffer chamber are all vertical structures. The carrier tray passes through the feed chamber, the process chamber, and the buffer chamber in an upright position. The buffer chamber is hinged to a discharge door plate, and the discharge door plate and the process door plate are located on the same side of the transport trajectory of the carrier tray.
[0010] In some embodiments, each chamber is provided with a guide device at its top. The guide device includes multiple sets of N-pole magnet assemblies and multiple sets of S-pole magnet assemblies, with each set of N-pole magnet assemblies corresponding one-to-one with the set of S-pole magnet assemblies. All the N-pole magnet assemblies are located on the same side of the transport track of the carrier, and all the S-pole magnet assemblies are located on the other side of the transport track of the carrier. A magnet is provided on the top of the carrier. When the top of the carrier passes between the N-pole magnet assemblies and the S-pole magnet assemblies, the N-pole magnet assemblies and the S-pole magnet assemblies exert equal repulsive forces on the magnets on the carrier to keep the carrier upright.
[0011] In some embodiments, the guiding device further includes a mounting frame, on the top of each chamber, which is vertically adjustable and mounted on the mounting frame, which mounts the N-pole magnet assembly and the S-pole magnet assembly.
[0012] In some embodiments, the guiding device further includes a mounting frame, which is fixedly mounted on the top of each chamber. The mounting frame includes a top plate, an N-pole mounting plate, and an S-pole mounting plate. The N-pole mounting plate is adjustablely mounted on one side of the top plate along the thickness direction of the carrier disk, and the N-pole magnet assembly is mounted on the N-pole mounting plate. The S-pole mounting plate is adjustablely mounted on the other side of the top plate along the thickness direction of the carrier disk, and the S-pole magnet assembly is mounted on the S-pole mounting plate.
[0013] In some embodiments, a feeding device is further included, which includes an upper guide assembly and a lower guide assembly; a feeding port is provided on one side of the feeding chamber, the upper guide assembly is disposed above the feeding port, and the lower guide assembly is disposed below the feeding port; the upper guide assembly includes an upper bracket, a first guide member, and a second guide member, both of which are rotatably mounted on the upper bracket, and the first guide member and the second guide member are spaced apart to form a conveying channel extending along a first horizontal direction; the lower guide assembly includes a lower bracket and a support member, the support member being rotatably mounted on the lower bracket; when the feeding device is in the working state, the upper guide... The components and the lower guide assembly are arranged opposite each other in the vertical direction, and the support member is located directly below the conveying channel; there are multiple first guide members, which are spaced apart along the first horizontal direction, and the number of first guide members is greater than the number of second guide members, with at least one first guide member located at the front end of the entrance of the conveying channel; the lower guide assembly also includes a third guide member, which is rotatably mounted on the lower support, and the third guide member and the first guide member are located on the same side of the conveying channel; there are multiple support members, and in the first horizontal direction, at least one support member is located in front of all the third guide members.
[0014] In some embodiments, one end of the upper support is provided with a first hinge assembly and a first locking assembly, the first hinge assembly being hinged to the feed chamber, and the first locking assembly being used to selectively lock the upper support to the feed chamber; one end of the lower support is provided with a second hinge assembly and a second locking assembly, the second hinge assembly being hinged to the feed chamber, and the second locking assembly being used to selectively lock the lower support to the feed chamber.
[0015] Compared with the prior art, the present invention has the following beneficial effects:
[0016] This invention provides a slit channel between the feeding chamber and the process chamber, and arranges anti-contamination plates on the side walls of the slit channel, forming a transition structure that combines isolation and purification functions, effectively preventing mutual contamination between the feeding chamber and the process chamber. Attached Figure Description
[0017] The present invention will now be described in detail with reference to specific embodiments and accompanying drawings. To illustrate the details and facilitate understanding of its principles, the drawings are not necessarily to scale, and similar reference numerals may describe similar components in different views. The accompanying drawings generally illustrate the embodiments discussed herein by way of example and not limitation. Wherein:
[0018] Figure 1 This is a three-dimensional schematic diagram of a vacuum coating equipment.
[0019] Figure 2 yes Figure 1 Enlarged diagram of point A in the middle.
[0020] Figure 3 This is a front view schematic diagram of a vacuum coating equipment.
[0021] Figure 4 yes Figure 3 A schematic diagram of the BB cross section.
[0022] Figure 5 yes Figure 4 Enlarged schematic diagram of point H in the middle.
[0023] Figure 6 yes Figure 4 A schematic diagram of the CC section.
[0024] Figure 7 This is a schematic diagram of the carrier disk.
[0025] Figure 8 yes Figure 7 Schematic diagram of the DD cross section.
[0026] Figure 9 This is a schematic diagram of the guide device at the top of the chamber.
[0027] Figure 10 yes Figure 9 A schematic diagram of the EE cross section.
[0028] Figure 11 yes Figure 9 A top-down view.
[0029] Figure 12 This is a three-dimensional schematic diagram of the feed chamber.
[0030] Figure 13 yes Figure 12 Enlarged schematic diagram at point F in the middle.
[0031] Figure 14 yes Figure 12 Enlarged schematic diagram of point G in the middle.
[0032] In the diagram, 1. Feeding chamber; 2. Process chamber; 3. Buffer chamber; 4. Slit channel; 5. Anti-stick plate; 6. Carrier tray; 7. First valve; 8. Second valve; 9. Adjustment groove; 10. Locking bolt; 11. Coating device; 12. Process door panel; 13. Discharge door panel; 61. Magnet; 14. N-pole magnet assembly; 15. S-pole magnet assembly; 16. Telescopic rod; 17. Top plate; 18. N-pole mounting plate; 19. S-pole mounting plate; 20. Upper bracket; 21. First guide component; 22. Second guide component; 23. Third guide component; 24. Support component; 25. Lower bracket; 26. First hinge assembly; 27. First locking assembly; 28. Second hinge assembly; 29. Second locking assembly; 30. Positioning groove; 31. Positioning bolt; 32. Support guide wheel; 33. Cylindrical rod. Detailed Implementation
[0033] The following are specific embodiments of this utility model, and the technical solution of this utility model will be further described with reference to the accompanying drawings. However, this utility model is not limited to these embodiments, and the following embodiments do not limit the utility model involved in the claims. In addition, all combinations of features described in the embodiments are not necessarily necessary for the solution of the utility model.
[0034] The principle and structure of this utility model will be described in detail below with reference to the accompanying drawings and embodiments.
[0035] Example
[0036] like Figure 1-5 As shown, a vacuum coating equipment includes a feeding chamber 1 and a process chamber 2. A slit channel 4 for a carrier plate 6 to pass through is provided between the feeding chamber 1 and the process chamber 2. A dust-proof plate 5 is provided on the side wall of the slit channel 4 for adsorbing dust.
[0037] A slit channel 4 is provided between the feed chamber 1 and the process chamber 2, and anti-fouling plates 5 are arranged on the side walls of the slit channel 4, forming a transition structure that combines isolation and purification functions. Specifically, the slit channel 4 limits the width of the channel when the tray 6 enters the process chamber 2, restricting airflow exchange and reducing the connectivity between the feed chamber 1 and the process chamber 2, thereby reducing the possibility of gas and particulate matter diffusion between the two chambers. In this embodiment, the anti-fouling plates 5 are installed on both sides of the slit channel 4, that is, the slit channel 4 is formed between the two opposing anti-fouling plate surfaces 5. When the tray 6 passes through the slit channel 4, if dust follows the flow of the tray 6, the dust is easily captured by the anti-fouling plates 5 when passing through the slit channel 4, thereby effectively preventing dust from entering the process chamber 2 with the tray 6; conversely, when the process chamber 2 is in vacuum plasma deposition mode, plasma particles are difficult to penetrate into the feed chamber 1 due to the restricted channel and the shielding effect of the anti-fouling plates 5, thereby effectively preventing the feed chamber 1 from being contaminated by plasma. The above structural design not only simplifies the reliance of traditional vacuum coating equipment on buffer chambers, significantly reduces the number of chambers, and lowers the overall footprint and manufacturing cost of the equipment, but also maintains the cleanliness isolation effect between chambers while simplifying the structure, ensuring the stability of the coating process and the yield of the coated products.
[0038] In this embodiment, the vacuum coating equipment does not require a separate buffer chamber between the feed chamber 1 and the process chamber 2, thus reducing costs.
[0039] Furthermore, a first valve 7 is provided on the side of the slit channel 4 of the feed chamber 1 away from the process chamber 2. This first valve 7 can selectively open or close the slit channel 4 as needed. When the carrier tray 6 needs to enter the process chamber 2 from the feed chamber 1, the first valve 7 is in the open state so that the carrier tray 6 can pass smoothly through the slit channel 4. During the process when the carrier tray 6 is not being transported, the first valve 7 can remain closed, forming a double barrier structure between the feed chamber 1 and the process chamber 2: on the one hand, the closed first valve 7 blocks dust and particles in the feed chamber 1 from entering the slit channel 4, effectively reducing the potential contamination of the dust on the anti-adhesion plate 5 and the process chamber 2; on the other hand, the first valve 7 can also prevent plasma or deposited particles in the process chamber 2 from diffusing along the slit channel 4 to the feed chamber 1, thereby further improving the isolation effect between the two chambers. The first valve 7 is located on the side of the slit channel 4 away from the process chamber 2. When the process chamber 2 coats the carrier tray 6, ion clusters cannot directly adhere to the first valve 7, extending the maintenance cycle of the first valve 7. With the first valve 7 in place, the vacuum environment and cleanliness of the process chamber 2 can be reliably maintained even when the equipment is in standby or maintenance mode. Therefore, this structure not only enhances the anti-contamination capability but also improves the flexibility and safety of equipment operation, helps extend the service life of the anti-contamination plate 5 and the slit channel 4, and improves the overall stability and yield of the coating process.
[0040] Furthermore, the anti-collision plate 5 is provided with an adjustment groove 9, which extends towards the slit channel 4. The locking member can pass through the adjustment groove 9 to fix the anti-collision plate 5 to the feed chamber 1 or the process chamber 2. Through the design of the adjustment groove 9, the anti-collision plate 5 can be adjusted in position along the direction of the adjustment groove 9 before locking, thereby flexibly changing the distance between the two relatively arranged anti-collision plates 5. When the thickness of the carrier plate 6 to be transferred changes, the operator only needs to loosen the locking member and push the anti-collision plate 5 within the range of the adjustment groove 9 to quickly adjust the effective width of the slit channel 4, and then re-lock the anti-collision plate 5 to ensure its stability. This structure, on the one hand, can adapt to the passage of carrier plates 6 of different thicknesses or types, improving the applicability and versatility of the equipment; on the other hand, after the spacing of the anti-collision plates 5 is optimized, the size of the slit channel 4 can more accurately restrict the flow path of gas and particulate matter, further improving the effect of preventing dust from entering the process chamber 2 and blocking plasma diffusion. Meanwhile, the combined design of the adjusting groove 9 and the locking element ensures the stability and reliability of the anti-collision plate 5 during operation, simplifies the adjustment process, and facilitates maintenance and replacement. A simple locking element such as a locking bolt 10 can suffice.
[0041] Furthermore, a coating device 11 is installed inside the process chamber 2. A process door plate 12 is hinged to the side of the process chamber 2 away from the coating device 11, and an anti-stick plate 5 with an adjustment groove 9 is located on the same side of the slit channel 4 as the process door plate 12. The process door plate 12 is hinged, making it easy to open during equipment maintenance or adjustment of the anti-stick plate 5. Operators can directly adjust or remove the anti-stick plate 5 from the same side of the slit channel 4, which is more convenient and quick, improving the operability of equipment maintenance. In addition, the design that the anti-stick plate 5 and the process door plate 12 are located on the same side allows the anti-stick plate 5 to be adjusted by removing the process door plate 12, avoiding the assembly complexity caused by the dispersed structure, making the overall layout more compact and reasonable, reducing the space occupied by the equipment while improving sealing reliability and working efficiency. Thus, this structure not only ensures a stable and clean environment for the coating process in the process chamber 2, but also improves the convenience of equipment maintenance and the stability of overall operation.
[0042] Furthermore, the buffer chamber 3 is located on the side of the process chamber 2 away from the feed chamber 1. The feed chamber 1, process chamber 2, and buffer chamber 3 are all vertical structures. The carrier tray 6 passes through each chamber in an upright position for transport. This vertical structure reduces the overall floor space and the overall equipment height. A discharge door 13 is hinged to one side of the buffer chamber 3, and the discharge door 13 and process door 12 are located on the same side of the carrier tray 6's transport path. This arrangement allows the carrier tray 6 to directly enter the buffer chamber 3 after coating, and the finished product can be smoothly discharged from the buffer chamber 3 by opening the discharge door 13, avoiding cross-contamination caused by the finished product directly passing through the feed chamber 1. Because each chamber is vertical, the carrier tray 6 maintains an upright posture during transport, saving lateral space, creating a compact chamber arrangement, and preventing particulate matter deposition on the substrate surface, thus improving coating quality. Meanwhile, the unloading door panel 13 and the process door panel 12 are located on the same side of the transport track of the carrier plate 6, which concentrates the operation and maintenance ports of the equipment on one side, making it convenient for loading, unloading and chamber maintenance operations of the carrier plate 6, reducing the complexity of manual operation and the footprint requirement.
[0043] The coating process can be carried out during the transition of the carrier 6 from the feed chamber 1 to the process chamber 2, or during the transition from the buffer chamber 3 to the process chamber 2, or during the back-and-forth transition of the carrier 6 in the above three chambers. In this case, it is suitable for coating multiple layers.
[0044] Furthermore, such as Figure 6-11 As shown, each chamber is equipped with a guide device at its top. The guide device includes multiple sets of N-pole magnet assemblies 14 and multiple sets of S-pole magnet assemblies 15, with each set of N-pole magnet assemblies 14 and S-pole magnet assemblies 15 arranged in a one-to-one correspondence. All N-pole magnet assemblies 14 are located on the same side of the transport track of the carrier 6, and all S-pole magnet assemblies 15 are located on the other side of the transport track. A magnet 61 is provided on the top of the carrier 6. When the carrier 6 passes through each chamber sequentially along the transport track, its top magnet 61 is located between the corresponding N-pole magnet assembly 14 and S-pole magnet assembly 15, and is subjected to equal repulsive forces from the magnet assemblies on both sides. The carrier 6 passing through each chamber sequentially along the transport track means that the carrier 6 passes through the feeding chamber 1, the process chamber 2, and the buffer chamber 3 sequentially along the transport track. Because the N-pole and S-pole magnet assemblies 15 are symmetrically arranged and act on the top magnet 61 of the carrier tray 6 respectively, the repulsive forces are opposite in direction and equal in magnitude, thus forming a stable magnetic balance during transportation. This allows the carrier tray 6 to reliably maintain an upright posture without tilting or wobbling. Through this magnetic levitation guidance method, the top of the carrier tray 6 can run smoothly in the transmission channel without relying on additional mechanical support, reducing mechanical friction and wear, and extending the service life of the transmission mechanism.
[0045] In some embodiments, the guide device further includes a mounting bracket, on the top of each chamber, which is adjustable in the vertical direction and on which the N-pole magnet assembly 14 and the S-pole magnet assembly 15 are fixedly mounted. When a carrier disk 6 of a different weight is replaced, such as a lighter carrier disk 6, if the repulsive force of the N-pole magnet assembly 14 and the S-pole magnet assembly 15 on the magnet 61 at the top of the carrier disk 6 cannot be reduced, the carrier disk 6 may not be able to pass between the N-pole magnet assembly 14 and the S-pole magnet assembly 15. To solve this problem, a mounting bracket is provided, and the position of the magnet assembly can be adjusted vertically according to actual needs. The mounting bracket can be connected to the top of the chamber via an adjustable-length telescopic rod 16, which can be a spiral telescopic rod, etc., to flexibly adapt to carrier disks 6 of different weights or heights. For example, when a lighter carrier disk 6 passes between the N-pole magnet assembly 14 and the S-pole magnet assembly 15, the mounting bracket raises the N-pole magnet assembly 14 and the S-pole magnet assembly 15, reducing the repulsive force of the N-pole magnet assembly 14 and the S-pole magnet assembly 15 on the magnet 61, allowing the top of the carrier disk 6 to pass smoothly between the N-pole magnet assembly 14 and the S-pole magnet assembly 15. When the height of the magnet 61 at the top of the carrier tray 6 changes, the operator can adjust the position of the mounting bracket to ensure that the magnet assembly always maintains the optimal correspondence with the magnet 61 at the top of the carrier tray 6. This ensures that the repulsive force exerted by the magnet assemblies on both sides is consistent and symmetrical when the carrier tray 6 passes through, thus stabilizing the upright position of the carrier tray 6. This structure not only improves the versatility and adaptability of the guiding device but also facilitates quick adjustments during equipment maintenance or changes in the specifications of the carrier tray 6, reducing downtime. Simultaneously, the mounting bracket provides reliable fixed support, ensuring that the magnet assembly does not shift position during long-term operation, thereby maintaining the stability and consistency of the transmission process.
[0046] In other embodiments, the guiding device includes a mounting frame fixedly installed on the top of each chamber and a support guide wheel 32 located at the bottom of each chamber for supporting the bottom side of the guide. The mounting frame consists of a top plate 17, an N-pole mounting plate 18 and an S-pole mounting plate 19. The N-pole mounting plate 18 can be adjusted and installed on one side of the top plate 17 along the thickness direction of the carrier plate 6 and is equipped with an N-pole magnet assembly 14. The S-pole mounting plate 19 can be adjusted and installed on the other side of the top plate 17 along the thickness direction of the carrier plate 6 and is equipped with the S-pole magnet assembly 15. Through this structure, the N-pole magnet assembly 14 and the S-pole magnet assembly 15 are arranged opposite each other on both sides of the top plate 17. The spacing between the magnets on both sides can be variably controlled by adjusting their respective mounting plates. When a lighter carrier plate 6 is used, the spacing between the N-pole magnet assembly 14 and the S-pole magnet assembly 15 is increased, reducing the repulsive force on the top magnet 61 of the carrier plate 6 and preventing the top of the carrier plate 6 from being unable to pass between the N-pole magnet assembly 14 and the S-pole magnet assembly 15. When carrier plates 6 of different thicknesses or weights need to pass, the operator can adjust the positions of the N-pole mounting plate 18 and the S-pole mounting plate 19 according to the position of the top magnet 61 of the carrier plate 6, ensuring that the two sets of magnet assemblies are always symmetrically distributed and apply a balanced repulsive force to the top magnet 61 when the carrier plate 6 passes, thereby stabilizing the upright posture of the carrier plate 6. This design not only improves the adaptability of the guide device to carrier plates 6 of different specifications but also ensures the precise balance of the magnetic levitation guiding force, preventing the carrier plate 6 from tilting or wobbling due to uneven force. Meanwhile, the adjustable structure of the N and S pole mounting plates 19 facilitates later maintenance and calibration, improving the stability and reliability of equipment operation. Thus, while maintaining a compact structure, it achieves the dual advantages of flexible adjustment and stable guidance.
[0047] Specifically, a positioning groove 30 along the thickness direction of the carrier plate 6 can be provided on the top plate 17. The N pole mounting plate 18 and the S pole mounting plate 19 can be connected to the positioning groove 30 by positioning bolts 31. The distance between the N pole and the S pole mounting plate 19 can be controlled by adjusting the position of the positioning groove 30 along the thickness direction of the carrier plate 6.
[0048] Furthermore, such as Figure 12 , 13 As shown in Figure 14, the vacuum coating equipment of this embodiment also includes a plate feeding device for smoothly and accurately feeding the carrier tray 6 into the feeding chamber 1. The plate feeding device includes an upper guide assembly and a lower guide assembly. A feed inlet is provided on one side of the feeding chamber 1. The upper guide assembly is located above the feed inlet, and the lower guide assembly is located below the feed inlet. When the plate feeding device is in operation, the upper guide assembly and the lower guide assembly are arranged opposite each other in the vertical direction to form a symmetrical guiding and supporting environment. The support member 24 is located directly below the conveying channel and is used to support the carrier tray 6 and guide it to smoothly enter the feeding chamber 1 in the vertical direction.
[0049] Specifically, the upper guide assembly includes an upper support 20, a first guide member 21, and a second guide member 22. Both the first guide member 21 and the second guide member 22 are rotatably mounted on the upper support 20, forming a conveying channel extending along a first horizontal direction. Multiple first guide members 21 are spaced apart horizontally, their number exceeding that of the second guide members 22. At least one first guide member 21 is located at the entrance front of the conveying channel. The tray 6 first contacts at least one first guide member 21, enabling the tray 6 to quickly align with the conveying channel in the horizontal direction, i.e., providing guidance. This guide function is used to pre-guide and adjust the attitude of the tray 6 during its initial entry into the channel, ensuring a smooth entry and preventing the tray 6 from deviating or impacting the channel wall during initial entry. The installation of the tray loading device reduces the need for rack platforms, decreases the floor space, and lowers costs.
[0050] The lower guide assembly includes a lower bracket 25, a support member 24, and a third guide member 23. The support member 24 is rotatably mounted on the lower bracket 25, located directly below the conveyor channel, and is used to support the pallet 6 and form a stable vertical support force, keeping the pallet 6 upright in the vertical direction. The third guide member 23 is rotatably mounted on the lower bracket 25 and is located on the same side of the conveyor channel as the first guide member 21. When the pallet 6 is placed on the support member 24, the first guide member 21 and the third guide member 23 contact the pallet 6 from the same side, working together with the first guide member 21 to guide the pallet 6 to move along the conveyor channel, ensuring that the pallet 6 also maintains a stable position in the horizontal direction, preventing displacement or shaking. Multiple support members 24 are provided, and in the horizontal direction, at least one support member 24 is located in front of all the third guide members 23, so that the support member 24 contacts the bottom plate of the pallet 6 first, ensuring that the pallet 6 can immediately receive downward support when entering the initial section of the conveyor channel, thereby preventing the pallet 6 from tilting or tipping over due to instability.
[0051] Through the coordinated action of the upper and lower guide components, the tray feeding device can provide multi-point, all-around guidance and support for the tray 6 in both horizontal and vertical directions, allowing the tray 6 to smoothly pass through the feed inlet into the feed chamber 1 in an upright and stable posture. This ensures the smooth transfer of the tray 6 to the subsequent slit channel 4, process chamber 2, and buffer chamber 3. The first guide component 21, the second guide component 22, and the third guide component 23 form a multi-point guide, effectively constraining the movement trajectory of the tray 6 during the initial entry into the channel and throughout the entire transfer process, preventing deviation and collision, and improving tray feeding accuracy. The support component 24 provides vertical support force, keeping the tray 6 upright, and, together with the guide components, forms multi-directional constraints in all directions, reducing swaying, ensuring the substrate surface is clean, and preventing dust or particles from falling off.
[0052] The first guide member 21, the second guide member 22, the third guide member 23, and the support member 24 can be one of the following: guide wheel, bearing, and universal ball bearing. In this embodiment, guide wheel is used. The first guide member 21 and the third guide member 23 are six guide wheels arranged side by side along the conveying direction. The second guide member 22 is a guide wheel that is slightly larger than the first guide member 21. The support member 24 consists of three guide wheels arranged side by side along the conveying direction with a concave center. The concave center part is used to guide the bottom edge of the carrier plate 6. The bottom edge of the carrier plate 6 can be set into an arc shape that matches the concave position, or simply a cylindrical rod 33 can be set on the bottom edge of the carrier plate 6 to cooperate with the concave position.
[0053] Furthermore, one end of the upper support 20 is provided with a first hinge assembly 26 and a first locking assembly 27. The first hinge assembly 26 is hinged to the feed chamber 1, and the first locking assembly 27 is used to selectively lock the upper support 20 to the feed chamber 1. One end of the lower support 25 is provided with a second hinge assembly 28 and a second locking assembly 29. The second hinge assembly 28 is hinged to the feed chamber 1, and the second locking assembly 29 is used to selectively lock the lower support 25 to the feed chamber 1. The locking assembly can be a fastener such as a locking bolt 10, thereby temporarily fixing the support relative to the feed chamber 1.
[0054] When the material tray needs to be transferred, the upper guide assembly and the lower guide assembly are rotated to the front of the feed port to correspond with the internal guide device. The upper bracket 20 and the lower bracket 25 can be fixed to the feed chamber 1 by their respective locking components to ensure the stability of the upper guide assembly and the lower guide assembly in the vertical and horizontal directions. This ensures that the tray 6 maintains an upright and stable movement trajectory during the board insertion process, preventing tilting or shaking, and improving the guiding accuracy and process reliability.
[0055] When the material tray is not needed, the locking assembly is released, causing the upper bracket 20 to rotate upward around the hinge axis and the lower bracket 25 to rotate to one side around the hinge axis, so that the upper guide assembly and the lower guide assembly can easily leave the feed port, thus avoiding affecting the opening and closing of the second valve 8.
[0056] The valve plate of the second valve 8 can be locked on the frame by a manual knob. The feeding chamber 1 has a suction door effect under vacuum. When the valve is opened, the carrier plate 6 passes through the feeding chamber 1, the process chamber 2 and the buffer chamber 3 from right to left. The unloading door of the buffer chamber 3 can be opened to take out the carrier plate 6, or the carrier plate 6 can return through the door of the feeding chamber 1.
[0057] The specific embodiments described herein are merely illustrative examples illustrating the spirit of this utility model. Those skilled in the art to which this utility model pertains may make various modifications or additions to the described specific embodiments or use similar methods to replace them, without departing from the spirit of this utility model or exceeding the scope defined by the appended claims.
Claims
1. A vacuum coating equipment, characterized in that, It includes a feeding chamber and a process chamber. A slit channel for the tray to pass through is provided between the feeding chamber and the process chamber. The side wall of the slit channel is provided with a dust trap, which is used to absorb dust.
2. The vacuum coating equipment according to claim 1, characterized in that, The feed chamber is equipped with a first gate valve, which is located on the side of the slit channel away from the process chamber. The first gate valve is used to open or close the slit channel.
3. The vacuum coating equipment according to claim 1, characterized in that, The anti-collision plate is provided with an adjustment groove that extends toward the slit channel. A locking member passes through the adjustment groove to lock the anti-collision plate in the feed chamber or the process chamber.
4. The vacuum coating equipment according to claim 3, characterized in that, The process chamber is equipped with a coating device. A process door panel is hinged to the side of the process chamber away from the coating device. The anti-stick plate with the adjustment groove and the process door panel are located on the same side of the slit channel.
5. The vacuum coating equipment according to claim 4, characterized in that, The vacuum coating equipment also includes a buffer chamber, which is located on the side of the process chamber away from the feed chamber. The feed chamber, the process chamber, and the buffer chamber are all vertical structures. The carrier tray passes through the feed chamber, the process chamber, and the buffer chamber in an upright position. The buffer chamber is hinged to a discharge door, which is located on the same side of the carrier tray's transport trajectory.
6. The vacuum coating equipment according to claim 5, characterized in that, Each chamber is equipped with a guide device at its top. The guide device includes multiple sets of N-pole magnet assemblies and multiple sets of S-pole magnet assemblies. The multiple sets of N-pole magnet assemblies correspond one-to-one with the multiple sets of S-pole magnet assemblies. All the N-pole magnet assemblies are located on the same side of the transport track of the carrier, and all the S-pole magnet assemblies are located on the other side of the transport track of the carrier. The top of the carrier is equipped with a magnet. When the top of the carrier passes between the N-pole magnet assemblies and the S-pole magnet assemblies, the N-pole magnet assemblies and the S-pole magnet assemblies exert equal repulsive forces on the magnet on the carrier to keep the carrier upright.
7. The vacuum coating equipment according to claim 6, characterized in that, The guiding device also includes a mounting frame, on the top of each chamber, which is adjustable in the vertical direction. The mounting frame is on which the N-pole magnet assembly and the S-pole magnet assembly are mounted.
8. The vacuum coating equipment according to claim 6, characterized in that, The guiding device also includes a mounting frame, which is fixedly installed on the top of each chamber. The mounting frame includes a top plate, an N-pole mounting plate, and an S-pole mounting plate. The N-pole mounting plate is adjustablely installed on one side of the top plate along the thickness direction of the carrier disk, and the N-pole magnet assembly is mounted on the N-pole mounting plate. The S-pole mounting plate is adjustablely installed on the other side of the top plate along the thickness direction of the carrier disk, and the S-pole magnet assembly is mounted on the S-pole mounting plate.
9. The vacuum coating equipment according to claim 6, characterized in that, It also includes a feeding device, which comprises an upper guide assembly and a lower guide assembly; a feeding port is provided on one side of the feeding chamber, the upper guide assembly is disposed above the feeding port, and the lower guide assembly is disposed below the feeding port; the upper guide assembly includes an upper bracket, a first guide member, and a second guide member, both of which are rotatably mounted on the upper bracket, and the first guide member and the second guide member are spaced apart to form a conveying channel extending along a first horizontal direction; the lower guide assembly includes a lower bracket and a support member, the support member being rotatably mounted on the lower bracket; when the feeding device is in working condition, the upper guide assembly and the lower guide assembly... The lower guide components are arranged opposite each other in the vertical direction, and the support member is located directly below the conveying channel; there are multiple first guide members, which are spaced apart along the first horizontal direction, and the number of first guide members is greater than the number of second guide members, with at least one first guide member located at the front end of the entrance of the conveying channel; the lower guide component also includes a third guide member, which is rotatably mounted on the lower support, and the third guide member and the first guide member are located on the same side of the conveying channel; there are multiple support members, and in the first horizontal direction, at least one support member is located in front of all the third guide members.
10. The vacuum coating equipment according to claim 9, characterized in that, One end of the upper support is provided with a first hinge assembly and a first locking assembly. The first hinge assembly is hinged to the feed chamber, and the first locking assembly is used to selectively lock the upper support to the feed chamber. One end of the lower support is provided with a second hinge assembly and a second locking assembly. The second hinge assembly is hinged to the feed chamber, and the second locking assembly is used to selectively lock the lower support to the feed chamber.