A plasma tail gas treatment apparatus for a vapour deposition apparatus

CN224757596UActive Publication Date: 2026-09-15HANGZHOU CHAORAN DIAMOND CO LTD
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Patent Information

Application Number
CN202522294231.4
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2025-10-30
Publication Date
2026-09-15
Estimated Expiration
2035-10-30

AI Technical Summary

Technical Problem

目前等离子体尾气处理设备在使用时,尾气通过进气管直接进入处理设备内部进行净化,但是由于气相沉积设备产生的尾气温度较高,可达到一千摄氏度,尾气的温度过高会影响等离子体处理尾气的效果(因为温度过高会降低电子能量、影响活性粒子生成效率),另外,尾气中也会有粉尘和一定的湿度,都会在一定程度上影响等离子体处理尾气的效果(因为尾气粉尘过多容易堵塞电极间隙、降低放电效率;尾气湿度过高容易引发放电短路等问题)

Benefits of technology

该气相沉积设备等离子体尾气处理装置,通过设置尾气预处理机构,在尾气进入等离子处理箱净化前,先对尾气进行除尘、然后对尾气进行温度,最后对尾气进行除湿,从而可避免粉尘、高温和湿气对后续等离子处理造成影响,大大地提高了等离子处理尾气的效果。

✦ Generated by Eureka AI based on patent content.

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Abstract

The application relates to the technical field of waste gas treatment, in particular to a plasma tail gas treatment device of a vapor deposition equipment, which comprises a plasma treatment box for treating tail gas, a plasma generator for emitting plasma into the plasma treatment box, a tail gas pretreatment mechanism comprising a first air duct and a second air duct which are connected and communicated, the second air duct being connected with the plasma treatment box, a filter screen being arranged in the first air duct, a driving piece for driving the filter screen to shake, and a heat exchange box and an activated carbon adsorption plate being installed in the second air duct. The tail gas pretreatment mechanism is arranged, dust in the tail gas is removed first, then the temperature of the tail gas is adjusted, and finally the humidity of the tail gas is removed, so that the influence of dust, high temperature and humidity on subsequent plasma treatment can be avoided, and the effect of plasma treatment on tail gas is greatly improved.
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Description

Technical Field

[0001] This application relates to the field of waste gas treatment technology, and more specifically, to a plasma tail gas treatment device for a vapor deposition equipment. Background Technology

[0002] Vapor deposition equipment is an important material preparation device widely used in materials science and engineering. Its main functions include material growth and deposition, heat treatment, thin film preparation, and nanomaterial preparation. Vapor deposition equipment generates a significant amount of harmful exhaust gas during operation. Plasma technology is generally used to treat the exhaust gas, converting the pollutants in the exhaust gas into harmless or less harmful substances. Currently, when plasma exhaust gas treatment equipment is in use, the exhaust gas directly enters the equipment through the inlet pipe for purification. However, the exhaust gas generated by the vapor deposition equipment has a high temperature, reaching up to 1,000 degrees Celsius. The excessively high temperature of the exhaust gas will affect the effectiveness of plasma treatment of the exhaust gas (because excessive temperature will reduce electron energy and affect the generation efficiency of active particles). In addition, the exhaust gas also contains dust and a certain amount of humidity, which will affect the effectiveness of plasma treatment of the exhaust gas to some extent (because excessive dust in the exhaust gas can easily clog the electrode gap and reduce the discharge efficiency; excessive humidity in the exhaust gas can easily cause problems such as short circuits during discharge). Utility Model Content

[0003] The purpose of this application is to provide a plasma exhaust gas treatment device for a vapor deposition equipment, which pre-treats the exhaust gas before it enters the plasma exhaust gas treatment device to reduce the temperature, humidity and dust content of the exhaust gas.

[0004] To achieve the above objectives, this application provides the following technical solution: A plasma exhaust gas treatment device for a vapor deposition equipment, comprising: The plasma treatment box is used to treat exhaust gases. A plasma generator is used to emit plasma into a plasma processing chamber. The exhaust gas pretreatment mechanism includes a first air duct and a second air duct connected and communicating with each other. The second air duct is connected to the plasma treatment box. A filter screen is installed in the first air duct, and a driving component is also included to drive the filter screen to oscillate. The second air duct is equipped with a heat exchange box and an activated carbon adsorption plate. Preferably, the heat exchange box is provided with a heat exchange cavity, and multiple heat exchange tubes are provided in the heat exchange cavity. The two ends of the heat exchange tubes extend out of the heat exchange box. The heat exchange box is provided with an inlet pipe and an outlet pipe that communicate with the heat exchange cavity. The end of the inlet pipe and the outlet pipe away from the heat exchange box extends to the outside of the second air duct.

[0005] Preferably, it also includes a movable frame disposed in the first air duct, a frame is fixedly connected to the edge of the filter screen, the frame is adapted to the movable frame so that the frame can be inserted into the movable frame, and a locking member for locking the frame onto the movable frame is also included.

[0006] Preferably, the locking component includes a strip plate, a first spring, and a limiting rod. The front side of the movable frame is provided with strip grooves on both sides, and the strip plate is slidably disposed in the strip grooves. The first spring and the limiting rod are respectively located on both sides of the strip plate. The two ends of the first spring are fixedly connected to the strip plate and the inner wall of the strip groove. One end of the limiting rod is fixedly connected to the strip plate, and the other end of the limiting rod extends into the movable frame. Both sides of the frame are provided with limiting grooves that are adapted to the limiting rod.

[0007] Preferably, the strip plate is provided with an extension plate, which is located outside the strip groove.

[0008] Preferably, a stop strip is fixedly connected between the two sides of the inner wall of the movable frame. When the frame is inserted into the movable frame and abuts against the stop strip, the positions of the limiting groove and the limiting rod correspond.

[0009] Preferably, the driving component includes a motor, a rotating shaft, and a cam. The rotating shaft is rotatably connected inside the first air duct, the motor is installed on the outer wall of the first air duct, the output shaft of the motor is coaxially connected to one end of the rotating shaft, and the cam is installed on the rotating shaft. It also includes a reset component, which is used to drive the stop bar to abut against the cam.

[0010] Preferably, the reset assembly includes a guide rod, a second spring, and fixed seats located at the four corners of the movable frame. The fixed seats are located on one side of the cam and are fixedly connected to the inner wall of the first air duct. The guide rod passes through the fixed seat, with one end of the guide rod fixedly connected to the movable frame and the other end of the guide rod fixedly connected to a round block. The second spring is sleeved on the guide rod, and both ends of the second spring are fixedly connected to the fixed seat and the round block, respectively.

[0011] Preferably, multiple guide plates are provided inside the heat exchange tube along its length, and two adjacent guide plates are fixedly connected to the upper and lower sides of the inner wall of the heat exchange tube, respectively.

[0012] Compared with the prior art, the beneficial effects of this application are: The plasma exhaust gas treatment device of this vapor deposition equipment, by setting up an exhaust gas pretreatment mechanism, first removes dust from the exhaust gas before it enters the plasma treatment box for purification, then heats the exhaust gas, and finally dehumidifies the exhaust gas. This can avoid the impact of dust, high temperature and moisture on subsequent plasma treatment, and greatly improve the effect of plasma treatment of exhaust gas. Attached Figure Description

[0013] Figure 1 This is a schematic diagram of the overall structure of this application.

[0014] Figure 2This is one of the structural schematic diagrams of the exhaust gas pretreatment mechanism in this application.

[0015] Figure 3 This is the second schematic diagram of the exhaust gas pretreatment mechanism in this application.

[0016] Figure 4 This is a cross-sectional structural diagram of the first air duct, the second air duct, the air inlet hood, and the air outlet hood in this application.

[0017] Figure 5 This is a schematic diagram of the structure in this application where the filter screen is installed inside the movable frame.

[0018] Figure 6 For this application Figure 5 A schematic diagram of the rear structure.

[0019] Figure 7 This is a schematic diagram of the separated state structure of the filter screen and the movable frame in this application.

[0020] Figure 8 For this application Figure 7 A partial structural diagram.

[0021] Figure 9 This is a schematic diagram of the non-structural structure of the active frame in this application.

[0022] Figure 10 This is a schematic diagram of the heat exchange box in this application.

[0023] Figure 11 This is a cross-sectional view of the heat exchange box in this application.

[0024] Figure 12 This is a cross-sectional view of the heat exchange tube in this application.

[0025] The meanings of the labels in the diagram are as follows: 10. Plasma treatment box; 11. Plasma generator; 12. Inlet pipe; 13. Outlet pipe; 20. First air duct; 21. Second air duct; 22. Inlet hood; 23. Outlet hood; 30. Movable frame; 300. Strip groove; 301. Baffle; 31. Frame; 310. Limiting groove; 32. Filter screen; 330. Strip plate; 331. Extension plate; 332. First spring; 333. Limiting rod; 340. Motor; 341. Rotating shaft; 342. Cam; 343. Fixed seat; 344. Guide rod; 345. Second spring; 346. Round block; 40. Heat exchange box; 41. Heat exchange tube; 410. Guide plate; 42. Water inlet pipe; 43. Water outlet pipe; 5. Activated carbon adsorption plate. Detailed Implementation

[0026] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0027] This application provides a technical solution: Please refer to the plasma exhaust gas treatment device for a vapor deposition equipment. Figures 1-12 ,include: The plasma treatment box 10 is used to treat the exhaust gas; The plasma generator 11 is used to emit plasma into the plasma processing chamber 10; the plasma processing chamber 10 is provided with an inlet pipe 12 and an outlet pipe 13. The exhaust gas enters the plasma treatment chamber 10 through the intake pipe 12. The plasma in the plasma treatment chamber 10 purifies the exhaust gas, and the treated exhaust gas is discharged through the exhaust pipe 13. Of course, in practice, the exhaust gas discharged through the exhaust pipe 13 may undergo further purification treatment as needed.

[0028] The exhaust gas pretreatment mechanism includes a first air duct 20 and a second air duct 21 connected and interconnected. The second air duct 21 is connected to the plasma treatment box 10. Specifically, the end of the air inlet pipe 12 away from the plasma treatment box 10 is connected to the second air duct 21. The exhaust gas pretreatment mechanism is mainly used to filter dust in the exhaust gas, dehumidify the exhaust gas appropriately, and cool the exhaust gas, thereby effectively avoiding the impact of high temperature, dust, and moisture on the subsequent plasma purification of the exhaust gas.

[0029] Specifically, the first air duct 20 and the second air duct 21 are connected by bolts and nuts. The side of the first air duct 20 away from the second air duct 21 is connected to the air inlet hood 22 by bolts and nuts. The side of the second air duct 21 away from the first air duct 20 is connected to the air outlet hood 23 by bolts and nuts. The end of the air inlet pipe 12 away from the plasma treatment box 10 is connected to the air outlet hood 23. The exhaust gas discharged from the vapor deposition equipment enters the exhaust gas pretreatment mechanism through the air inlet hood 22 for pretreatment and then enters the plasma treatment box 10 for further purification.

[0030] See Figures 4-9 The first air duct 20 is provided with a filter screen 32, and a frame 31 is fixedly connected to the edge of the filter screen 32. It also includes a movable frame 30 provided in the first air duct 20. The four sides of the movable frame 30 are fitted with the inner wall of the first air duct 20. The frame 31 is adapted to the movable frame 30. It also includes a locking member for locking the frame 31 onto the movable frame 30.

[0031] Specifically, the locking components include a strip plate 330, a first spring 332, and a limiting rod 333. The front side of the movable frame 30 (the side of the movable frame 30 near the air intake hood 22) is provided with strip grooves 300 on both sides. The strip grooves 300 are vertically arranged, and the strip plate 330 is slidably arranged in the strip grooves 300. The strip plate 330 slides horizontally. The first spring 332 and the limiting rod 333 are located on both sides of the strip plate 330. The two ends of the first spring 332 are fixedly connected to the inner wall of the strip plate 330 and the strip groove 300. One end of the limiting rod 333 is fixedly connected to the strip plate 330, and the other end of the limiting rod 333 extends into the movable frame 30. Both sides of the frame 31 are provided with limiting grooves 310 that are adapted to the limiting rods 333. The number of limiting rods 333 and limiting grooves 310 are the same, and their positions correspond to each other. There are at least two limiting rods 333 on each side.

[0032] The strip plate 330 is provided with an extension plate 331, which is located outside the strip groove 300. The extension plate 331 is convenient for workers to hold and thus facilitates pushing the strip plate 330.

[0033] It is worth noting that when no external force is applied to push the strip plate 330, the elastic force of the first spring 332 will cause the end of the limiting rod 333 away from the strip plate 330 to extend into the interior of the movable frame 30.

[0034] A baffle 301 is fixedly connected between the two sides of the inner wall of the movable frame 30. When the frame 31 is inserted into the movable frame 30 and abuts against the baffle 301, the limiting groove 310 and the limiting rod 333 are in the same position. Of course, when the frame 31 is inserted into the movable frame 30 and abuts against the baffle 301, part of the frame 31 will be outside the movable frame 30, so that the filter screen 32 can be removed.

[0035] When the filter screen 32 needs to be removed for cleaning, first remove the air intake cover 22, and then the staff push the extension plate 331 to move the strip plate 330 away from the filter screen 32, so that the limiting rod 333 moves out of the limiting groove 310, and the frame 31 and the filter screen 32 can be removed together for cleaning.

[0036] When the filter screen 32 needs to be installed, push the extension plate 331 to move the strip plate 330 away from the filter screen 32, and then insert the frame 31 together with the filter screen 32 into the movable frame 30. When the frame 31 abuts against the stop bar 301, the extension plate 331 can be released. Under the elastic force of the first spring 332, the limiting rod 333 will be inserted into the limiting groove 310, and the installation can be completed.

[0037] It also includes a drive component for driving the filter screen 32 to shake; the drive component includes a motor 340, a rotating shaft 341, and a cam 342. The rotating shaft 341 is rotatably connected inside the first air duct 20. The motor 340 is installed on the outer wall of the first air duct 20. The output shaft of the motor 340 is coaxially connected to one end of the rotating shaft 341. The cam 342 is installed on the rotating shaft 341. It also includes a reset component, which is used to drive the baffle 301 to abut against the cam 342.

[0038] The reset assembly includes a guide rod 344, a second spring 345, and a fixed seat 343 located at the four corners of the movable frame 30. The fixed seat 343 is located on one side of the cam 342 and is fixedly connected to the inner wall of the first air duct 20. The guide rod 344 passes through the fixed seat 343. One end of the guide rod 344 is fixedly connected to the movable frame 30, and the other end of the guide rod 344 is fixedly connected to a round block 346. The second spring 345 is sleeved on the guide rod 344, and both ends of the second spring 345 are fixedly connected to the fixed seat 343 and the round block 346, respectively.

[0039] When in use, starting the motor 340 will drive the rotating shaft 341 and cam 342 to rotate. When the cam 342 rotates the first half turn, it will push the baffle 301 away from the side of the cam 342, thereby causing the movable frame 30, filter screen 32, and guide rod 344 to move away from the side of the cam 342. At this time, the second spring 345 is compressed. When the cam 342 rotates the second half turn, under the elastic force of the second spring 345, the baffle 301, movable frame 30, filter screen 32, and guide rod 344 will move towards the side of the cam 342, so that the baffle 301 is always in contact with the cam 342. In this way, one rotation of the cam 342 will cause the filter screen 32 to swing back and forth once. The continuous rotation of the cam 342 will cause the filter screen 32 to swing back and forth, thereby vibrating away the dust and impurities on the filter screen 32, preventing the filter screen 32 from being blocked, and achieving a certain cleaning effect.

[0040] The filter 32 can effectively filter out dust in the exhaust gas, thereby reducing the impact of dust in the exhaust gas on the subsequent plasma purification of the exhaust gas.

[0041] The second air duct 21 is equipped with a heat exchange box 40 and an activated carbon adsorption plate 5. The activated carbon adsorption plate 5 can remove moisture from the exhaust gas to avoid the impact of moisture on the subsequent plasma purification of the exhaust gas. The heat exchange box 40 is provided with a heat exchange cavity, and multiple heat exchange tubes 41 are provided in the heat exchange cavity. Both ends of the heat exchange tubes 41 extend out of the heat exchange box 40. The heat exchange box 40 is provided with an inlet pipe 42 and an outlet pipe 43 that communicate with the heat exchange cavity. The ends of the inlet pipe 42 and the outlet pipe 43 that are away from the heat exchange box 40 extend to the outside of the second air duct 21.

[0042] Cold water can be injected into the heat exchange cavity through the water inlet pipe 42, filling the entire heat exchange cavity with cold water. Excess cold water flows out from the water outlet pipe 43. After the exhaust gas passes through the filter screen 32 to remove dust, it will disperse into multiple heat exchange tubes 41. The exhaust gas can be heat exchanged through the heat exchange tubes 41, thereby reducing the temperature of the exhaust gas.

[0043] Setting up multiple independent heat exchange tubes 41 allows the exhaust gas to be dispersed for heat exchange. Compared to a single large heat exchange tube, this disperses the exhaust gas and prevents the exhaust gas in the middle of a single large heat exchange tube from not receiving sufficient heat exchange.

[0044] Multiple guide plates 410 are provided inside the heat exchange tube 41 along its length. Two adjacent guide plates 410 are fixedly connected to the upper and lower sides of the inner wall of the heat exchange tube 41, respectively. The guide plates 410 can increase the residence time of the exhaust gas in the heat exchange tube 41, thereby achieving more complete heat exchange.

Claims

1. A plasma exhaust gas treatment device for a vapor deposition equipment, characterized in that, include: The plasma treatment box (10) is used to treat the exhaust gas; A plasma generator (11) is used to emit plasma into the plasma processing chamber (10); The exhaust gas pretreatment mechanism includes a first air duct (20) and a second air duct (21) connected and interconnected. The second air duct (21) is connected to the plasma treatment box (10). The first air duct (20) is provided with a filter screen (32). It also includes a driving component for driving the filter screen (32) to shake. The second air duct (21) is equipped with a heat exchange box (40) and an activated carbon adsorption plate (5).

2. The plasma exhaust gas treatment device for a vapor deposition equipment according to claim 1, characterized in that: The heat exchange box (40) is provided with a heat exchange cavity, and multiple heat exchange tubes (41) are provided in the heat exchange cavity. Both ends of the heat exchange tubes (41) extend out of the heat exchange box (40). The heat exchange box (40) is provided with an inlet pipe (42) and an outlet pipe (43) that are connected to the heat exchange cavity. The end of the inlet pipe (42) and the outlet pipe (43) that is away from the heat exchange box (40) extends to the outside of the second air duct (21).

3. The plasma exhaust gas treatment device for a vapor deposition equipment according to claim 2, characterized in that: It also includes a movable frame (30) located in the first air duct (20), a frame (31) fixedly connected to the edge of the filter (32), the frame (31) can be inserted into the movable frame (30), and a locking member for locking the frame (31) onto the movable frame (30).

4. The plasma exhaust gas treatment device for a vapor deposition equipment according to claim 3, characterized in that: The locking component includes a strip plate (330), a first spring (332), and a limiting rod (333). The front side of the movable frame (30) is provided with strip grooves (300) on both sides. The strip plate (330) is slidably provided in the strip grooves (300). The first spring (332) and the limiting rod (333) are respectively located on both sides of the strip plate (330). The two ends of the first spring (332) are fixedly connected to the inner wall of the strip plate (330) and the strip groove (300). One end of the limiting rod (333) is fixedly connected to the strip plate (330), and the other end of the limiting rod (333) extends into the movable frame (30). The two sides of the frame (31) are provided with limiting grooves (310) that are adapted to the limiting rod (333).

5. The plasma tail gas treatment device for a vapor deposition equipment according to claim 4, characterized in that: An extension plate (331) is provided on the strip plate (330), and the extension plate (331) is located outside the strip groove (300).

6. The plasma exhaust gas treatment device for a vapor deposition equipment according to claim 4, characterized in that: A stop bar (301) is fixedly connected between the two sides of the inner wall of the movable frame (30). When the frame (31) is inserted into the movable frame (30) and abuts against the stop bar (301), the position of the limiting groove (310) corresponds to that of the limiting rod (333).

7. The plasma exhaust gas treatment device for a vapor deposition equipment according to claim 6, characterized in that: The driving components include a motor (340), a rotating shaft (341), and a cam (342). The rotating shaft (341) is rotatably connected inside the first air duct (20). The motor (340) is installed on the outer wall of the first air duct (20). The output shaft of the motor (340) is coaxially connected to one end of the rotating shaft (341). The cam (342) is installed on the rotating shaft (341). The driving components also include a reset assembly, which is used to drive the baffle (301) to abut against the cam (342).

8. The plasma exhaust gas treatment device for a vapor deposition equipment according to claim 7, characterized in that: The reset assembly includes a guide rod (344), a second spring (345), and a fixed seat (343) located at the four corners of the movable frame (30). The fixed seat (343) is located on one side of the cam (342). The fixed seat (343) is fixedly connected to the inner wall of the first air duct (20). The guide rod (344) passes through the fixed seat (343). One end of the guide rod (344) is fixedly connected to the movable frame (30), and the other end of the guide rod (344) is fixedly connected to a round block (346). The second spring (345) is sleeved on the guide rod (344), and the two ends of the second spring (345) are fixedly connected to the fixed seat (343) and the round block (346) respectively.

9. A plasma tail gas treatment device for a vapor deposition equipment according to claim 2, characterized in that: Multiple guide plates (410) are provided inside the heat exchange tube (41) along its length direction. Two adjacent guide plates (410) are fixedly connected to the upper and lower sides of the inner wall of the heat exchange tube (41).