A sputtering tantalum ring compliance detection device

Abstract

The utility model relates to tantalum ring detection technical field discloses a kind of sputtering tantalum ring compliance detection device. Wherein sputtering tantalum ring compliance detection device includes detection ring. The inner wall shape of detection ring is compatible with the outer wall shape of compliance sputtering tantalum ring, and can be attached with the outer wall of compliance sputtering tantalum ring, on detection ring, multiple detection grooves are set up at the boss of compliance sputtering tantalum ring, the size of detection groove is matched with the boss size of compliance sputtering tantalum ring, detection groove bottom is attached with the boss of compliance sputtering tantalum ring, detection groove is used to accommodate the boss of tantalum ring to be detected, the wall thickness of detection ring is greater than the axial length of the boss of compliance sputtering tantalum ring, can carry out compliance detection to the tantalum ring possibly existing roundness perpendicularity deviation, adjacent boss axis angle abnormality after processing, avoid the problem that tantalum ring is installed in detection device difficult, time-consuming and laborious in the process of detecting tantalum ring, and tantalum ring to be detected is prone to collision with detection device and is further knocked tantalum ring.

Description

Technical Field

[0001] This utility model relates to the field of tantalum ring testing technology, and in particular to a sputtered tantalum ring compliance testing device. Background Technology

[0002] In the physical vapor deposition (PVD) process for semiconductor chip manufacturing, tantalum rings, as key auxiliary components, play a crucial role in ensuring thin film uniformity and sputtering stability. During the tantalum thin film production process, the tantalum ring is installed between the tantalum target and the single-crystal silicon carrier and assembled onto the sputtering machine. The magnetic field generated around the tantalum ring after energization guides atoms from the tantalum target surface to uniformly adhere to the single-crystal silicon carrier along a predetermined path, directly determining the final film quality and precision. Therefore, the structural compliance of the tantalum ring is one of the important prerequisites for ensuring the qualification of the deposition process. Tantalum ring processing is easily affected by factors such as material properties and process precision, resulting in problems such as roundness deviation and perpendicularity errors. Especially for the bosses on the tantalum ring used for positioning and installation, if there is an error in the included angle between the axes of adjacent bosses, or if the size and position of the bosses deviate from the standard, it will directly lead to the tantalum ring not being accurately matched with the sputtering machine. This can cause minor issues such as tantalum atom sputtering direction deviation, damaging film uniformity, or even make the tantalum ring completely uninstallable, significantly increasing the ring scrap rate and production losses.

[0003] Currently, the common testing method involves directly installing and calibrating the tantalum rings inside the cylindrical cavity of the sputtering machine components. The compliance of the tantalum rings is determined through actual assembly. However, the narrow space of the cylindrical cavity makes the installation and calibration of the tantalum rings cumbersome, requiring significant manpower and time, resulting in extremely low testing efficiency. Furthermore, the tantalum rings themselves possess a certain degree of elasticity and require high surface precision. During repeated disassembly and assembly within the cavity, they are prone to collisions with the cavity wall, causing scratches and further increasing the risk of scrapping. The circumferential notch on the tantalum rings, combined with their elastic characteristics, makes it difficult for traditional testing methods to accurately determine whether their roundness, perpendicularity, and boss positions truly meet the standards. This results in insufficient testing reliability and fails to meet the demands of large-scale production for efficient, low-destructive testing.

[0004] Therefore, there is an urgent need for a sputtering tantalum ring compliance testing device that can quickly, accurately, and with low damage test the compliance of tantalum rings, ensure the quality stability of tantalum rings, and thus improve the yield of coating processes. Utility Model Content

[0005] The purpose of this invention is to provide a sputtering tantalum ring compliance testing device that can quickly, accurately, and with low damage test the compliance of tantalum rings, ensure the quality stability of tantalum rings, and thus improve the yield of coating processes.

[0006] Based on the above concept, the technical solution adopted by this utility model is as follows:

[0007] A sputtered tantalum ring compliance testing device, comprising a testing ring;

[0008] The inner wall shape of the detection ring is adapted to the outer wall shape of the compliant sputtering tantalum ring, and can fit completely against the outer wall of the compliant sputtering tantalum ring;

[0009] The compliant sputtered tantalum ring has multiple bosses along its circumference. On the detection ring, multiple detection grooves extending radially along the detection ring are formed at the bosses corresponding to the compliant sputtered tantalum ring. The size of the detection groove matches the size of the bosses of the compliant sputtered tantalum ring. The bottom of the detection groove is completely fitted with the bosses of the compliant sputtered tantalum ring. The detection groove is used to accommodate the bosses of the tantalum ring to be tested. The wall thickness of the detection ring is greater than the axial length of the bosses of the compliant sputtered tantalum ring.

[0010] As an optional solution for the sputtered tantalum ring compliance testing device, the device also includes a testing nut, which can be screwed onto the testing ring. When the boss of the tantalum ring to be tested is accommodated in the testing groove, the testing nut can also be screwed onto the threaded hole of the tantalum ring to be tested.

[0011] As an optional solution for the sputtered tantalum ring compliance testing device, the sputtered tantalum ring compliance testing device also includes a pressure sensing plate, which is installed on the inner wall of the testing ring, and the outer wall of the tantalum ring to be tested can abut against the pressure sensing plate.

[0012] As an optional solution for the sputtered tantalum ring compliance testing device, the sputtered tantalum ring compliance testing device also includes an alarm module, which is electrically connected to the pressure sensor. When the pressure received by the pressure sensor is greater than or less than a preset pressure threshold, the alarm module will be triggered.

[0013] As an optional solution for the sputtered tantalum ring compliance testing device, the inner wall of the testing ring is coated with a wear-resistant coating.

[0014] As an optional solution for the sputtered tantalum ring compliance testing device, a guide ramp is provided between the top surface and the inner sidewall of the testing ring to guide the tantalum ring to be tested into the testing ring.

[0015] As an optional solution for the sputtered tantalum ring compliance testing device, the testing ring is made of stainless steel.

[0016] As an optional solution for the sputtered tantalum ring compliance testing device, the testing ring is also provided with multiple weight reduction holes, which are evenly distributed along the circumference of the testing ring and are not connected to the testing groove.

[0017] As an optional solution for the sputtered tantalum ring compliance testing device, the device also includes a protective cover, which is detachably connected to the top of the testing ring and is used to protect the inner wall of the testing ring and the testing groove when the sputtered tantalum ring compliance testing device is not in use.

[0018] As an optional solution for the sputtered tantalum ring compliance testing device, a colored sticker or paint is affixed to the outer periphery of the test groove corresponding to the top of the test ring.

[0019] The beneficial effects of this utility model are as follows:

[0020] This invention proposes a compliance testing device for sputtered tantalum rings. The inner wall shape of the testing ring is adapted to the outer wall shape of the compliant sputtered tantalum ring and can completely fit against the outer wall of the compliant sputtered tantalum ring. The compliant sputtered tantalum ring has multiple bosses along its circumference. On the testing ring, multiple testing grooves extending radially along the testing ring are opened at the corresponding bosses of the compliant sputtered tantalum ring. The size of the testing grooves matches the size of the bosses of the compliant sputtered tantalum ring. The bottom of the testing grooves completely fits against the bosses of the compliant sputtered tantalum ring. The testing grooves are used to accommodate the bosses of the tantalum ring to be tested. The wall thickness of the testing ring is greater than the axial length of the bosses of the compliant sputtered tantalum ring. This device can quickly and conveniently perform compliance testing on tantalum rings that may have roundness and perpendicularity deviations or abnormal angles between the axes of adjacent bosses after processing. It avoids the problems of difficulty in installing the tantalum ring to be tested into the testing device, which is time-consuming and laborious, and the tantalum ring to be tested is prone to collision with the testing device and damage. Attached Figure Description

[0021] Figure 1 This is a first structural schematic diagram of the sputtering tantalum ring compliance testing device provided in this embodiment of the present invention;

[0022] Figure 2 This is a second structural schematic diagram of the sputtering tantalum ring compliance testing device provided in this embodiment of the present invention;

[0023] Figure 3 This is a cross-sectional view of the sputtering tantalum ring compliance testing device provided in this embodiment of the utility model.

[0024] In the picture:

[0025] 1. Detection ring; 11. Detection groove;

[0026] 2. Inspect the nuts. Detailed Implementation

[0027] To make the technical problem solved by this utility model, the technical solution adopted, and the technical effect achieved clearer, the technical solution of this utility model will be further described below with reference to the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are merely for explaining this utility model and not for limiting it. Furthermore, it should be noted that, for ease of description, only the parts related to this utility model are shown in the accompanying drawings, not all of them.

[0028] In the description of this utility model, unless otherwise explicitly specified and limited, the terms "connected," "linked," and "fixed" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0029] In this invention, unless otherwise explicitly specified and limited, "above" or "below" the second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of the second feature includes the first feature directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature includes the first feature directly below or diagonally below the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0030] In the description of this embodiment, the terms "upper," "lower," "left," and "right," etc., refer to the orientation or positional relationship shown in the accompanying drawings. They are used only for ease of description and simplification of operation, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model. In addition, the terms "first" and "second" are only used for distinction in description and have no special meaning.

[0031] The technical solution of this utility model will be further described below with reference to the accompanying drawings and specific embodiments.

[0032] This embodiment discloses a compliance testing device for sputtered tantalum rings, such as... Figures 1-3As shown, in this embodiment, the tantalum sputtering ring compliance testing device includes a testing ring 1. The inner wall shape of the testing ring 1 is adapted to the outer wall shape of the compliant tantalum sputtering ring and can completely fit against the outer wall of the compliant tantalum sputtering ring. The compliant tantalum sputtering ring has multiple bosses along its circumference. On the testing ring 1, multiple testing grooves 11 extending radially along the testing ring 1 are formed at the corresponding bosses of the compliant tantalum sputtering ring. The size of the testing grooves 11 matches the size of the bosses of the compliant tantalum sputtering ring. The bottom of the testing grooves 11 completely fits against the bosses of the compliant tantalum sputtering ring. The testing grooves 11 are used to accommodate the bosses of the tantalum ring to be tested. The wall thickness of the testing ring 1 is greater than the axial length of the bosses of the compliant tantalum sputtering ring. The testing personnel can detect whether the included angle between the axes of any two adjacent bosses is standard based on whether the bosses on the tantalum ring to be tested can be placed in the testing grooves 11. The testing personnel can also determine whether the included angle between the axes of two adjacent bosses is standard based on whether the bosses on the tantalum ring to be tested and the testing ring can fit into the testing grooves 11. The roundness can be determined by the degree of fit between the inner wall and the bottom of the testing groove 11. The perpendicularity can be determined by the degree of fit between the tantalum ring to be tested and the bottom of the testing groove 11. The testing process is simple, and it can quickly and conveniently perform compliance testing on tantalum rings that may have deviations in roundness and perpendicularity after processing, or abnormal angles between the axes of adjacent bosses. This avoids the problems of difficulty in installing the tantalum ring to be tested on the testing device, which is time-consuming and laborious, and the tantalum ring to be tested is prone to collision with the testing device and damage. It greatly improves the efficiency and convenience of tantalum ring testing, reduces the risk of damage to tantalum rings during testing, and can accurately screen out tantalum rings that meet the installation requirements of the sputtering machine. It also reduces problems such as installation failure and sputtered atoms deviating from the correct direction due to abnormal shape or angle of tantalum ring, and ensures the uniformity of thin film and production yield in semiconductor coating production.

[0033] Specifically, such as Figures 1-3As shown, in this embodiment, the sputtered tantalum ring compliance testing device also includes a testing nut 2. The testing nut 2 can be screwed onto the testing ring 1, and when the boss of the tantalum ring to be tested is accommodated in the testing groove 11, the testing nut 2 can also be screwed onto the threaded hole of the tantalum ring to be tested. Through the dual cooperation of screwing onto the testing ring 1 and screwing onto the threaded hole of the tantalum ring to be tested, the testing nut 2 can achieve auxiliary correction of the installation posture of the tantalum ring during the testing process. When the testing nut 2 is screwed in, its precise threaded engagement with the testing ring 1 can serve as a reference. If there is a slight positional deviation in the threaded hole of the tantalum ring to be tested, the testing nut 2 can generate a slight guiding force on the tantalum ring during the screwing process. This helps adjust the position of the tantalum ring within the detection ring 1, making the fit between the tantalum ring boss and the detection groove 11 more precise. It also assists in calibrating the coaxiality deviation of the threaded hole itself. Double correction can be completed by the tightening action of the detection nut 2 without the need for additional correction tools. This avoids misjudgment of test results caused by tantalum ring installation posture deviation, improves the accuracy of test data, and reduces the impact damage to the tantalum ring that may be caused by manual correction. This makes the testing process both accurate and practical, and eliminates the hidden dangers caused by posture or threaded hole coaxiality deviation in advance for the subsequent precise assembly of the tantalum ring and sputtering machine, thus more comprehensively ensuring the stability of semiconductor coating production.

[0034] Preferably, in this embodiment, the sputtered tantalum ring compliance testing device further includes a pressure sensing plate. The pressure sensing plate is installed on the inner wall of the testing ring 1, and the outer wall of the tantalum ring to be tested can abut against the pressure sensing plate. When the boss of the tantalum ring to be tested is completely contained in the testing groove 11, the pressure sensing plate can detect the contact pressure between the tantalum ring to be tested and the inner wall of the testing groove 11. Setting a pressure sensing plate can realize the quantitative detection of the contact state between the tantalum ring and the testing device. It can not only further accurately obtain the specific pressure data of the tightness of the contact on the basis of judging whether the roundness, perpendicularity and the included angle of the axis of adjacent bosses meet the standards by vision or touch, but also avoid the problem of inaccurate detection caused by subjective judgment error. It can also more efficiently identify the slight shape deviations that may exist on the outer wall or boss of the tantalum ring, thereby more comprehensively ensuring the accuracy of the test results.

[0035] Preferably, in this embodiment, the sputtering tantalum ring compliance testing device further includes an alarm module, which is electrically connected to the pressure sensor. When the pressure received by the pressure sensor is greater than or less than a preset pressure threshold, the alarm module is triggered, thereby enabling rapid identification of the tantalum ring's compliance. When the tantalum ring to be tested has deviations in roundness, perpendicularity, or the angle between the axes of adjacent bosses, resulting in abnormal contact between it and the inner wall of the testing ring 1 or the bottom of the testing groove 11, and thus causing the pressure sensed by the pressure sensor to exceed or fall below a preset reasonable range, the alarm module will respond promptly. This eliminates the need for testing personnel to rely solely on subjective observation and judgment, further simplifying the testing process, significantly improving the efficiency and accuracy of tantalum ring compliance testing, avoiding errors that may occur with manual judgment, and enabling faster screening of tantalum rings that meet the installation requirements of the sputtering machine. This effectively reduces problems such as installation failures and sputtered atoms deviating from the correct direction due to abnormal tantalum ring shape or angle, and better ensures the uniformity and production yield of thin films in semiconductor coating production.

[0036] Preferably, in this embodiment, the pressure sensor is also installed at the bottom of the detection groove 11, which can realize the distributed and accurate capture of the contact pressure between the tantalum ring boss and the bottom of the detection groove 11. When the verticality deviation of the tantalum ring to be tested exists, the contact between its boss and the bottom of the detection groove 11 will result in local pressure unevenness. By observing the pressure data distribution obtained by the pressure sensor at the bottom of the groove, it is possible to intuitively determine whether the boss is completely and evenly attached to the bottom of the groove, thereby accurately identifying whether the verticality of the tantalum ring meets the standard, effectively avoiding the problem of missing detection of minor verticality deviations caused by human subjective error.

[0037] Preferably, in this embodiment, the inner wall of the detection ring 1 is coated with a wear-resistant coating, which can improve the wear resistance of the inner wall of the detection ring 1. During the detection process, the tantalum ring to be tested needs to be repeatedly attached to and separated from the inner wall of the detection ring 1. The coating can effectively reduce the wear of the inner wall of the detection ring 1 and the tantalum ring to be tested caused by long-term contact friction, and avoid shape deviation of the inner wall due to wear. This ensures that the inner wall of the detection ring 1 can always maintain a precise fit with the outer wall of the compliant sputtered tantalum ring, ensuring the long-term accuracy of the roundness detection results. The wear-resistant coating can also reduce the debris generated by wear on the inner wall of the detection ring 1, prevent debris from adhering to the surface of the tantalum ring to be tested or entering the detection groove 11 to affect the detection of the boss, reduce potential contamination and damage to the tantalum ring, and further extend the service life of the detection ring 1.

[0038] Preferably, in this embodiment, the wear-resistant coating is made of aluminum nitride ceramic material, which can improve the wear resistance of the inner wall of the detection ring 1. Aluminum nitride ceramic material has the characteristics of high hardness, excellent wear resistance and chemical stability. At the same time, the high hardness can also significantly reduce the wear of the inner wall caused by repeated bonding and separation of the tantalum ring to be tested, and maintain the precise shape of the inner wall of the detection ring 1 and the outer wall of the compliant tantalum ring for a long time, ensuring the continuous accuracy of the roundness test results. Aluminum nitride ceramic has excellent chemical inertness, which can effectively resist the erosion of trace corrosive substances that may be present in the detection environment, avoid coating peeling or inner wall corrosion, prevent impurities from contaminating the tantalum ring to be tested, and ensure the cleanliness of the tantalum ring surface and the accuracy of the detection groove 11 for detecting the boss. In other embodiments, the wear-resistant coating can also be made of high molecular weight polyethylene modified material or alumina ceramic material, etc.

[0039] Preferably, in this embodiment, a guide slope is provided between the top surface and the inner sidewall of the detection ring 1, which can play a guiding role in the process of placing the tantalum ring to be tested into the detection ring 1, helping the tantalum ring to be tested to quickly align with the inner wall of the detection ring 1 and the position of the detection groove 11, avoiding direct collision between the tantalum ring and the edge of the detection ring 1 due to positional deviation during placement, reducing the difficulty of installing the tantalum ring to be tested, reducing the adjustment time of the testing personnel when placing the tantalum ring, improving the testing efficiency and operational convenience, and effectively avoiding the risk of tantalum ring damage caused by installation alignment difficulties.

[0040] Preferably, in this embodiment, the detection ring 1 is made of stainless steel. The high strength, high hardness, and good structural stability of stainless steel ensure that the dimensions and shape of the inner wall contact surface and the detection groove 11 remain accurate throughout long-term use. This avoids deviations in the detection benchmark due to material deformation, thereby guaranteeing the accuracy and consistency of the detection of the roundness, perpendicularity, and angle between adjacent boss axes of the sputtered tantalum ring. In other embodiments, the detection ring 1 can also be made of materials such as polytetrafluoroethylene or aluminum alloy.

[0041] Preferably, in this embodiment, the detection ring 1 is also provided with a plurality of weight-reducing holes. The weight-reducing holes are evenly distributed along the circumference of the detection ring 1 and are not connected to the detection groove 11. Under the premise of not damaging the structural integrity of the detection groove 11, not affecting the detection groove 11's function of accommodating and fitting the tantalum ring boss, and not interfering with the fitting effect between the inner wall of the detection ring 1 and the outer wall of the tantalum ring, the overall weight of the detection ring 1 itself is effectively reduced, reducing the physical burden on the testing personnel when holding or operating the detection ring 1, making the testing process more labor-saving and convenient, and further improving the flexibility and efficiency of the testing operation.

[0042] Preferably, in this embodiment, the sputtered tantalum ring compliance testing device further includes a protective cover, which is detachably connected to the top of the testing ring 1. This protective cover protects the inner wall of the testing ring 1 and the testing groove 11 when the sputtered tantalum ring compliance testing device is not in use. This prevents damage or accuracy deviations to the inner wall of the testing ring 1 and the testing groove 11 due to dust accumulation, contamination, or accidental bumps or scratches during idle periods. It ensures that the original fit and dimensional accuracy of the core testing parts of the testing ring 1 are not affected, guaranteeing the accuracy of subsequent roundness, perpendicularity, and angle measurements of adjacent boss axes on the tantalum ring. Simultaneously, it extends the overall service life of the testing device and reduces testing errors or device repair and replacement costs caused by damage to the testing parts.

[0043] Preferably, in this embodiment, the top of the detection ring 1 is affixed with a colored sticker or painted with pigment on the outer periphery corresponding to the detection groove 11. This allows the testing personnel to quickly and clearly locate the specific position of the detection groove 11 without spending extra time searching for or identifying each detection groove 11 on the detection ring 1. When testing the tantalum ring to be tested, the tantalum ring boss can be quickly aligned with the detection groove 11 to attempt insertion, further simplifying the testing operation process, significantly shortening the preparation time before testing and the positioning time during testing, and improving the overall testing efficiency. At the same time, the color marking can reduce the situation where the tantalum ring boss and the non-detection groove 11 area of ​​the detection ring 1 accidentally contact or collide due to the unclear position of the detection groove 11, reducing the risk of damage to the tantalum ring to be tested, and also avoiding the accuracy of the detection results of roundness, perpendicularity and the angle between the axes of adjacent bosses due to positioning deviation.

[0044] Optionally, in this embodiment, the sticker or paint is fluorescent green. In other embodiments, the sticker or paint can also be yellow, fluorescent pink, or red, as long as it is a relatively eye-catching color.

[0045] Obviously, the above embodiments of this utility model are merely examples for clearly illustrating the present utility model, and are not intended to limit the implementation of the present utility model. Those skilled in the art can make other variations or modifications based on the above description. It is neither necessary nor possible to exhaustively list all possible implementations here. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of this utility model should be included within the protection scope of the claims of this utility model.

Claims

1. A compliance testing device for sputtered tantalum rings, characterized in that, Includes the detection ring (1); The inner wall shape of the detection ring (1) is adapted to the outer wall shape of the compliant sputtering tantalum ring, and can be completely fitted to the outer wall of the compliant sputtering tantalum ring; The compliant sputtered tantalum ring has multiple bosses along its circumference. On the detection ring (1), a plurality of detection grooves (11) extending radially along the detection ring (1) are provided at the bosses of the compliant sputtered tantalum ring. The size of the detection grooves (11) matches the size of the bosses of the compliant sputtered tantalum ring. The bottom of the detection grooves (11) is completely fitted with the bosses of the compliant sputtered tantalum ring. The detection grooves (11) are used to accommodate the bosses of the tantalum ring to be tested. The wall thickness of the detection ring (1) is greater than the axial length of the bosses of the compliant sputtered tantalum ring.

2. The sputtered tantalum ring compliance testing device according to claim 1, characterized in that, The sputtered tantalum ring compliance testing device also includes a testing nut (2), which can be screwed into the testing ring (1), and when the boss of the tantalum ring to be tested is accommodated in the testing groove (11), the testing nut (2) can also be screwed into the threaded hole of the tantalum ring to be tested.

3. The sputtered tantalum ring compliance testing device according to claim 1, characterized in that, The sputtered tantalum ring compliance testing device also includes a pressure sensor plate, which is installed on the inner wall of the testing ring (1), and the outer wall of the tantalum ring to be tested can abut against the pressure sensor plate.

4. The sputtered tantalum ring compliance testing device according to claim 3, characterized in that, The sputtered tantalum ring compliance testing device also includes an alarm module, which is electrically connected to the pressure sensor. When the pressure received by the pressure sensor is greater than or less than a preset pressure threshold, the alarm module will be triggered.

5. The sputtered tantalum ring compliance testing device according to any one of claims 1-4, characterized in that, The inner wall of the detection ring (1) is coated with a wear-resistant coating.

6. The sputtering tantalum ring compliance testing device according to any one of claims 1-4, characterized in that, A guide slope is provided between the top surface and the inner sidewall of the detection ring (1) to guide the tantalum ring to be tested into the detection ring (1).

7. The sputtering tantalum ring compliance testing device according to any one of claims 1-4, characterized in that, The detection ring (1) is made of stainless steel.

8. The sputtered tantalum ring compliance testing device according to any one of claims 1-4, characterized in that, The detection ring (1) is also provided with a plurality of weight reduction holes, which are evenly distributed along the circumference of the detection ring (1) and are not connected to the detection groove (11).

9. The sputtering tantalum ring compliance testing device according to any one of claims 1-4, characterized in that, The sputtering tantalum ring compliance testing device also includes a protective cover, which is detachably connected to the top of the testing ring (1) and is used to protect the inner wall of the testing ring (1) and the testing groove (11) when the sputtering tantalum ring compliance testing device is not in use.

10. The sputtered tantalum ring compliance testing device according to any one of claims 1-4, characterized in that, A colored sticker or paint is affixed to the outer periphery of the detection groove (11) at the top of the detection ring (1).

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