An OverlayMark area structure of a color filter

Abstract

The utility model discloses an Overlay Mark area structure of color filter relates to color filter technical field. The structure includes: black matrix BM, be provided with the hollow area on black matrix BM, the hollow area is located in the area of Overlay Mark, and the area is less than the area of Overlay Mark, Overlay Mark, form in the hollow area of black matrix BM top, bottom embed the hollow area, RGB process and interval column PS process use Overlay Mark monitoring alignment precision. The Overlay Mark area structure of color filter provided by the utility model improves the adhesion of Overlay Mark through the modification Overlay Mark standing area design.

Description

Technical Field

[0001] This utility model relates to the field of color filter technology, specifically to an Overlay Mark region structure for a color filter. Background Technology

[0002] The manufacturing process of color filters in TFT-LCD panel factories includes the BM (black matrix) process, R (red photoresist) process, G (green photoresist) process, B (blue photoresist) process, OC (planarization layer photoresist) process, and PS (spacer column) process. The BM process, or First Layer, is directly fabricated on a clean substrate glass. Subsequent processes, based on the BM process, are collectively referred to as the 2nd Layer.

[0003] RGB and PS processes use overlay marks to monitor alignment accuracy. Existing overlay mark designs include... Figure 1 and Figure 2 As shown, the image stands on the BM photoresist. The alignment accuracy of each process is determined by measuring the offset between the center of the Overlay Mark and the center of the BM frame using a precision length measuring instrument.

[0004] However, the applicant discovered that the Overlay Mark was at risk of peeling when the development concentration was too high. If it peeled, it could not be measured and a new substrate with a lower development concentration would need to be made for measurement, which would affect the operation of the production line. Utility Model Content

[0005] The technical problem to be solved by this utility model is to provide an Overlay Mark area structure for a color filter. By modifying the design of the Overlay Mark standing area, the problem of peeling due to poor adhesion between the Overlay Mark and the BM photoresist caused by excessively high development concentration is eliminated, thereby improving the adhesion of the Overlay Mark.

[0006] This utility model is implemented as follows: An overlay mark region structure for a color filter, comprising: A black matrix BM has a cutout area on it, which is located within the area of ​​the Overlay Mark and has a smaller area than the area of ​​the Overlay Mark. An overlay mark is formed above the cutout area of ​​the black matrix BM and embedded at the bottom of the cutout area; the overlay mark is used to monitor the alignment accuracy of the RGB process and the spacer column PS process.

[0007] Optionally, the hollowed-out area is square.

[0008] Optionally, the side length of the square cutout area can range from 3um to 10um.

[0009] Optionally, the hollowed-out area is circular.

[0010] Optionally, the diameter of the circular cutout area ranges from 3um to 10um.

[0011] Optionally, the hollowed-out area is triangular.

[0012] Optionally, the side length of the triangular cutout area can range from 3um to 10um.

[0013] Preferably, the cutout area is located at the center of the Overlay Mark area.

[0014] The advantages of this utility model are: By changing the black matrix BM photoresist plane to a BM photoresist plane with a hollowed-out area, the adhesion of the 2nd layer overlay mark is increased, making it less likely to peel off even when the development concentration is too high, thus avoiding affecting the operation of the production line and expanding the range of development concentrations that the overlay mark can be used for. Attached Figure Description

[0015] The present invention will be further described below with reference to the accompanying drawings and embodiments.

[0016] Figure 1 This is a top-view structural diagram of an Overlay Mark in the prior art.

[0017] Figure 2 This is a side view diagram of the Overlay Mark structure in the prior art.

[0018] Figure 3 This is a top view of the Overlay Mark in an embodiment of this utility model; Figure 4 This is a side view of the Overlay Mark in an embodiment of this utility model. Detailed Implementation

[0019] The technical solution of this utility model will now be clearly and completely described with reference to the accompanying drawings and specific embodiments. All other embodiments obtained by those skilled in the art based on the embodiments of this utility model without creative effort are within the scope of protection of this utility model.

[0020] In the description of this utility model, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model.

[0021] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this invention based on the specific circumstances.

[0022] Please see Figure 3 and Figure 4 As shown, this embodiment provides an Overlay Mark region structure for a color filter, including: Black matrix BM1, the black matrix BM1 is provided with a hollow area 10, the hollow area is located in the area of ​​Overlay Mark2, and the area is smaller than the area of ​​Overlay Mark2; Overlay Mark2 is formed above the cutout area 10 of the black matrix BM1 and is embedded in the cutout area 10 at the bottom; the RGB process and the spacer PS process use Overlay Mark2 to monitor the alignment accuracy.

[0023] In this embodiment, the hollowed-out area 10 is square. The side length of the square hollowed-out area ranges from 3µm to 10µm. In a specific embodiment, 5µm × 5µm is preferred.

[0024] Preferably, the black matrix BM1 is disposed on the substrate glass 3. The cutout area 10 is located at the center of the overlay mark 2 area.

[0025] In one possible implementation, the hollowed-out area 10 is circular. The diameter of the circular hollowed-out area ranges from 3µm to 10µm. In a specific embodiment, 5µm is preferred.

[0026] In another possible implementation, the hollowed-out area 10 is triangular. The side length of the triangular hollowed-out area ranges from 3µm to 10µm. In a specific embodiment, 5µm is preferred.

[0027] The shape and position of the cutout area 10 are not limited, and the cutout area 10 can be set to other shapes or non-center positions of the Overlay Mark 2 area according to actual needs. However, the cutout area 10 should not exceed the Overlay Mark 2 area, and should not be too large or too small.

[0028] This invention improves the adhesion of the 2nd Layer Overlay Mark by replacing the black matrix BM photoresist plane with a BM photoresist plane with a hollowed-out area. This makes it less likely to peel off even when the development concentration is too high, thus avoiding affecting the operation of the production line and expanding the range of development concentrations that the Overlay Mark can be used for.

[0029] While specific embodiments of the present invention have been described above, those skilled in the art should understand that the specific embodiments described are merely illustrative and not intended to limit the scope of the present invention. Equivalent modifications and variations made by those skilled in the art in accordance with the spirit of the present invention should be covered within the scope of protection of the claims of the present invention.

Claims

1. A structure of an Overlay Mark area of a color filter, characterized by, include: A black matrix BM has a cutout area on it, which is located within the area of ​​the Overlay Mark and has a smaller area than the area of ​​the Overlay Mark. An overlay mark is formed above the cutout area of ​​the black matrix BM and embedded at the bottom of the cutout area; the overlay mark is used to monitor the alignment accuracy of the RGB process and the spacer column PS process.

2. The Overlay Mark area structure of a color filter according to claim 1, characterized in that: The hollowed-out area is square.

3. The Overlay Mark area structure of a color filter according to claim 2, characterized by: The side length of the square cutout area ranges from 3um to 10um.

4. The Overlay Mark area structure of a color filter according to claim 1, wherein: The hollowed-out area is circular.

5. The Overlay Mark region structure of a color filter according to claim 4, characterized in that: The diameter of the circular hollow area ranges from 3um to 10um.

6. The Overlay Mark region structure of a color filter according to claim 1, characterized in that: The hollowed-out area is triangular.

7. The Overlay Mark region structure of a color filter according to claim 1, characterized in that: The side length of the triangular hollow area ranges from 3um to 10um.

8. The Overlay Mark region structure of a color filter according to claim 1, characterized in that: The cutout area is located at the center of the Overlay Mark area.

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