Solid-state battery electrostatic film forming machine with turnover structure

Abstract

The utility model discloses a solid -state battery static electrostatic film forming machine with turnover structure, including the shell, be provided with silk screen in the shell, be located silk screen below's film forming base plate and with silk screen or film forming base plate electric connection's static generator, still be provided with support in the shell, silk screen articulates on the support, be provided with elastic part on the support, and elastic part makes silk screen have the tendency of far away film forming base plate, and the hinged end of support and silk screen is provided with damping part, and the force direction of damping part is opposite with the turnover direction of silk screen. The utility model discloses under the condition that need not dismounting silk screen, can clean the residual between silk screen and film forming base plate, has saved the operation step, has reduced the production preparation time, makes the cleaning more convenient.

Description

Technical Field

[0001] This utility model relates to the field of solid-state battery manufacturing equipment technology, and in particular to a solid-state battery electrostatic film forming machine with a flipping structure. Background Technology

[0002] Electrostatic film deposition technology is a key process in the preparation of solid-state battery electrodes. Its basic principle is to use an electrostatic generator to create a high-voltage electrostatic field between the screen and the film deposition substrate. Under the action of the electric field, the powdered or slurry battery material is precisely and uniformly deposited onto the substrate through a specific pattern on the screen, thereby forming the desired thin film structure.

[0003] Existing electrostatic film deposition equipment typically uses bolts or clamps to rigidly fix the screen to a frame, maintaining a precise parallel alignment with the substrate. While this fixed design ensures stability during film deposition, a small amount of material powder or slurry inevitably remains inside the screen mesh after each deposition operation. Due to the very narrow gap between the screen and the substrate and the fixed structure, it is difficult for operators to clean it thoroughly and conveniently. Long-term accumulation of residue can clog the mesh, seriously affecting the quality and pattern accuracy of subsequent film deposition, and even leading to product scrap. To clean this residue, the entire screen must be disassembled. However, the disassembly of a fixed-installation screen requires a cumbersome disassembly, reinstallation, and alignment process, which is time-consuming and seriously affects the flexibility of the production line and the utilization rate of the equipment, increasing production preparation time. Utility Model Content

[0004] The purpose of this invention is to provide a solid-state battery electrostatic film forming machine with a flipping structure, which can clean the residue between the wire mesh and the film forming substrate without disassembling the wire mesh, saving operation steps, reducing production preparation time, and making cleaning more convenient.

[0005] The above-mentioned technical objective of this utility model is achieved through the following technical solution: a solid-state battery electrostatic film forming machine with a flipping structure, comprising a housing, a wire mesh disposed inside the housing, a film forming substrate located below the wire mesh, and an electrostatic generator electrically connected to the wire mesh or the film forming substrate, a support disposed inside the housing, the wire mesh being hinged to the support, an elastic element disposed on the support, the elastic element causing the wire mesh to tend to move away from the film forming substrate, a damping element disposed on the hinge end of the support and the wire mesh, the direction of the force of the damping element being opposite to the flipping direction of the wire mesh.

[0006] By adopting the above technical solution and setting up an elastic element, the screen can be flipped upwards to detach from the film-forming substrate, exposing the substrate. This eliminates the need to remove the screen and clean the gap between the screen and the substrate, saving operational steps, reducing production preparation time, and making cleaning more convenient. By setting up a damping element, the screen flips upwards slowly, smoothly, and in a controlled manner, preventing the screen from bouncing upwards at high speed and violently, which could damage equipment or endanger operators, thus ensuring operational safety.

[0007] A further feature of this invention is that the damping component includes an outer sleeve, and a rotating rod, a first friction plate, a second friction plate, and a top rod located within the outer sleeve. The top rod is coaxially arranged with the rotating rod, the first friction plate is disposed on the rotating rod, the second friction plate is disposed on the top rod, and the second friction plate abuts against the first friction plate.

[0008] By adopting the above technical solution, when the hinge shaft rotates, it drives the first friction plate to rotate on the second friction plate, thereby generating a large friction force and thus completing the damping function.

[0009] A further feature of this invention is that an adjustment mechanism is provided inside the outer sleeve, and the adjustment mechanism is operated to make the top rod have a displacement path that moves closer to or further away from the rotating rod.

[0010] By adopting the above technical solution, the distance between the top rod and the rotating rod is controlled by setting an adjustment mechanism, thereby reducing or increasing the friction force of the first friction plate on the second friction plate, and achieving the effect of adjusting the damping force.

[0011] A further feature of this invention is that the adjusting mechanism includes an end cap fixedly mounted on the outer sleeve and an adjusting cylinder threadedly connected to the end cap, wherein the adjusting cylinder has a sliding chamber for accommodating the top rod.

[0012] A further feature of this invention is that a clamping block is formed in the middle of the top rod, and a spring is provided between the clamping block and the adjusting cylinder.

[0013] A further feature of this invention is that a limiting block is provided between the pressing block and the second friction plate, and the limiting block restricts the displacement of the pressing block toward the rotating rod.

[0014] By adopting the above technical solution, and by setting a sliding chamber and a limiting block, the excessive compression of the rotating rod by the push rod is avoided, which would cause damage to the push rod and the rotating rod, thereby increasing the service life of the damping components.

[0015] A further feature of this invention is that the support includes a vertical column installed inside the outer casing and a crossbeam installed on the column. One end of the crossbeam is fixedly connected to the wire mesh, and the other end is hinged to the column. One end of the elastic element is placed on the crossbeam, and the other end is placed on the column.

[0016] A further feature of this invention is that a partition is fixedly disposed inside the outer sleeve, and an extension portion extending toward the wire mesh is disposed at one end of the partition away from the support. A shaft clamp is disposed on the extension portion, and the shaft clamp locks the wire mesh directly above the film-forming substrate.

[0017] A further feature of this invention is that an XYZ fine-tuning platform is provided below the film-forming substrate. The XYZ fine-tuning platform includes an X-axis adjustment component, a Y-axis adjustment component, and a Z-axis adjustment component. The X-axis adjustment component includes a first support, an X-axis adjustment bolt located on the first support, and a first slide block abutting below the film-forming substrate. The first slide block is threadedly connected to the X-axis adjustment bolt. The Y-axis adjustment component includes a second support, a Y-axis adjustment bolt located on the second support, and a second slide block abutting below the first support. The second slide block is threadedly connected to the Y-axis adjustment bolt. The Z-axis adjustment component includes a first support arm and a second support arm abutting below the second support, and a Z-axis adjustment knob driven by a lead screw of the first support arm. The first support arm and the second support arm are hinged to each other. The Z-axis adjustment knob allows the first support arm to have a displacement path that moves closer to or further away from the second support arm.

[0018] A further feature of this invention is that the outer shell includes an upper shell and a lower shell, the partition is located between the upper shell and the lower shell, the upper shell and the partition together define an operating cavity for accommodating the wire mesh and the film-forming substrate, and the lower shell and the partition together define a control cavity for accommodating the electrostatic generator.

[0019] By adopting the above technical solution, different areas are divided in space according to the different functions of the screen, film-forming substrate and electrostatic generator, resulting in a reasonable layout that facilitates inspection and maintenance.

[0020] In summary, this utility model has the following beneficial effects: The support frame incorporates an elastic element that allows the wire mesh to flip upwards and detach from the film-forming substrate, exposing the substrate. This eliminates the need to remove the wire mesh before cleaning the gap between it and the substrate, saving operational steps, reducing production preparation time, and making cleaning more convenient. A damping element is installed at the hinge end between the support frame and the wire mesh, ensuring a slow, smooth, and controlled upward flip of the wire mesh. This prevents the wire mesh from springing upwards at high speed and violently, which could damage equipment or endanger operators, thus ensuring operational safety. Attached Figure Description

[0021] Figure 1 This is a perspective view of the present invention.

[0022] Figure 2 This is a cross-sectional view of the present invention.

[0023] Figure 3 This is a schematic diagram of the present invention with the upper shell omitted.

[0024] Figure 4 This is a schematic diagram of the internal structure of the damping component of this utility model.

[0025] In the diagram: 1. Outer shell; 11. Upper shell; 111. Operating chamber; 12. Lower shell; 121. Control chamber; 2. Wire mesh; 3. Film-forming substrate; 4. Electrostatic generator; 5. Support; 50. Elastic element; 51. Column; 52. Crossbeam; 60. Outer sleeve; 61. Rotating rod; 62. First friction plate; 63. Second friction plate; 64. Top rod; 65. End cap; 66. Adjusting cylinder; 661. Sliding chamber; 67. Pressing block; 68. Spring; 6 9. Limiting block; 7. Partition plate; 71. Extension; 72. Shaft clamp; 81. X-axis adjustment assembly; 811. First support; 812. X-axis adjusting bolt; 813. First slide; 82. Y-axis adjustment assembly; 821. Second support; 822. Y-axis adjusting bolt; 823. Second slide; 83. Z-axis adjustment assembly; 831. First support arm; 832. Second support arm; 833. Z-axis adjusting knob; 91. Protrusion; 92. Limiting groove. Detailed Implementation

[0026] The present invention will be further described below with reference to the accompanying drawings.

[0027] A solid-state battery electrostatic film deposition machine with a flipping structure, such as Figure 1-4As shown, the device includes a housing 1, within which a wire mesh 2, a film-forming substrate 3 located below the wire mesh 2, and an electrostatic generator 4 electrically connected to either the wire mesh 2 or the film-forming substrate 3 are disposed. A support 5 is also disposed within the housing 1, and the wire mesh 2 is hinged to the support 5. An elastic element 50 is disposed on the support 5, which causes the wire mesh 2 to tend to move away from the film-forming substrate 3. A damping element is disposed at the hinge end of the support 5 and the wire mesh 2, and the direction of the force exerted by the damping element is opposite to the flipping direction of the wire mesh 2. By providing the elastic element 50, the wire mesh 2 can be flipped upwards to detach from the film-forming substrate 3, exposing the substrate 3. This allows for cleaning of the gap between the wire mesh 2 and the substrate without removing the wire mesh 2, saving operational steps, reducing production preparation time, and making cleaning more convenient. The damping element ensures that the wire mesh 2 flips upwards slowly, smoothly, and in a controlled manner, preventing the wire mesh 2 from bouncing upwards at high speed and violently, which could damage equipment or endanger operators, thus ensuring operational safety.

[0028] Preferably, the damping component includes an outer sleeve 60, and a rotating rod 61, a first friction plate 62, a second friction plate 63, and a push rod 64 located within the outer sleeve 60. The push rod 64 is coaxially arranged with the rotating rod 61. The first friction plate 62 is disposed on the rotating rod 61, and the second friction plate 63 is disposed on the push rod 64, with the second friction plate 63 abutting against the first friction plate 62. The rotating rod 61 is rotatably connected to the hinge shaft of the wire mesh 2 via a coupling (not shown in the figure). The first friction plate 62 on the rotating rod 61 and the second friction plate 63 on the push rod 64 abut against each other. When the hinge shaft rotates, it drives the first friction plate 62 to rotate on the second friction plate 63, thereby generating a large frictional force to complete the damping function.

[0029] Preferably, an adjustment mechanism is provided inside the outer sleeve 60. Operating the adjustment mechanism allows the push rod 64 to have a displacement path that moves closer to or further away from the rotating rod 61. By controlling the distance between the push rod 64 and the rotating rod 61 through the adjustment mechanism, the frictional force of the first friction plate 62 on the second friction plate 63 is reduced or increased, thereby achieving the effect of adjusting the damping force.

[0030] Preferably, the adjusting mechanism includes an end cap 65 fixedly mounted on the outer sleeve 60, and an adjusting cylinder 66 threadedly connected to the end cap 65. The adjusting cylinder 66 has a sliding chamber 661 for accommodating the push rod 64. The end of the adjusting cylinder 66 away from the push rod 64 has an internal hexagonal groove. An internal hexagonal wrench can be used to move the adjusting cylinder 66 on the end cap 65, thereby controlling the distance between the push rod 64 and the rotating rod 61, and achieving the effect of adjusting the damping force.

[0031] Preferably, a clamping block 67 is formed in the middle of the top rod 64, and a spring 68 is provided between the clamping block 67 and the adjusting cylinder 66. When the adjusting cylinder 66 moves toward the clamping block 67 on the end cover 65, the adjusting cylinder 66 pushes the spring 68, and the spring 68 pushes the clamping block 67 toward the rotating rod 61, thereby driving the top rod 64 to move toward the rotating rod 61, increasing the clamping force between the top rod 64 and the rotating rod 61, and thus increasing the damping force. When the adjusting cylinder 66 moves away from the clamping block 67 on the end cover 65, the clamping force between the top rod 64 and the rotating rod 61 decreases, thereby decreasing the damping force.

[0032] Preferably, a limiting block 69 is provided between the clamping block 67 and the second friction plate 63, and the limiting block 69 restricts the displacement of the clamping block 67 toward the rotating rod 61. The limiting block 69 protrudes into the outer sleeve 60. When the adjusting cylinder 66 moves toward the clamping block 67 on the end cover 65, the adjusting cylinder 66 pushes the spring 68, and the spring 68 pushes the clamping block 67 toward the rotating rod 61 until it abuts against the limiting block 69. At this time, when the adjusting cylinder 66 moves toward the clamping block 67 again, the spring 68 contracts under the compression of the adjusting cylinder 66 and the clamping block 67, and the push rod 64 slides in the sliding chamber 661 until it abuts against the bottom wall of the sliding chamber 661. At this time, it is impossible to push the push rod 64 forward. By setting the sliding chamber 661 and the limiting block 69, the excessive compression of the rotating rod 61 by the push rod 64 is avoided, thereby preventing damage to the push rod 64 and the rotating rod 61, and increasing the service life of the damping component.

[0033] Preferably, the support 5 includes a vertical column 51 disposed within the outer casing 1 and a crossbeam 52 disposed on the column 51. One end of the crossbeam 52 is fixedly connected to the wire mesh 2, and the other end is hinged to the column 51. One end of the elastic element 50 is placed on the crossbeam 52, and the other end is placed on the column 51. The wire mesh 2 is clamped and fixed to the crossbeam 52 by a screw passing through the crossbeam 52. One end of the elastic element 50 on the crossbeam 52 and the wire mesh 2 are respectively disposed at both ends of the hinge shaft. One end of the elastic element 50 on the column 51 is disposed near the bottom of the column 51, so that the elastic element 50 is in a stretched state, and the wire mesh 2 can be flipped upward under the elastic force of the elastic element 50.

[0034] Preferably, a partition 7 is fixedly provided inside the outer sleeve 60. The end of the partition 7 away from the support 5 is provided with an extension 71 extending toward the wire mesh 2. A shaft clamp 72 is provided on the extension 71, and the shaft clamp 72 locks the wire mesh 2 directly above the film-forming substrate 3. The column 51 of the support 5 is fixedly mounted on the partition 7. The shaft clamp 72 is preferably a clamp shell elastic coupling, which uses two axially split clamp shells to clamp the two shafts together with bolts. This is existing technology and will not be described in detail here. When the wire mesh 2 is in working condition, the shaft clamp 72 clamps the wire mesh 2 to prevent the wire mesh 2 from bouncing under the force of the elastic element 50, so that the wire mesh 2 is directly above the film-forming substrate 3, ensuring the completion of the normal electrostatic film-forming function. When it is necessary to clean the gap space between the wire mesh 2 and the film-forming substrate 3, the shaft clamp 72 is released, and the wire mesh 2 is flipped up normally under the force of the elastic element 50, so that the gap space can be cleaned. The structure is simple and easy to operate.

[0035] Preferably, an XYZ fine-tuning platform is disposed below the film-forming substrate 3. The XYZ fine-tuning platform includes an X-axis adjustment component 81, a Y-axis adjustment component 82, and a Z-axis adjustment component 83. The X-axis adjustment component 81 includes a first support 811, an X-axis adjustment bolt 812 located on the first support 811, and a first slide block 813 abutting against the underside of the film-forming substrate 3. The first slide block 813 is threadedly connected to the X-axis adjustment bolt 812. The Y-axis adjustment component 82 includes a second support 821 and a Y-axis adjustment bolt 82 located on the second support 821. 2. And a second slide 823 abutting below the first support 811, the second slide 823 being threadedly connected to the Y-axis adjusting bolt 822, the Z-axis adjusting assembly 83 including a first support arm 831 and a second support arm 832 abutting below the second support 821, and a Z-axis adjusting knob 833 driven by a lead screw of the first support arm 831, the first support arm 831 and the second support arm 832 being hinged to each other, the Z-axis adjusting knob 833 causing the first support arm 831 to have a displacement path that moves closer to or further away from the second support arm 832.

[0036] Preferably, the outer casing 1 includes an upper casing 11 and a lower casing 12, with a partition 7 located between the upper casing 11 and the lower casing 12. The upper casing 11 and the partition 7 together define an operating cavity 111 for accommodating the wire mesh 2 and the film-forming substrate 3, and the lower casing 12 and the partition 7 together define a control cavity 121 for accommodating the electrostatic generator 4. The partition 7 is fixedly connected to the upper casing 11 and the lower casing 12 respectively, and spatially divides different areas according to the different functions of the wire mesh 2, the film-forming substrate 3, and the electrostatic generator 4, resulting in a reasonable layout that facilitates inspection and maintenance.

[0037] Preferably, the push rod 64 has a protrusion 91 formed on it, which extends radially along the push rod 64. The outer sleeve 60 has a limiting groove 92 for accommodating the protrusion 91. The size of the limiting groove 92 is adapted to the size of the protrusion 91. By setting the protrusion 91 and the limiting groove 92, the push rod 64 is prevented from rotating, thus preventing the push rod 64 from rotating under the drive of the rotating rod 61, which would reduce or cause the damping force to fail, and ensuring the damping effect.

[0038] The above description is only a preferred embodiment of the present utility model. Therefore, all equivalent changes or modifications made to the structure, features and principles described in the claims of the present utility model patent application are included in the scope of the present utility model patent application.

Claims

1. A solid-state battery electrostatic film deposition machine with a flip structure, comprising a housing (1), wherein a wire mesh (2), a film deposition substrate (3) located below the wire mesh (2), and an electrostatic generator (4) electrically connected to the wire mesh (2) or the film deposition substrate (3) are disposed inside the housing (1), characterized in that: The outer casing (1) is also provided with a support (5), the wire mesh (2) is hinged to the support (5), the support (5) is provided with an elastic element (50), the elastic element (50) causes the wire mesh (2) to tend to move away from the film-forming substrate (3), and a damping element is provided at the hinge end of the support (5) and the wire mesh (2), the direction of the force of the damping element is opposite to the flipping direction of the wire mesh (2).

2. The solid-state battery electrostatic film forming machine with a flipping structure according to claim 1, characterized in that: The damping component includes an outer sleeve (60), and a rotating rod (61), a first friction plate (62), a second friction plate (63), and a push rod (64) located inside the outer sleeve (60). The push rod (64) is coaxially arranged with the rotating rod (61). The first friction plate (62) is disposed on the rotating rod (61), and the second friction plate (63) is disposed on the push rod (64). The second friction plate (63) abuts against the first friction plate (62).

3. The solid-state battery electrostatic film forming machine with a flipping structure according to claim 2, characterized in that: An adjustment mechanism is provided inside the outer tube (60), and the adjustment mechanism is operated to make the top rod (64) have a displacement path that is closer to or farther away from the rotating rod (61).

4. The solid-state battery electrostatic film forming machine with a flipping structure according to claim 3, characterized in that: The adjustment mechanism includes an end cap (65) fixedly mounted on the outer sleeve (60) and an adjustment cylinder (66) threadedly connected to the end cap (65). The adjustment cylinder (66) has a sliding chamber (661) for accommodating the top rod (64).

5. A solid-state battery electrostatic film forming machine with a flipping structure according to claim 4, characterized in that: A clamping block (67) is formed in the middle of the top rod (64), and a spring (68) is provided between the clamping block (67) and the adjusting cylinder (66).

6. The solid-state battery electrostatic film forming machine with a flipping structure according to claim 5, characterized in that: A limiting block (69) is provided between the clamping block (67) and the second friction plate (63), and the limiting block (69) restricts the clamping block (67) from moving toward the rotating rod (61).

7. The solid-state battery electrostatic film forming machine with a flipping structure according to claim 1, characterized in that: The bracket (5) includes a vertical column (51) installed inside the outer shell (1) and a crossbeam (52) installed on the column (51). One end of the crossbeam (52) is fixedly connected to the wire mesh (2), and the other end is hinged to the column (51). One end of the elastic element (50) is placed on the crossbeam (52), and the other end is placed on the column (51).

8. A solid-state battery electrostatic film forming machine with a flipping structure according to claim 2, characterized in that: A partition (7) is fixedly provided inside the outer tube (60). An extension (71) extending toward the wire mesh (2) is provided at one end of the partition (7) away from the support (5). A shaft clamp (72) is provided on the extension (71) to lock the wire mesh (2) directly above the film-forming substrate (3).

9. A solid-state battery electrostatic film forming machine with a flipping structure according to claim 1, characterized in that: An XYZ fine-tuning platform is provided below the film-forming substrate (3). The XYZ fine-tuning platform includes an X-axis adjustment component (81), a Y-axis adjustment component (82), and a Z-axis adjustment component (83). The X-axis adjustment component (81) includes a first support (811), an X-axis adjustment bolt (812) located on the first support (811), and a first slide (813) abutting against the bottom of the film-forming substrate (3). The first slide (813) is threadedly connected to the X-axis adjustment bolt (812). The Y-axis adjustment component (82) includes a second support (821) and a Y-axis adjustment bolt (822) located on the second support (821). The Z-axis adjustment assembly (83) includes a first support arm (831) and a second support arm (832) abutting below the first support (811), the second slide (823) being threadedly connected to the Y-axis adjusting bolt (822), the Z-axis adjusting assembly (83) including a first support arm (831) and a second support arm (832) abutting below the second support (821), and a Z-axis adjusting knob (833) driven by a lead screw of the first support arm (831), the first support arm (831) and the second support arm (832) being hinged to each other, and the Z-axis adjusting knob (833) allowing the first support arm (831) to have a displacement path closer to or further away from the second support arm (832).

10. A solid-state battery electrostatic film forming machine with a flipping structure according to claim 8, characterized in that: The outer shell (1) includes an upper shell (11) and a lower shell (12). The partition (7) is located between the upper shell (11) and the lower shell (12). The upper shell (11) and the partition (7) together define an operating cavity (111) for accommodating the wire mesh (2) and the film-forming substrate (3). The lower shell (12) and the partition (7) together define a control cavity (121) for accommodating the electrostatic generator (4).

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