A dust removal device for a polycrystalline silicon power distribution cabinet
Patent Information
- Application Number
- CN202521535095.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-07-22
- Publication Date
- 2026-09-15
- Estimated Expiration
- 2035-07-22
AI Technical Summary
1.本实用新型通过设置具有吸附斜面的导流板,利用静电发生组件提供给吸附斜面的导电层静电吸附力,从而对低压抽屉柜垂直母线室内的细小灰尘颗粒进行吸附,再配合清理组件对细小灰尘颗粒进行喷吹,利用导流板上的导流孔使细小灰尘颗粒落入下方的集尘组件进行收集存储,实现了对多晶硅行业的配电系统中的超细、低阻、易板结的粉尘进行高效清理,解决了现有技术中低压抽屉柜垂直母线室防尘设计主要基于物理隔离与被动导流技术,处理多晶硅行业特有的超细、低阻、易板结的粉尘时效果不佳,容易导致配电系统积尘,短路影响多晶硅的正常生产,增加安全风险的问题。
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Figure CN224759817U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the technical field of polysilicon production equipment, specifically to a dust removal device for a polysilicon distribution cabinet. Background Technology
[0002] Polysilicon post-processing refers to the further processing of polysilicon during production. This mainly includes silicon material crushing, silicon core preparation, mechanical crushing, silicon core furnace pulling, and single crystal furnace pulling. Various equipment in the polysilicon post-processing process also require electrical control cabinets. For example... Figure 1 As shown, in a distribution cabinet, the vertical busbar is generally located at the rear center or side of the cabinet, connecting functional units and the main busbar, and is an important component for current distribution. Vertical busbars typically use rectangular or L-shaped copper busbars, which have good conductivity and mechanical strength.
[0003] In the vertical busbar compartment of the low-voltage drawer cabinet in polysilicon production distribution cabinets, existing dustproof designs include baffle structures, sealing baffles, and typical patented technologies, such as the Chinese utility model patent: A dust removal and phase-to-phase short-circuit prevention device for the bottom of the vertical busbar compartment of a low-voltage drawer cabinet (CN202121801950.6). However, these existing technical solutions are mainly based on physical isolation and passive flow guidance technology, which are not very effective in dealing with the ultrafine, low-resistivity, and easily agglomerated dust unique to the polysilicon industry. This can easily lead to dust accumulation in the distribution cabinet, short circuits, and disruption of the normal polysilicon production process. In the actual working conditions of the polysilicon post-processing workshop, the engineering problems caused by silicon powder deposition in the power distribution system are mainly manifested as follows: 1. Electrical safety risks: The resistivity of silicon powder is ρ=500-800 Ω·m, which can easily cause dielectric breakdown when it accumulates between phase busbars (breakdown field strength Eb<1 kV / mm); 2. Production and economic losses: The average monthly downtime for cleaning a single piece of equipment is ≥8 hours, which translates to a production capacity loss of about 10,000 yuan / unit·month; 3. Occupational safety hazards: Manual cleaning operations pose a risk of electric shock (contact voltage U≥36 V) and dust explosion hazards (minimum ignition energy Emin=15mJ, lower explosive limit LFL=150 g / m³). Utility Model Content
[0004] This utility model addresses the problem that existing dustproof designs for low-voltage drawer cabinet vertical busbar compartments, which primarily rely on physical isolation and passive flow diversion technology, are ineffective in handling the ultrafine, low-resistivity, and easily agglomerated dust unique to the polysilicon industry. This leads to dust accumulation in the power distribution system, short circuits affecting normal polysilicon production, and increased safety risks. The invention provides a polysilicon distribution cabinet dust removal device that effectively reduces dust accumulation in the vertical busbar compartment of low-voltage drawer cabinets during polysilicon production and provides real-time monitoring and cleaning.
[0005] The technical solution adopted in this utility model is: A dust removal device for a polycrystalline silicon power distribution cabinet, comprising: A flow guide plate is installed at the bottom of the vertical copper busbar in the vertical busbar compartment of the low-voltage drawer cabinet; an adsorption slope is provided on the side of the flow guide plate near the bottom of the vertical copper busbar; and several flow guide holes penetrating both sides are provided on the flow guide plate. A cleaning component is disposed on one side of the guide plate; the cleaning component has at least one spray nozzle; the spray nozzle is disposed facing the middle of the adsorption slope; The dust collection assembly is located at the bottom of the vertical busbar chamber of the low-pressure drawer cabinet and below the baffle plate. The guide plate has a conductive layer on its adsorption slope, and the conductive layer is electrically connected to an electrostatic generating component. The adsorption slope is provided with a plurality of snap-fit components; the spacing between the snap-fit components is adapted to the spacing between the vertical copper busbars; and the snap-fit components are provided with snap-fit grooves that can snap the vertical copper busbars; the snap-fit components are provided with ventilation openings that penetrate both sides; The cleaning assembly also includes at least an air pump; the air pump is disposed on the side of the guide plate; the air pump and the spray nozzle are connected by a spray air duct.
[0006] Furthermore, a powder-repellent coating is provided on the adsorption slope, which comprises a coating formed by first pre-treating the adsorption slope with sandblasting and then spraying PTFE.
[0007] Furthermore, the conductive layer includes a serpentine copper foil electrode etched on the powder-repellent coating.
[0008] Furthermore, an insulating layer is provided between the flow guide plate and the cleaning assembly.
[0009] Furthermore, a fan-shaped nozzle is provided inside the spray nozzle; the angle of the fan-shaped nozzle is inclined downward.
[0010] Furthermore, the dust collection assembly has at least a dust collection box; the dust collection box has an opening at the top and is provided with a filter screen.
[0011] Furthermore, it also includes: The monitoring component includes at least a laser dust sensor. The laser dust sensor is located at the upper part of the vertical busbar chamber of the low-voltage drawer cabinet. The laser dust sensor can trigger the cleaning component to operate based on the detected dust concentration in the vertical busbar chamber of the low-voltage drawer cabinet.
[0012] The beneficial effects of this utility model are: 1. This utility model utilizes a guide plate with an adsorption slope to provide electrostatic adsorption force to the conductive layer of the adsorption slope through an electrostatic generator, thereby adsorbing fine dust particles in the vertical busbar chamber of a low-voltage drawer cabinet. A cleaning component then blows these fine dust particles away, and the guide holes on the guide plate allow them to fall into a dust collection component below for collection and storage. This achieves efficient cleaning of ultrafine, low-resistivity, and easily agglomerated dust in the power distribution system of the polysilicon industry. It solves the problem that existing dustproof designs for the vertical busbar chamber of low-voltage drawer cabinets, which are mainly based on physical isolation and passive flow guidance technology, are ineffective in handling the ultrafine, low-resistivity, and easily agglomerated dust unique to the polysilicon industry. This often leads to dust accumulation in the power distribution system, short circuits affecting normal polysilicon production, and increased safety risks. Attached Figure Description
[0013] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0014] Figure 1 A three-dimensional schematic diagram of a low-pressure drawer cabinet based on existing technology; Figure 2 This is a perspective view of the dust removal device according to an embodiment of the present utility model; Figure 3 This is a top view of the dust removal device according to an embodiment of the present utility model; Figure 4 This is a side view of the dust removal device according to an embodiment of the present utility model.
[0015] Reference numerals: 100-guide plate, 110-adsorption slope, 120-guide hole, 130-clamping piece, 132-vent, 134-slot, 140-insulating layer; 200 - Cleaning component, 210 - Air pump, 220 - Nozzle; 300 - Dust collection assembly, 310 - Dust collection box, 320 - Filter; 400-Static Electrostatic Generator Component. Detailed Implementation
[0016] In the description of this utility model, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc., indicating the orientation or positional relationship are based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this utility model and simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model.
[0017] The following disclosure provides many different embodiments or examples for implementing various structures of this invention. To simplify the disclosure, specific examples of components and arrangements are described below. Of course, these are merely examples and are not intended to limit the scope of this invention.
[0018] The embodiments of the utility model will now be described in detail with reference to the accompanying drawings.
[0019] Example 1
[0020] Through analysis and research of existing technologies, the applicant found that the dustproof design of the vertical busbar compartment of traditional low-voltage drawer cabinets is mainly based on physical isolation and passive flow diversion technology. However, when dealing with the ultrafine, low-resistivity, and easily caking dust unique to the polysilicon industry, the following technical bottlenecks exist: 1. Insufficient interception efficiency: The traditional flow diversion structure has a significantly reduced efficiency in handling ultrafine particles, causing silicon powder to accumulate in the busbar area after penetrating the protection system; 2. Excessive operation and maintenance costs: The frequency of manual dust cleaning operations needs to be maintained at a high level of once a week, which seriously affects the continuity of equipment operation; 3. Lack of condition monitoring: There is a lack of a real-time dust concentration monitoring mechanism, making it difficult to provide timely warnings of insulation failure risks and posing a sudden short circuit hazard.
[0021] Furthermore, we continue to analyze the reasons for the poor treatment effect of existing technologies. First, the technical principle of the baffle structure is to set a 30°-45° inclined baffle at the bottom of the busbar chamber, using the principle of gravity settling to achieve directional migration of dust to the dust collection area. The fundamental technical defect is that, in actual operation, the treatment efficiency for dust particles <0.5 mm is only 38%-42%; silicon powder is prone to secondary deposition on the surface of the baffle due to the surface electrostatic adsorption effect (contact angle ≤15°). Next, the technical principle of the sealing baffle structure is to use a silicone rubber baffle with an elastic modulus of 0.5-1.2 MPa to seal the gaps along the lower edge of the busbar, establishing a physical isolation barrier. The fundamental technical defect is that silicon powder with a particle size distribution D50 of less than 0.2 mm can still penetrate through the baffle joints; and the material undergoes creep under long-term stress deformation, resulting in a seal failure time of <2000 h, indicating insufficient durability. While the technical solution of the typical patent CN202121801950.6 integrates the synergistic effect of the guide plate and the sealing baffle, it still has limitations in the guide plate material in the polysilicon industrial scenario: the surface roughness Ra of the epoxy resin substrate is 3.2 μm, resulting in a silicon powder surface adhesion rate as high as 65% (contact angle measurement value); the static installation method results in a guide plate tilt angle θ=35°±2°, which cannot achieve dynamic adaptation for dust particle size d∈[0.1,1] mm. Furthermore, the manual intervention mode with a dust removal cycle T≤24 h does not meet the requirements of industrial automation; the time for removing caking material shows a nonlinear increase of τ≥3Δt compared with the initial state.
[0022] To address the aforementioned problems in the existing technology, and based on our research and analysis of the causes of these problems, this embodiment provides a dust removal device for polycrystalline silicon distribution cabinets. This device is used to prevent short circuits caused by dust accumulation in the vertical busbar compartment of the low-voltage drawer cabinet during polycrystalline silicon production. This dust removal device effectively reduces the accumulation of silicon powder-containing dust in the vertical busbar compartment of the low-voltage drawer cabinet during polycrystalline silicon production and monitors and cleans the dust in real time. Please refer to... Figures 2-4 The dust removal device for the polycrystalline silicon distribution cabinet mainly includes: a guide plate 100, a cleaning component 200, and a dust collection component 300.
[0023] The guide plate 100 is installed at the bottom of the vertical copper busbar in the vertical busbar compartment of the low-voltage drawer cabinet. Its main purpose is to guide and collect dust entering the vertical busbar compartment, preventing dust from accumulating and hardening within the compartment, which could cause power distribution system malfunctions. Figure 2 , Figure 3As shown, the guide plate 100 has an adsorption slope 110 on one side connected to the bottom of the vertical copper busbar. A conductive layer is provided on the adsorption slope 110 to conduct static electricity, thus adsorbing fine dust particles. The other side of the guide plate 100 is flat. Furthermore, the guide plate 100 has several guide holes 120 penetrating both sides. Fine dust particles adsorbed on the adsorption slope 110 can slide along the slope 110 into the guide holes 120, then pass through the guide holes 120 and fall into the dust collection assembly 300 below for collection.
[0024] The cleaning component 200 is used to blow away the dust adsorbed on the guide plate 100, assisting the dust particles to fall into the dust collection component 300 below through the guide holes 120 for collection. The cleaning component 200 is installed on the guide plate 100 and mainly includes an air pump 210, several blowing nozzles 220, and a blowing air duct. The air pump 210 is installed on the side of the guide plate 100; the several blowing nozzles 220 are installed on the adsorption slope 110, and are located on one side of the adsorption slope 110 near the edge, with all the blowing nozzles 220 facing the middle of the adsorption slope 110; the blowing air duct (not shown in the figure) is installed between the air inlet of the several blowing nozzles 220 and the air outlet of the air pump 210, and is used to transmit compressed gas for blowing. When the cleaning component 200 is turned on, because it is located near the edge on one side of the adsorption slope 110, it can drive fine dust particles to move to the other side and move downward along the adsorption slope 110 at the same time, so that as many fine dust particles as possible fall into the several guide holes 120, reducing the fine dust particles remaining on the surface of the adsorption slope 110. In particular, by providing lateral driving force, it reduces the fine dust particles remaining between adjacent guide holes 120 at the same height on the guide plate 100.
[0025] The dust collection assembly 300 is used to collect dust falling from the guide hole 120 for centralized recycling and reuse. In this embodiment, the dust collection assembly 300 mainly includes a dust collection box 310, which is roughly rectangular in shape and located at the bottom of the vertical busbar chamber of the low-voltage drawer cabinet, below the guide plate 100. The internal chamber of the dust collection box 310 is used to store fine dust particles. The dust collection box 310 has an opening at the top and is equipped with a filter screen 320. The filter screen 320 is used to separate larger particles. The filter screen 320 needs to be regularly maintained and cleaned to reduce the risk of accumulation.
[0026] Furthermore, an electrostatic generator 400 is provided on one side of the dust collection assembly 300. In this embodiment, the electrostatic generator 400 is a low-voltage electrostatic generator, which can be installed inside the vertical busbar compartment of the low-voltage drawer cabinet. When the space inside the vertical busbar compartment is limited, the electrostatic generator 400 can also be installed outside the vertical busbar compartment. The electrostatic generator 400 is electrically connected to the conductive layer on the adsorption slope 110 of the guide plate 100. When the electrostatic generator 400 is activated, it can make the conductive layer on the adsorption slope 110 statically charged, thereby adsorbing fine dust particles.
[0027] One specific working method of this embodiment is as follows: First, the dust removal device for the polycrystalline silicon distribution cabinet of this embodiment is installed at the bottom of the vertical busbar chamber of the low-voltage drawer cabinet, and the guide plate 100 is connected to the bottom of the vertical copper busbar. Next, the electrostatic generator 400 is activated so that the adsorption slope 110 of the guide plate 100 can adsorb the fine dust particles in the vertical busbar chamber. After that, the cleaning component 200 is activated every 2 hours, and each time it blows for 5 minutes, so that the fine dust particles adsorbed on the adsorption slope 110 fall into the dust collection box 310 below through the guide hole 120 for collection and storage. Preferably, the power of the electrostatic generator 400 can be reduced simultaneously during the blowing to reduce the adsorption force on the fine dust particles, so that they can slide into the guide hole 120.
[0028] In this embodiment, the polycrystalline silicon distribution cabinet dust removal device uses a guide plate 100 with an adsorption slope 110 to provide electrostatic adsorption force to the conductive layer of the adsorption slope 110 through an electrostatic generator 400. This adsorbs fine dust particles in the vertical busbar chamber of the low-voltage drawer cabinet. The cleaning component 200 then blows the fine dust particles away, and the guide holes 120 on the guide plate 100 allow the fine dust particles to fall into the dust collection box 310 below for collection and storage. This achieves efficient cleaning of ultrafine, low-resistivity, and easily caking dust in the power distribution system of the polycrystalline silicon industry. It solves the problem that the existing dust prevention design of the vertical busbar chamber of the low-voltage drawer cabinet is mainly based on physical isolation and passive flow guidance technology, which is not effective in dealing with the ultrafine, low-resistivity, and easily caking dust unique to the polycrystalline silicon industry. This can easily lead to dust accumulation in the power distribution system, short circuits affecting the normal production of polycrystalline silicon, and increased safety risks.
[0029] Furthermore, in this embodiment, the inclination angle of the adsorption slope 110 of the guide plate 100 is 30°~45°, and a powder-repellent coating is provided on the adsorption slope 110. The powder-repellent coating is formed by first pre-treating the adsorption slope 110 with sandblasting (Sa2.5 grade) to achieve a surface roughness Ra=6.3μm to enhance the adhesion of the coating; then a 0.2mm thick PTFE (polytetrafluoroethylene) layer (friction coefficient <0.1) is sprayed on, the coating has a wear resistance >5000 cycles of steel wool friction (load 500g), and a surface contact angle >110°. In addition, in this embodiment, the conductive layer on the adsorption slope 110 is a serpentine copper foil electrode etched on the powder-repellent coating, with a line width of 2mm and a spacing of 5mm.
[0030] Furthermore, in this embodiment, the adsorption slope 110 of the guide plate 100 is also provided with a plurality of snap-fit members 130. The snap-fit members 130 are generally strip-shaped, and the spacing between the snap-fit members 130 is adapted to the spacing between the vertical copper busbars. The snap-fit members 130 are provided with slots 134, and the snap-fit members 130 are snapped into the bottom of the vertical copper busbar through the slots 134, thereby detachably installing the guide plate 100 at the bottom of the vertical copper busbar, which is convenient for installation and removal. At the same time, the snap-fit members 130 are provided with ventilation openings 132 that penetrate through both sides. By providing ventilation openings 132, it is easy to clean the fine dust particles adsorbed on the entire adsorption slope 110 of the guide plate 100 by the spray nozzle 220 of the component 200.
[0031] Furthermore, in this embodiment, both the adsorption slope 110 of the guide plate 100 and the side surface on which the air pump 210 is installed are covered with an insulating layer 140. The insulating layer 140 is disposed between the guide plate 100 and the cleaning component 200, so as to avoid the static electricity on the surface of the guide plate 100 from interfering with the normal operation of the cleaning component 200.
[0032] Furthermore, in the cleaning component 200 of this embodiment, the air pump 210 adopts a miniature oil-free silent pump to deliver airflow with a pressure of 0.3MPa; the blowing air duct uses PVC pipe; and the blowing port 220 is provided with a stainless steel fan-shaped nozzle (the angle in this embodiment is 60°, preferably 50~70°), which is tilted downward to increase the coverage of the blowing.
[0033] Preferably, the polycrystalline silicon distribution cabinet dust removal device in this embodiment further includes a monitoring component, which mainly includes a laser dust sensor. The laser dust sensor is installed in the upper part of the vertical busbar compartment of the low-voltage drawer cabinet. The detection accuracy of the laser dust sensor is ±10%, and the response time is <1 second. When the dust concentration is >200mg / m³, the signal from the laser dust sensor can trigger the cleaning component 200 to start the air pump 210, which cleans the dust through the nozzle 220; when the dust concentration is >500mg / m³, the laser dust sensor can also send an alarm signal. Furthermore, the laser dust sensor is linked to the host computer system via the Modbus RTU protocol, supporting wireless data transmission.
[0034] The foregoing has shown and described the basic principles, main features, and advantages of this utility model. Those skilled in the art should understand that this utility model is not limited to the above embodiments. The embodiments and descriptions in the specification are merely preferred examples and are not intended to limit the utility model. Various changes and modifications can be made to this utility model without departing from its spirit and scope, and all such changes and modifications fall within the scope of the claimed utility model. The scope of protection of this utility model is defined by the appended claims and their equivalents.
Claims
1. A dust removal device for a polycrystalline silicon power distribution cabinet, characterized in that, Include: A flow guide plate (100) is installed at the bottom of the vertical copper busbar in the vertical busbar chamber of the low-voltage drawer cabinet; an adsorption slope (110) is provided on the side of the flow guide plate (100) near the bottom of the vertical copper busbar; and a plurality of flow guide holes (120) penetrating both sides are provided on the flow guide plate (100). A cleaning assembly (200) is disposed on one side of the guide plate (100); the cleaning assembly (200) has at least one nozzle (220); the nozzle (220) is disposed facing the center of the adsorption slope (110); The dust collection assembly (300) is located at the bottom of the vertical busbar chamber of the low-pressure drawer cabinet and below the baffle plate (100); The guide plate (100) has a conductive layer on its adsorption slope (110), and the conductive layer is electrically connected to an electrostatic generating component (400). The adsorption slope (110) is provided with a plurality of snap-fit pieces (130); the spacing between the snap-fit pieces (130) is adapted to the spacing between the vertical copper busbars; and the snap-fit pieces (130) are provided with snap-fit grooves (134) that can snap the vertical copper busbars; the snap-fit pieces (130) are provided with ventilation openings (132) that penetrate both sides. The cleaning assembly (200) also includes at least an air pump (210); the air pump (210) is disposed on the side of the guide plate (100); the air pump (210) and the nozzle (220) are connected by a blower duct.
2. The dust removal device for polycrystalline silicon distribution cabinets as described in claim 1, characterized in that, The adsorption slope (110) is provided with a powder-repellent coating, which is a coating formed by first pre-treating the adsorption slope (110) with sandblasting and then spraying PTFE.
3. The dust removal device for polycrystalline silicon distribution cabinets as described in claim 2, characterized in that, The conductive layer includes a serpentine copper foil electrode etched on the powder-repellent coating.
4. The dust removal device for polycrystalline silicon distribution cabinets as described in claim 1, characterized in that, An insulating layer (140) is provided between the flow guide plate (100) and the cleaning assembly (200).
5. The dust removal device for polycrystalline silicon distribution cabinets as described in claim 1, characterized in that, A fan-shaped nozzle is provided inside the blow nozzle (220); the angle of the fan-shaped nozzle is tilted downward.
6. The dust removal device for polycrystalline silicon distribution cabinets as described in claim 1, characterized in that, The dust collection assembly (300) has at least a dust collection box (310); the dust collection box (310) has an opening at the top and is provided with a filter screen (320).
7. The dust removal device for polycrystalline silicon distribution cabinets as described in any one of claims 1-6, characterized in that, Also includes: The monitoring component includes at least a laser dust sensor; the laser dust sensor is located at the upper part of the vertical busbar chamber of the low-voltage drawer cabinet, and the laser dust sensor can trigger the cleaning component (200) to work based on the detected dust concentration in the vertical busbar chamber of the low-voltage drawer cabinet.
Citation Information
Patent Citations
Bottom dedusting and interphase short circuit prevention device for vertical bus chamber of low-voltage drawer cabinet
CN215733116U