Single wafer vacuum transport system with lift function

Abstract

The utility model provides a single piece vacuum transmission system with lifting function, include: casing, have the chamber of forming controlled environment and the wall body of defining the chamber, the wall body is along first direction and is opened openable and closable opening, openable and closable opening is configured to selectively allow or block the fluid connection between controlled environment and uncontrolled environment, lifting device, including at least one block, with the drive end of preset stroke, and the adaptive isolation component of sealed connection in the wall body and cover the preset stroke path of drive end, wherein, drive end with adaptive isolation component is dynamic sealing medium and actuates the block and moves wafer from first height position to second height position, the utility model discloses lifting device to wafer lifting movement, avoid outside mechanical arm or artificial to stretch into the chamber too deep, even need not to enter the chamber, and then avoid the interference with casing and lead to wafer surface scratch.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor manufacturing equipment technology, and in particular to a single-chip vacuum transmission system with a lifting function. Background Technology

[0002] In semiconductor manufacturing, the precision of wafer transport and the cleanliness of the environment directly affect chip yield. As a key connecting device between wafer processing equipment (such as deposition, etching, and inspection equipment) and the vacuum chamber, the monolithic vacuum transport system needs to achieve stable wafer transport in a high-vacuum environment.

[0003] Existing single-wafer vacuum transfer systems mainly consist of a transfer track, a sealed housing, and a drive mechanism. Their core function focuses on the horizontal transfer of wafers within the housing. However, the wafer handling process relies on external robotic arms or manual intervention: after the wafer has been processed and transferred to the housing exit position, an external device must be inserted into the housing to grasp the wafer and then remove it for the next process. This robotic arm or manual handling method is prone to interference with the housing during wafer handling, leading to scratches on the wafer surface.

[0004] In view of this, it is necessary to propose a single-piece vacuum transmission system with lifting function to solve the above problems. Utility Model Content

[0005] The purpose of this invention is to provide a single-chip vacuum transfer system with a lifting function to solve the technical problem in existing single-chip vacuum transfer systems where interference between the external robotic arm or manual handling of wafers and the housing can easily occur, resulting in scratches on the wafer surface.

[0006] This utility model provides a single-chip vacuum transmission system with lifting function, comprising: The housing has a chamber forming a controlled environment and a wall defining the chamber, the wall having an openable and closable opening along a first direction, the openable and closable opening being configured to selectively allow or block fluid communication between the controlled environment and an uncontrolled environment. The lifting device includes at least one support block, a drive end with a preset stroke, and an adaptive isolation component that is sealed to the wall and covers the preset stroke path of the drive end. The drive unit uses the adaptive isolation component as a dynamic sealing medium to actuate the support block to move the wafer from a first height position to a second height position.

[0007] In one possible embodiment, when the openable / closable opening is closed, it blocks fluid communication between the controlled and uncontrolled environments, wherein the first height position is located within the controlled environment of the chamber; or, When the closable opening is in the open state, it allows fluid communication between the controlled environment and the uncontrolled environment, such that the controlled environment and the uncontrolled environment mix in the chamber to form a mixed environment and the first height position is in the mixed environment.

[0008] In one possible embodiment, the second height position is located within the cavity; or, The second height position is located outside the cavity.

[0009] In one possible embodiment, the adaptive isolation component is configured to adaptively deform with the movement of the drive end to dynamically maintain the environmental state within the cavity.

[0010] In one possible embodiment, the adaptive isolation component includes a flexible deformable body with a stretchable isolation space inside.

[0011] In one possible embodiment, the flexible deformable body has at least one open end, allowing the isolation space to communicate with the environment inside the cavity.

[0012] In one possible embodiment, the lifting device further includes a drive source that provides actuation force to the drive end and is located outside the range covered by a preset stroke.

[0013] In one possible embodiment, the lifting device further includes a support extending from the wall in a first direction to limit the travel of the drive end.

[0014] In one possible embodiment, the lifting device further includes a guide structure that constrains the movement path of the drive end, and is a separate structure from the drive end.

[0015] In one possible embodiment, the lifting device further includes a lifting seat that moves synchronously with the drive end, having at least one support portion and connected to the end of the adaptive isolation component away from the wall.

[0016] In one possible embodiment, the support block has a supporting surface facing the wafer, and the supporting surface forms a partial surface contact with the wafer.

[0017] In one possible embodiment, the support block has a slope extending from the edge of the support surface, the slope of which gradually decreases from the outer periphery of the support block toward the center.

[0018] In one possible embodiment, a linear drive mechanism is further included, disposed within the cavity, configured to support the wafer and move it along a second direction, the wafer's movement path in the second direction having a common movement position point with the wafer's movement path in the first direction, the linear drive mechanism and the lifting device being able to alternately support the wafer at the movement position point.

[0019] In one possible embodiment, the wall has an openable and closable conveying port along the second direction.

[0020] The beneficial effects of the single-piece vacuum transmission system with lifting function provided by this utility model are as follows: 1. Under the actuation of the drive end of the lifting device, the support block moves the wafer from the first height position to the second height position. By lifting and moving the wafer through the lifting device, it is possible to avoid external robotic arms or manual insertion into the cavity too deeply, or even to enter the cavity at all, thereby avoiding interference with the housing and causing scratches on the wafer surface.

[0021] 2. The adaptive isolation component can dynamically seal during the movement of the drive end to dynamically maintain the environmental state inside the cavity. Attached Figure Description

[0022] Figure 1 This is a schematic diagram of the single-piece vacuum transmission system with lifting function of this utility model when the opening is open.

[0023] Figure 2 This is a schematic diagram of the single-piece vacuum transmission system with lifting function of this utility model when the opening is closed.

[0024] Figure 3 This is a schematic diagram of the lifting device in the single-piece vacuum transmission system with lifting function of this utility model, shown in perspective of the housing.

[0025] Figure 4 This is a side view of the monolithic vacuum transmission system with lifting function of this utility model.

[0026] Figure 5 This is a schematic diagram of the lifting device in the single-piece vacuum transmission system with lifting function of this utility model.

[0027] Figure 6 This is a schematic diagram of the lifting seat in the single-piece vacuum transmission system with lifting function of this utility model.

[0028] Figure 7 This is a schematic diagram of the support block in the single-piece vacuum transmission system with lifting function of this utility model.

[0029] Figure 8This is a schematic diagram of the linear drive mechanism and housing in the monolithic vacuum transmission system with lifting function of this utility model.

[0030] Explanation of reference numerals in the attached drawings: 110, shell; 111, chamber; 112, wall; 1121, opening; 1122, conveying port; 120, lifting device; 121, support block; 1211, supporting surface; 1212, slope; 1213, limiting surface; 122, drive source; 123, adaptive isolation component; 1231, flexible deformable body; 12311, open end; 1232, sealing flange; 124, lifting seat; 1241, bearing part; 1242, main body; 125, support rod; 126, bracket; 127 1. First connecting part; 1262. Second connecting part; 127. Guide structure; 1271. First guide rail; 1272. Slider; 1273. Connecting seat; 130. Linear drive mechanism; 131. Finger; 132. Drive component; 133. Constraint structure; 1331. Second guide rail; 1332. Moving seat; 134. Transmission structure; 1341. Lead screw; 1342. Moving component; 1343. Connecting block; 140. Cover plate; 141. Observation window; 142. Hinge; 150. Telescopic component; 200. Wafer. Detailed Implementation

[0031] To make the objectives, technical solutions, and advantages of the embodiments of this utility model clearer, the technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this utility model, not all embodiments. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of this utility model.

[0032] To address the problems existing in the prior art, embodiments of this utility model provide a single-piece vacuum transmission system with a lifting function, see [link to relevant documentation]. Figure 1 and Figure 2 The monolithic vacuum transport system includes a housing 110 and a lifting device 120. The housing 110 has a chamber 111 forming a controlled environment and a wall 112 defining the chamber 111. The wall 112 has an openable and closable opening 1121 along a first direction, configured to selectively allow or block fluid communication between the controlled and uncontrolled environments. The lifting device 120 includes at least one support block 121, a drive end with a preset stroke, and an adaptive isolation component 123 sealed to the wall 112 and covering the preset stroke path of the drive end. The drive end actuates the support block 121 using the adaptive isolation component 123 as a dynamic sealing medium to move the wafer 200 from a first height position to a second height position. For example, the first direction is a vertical direction.

[0033] The support block 121 of the lifting device 120 supports the wafer 200. The drive end of the lifting device 120 actuates the support block 121 to move the wafer 200 from a first height position to a second height position. The first height position is located inside the chamber 111, and the second height position can be located inside or outside the chamber 111. In the first scenario, the wafer 200 can be lifted and moved from the first height position inside the chamber 111 to the second height position inside the chamber 111. In this first scenario, when the external robotic arm or a person picks up or places the wafer 200, it is not necessary to extend too deeply into the housing 110, which reduces the possibility of interference due to excessive insertion into the housing 110 and significantly reduces the risk of scratches on the surface of the wafer 200. In the second scenario, the wafer 200 can be lifted and moved from a first height position inside the chamber 111 to a second height position outside the chamber 111. In this second scenario, since the wafer 200 has been moved outside the housing 110, the external robotic arm or manual handling of the wafer 200 does not need to extend into the housing 110, fundamentally eliminating the possibility of interference with the housing 110, significantly reducing the risk of surface scratches on the wafer 200, and improving the yield of the wafer 200 and the stability of product quality.

[0034] It should be noted that the specific height position of the first height position inside the chamber 111 and the specific height position of the second height position inside or outside the chamber 111 can be flexibly set according to actual process requirements, so as to achieve flexible position transmission and adapt to the stepped transmission level.

[0035] The setting of the first height position will be explained in detail below based on the opening and closing status of opening 1121.

[0036] In some embodiments, see Figure 2 When the closable opening 1121 is closed, it blocks fluid communication between the controlled and uncontrolled environments, with the first height position located within the controlled environment of chamber 111; or, see... Figure 1 When the closable opening 1121 is in the open state, it allows fluid communication between the controlled environment and the uncontrolled environment, so that the controlled environment and the uncontrolled environment mix in the chamber 111 to form a mixed environment and the first height position is in the mixed environment.

[0037] When opening 1121 is closed, fluid communication between the controlled and uncontrolled environments is blocked. In other words, the controlled environment inside chamber 111 is isolated from the uncontrolled environment outside chamber 111. At this time, the first height position is located within the controlled environment inside chamber 111. When opening 1121 is open, fluid communication between the controlled and uncontrolled environments is allowed. In other words, after the controlled environment inside chamber 111 is diluted by the uncontrolled environment outside chamber 111, a mixed environment is formed inside chamber 111. At this time, the first height position is located within the mixed environment inside chamber 111.

[0038] The following is a detailed explanation of how the first height position is set based on spatial location.

[0039] In some embodiments, see Figure 3 The second height position is located inside the cavity 111; or, the second height position is located outside the cavity 111. The wafer 200 can be moved from the first height position inside the cavity 111 to the second height position inside the cavity 111; or, from the first height position inside the cavity 111 to the second height position outside the cavity 111, and the setting can be flexibly selected according to actual process requirements.

[0040] The following section provides a detailed explanation of the specific settings for the adaptive isolation component 123.

[0041] In one embodiment, see Figures 1 to 3 The adaptive isolation component 123 is configured to adaptively deform with the movement of the drive end to dynamically maintain the environmental state inside the chamber 111. In order to avoid the movement of the drive end from affecting the environmental state inside the chamber 111, the adaptive isolation component 123 covers the preset travel path of the drive end and adaptively deforms with the movement of the drive end, so as to ensure dynamic sealing of the environment inside the chamber 111 without affecting the movement of the drive end.

[0042] In one specific embodiment, see Figure 3 and Figure 5 The adaptive isolation component 123 includes a flexible deformable body 1231 with an internal expandable isolation space. The flexible deformable body 1231 has flexible and deformable characteristics, so that it has an internal expandable isolation space to cover the preset travel path of the drive end, and adaptively deforms with the movement of the drive end to dynamically maintain the environmental state inside the chamber 111.

[0043] In some embodiments, see Figure 3 and Figure 5 The flexible deformable body 1231 has at least one open end 12311, which connects the isolation space with the environment inside the chamber 111, and can both cover the preset travel path of the drive end and dynamically seal the environment inside the chamber 111.

[0044] The following section provides a detailed explanation of the specific settings of the driver source 122 and related components at the driver end.

[0045] In one embodiment, see Figures 3 to 5 The lifting device 120 also includes a drive source 122, which provides actuation force to the drive end and is located outside the range covered by the preset stroke. The drive source 122 is a drive device such as a cylinder or hydraulic cylinder that can provide driving force.

[0046] In one specific embodiment, see Figures 3 to 5 The lifting device 120 also includes a lifting seat 124 that moves synchronously with the drive end. The lifting seat 124 has at least one support portion 1241 and is connected to the end of the adaptive isolation component 123 away from the wall 112. Since the adaptive isolation component 123 is connected to the lifting seat 124, when the drive end moves synchronously with the lifting seat 124, the adaptive isolation component 123 also adaptively deforms to dynamically maintain the environmental state inside the chamber 111.

[0047] Specifically, see Figure 5 and Figure 6 The lifting seat 124 also includes a main body 1242 integrally formed with the support portion 1241. The main body 1242 is connected to the power end of the drive source 122, and the support portion 1241 extends outward from the side of the main body 1242. For example, there is a pair of support portions 1241, which are symmetrically arranged on opposite sides of the main body 1242.

[0048] Furthermore, the end of the flexible deformable body 1231 away from the wall 112 is open or closed.

[0049] Further, see Figure 3 and Figure 5 The lifting device 120 also includes a support rod 125 corresponding to the support block 121. One end of the support rod 125 is located inside the chamber 111 and connected to the support block 121. The support rod 125 passes through the housing 110. The end of the support rod 125 away from the support block 121 is the driving end and is located inside the flexible deformable body 1231 outside the chamber 111. An open end 12311 of the flexible deformable body 1231 is provided corresponding to the insertion point of the support rod 125. The flexible deformable body 1231 covers the part of the support rod 125 located outside the chamber 111.

[0050] In one example, when there is only one open end 12311, the end of the flexible deformable body 1231 away from the wall 112 is closed. Since the end of the flexible deformable body 1231 away from the wall 112 is connected to the lifting seat 124 and the driving end is located inside the flexible deformable body 1231, the driving source 122 drives the lifting seat 124 to move, causing the flexible deformable body 1231 connected to the lifting seat 124 to deform, thereby causing the driving end located inside the flexible deformable body 1231 to move.

[0051] In another example, see Figures 3 to 5 When there are two open ends 12311, the end of the flexible deformable body 1231 away from the wall 112 is open. The driving end is connected to the lifting seat 124. The driving source 122 drives the lifting seat 124 to move, which in turn drives the driving end to move. The flexible deformable body 1231 then adapts to the deformation.

[0052] Specifically, see Figures 4 to 5 The open end 12311 of the flexible deformable body 1231 is assembled and fixed by the sealing flange 1232. When there is one open end 12311, the sealing flange 1232 of the adaptive isolation component 123 is located on the wall 112; when there are two open ends 12311, one of the sealing flanges 1232 of the adaptive isolation component 123 is located on the wall 112, and the other sealing flange 1232 is located on the lifting seat 124.

[0053] The specific settings of bracket 126 will be explained in detail below.

[0054] In one embodiment, see Figures 1 to 4 The lifting device 120 also includes a bracket 126, which extends from the wall 112 along a first direction to limit the stroke of the drive end. In other words, the preset stroke of the drive end is defined by the height space of the bracket 126 in the first direction.

[0055] Further, see Figures 3 to 5 The bracket 126 is located outside the wall 112. The drive source 122 is located on the side of the bracket 126 away from the wall 112 and outside the bracket 126. The lifting seat 124 is located inside the bracket 126 in the first direction. The power end of the drive source 122 passes through the bracket 126 and extends into the bracket 126 and is connected to the lifting seat 124.

[0056] The power end of the drive source 122 drives the lifting seat 124 to move along the first direction, which in turn drives the drive end to move along the first direction. The flexible deformable body 1231 then adapts to the deformation. Under the actuation of the drive end, the support block 121 supports the wafer 200 and moves along the first direction, realizing the positional movement from the first height position to the second height position.

[0057] In one specific embodiment, see Figures 3 to 5 The bracket 126 includes at least one first connecting portion 1261 disposed along a first direction and a second connecting portion 1262 disposed along a second direction. One end of the first connecting portion 1261 is connected to the wall 112 and the other end is connected to the second connecting portion 1262. For example, the second direction is a horizontal direction.

[0058] Specifically, when there is one first connecting part 1261, the bracket 126 is L-shaped; when there are two first connecting parts 1261, the bracket 126 is concave. It should be noted that the shapes of the first connecting part 1261 and the second connecting part 1262 are not specifically limited here. For example, the first connecting part 1261 may be a vertical line or an inverted L-shape, and the second connecting part 1262 may be a straight line.

[0059] Furthermore, the drive source 122 is located on the side of the horizontal portion away from the wall 112, and the power end of the drive source 122 passes through the horizontal portion and extends into the bracket 126.

[0060] The specific configuration of the guide structure 127 will be explained in detail below.

[0061] In one embodiment, see Figures 1 to 5 The lifting device 120 also includes a guide structure 127 that constrains the movement path of the drive end. The guide structure 127 and the drive end are separate structures. The guide structure 127 constrains and guides the movement path of the drive end, ensuring the accuracy and stability of the linear displacement of the drive end along the first direction.

[0062] In one specific embodiment, see Figure 4 and Figure 5 The guide structure 127 includes at least one first guide rail 1271 disposed within the bracket 126 along a first direction, and at least one slider 1272 slidably disposed on the first guide rail 1271 and connected to the lifting seat 124. Specifically, the first guide rail 1271 is disposed on the first connecting portion 1261 along the first direction, and the lifting seat 124 is connected to the slider 1272 via a connecting seat 1273. Through the cooperation of the first guide rail 1271 and the slider 1272, the drive source 122 drives the lifting seat 124 to move along the extension direction of the first guide rail 1271, i.e., the first direction, thereby driving the drive end to move along the first direction, constraining the movement path of the drive end, and ensuring the accuracy and stability of the displacement of the transfer wafer 200.

[0063] The specific structure of the support block 121 will be explained in detail below.

[0064] In one embodiment, see Figure 7The support block 121 has a supporting surface 1211 facing the wafer 200, and the supporting surface 1211 forms a partial surface contact with the wafer 200. The partial surface contact means that the supporting surface 1211 contacts a part of the surface of the wafer 200, thereby reducing the contact area with the wafer 200 and reducing friction and contamination to the wafer 200.

[0065] Further, see Figure 7 The support block 121 has a slope 1212 extending from the edge of the support surface 1211, and the slope of the slope 1212 gradually decreases from the outer periphery of the support block 121 towards the center. The slope 1212 is arc-shaped along its extension direction to fit the wafer 200, and the slope 1212 has a guiding effect on the wafer 200, which can be guided to the support surface 1211 along the slope 1212.

[0066] Furthermore, see Figure 7 The support block 121 has a limiting surface 1213 connected between the supporting surface 1211 and the slope surface 1212. The limiting surface 1213 is arc-shaped along its extension direction to adapt to the wafer 200. The limiting surface 1213 is vertical along the first direction. The limiting surface 1213 defines the edge position of the wafer 200.

[0067] The specific structure of the linear drive mechanism 130 will be explained in detail below.

[0068] In one embodiment, see Figure 1 , Figure 2 and Figure 8 The monolithic vacuum transfer system also includes a linear drive mechanism 130, which is located in the chamber 111 and configured to support the wafer 200 and move it along a second direction. The movement path of the wafer 200 in the second direction has a common movement position point with the movement path of the wafer 200 in the first direction. The linear drive mechanism 130 and the lifting device 120 can support the wafer 200 at interchangeable movement position points.

[0069] When the lifting device 120 does not support the wafer 200 and the linear drive mechanism 130 supports the wafer 200, the linear drive mechanism 130 supports the wafer 200 and moves along the second direction, moving the wafer 200 to a common moving position point. Under the drive of the drive source 122, the drive end moves along the first direction, driving the support block 121 to move towards the wafer 200 and support the wafer 200. The drive continues to make the wafer 200 move along the first direction and separate from the linear drive mechanism 130, so that the wafer 200 can be moved from the first height position to the second height position.

[0070] When the linear drive mechanism 130 does not support the wafer 200 and the lifting device 120 supports the wafer 200, the support block 121 supports the wafer 200 and the drive end moves along the first direction under the drive of the drive source 122, so that the wafer 200 moves to a common moving position point, and then the linear drive mechanism 130 supports the wafer 200. The linear drive mechanism 130 can adjust the displacement before or after the wafer 200 moves to the common moving position point to reach the common moving position point.

[0071] Specifically, see Figure 1 , Figure 2 and Figure 8 The wall 112 has an openable and closable transfer port 1122 along the second direction. The part of the linear drive mechanism 130 that supports the wafer 200 can extend out of the transfer port 1122 to transfer the wafer 200 out of the chamber 111 or receive the wafer 200 sent in from the outside.

[0072] In one embodiment, see Figure 8 The linear drive mechanism 130 includes a finger 131 configured to support the wafer 200 and a drive member 132 configured to drive the finger 131 to move along a second direction. Specifically, the drive member 132 is a motor or the like. Driven by the drive member 132, the finger 131 can move along the second direction, thereby driving the wafer 200 on it to move along the second direction.

[0073] In one specific embodiment, see Figure 8 The linear drive mechanism 130 also includes a constraint structure 133 that constrains the finger 131 to move along the second direction. The constraint structure 133 constrains and guides the movement path of the finger 131, ensuring the accuracy and stability of the linear displacement of the wafer 200 supported by the finger 131 along the second direction.

[0074] Further, see Figure 8 The constraint structure 133 includes at least one second guide rail 1331 disposed in the cavity 111 along the second direction, and a movable seat 1332 slidably disposed on the at least one second guide rail 1331 and connected to the drive member 132. Under the drive of the drive member 132, the movable seat 1332 moves along the extension direction of the second guide rail 1331, i.e., the second direction, thereby driving the finger 131 to move along the second direction.

[0075] Furthermore, see Figure 8The driving member 132 is connected to the movable seat 1332 through the transmission structure 134. The transmission structure 134 includes a lead screw 1341 located at the rotating end of the driving member 132 along the second direction and a movable member 1342 threadedly engaged with the lead screw 1341. When the driving member 132 drives the lead screw 1341 to rotate around its own axis, the movable member 1342 moves linearly back and forth under the action of threaded engagement with the lead screw 1341, and drives the movable seat 1332 to move synchronously. The movable seat 1332 drives the finger 131 to move along the second direction, so that the finger 131 extends out of the chamber 111 through the conveying port 1122 or retracts into the straight chamber 111.

[0076] Specifically, see Figure 8 The rotating end of the drive component 132 is rigidly connected coaxially to the lead screw 1341 via a coupling. Both ends of the lead screw 1341 are mounted in the chamber 111 via bearings, which are angular contact ball bearings. The moving component 1342 is connected to the moving seat 1332 via a connecting block 1343.

[0077] The specific configuration of cover plate 140 will be explained in detail below.

[0078] In one specific embodiment, see Figure 1 , Figure 2 and Figure 4 The monolithic vacuum transmission system also includes a cover plate 140, which is rotatably disposed at the opening 1121 of the housing 110 via at least one hinge 142. The opening 1121 is opened or closed by opening or closing the cover plate 140.

[0079] Further, see Figure 1 , Figure 2 and Figure 4 The monolithic vacuum transfer system also includes at least one telescopic member 150 configured to control the opening and closing of the cover 140. The telescopic member 150 is telescopically adjustable, with one end hinged to the cover 140 and the other end hinged to the housing 110. By adjusting the length of the telescopic member 150, the cover 140 can be pushed away from the opening 1121 to open it, or pulled towards the opening 1121 to close it. For example, the telescopic member 150 may be a hydraulic rod, etc.

[0080] Furthermore, see Figure 1 and Figure 2 The cover plate 140 is provided with a transparent observation window 141. The position of the observation window 141 is perpendicular to the parking position when the wafer 200 is retracted into the cavity 111. It can be a common moving position point in the above embodiments, which facilitates real-time monitoring of the wafer 200 status.

[0081] In the description of this utility model, it should be understood that the terms "comprising" and "having" as used herein, and any variations thereof, are intended to cover non-exclusive inclusion, for example, a process, method, system, product, or device that includes a series of steps or units is not necessarily limited to those steps or units that are explicitly listed, but may include other steps or units that are not explicitly listed or that are inherent to such process, method, product, or device.

[0082] It should be understood that the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", and "outer" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model.

[0083] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this utility model, unless otherwise stated, "a plurality of" means two or more.

[0084] While the embodiments of this utility model have been described in detail above, it will be apparent to those skilled in the art that various modifications and variations can be made to these embodiments. However, it should be understood that such modifications and variations fall within the scope and spirit of this utility model. Furthermore, the utility model described herein may have other embodiments and can be implemented or realized in various ways. Unless otherwise defined, the technical or scientific terms used herein should have the ordinary meaning understood by one of ordinary skill in the art to which this utility model pertains.

Claims

1. A single-piece vacuum transfer system with lifting function, characterized in that, include: The housing (110) has a chamber (111) forming a controlled environment and a wall (112) defining the chamber (111), the wall (112) having an openable and closable opening (1121) in a first direction, the openable and closable opening (1121) being configured to selectively allow or block fluid communication between the controlled environment and an uncontrolled environment. The lifting device (120) includes at least one support block (121), a drive end with a preset stroke, and an adaptive isolation component (123) that is sealed to the wall (112) and covers the preset stroke path of the drive end. The drive end uses the adaptive isolation component (123) as a dynamic sealing medium to actuate the support block (121) to move the wafer (200) from a first height position to a second height position.

2. The single-piece vacuum transmission system with lifting function according to claim 1, characterized in that, When the openable opening (1121) is closed, it blocks fluid communication between the controlled and uncontrolled environments, wherein the first height position is located within the controlled environment of the chamber (111); or, When the openable opening (1121) is in the open state, it allows fluid communication between the controlled environment and the uncontrolled environment, such that the controlled environment and the uncontrolled environment mix in the chamber (111) to form a mixed environment and the first height position is in the mixed environment.

3. The single-piece vacuum transmission system with lifting function according to claim 1, characterized in that, The second height position is located within the chamber (111); or, The second height position is located outside the chamber (111).

4. The single-piece vacuum transmission system with lifting function according to claim 1, characterized in that, The adaptive isolation component (123) is configured to adaptively deform with the movement of the drive end to dynamically maintain the environmental state within the chamber (111).

5. The single-piece vacuum transmission system with lifting function according to claim 1, characterized in that, The adaptive isolation component (123) includes a flexible deformable body (1231) with an internally expandable isolation space.

6. The single-piece vacuum transmission system with lifting function according to claim 5, characterized in that, The flexible deformable body (1231) has at least one open end (12311) that allows the isolation space to communicate with the environment inside the chamber (111).

7. The single-piece vacuum transmission system with lifting function according to claim 1, characterized in that, The lifting device (120) also includes a drive source (122), which provides actuation force to the drive end and is located outside the range covered by the preset stroke.

8. The single-piece vacuum transmission system with lifting function according to claim 1, characterized in that, The lifting device (120) further includes a bracket (126) that extends from the wall (112) in a first direction to limit the stroke of the drive end.

9. The single-piece vacuum transmission system with lifting function according to claim 1, characterized in that, The lifting device (120) also includes a guide structure (127) that constrains the movement path of the drive end, and is a separate structure from the drive end.

10. The single-piece vacuum transmission system with lifting function according to claim 1, characterized in that, The lifting device (120) also includes a lifting seat (124) that moves synchronously with the drive end, has at least one support portion (1241), and is connected to the end of the adaptive isolation component (123) away from the wall (112).

11. The single-piece vacuum transmission system with lifting function according to claim 1, characterized in that, The support block (121) has a support surface (1211) facing the wafer (200), and the support surface (1211) forms a partial surface contact with the wafer (200).

12. The monolithic vacuum transmission system with lifting function according to claim 11, characterized in that, The support block (121) has a slope (1212) extending from the edge of the support surface (1211), and the slope of the slope (1212) gradually decreases from the outer periphery of the support block (121) towards the center.

13. The single-piece vacuum transmission system with lifting function according to claim 1, characterized in that, It also includes a linear drive mechanism (130) disposed in the chamber (111) and configured to support the wafer (200) and move it along a second direction. The movement path of the wafer (200) in the second direction has a common movement position point with the movement path of the wafer (200) in the first direction. The linear drive mechanism (130) and the lifting device (120) are able to support the wafer (200) interchangeably at the movement position point.

14. The monolithic vacuum transmission system with lifting function according to claim 13, characterized in that, The wall (112) has an openable and closable conveyor (1122) along the second direction.

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