Pulling cleaning device

Abstract

The application relates to the technical field of battery piece cleaning, and provides a lifting cleaning device, which comprises a tank body, a bubble generator and a scraper. The bubble generator is arranged in the tank body and is used for bubbling the cleaning liquid in the tank body. The scraper is arranged at the opening side of the tank body and is used for scraping the pollutants on the liquid surface of the cleaning liquid in the tank body. The bubble generator arranged in the tank body can not only enhance the cleaning effect on the silicon piece by using the bubbles, but also can bubble the silicon powder at the tank bottom, so that the silicon powder is suspended to the surface of the cleaning liquid. Further, the silicon powder suspended on the surface of the cleaning liquid is scraped by the scraper, the time and the quantity of the silicon powder staying in the tank are reduced, and the cleanliness in the tank is improved. Therefore, the lifting cleaning device can not only improve the cleaning effect on the silicon piece, but also does not need to clean the silicon powder accumulated in the tank body frequently, and the cleaning efficiency is effectively improved.

Description

Technical Field

[0001] This application relates to the field of battery cell cleaning technology, and in particular to a lifting cleaning device. Background Technology

[0002] In the HJT (Heterojunction Technology) solar cell manufacturing process, the cells need to undergo initial polishing, gettering, texturing and cleaning, front and back coating, and screen printing of electrodes. The primary purpose of the initial polishing process is to remove particulate matter and organic matter from the silicon wafer surface and slightly remove any damaged layers. For example, the initial polishing process includes: ozone cleaning, initial polishing, ozone cleaning, followed by hydrofluoric acid cleaning, and then slow pulling and drying of the silicon wafer. Because silicon powder accumulates in the slow pulling tank of the initial polishing machine over time, if not effectively treated, residual silicon powder may remain on the surface of the solar cell during the slow pulling process, thus affecting the photoelectric conversion efficiency of the photovoltaic cell. Frequent cleaning of the slow pulling tank affects the slow pulling efficiency, which in turn affects the initial polishing efficiency. Utility Model Content

[0003] Based on this, this application provides a lifting and cleaning device with good cleaning effect and high efficiency.

[0004] This application provides a lifting and cleaning device, the lifting and cleaning device comprising:

[0005] Tank body;

[0006] A bubble generator, disposed within the tank, is used to bubble the cleaning solution within the tank; and,

[0007] A scraper is provided on the open side of the tank body and is used to scrape off contaminants from the surface of the cleaning fluid in the tank body.

[0008] In some embodiments, the inner wall of the tank is provided with a first protective layer for reducing the adhesion of contaminants.

[0009] In some embodiments, the scraper includes a scraper and a first driving member, the scraper being disposed on the open side of the tank; the first driving member is connected to the scraper and is used to drive the scraper to move along the liquid surface of the cleaning fluid in the tank.

[0010] In some embodiments, the scraper further includes a second drive member connected to the first drive member, the second drive member being used to drive the first drive member to move in a vertical direction to adjust the relative distance between the scraper and the surface of the cleaning fluid in the tank.

[0011] In some embodiments, the bubble generator includes an air blower disposed on the tank and at least one bubble tube, each bubble tube being disposed at the bottom of the tank and each bubble tube being connected to the air blower.

[0012] In some embodiments, the lifting and cleaning device further includes a replenishing device connected to the tank, the replenishing device being used to replenish the tank with cleaning fluid.

[0013] In some embodiments, an overflow trough is provided on the outer periphery of the tank for collecting cleaning fluid overflowing from the tank and contaminants scraped off by the scraper.

[0014] In some embodiments, the inner wall of the overflow trough is provided with a second protective layer to reduce the adhesion of contaminants.

[0015] In some embodiments, a filter plate is also provided in the overflow tank, which is used to filter the liquid flowing into the overflow tank.

[0016] In some embodiments, the lifting and cleaning device further includes a collection pipe connected to the bottom of the overflow tank for collecting liquid flowing into the overflow tank.

[0017] Compared with traditional technologies, this application has at least the following beneficial effects:

[0018] This application, by incorporating a bubble generator within the cleaning tank, not only enhances the cleaning effect on silicon wafers through the use of bubbles but also aerates the silicon powder at the bottom of the tank, preventing its accumulation and suspending it on the surface of the cleaning solution. Furthermore, a scraper removes the suspended silicon powder from the surface, reducing the time and amount of silicon powder remaining in the tank and improving its cleanliness. Therefore, this lifting cleaning device not only improves the cleaning effect on silicon wafers but also eliminates the need for frequent cleaning of accumulated silicon powder within the tank, effectively increasing cleaning efficiency. Attached Figure Description

[0019] Figure 1 This is a cross-sectional schematic diagram of a lifting and cleaning device provided in one embodiment of this application;

[0020] Figure 2 This is a top view schematic diagram of a lifting and cleaning device provided in one embodiment of this application.

[0021] Wherein, 100-tank body; 110-first protective layer; 200-bubble generator; 210-air blower; 220-bubbling tube; 300-scraper; 310-scraper; 320-first driving component; 330-second driving component; 340-detector; 400-liquid replenisher; 500-overflow tank; 510-second protective layer; 520-filter plate; 600-collection tube. Detailed Implementation

[0022] The present application will be further described in detail below with reference to the accompanying drawings, embodiments, and examples. These embodiments and examples are for illustrative purposes only and are not intended to limit the scope of the present application. The purpose of providing these embodiments and examples is to enable a more thorough and comprehensive understanding of the disclosure of the present application. It should also be understood that the present application can be implemented in many different forms and is not limited to the embodiments and examples described herein. Those skilled in the art can make various modifications or alterations without departing from the spirit of the present application, and the equivalent forms obtained also fall within the protection scope of the present application. Furthermore, numerous specific details are set forth in the following description to provide a fuller understanding of the present application. It should be understood that the present application can be implemented without one or more of these details.

[0023] It should be understood that the terms "upper", "lower", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", and "outer" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application.

[0024] In the description of this application, unless otherwise expressly specified and limited, the terms "connected," "linked," "fixed," and "set" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the meaning of the above terms in this application according to the specific circumstances.

[0025] In this application, "optionally," "optionally," and "optional" mean that something is optional, that is, it means that it is selected from either "with" or "without." If there are multiple "optional" entries in a technical solution, unless otherwise specified, and there are no contradictions or mutual constraints, each "optional" entry shall be independent.

[0026] In this application, the technical features described in an open-ended manner include both closed technical solutions consisting of the listed features and open technical solutions that include the listed features.

[0027] In this application, the terms "first," "second," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance or quantity, nor should they be construed as implicitly indicating the importance or quantity of the indicated technical features. Moreover, "first," "second," etc., serve only as a non-exhaustive enumeration and should be understood not to constitute a closed limitation on quantity.

[0028] All references to this application are incorporated herein by reference as if each document were individually incorporated herein by reference. Unless they conflict with the purpose and / or technical solution of this application, all cited references are incorporated herein by reference in their entirety and for all purposes. When references are cited in this application, the definitions of relevant technical features, terms, nouns, phrases, etc., are also incorporated herein by reference. Examples and preferred embodiments of the cited technical features may also be incorporated herein by reference, but only to the extent that they enable the implementation of this application. It should be understood that when the cited content conflicts with the description in this application, this application shall prevail or modifications shall be made adaptably to the description in this application.

[0029] In traditional technologies, silicon powder accumulates in the slow-lift cleaning tank, requiring frequent cleaning and severely impacting cleaning efficiency. Failure to clean in a timely manner can result in silicon powder residue on the silicon wafer, affecting surface cleanliness and subsequent gettering and coating operations, ultimately impacting the photoelectric conversion efficiency of the solar cell.

[0030] Based on this, this application provides a lifting and cleaning device, such as... Figure 1 and Figure 2 As shown, the lifting and cleaning device includes a tank 100, a bubble generator, and a scraper 300.

[0031] The bubble generator is installed inside the tank 100 to bubble the cleaning fluid inside the tank 100. The scraper 300 is installed on the open side of the tank 100 to scrape off contaminants from the surface of the cleaning fluid inside the tank 100.

[0032] This application, by incorporating a bubble generator within the tank 100, not only enhances the cleaning effect on the silicon wafers through the use of bubbles but also aerates the silicon powder at the bottom of the tank, preventing its accumulation and allowing it to suspend on the surface of the cleaning liquid. Furthermore, a scraper 300 removes the suspended silicon powder from the cleaning liquid surface, reducing the time and amount of silicon powder remaining in the tank and improving its cleanliness. Therefore, this lifting cleaning device not only improves the cleaning effect on the silicon wafers but also eliminates the need for frequent cleaning of accumulated silicon powder within the tank 100, effectively increasing cleaning efficiency.

[0033] In some embodiments, such as Figure 1 As shown, the inner wall of the tank 100 is provided with a first protective layer 110 for reducing contaminant adhesion. Optionally, the surface roughness Ra of the first protective layer 110 is <0.1 μm. The thickness of the first protective layer 110 can be 50 μm to 100 μm. It is understood that in this application, the first protective layer 110 only needs to be sufficient to reduce contaminant adhesion. Taking silicon powder as an example, by improving the surface smoothness of the first protective layer 110, the adhesion of silicon powder is reduced. The first protective layer 110 can be a ceramic coating, such as an Al2O3 / TiO2 composite coating.

[0034] This application provides a smooth first protective layer 110 on the inner wall of the tank 100, which has low adhesion and can reduce the adhesion of contaminants such as silicon powder to the inner wall of the tank 100, thereby preventing the accumulation of contaminants on the inner wall of the tank 100. The first protective layer 110 can improve the cleanliness of the cleaning solution in the tank 100 and reduce the number of cleaning cycles of the tank 100, further improving the cleaning efficiency and cleanliness of the silicon wafers.

[0035] In some embodiments, such as Figure 2 As shown, the scraper 300 includes a scraper 310 and a first driving member 320. The scraper 310 is disposed on the open side of the tank 100. The first driving member 320 is connected to the scraper 310 and is used to drive the scraper 310 to move along the surface of the cleaning liquid in the tank 100. It is understood that the first driving member 320 only needs to be able to drive the scraper 310 to move along the surface of the cleaning liquid. For example, the first driving member 320 can be a telescopic cylinder or a telescopic hydraulic cylinder, which drives the scraper 310 to reciprocate through telescopic movement. Alternatively, the first driving member 320 can also be a combination of a drive motor and a toothed plate. Specifically, the toothed plate is movably disposed on the tank 100, and the toothed plate is connected to the drive motor and can slide along the movement direction of the scraper 310. The scraper 310 is fixed to one end of the toothed plate, so that the drive motor drives the toothed plate to move along the movement path of the scraper 310, thereby realizing the reciprocating scraping motion of the scraper 310.

[0036] In some embodiments, such as Figure 2 As shown, the scraper 300 also includes a second drive member 330 connected to the first drive member 320. The second drive member 330 is used to drive the first drive member 320 to move vertically, thereby adjusting the relative distance between the scraper 310 and the surface of the cleaning fluid in the tank 100. It is understood that the second drive member 330 only needs to be able to drive the scraper 310 to move in a direction perpendicular to the surface of the cleaning fluid. For example, the second drive member 330 can be a telescopic cylinder or a telescopic hydraulic cylinder, which drives the scraper 310 to reciprocate through telescopic movement.

[0037] Furthermore, as well as Figure 2 As shown, the scraper 300 may further include a detector 340 and a controller (not shown in the figure). The detector 340 is disposed on the scraper 300 or on the tank 100, and is used to detect whether there is an object to be cleaned in the tank 100, such as a flower basket containing battery cells. Optionally, the detector 340 may be an infrared sensor. The controller is electrically connected to the detector 340, and is used to receive the detection signal from the detector 340 and provide feedback control to the first drive unit 320 and the second drive unit 330 to adjust the scraper 310 to perform scraping operations at different positions. For example, when no object to be cleaned is detected in the tank 100, the scraper 310 can be adjusted to the bottom of the tank 100 to scrape the bottom of the tank 100, further improving the cleanliness of the cleaning solution in the tank 100.

[0038] In some embodiments, such as Figure 1 As shown, the bubble generator includes an air blower 210 mounted on the tank 100 and at least one bubble tube 220. Each bubble tube 220 is located at the bottom of the tank 100 and is connected to the air blower 210. Furthermore, the bubble tubes 220 can extend along the length of the tank 100, and multiple bubble tubes 220 can be arranged at intervals along the width of the tank 100. During the cleaning process, the arrangement of the bubble tubes 220 allows bubbles to be evenly dispersed in the tank 100, reducing the adhesion of contaminants to the surface of the object to be cleaned, enhancing cleaning ability, and preventing contaminants from accumulating at the bottom of the tank 100.

[0039] Optionally, the bubbling tube 220 is provided with multiple air holes. Further, the pore diameter can be 40μm~60μm. Setting the pore diameter as described above ensures the bubble size and prevents particle blockage, thereby improving equipment lifespan and cleaning effect.

[0040] Furthermore, the air pressure of the blower 210 can be 0.2MPa~0.5MPa, thereby ensuring stable bubble formation and avoiding bubble merging under high pressure, which would affect the cleaning effect.

[0041] In some embodiments, a support frame is also provided inside the tank 100 to support the object to be cleaned, so as to prevent the object to be cleaned from directly contacting the bubble generator.

[0042] In some embodiments, such as Figure 1 As shown, the lifting cleaning device also includes a replenishing device 400 connected to the tank 100, which is used to replenish the cleaning fluid to the tank 100. This application replenishes the tank 100 with fluid via the replenishing device 400, thereby achieving an overflow operation of the tank 100. This overflow can carry away contaminants from the surface of the cleaning fluid, further improving the cleanliness of the cleaning fluid.

[0043] In some embodiments, such as Figure 1 and Figure 2 As shown, an overflow trough 500 is provided on the outer periphery of the tank 100. The overflow trough 500 is used to collect the cleaning fluid overflowing from the tank 100 and the contaminants scraped off by the scraper 300. Optionally, the overflow trough 500 can be integrally formed with the tank 100, that is, the tank 100 includes a cleaning tank for cleaning and an overflow trough 500 surrounding the cleaning tank, so that the liquid overflowing from the cleaning tank can enter the overflow trough 500 for collection. Alternatively, the overflow trough 500 can also be separately provided from the tank 100. For example, an enclosure is provided outside the tank 100, and the overflow trough 500 is formed between the enclosure and the tank 100.

[0044] This application, by incorporating an overflow tank 500, can collect the overflowing cleaning fluid and the contaminants scraped off by the scraper 300, facilitating centralized collection and treatment of contaminants. Taking silicon powder as an example, it can be extracted for secondary use through sedimentation, filtration, and other methods.

[0045] In some embodiments, such as Figure 1 As shown, the inner wall of the overflow tank 500 is provided with a second protective layer 510 for reducing contaminant adhesion. Optionally, the surface roughness Ra of the second protective layer 510 is <0.1 μm. The thickness of the second protective layer 510 can be 50 μm to 100 μm. It is understood that in this application, the second protective layer 510 only needs to be sufficient to reduce contaminant adhesion. Taking silicon powder as an example, by improving the surface smoothness of the second protective layer 510, the adhesion of silicon powder is reduced. The second protective layer 510 can be a ceramic coating, such as an Al2O3 / TiO2 composite coating.

[0046] This application provides a smooth second protective layer 510 as described above, thereby reducing the residue of contaminants such as silicon powder on the inner wall of the overflow tank 500, and further reducing the number of times the overflow tank 500 needs to be cleaned.

[0047] In some embodiments, such as Figure 1As shown, a filter plate 520 is also provided inside the overflow tank 500, which is used to filter the liquid flowing into the overflow tank 500. Optionally, the filter plate 520 can be arranged close to the opening side of the overflow tank 500.

[0048] This application uses a filter plate 520 to filter the liquid flowing out of the tank 100, thus preventing large-volume pollutants from entering the overflow tank 500 and becoming difficult to clean.

[0049] In some embodiments, the lifting cleaning device further includes a collection pipe 600 connected to the bottom of the overflow tank 500, the collection pipe 600 being used to collect the liquid flowing into the overflow tank 500. Optionally, the outlet end of the collection pipe 600 is connected to a storage tank to treat the cleaning fluid discharged from the tank 100. For example, a precipitator is provided to treat the liquid in the storage tank, recovering silicon powder through precipitation and reusing the supernatant cleaning fluid after precipitation.

[0050] Exemplarily, a method for cleaning battery cells using the above-described lifting and cleaning device is provided, comprising the following steps:

[0051] S1. Immerse the basket containing the battery cells into the tank 100 filled with cleaning solution. At the same time, a blower blows air into the bubbling tube 220 to form bubbles in the cleaning solution in the tank 100, which cleans the battery cells in the basket by bubbling. Under the action of the bubbles, the silicon powder attached to the battery cells is concentrated on the surface of the cleaning solution.

[0052] S2. The replenishing device 400 continuously replenishes the cleaning fluid into the tank 100. Under the overflow action, some of the silicon powder on the surface of the cleaning fluid overflows into the overflow tank 500. At the same time, the scraper 300 is started, and the scraper 310 scrapes the silicon powder on the surface of the cleaning fluid into the overflow tank 500. The scraper 300 can be used for intermittent scraping operation.

[0053] S3. After cleaning, remove the flower basket containing the battery cells.

[0054] S4. After the lifting and cleaning device has been continuously processing for a period of time and there is no flower basket in the tank 100, the scraper 310 is inserted into the bottom of the tank 100 to scrape the bottom, thereby cleaning the tank 100.

[0055] In summary, by incorporating a bubble generator within the tank 100, this application not only enhances the cleaning effect on the silicon wafers but also aerates the silicon powder at the bottom of the tank, preventing its accumulation and allowing it to float to the surface of the cleaning liquid. Furthermore, the scraper 300 removes the suspended silicon powder from the cleaning liquid surface, reducing its residence time and quantity within the tank and improving its cleanliness. Therefore, this lifting cleaning device not only improves the cleaning effect on the silicon wafers but also eliminates the need for frequent cleaning of accumulated silicon powder within the tank 100, effectively increasing cleaning efficiency.

[0056] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0057] The above embodiments are merely illustrative of several implementation methods of this application, and their descriptions are relatively specific and detailed, but they should not be construed as limiting the scope of the application. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this application, and these all fall within the protection scope of this application. Therefore, the protection scope of this application should be determined by the appended claims.

Claims

1. A pull cleaning device, characterized by The lifting and cleaning device includes: Tank body (100); A bubble generator (200), disposed within the tank (100), is used to bubble the cleaning liquid within the tank (100); and, A scraper (300) is provided on the open side of the tank (100) for scraping off contaminants from the surface of the cleaning fluid in the tank (100).

2. The pull cleaning apparatus according to claim 1, wherein The inner wall of the tank (100) is provided with a first protective layer (110) for reducing the adhesion of pollutants.

3. The pull cleaning apparatus of claim 1, wherein The scraper (300) includes a scraper (310) and a first drive member (320). The scraper (310) is disposed on the opening side of the tank (100). The first drive member (320) is connected to the scraper (310) and is used to drive the scraper (310) to move along the liquid surface of the cleaning liquid in the tank (100).

4. The pull cleaning apparatus according to claim 3, wherein The scraper (300) further includes a second drive (330) connected to the first drive (320), the second drive (330) being used to drive the first drive (320) to move vertically, so as to adjust the relative distance between the scraper (310) and the liquid surface of the cleaning fluid in the tank (100).

5. The pull cleaning apparatus of claim 1, wherein The bubble generator (200) includes an air blower (210) disposed on the tank (100) and at least one bubble tube (220), each of the bubble tubes (220) being disposed at the bottom of the tank (100) and each of the bubble tubes (220) being connected to the air blower (210).

6. The pull cleaning apparatus of claim 1, wherein The lifting and cleaning device also includes a replenishing device (400) connected to the tank (100), the replenishing device (400) being used to replenish the tank (100) with cleaning fluid.

7. The pull cleaning apparatus according to any one of claims 1 to 6, wherein An overflow trough (500) is provided on the outer periphery of the tank (100), the overflow trough (500) being used to collect the cleaning fluid overflowing from the tank (100) and the contaminants scraped off by the scraper (300).

8. The lifting and cleaning device as described in claim 7, characterized in that, The inner wall of the overflow trough (500) is provided with a second protective layer (510) for reducing the adhesion of pollutants.

9. The pull cleaning apparatus of claim 7, wherein The overflow tank (500) is also provided with a filter plate (520), which is used to filter the liquid flowing into the overflow tank (500).

10. The pull cleaning apparatus of claim 7, wherein The lifting and cleaning device also includes a collection pipe (600) connected to the bottom of the overflow tank (500), the collection pipe (600) being used to collect the liquid flowing into the overflow tank (500).

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