A pH on-line regulating device for alkaline etching solution

CN224768882UActive Publication Date: 2026-09-18GUANGDONG ZHONGYI ENVIRONMENTAL PROTECTION TECH CO LTD
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Patent Information

Application Number
CN202522290134.8
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2025-10-29
Publication Date
2026-09-18
Estimated Expiration
2035-10-29

AI Technical Summary

Technical Problem

在调节过程中,会有碱性残留物附着于罐体内壁,影响pH检测精度及调节效果,然而,现有装置缺乏有效的自清洁功能,导致残留物积累后难以彻底清除,容易影响后续pH调节的准确性

Benefits of technology

[0014] The beneficial effects of this utility model are as follows: This utility model provides an online pH adjustment device for alkaline etching solutions. By setting a first distributor and a second distributor in the adjustment tank, the first distributor is connected to the alkaline solution storage tank through a first dosing pump, and the second distributor is connected to the acid solution storage tank through a second dosing pump. The distributor can evenly disperse the alkaline or acid solution into the adjustment tank, avoiding drastic local pH fluctuations during the dosing process. The solution is stirred by a stirring mechanism to improve the mixing effect. A lifting mechanism is provided in the adjustment tank to drive a cleaning brush to move up and down along the inner wall of the tank, achieving efficient removal of attached dirt. At the same time, the water flow of the water cleaning component further improves the cleaning effect, thereby preventing pH detection errors caused by dirt accumulation and improving pH adjustment accuracy.

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Abstract

The utility model relates to a kind of pH online regulating device for alkaline etching liquid, involve pH regulating technical field, by being provided with first flow divider and second flow divider in adjusting tank, first flow divider is connected with lye storage tank by first dosing pump, second flow divider is connected with acid storage tank by second dosing pump, flow divider can evenly disperse lye or acid into adjusting tank, avoid local pH violent fluctuation in dosing process;And by stirring mechanism, solution is stirred, and mixing effect is improved;Adjusting tank is equipped with lifting mechanism drive cleaning brush and moves up and down along the inner wall of tank body, realize efficient removal to adhered dirt, while cooperating with the water flow scouring of water cleaning component, further improve cleaning effect, to prevent the pH detection error caused by dirt accumulation, improve pH regulating precision.
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Description

Technical Field

[0001] This utility model relates to the field of pH adjustment technology, and in particular to an online pH adjustment device for alkaline etching solutions. Background Technology

[0002] Wet etching is an important process that involves contacting the target material with a specific etching solution, using a chemical reaction to corrode and remove the material's surface. Its advantages include fast etching speed, high selectivity, and relatively simple process, making it widely used in the panel manufacturing industry. Currently, most etching solutions are alkaline systems. The required pH value varies depending on the material being etched, necessitating real-time monitoring and adjustment to ensure stable etching results. During adjustment, alkaline residues adhere to the inner wall of the etching tank, affecting pH detection accuracy and adjustment effectiveness. However, existing devices lack effective self-cleaning functions, leading to residue accumulation that is difficult to remove completely, potentially impacting the accuracy of subsequent pH adjustments. Utility Model Content

[0003] Therefore, it is necessary to provide an online pH adjustment device for alkaline etching solutions.

[0004] The technical solution of this utility model to solve the above-mentioned technical problems is as follows: A pH online adjustment device for alkaline etching solution, comprising: a base, an adjustment tank in the middle of the base, and an alkaline storage tank, a clean water tank, and an acid storage tank arranged sequentially on the outer side of the adjustment tank; a stirring mechanism in the middle of the adjustment tank, and a temperature detection device and a pH detection device respectively on both sides of the stirring mechanism; a first distributor and a second distributor are also provided on both sides of the stirring mechanism, the first distributor being connected to one end of a first dosing pump, and the other end of the first dosing pump being connected to the alkaline storage tank; the second distributor being connected to one end of a second dosing pump, and the other end of the second dosing pump being connected to the acid storage tank; a lifting mechanism is also provided inside the adjustment tank, a cleaning brush that fits against the inner wall of the adjustment tank is provided on the lifting mechanism, and a water cleaning assembly is provided around the cleaning brush above it, the water cleaning assembly being connected to the clean water tank via a water pump.

[0005] In one embodiment, a liquid level sensor is provided at the top of the regulating tank to detect the height of the liquid level inside the regulating tank.

[0006] In one embodiment, the pH detection device includes an electric actuator and a pH detection head disposed at the output end of the electric actuator; a sleeve is provided on the outside of the pH detection head, and the bottom of the sleeve is flush with the bottom of the pH detection head.

[0007] In one embodiment, the stirring mechanism includes a stirring motor disposed at the upper end of the regulating tank and a stirring rod connected to the stirring motor. The stirring rod is located inside the regulating tank, and the upper end of the stirring rod is provided with multiple turbine blades, while the bottom of the stirring rod is provided with an anchor blade.

[0008] In one embodiment, the lifting mechanism includes a lifting motor and two parallel first screws and second screws arranged on both sides inside the regulating tank. Each of the first screws and the second screw is provided with a synchronous pulley, and the synchronous pulleys are connected to each other by a synchronous belt. The lifting motor is fixedly connected to the upper end of the first screw.

[0009] In one embodiment, the cleaning brush is threadedly connected to the first screw and the second screw, respectively.

[0010] In one embodiment, the water cleaning assembly includes a rotary joint, a telescopic hose, a cleaning ring tube, and a plurality of nozzles; the rotary joint is disposed on the upper end face of the regulating tank, the cleaning ring tube is disposed around the cleaning brush above it, and the two ends of the telescopic hose are respectively connected to the rotary joint and the cleaning ring tube; the nozzles are evenly spaced on the cleaning ring tube.

[0011] In one embodiment, the nozzle is tilted downwards at a 45° angle.

[0012] In one embodiment, the water cleaning assembly further includes a guide tube, the outer wall of which is provided with a connection portion that is threadedly connected to the first screw, and the telescopic hose passes through the guide tube and is connected to the cleaning ring tube.

[0013] In one embodiment, a controller is also provided in front of the regulating tank. The controller is signal-connected to the pH detection device and to the first dosing pump, the second dosing pump, and the water pump.

[0014] The beneficial effects of this utility model are as follows: This utility model provides an online pH adjustment device for alkaline etching solutions. By setting a first distributor and a second distributor in the adjustment tank, the first distributor is connected to the alkaline solution storage tank through a first dosing pump, and the second distributor is connected to the acid solution storage tank through a second dosing pump. The distributor can evenly disperse the alkaline or acid solution into the adjustment tank, avoiding drastic local pH fluctuations during the dosing process. The solution is stirred by a stirring mechanism to improve the mixing effect. A lifting mechanism is provided in the adjustment tank to drive a cleaning brush to move up and down along the inner wall of the tank, achieving efficient removal of attached dirt. At the same time, the water flow of the water cleaning component further improves the cleaning effect, thereby preventing pH detection errors caused by dirt accumulation and improving pH adjustment accuracy. Attached Figure Description

[0015] To more clearly illustrate the technical solutions of the embodiments of this application, the accompanying drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this application and should not be regarded as a limitation of the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0016] Figure 1 This is a schematic diagram of the structure of an online pH adjustment device for an alkaline etching solution according to one embodiment;

[0017] Figure 2 This is a cross-sectional structural schematic diagram of an online pH adjustment device for an alkaline etching solution according to one embodiment.

[0018] In the attached diagram, 10 is an online pH adjustment device for alkaline etching solution; 100 is a base; 200 is an adjustment tank; 210 is a stirring motor; 211 is a stirring rod; 212 is a turbine propeller; 213 is an anchor propeller; 220 is a first distributor; 230 is a second distributor; 240 is a lifting motor; 241 is a first screw; 242 is a second screw; 250 is a cleaning brush; 260 is a telescopic hose; 261 is a cleaning ring pipe; 262 is a nozzle; 263 is a guide pipe; 270 is a liquid level sensor; 280 is a temperature detection device; 290 is a pH detection device; 300 is an alkaline solution storage tank; 310 is a first dosing pump; 400 is a clean water tank; 410 is a water pump; 500 is an acid solution storage tank; 510 is a second dosing pump; and 600 is a controller. Detailed Implementation

[0019] It should be noted that, unless otherwise specified, the embodiments and features described in these embodiments of the present invention can be combined with each other. The technical solutions of the present invention will be further described below with reference to the accompanying drawings of the embodiments. The present invention is not limited to the specific embodiments described below.

[0020] It should be understood that the same or similar reference numerals in the accompanying drawings of the embodiments correspond to the same or similar components. In the description of this utility model, it should be understood that if terms such as "upper," "lower," "front," "rear," "left," "right," "top," and "bottom" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, they are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or component referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, the terms describing positional relationships in the accompanying drawings are for illustrative purposes only and should not be construed as limiting this patent. Those skilled in the art can understand the specific meaning of the above terms according to the specific circumstances.

[0021] In one embodiment, such as Figure 1 and Figure 2 As shown, an online pH adjustment device for alkaline etching solution includes: a base 100, an adjustment tank 200 located in the middle of the base 100, and an alkaline storage tank 300, a clean water tank 400, and an acid storage tank 500 sequentially located on the outer side of the adjustment tank 200; a stirring mechanism located in the middle of the adjustment tank 200, and a temperature detection device 280 and a pH detection device 290 respectively located on both sides of the stirring mechanism; a first distributor 220 and a second distributor 230 are also located on both sides of the stirring mechanism, the first distributor 220 being connected to... One end of the first dosing pump 310 is connected to the first dosing pump 310, and the other end of the first dosing pump 310 is connected to the alkali storage tank 300; the second diverter 230 is connected to one end of the second dosing pump 510, and the other end of the second dosing pump 510 is connected to the acid storage tank 500; the regulating tank 200 is also provided with a lifting mechanism, and the lifting mechanism is provided with a cleaning brush 250 that fits against the inner wall of the regulating tank 200. A water cleaning assembly is provided above the cleaning brush 250, and the water cleaning assembly is connected to the clean water tank 400 through a water pump 410.

[0022] In this embodiment, an adjusting tank 200 is fixedly installed in the middle of the upper surface of the base 100. The adjusting tank 200 is a hollow cylindrical structure, and an installation cavity is provided at the upper end of the inner cavity of the adjusting tank 200. The upper end of the adjusting tank 200 is provided with a liquid inlet, and the bottom is provided with a liquid outlet. A stirring mechanism is provided in the middle of the adjusting tank 200 to stir the liquid in the adjusting tank 200, so that the etching solution is fully mixed and uniform. A temperature detection device 280, a pH detection device 290, and a heating device are respectively installed on both sides of the stirring mechanism. The device monitors the temperature and pH of the liquid in the regulating tank 200 in real time. The heating device is an electric heating tube that extends into the regulating tank 200 to maintain a constant temperature of the solution. Above the base 100, an alkali storage tank 300, a clear water tank 400, and an acid storage tank 500 are sequentially installed. The alkali storage tank 300 is connected to the first distributor 220 via a first dosing pump 310, the acid storage tank 500 is connected to the second distributor 230 via a second dosing pump 510, and the clear water tank 400 is connected to the distributor via a water pump. 410 is connected to the water cleaning component; the first distributor 220 and the second distributor 230 are symmetrically arranged on both sides of the stirring mechanism. The distributors evenly inject the alkaline or acidic solution into the regulating tank 200, so that the regulating solution is quickly dispersed and the ion deposition caused by excessive local concentration is reduced; a lifting mechanism is provided inside the regulating tank 200, and a cleaning brush 250 is provided on the lifting mechanism. The outer wall of the cleaning brush 250 is attached to the inner wall of the regulating tank 200 and can move up and down with the lifting mechanism. A water cleaning component is also provided above the cleaning brush 250. When the lifting mechanism drives the cleaning brush 250 to rise, the water cleaning component sprays clean water to rinse the inner wall of the regulating tank 200, effectively removing the adhering substances and avoiding the residual solution from affecting the subsequent adjustment accuracy; a controller 600 is provided in front of the regulating tank 200. The controller 600 is connected to the temperature detection device 280, the pH detection device 290, the first dosing pump 310, the second dosing pump 510, the water pump 410 and the lifting mechanism. The controller 600 controls the automatic operation of the entire system.

[0023] A liquid level sensor 270 is installed at the top of the inside of the regulating tank 200. The liquid level sensor 270 is an ultrasonic liquid level sensor. The liquid level sensor is installed in the mounting cavity, and the bottom of the liquid level sensor extends to the bottom of the mounting cavity. It is used to monitor the liquid level in the regulating tank 200. The liquid level sensor 270 is connected to an external audible and visual alarm. When the liquid level is too low, an alarm is issued. When the liquid level is too high, the liquid inlet passage is cut off to prevent the etching solution from corroding the equipment or overflowing and causing safety hazards.

[0024] Furthermore, the pH detection device 290 includes an electric push rod extending into the regulating tank 200 from the upper end of the regulating tank 200 and a pH detection head fixed to the end of the push rod. The pH detection head can reciprocate vertically under the drive of the electric push rod. The electric push rod automatically adjusts the immersion depth of the pH detection head according to the liquid level height fed back by the liquid level sensor 270, ensuring that the pH detection head is always in the optimal measurement position below the liquid surface. A sleeve is provided on the outside of the pH detection head. The sleeve is fitted onto the outside of the pH detection head, and the bottom of the sleeve is flush with the bottom of the pH detection head to prevent damage to the detection head caused by the impact of the medicine during stirring, thereby improving the accuracy of pH detection. At the same time, the side wall of the sleeve is uniformly provided with guide holes, which not only ensures full contact between the medicine and the pH detection head, but also effectively buffers the impact of water flow, avoiding measurement drift of the detection head due to turbulence.

[0025] Furthermore, the stirring mechanism includes a stirring motor 210 mounted on the upper surface of the regulating tank 200. The output end of the stirring motor 210 extends into the regulating tank 200 and is fixedly connected to the stirring rod 211. The bottom end of the stirring rod 211 is provided with an anchor paddle 213, and the upper end of the stirring rod 211 is provided with multiple annularly arranged turbine paddles 212. The turbine paddles 212 and the anchor paddles 213 work together to achieve three-dimensional stirring of the liquid in the tank, so that the etching solution is fully mixed while preventing the accumulation of lower sediments and ensuring that the composition of the solution is uniform and stable.

[0026] To facilitate cleaning of the inner wall of the regulating tank 200, a lifting mechanism is provided inside the regulating tank 200 to drive the cleaning brush 250 to move up and down. The cleaning brush 250 reciprocates along the inner wall of the tank with the lifting mechanism, effectively removing residues adhering to the inner wall in conjunction with the water sprayed by the water cleaning component. The lifting mechanism includes a first screw 241 and a second screw 242 arranged parallel to each other at both ends inside the regulating tank 200, and a lifting motor 240 disposed above the regulating tank 200. The output end of the lifting motor 240 is fixedly connected to the upper end of the first screw 241. The upper ends of the first screw 241 and the second screw 242 are each provided with a synchronous pulley, and the two synchronous pulleys are connected by a synchronous belt. The synchronous pulley and synchronous belt are both located inside the mounting cavity. The first screw 241 is driven to rotate by the lifting motor 240, and the second screw 242 is rotated synchronously through the transmission of the synchronous pulley and synchronous belt. The cleaning brush 250 has a ring structure and is provided with threaded holes that match the first screw 241 and the second screw 242. The cleaning brush 250 is screwed onto the first screw 241 and the second screw 242 through the threaded holes. The rotation of the screws drives the cleaning brush 250 to move up and down along the inner wall of the tank. The outer wall of the cleaning brush 250 is provided with flexible bristles that fit against the inner wall of the tank. When the cleaning brush 250 moves up and down, the flexible bristles are in close contact with the inner wall of the tank to wipe it in all directions, effectively removing the attached dirt.

[0027] To further enhance the cleaning effect, a water cleaning assembly is provided above the cleaning brush 250. The water cleaning assembly includes a rotary joint on the upper surface of the regulating tank 200, a cleaning ring pipe 261 fixed above the cleaning brush, a telescopic hose 260 with both ends connected to the rotary joint and the cleaning ring pipe 261 respectively, and multiple nozzles 262 evenly spaced on the cleaning ring pipe 261. The upper end of the rotary structure is connected to the end of the water pump 410 away from the clean water tank 400, the lower end of the rotary joint is connected to one end of the telescopic hose 260, and the other end of the telescopic hose 260 is connected to the cleaning ring pipe 261. The water pump 410 delivers water from the clean water tank 400 to the cleaning ring pipe 261 through the rotary joint and the telescopic hose, and then sprays it evenly onto the inner wall of the tank through the nozzles 262. The outlet of the nozzles 262 is inclined towards the inner wall of the tank at an angle of 45°, effectively rinsing away residual medicine and deposits on the inner wall, achieving efficient cleaning in conjunction with the mechanical wiping of the cleaning brush 250.

[0028] Furthermore, to prevent the telescopic hose 260 from tangling with other components during lifting and lowering, the water cleaning assembly also includes a guide tube 263. The guide tube 263 has a connecting portion on its side wall that is threaded to the first screw 241. The guide tube 263 is positioned above the cleaning ring tube 261, and the telescopic hose 260 passes through the interior of the guide tube 263. Both the upper and lower ends of the guide tube 263 are flared to facilitate the smooth passage of the telescopic hose 260 and prevent bending. Through the guiding and limiting function of the guide tube 263, the telescopic hose 260 is effectively prevented from twisting or tangling during lifting and lowering, making the water supply process more stable and reliable, and ensuring continuous cleaning operations.

[0029] The general workflow of this utility model is as follows: The etching solution is injected into the regulating tank 200 through the inlet of the regulating pipe. The liquid level is detected by the liquid level sensor 270, and the liquid addition is stopped after the set value is reached. The electric push rod adjusts the position of the pH detection head according to the liquid level, so that it is immersed to a specified depth below the liquid surface, and the pH value of the etching solution is monitored in real time. When the pH value is too high, the second dosing pump 510 is started to add acidic neutralizing agent into the regulating tank 200. When the pH value is too low, the first dosing pump 310 is started to add alkaline neutralizing agent. The stirring mechanism stirs the liquid in the regulating tank 200 to make it fully mixed until the pH value reaches the set range. Then, the neutralized etching solution is discharged to the subsequent processing steps through the outlet at the bottom of the regulating tank 200. During cleaning, the water pump 410 and the lifting motor 240 are started. The water in the clean water tank 400 is pressurized by the water pump 410 and enters the telescopic hose 260 through the rotary joint. It is then delivered to the cleaning ring pipe 261 and sprayed evenly from the nozzle 262 at a 45° angle to rinse the inner wall of the tank. At the same time, the first screw 241 and the second screw 242 rotate synchronously under the drive of the drive device, so that the cleaning brush 250 moves slowly up and down along the inner wall of the tank. The flexible bristles are in close contact with the inner wall to wipe it in all directions. Combined with the water flow, it achieves efficient cleaning.

[0030] Obviously, the above embodiments of this utility model are merely examples for clearly illustrating this utility model, and are not intended to limit the implementation of this utility model. Those skilled in the art can make other variations or modifications based on the above description. It is neither necessary nor possible to exhaustively describe all embodiments here. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of this utility model should be included within the protection scope of the claims of this utility model.

Claims

1. A pH online adjustment device for alkaline etching solutions, characterized in that, include: The base includes a regulating tank in its center, and an alkali storage tank, a clean water tank, and an acid storage tank arranged sequentially on its outer side. A stirring mechanism is located in the center of the regulating tank, with a temperature detection device and a pH detection device on either side of the stirring mechanism. A first diverter and a second diverter are also located on either side of the stirring mechanism. The first diverter is connected to one end of a first dosing pump, and the other end of the first dosing pump is connected to the alkali storage tank. The second diverter is connected to one end of a second dosing pump, and the other end of the second dosing pump is connected to the acid storage tank. A lifting mechanism is also provided inside the regulating tank, with a cleaning brush that conforms to the inner wall of the regulating tank. A water cleaning assembly is located above the cleaning brush, and the water cleaning assembly is connected to the clean water tank via a water pump.

2. The pH online adjustment device for alkaline etching solution according to claim 1, characterized in that, A liquid level sensor is installed at the top of the inside of the regulating tank to detect the height of the liquid level inside the regulating tank.

3. The pH online adjustment device for alkaline etching solution according to claim 1, characterized in that, The pH detection device includes an electric push rod and a pH detection head disposed at the output end of the electric push rod; a sleeve is provided on the outside of the pH detection head, and the bottom of the sleeve is flush with the bottom of the pH detection head.

4. The pH online adjustment device for alkaline etching solution according to claim 1, characterized in that, The stirring mechanism includes a stirring motor installed at the top of the regulating tank and a stirring rod connected to the stirring motor. The stirring rod is located inside the regulating tank, with multiple turbine blades at the upper end and an anchor blade at the bottom.

5. The pH online adjustment device for alkaline etching solution according to claim 1, characterized in that, The lifting mechanism includes a lifting motor and two parallel screws, a first screw and a second screw, arranged on both sides inside the regulating tank. Each screw has a synchronous pulley, and the synchronous pulleys are connected by a synchronous belt. The lifting motor is fixedly connected to the upper end of the first screw.

6. The pH online adjustment device for alkaline etching solution according to claim 5, characterized in that, The cleaning brush is threadedly connected to the first screw and the second screw, respectively.

7. The pH online adjustment device for alkaline etching solution according to claim 6, characterized in that, The water cleaning assembly includes a rotary joint, a telescopic hose, a cleaning ring tube, and multiple nozzles; the rotary joint is located on the upper end face of the regulating tank, the cleaning ring tube is arranged around the cleaning brush above it, and the two ends of the telescopic hose are respectively connected to the rotary joint and the cleaning ring tube; the nozzles are evenly spaced on the cleaning ring tube.

8. The pH online adjustment device for alkaline etching solution according to claim 7, characterized in that, The nozzle is tilted downwards at a 45° angle.

9. A pH online adjustment device for alkaline etching solution according to claim 8, characterized in that, The water cleaning assembly also includes a guide tube, the outer wall of which is provided with a connection portion that is threaded to the first screw, and the telescopic hose passes through the guide tube and is connected to the cleaning ring tube.

10. A pH online adjustment device for alkaline etching solution according to any one of claims 1-9, characterized in that, A controller is also provided in front of the regulating tank. The controller is connected to the pH detection device and to the first dosing pump, the second dosing pump and the water pump.