Wafer brush roller drying box with built-in grid structure

Abstract

The utility model relates to a kind of wafer brush roller drying box with built-in net rack structure, it is related to wafer brush roller drying box technical field.It includes drying shell, the drying shell inside is provided with heating device, the side wall of drying shell is equipped with inlet, the side wall of inlet is rotatably connected with cover plate, the inner side wall of drying shell is provided with bearing rod, the bearing rod is used to set the wafer brush roller to be dried, the bearing rod is towards cover plate setting.The utility model makes it difficult to produce deformation in the process of drying wafer brush roller, reduces the effect of finished product's defective rate.

Description

Technical Field

[0001] This utility model relates to the field of wafer brush roller drying boxes, and in particular to a wafer brush roller drying box with a built-in mesh frame structure. Background Technology

[0002] In the semiconductor field, many identical circuits are fabricated on wafers (i.e., substrates) that have been processed into thin, circular plates, forming semiconductor integrated circuits. These integrate many devices onto a single chip to perform various processing and storage functions, making them arguably the fundamental building blocks of semiconductors. The process of manufacturing silicon wafers involves melting silicon raw materials extracted from sand at high temperatures to form a high-purity silicon solution. This solution is then allowed to grow and harden into columnar crystals, forming silicon ingots. To shape these ingots into disc-shaped wafers, diamond saws are used to cut them into wafers of uniform thickness. The cut wafers have defects and roughness on their surfaces, affecting circuit precision. Therefore, polishing fluids and polishing machines are used to polish the wafer surfaces, making them smooth and mirror-like.

[0003] The aforementioned wafer surface polishing process includes a cleaning process to remove various substances, such as metallic impurities, organic contaminants, and surface coatings like natural oxide films, including particles remaining on the wafer surface after various semiconductor device manufacturing processes (such as chemical mechanical polishing). During cleaning, wafer brush rollers are often used for surface treatment.

[0004] During the drying process in the manufacturing of wafer brush rollers, due to the high precision requirements of the finished wafer brush rollers, conventional drying ovens require a small number of wafer brush rollers to be added at a time to ensure uniform placement of each semi-finished product, resulting in low drying efficiency. However, if wafer brush rollers are stacked together for drying, it can easily cause the semi-finished wafer brush rollers to bend, affecting the quality of the finished product, thus requiring improvement. Utility Model Content

[0005] In order to improve the problem of low efficiency or easy deformation of wafer brush rollers in related technologies during the drying process, this utility model provides a wafer brush roller drying box with a built-in mesh frame structure.

[0006] The present invention provides a wafer brush roller drying box with a built-in mesh frame structure, which adopts the following technical solution:

[0007] A wafer brush roller drying box with a built-in mesh frame structure includes a drying shell, a heating device inside the drying shell, a feed inlet on the side wall of the drying shell, a cover plate rotatably connected to the side wall of the feed inlet, and a support rod on the inner side wall of the drying shell. The support rod is used to hold the wafer brush roller to be dried, and the support rod is positioned towards the cover plate.

[0008] By adopting the above technical solution, when the wafer brush roller drying box of this utility model is in use, the operator can put the wafer brush rollers on the support rods. The number of wafer brush rollers put on the support rods can be adjusted by using support rods of different lengths. Each support rod can be fitted with several wafer brush rollers for drying. During the drying process, the support rods maintain a distance from each other, so that the sidewalls of each wafer brush roller maintain a certain distance. This not only improves the drying efficiency, but also makes the wafer brush rollers less prone to deformation during the drying process, thus reducing the defect rate of the finished product.

[0009] Optionally, a plurality of support rods are provided, and the plurality of support rods are arranged alternately.

[0010] By adopting the above technical solution and using a staggered arrangement of several support rods, the wafer brush roller has a larger area for air circulation during the drying process, resulting in higher drying efficiency.

[0011] Optionally, a sliding ring is provided on the side wall of the support rod, the sliding ring is slidably connected to the support rod, an adjusting rod is rotatably connected to the side wall of the sliding ring, and a linkage rod is rotatably connected to the side wall of the adjusting rod, the end of the linkage rod away from the support rod is used to abut against the inner side wall of the wafer brush roller.

[0012] By adopting the above technical solution, when the operator places the wafer brush roller on the support rod, the sliding ring can be slid to drive the adjusting rod to rotate, which in turn drives the linkage rod to rotate until it is in contact with the inner wall of the wafer brush roller, thereby further supporting the wafer brush roller, reducing the possibility of deformation after the wafer brush roller is dried, and improving the quality of the finished product.

[0013] Optionally, a control motor is provided on the side wall of the sliding ring, and the output end of the control motor is connected to the adjusting rod. The control motor is used to control the rotation of the adjusting rod.

[0014] By adopting the above technical solution, the motor is controlled to drive the adjusting rod to rotate, thereby realizing the rotation and locking of the adjusting rod and further improving the stability of the linkage rod during wafer brush roller drying.

[0015] Optionally, a pair of sliding rings are provided, with the pair of sliding rings respectively located at both ends of the bearing rod. The pair of sliding rings are symmetrically arranged with the midpoint of the bearing rod as the center. A driving device for driving the pair of sliding rings to move is provided on the side wall of the bearing rod.

[0016] By adopting the above technical solution, the pair of sliding rings are controlled by the driving device, so that the pair of sliding rings move uniformly around the midpoint of the bearing rod, thereby enabling the pair of linkage rods to support the inner sidewall of the wafer brush roller at a symmetrical position, further reducing the defect rate of the wafer brush roller during drying.

[0017] Optionally, the driving device includes a driving box, a driving gear, a driving motor, and meshing plates. The driving box is sleeved on the support rod, the driving motor is disposed on the top wall of the driving box, the driving gear is located inside the driving box, the driving gear is connected to the output end of the driving motor, a pair of meshing plates are respectively attached to the inner side wall of the driving box, each meshing plate is respectively connected to a sliding ring, and the meshing plates are meshed with the driving gear.

[0018] By adopting the above technical solution, when the position of the sliding ring needs to be adjusted, the operator starts the drive motor, which drives the drive gear to rotate, and then drives a pair of meshing plates to rotate, thereby causing the sliding ring to slide. Through the above driving device, a pair of meshing plates can move at the same distance, thereby maintaining the symmetrical movement of a pair of sliding rings on the bearing rod, and improving the stability when controlling the rotation of the linkage rod.

[0019] Optionally, a bearing plate is provided on the side wall of the adjusting rod away from the bearing rod, and a stabilizing groove is provided on the side wall of the bearing plate near the adjusting rod. A stabilizing block is slidably connected in the stabilizing groove, and a pair of stabilizing blocks are provided. The stabilizing blocks are rotatably connected to the adjusting rod.

[0020] By adopting the above technical solution, the structure of the carrier plate allows the linkage rod and the carrier plate to move towards the inner wall of the wafer brush roller when the sliding ring drives the adjusting rod to move. This causes the carrier plate to abut against the inner wall of the wafer brush roller to be dried, thereby providing further support to the wafer brush roller and reducing the possibility of deformation of the wafer brush roller during drying.

[0021] Optionally, a fixing adhesive is provided on the side wall of the carrier plate away from the adjusting rod, and the fixing adhesive is attached to the inner side wall of the wafer brush roller.

[0022] By adopting the above technical solution, the structure of the fixed colloid makes it less likely to damage the inner wall of the wafer brush roller when the carrier sheet comes into contact with the wafer brush roller, thereby further improving the stability of supporting the inner wall of the wafer brush roller.

[0023] In summary, this utility model has at least one of the following beneficial effects:

[0024] 1. In the wafer brush roller drying box of this utility model, the operator can place the wafer brush rollers on the support rods. The number of wafer brush rollers placed on the support rods can be adjusted by using support rods of different lengths. Each support rod can hold several wafer brush rollers for drying. During the drying process, the support rods maintain a distance from each other, so that the side walls of each wafer brush roller maintain a certain distance. This not only improves the drying efficiency, but also makes the wafer brush rollers less prone to deformation during the drying process, thus reducing the defect rate of the finished product.

[0025] 2. When the operator places the wafer brush roller onto the support rod, the sliding ring can be slid to rotate the adjusting rod, which in turn rotates the linkage rod until it is in contact with the inner wall of the wafer brush roller. This further supports the wafer brush roller, reduces the possibility of deformation after drying, and improves the quality of the finished product. Attached Figure Description

[0026] Figure 1 This is a schematic diagram of the structure of Embodiment 1 of the present invention;

[0027] Figure 2 This is a schematic diagram of the structure of Embodiment 2 of the present invention;

[0028] Figure 3 This is a schematic diagram illustrating the connection between the drying shell and the support rod in Embodiment 2 of this utility model;

[0029] Figure 4 This is an enlarged schematic diagram of part A in Embodiment 2 of this utility model;

[0030] In the diagram: 1. Drying shell; 11. Feed inlet; 12. Cover plate; 13. Support rod; 2. Sliding ring; 21. Adjusting rod; 22. Linkage rod; 23. Control motor; 3. Drive device; 31. Drive box; 32. Drive gear; 33. Drive motor; 34. Meshing plate; 4. Support plate; 41. Stabilizing groove; 42. Stabilizing block; 43. Fixing colloid. Detailed Implementation

[0031] The following is in conjunction with the appendix Figure 1-4 The present invention will be described in further detail below.

[0032] This utility model discloses a wafer brush roller drying box with a built-in mesh frame structure.

[0033] Example 1

[0034] Reference Figure 1A wafer brush roller drying box with a built-in mesh frame structure includes a drying shell 1, which is hollow inside. An inlet 11 is formed through the side wall of the drying shell 1. A cover plate 12 is hinged to the inner side wall of the inlet 11 via a pivot, and the cover plate 12 is used to seal the inlet 11. A heating device is fixedly installed on the inner side wall of the drying shell 1 to heat the interior of the drying shell 1. Several support rods 13 are bolted to the inner side wall of the drying shell 1, and these support rods 13 are arranged in rows and columns. The operator can place the wafer brush roller onto the support rods 13 and heat it using the heating device for drying.

[0035] The implementation principle of a wafer brush roller drying box with a built-in mesh frame structure in this embodiment of the utility model is as follows: the operator directly places the wafer brush roller to be dried on the support rod 13 for drying. Since the support rods 13 maintain a distance between each other, the side walls of each wafer brush roller maintain a certain distance, which not only improves the drying efficiency, but also makes the wafer brush roller less prone to deformation during the drying process, thereby reducing the defect rate of the finished product.

[0036] Example 2

[0037] Reference Figure 2 , Figure 3 and Figure 4 The difference between Embodiment 2 and Embodiment 1 is that the support rods 13 are staggered inside the drying shell 1, and a driving device 3 is provided on the support rods 13. The driving device 3 includes a driving box 31, a driving gear 32, a driving motor 33, and a meshing plate 34. The driving box 31 is sleeved on the support rods 13, and the driving motor 33 is mounted on the side wall of the driving box 31, with its output end inserted inside the driving box 31. The driving gear 32 is rotatably connected to the output end of the driving motor 33 via a damping shaft. The meshing plate 34 is inserted inside the driving box 31, and a pair of meshing plates 34 are provided, each set against the opposite inner side wall of the driving box 31. The meshing plates 34 mesh with the driving gear 32. When the driving motor 33 drives the driving gear 32 to rotate, the driving gear 32 drives the pair of meshing plates 34 to move in a direction parallel to the support rods 13.

[0038] Reference Figure 3 and Figure 4A sliding ring 2 is fixedly connected to the end of the meshing plate 34 away from the drive box 31. Therefore, a pair of sliding rings 2 are provided, and the pair of sliding rings 2 are symmetrically arranged with the center position of the support rod 13 as the midpoint. The sliding ring 2 is sleeved on the support rod 13, and the sliding ring 2 is slidably connected to the support rod 13. A control motor 23 is fixedly installed on the side wall of the sliding ring 2 by bolts. An adjusting rod 21 is fixedly connected to the output end of the control motor 23, and the adjusting rod 21 rotates under the drive of the control motor 23. A linkage rod 22 is rotatably connected to the end of the adjusting rod 21 away from the control motor 23. The end wall of the linkage rod 22 is rotatably connected to the side wall of the support rod 13. When the wafer brush roller is sleeved on the support rod 13, the end wall of the linkage rod 22 abuts against the inner side wall of the wafer brush roller, thereby reducing the possibility of deformation of the wafer brush roller during drying.

[0039] Reference Figure 3 and Figure 4 A support plate 4 is provided on the end wall of the linkage rod 22 away from the support rod 13. A stabilizing groove 41 is formed on the side wall of the support plate 4 near the linkage rod 22. A stabilizing block 42 is inserted into the stabilizing groove 41 and is slidably connected to the stabilizing groove 41. The end of the linkage rod 22 away from the support rod 13 is rotatably connected to the side wall of the stabilizing block 42. The support plate 4 is disposed between a pair of linkage rods 22. A fixing adhesive 43 is glued to the end of the support plate 4 away from the linkage rod 22, and the fixing adhesive 43 is attached to the side wall of the wafer brush roller. The structure of the adjusting rod 21 and the linkage rod 22 is provided as a pair, and the pair of adjusting rods 21 and the linkage rod are respectively disposed on both sides of the support rod 13, thereby increasing the contact points between the support rod 13 and the wafer brush roller to be dried, thereby reducing the possibility of deformation of the wafer brush roller due to its own weight during drying.

[0040] The implementation principle of the wafer brush roller drying box with a built-in mesh frame structure in this embodiment of the present invention is as follows: When the wafer brush roller drying box with a built-in mesh frame structure in Embodiment 2 is used, the operator first places the wafer brush roller to be dried onto the support rod 13, then starts the drive motor 33, causing the drive motor 33 to drive the drive gear 32 to rotate, thereby causing a pair of sliding rings 2 to slide, thus causing the adjusting rod 21 to move. Next, the control motor 23 is started, causing the control motor 23 to drive the adjusting rod 21 to rotate, thereby causing the linkage rod 22 to rotate. The support plate 4 is in contact with the side wall of the wafer brush roller under the drive of the pair of linkage rods 22. Then, the wafer brush roller is dried by heating with a heating device, thereby reducing the possibility of deformation after drying and improving the quality of the finished product.

[0041] The above are all preferred embodiments of this utility model, and are not intended to limit the scope of protection of this utility model. Therefore, all equivalent changes made to the structure, shape and principle of this utility model should be covered within the scope of protection of this utility model.

Claims

1. A wafer brush roller drying box with a built-in mesh frame structure, characterized in that: The device includes a drying shell (1), which is equipped with a heating device. The drying shell (1) has a feed inlet (11) on its side wall. A cover plate (12) is rotatably connected to the side wall of the feed inlet (11). A support rod (13) is provided on the inner side wall of the drying shell (1). The support rod (13) is used to mount the wafer brush roller to be dried. The support rod (13) is positioned towards the cover plate (12).

2. The wafer brush roller drying box with a built-in mesh frame structure according to claim 1, characterized in that: The bearing rod (13) is provided in a plurality of places, and the plurality of bearing rods (13) are arranged alternately.

3. A wafer brush roller drying box with a built-in mesh frame structure according to claim 2, characterized in that: A sliding ring (2) is provided on the side wall of the support rod (13). The sliding ring (2) is slidably connected to the support rod (13). An adjusting rod (21) is rotatably connected to the side wall of the sliding ring (2). A linkage rod (22) is rotatably connected to the end wall of the sliding ring (2) away from the adjusting rod (21). The end of the linkage rod (22) away from the support rod (13) is used to abut against the inner side wall of the wafer brush roller.

4. A wafer brush roller drying box with a built-in mesh frame structure according to claim 3, characterized in that: A control motor (23) is provided on the side wall of the sliding ring (2). The output end of the control motor (23) is connected to the adjusting rod (21). The control motor (23) is used to control the rotation of the adjusting rod (21).

5. A wafer brush roller drying box with a built-in mesh frame structure according to claim 3, characterized in that: The sliding rings (2) are provided in pairs, and the pair of sliding rings (2) are respectively provided at both ends of the bearing rod (13). The pair of sliding rings (2) are symmetrically arranged with the midpoint of the bearing rod (13) as the center. The side wall of the bearing rod (13) is provided with a driving device (3) for driving the pair of sliding rings (2) to move.

6. A wafer brush roller drying box with a built-in mesh frame structure according to claim 5, characterized in that: The driving device (3) includes a driving box (31), a driving gear (32), a driving motor (33), and a meshing plate (34). The driving box (31) is sleeved on the support rod (13). The driving motor (33) is located on the top wall of the driving box (31). The driving gear (32) is located inside the driving box (31). The driving gear (32) is connected to the output end of the driving motor (33). A pair of meshing plates (34) are respectively attached to the inner side wall of the driving box (31). Each meshing plate (34) is connected to a sliding ring (2). The meshing plate (34) is meshed with the driving gear (32).

7. A wafer brush roller drying box with a built-in mesh frame structure according to claim 5, characterized in that: A bearing plate (4) is provided on the side wall of the adjusting rod (21) away from the bearing rod (13). A stabilizing groove (41) is provided on the side wall of the bearing plate (4) near the adjusting rod (21). A stabilizing block (42) is slidably connected in the stabilizing groove (41). A pair of stabilizing blocks (42) are provided. The stabilizing blocks (42) are rotatably connected to the adjusting rod (21).

8. A wafer brush roller drying box with a built-in mesh frame structure according to claim 7, characterized in that: A fixing adhesive (43) is provided on the side wall of the carrier plate (4) away from the adjusting rod (21), and the fixing adhesive (43) is attached to the inner side wall of the wafer brush roller.

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