A polishing liquid filtering device and a polishing machine

Abstract

The utility model discloses a kind of polishing liquid filtering device and polishing machine, belong to polishing liquid filtering technical field, and polishing liquid filtering device includes the cabinet for containing polishing liquid, further includes: first filtering module, including the liquid inlet being set on cabinet, grid and slag collection frame are set in liquid inlet, grid is provided with movable block, movable block can be close to or far from slag collection frame movement;Second filtering module, be below first filtering module, including the filter plate in the inside of cabinet, filter plate is obliquely arranged below liquid inlet;Third filtering module, including the filter screen being set in the inside of cabinet, and setting on cabinet fine filter and backwash pump, fine filter is communicated with backwash pump, and fine filter includes filter core, liquid outlet pipe and blowdown valve, filter core is located in the inside of fine filter, liquid outlet pipe is used to discharge polishing liquid that filtering is completed from cabinet, and blowdown valve is used to discharge impurity. The filtering effect of polishing liquid is enhanced by the way of multistage filtration, to improve the cleanliness of polishing liquid.

Description

Technical Field

[0001] This utility model relates to the field of polishing fluid filtration technology, and in particular to a polishing fluid filtration device and a polishing machine. Background Technology

[0002] Wet polishing technology, due to its superior cooling effect, lubrication performance, and efficient removal of grinding debris, has been widely used in high-precision polishing. However, the polishing process inevitably generates grinding debris, lint, polishing wax residue, and particles peeling off the workpiece surface. These impurities mix into the polishing fluid, adversely affecting the polishing operation. In the recycling process of the polishing fluid, the filtration process is crucial to ensuring its purity. However, existing filtration processes often fail to achieve ideal removal results when faced with these tiny and complex impurities. These residual impurities continue to contact the workpiece surface during polishing, not only causing secondary scratches and other surface defects, impairing the polishing precision, but also causing irreversible damage to the surface finish. Furthermore, these impurities accelerate the wear and clogging of consumables such as filter cartridges during filtration, leading to decreased filtration efficiency, increased replacement frequency, and further increasing the cost of polishing operations. Utility Model Content

[0003] The main purpose of this invention is to provide a polishing slurry filtration device and a polishing machine, which aims to solve the problem that the existing polishing slurry filtration process has poor impurity removal effect, which affects polishing accuracy and accelerates the wear of consumables.

[0004] To achieve the above objectives, this utility model proposes a polishing fluid filtration device, including a cabinet for containing polishing fluid, and further comprising: The first filtration module includes a liquid inlet installed on the cabinet, a grid and a slag collection frame installed inside the liquid inlet, and a movable block installed on the grid, which can move closer to or further away from the slag collection frame. The second filtration module is located below the first filtration module and includes a filter plate located inside the cabinet. The filter plate is inclined and located below the liquid inlet. The third filtration module includes a filter screen installed inside the cabinet, a fine filter and a backwash pump installed on the cabinet. The fine filter is connected to the backwash pump and includes a filter element, an outlet pipe and a drain valve. The filter element is located inside the fine filter, the outlet pipe is used to discharge the filtered polishing liquid out of the cabinet, and the drain valve is used to discharge impurities.

[0005] In some embodiments, the slag collection frame is disposed close to the inner wall of one side of the liquid inlet, and the grid is disposed between the inner wall of the other side of the liquid inlet and the slag collection frame to prevent impurities from entering the cabinet through the liquid inlet.

[0006] In some embodiments, the inlet is further provided with a cylinder connected to the movable block for driving the movable block to move.

[0007] In some embodiments, the movable block is provided with rake teeth on the side facing the grid, and the rake teeth move on the grid as the movable block moves.

[0008] In some embodiments, the filter plate is provided with a plurality of filter holes, and the filter plate includes an inclined section and a horizontal section. The inclined section is connected to the liquid inlet, and the horizontal section is connected to the cabinet. The horizontal section is located at a position lower than that of the liquid inlet.

[0009] In some embodiments, the filter screen divides the interior of the cabinet into a first chamber and a second chamber, the liquid inlet is connected to the first chamber, the filter plate is located in the first chamber, the backwash pump is connected to the second chamber, and the fine filter is connected to the second chamber through the backwash pump.

[0010] In some embodiments, the fine filter further includes a pressure sensor for detecting the pressure difference of the filter element.

[0011] In some embodiments, the cabinet is also equipped with a liquid level sensor and a pressure relief pipe. The liquid level sensor is used to detect the liquid level in the second cavity, and the pressure relief pipe is used to balance the air pressure inside and outside the cabinet.

[0012] In some embodiments, the cabinet is further provided with a control module, which includes a PLC controller and an HMI (Human Machine Interface), and the HMI is electrically connected to the PLC controller.

[0013] This utility model further proposes a polishing machine, which includes the above-mentioned polishing liquid filtration device.

[0014] This invention discloses a polishing slurry filtration device and a polishing machine. By incorporating a first, second, and third filtration module within the filtration device, the cleanliness of the polishing slurry is significantly improved through multi-stage filtration. This enhances the recycling rate of the polishing slurry, ensuring a continuous supply of high-purity slurry to the polishing machine. This not only effectively prevents secondary scratches on the workpiece during polishing but also directly improves the polishing precision and surface finish. Furthermore, a backwashing pump is included to clean the filter element by altering the flow direction of the polishing slurry. This eliminates the need for frequent disassembly, cleaning, or replacement of the filter element, extending its lifespan and allowing the filtration device to operate continuously for a longer period. Attached Figure Description

[0015] Figure 1 This is a schematic diagram of one embodiment of the polishing liquid filtration device of this utility model; Figure 2 This is a schematic diagram of one embodiment of the polishing liquid filtration device of this utility model; Figure 3 This is a schematic diagram of one embodiment of the polishing liquid filtration device of this utility model; Figure 4 This is a schematic diagram of one embodiment of the polishing liquid filtration device of this utility model.

[0016] Explanation of icon numbers: Cabinet 100; Liquid inlet 110; Grille 111; Slag collection frame 112; Movable block 113; Cylinder 114; Filter plate 120; Filter screen 130; Fine filter 140; Liquid outlet pipe 141; Drain valve 142; Backwash pump 150; Liquid level sensor 160; Pressure relief pipe 170; Control module 180. Detailed Implementation

[0017] The solutions in the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this utility model, and not all of them. Based on the embodiments of this utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of this utility model.

[0018] It should be noted that all directional indicators (such as up, down, left, right, front, back, etc.) in this utility model embodiment are only used to explain the relative positional relationship and movement of each component in a certain specific posture (as shown in the figure). If the specific posture changes, the directional indicator will also change accordingly.

[0019] It should also be noted that when a component is described as "fixed to" or "set on" another component, it can be directly on the other component or there may be an intervening component present. When a component is described as "connected to" another component, it can be directly connected to the other component or there may be an intervening component present.

[0020] Furthermore, the use of terms such as "first" and "second" in this utility model is for descriptive purposes only and should not be construed as indicating or implying their relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. Additionally, the technical solutions of the various embodiments can be combined with each other, but only on the basis of being achievable by those skilled in the art. When the combination of technical solutions is contradictory or impossible to implement, such a combination of technical solutions should be considered non-existent and not within the scope of protection claimed by this utility model.

[0021] This utility model proposes a polishing fluid filtration device, including a cabinet 100 for containing polishing fluid, and further comprising: The first filtration module includes an inlet 110 set on the cabinet 100. The inlet 110 is equipped with a grid 111 and a slag collection frame 112. The grid 111 is equipped with a movable block 113, which can move closer to or further away from the slag collection frame 112. The second filtration module is located below the first filtration module and includes a filter plate 120 located inside the cabinet 100. The filter plate 120 is inclined and located below the liquid inlet 110. The third filtration module includes a filter screen 130 installed inside the cabinet 100, a fine filter 140 installed on the cabinet 100, and a backwash pump 150. The fine filter 140 is connected to the backwash pump 150, and the fine filter 140 includes a filter element, an outlet pipe 141, and a drain valve 142. The filter element is located inside the fine filter 140, the outlet pipe 141 is used to discharge the filtered polishing liquid out of the cabinet 100, and the drain valve 142 is used to discharge impurities.

[0022] Please see Figures 1 to 4 The polishing slurry filtration device proposed in this application includes a cabinet 100 for containing polishing slurry. A first filtration module, a second filtration module and a third filtration module are provided on the cabinet 100 for filtering the polishing slurry multiple times to ensure that the purity of the polishing slurry can be recycled, thereby improving the precision and efficiency of polishing work.

[0023] Specifically, the first filtration module includes an inlet 110, a grid 111, and a slag collection frame 112. The inlet 110 is located on the cabinet 100 and communicates with the interior of the cabinet 100. The polishing liquid to be filtered flows into the cabinet 100 through the inlet 110. The grid 111 and the slag collection frame 112 are located inside the inlet 110. After the polishing liquid enters the inlet 110, it first passes through the grid 111. The grid 111 filters out and adsorbs larger floating objects in the polishing liquid, such as lint and water-soluble wax, preventing these larger impurities from entering the interior of the cabinet 100. This achieves the first filtration of the polishing liquid. It is worth mentioning that a movable block 113 is also provided on the grid 111. The movable block 113 can move on the grid 111 and can move closer to or further away from the slag collection frame 112 as needed. By setting the movable block 113, the impurities adsorbed on the grid 111 can be pushed into the slag collection frame 112 to improve the efficiency of impurity treatment.

[0024] Here, the second filtration module includes a filter plate 120, which is located below the liquid inlet 110 and inside the cabinet 100. After the polishing fluid undergoes its first filtration through the grille 111, it falls onto the filter plate 120. It is important to note that the filter plate 120 is angled. This angled design significantly slows the flow rate of the polishing fluid on the filter plate 120 compared to direct descent, increasing the residence time of the polishing fluid on the filter plate 120 and ensuring its filtration effectiveness. As the polishing fluid flows on the filter plate 120, impurities in the fluid gradually settle and accumulate on the surface of the filter plate 120 under the influence of gravity. This further intercepts impurities in the polishing fluid, thus achieving a second filtration.

[0025] The third filtration module includes a filter screen 130 and a fine filter 140. The filter screen 130 is located inside the cabinet 100 and divides the internal space of the cabinet 100 into two parts: one side of the filter screen 130 is the first chamber, and the other side is the second chamber. The filter plate 120 is located inside the first chamber. After the polishing liquid undergoes a second filtration through the filter plate 120, it passes from the first chamber through the filter screen 130 and enters the second chamber, where the filter screen 130 performs a third filtration. The cabinet 100 also includes a fine filter 140 and a backwash pump 150. The fine filter 140 is connected to the backwash pump 150 and contains a filter element. An outlet pipe 141 is also installed on the fine filter 140. Powered by the backwash pump 150, the polishing liquid in the second chamber is discharged through the outlet pipe 141 on the fine filter 140. During this process, the polishing liquid undergoes a fourth filtration through the filter element within the fine filter 140. In summary, the polishing slurry undergoes multi-stage filtration through the first, second, and third filtration modules, significantly improving its cleanliness. Therefore, the recycling rate of the polishing slurry is increased, ensuring a continuous supply of high-purity slurry to the polishing machine. This not only effectively avoids secondary scratches that may occur on the workpiece during polishing but also directly improves the polishing precision and surface finish of the workpiece.

[0026] It is important to note that a drain valve 142 is also installed on the fine filter 140. During prolonged use, a large amount of impurities will inevitably accumulate on the filter element. When these impurities accumulate to a certain level, they can cause the filter element to become clogged. At this point, the backwash pump 150 cleans the filter element by changing the flow direction of the polishing fluid. This flushing process effectively removes impurities from the filter element, restoring its filtration capacity, while the flushed-off impurities are discharged through the drain valve 142. This design eliminates the need for frequent disassembly, cleaning, or replacement of the filter element, extending its service life.

[0027] In some embodiments, the slag collection frame 112 is disposed close to the inner wall of one side of the liquid inlet 110, and the grid 111 is disposed between the inner wall of the other side of the liquid inlet 110 and the slag collection frame 112, for blocking impurities from entering the cabinet 100 through the liquid inlet 110.

[0028] In some embodiments, the inlet 110 is further provided with a cylinder 114 connected to the movable block 113 for driving the movable block 113 to move.

[0029] In some embodiments, the movable block 113 is provided with rake teeth on the side facing the grid 111, and the rake teeth move on the grid 111 as the movable block 113 moves.

[0030] like Figure 2 As shown, in this embodiment, the slag collection frame 112 is located inside the liquid inlet 110 and is fixed to the inner wall of one side of the liquid inlet 110. One end of the grille 111 is connected to the slag collection frame 112, and the other end of the grille 111 is connected to the inner wall of the other side of the liquid inlet 110. This design allows the polishing liquid to pass through the grille 111 first when it enters the liquid inlet 110, filtering out and adsorbing floating lint and water-soluble wax in the polishing liquid onto the grille 111. This performs the first filtration of the polishing liquid, effectively removing the mixture of lint and water-soluble wax, thus protecting subsequent filter elements and preventing clogging. In other embodiments, the grille 111 can also be used in conjunction with a filter screen, with a filter screen placed below the grille 111 to jointly perform the first filtration of the polishing liquid.

[0031] A cylinder 114 is installed at the liquid inlet 110. The movable block 113 is connected to the telescopic rod of the cylinder 114, and the cylinder 114 drives the movable block 113 to move closer to or away from the slag collection frame 112. To ensure the stable operation of the cylinder 114 and prevent the polishing liquid from interfering with it, a protective cover is installed on the liquid inlet 110, and the cylinder 114 is located inside the protective cover. A row of rake teeth is also provided on the contact surface between the movable block 113 and the grid 111. When the movable block 113 moves with the cylinder 114, this row of rake teeth can scrape off the impurities adsorbed on the grid 111 and send these impurities into the slag collection frame 112. In addition, multiple filter holes are opened at the bottom of the slag collection frame 112. These filter holes allow the polishing liquid to permeate through, while solid impurities are trapped on the slag collection frame 112. Over time, these solid impurities will gradually dry out. This design not only improves the efficiency of impurity removal but also ensures the continuous cleanliness of the surface of the grille 111, thus guaranteeing the filtration effect of the grille 111.

[0032] In some embodiments, the filter plate 120 is provided with a plurality of filter holes, and the filter plate 120 includes an inclined section and a horizontal section. The inclined section is connected to the liquid inlet 110, and the horizontal section is connected to the cabinet 100. The horizontal section is located at a position lower than that of the liquid inlet 110.

[0033] like Figure 3 and Figure 4 As shown, in this embodiment, the filter plate 120 has multiple filter holes and includes an inclined section and a horizontal section. The inclined section is connected to the liquid inlet 110, and the horizontal section is connected to the cabinet 100. After the polishing liquid passes through the grid 111 for the first filtration, it falls onto the inclined section of the filter plate 120. The inclined section slows down the flow rate of the polishing liquid on the filter plate 120, thereby extending the residence time of the polishing liquid on the filter plate 120. This allows the filter plate 120 sufficient filtration time, enabling impurities in the polishing liquid to settle and accumulate on the surface of the filter plate 120. Furthermore, since the horizontal section of the filter plate 120 is lower than the inclined section, under the action of gravity, most of the impurities accumulated on the inclined section will roll to the horizontal section, eventually forming an impurity accumulation on the horizontal section. This design facilitates the centralized treatment of impurities and improves the efficiency of impurity treatment.

[0034] In some embodiments, the filter screen 130 divides the interior of the cabinet 100 into a first cavity and a second cavity, the liquid inlet 110 is connected to the first cavity, the filter plate 120 is located in the first cavity, the backwash pump 150 is connected to the second cavity, and the fine filter 140 is connected to the second cavity through the backwash pump 150.

[0035] In some embodiments, the fine filter 140 further includes a pressure sensor for detecting the pressure difference of the filter element.

[0036] In some embodiments, the cabinet 100 is also provided with a liquid level sensor 160 and a pressure relief pipe 170. The liquid level sensor 160 is used to detect the liquid level in the second cavity, and the pressure relief pipe 170 is used to balance the air pressure inside and outside the cabinet 100.

[0037] In some embodiments, the cabinet 100 is further provided with a control module 180, which includes a PLC controller and an HMI human-machine interface, and the HMI human-machine interface is electrically connected to the PLC controller.

[0038] like Figure 1 and Figure 3As shown, in this embodiment, the filter 130 divides the internal space of the cabinet 100 into a first chamber and a second chamber. The backwash pump 150 is connected to the second chamber, and the fine filter 140 is also connected to the second chamber via the backwash pump 150, so that the polishing fluid in the second chamber is discharged through the outlet pipe 141 on the fine filter 140, thereby continuously providing the polishing machine with high-purity polishing fluid and improving the recycling rate of the polishing fluid. In practical operation, the polishing slurry enters through inlet 110 and undergoes its first filtration at the grid 111 at inlet 110. The polishing slurry filtered through grid 111 flows into the first chamber, where it undergoes a second filtration on filter plate 120. After passing through filter plate 120, the polishing slurry then passes through filter screen 130 into the second chamber, where it undergoes a third filtration. The polishing slurry in the second chamber is then discharged from the outlet pipe 141 of the fine filter 140 under the power provided by backwash pump 150. The polishing slurry undergoes a fourth filtration at the filter element within the fine filter 140. For applications requiring extremely high polishing slurry cleanliness, a membrane filtration unit can be integrated into the filter element within the fine filter 140 to achieve more thorough solid-liquid separation through physical interception, ensuring the polishing slurry meets high-purity recycling standards.

[0039] In addition, a liquid level sensor 160 and a pressure relief pipe 170 are installed on the cabinet 100. The liquid level sensor 160 is used to detect changes in the liquid level of the polishing fluid in the second chamber. This design ensures that operators can accurately grasp the amount of polishing fluid in the second chamber, so as to replenish or adjust it in a timely manner. The pressure relief pipe 170 connects the second chamber to the outside. During the circulation and filtration of the polishing fluid, air pressure fluctuations may occur inside the cabinet 100 due to various reasons. Since the pressure relief pipe 170 is connected to the outside, the gas can be discharged, which can balance the air pressure difference inside and outside the cabinet 100 and improve the overall reliability.

[0040] It is worth noting that a pressure sensor is also installed inside the fine filter 140 to detect the pressure difference of its internal filter element. A control module 180 is also installed on the cabinet 100. The control module 180 includes a PLC controller and an HMI (Human-Machine Interface). The PLC controller is used to precisely control the overall operation of the polishing fluid filtration device proposed in this application. The HMI is electrically connected to the PLC controller, allowing operators to monitor the working status of the polishing fluid filtration device in real time and perform necessary operations and adjustments through various buttons, indicator lights, and displays on the HMI. This provides operators with a visual interactive platform, improving operational convenience.

[0041] For example, when the pressure sensor detects that the pressure difference of the filter element reaches a preset value, it indicates that the filter element is clogged. At this time, the PLC controller starts the backwash pump 150 to change the flow direction of the polishing liquid or pressurize the polishing liquid to flush the surface of the filter element and remove the impurities adsorbed on the filter element. At the same time, the PLC controller controls the shut-off valve on the outlet pipe 141 to close, so that the polishing liquid cannot be discharged from the outlet pipe 141, and opens the drain valve 142 on the fine filter 140, so that the impurities flushed off the filter element can be discharged from the drain valve 142. This eliminates the need for frequent disassembly, cleaning or replacement of the filter element, extends the service life of the filter element, reduces maintenance intensity and operating costs, and enables the polishing liquid filtration device to operate continuously for a longer period of time.

[0042] The polishing machine further proposed in this utility model includes the polishing liquid filtration device described above. The specific structure of the polishing liquid filtration device is as described in the above embodiments. Since this polishing machine adopts all the technical solutions of all the above embodiments, it has at least all the technical effects brought about by the technical solutions of the above embodiments, which will not be described in detail here.

[0043] In summary, this application proposes a polishing slurry filtration device and a polishing machine. By incorporating a first, second, and third filtration module within the polishing slurry filtration device, multi-stage filtration of the polishing slurry significantly improves its cleanliness. This enhances the recycling rate of the polishing slurry, enabling a continuous supply of high-purity polishing slurry to the polishing machine. This not only effectively prevents secondary scratches on the workpiece during polishing but also directly improves the polishing precision and surface finish of the workpiece. Furthermore, a backwash pump 150 is included to clean the filter element by altering the flow direction of the polishing slurry. This eliminates the need for frequent disassembly, cleaning, or replacement of the filter element, extending its service life, reducing maintenance intensity and operating costs, and allowing the polishing slurry filtration device to operate continuously for a longer period.

[0044] The above description is only a part or preferred embodiment of this utility model. Neither the text nor the drawings should limit the scope of protection of this utility model. All equivalent structural transformations made using the content of this utility model specification and drawings under the overall concept of this utility model, or direct / indirect applications in other related technical fields, are included within the scope of protection of this utility model.

Claims

1. A polishing fluid filtration device, comprising a cabinet for containing polishing fluid, characterized in that, Also includes: The first filtration module includes a liquid inlet provided on the cabinet, a grid and a slag collection frame provided inside the liquid inlet, and a movable block provided on the grid, which can move closer to or away from the slag collection frame. The second filter module is located below the first filter module and includes a filter plate located inside the cabinet. The filter plate is inclinedly arranged below the liquid inlet. The third filtration module includes a filter screen installed inside the cabinet, a fine filter and a backwash pump installed on the cabinet. The fine filter is connected to the backwash pump and includes a filter element, a liquid outlet pipe and a drain valve. The filter element is located inside the fine filter. The liquid outlet pipe is used to discharge the filtered polishing liquid out of the cabinet, and the drain valve is used to discharge impurities.

2. The polishing fluid filtration device according to claim 1, characterized in that, The slag collection frame is installed close to the inner wall of one side of the liquid inlet, and the grille is installed between the inner wall of the other side of the liquid inlet and the slag collection frame to prevent impurities from entering the cabinet through the liquid inlet.

3. The polishing fluid filtration device according to claim 2, characterized in that, The liquid inlet is also equipped with a cylinder connected to the movable block, which is used to drive the movable block to move.

4. The polishing fluid filtration device according to claim 3, characterized in that, The movable block is provided with rake teeth on the side facing the grid, and the rake teeth move on the grid as the movable block moves.

5. The polishing fluid filtration device according to claim 1, characterized in that, The filter plate is provided with multiple filter holes, and the filter plate includes an inclined section and a horizontal section. The inclined section is connected to the liquid inlet, and the horizontal section is connected to the cabinet. The horizontal section is located at a position lower than that of the liquid inlet.

6. The polishing fluid filtration device according to claim 1, characterized in that, The filter screen divides the interior of the cabinet into a first cavity and a second cavity. The liquid inlet is connected to the first cavity. The filter plate is located in the first cavity. The backwash pump is connected to the second cavity. The fine filter is connected to the second cavity through the backwash pump.

7. The polishing slurry filtration device according to claim 6, characterized in that, The fine filter also includes a pressure sensor for detecting the pressure difference of the filter element.

8. The polishing slurry filtration device according to claim 6, characterized in that, The cabinet is also equipped with a liquid level sensor and a pressure relief pipe. The liquid level sensor is used to detect the liquid level in the second cavity, and the pressure relief pipe is used to balance the air pressure inside and outside the cabinet.

9. The polishing slurry filtration device according to any one of claims 1 to 8, characterized in that, The cabinet is also equipped with a control module, which includes a PLC controller and an HMI (human-machine interface). The HMI is electrically connected to the PLC controller.

10. A polishing machine, characterized in that, Includes the polishing fluid filtration device according to any one of claims 1 to 9.

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