A polishing device for chamfering a quartz wafer

Abstract

The utility model discloses a polishing device of quartz piece chamfer, include: mainframe, limiting mechanism, adjusting mechanism, mounting structure and polishing disc, and polishing disc can rotate horizontally relative mainframe, and mounting structure can be relative mainframe in vertical plane and turn, and mounting structure includes mounting plate, motor and mounting assembly, and mounting plate is hinged on mainframe, and quartz piece is fixed on mounting assembly, and motor is connected with mounting assembly transmission, and adjusting mechanism is located below mounting plate and is arranged on the side close to motor, and limiting mechanism is located below mounting plate and is arranged on the side close to mounting assembly, and adjusting mechanism is connected with mounting plate transmission, is used for driving mounting plate to rotate around hinged point to mounting structure and limiting mechanism and abuts, to make mounting structure be located at working position, adjusting mechanism is also used for providing the down pressure to the chamfer of quartz piece, to make polishing disc polish the chamfer. The utility model can realize the polishing of quartz piece chamfer of metallographic polishing machine.

Description

Technical Field

[0001] This utility model relates to the field of quartz processing and manufacturing technology, specifically to a polishing device for beveling quartz sheets. Background Technology

[0002] Quartz has a very low coefficient of thermal expansion, resulting in minimal dimensional change with temperature variations. This gives it excellent resistance to thermal shock, allowing it to withstand rapid temperature changes without easily breaking. Its Mohs hardness is approximately 7, classifying it as a relatively hard material, making it scratch- and wear-resistant. Furthermore, its high melting point ensures stable physical properties and structure over a wide temperature range. Combined with its piezoelectric effect, it is widely used in hemispherical resonator gyroscopes, for example, in fabricating hemispherical resonator oscillators and creating spherical or planar electrodes to excite their vibration. To meet the clamping requirements before product processing or the assembly requirements of the final product, chamfering is typically required on cylindrical quartz bodies or quartz sheets. Chamfers achieved by grinding with tools or grinding wheels have a high surface roughness and cannot be directly used in the manufacture of high-precision parts; therefore, a suitable polishing device is needed. This invention provides a polishing solution suitable for chamfering quartz sheets, which is simple in structure and easy to operate. Utility Model Content

[0003] To address the problems in the background art, this utility model proposes a polishing device for chamfering quartz plates, which can realize the polishing of chamfered quartz plates by a metallographic polishing machine.

[0004] The present invention adopts the following technical solution: A polishing apparatus for beveling quartz plates, comprising: The system includes a main frame, a limiting mechanism and an adjusting mechanism mounted on the main frame, a mounting structure rotatably mounted on the main frame, and a polishing disc. The polishing disc can rotate horizontally relative to the main frame, and the mounting structure can rotate vertically relative to the main frame. The mounting structure includes a mounting plate, a motor fixed to the mounting plate, and a mounting assembly. The mounting plate is hinged to the main frame, the quartz disc is fixed to the mounting assembly, and the motor is connected to the mounting assembly for driving the quartz disc to rotate axially. Both the adjustment mechanism and the limiting mechanism are located below the mounting plate, and are respectively arranged on both sides of the mounting plate hinge point along the length of the mounting plate. The adjustment mechanism is arranged on the side closer to the motor, and the limiting mechanism is arranged on the side closer to the mounting component. The adjustment mechanism is connected to the mounting plate drive and is used to drive the mounting plate to rotate around the hinge point until the mounting structure abuts against the limiting mechanism, so that the mounting structure is in the working position. The adjustment mechanism is also used to apply downward pressure to the chamfer of the quartz plate so that the polishing disc polishes the chamfer.

[0005] Optionally, the adjustment mechanism includes a drive cylinder, an upper hinge seat, and a lower hinge seat. The drive cylinder is hinged to the mounting plate via the upper hinge seat, and the drive cylinder is hinged to the main frame via the lower hinge seat.

[0006] Optionally, the limiting mechanism includes a mounting frame and a support member disposed on the mounting frame, one end of the support member in the length direction abutting against the mounting structure, and its length is adjustable relative to the main frame.

[0007] Optionally, the support can be a stop screw threaded to the main frame, or a micrometer fixed to the main frame.

[0008] Optionally, the mounting structure also includes a slide table with a groove, in which the mounting plate is disposed and can slide along the axial direction of the mounting structure. A detachable connection structure is provided between the slide table and the mounting plate for fixing the two together.

[0009] Optionally, the mounting assembly includes a rotating shaft, a mounting sleeve, and a mounting base. The mounting sleeve is fixed to the mounting plate, and the rotating sleeve is disposed on the mounting sleeve and is rotatably connected to the mounting sleeve in a sealed manner. Both ends of the rotating shaft extend out of the mounting sleeve, one end is connected to the motor drive, and the other end is fixed to the mounting base. There is an air extraction channel between the rotating shaft, the mounting sleeve, and the mounting base. One end of the air extraction channel is connected to a vacuum pump. A quartz plate can seal the other end of the air extraction channel so that it is adsorbed onto the mounting base after the vacuum pump evacuates the air extraction channel.

[0010] Optionally, the rotating shaft has an axially arranged central hole, the mounting sleeve has a first air hole on its side wall, the first air hole is connected to the inner cavity of the mounting sleeve, the rotating shaft has a second air hole on its side wall, the second air hole is connected to the central hole of the rotating shaft, and the mounting base has an air passage connected to the central hole, the first air hole, the inner cavity of the mounting sleeve, the second air hole, the central hole of the rotating shaft and the air passage of the mounting base are connected to form the air extraction channel.

[0011] Optionally, the rotating shaft and the mounting sleeve are rotatably connected by a ball bearing, and oil seals are provided on both sides of the ball bearing in the axial direction to ensure that the rotating shaft and the mounting sleeve are rotatably connected in a sealed manner.

[0012] Optionally, one end of the rotating shaft mounting base has a slot, one end of the mounting base is locked in the slot and fixed to the rotating shaft by a locking screw, and the other end of the mounting base facing the quartz plate has an adsorption groove, the quartz plate can close the adsorption groove, the locking screw has a first air distribution channel, one end of the first air distribution channel is connected to the central hole, and the other end is connected to the adsorption groove through a second air distribution channel opened on the mounting base. The first air distribution channel opened by the locking screw, the second air distribution channel opened on the mounting base, and the adsorption groove are connected to form the air channel of the mounting base.

[0013] Optionally, the polishing disc is connected to a rotary drive mechanism for driving the polishing disc to rotate horizontally in the circumferential direction.

[0014] Optionally, the main frame is provided with a support mechanism, which includes a support frame, a support seat fixed on the support frame, and a support plate fixed on the support seat. The support frame is fixed on the main frame, the lower hinge seat is provided on the support plate, and the main hinge seat is also installed on the support plate. The slide is hinged to the main hinge seat, and the limiting mechanism is fixed on the support seat.

[0015] Optionally, the main hinge seat includes a spindle and a hinge sleeve, which are rotatably connected by a hinge bearing. The two ends of the spindle extend out of the hinge sleeve and are fixedly connected to the support seat, and the slide is fixedly connected to the hinge sleeve.

[0016] Compared with the prior art, the advantages of this utility model are: This utility model discloses a polishing device for chamfering quartz plates. It uses a metallographic polishing machine's polishing disc to polish the chamfer on the quartz plate. The device features smooth rotation, low noise, and ensures high-quality chamfering. Since the polishing disc is made of a soft material, while quartz is hard and brittle, a certain downward pressure is required during polishing. This device utilizes an adjustment mechanism on the side of the mounting structure's hinge point near the motor and a limiting mechanism on the other side near the mounting component. The adjustment mechanism drives the mounting component to rotate around the hinge point until the mounting structure abuts against the limiting mechanism, thus limiting the rotation direction of the mounting structure. At this point, the chamfer of the quartz plate is in contact with the polishing disc, and the mounting structure is in the working position. Simultaneously with activating the polishing disc, the adjustment mechanism provides adjustable downward pressure to the chamfer of the quartz plate, enabling the metallographic polishing machine to polish the chamfer of the quartz plate. Attached Figure Description

[0017] To facilitate understanding of this invention, it will be described in more detail with reference to the specific embodiments shown in the accompanying drawings. These drawings depict only typical embodiments of this invention and should not be considered as limiting the scope of protection of this invention.

[0018] Figure 1 This is a front view structural schematic diagram of the polishing device for chamfering quartz plates according to an embodiment of the present invention.

[0019] Figure 2 This is a cross-sectional structural diagram of the polishing device for chamfering quartz plates according to an embodiment of the present invention.

[0020] Figure 3 This is a front exploded view of the polishing device for chamfering quartz plates according to an embodiment of the present invention.

[0021] Figure 4 This is a three-dimensional exploded view of the polishing device for beveling quartz plates according to an embodiment of the present invention.

[0022] Figure 5 This is a partial cross-sectional view of the polishing device for chamfering quartz plates according to an embodiment of the present invention.

[0023] Figure label: 1. Mounting structure; 11. Slide table; 12. Mounting plate; 13. First motor; 14. Fixing bracket; 15. Coupling; 151. Axial through groove; 152. Slot; 16. End cover; 17. Mounting bushing; 171. First air hole; 172. Inner cavity; 18. Mounting seat; 181. Adsorption tank; 182. Second air distribution channel; 2. Hinge seat; 20. Outer oil seal; 21. Ball bearing; 22. Inner oil seal; 23. Rotating shaft; 231. Second air hole; 232. 233. Center hole; 24. Slot; 25. Locking screw; 26. First air distribution channel; 27. Hinge bushing; 28. Dust cover; 29. ​​Hinge bearing; 20. Fixing plate; 20. Mandrel; 31. Limiting mechanism; 32. Mounting bracket; 43. Support component; 44. Adjusting mechanism; 45. Upper hinge seat; 46. Lower hinge seat; 57. Drive cylinder; 58. Support mechanism; 59. Support base; 50. Support plate; 60. Main frame; 71. Polishing disc; 82. Quartz plate. Detailed Implementation

[0024] The embodiments of the present invention are described below with reference to the accompanying drawings, so that those skilled in the art can better understand and implement the present invention. However, the listed embodiments are not intended to limit the present invention. In the absence of conflict, the following embodiments and the technical features in the embodiments can be combined with each other, wherein the same components are indicated by the same reference numerals.

[0025] like Figures 1-5 As shown, this embodiment provides a polishing apparatus for beveling quartz plates, comprising: The main frame 6, the limiting mechanism 3 and the adjusting mechanism 4 are provided on the main frame 6, and the mounting structure 1 and the polishing disc 7 are rotatably mounted on the main frame 6. The polishing disc 7 can rotate horizontally relative to the main frame 6, and the mounting structure can rotate in a vertical plane relative to the main frame 6. Mounting structure 1 includes a mounting plate 12, a motor 13 fixed to the mounting plate 12, and a mounting assembly. The mounting plate 12 is hinged to the main frame 6. The quartz disc is fixed to the mounting assembly. The motor 13 is connected to the mounting assembly for driving the quartz disc to rotate circumferentially via the mounting assembly. The adjusting mechanism 4 and the limiting mechanism 3 are both located below the mounting plate 12, and are respectively arranged on both sides of the hinge point of the mounting plate 12 along the length of the mounting plate 12. The adjusting mechanism 4 is arranged on the side closer to the motor 13, and the limiting mechanism 3 is arranged on the side closer to the mounting assembly. The adjustment mechanism 4 is connected to the mounting plate 12 via a transmission, and is used to drive the mounting plate 12 to rotate around the hinge point until the mounting structure abuts against the limiting mechanism 3, so that the mounting structure is in the working position. The adjustment mechanism 4 is also used to apply downward pressure to the chamfer of the quartz plate so that the polishing disc 7 polishes the chamfer.

[0026] This utility model discloses a polishing device for chamfering quartz plates. It uses a metallographic polishing machine's polishing disc to polish the chamfer on the quartz plate. The device features smooth rotation, low noise, and ensures high-quality chamfering. Since the polishing disc is made of a soft material, while quartz is hard and brittle, a certain downward pressure is required during polishing. This device utilizes an adjustment mechanism on the side of the mounting structure's hinge point near the motor and a limiting mechanism on the other side near the mounting component. The adjustment mechanism drives the mounting component to rotate around the hinge point until the mounting structure abuts against the limiting mechanism, thus limiting the rotation direction of the mounting structure. At this point, the chamfer of the quartz plate is in contact with the polishing disc, and the mounting structure is in the working position. Simultaneously with activating the polishing disc, the adjustment mechanism provides adjustable downward pressure to the chamfer of the quartz plate, enabling the metallographic polishing machine to polish the chamfer of the quartz plate.

[0027] In this embodiment, the adjustment mechanism 4 includes a drive cylinder 43, an upper hinge seat 41, and a lower hinge seat 42. The drive cylinder 43 is hinged to the mounting plate 12 through the upper hinge seat 41, and the drive cylinder 43 is hinged to the main frame 6 through the lower hinge seat 42.

[0028] In this embodiment, the limiting mechanism 3 includes a mounting frame 31 and a support member 32 disposed on the mounting frame 31. One end of the support member 32 in the length direction abuts against the mounting structure, and its length is adjustable relative to the main frame 6.

[0029] By first adjusting the length of the support component of the limiting mechanism, and then driving the installation structure to abut against the support component through the adjustment mechanism, the tilt angle of the chamfer can be controlled, thereby achieving polishing of chamfers at different angles and controlling the amount of polishing.

[0030] In this embodiment, the support member 32 is a stop screw that is threadedly connected to the main frame 6, or a micrometer fixed on the main frame 6.

[0031] In this embodiment, the mounting structure also includes a slide table 11, which has a sliding groove. The mounting plate 12 is disposed in the sliding groove and can slide along the axial direction of the mounting structure. A detachable connection structure is provided between the slide table 11 and the mounting plate 12 to fix the two together.

[0032] By adjusting the relative position of the slide table 11 and the mounting plate, the distance between the mounting structure 1 and the polishing disc 7 can be adjusted so that the quartz disc is positioned in a suitable polishing position. After the position is adjusted, the two are fixed together by fasteners.

[0033] In this embodiment, the mounting assembly includes a rotating shaft 23, a mounting sleeve 17, and a mounting base 18. The mounting sleeve 17 is fixed on the mounting plate 12. The rotating shaft 23 is sleeved on the mounting sleeve 17 and is rotatably connected to the mounting sleeve 17 in a sealed manner. Both ends of the rotating shaft 23 extend out of the mounting sleeve 17. One end is connected to the motor 13 for transmission, and the other end is fixed to the mounting base 18. There is a vacuum channel between the rotating shaft 23, the mounting sleeve 17, and the mounting base 18. One end of the vacuum channel is connected to a vacuum pump. A quartz plate can seal the other end of the vacuum channel so that it can be adsorbed onto the mounting base 18 after the vacuum pump evacuates the vacuum channel.

[0034] Motor 13 is fixed to mounting plate 12 by bracket 14. The motor shaft of motor 13 is fixed to one end of rotating shaft 23 via coupling 15. The side wall of coupling 15 has an axial through groove and a circumferential 1 / 4 groove. The axial through groove communicates with its center hole, and the circumferential 1 / 4 groove communicates with the axial through groove. The purpose of the axial through groove is to increase the elasticity of the coupling and the magnitude of the tightening force, while the circumferential 1 / 4 groove is to adjust the tightening effect when the two connecting shafts are not concentric. If the rotating shaft 23 and the rotating shaft of motor 13 are misaligned, the tightening force of the screws can be increased or decreased by adjusting the part closer to motor 13 (or the part closer to rotating shaft 23).

[0035] In this embodiment, the rotating shaft 23 has an axially arranged central hole 232, the mounting sleeve 17 has a first air hole 171 on its side wall, the first air hole 171 is connected to the inner cavity 172 of the mounting sleeve 17, the rotating shaft 23 has a second air hole 231 on its side wall, the second air hole 231 is connected to the central hole 232 of the rotating shaft 23, and the mounting base 18 has an air passage connected to the central hole 232. The first air hole 171, the inner cavity 172 of the mounting sleeve 17, the second air hole 231, the central hole 232 of the rotating shaft 23 and the air passage of the mounting base 18 are connected to form an air extraction channel.

[0036] In this embodiment, the rotating shaft 23 and the mounting sleeve 17 are rotatably connected by a ball bearing 21. Oil seals are provided on both sides of the ball bearing 21 in the axial direction so that the rotating shaft 23 and the mounting sleeve 17 are rotatably connected in a sealed manner.

[0037] An oil seal is located between the rotating shaft 23 and the mounting sleeve 17, and includes an outer oil seal 20 and an inner oil seal 22. An end cover 16 is also provided at the connection end of the rotating shaft 23 and the motor 13, and the outer oil seal 20 at this end is located between the end cover 16 and the mounting sleeve 17.

[0038] In this embodiment, a slot is provided at one end of the mounting base 18 for fixing the rotating shaft 23. One end of the mounting base 18 is locked in the slot and fixed to the rotating shaft 23 by the locking screw 24. An adsorption groove 181 is provided at the other end of the mounting base facing the quartz plate. The quartz plate can close the adsorption groove 181. A first air distribution channel 241 is provided on the locking screw 24. One end of the first air distribution channel 241 is connected to the central hole 232, and the other end is connected to the adsorption groove 181 through a second air distribution channel 182 provided on the mounting base 18. The first air distribution channel 241 provided on the locking screw 24, the second air distribution channel 182 provided on the mounting base 18, and the adsorption groove 181 are connected to form the air passage of the mounting base 18.

[0039] In this embodiment, the polishing disk 7 is connected to a rotary drive mechanism, which is used to drive the polishing disk to rotate horizontally in the circumferential direction.

[0040] In this embodiment, the main frame 6 is provided with a support mechanism 5. The support mechanism 5 includes a support frame 53, a support seat 51 fixed on the support frame 53, and a support plate 52 fixed on the support seat 51. The support frame 53 is fixed on the main frame 6. The lower hinge seat 42 is provided on the support plate 52. The main hinge seat 2 is also installed on the support plate 52. The slide table 11 is hinged to the main hinge seat 2. The limiting mechanism 3 is fixed on the support seat 51.

[0041] In this embodiment, the main hinge seat 2 includes a spindle 29 and a hinge sleeve 25. The spindle 29 and the hinge sleeve 25 are rotatably connected by a hinge bearing 27. The two ends of the spindle 29 extend out of the hinge sleeve 25 and are fixedly connected to the support seat 4. The slide 11 is fixedly connected to the hinge sleeve 25.

[0042] Specifically, dust covers 26 are fixed at both ends of the spindle 29, and the lower end of the dust cover 26 is fixedly connected to a fixing plate 28. The fixing plate 28 is detachably installed on the support base 51.

[0043] The polishing device in this embodiment achieves the polishing process of chamfering the quartz plate as follows: Step 1: Install the support mechanism 5 on the main frame, hinge the structure 1 and the adjustment mechanism 4 on the support plate 52 of the support mechanism 5, and fix the limiting mechanism 3 on its support base 51. Step 2: Install structure 1. By adjusting the relative positions of the slide table 11 and the connecting plate 12, the quartz plate is positioned at a suitable polishing position on the metallographic polishing machine. The slide table 11 and the connecting plate 12 are then fixed with fasteners. Step 3: Vacuum the air extraction channel through the first air hole 171, put the quartz plate 8 into the mounting base 18, so that the quartz plate 8 can be adsorbed on the mounting base 18 under negative pressure; start the motor 13, so that the quartz plate 8 can rotate under the drive of the motor 13; start the gold camera rotation movement simultaneously. Step 4: Activate the adjustment mechanism 4 to allow the mounting structure 1 to move towards the main frame 6 under the drive of the hinge seat 2 until the mounting structure 1 contacts the limiting mechanism 3. Step 5: Adjust the length of the support member 32 of the limiting mechanism 3 so that the chamfer of the quartz plate 8 contacts the polishing abrasive on the polishing disc 7. The adjusting mechanism 4 provides downward pressure to polish the chamfer to the required roughness. The length of the support member 32 can be finely adjusted during polishing to facilitate the adjustment of the removal amount.

[0044] The embodiments described above are merely preferred embodiments of this utility model. The terms "in one embodiment," "in another embodiment," "in yet another embodiment," or "in still another embodiment" used in this specification all refer to one or more of the same or different embodiments according to this disclosure. Ordinary variations and substitutions made by those skilled in the art within the scope of this utility model's technical solution should be included within the protection scope of this utility model.

Claims

1. A polishing apparatus for beveling quartz plates, characterized in that, include: The main frame (6), the limiting mechanism (3) and the adjusting mechanism (4) are provided on the main frame (6), and the mounting structure (1) and the polishing disc (7) are rotatably mounted on the main frame (6). The polishing disc (7) can rotate horizontally relative to the main frame (6), and the mounting structure can rotate in a vertical plane relative to the main frame (6). The mounting structure (1) includes a mounting plate (12), a motor (13) fixed on the mounting plate (12), and a mounting assembly. The mounting plate (12) is hinged to the main frame (6), the quartz disc is fixed on the mounting assembly, and the motor (13) is connected to the mounting assembly for driving the quartz disc to rotate axially through the mounting assembly. The adjusting mechanism (4) and the limiting mechanism (3) are both located below the mounting plate (12) and are respectively arranged on both sides of the hinge point of the mounting plate (12) along the length of the mounting plate (12). The adjusting mechanism (4) is arranged on the side closer to the motor (13), and the limiting mechanism (3) is arranged on the side closer to the mounting assembly. The adjustment mechanism (4) is connected to the mounting plate (12) for driving the mounting plate (12) to rotate around the hinge point until the mounting structure abuts against the limiting mechanism (3) so that the mounting structure is in the working position; The adjustment mechanism (4) is also used to provide downward pressure to the chamfer of the quartz plate so that the polishing disc (7) polishes the chamfer.

2. The polishing apparatus for chamfering quartz plates according to claim 1, characterized in that, The adjustment mechanism (4) includes a drive cylinder (43), an upper hinge seat (41) and a lower hinge seat (42). The drive cylinder (43) is hinged to the mounting plate (12) through the upper hinge seat (41), and the drive cylinder (43) is hinged to the main frame (6) through the lower hinge seat (42).

3. The polishing apparatus for chamfering quartz plates according to claim 1, characterized in that, The limiting mechanism (3) includes a mounting frame (31) and a support member (32) provided on the mounting frame (31). One end of the support member (32) in the length direction abuts against the mounting structure, and its length is adjustable relative to the main frame (6).

4. The polishing apparatus for chamfering quartz plates according to claim 3, characterized in that, The support (32) is a stop screw that is threaded to the main frame (6), or a micrometer fixed on the main frame (6).

5. The polishing apparatus for chamfering quartz plates according to claim 1, characterized in that, The mounting structure also includes a slide (11), which has a groove. The mounting plate (12) is located in the groove and can slide along the axial direction of the mounting structure. A detachable connection structure is provided between the slide (11) and the mounting plate (12) to fix the two together.

6. The polishing apparatus for beveling quartz plates according to any one of claims 1-5, characterized in that, The mounting assembly includes a rotating shaft (23), a mounting sleeve (17), and a mounting base (18). The mounting sleeve (17) is fixed on the mounting plate (12). The rotating shaft (23) is sleeved on the mounting sleeve (17) and is sealed and rotatably connected to the mounting sleeve (17). Both ends of the rotating shaft (23) extend out of the mounting sleeve (17). One end is connected to the motor (13) for transmission, and the other end is fixed to the mounting base (18). There is an air extraction channel between the rotating shaft (23), the mounting sleeve (17), and the mounting base (18). One end of the air extraction channel is connected to a vacuum pump. The quartz plate can seal the other end of the air extraction channel so that it can be adsorbed onto the mounting base (18) after the vacuum pump pump evacuates the air extraction channel.

7. The polishing apparatus for chamfering quartz plates according to claim 6, characterized in that, The rotating shaft (23) has an axially arranged central hole (232), and the side wall of the mounting sleeve (17) has a first air hole (171). The first air hole (171) is connected to the inner cavity (172) of the mounting sleeve (17). The side wall of the rotating shaft (23) has a second air hole (231). The second air hole (231) is connected to the central hole (232) of the rotating shaft (23). The mounting base (18) has an air passage connected to the central hole (232). The first air hole (171), the inner cavity (172) of the mounting sleeve (17), the second air hole (231), the central hole (232) of the rotating shaft (23) and the air passage of the mounting base (18) are connected to form the air extraction channel.

8. The polishing apparatus for chamfering quartz plates according to claim 7, characterized in that, The rotating shaft (23) and the mounting bushing (17) are rotatably connected by a ball bearing (21). Oil seals are provided on both sides of the ball bearing (21) in the axial direction so that the rotating shaft (23) and the mounting bushing (17) are rotatably connected in a sealed manner.

9. The polishing apparatus for chamfering quartz plates according to claim 7, characterized in that, A slot is provided at one end of the mounting base (18) for the rotating shaft (23). One end of the mounting base (18) is locked in the slot and fixed to the rotating shaft (23) by a locking screw (24). An adsorption groove (181) is provided at the other end of the mounting base facing the quartz plate. The quartz plate can close the adsorption groove (181). A first air distribution channel (241) is provided on the locking screw (24). One end of the first air distribution channel (241) is connected to the central hole (232). The other end is connected to the adsorption groove (181) through a second air distribution channel (182) opened on the mounting base (18). The first air distribution channel (241) opened by the locking screw (24), the second air distribution channel (182) opened on the mounting base (18), and the adsorption groove (181) are connected to form the air passage of the mounting base (18).

10. The polishing apparatus for chamfering quartz plates according to claim 5, characterized in that, The main frame (6) is provided with a support mechanism (5). The support mechanism (5) includes a support frame (53), a support seat (51) fixed on the support frame (53), and a support plate (52) fixed on the support seat (51). The support frame (53) is fixed on the main frame (6). The lower hinge seat (42) is provided on the support plate (52). The main hinge seat (2) is also installed on the support plate (52). The slide (11) is hinged to the main hinge seat (2). The limiting mechanism (3) is fixed on the support seat (51).

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