Chemical polishing device for microcrystalline glass

Abstract

The utility model belongs to glass polishing technical field, concretely is a kind of chemical polishing device of microcrystalline glass, including the material placing assembly of the positionable microcrystalline glass to be polished, and the material placing assembly is provided with the shift subassembly that can adjust polishing strength, position as needed, and the polishing subassembly is provided on shift subassembly and has mechanical and chemical polishing function. The utility model is convenient for setting hollow shaft, liquid inlet disc and liquid discharge disc, which can be filled with polishing liquid, on the lifting and transverse moving carrier, and setting liquid discharge plate below the liquid discharge disc, which can periodically change the flow direction and flow rate of polishing liquid, and polishing plate for mechanical polishing of microcrystalline glass, so that the device can perform chemical corrosion and mechanical grinding cooperatively or alternately in one station, thereby realizing uniform, efficient and high-precision polishing of microcrystalline glass.

Description

Technical Field

[0001] This utility model belongs to the field of glass polishing technology, specifically relating to a chemical polishing device for microcrystalline glass. Background Technology

[0002] Chemical polishing equipment for microcrystalline glass is a key process equipment for achieving high surface quality and integrity of microcrystalline glass. Its core function lies in utilizing the chemical corrosion effect of the polishing slurry to selectively react with the surface of the microcrystalline glass, generating an easily removable softening layer, which is then uniformly peeled off mechanically, thereby achieving ultra-smooth, damage-free processing, obtaining a surface with nanoscale roughness, and eliminating microcracks and stress layers generated in previous processing.

[0003] Chinese patent document CN223130401U discloses a continuous polishing device for microcrystalline glass, which realizes continuous workpiece feeding through a transmission belt and uses a height-adjustable diamond polishing wheel for mechanical grinding. It also integrates an automatic chip cleaning and collection mechanism to improve the automation and continuity of the roughing stage.

[0004] However, in the existing technology, for composite materials such as glass-ceramics, which are composed of hard crystalline phases and glass phases, simple mechanical polishing can remove the material, but hard abrasive particles will inevitably cause scratches on the surface and cause grain shedding. Simple chemical polishing, on the other hand, results in uneven corrosion rates due to the difference in chemical properties between the two phases of the material, making it difficult to obtain a consistent and smooth surface quality. Therefore, a chemical polishing device for glass-ceramics is proposed. Utility Model Content

[0005] The purpose of this invention is to provide a chemical polishing device for microcrystalline glass.

[0006] The technical solution adopted in this utility model is as follows:

[0007] A chemical polishing apparatus for microcrystalline glass includes a material placement component for positioning the microcrystalline glass to be polished, a displacement component for adjusting the polishing force and position as needed, and a polishing component that combines mechanical and chemical polishing functions.

[0008] The material feeding assembly includes a frame, within which a turntable is movably mounted;

[0009] The shifting assembly includes a carrier mounted above the turntable;

[0010] The polishing assembly includes a polishing component capable of uniformly spraying liquid and performing mechanical double polishing;

[0011] The polishing component includes a hollow shaft that is movably mounted on a carrier and passes through it. A liquid inlet plate is fixedly connected to the bottom of the hollow shaft, and a liquid outlet plate is fixedly connected to the bottom of the liquid inlet plate. Multiple insert rods are fixedly mounted on the liquid inlet plate. Springs are provided on the outer side of the insert rods. A support rod is provided on one side of the springs. Rollers are fixedly connected to the top of the support rods. A baffle is fixedly mounted under the carrier between the multiple rollers. A liquid outlet plate is fixedly connected to the lower end of the support rods. A polishing plate is fixedly connected to the lower side of the liquid outlet plate.

[0012] The polishing assembly also includes a drive unit that enables the polished part to operate as needed, and a liquid guide unit that continuously introduces external polishing liquid into the polished part.

[0013] Preferably, the driving component includes a third driving unit fixedly mounted above the carrier, and a second pulley set is provided between the output end of the third driving unit and the hollow shaft.

[0014] Preferably, the liquid guiding component includes a second rotary joint fixedly connected above the hollow shaft, and a pipe is fixedly connected above the second rotary joint.

[0015] Preferably, the hollow shaft, inlet plate, outlet plate, and baffle are all coaxial, the inlet plate and outlet plate are hollow, and multiple insert rods are arranged at equal angular intervals around the axis of the hollow shaft radially.

[0016] Preferably, a main drain cone hole is provided on the bottom side of the drain tray, and a secondary drain cone hole corresponding to the adjacent main drain cone hole is provided on the drain plate, wherein the corresponding main drain cone hole and secondary drain cone hole are not coaxial.

[0017] Preferably, the carrier is rotatably connected to the hollow shaft, the spring and the support rod are slidably connected to the insertion rod, and the drain plate is slidably connected to the drain plate.

[0018] The beneficial effects of this utility model are as follows: by setting a hollow shaft, an inlet plate, and an outlet plate for the polishing liquid to be introduced on a liftable and horizontally movable carrier, and by setting an outlet plate below the outlet plate that can periodically change the outflow direction and flow rate of the polishing liquid, as well as a polishing plate for mechanically polishing microcrystalline glass, this device can perform chemical corrosion and mechanical grinding in one station in a coordinated or alternating manner, thereby achieving uniform, efficient and high-precision polishing of microcrystalline glass. Attached Figure Description

[0019] The accompanying drawings are provided to further illustrate the present invention and form part of the specification. They are used together with the following detailed description to explain the present invention, but do not constitute a limitation thereof. In the drawings:

[0020] Figure 1 This is a schematic diagram of the structure of a chemical polishing device for microcrystalline glass according to the present invention;

[0021] Figure 2This is a left-side view of the chemical polishing device for microcrystalline glass described in this utility model;

[0022] Figure 3 yes Figure 1 Schematic diagram of some component structures;

[0023] Figure 4 yes Figure 2 A schematic diagram of the cross-sectional structure of the frame;

[0024] Figure 5 yes Figure 1 Schematic diagram of some component structures;

[0025] Figure 6 yes Figure 5 A schematic diagram of the structure of some components from another perspective;

[0026] Figure 7 yes Figure 5 sectional structural diagram of some components;

[0027] Figure 8 yes Figure 5 A schematic diagram of some of the component structures.

[0028] The annotations in the attached figures are explained as follows:

[0029] 1. Material feeding assembly; 101. Frame; 102. Turntable; 103. First drive unit; 104. First pulley assembly; 105. Pump; 106. First rotary joint; 107. Filter unit; 108. Drain valve; 2. Shifting assembly; 201. Upright pole; 202. Top frame; 203. Hydraulic cylinder; 204. Lifting frame; 205. Second drive unit; 206. Limiting rod; 207. Carrier frame; 3. Polishing assembly; 301. Hollow shaft; 302. Inlet tray; 303. Drain tray; 304. Insert rod; 305. Spring; 306. Support rod; 307. Roller; 308. Baffle; 309. Drain plate; 310. Polishing plate; 311. Third drive unit; 312. Second pulley assembly; 313. Second rotary joint; 314. Connecting pipe. Detailed Implementation

[0030] In the description of this utility model, it should be understood that the terms "center," "longitudinal," "lateral," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," and "outer," etc., indicating orientation or positional relationships based on the orientation or positional relationships shown in the accompanying drawings, are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model. Furthermore, the terms "first," "second," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, features defined with "first," "second," etc., may explicitly or implicitly include one or more of that feature. In the description of this utility model, unless otherwise stated, "a plurality of" means two or more.

[0031] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0032] The present invention will be further described below with reference to the embodiments and accompanying drawings.

[0033] like Figures 1-8 As shown, a chemical polishing device for microcrystalline glass includes a material placement component 1 for positioning the microcrystalline glass to be polished, a displacement component 2 for adjusting the polishing intensity and position as needed, and a polishing component 3 for combining mechanical and chemical polishing functions.

[0034] In this embodiment: the material feeding assembly 1 includes a frame 101, a turntable 102 is movably installed in the frame 101, a first drive unit 103 is fixedly installed in the frame 101, a first pulley group 104 is provided between the turntable 102 and the first drive unit 103, a pump 105 is fixedly installed on the frame 101 in front of the first drive unit 103, a first rotary joint 106 is fixedly connected below the turntable 102, a filter unit 107 is provided between the air inlet end of the pump 105 and the first rotary joint 106, and drain valves 108 are fixedly installed on both sides of the frame 101;

[0035] A hollow frame 101 with a certain depth provides mounting positions for a turntable 102, a first drive unit 103, and a support pole 201. The hollow turntable 102, rotatably connected to the frame 101 and equipped with an adsorption hole at the center of its upper side and insertion holes at its edges, holds the microcrystalline glass to be polished. When the adsorption hole on the turntable 102 is under negative pressure, the microcrystalline glass can be adsorbed and fixed. The insertion holes on the turntable 102 provide insertion positions for external clamps that further fix the microcrystalline glass. The rotation of the output end of the first drive unit 103 (composed of a motor and reducer) is transmitted to the turntable 102 via pulleys connected to the lower part of the turntable 102 and the output end of the first drive unit 103, and a belt between the two pulleys. This allows the turntable 102 to rotate under the first drive unit 103. After the moving unit 103 starts running, it rotates at the required speed in the cavity of the frame 101. Through the filter unit 107, which can be composed of connecting pipes, filters, etc., and after being connected to the air inlet of the pump 105 and the lower end of the first rotary joint 106 respectively, the running pump 105 can continuously draw air from the rotating turntable 102 through the relatively stationary filter unit 107 and the first rotary joint 106, so that a negative pressure is continuously formed at the adsorption hole of the turntable 102. After the filter unit 107 is equipped with an oleophobic and hydrophobic filter element, it can effectively prevent the pump 105 from sucking in the trace polishing liquid that enters the turntable 102 through the adsorption hole. Through the drain valve 108 connected to the drain port of the cavity of the frame 101, the solid-liquid mixture flowing into the cavity of the frame 101 through the polishing component 3 can be conveniently discharged from the device.

[0036] In this embodiment: the shifting component 2 includes multiple uprights 201 fixedly installed on the rear of the frame 101. A top frame 202 is fixedly connected above the uprights 201. A hydraulic cylinder 203 is fixedly installed on the top frame 202. A lifting frame 204 movably connected to the uprights 201 is provided below the top frame 202. A second drive unit 205 is fixedly installed inside the lifting frame 204. The second drive unit 205 includes a support, a lead screw, a motor, etc. The support is fixedly installed on both sides of the lifting frame 204. A lead screw is movably connected between the two supports. A motor is fixedly installed on one side of the lifting frame 204 at one end of the lead screw. Limiting rods 206 located above and below the lead screw are fixedly installed inside the lifting frame 204. A carrier frame 207 is provided between the lead screw and the limiting rods 206.

[0037] The upright 201 is slidably connected to the lifting frame 204, the support is rotatably connected to the lead screw, the lifting frame 204 and the limit rod 206 are both slidably connected to the carrier 207, and the lead screw is connected to the carrier 207 by a thread.

[0038] The top frame 202 and the lifting frame 204 are installed by the upright 201. The hydraulic cylinder 203, which is installed on the top frame 202 and whose telescopic end is connected to the lifting frame 204, drives the lifting frame 204 and other components to rise and fall vertically along the length of the upright 201 after operation. The second drive unit 205, after operation, drives the carrier 207, which is limited by the lifting frame 204 and the limit rod 206, to move horizontally along the length of the limit rod 206.

[0039] In this embodiment: the polishing component 3 includes a polishing part that can uniformly spray liquid and perform mechanical double polishing, a driving part that can make the polishing part operate as needed, and a liquid guiding part that can continuously introduce external polishing liquid into the polishing part.

[0040] The polishing component includes a hollow shaft 301 movably mounted on and passing through a carrier 207. A liquid inlet plate 302 is fixedly connected below the hollow shaft 301, and a liquid outlet plate 303 is fixedly connected below the liquid inlet plate 302. Multiple insert rods 304 are fixedly mounted on the liquid inlet plate 302. Springs 305 are provided on the outer side of each insert rod 304. A support rod 306 is provided on one side of each spring 305. Rollers 307 are fixedly connected above the support rod 306. A mounting bracket fixedly mounted on the carrier 207 is provided between the multiple rollers 307. The baffle 308 below 7 has a drain plate 309 fixedly connected to the lower end of the support rod 306, a polishing plate 310 fixedly connected to the lower side of the drain plate 303, the driving component includes a third driving unit 311 fixedly installed above the carrier 207, a second pulley group 312 is provided between the output end of the third driving unit 311 and the hollow shaft 301, and the liquid guiding component includes a second rotary joint 313 fixedly connected above the hollow shaft 301, and a pipe 314 fixedly connected above the second rotary joint 313;

[0041] Hollow shaft 301, inlet plate 302, outlet plate 303, and baffle 308 are all coaxial. Inlet plate 302 and outlet plate 303 are hollow. Multiple insert rods 304 are arranged at equal angles around the axis of hollow shaft 301 radially. The bottom side of outlet plate 303 is provided with a main outlet cone hole. The outlet plate 309 is provided with a secondary outlet cone hole corresponding to the adjacent main outlet cone hole. The corresponding main outlet cone hole and secondary outlet cone hole are not coaxial. The carrier 207 is rotatably connected to hollow shaft 301. Spring 305 and support rod 306 are slidably connected to insert rods 304. Outlet plate 303 is slidably connected to outlet plate 309.

[0042] The inlet plate 302, connected to the drain plate 303, is installed via the hollow shaft 301. The insert rod 304, connected to the drain plate 303 and radially arranged along the hollow shaft 301, provides mounting positions for the spring 305 and the support rod 306. The spring 305 allows the support rod 306 to overcome the centrifugal force generated by the rotation of the hollow shaft 301, and drives the roller 307 to continuously move towards the baffle 308. The baffle 308, with its regularly varying distance from its outer contour to the axis of the hollow shaft 301, allows the roller 307 to periodically oscillate along the radial direction of the drain plate 309 via the support rod 306 when contacting different parts of the baffle 308's outer contour. The drain plate 309, equipped with a secondary drain cone hole, oscillates during this periodic oscillation. The main drain cone hole on the bottom side of the drain tray 303 is continuously misaligned, thereby changing the flow rate and direction of the polishing agent. The polishing plate 310, which is in a rotating state, mechanically polishes the microcrystalline glass after contacting it. The second pulley group 312, which consists of pulleys connected to the output end of the third drive unit 311, the outer side of the hollow shaft 301, and the belt between the two pulleys, drives the hollow shaft 301, the inlet tray 302, the drain tray 303, etc. to rotate at the required speed after the third drive unit 311, which consists of a motor and a reducer, is running. The second rotary joint 313 enables the pipe 314 connected to the external liquid supply equipment to continuously introduce the polishing agent supplied by the external liquid supply equipment into the hollow shaft 301 while it is relatively stationary.

[0043] Working principle: When this device is installed for chemical polishing of microcrystalline glass, after the pump 105 starts working, the microcrystalline glass to be polished is placed in the center on the turntable 102. After the microcrystalline glass is fixed by adsorption or adsorption combined with clamping, the height of the carrier 207 is adjusted by the hydraulic cylinder 203 after the first drive unit 103 and the third drive unit 311 are running, until the polishing plate 310 fully contacts the microcrystalline glass and polishes it. During this process, the lateral position of the hollow shaft 301, etc. can also be adjusted by the second drive unit 205 after it is running, thereby changing the operating area of ​​the polishing plate 310.

[0044] To improve polishing quality, an external liquid supply device connected to the nozzle 314 can be used to continuously inject polishing slurry containing chemical components into the device. After the polishing slurry enters the drain plate 303 through the nozzle 314, the second rotary joint 313, the hollow shaft 301, and the inlet plate 302, it flows out through the main drain cone hole on the bottom side of the drain plate 303. As the roller 307 and other components rotate around the baffle 308 with the insert rod 304 and the spring 305, the drain plate 309 will periodically swing below the drain plate 303 with the support rod 306. This allows the polishing slurry to fully contact the polished part of the microcrystalline glass through different degrees of misalignment between its secondary drain cone hole and the main drain cone hole of the drain plate 303.

[0045] The preferred embodiments of the present invention have been described in detail above with reference to the accompanying drawings. However, the present invention is not limited to the above embodiments. Within the scope of knowledge possessed by those skilled in the art, various changes can be made without departing from the spirit of the present invention.

Claims

1. A chemical polishing apparatus for microcrystalline glass, characterized in that: It includes a material placement component (1) for positioning microcrystalline glass to be polished, and a displacement component (2) is provided on the material placement component (1) for adjusting the polishing intensity and position as needed. The displacement component (2) is provided with a polishing component (3) that has both mechanical and chemical polishing functions. The material feeding assembly (1) includes a frame (101), and a turntable (102) is movably installed inside the frame (101); The shifting assembly (2) includes a carrier (207) disposed above the turntable (102); The polishing assembly (3) includes a polishing component capable of uniformly spraying liquid and performing mechanical double polishing; The polishing component includes a hollow shaft (301) movably mounted on and passing through the carrier (207). A liquid inlet plate (302) is fixedly connected below the hollow shaft (301), and a liquid outlet plate (303) is fixedly connected below the liquid inlet plate (302). Multiple insert rods (304) are fixedly mounted on the liquid inlet plate (302). A spring (305) is provided on the outer side of the insert rod (304). A support rod (306) is provided on one side of the spring (305). A roller (307) is fixedly connected above the support rod (306). A baffle (308) is fixedly mounted below the carrier (207) between the multiple rollers (307). A drain plate (309) is fixedly connected to the lower end of the support rod (306). A polishing plate (310) is fixedly connected to the lower side of the drain plate (303). The polishing assembly (3) also includes a drive unit that enables the polishing component to operate as needed, and a liquid guide unit that continuously introduces external polishing liquid into the polishing component.

2. The chemical polishing apparatus for microcrystalline glass according to claim 1, characterized in that: The drive unit includes a third drive unit (311) fixedly installed above the carrier (207), and a second pulley group (312) is provided between the output end of the third drive unit (311) and the hollow shaft (301).

3. The chemical polishing apparatus for microcrystalline glass according to claim 2, characterized in that: The liquid guiding component includes a second rotary joint (313) fixedly connected above the hollow shaft (301), and a connecting pipe (314) is fixedly connected above the second rotary joint (313).

4. The chemical polishing apparatus for microcrystalline glass according to claim 1, characterized in that: The hollow shaft (301), the liquid inlet plate (302), the liquid outlet plate (303), and the baffle (308) are all coaxial. The liquid inlet plate (302) and the liquid outlet plate (303) are both hollow. A plurality of the insert rods (304) are arranged at equal angular intervals around the axis of the hollow shaft (301) radially.

5. The chemical polishing apparatus for microcrystalline glass according to claim 4, characterized in that: The bottom side of the drain plate (303) is provided with a main drain cone hole, and the drain plate (309) is provided with a secondary drain cone hole corresponding to the adjacent main drain cone hole. The corresponding main drain cone hole and the secondary drain cone hole are not coaxial.

6. The chemical polishing apparatus for microcrystalline glass according to claim 5, characterized in that: The carrier (207) is rotatably connected to the hollow shaft (301), the spring (305) and the support rod (306) are slidably connected to the insertion rod (304), and the drain plate (303) is slidably connected to the drain plate (309).

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