A semiconductor cmp retaining ring blasting positioning fixture

Abstract

The utility model discloses a kind of semiconductor CMP retaining ring sand blasting positioning fixture including support table, circular through slot two being set in the inner wall of support table top end, further include: inner support mechanism, fixedly installed in the inner wall of the bottom end of support table;Shielding mechanism, installed in the top end of inner support mechanism;Rotary mechanism, fixedly connected to one side of inner support mechanism;The inner support mechanism includes: upper support, the outer wall of its bottom end is fixedly connected with lower support, and upper support passes through circular through slot two;Multiple extrusion rods, equidistantly set in the circumferential inner wall of upper support, and the inner end of each extrusion rod is respectively fixedly connected with circular support plate;Multiple springs are respectively sleeved on multiple extrusion rods, the utility model discloses semiconductor CMP retaining ring sand blasting positioning fixture has while guaranteeing stable clamping, and clamping surface is smaller, more easily guaranteeing the uniformity of sand blasting, while releasing workbench surface space, avoid the effect of traditional exposed fixture dust accumulation.

Description

Technical Field

[0001] This utility model relates to the field of CMP retaining rings, and more particularly to a semiconductor CMP retaining ring sandblasting positioning fixture. Background Technology

[0002] CMP retaining rings are core components of the chemical mechanical polishing (CMP) process in semiconductor manufacturing. They are used to fix the wafer and ensure stable positioning during polishing, while also addressing the issue of over-grinding at the edges.

[0003] In semiconductor chemical mechanical polishing (CMP) processes, the retaining ring is a critical component, and its surface sandblasting treatment directly affects the polishing uniformity and equipment lifespan. Traditional sandblasting fixtures often employ external clamping or tape masking, which has significant drawbacks: external clamping can cover the edge area of ​​the retaining ring, leading to uneven sandblasting. Manual tape masking is not only inefficient but also prone to scratches or contamination of the protective surface due to inaccurate application. Utility Model Content

[0004] This utility model discloses a semiconductor CMP retaining ring sandblasting positioning fixture, which aims to solve the technical problems that external clamping will cover the edge area of ​​the retaining ring, resulting in uneven sandblasting, while manual tape masking is not only inefficient, but also prone to scratches or sandblasting contamination of the protective surface due to inaccurate adhesion.

[0005] To achieve the above objectives, the present invention adopts the following technical solution: A semiconductor CMP retaining ring sandblasting positioning fixture includes a support platform and a circular through slot II disposed through the inner wall of the top of the support platform. It also includes: an inner support mechanism fixedly installed on the inner wall of the bottom end of the support platform; a shielding mechanism installed on the top of the inner support mechanism; and a rotating mechanism fixedly connected to one side of the inner support mechanism. The internal support mechanism includes: an upper support, to which a lower support is fixedly connected at its bottom outer wall, and the upper support passes through a circular through-slot; multiple compression rods, equidistantly arranged through the inner circumference of the upper support, and each compression rod having a circular support plate fixedly connected to its inner end; multiple springs, each sleeved around the multiple compression rods, and one end of each spring fixedly connected to one side of the circular support plate; a conical support, whose outer wall movably fits against the multiple circular support plates; a hydraulic cylinder, fixedly connected to the inner wall at the bottom of the lower support, and the output end of the hydraulic cylinder fixedly connected to the bottom of the conical support; and a cross-type lifting platform located at the bottom of the lower support. The internal support mechanism further includes: multiple inner rings, which are equidistantly fixed to the inner circumference of the upper support, and multiple compression rods are respectively inserted into the multiple inner rings, and the other ends of multiple springs are respectively fixedly connected to the outer side of one side of the multiple inner rings.

[0006] With an internal support mechanism, the conical support can be raised to change its contact position with the circular support plate, allowing multiple extrusion rods to extrude outwards simultaneously, thus achieving clamping of the inner wall of the retaining ring. Under this clamping structure, the clamping surface is smaller than that of external clamping, making it easier to ensure the uniformity of sandblasting. In addition, the lifting structure can also be used to retract the clamping structure downwards, freeing up workbench space and avoiding dust accumulation in traditional exposed fixtures.

[0007] In a preferred embodiment, the shielding mechanism includes: a circular through slot 1, which is disposed through the inner wall of the top end of the upper support; and a C-shaped sleeve 2, which is fixedly embedded in the circular through slot 1, and the outer wall of the top end of the C-shaped sleeve 2 is flush with the outer wall of the top end of the upper support, and the inner wall of the bottom circumference of the C-shaped sleeve 2 is larger than the inner wall of its top circumference. The shielding mechanism further includes: a C-shaped sleeve one, which is movably engaged within a C-shaped sleeve two, and the inner circumference of its bottom end is smaller than the inner circumference of its top end; and a top cover, which is movably connected within the C-shaped sleeve one, and the bottom end of the top cover is fixedly connected to a bottom edge.

[0008] By incorporating a shielding mechanism, which consists of a top cover, C-shaped sleeve one, and C-shaped sleeve two, the protruding part of the conical support is positioned precisely within the raised shielding mechanism. This achieves top sealing protection while preventing the top of the upper support from protruding too high and causing obstruction, thus affecting the sandblasting effect.

[0009] In a preferred embodiment, the internal support mechanism further includes: multiple through holes equidistantly disposed through the inner wall of the upper support, and multiple compression rods respectively inserted into the multiple through holes; a base, the lower support being rotatably connected to the top of the base, and the cross-type lifting mechanism being simultaneously fixedly connected to the bottom end of the base and the bottom inner wall of the support platform. The rotating mechanism includes: a motor, which is fixedly installed on the bottom outer wall of the base; and a connecting shaft, which is fixedly connected to the output end of the motor and rotatably connected inside the base. The rotating mechanism further includes: a gear, fixedly connected to the top of the connecting shaft; and multiple locking teeth, equidistantly fixedly connected to one side of the outer wall of the lower support.

[0010] By incorporating a rotating mechanism that can be activated by a motor, the lower support can be rotated a certain distance. This allows for the alteration of the pressure points of multiple extrusion rods on the inner wall of the retaining ring during the sandblasting process, ensuring complete coverage of the inner wall of the ring during sandblasting.

[0011] As described above, a semiconductor CMP retaining ring sandblasting positioning fixture includes a support platform and a circular through-slot II penetrating the inner wall of the top of the support platform. It also includes: an inner support mechanism fixedly installed on the inner wall of the bottom end of the support platform; a shielding mechanism installed at the top of the inner support mechanism; and a rotating mechanism fixedly connected to one side of the inner support mechanism. The inner support mechanism includes: an upper support with a lower support fixedly connected to its bottom outer wall, and the upper support passing through the circular through-slot II; multiple extrusion rods equidistantly penetrating the inner circumference of the upper support, with a circular support plate fixedly connected to the inner end of each extrusion rod; multiple springs respectively sleeved around the multiple extrusion rods, with one end fixedly connected to one side of the circular support plate; a conical support with its outer wall movably fitting against the multiple circular support plates; a hydraulic cylinder fixedly connected to the inner wall of the bottom end of the lower support, with the output end of the hydraulic cylinder fixedly connected to the bottom end of the conical support; and a cross-type lifting mechanism located at the bottom end of the lower support. The semiconductor CMP retaining ring sandblasting positioning fixture provided by this utility model has the technical effect of ensuring stable clamping while having a smaller clamping surface, making it easier to ensure the uniformity of sandblasting, and freeing up workbench space, thus avoiding the accumulation of dust in traditional exposed fixtures. Attached Figure Description

[0012] Figure 1 This is a schematic diagram of the overall structure of a semiconductor CMP retaining ring sandblasting positioning fixture proposed in this utility model.

[0013] Figure 2 This is a schematic diagram of the internal structure of a semiconductor CMP retaining ring sandblasting positioning fixture proposed in this utility model.

[0014] Figure 3 This is a schematic diagram showing the disassembled inner support mechanism of a semiconductor CMP retaining ring sandblasting positioning fixture proposed in this utility model.

[0015] Figure 4 This is a schematic diagram showing the shielding mechanism of a semiconductor CMP retaining ring sandblasting positioning fixture proposed in this utility model.

[0016] In the attached diagram: 1. Support platform; 2. Covering mechanism; 3. Internal support mechanism; 4. Rotating mechanism; 201. Circular through-slot one; 202. Top cover; 203. Bottom edge; 204. C-shaped sleeve one; 205. C-shaped sleeve two; 301. Upper support; 302. Lower support; 303. Cross-type lifting platform; 304. Base; 305. Hydraulic cylinder; 306. Conical support; 307. Inner collar; 308. Perforation; 309. Extrusion rod; 310. Circular support plate; 311. Spring; 401. Clamping tooth; 402. Gear; 403. Connecting shaft; 404. Motor. Detailed Implementation

[0017] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present utility model. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments.

[0018] The semiconductor CMP retaining ring sandblasting positioning fixture disclosed in this utility model is mainly used in CMP retaining ring sandblasting operations.

[0019] Reference Figures 1-3 A semiconductor CMP retaining ring sandblasting positioning fixture includes a support platform 1 and a circular through slot 2 that penetrates the inner wall of the top of the support platform 1. It also includes: an inner support mechanism 3, which is fixedly installed on the inner wall of the bottom end of the support platform 1; a shielding mechanism 2, which is installed on the top of the inner support mechanism 3; and a rotating mechanism 4, which is fixedly connected to one side of the inner support mechanism 3. The internal support mechanism 3 includes: an upper support 301, to which a lower support 302 is fixedly connected at its bottom outer wall, and the upper support 301 passes through a circular through slot 2; multiple compression rods 309, equidistantly arranged through the inner circumference of the upper support 301, and each compression rod 309 has a circular support plate 310 fixedly connected to its inner end; multiple springs 311, respectively sleeved on the outside of the multiple compression rods 309, and one end of each spring is fixedly connected to one side of the circular support plate 310; a conical support 306, whose outer wall is movably fitted with the multiple circular support plates 310; a hydraulic cylinder 305, fixedly connected to the bottom inner wall of the lower support 302, and the output end of the hydraulic cylinder 305 is fixedly connected to the bottom end of the conical support 306; and a cross-type lifting platform 303, located at... At the bottom of the lower support 302, after the retaining ring is placed on the top of the support platform 1, the upper support 301 can be pushed up by starting the cross-type lifting machine 303 until it extends beyond the top of the support platform 1. Then, the extension of the output end of the hydraulic cylinder 305 can push the conical support 306 up. After being lifted, the conical support 306 changes its contact position with the circular support plate 310, causing the spring 311 to stretch and causing multiple extrusion rods 309 to extrude outward at the same time, thereby achieving clamping of the inner wall of the retaining ring. Under this clamping structure, compared with external clamping, the clamping surface is smaller, making it easier to ensure the uniformity of sandblasting. In addition, the lifting structure can also realize the downward storage of the clamping structure, freeing up the worktable space and avoiding dust accumulation in traditional exposed fixtures.

[0020] Reference Figure 3 In a preferred embodiment, the inner support mechanism 3 further includes: a plurality of inner rings 307, which are fixedly connected at equal intervals to the inner circumference of the upper support 301, and a plurality of compression rods 309 are respectively inserted into the plurality of inner rings 307, and the other ends of the plurality of springs 311 are respectively fixedly connected to the outer side of the plurality of inner rings 307.

[0021] Reference Figure 2 and Figure 3In a preferred embodiment, the inner support mechanism 3 further includes: a plurality of through holes 308, which are equidistantly disposed through the inner wall of the upper support 301, and a plurality of compression rods 309 are respectively inserted into the plurality of through holes 308; a base 304, a lower support 302 rotatably connected to the top of the base 304, and a cross-type lifting mechanism 303 simultaneously fixedly connected to the bottom end of the base 304 and the bottom inner wall of the support platform 1.

[0022] Reference Figure 2 In a preferred embodiment, the rotating mechanism 4 includes: a motor 404, which is fixedly installed on the bottom outer wall of the base 304; and a connecting shaft 403, which is fixedly connected to the output end of the motor 404 and rotatably connected to the base 304.

[0023] Reference Figure 2 In a preferred embodiment, the rotating mechanism 4 further includes: a gear 402, fixedly connected to the top of the connecting shaft 403; and multiple locking teeth 401, equidistantly fixedly connected to one side outer wall of the lower support 302. Since the lower support 302 is rotatably connected to the top of the base 304, the lower support 302 and all its top structures can rotate on the base 304. When the motor 404 is started, the gear 402 is driven to rotate a certain distance. The meshing of the gear 402 and the locking teeth 401 drives the lower support 302 to rotate a certain distance. This allows the multiple extrusion rods 309 to change the extrusion point on the inner wall of the retaining ring during the sandblasting process, ensuring complete coverage of the inner wall of the ring during the sandblasting process.

[0024] Reference Figure 3 and Figure 4 In a preferred embodiment, the shielding mechanism 2 includes: a circular through slot 201, which is disposed through the inner wall of the top end of the upper support 301; and a C-shaped sleeve 205, which is fixedly embedded in the circular through slot 201, and the outer wall of the top end of the C-shaped sleeve 205 is flush with the outer wall of the top end of the upper support 301, and the inner wall of the bottom circumference of the C-shaped sleeve 205 is larger than the inner wall of its top circumference.

[0025] Reference Figure 4In a preferred embodiment, the shielding mechanism 2 further includes: a C-shaped sleeve 204, which is movably engaged within a C-shaped sleeve 205, and the inner wall of its bottom circumference is smaller than the inner wall of its top circumference; and a top cover 202, which is movably connected within the C-shaped sleeve 204, and the bottom edge 203 is fixedly connected to the bottom end of the top cover 202. In the shielding mechanism 2, based on the sleeve structure of the top cover 202, the C-shaped sleeve 204, and the C-shaped sleeve 205, the top cover 202 and the C-shaped sleeve 204 can be hidden within the C-shaped sleeve 205, or the three can be extended upwards to greatly increase their overall height. Thus, during the process of the hydraulic cylinder 305 driving the conical support 306 to rise, the part of the top of the conical support 306 extending out is just located within the raised shielding mechanism 2, thereby achieving top sealing protection while also preventing the top of the upper support 301 from extending too high and causing obstruction, which would affect the sandblasting effect.

[0026] Working principle: After the retaining ring is placed on the top of the support platform 1, the upper support 301 can be moved upward by starting the cross-type lifting machine 303 until it extends beyond the top of the support platform 1. Then, the extension of the output end of the hydraulic cylinder 305 can push the conical support 306 to rise. After rising, the conical support 306 changes its contact position with the circular support plate 310, which drives the spring 311 to stretch and causes multiple extrusion rods 309 to extrude outward at the same time, realizing the inner wall clamping of the retaining ring. Under this clamping structure, compared with external clamping, the clamping surface is smaller, making it easier to ensure the uniformity of sandblasting. In addition, the lifting structure can also realize the downward storage of the clamping structure, freeing up the worktable space and avoiding dust accumulation in traditional exposed fixtures.

[0027] The above description is merely a preferred embodiment of this utility model, but the protection scope of this utility model is not limited thereto. The substitutions may be replacements of some structures, devices, or method steps, or they may be complete technical solutions. Equivalent substitutions or modifications made based on the technical solution and inventive concept of this utility model should all be covered within the protection scope of this utility model.

Claims

1. A semiconductor CMP retaining ring sandblasting positioning fixture, comprising a support platform (1) and a circular through-slot 2 penetrating the inner wall of the top of the support platform (1), characterized in that, Also includes: The inner support mechanism (3) is fixedly installed on the inner wall of the bottom end of the support platform (1); The shielding mechanism (2) is installed at the top of the inner support mechanism (3); The rotating mechanism (4) is fixedly connected to one side of the inner support mechanism (3); The internal support mechanism (3) includes: The upper support (301) has a lower support (302) fixedly connected to its bottom outer wall, and the upper support (301) passes through the circular through groove II; Multiple extrusion rods (309) are equidistantly arranged through the inner circumference of the upper support (301), and each extrusion rod (309) has a circular support plate (310) fixedly connected to its inner end. Multiple springs (311) are respectively sleeved on the outside of multiple compression rods (309), and one end of each spring is fixedly connected to one side of a circular support plate (310); A conical support (306) has its outer wall movably fitted with multiple circular support plates (310); The hydraulic cylinder (305) is fixedly connected to the inner wall of the bottom end of the lower support (302), and the output end of the hydraulic cylinder (305) is fixedly connected to the bottom end of the tapered support (306); The cross lift (303) is located at the bottom of the lower support (302).

2. The semiconductor CMP retaining ring sandblasting positioning fixture according to claim 1, characterized in that, The internal support mechanism (3) also includes: Multiple inner rings (307) are fixedly connected at equal intervals to the inner circumference of the upper support (301), and multiple extrusion rods (309) are inserted into the multiple inner rings (307) respectively. The other end of multiple springs (311) is fixedly connected to the outer side of one side of the multiple inner rings (307).

3. The semiconductor CMP retaining ring sandblasting positioning fixture according to claim 1, characterized in that, The internal support mechanism (3) also includes: Multiple perforations (308) are equidistantly arranged through the inner wall of the upper support (301), and multiple extrusion rods (309) are respectively inserted into the multiple perforations (308); The base (304) and the lower support (302) are rotatably connected to the top of the base (304), and the cross-type lifting machine (303) is simultaneously fixedly connected to the bottom of the base (304) and the inner wall of the bottom of the support platform (1).

4. A semiconductor CMP retaining ring sandblasting positioning fixture according to claim 1, characterized in that, The rotating mechanism (4) includes: The motor (404) is fixedly installed on the bottom outer wall of the base (304); The connecting shaft (403) is fixedly connected to the output end of the motor (404) and simultaneously rotatably connected to the base (304).

5. A semiconductor CMP retaining ring sandblasting positioning fixture according to claim 4, characterized in that, The rotating mechanism (4) further includes: Gear (402) is fixedly connected to the top end of connecting shaft (403); Multiple locking teeth (401) are equidistantly fixed to one side of the outer wall of the lower support (302).

6. A semiconductor CMP retaining ring sandblasting positioning fixture according to claim 1, characterized in that, The shielding mechanism (2) includes: A circular through-groove (201) is provided through the inner wall of the top of the upper support (301); C-shaped sleeve two (205) is fixedly embedded in circular through groove one (201), and the top outer wall of C-shaped sleeve two (205) is flush with the top outer wall of the upper support (301), and the bottom circumferential inner wall of C-shaped sleeve two (205) is larger than its top circumferential inner wall.

7. A semiconductor CMP retaining ring sandblasting positioning fixture according to claim 6, characterized in that, The shielding mechanism (2) further includes: C-type sleeve one (204) is movably attached to C-type sleeve two (205), and the inner wall of its bottom circumference is smaller than the inner wall of its top circumference; The top cover (202) is movably connected to the C-shaped sleeve (204), and the bottom edge (203) is fixedly connected to the bottom end of the top cover (202).

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