Semiconductor wafer sealing spin platform

Abstract

The utility model provides a kind of semiconductor wafer sealed rotary platform, including rotary interface and seal door component.The rotary interface is clamped wafer carrier by the clamping arm of pneumatic cylinder drive and spring mechanism, 180 degrees rotation alignment internal manipulator;Seal door component is fixed in rack by outside door and inside door, ensure airtight isolation.The platform realizes wafer in nitrogen gas warehouse without contact transfer, prevent gas leakage and pollution, improve positioning accuracy and transfer efficiency, compact structure, easy to maintain, adapt to semiconductor production line automation needs.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor manufacturing technology, specifically to a semiconductor wafer sealing rotation platform for isolated rotational transfer in nitrogen storage. Background Technology

[0002] In the semiconductor manufacturing industry, wafer storage and transfer technology is a crucial link in ensuring production efficiency and product quality. With the continuous advancement of semiconductor processes, especially the increase in wafer size and process complexity, the requirements for cleanliness and environmental control during wafer production and storage are becoming increasingly stringent. Particularly in storage environments protected by nitrogen or other inert gases, wafers need to be efficiently and contaminantly transferred between the external environment and the storage area using specialized transfer devices. Traditional wafer transfer devices are mostly based on robotic arms or conveyor belts, combined with simple sealing structures, and have gradually developed into automated equipment capable of meeting high cleanliness requirements. However, these devices still have significant shortcomings in terms of isolation, airtightness, and operational continuity in nitrogen storage environments. In recent years, the industry has gradually introduced rotating platforms and sealed door technologies, attempting to improve transfer efficiency and environmental isolation through structural optimization. However, existing technologies still face many challenges in practical applications and cannot fully meet the high-precision and contamination-free transfer requirements of semiconductor production.

[0003] In existing technologies, wafer transfer devices typically employ a single robotic arm docking or conveyor belt transfer method. While these devices prioritize rapid wafer transfer, they often neglect airtightness, especially in nitrogen-filled storage environments. External air or particles can easily enter the storage space through the transfer interface, leading to wafer surface contamination or oxidation. For example, some devices rely on simple sealing gaskets or single-door structures, making it difficult to maintain stable airtightness during frequent opening and closing operations. Existing devices often use fixed clamping mechanisms, lacking flexible adjustment mechanisms. This makes them prone to instability due to dimensional deviations or installation errors in the wafer carrier, potentially causing wafer misalignment or damage. Regarding rotational positioning, traditional devices typically use a single motor-driven rotating platform, lacking precise positioning control. This is particularly problematic during 180-degree rotation docking, where angular deviations can occur, affecting seamless integration with the internal robotic arm. These issues are especially pronounced in high-density storage scenarios, as frequent wafer transfers increase the risk of gas leakage and contamination.

[0004] To address the aforementioned issues, existing technologies have proposed several improvements. For example, some devices attempt to improve airtightness by increasing the thickness of the sealing gasket or employing a multi-layered sealing structure. However, this increases the complexity and maintenance costs of the device, and the sealing effect may still decline after long-term use. Other solutions achieve internal and external isolation through a double-door structure, but the door opening and closing mechanism typically operates independently of the rotating platform, lacking a coordinated design, resulting in low continuity and efficiency in the transfer process. Some clamping mechanisms attempt to introduce pneumatic control to improve clamping flexibility, but their complex design and slow cylinder response make them unsuitable for rapid transfer requirements. Regarding rotational positioning, some devices use sensors for angle calibration, but these sensors are typically sensitive to environmental changes and susceptible to temperature or humidity variations in nitrogen storage, leading to decreased positioning accuracy. Overall, the improvements in existing technologies alleviate airtightness and positioning problems to some extent, but they still cannot achieve an organic combination of rotational positioning and sealed isolation, and they have significant shortcomings in non-contact operation and emergency maintenance.

[0005] This application aims to address the problems of insufficient airtightness, poor clamping stability, low rotational positioning accuracy, and insufficient operational continuity in existing wafer transfer devices under nitrogen storage environments, while simplifying the structural design to facilitate maintenance and adaptation to automated production lines. Utility Model Content

[0006] To address the aforementioned technical problems, this utility model provides a semiconductor wafer sealing rotary platform. Its purpose is to achieve airtight isolation and transfer of wafers in nitrogen storage by integrating a rotary docking platform and a double-door sealing assembly, preventing gas leakage and external contamination, ensuring contactless operation, improving positioning accuracy and transfer efficiency, and facilitating maintenance.

[0007] A semiconductor wafer sealing rotary platform includes a rotary docking platform disposed at the entrance of a storage aisle and a sealing door assembly that cooperates with the entrance of the aisle; in, The rotating docking station includes a rotating platform, clamping arms, cylinder assemblies, and a spring mechanism. The rotating platform is rotatably mounted on a base at the entrance of the storage aisle via a drive mechanism. The clamping arm is disposed on the top of the rotating platform, and the cylinder assembly is fixedly installed on the bottom of the rotating platform and connected to the clamping arm. The clamping arm is driven to the cylinder assembly through the spring mechanism. Under the drive of the cylinder assembly, it opens and closes to clamp or release the wafer carrier, and provides clamping force to the wafer carrier through the spring mechanism to position and fix it. The sealing door assembly includes an outer door, an inner door, and a sealing assembly. The outer door is rotatably mounted on the outside of the storage aisle entrance via a first door hinge mechanism, and the inner door is rotatably mounted on the inside of the storage aisle entrance via a second door hinge mechanism. The outer door and the inner door are configured to open and close alternately. The sealing assembly is fixedly installed on the side wall of the tunnel entrance and electrically connected to the drive mechanism of the outer door and the inner door. It is used to control the alternating opening and closing of the outer door and the inner door so that at least one door is always closed when the wafer carrier enters and exits the storage via the rotating dock, so as to form an airlock structure at the tunnel entrance. The rotating platform can rotate within a predetermined angle range under the drive of the drive mechanism, so that when the wafer carrier is clamped by the clamping arm, the protrusion of the wafer carrier is rotated from the side facing the outside of the warehouse to the side facing the robot arm inside the warehouse, so as to realize the alignment and connection of the robot arm inside the warehouse, and reduce nitrogen leakage under the airtight isolation effect of the sealing door assembly.

[0008] Furthermore, the rotating platform also includes a rotating platform support plate and a sensor assembly. The rotating platform support plate is fixedly installed at the bottom of the rotating platform, and the sensor assembly is disposed on the side edge of the rotating platform support plate to detect the position or positioning status of the wafer carrier on the rotating docking platform and to feed back the detection signal to the control system.

[0009] Furthermore, the drive mechanism includes a motor pulley assembly, which is fixedly installed at the bottom of the rotating platform and connected to the rotating platform via a belt drive to drive the rotating platform to rotate relative to the base and realize the wafer carrier to rotate approximately 180 degrees from the outside to the inside.

[0010] Furthermore, the rotating docking platform also includes a fixed plate and a guide column and bracket assembly. The fixed plate is fixedly installed at the bottom of the rotating platform, and the guide column and bracket assembly is bolted to the fixed plate and cooperates with the clamping arm to guide the clamping arm to move along a predetermined trajectory in the opening and closing direction.

[0011] Furthermore, the sealing door assembly also includes a sealing panel, which is fixedly installed on the inner surface of the outer door and the inner door respectively, for cooperating with the corresponding sealing surface of the tunnel entrance when the outer door and / or the inner door are closed, so as to enhance the airtightness of the outer door and the inner door.

[0012] Furthermore, the sensor assembly includes an infrared sensor, which is embedded in the side edge of the rotary table support plate to detect the alignment or presence of the wafer carrier, and inputs the detection result as a control signal for the rotation of the rotary platform and the opening and closing of the clamping arm.

[0013] Furthermore, the rotating docking platform also includes a limiting component, which is fixedly installed on the side of the rotating platform or on the base to limit the rotation angle range of the rotating platform and prevent the rotating platform from exceeding a predetermined angle.

[0014] Furthermore, the rotary docking platform also includes a linear bearing, which is installed between the clamping arm and the cylinder assembly to support the clamping arm in linear reciprocating motion along its opening and closing direction and reduce the frictional resistance of the clamping arm during the opening and closing process.

[0015] Furthermore, the guide post and support assembly includes multiple guide posts that are evenly distributed around the circumference of the fixing plate and slidably connected to the clamping arm to ensure smooth movement of the clamping arm during opening and closing, thereby improving the stability of wafer carrier clamping.

[0016] Furthermore, the sealing assembly includes a control circuit board, which is embedded in the side wall of the tunnel entrance and electrically connected to the drive mechanism of the outer door and the inner door. The control circuit board is used to control the rotation angle and opening and closing sequence of the outer door and the inner door according to the control command, so as to realize the interlocking and alternating opening and closing of the two doors.

[0017] The semiconductor wafer sealing rotary platform provided by this utility model has the following advantages: by setting a rotary docking platform at the entrance of the storage aisle, and arranging clamping arms, cylinder assemblies, and spring mechanisms on the rotary platform, the wafer carrier can be stably clamped and positioned after being placed on the rotary docking platform. During rotation, it is less prone to displacement or tilting, providing an accurate posture basis for subsequent docking with the robotic arm inside the storage area. The drive mechanism rotates the rotary platform within a predetermined angle range, preferably 180 degrees, thereby enabling the wafer carrier to rotate from the side facing the outside of the storage area to the side facing the robotic arm inside the storage area. This simplifies the alignment difficulty between the external handling mechanism and the internal robotic arm, and improves the automation level and alignment accuracy of the loading and unloading process.

[0018] The sealing door assembly, by setting an outer door and an inner door, and controlling their alternating opening and closing by the sealing assembly, ensures that at least one door is always closed when the wafer carrier enters and exits the storage via the rotating dock. This forms a structure similar to an airlock at the entrance of the aisle, effectively reducing the leakage of high-purity nitrogen from inside the storage to the outside, and reducing the risk of outside air and particulate matter entering the storage.

[0019] By installing a sensor assembly, preferably an infrared sensor, at the bottom of the rotating platform, and using a limiting assembly to restrict the rotation angle, the positioning status of the wafer carrier and the angular position of the rotating platform can be detected and fed back, realizing closed-loop control of the rotation and clamping actions, and further improving the reliability and safety of the entire platform operation.

[0020] The clamping arm movement is constrained by a fixed plate, guide post and bracket assembly, and a linear bearing is installed between the clamping arm and the cylinder assembly, so that the clamping arm can make linear reciprocating motion in a predetermined direction, reducing frictional resistance and shaking during the opening and closing process, thereby improving the stability and repeatability of the wafer carrier clamping action.

[0021] This utility model improves the overall sealing performance and ease of use of the tunnel entrance by setting sealing panels on the inner surfaces of the outer and inner doors and setting a sealing assembly with a control circuit board on the side wall of the tunnel entrance. This allows for good physical sealing of the door body while uniformly controlling the rotation angle and opening and closing sequence of the outer and inner doors. Attached Figure Description

[0022] Appendix Figure 1 This is a schematic diagram of the overall front structure of this utility model.

[0023] Appendix Figure 2 This is a schematic diagram of the overall three-dimensional structure of this utility model.

[0024] Appendix Figure 3 This is a top view of the rotary table assembly of this utility model.

[0025] Appendix Figure 4 This is a three-dimensional structural diagram of the rotary table assembly of this utility model.

[0026] Appendix Figure 5 This is a top view of the rotary table assembly of this utility model.

[0027] Appendix Figure 6 This is an exploded structural diagram of the sealing door assembly of this utility model.

[0028] Explanation of reference numerals in the attached drawings: 1-Sealing door assembly; 2-Frame assembly; 3-Sealing assembly; 4-Electrical distribution panel assembly; 5-Rotating table assembly; 6-Rotating table support plate; 7-Sensor assembly; 8-Hollow rotating table; 9-Platform assembly; 10-Clamping assembly; 11-Cylinder assembly; 12-Fixing plate; 13-Sealing panel; 14-Motor pulley assembly; 15-Limiting assembly; 16-Guide column and bracket assembly; 17-Linear bearing; 18-Connecting rod assembly. Detailed Implementation

[0029] The technical solution of this utility model will now be clearly and completely described in conjunction with the accompanying drawings. In the description of this utility model, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the accompanying drawings and are only for the convenience of describing this utility model and simplifying the description. They do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model. The terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0030] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances. The utility model will be further described below with reference to the accompanying drawings.

[0031] This invention provides a sealed rotary platform for semiconductor wafers, designed to achieve airtight and isolated transfer of wafers in a nitrogen storage environment. It solves the problems of insufficient airtightness, unstable clamping, and low positioning accuracy in traditional transfer devices, while ensuring contactless operation and easy maintenance. The specific implementation of the platform is described in detail below with reference to the accompanying drawings, so that those skilled in the art can fully understand and implement this technical solution. The overall structure is compact, integrating a rotary docking platform and a sealed door assembly. Installed at the entrance of the storage aisle, it enables efficient transfer of wafers between external buffer shelves and internal storage shelves.

[0032] Appendix Figure 1 and attached Figure 2The layout of the sealing door assembly 1 and the electrical distribution panel assembly 4 is presented. The sealing door assembly 1 is fixedly installed both externally and internally at the tunnel entrance to isolate the external environment from the nitrogen-filled storage interior, ensuring airtightness. The electrical distribution panel assembly 4 is fixed to a frame on one side of the tunnel entrance, providing power distribution and control signal transmission via electrical connection to support the platform's automated operation. The electrical distribution panel assembly 4 is connected to the sealing assembly 3 and the actuators of the rotating dock, distributing commands from the upper control system to each drive mechanism. The frame assembly 2 is bolted to the tunnel entrance base, forming the support frame for the entire platform and ensuring structural stability during operation. The sealing assembly 3 is integrally embedded in the side wall of the tunnel entrance, including seals arranged along the edge of the sealing door assembly 1 and a control circuit board integrated therein. The seals are made of high-sealing rubber or corrosion-resistant polymer materials, and when the outer and inner doors are closed, they cooperate with the sealing panel 13 to enhance airtightness and prevent nitrogen leakage or the entry of external contaminants. The control circuit board is electrically connected to the drive mechanisms of the outer and inner doors via the electrical distribution panel assembly 4, and is used to control the opening and closing sequence and rotation angle of the two doors. The sealing door assembly 1 includes an outer door and an inner door, which are rotatably mounted on the outside and inside of the aisle entrance respectively via a first rotating mechanism and a second rotating mechanism. Under the coordinated control of the control circuit board, they are opened and closed alternately to maintain the isolation between the storage environment and the external environment.

[0033] A rotary docking station is used to clamp, position, and rotate wafer carriers. (See attached image) Figure 3 The diagram shows a top view of the rotary table assembly 5, which forms the main body of the rotary docking platform. The assembly includes a hollow rotary table 8, a platform assembly 9, a clamping assembly 10, and a cylinder assembly 11. The hollow rotary table 8 is rotatably connected to the tunnel entrance base via high-precision bearings and is located at the center of the rotary docking platform. It is made of lightweight, corrosion-resistant alloy material to ensure smooth rotation and adaptability to a nitrogen environment. The platform assembly 9 is bolted to the top of the hollow rotary table 8. Its smooth surface and anti-slip coating form a direct support platform for the wafer carrier, ensuring it does not slip during transfer.

[0034] The clamping assembly 10 is connected to the cylinder assembly 11 via a spring mechanism and is positioned above the stage assembly 9. It includes two symmetrically arranged clamping arms for clamping the wafer carrier. The cylinder assembly 11 is fixed to the bottom of the hollow turntable 8 and drives the clamping assembly 10 to open and close via a pneumatic push rod, enabling rapid clamping and release of the wafer carrier. The spring mechanism provides a self-resetting clamping force when the cylinder assembly 11 is reset or de-energized, causing the clamping arms to apply clamping force to the wafer carrier in both vertical and horizontal directions, thereby achieving stable positioning of the wafer carrier and preventing displacement during rotation.

[0035] Appendix Figure 4 and attached Figure 5The rotary table support plate 6, made of steel plate, is bolted to the bottom of the hollow rotary table 8, providing additional structural rigidity for the hollow rotary table 8 and the platform assembly 9 above it. Sensor assembly 7, preferably an infrared sensor, is embedded in the side edge of the rotary table support plate 6 to detect the position of the wafer carrier and the angle of the rotating platform in real time. The detection signal is fed back to the electrical distribution panel assembly 4, and the control system uses this signal to control the clamping assembly 10 and the rotation action, ensuring the accuracy of clamping and rotation. The rotary table support plate 6 has a rectangular structure and is fixed to the bottom of the hollow rotary table 8, supporting the entire rotating connection structure. Sensor assemblies 7 are distributed along the side edge of the rotary table support plate 6, and one or more sets can be set according to specific needs, for comprehensive monitoring of the wafer carrier's positioning status and rotation angle. The platform assembly 9 is located on top of the hollow rotary table 8, vertically aligned with the clamping assembly 10. The clamping arms of the clamping assembly 10, driven by the cylinder assembly 11, perform an approximately linear opening and closing motion in a predetermined direction, forming a stable clamping space. The cylinder assembly 11 is connected to an external air source via a pneumatic pipe and is fixed to the bottom of the hollow turntable 8 to ensure rapid response of the clamping action and consistency of repeated actions.

[0036] As attached Figure 6 The sealing door assembly 1 shown includes a fixing plate 12, a sealing panel 13, a motor pulley assembly 14, a limiting assembly 15, a guide column and bracket assembly 16, a linear bearing 17, and a connecting rod assembly 18. The fixing plate 12, made of high-strength steel, is bolted to the tunnel entrance base and provides a stable mounting foundation for the rotary table assembly 5 and the sealing door assembly 1. The sealing panel 13 is fixed to the inner surfaces of the outer and inner doors and is made of a corrosion-resistant, high-sealing polymer material. When the door is closed, it cooperates with the seals in the sealing assembly 3 to significantly enhance the airtightness of the door and prevent nitrogen leakage.

[0037] The motor pulley assembly 14 is fixed to the hollow turntable 8 or the rotary table support plate 6 below it. It is connected to the drive motor via belt drive, driving the hollow turntable 8 to achieve a precise rotation of approximately 180 degrees, ensuring that the protruding part of the wafer carrier aligns with the robotic arm inside the storage area after rotation. The limiting assembly 15 is fixed to the side of the hollow turntable 8 or its corresponding base position. It includes a mechanical stop and a microswitch, used to detect and limit the rotation angle, ensuring that the rotation angle is controlled within a predetermined range and preventing over-rotation that could lead to positioning deviation. The guide post and bracket assembly 16 is fixed to the fixed plate 12 by bolts. It includes multiple guide posts evenly distributed circumferentially and cooperates with the clamping assembly 10 through a sliding connection, guiding the clamping arm to move smoothly in the opening and closing direction. The linear bearing 17 is installed between the clamping assembly 10 and the cylinder assembly 11. It is made of highly wear-resistant material, significantly reducing the frictional resistance during the movement of the clamping arm and improving the smoothness and durability of the clamping action. The linkage assembly 18 connects the clamping assembly 10 and the cylinder assembly 11 by means of hinge, which accurately converts the pushing and pulling force of the cylinder assembly 11 into the opening and closing action of the clamping arm, ensuring that the clamping force is evenly distributed among multiple clamping points.

[0038] The platform's workflow is as follows: The wafer carrier is placed on the platform assembly 9 by an external robotic arm. The sensor assembly 7 confirms the carrier's position via infrared detection, and the detection signal is transmitted to the control system via the electrical distribution panel assembly 4. The control system first controls the sealing door assembly 1 to open the outer door while keeping the inner door closed. The rotation process is initiated only after the outer door is closed. Subsequently, the cylinder assembly 11 drives the clamping assembly 10 to operate. The clamping arm, under the action of the spring mechanism, applies clamping force in the vertical and horizontal directions to the wafer carrier, reliably fixing it and ensuring no deviation during rotation. The motor pulley assembly 14 drives the hollow turntable 8 to rotate approximately 180 degrees under the action of the control signal. The limiting assembly 15 detects and limits the rotation angle in real time, ensuring that the rotation terminates when the protruding part of the wafer carrier aligns with the position of the robotic arm inside the storage area. After rotation to the correct position, the control system controls the inner door to open while keeping the outer door closed. Under the airtight isolation formed by the sealing panel 13 and the sealing assembly 3, the internal robotic arm grips the carrier in a nitrogen environment, completing the contactless transfer. The entire process is controlled by the control circuit board inside the sealing assembly 3 and the electrical distribution panel assembly 4, which work together to control the opening and closing sequence of the door and the working status of the rotating platform. At the same time, the sealing assembly 3 supports emergency manual operation, which is convenient for maintenance in case of failure or repair.

[0039] In another embodiment, the clamping assembly 10 may employ multiple spring mechanisms to further optimize the uniformity of clamping force and adapt to wafer carriers of different sizes or masses. The number of guide posts in the guide post and support assembly 16 can be adjusted according to the carrier specifications and clamping stroke, typically set to 4 to 6 posts to ensure the stability of the sliding guide. The sealing panel 13 may be made of different grades of corrosion-resistant polymer materials to adapt to the long-term use requirements of specific nitrogen concentrations or storage environments. The motor pulley assembly 14 may be equipped with motors of different power ratings, and the rotational speed requirements under different load conditions can be adapted by adjusting the transmission ratio. These variations, through flexible configuration of structural parameters and material selection, enhance the applicability and scalability of the device, and can meet the needs of diverse semiconductor production lines and storage systems.

[0040] The platform's structure and operation achieve airtight, isolated transfer of wafers within a nitrogen storage environment through a highly integrated rotating dock and sealed door assembly. The rotating dock assembly 5, with its precise approximately 180-degree rotation and positioning detection by the sensor assembly 7, effectively overcomes the deviation problems in carrier attitude adjustment and alignment inherent in traditional devices. The synergistic action of the clamping assembly 10, cylinder assembly 11, and their cooperating guide columns, support assembly 16, and linear bearing 17 ensures clamping stability, preventing wafer damage during transfer. The sealed door assembly 1, through a double-door alternating mechanism and the high-sealing cooperation between the sealing panel 13 and the sealing assembly 3, effectively prevents nitrogen leakage and the entry of external contaminants. The overall device utilizes corrosion-resistant materials and a cabinet-style structure design, enhancing system durability and ease of maintenance, significantly improving the safety and operational efficiency of the semiconductor storage system, and adapting to the upgrade requirements of automated production lines.

[0041] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of this utility model, and are not intended to limit it. Although the utility model has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features therein. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this utility model.

Claims

1. A semiconductor wafer sealing rotary platform, characterized in that, Includes a rotating docking station located at the entrance of a storage aisle and a sealing door assembly that cooperates with the entrance of the aisle; in, The rotating docking station includes a rotating platform, clamping arms, cylinder assemblies, and a spring mechanism. The rotating platform is rotatably mounted on a base at the entrance of the storage aisle via a drive mechanism. The clamping arm is disposed on the top of the rotating platform, and the cylinder assembly is fixedly installed on the bottom of the rotating platform and connected to the clamping arm. The clamping arm is driven to the cylinder assembly through the spring mechanism. Under the drive of the cylinder assembly, it opens and closes to clamp or release the wafer carrier, and provides clamping force to the wafer carrier through the spring mechanism to position and fix it. The sealing door assembly includes an outer door, an inner door, and a sealing assembly. The outer door is rotatably mounted on the outside of the storage aisle entrance via a first door hinge mechanism, and the inner door is rotatably mounted on the inside of the storage aisle entrance via a second door hinge mechanism. The outer door and the inner door are configured to open and close alternately. The sealing assembly is fixedly installed on the side wall of the tunnel entrance and electrically connected to the drive mechanism of the outer door and the inner door. It is used to control the alternating opening and closing of the outer door and the inner door so that at least one door is always closed when the wafer carrier enters and exits the storage via the rotating dock, so as to form an airlock structure at the tunnel entrance. The rotating platform can rotate within a predetermined angle range under the drive of the drive mechanism, so that when the wafer carrier is clamped by the clamping arm, the protrusion of the wafer carrier is rotated from the side facing the outside of the warehouse to the side facing the robot arm inside the warehouse, so as to realize the alignment and connection of the robot arm inside the warehouse, and reduce nitrogen leakage under the airtight isolation effect of the sealing door assembly.

2. The semiconductor wafer sealing rotary platform according to claim 1, characterized in that... The rotating platform also includes a rotating platform support plate and a sensor assembly. The rotating platform support plate is fixedly installed at the bottom of the rotating platform, and the sensor assembly is located on the side edge of the rotating platform support plate. It is used to detect the position or positioning status of the wafer carrier on the rotating docking platform and to feed back the detection signal to the control system.

3. The semiconductor wafer sealing rotary platform according to claim 1, characterized in that, The drive mechanism includes a motor pulley assembly, which is fixedly installed at the bottom of the rotating platform and connected to the rotating platform via a belt drive to drive the rotating platform to rotate relative to the base and realize the wafer carrier to rotate approximately 180 degrees from the outside to the inside.

4. The semiconductor wafer sealing rotary platform according to claim 1, characterized in that, The rotating docking platform also includes a fixed plate and a guide column and bracket assembly. The fixed plate is fixedly installed at the bottom of the rotating platform. The guide column and bracket assembly is bolted to the fixed plate and cooperates with the clamping arm to guide the clamping arm to move along a predetermined trajectory in the opening and closing direction.

5. The semiconductor wafer sealing rotary platform according to claim 1, characterized in that, The sealing door assembly also includes a sealing panel, which is fixedly installed on the inner surfaces of the outer door and the inner door, respectively, for cooperating with the corresponding sealing surface of the tunnel entrance when the outer door and / or the inner door are closed, so as to enhance the airtightness of the outer door and the inner door.

6. The semiconductor wafer sealing rotary platform according to claim 2, characterized in that, The sensor assembly includes an infrared sensor, which is embedded in the side edge of the rotary table support plate. The infrared sensor is used to detect the alignment or presence of the wafer carrier and to input the detection result as a control signal for the rotation of the rotary platform and the opening and closing of the clamping arm.

7. The semiconductor wafer sealing rotary platform according to claim 1, characterized in that, The rotating docking platform also includes a limiting component, which is fixedly installed on the side of the rotating platform or on the base to limit the rotation angle range of the rotating platform and prevent the rotating platform from exceeding the predetermined angle.

8. The semiconductor wafer sealing rotary platform according to claim 1, characterized in that, The rotating docking platform also includes a linear bearing, which is installed between the clamping arm and the cylinder assembly to support the clamping arm in linear reciprocating motion along its opening and closing direction and to reduce the frictional resistance of the clamping arm during the opening and closing process.

9. The semiconductor wafer sealing rotary platform according to claim 4, characterized in that, The guide post and support assembly includes multiple guide posts that are evenly distributed around the circumference of the fixing plate and are slidably connected to the clamping arm to ensure smooth movement of the clamping arm during opening and closing, thereby improving the stability of wafer carrier clamping.

10. The semiconductor wafer sealing rotary platform according to claim 1, characterized in that, The sealing assembly includes a control circuit board, which is embedded in the side wall of the tunnel entrance and electrically connected to the drive mechanism of the outer door and the inner door. The control circuit board is used to control the rotation angle and opening and closing sequence of the outer door and the inner door according to the control command, so as to realize the interlocking and alternating opening and closing of the two doors.

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