Tray placing mechanism for processing semiconductor wafers

CN224783552UActive Publication Date: 2026-09-22昆山日月同芯半导体有限公司
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Patent Information

Application Number
CN202522381193.6
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2025-11-10
Publication Date
2026-09-22
Estimated Expiration
2035-11-10

AI Technical Summary

Technical Problem

[0004]现有的托盘放置机构,不具备防尘功能,在使用过程,若托盘不够使用,需要从其他车间调配,调配时需要使用转运车对托盘转运,转运时会离开无尘车间,而一般托盘都是放置在存放架或者存放柜上通过转运车进行转运调配的,存放架或者放置柜都是开放式设计,这样在离开无尘车间时,托盘会沾染灰尘,影响托盘的清洁,在使用前需要对其进行清洁,增加工作量,降低了实用性,为了解决上述所存在的问题,我们提出加工半导体晶圆用托盘放置机构

Benefits of technology

1.本实用新型通过在放置后,转动手轮使第二同步轮带动同步带转动,同步带转动带动第一同步轮使收卷筒转动,收卷筒转动将遮挡帘放下对托盘进行遮挡防尘的方式,能够达到具备防尘功能的目的,保证了托盘的清洁,减少了工作量,提高了实用性;

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Abstract

The utility model discloses a tray placing mechanism for processing semiconductor wafer is applied to wafer processing field, including the placing cabinet, the top bolt connection of placing cabinet has first fixed shell, and the inner wall between first fixed shell has the reel of rotation sleeve joint, the utility model discloses a reel is rotated to the mode of dustproof of placing down the shielding curtain to the tray for shielding after being placed, can reach the purpose that possesses the dustproof function, has guaranteed the cleanness of tray, has reduced the work load, has improved practicality, the utility model discloses the screw cap is loosened, and the screw rod is rotated to the rotation adjusting head, and the screw rod rotation drives L slide plate to remove, and L slide plate removes the second synchronous wheel and removes the tightness of synchronous belt, thereby can adjust the tightness of synchronous belt, guarantee the stability, convenient to use.
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Description

Technical Field

[0001] This utility model relates to the field of wafer processing, and in particular to a tray placement mechanism for processing semiconductor wafers. Background Technology

[0002] A wafer is a chip used to manufacture silicon semiconductor integrated circuits. It is called a wafer because of its circular shape. Wafers are the basic material for manufacturing semiconductor chips. The most important raw material for semiconductor integrated circuits is silicon, hence the term silicon wafer. During wafer processing, trays are used to place the wafers for processing. When not in use, the trays need to be stored in a storage cabinet.

[0003] A search of Chinese patents revealed publication number CN215827190U, which discloses a material rack and wafer or disk storage mechanism. The material rack is vertically positioned within a material storage chamber. It includes an outer frame and at least one material-carrying section. An opening is provided on one side of the outer frame, connecting both sides of the outer frame. One side of the outer frame is a working side, and the other side is a temporary material-retrieving side. At least one material-carrying section is connected within the opening, and is arranged in a linear array along the vertical direction of the outer frame. The material-carrying section is composed of several rods located on the same horizontal plane, which is perpendicular to the vertical direction of the outer frame. This application can increase storage capacity and enable material retrieval from both sides.

[0004] Existing pallet placement mechanisms lack dustproof functionality. If there aren't enough pallets, they need to be transferred from other workshops, requiring the use of transfer vehicles. This transfer takes place outside the cleanroom. Pallets are typically placed on storage racks or cabinets and then transferred via transfer vehicles. These racks or cabinets are open designs, meaning the pallets become dusty when leaving the cleanroom, affecting their cleanliness. They need to be cleaned before use, increasing workload and reducing practicality. To address these issues, we propose a pallet placement mechanism for semiconductor wafer processing. Utility Model Content

[0005] The purpose of this invention is to provide a tray placement mechanism for processing semiconductor wafers, which has the advantage of being dustproof.

[0006] The above-mentioned technical objective of this utility model is achieved through the following technical solution: a tray placement mechanism for processing semiconductor wafers, including a placement cabinet, a first fixed shell bolted to the top of the placement cabinet, a winding drum rotatably sleeved between the inner walls of the first fixed shell, a shielding curtain bolted to the surface of the winding drum, a sliding rod bolted to the bottom of the shielding curtain, a fixing mechanism provided at one end of the winding drum, a first synchronous pulley fixedly sleeved at the other end of the winding drum, a rotating shaft provided at the bottom of the first synchronous pulley, a second synchronous pulley fixedly sleeved on the surface of the rotating shaft, and a synchronous belt drivingly connecting the surfaces of the second synchronous pulley and the first synchronous pulley.

[0007] By adopting the above technical solution, after placement, turning the handwheel causes the second synchronous pulley to drive the synchronous belt to rotate, and the rotation of the synchronous belt drives the first synchronous pulley to rotate the take-up drum. The rotation of the take-up drum lowers the shielding curtain to cover the tray and prevent dust. This achieves the purpose of dust prevention, ensures the cleanliness of the tray, reduces workload, and improves practicality.

[0008] The present invention is further configured such that: a second fixed shell is bolted to the surface of the placement cabinet, and the rotating shaft is rotatably sleeved with the inner wall of the second fixed shell; a first sliding groove is provided on the inner wall of the second fixed shell; a first slider is slidably connected to the inner wall of the first sliding groove; an L-shaped sliding plate is bolted between the first sliders; the surface of the L-shaped sliding plate is rotatably connected to one end of the rotating shaft; a screw is rotatably connected to the surface of the L-shaped sliding plate; and the screw is threadedly connected to the inner wall of the second fixed shell.

[0009] By adopting the above technical solution, by loosening the nut and rotating the adjusting head, the screw is rotated. The rotation of the screw drives the L-shaped slide plate to move, and the movement of the L-shaped slide plate drives the second synchronous pulley to move, thereby changing the tension of the synchronous belt. This allows for adjustment of the tension of the synchronous belt, ensuring stability and making it convenient to use.

[0010] The present invention is further configured such that: the fixing mechanism includes a fixing block, the fixing block is bolted to the surface of the first fixing shell, a turntable is fixedly sleeved on the surface of the winding drum, and the turntable is rotatably sleeved with the inner wall of the fixing block; a plurality of limiting heads are slidably sleeved on the inner wall of the fixing block; a spring is provided between the limiting head and the inner wall of the fixing block; a plurality of limiting grooves are opened on the surface of the turntable, and the limiting head is engaged with the limiting groove.

[0011] By adopting the above technical solution, a fixing mechanism is set up to engage the limiting head with the limiting hole under the action of the spring, which can fix the winding drum and prevent the curtain from stopping in the required position. One end of the limiting head is arc-shaped to facilitate the rotation of the winding drum.

[0012] The present invention is further configured such that: both ends of the slide rod are bolted to a second slider, the surface of the second slider is slidably connected to a second groove, and the second groove is opened on the inner wall of the cabinet.

[0013] By adopting the above technical solution, the second slider and the second slide groove are set to prevent the slide rod from deviating and improve stability.

[0014] The present invention is further configured such that a handwheel is fixedly sleeved at one end of the rotating shaft.

[0015] By adopting the above technical solution, a handwheel is provided to facilitate the rotation of the shaft and make it easy to use.

[0016] The present invention is further configured such that an adjusting head is welded to one end of the screw.

[0017] By adopting the above technical solution, the screw can be easily rotated by setting an adjustment head.

[0018] The present invention is further configured such that a nut is threaded onto the surface of the screw.

[0019] By adopting the above technical solution, the screw is fixed by setting a nut to ensure stability.

[0020] The present invention is further configured such that the bottom of the placement cabinet is bolted with multiple casters.

[0021] The above technical solution, by incorporating casters, facilitates movement.

[0022] In summary, this utility model has the following beneficial effects: 1. This utility model achieves the purpose of dust prevention by rotating the handwheel after placement, causing the second synchronous pulley to drive the synchronous belt to rotate, which in turn drives the first synchronous pulley to rotate the take-up drum. The rotation of the take-up drum lowers the shielding curtain to cover the tray and prevent dust. This ensures the cleanliness of the tray, reduces workload, and improves practicality. 2. This utility model allows for adjustment of the timing belt tension by loosening the nut and rotating the adjusting head, thus ensuring stability and ease of use. Attached Figure Description

[0023] Figure 1 This is a three-dimensional structural view of the present invention; Figure 2 This is a three-dimensional sectional view of the structure of this utility model; Figure 3 This is a partial three-dimensional structural view of the present invention; Figure 4This is a partial three-dimensional cross-sectional view of the structure of this utility model; Figure 5 This is a partial three-dimensional cross-sectional view of the structure of this utility model; Figure 6 This is a utility model Figure 2 Enlarged view of the structure at point A in the middle.

[0024] Reference numerals in the attached drawings: 1. Placement cabinet; 2. First fixed shell; 3. Rewind drum; 4. Screen curtain; 5. Slide rod; 6. Fixing mechanism; 7. First synchronous pulley; 8. Rotating shaft; 9. Second synchronous pulley; 10. Synchronous belt; 11. Second fixed shell; 12. First slide groove; 13. First slider; 14. L-shaped slide plate; 15. Screw; 16. Fixing block; 17. Turntable; 18. Limiting head; 19. Spring; 20. Limiting groove; 21. Second slider; 22. Second slide groove; 23. Handwheel; 24. Adjusting head; 25. Nut; 26. Universal wheel. Detailed Implementation

[0025] The present invention will be further described in detail below with reference to the accompanying drawings.

[0026] Example 1: refer to Figure 1 , Figure 2 , Figure 3 and Figure 4 A tray placement mechanism for processing semiconductor wafers includes a placement cabinet 1. A first fixed shell 2 is bolted to the top of the placement cabinet 1. A take-up drum 3 is rotatably sleeved between the inner walls of the first fixed shell 2. A shielding curtain 4 is bolted to the surface of the take-up drum 3. A sliding rod 5 is bolted to the bottom of the shielding curtain 4. A fixing mechanism 6 is provided at one end of the take-up drum 3, and a first synchronous pulley 7 is fixedly sleeved at the other end of the take-up drum 3. A rotating shaft 8 is provided at the bottom of the first synchronous pulley 7, and a second synchronous pulley 9 is fixedly sleeved on the surface of the rotating shaft 8. A synchronous belt 10 is connected between the surfaces of the second synchronous pulley 9 and the first synchronous pulley 7. After placement, rotating the handwheel 23 causes the second synchronous pulley 9 to drive the synchronous belt 10 to rotate. The rotation of the synchronous belt 10 drives the first synchronous pulley 7 to rotate the take-up drum 3. The rotation of the take-up drum 3 lowers the shielding curtain 4 to cover the tray and prevent dust. This achieves the purpose of dust prevention, ensures the cleanliness of the tray, reduces workload, and improves practicality.

[0027] refer to Figure 2 and Figure 5The fixing mechanism 6 includes a fixing block 16, which is bolted to the surface of the first fixing shell 2. A turntable 17 is fixedly sleeved on the surface of the take-up drum 3, and the turntable 17 is rotatably sleeved with the inner wall of the fixing block 16. Multiple limiting heads 18 are slidably sleeved on the inner wall of the fixing block 16. A spring 19 is provided between the limiting head 18 and the inner wall of the fixing block 16. Multiple limiting grooves 20 are opened on the surface of the turntable 17, and the limiting head 18 is engaged with the limiting groove 20. By setting the fixing mechanism 6, the limiting head 18 is engaged with the limiting hole under the action of the spring 19, which can fix the take-up drum 3 and prevent the curtain 4 from stopping in the required position. One end of the limiting head 18 is arc-shaped to facilitate the rotation of the take-up drum 3.

[0028] refer to Figure 6 Both ends of the slide rod 5 are bolted to a second slider 21. The surface of the second slider 21 is slidably connected to a second groove 22, and the second groove 22 is opened on the inner wall of the placement cabinet 1. By setting the second slider 21 and the second groove 22, the slide rod 5 is prevented from shifting and the stability is improved.

[0029] refer to Figure 1 , Figure 2 and Figure 3 A handwheel 23 is fixedly sleeved at one end of the rotating shaft 8. By setting the handwheel 23, it is easy to rotate the rotating shaft 8 and make it convenient to use.

[0030] Example 2: refer to Figure 4 The surface of the cabinet 1 is bolted to a second fixed shell 11, and the rotating shaft 8 is rotatably sleeved with the inner wall of the second fixed shell 11. The inner wall of the second fixed shell 11 is provided with a first sliding groove 12, and the inner wall of the first sliding groove 12 is slidably connected to a first slider 13. An L-shaped sliding plate 14 is bolted between the first sliders 13, and the surface of the L-shaped sliding plate 14 is rotatably connected to one end of the rotating shaft 8. A screw 15 is rotatably connected to the surface of the L-shaped sliding plate 14, and the screw 15 is threadedly connected to the inner wall of the second fixed shell 11. By loosening the nut 25 and rotating the adjusting head 24, the screw 15 is rotated. The rotation of the screw 15 drives the L-shaped sliding plate 14 to move, and the movement of the L-shaped sliding plate 14 drives the second synchronous pulley 9 to move, thereby changing the tension of the synchronous belt 10. This allows for adjustment of the tension of the synchronous belt 10, ensuring stability and ease of use.

[0031] refer to Figure 4 An adjusting head 24 is welded to one end of the screw 15, which facilitates the rotation of the screw 15.

[0032] refer to Figure 4 The screw 15 is threaded with a nut 25, which fixes the screw 15 and ensures stability.

[0033] refer to Figure 1 , Figure 2 and Figure 3 The bottom of the cabinet 1 is bolted with multiple casters 26, which facilitate movement.

[0034] Brief description of usage: Place the tray in the slotted compartment of storage cabinet 1. After placement, turn handwheel 23. Handwheel 23 rotates shaft 8, which in turn rotates second synchronous pulley 9, which in turn rotates synchronous belt 10, which in turn rotates first synchronous pulley 7, which in turn rotates winding drum 3. Winding drum 3 lowers the shielding curtain 4, which protects the tray inside storage cabinet 1 from dust. To use, turn handwheel 23 in the opposite direction to roll up and open the shielding curtain 4 for tray retrieval. One end of the limiting head 18 is arc-shaped, positioned on the shielding curtain 4. When moved to the desired position, the limiting head 18 engages with the limiting hole under the action of the spring 19, fixing it in place, thus securing the curtain 4 in the desired position and achieving dust prevention. Loosen the nut 25, rotate the adjusting head 24, and the rotation of the adjusting head 24 drives the screw 15 to rotate. The rotation of the screw 15 causes the L-shaped slide plate 14 to move, which in turn drives the rotating shaft 8 to move the second synchronous pulley 9. The movement of the second synchronous pulley 9 changes the tension of the synchronous belt 10. After adjusting the tension of the synchronous belt 10 to the desired position, tighten the nut 25 to facilitate the adjustment of the tension of the synchronous belt 10.

[0035] It should be noted that parts have a lifespan and can be replaced during regular maintenance when they no longer meet performance requirements. Deterioration in performance due to prolonged use of parts is not a design defect of this application.

[0036] This specific embodiment is merely an explanation of the present utility model and is not intended to limit the present utility model. After reading this specification, those skilled in the art can make modifications to this embodiment without contributing any inventive step, but as long as they are within the scope of the claims of the present utility model, they are protected by patent law.

Claims

1. A tray placement mechanism for processing semiconductor wafers, comprising a placement cabinet (1), characterized in that, The top of the placement cabinet (1) is bolted to a first fixed shell (2), and a take-up drum (3) is rotatably sleeved between the inner walls of the first fixed shell (2). A shielding curtain (4) is bolted to the surface of the take-up drum (3), and a sliding rod (5) is bolted to the bottom of the shielding curtain (4). A fixing mechanism (6) is provided at one end of the take-up drum (3), and a first synchronous pulley (7) is fixedly sleeved at the other end of the take-up drum (3). A rotating shaft (8) is provided at the bottom of the first synchronous pulley (7), and a second synchronous pulley (9) is fixedly sleeved on the surface of the rotating shaft (8). A synchronous belt (10) is connected between the surfaces of the second synchronous pulley (9) and the first synchronous pulley (7).

2. The tray placement mechanism for processing semiconductor wafers according to claim 1, characterized in that, The surface of the placement cabinet (1) is bolted to a second fixed shell (11), and the rotating shaft (8) is rotatably sleeved with the inner wall of the second fixed shell (11). The inner wall of the second fixed shell (11) is provided with a first sliding groove (12). The inner wall of the first sliding groove (12) is slidably connected to a first slider (13). An L-shaped sliding plate (14) is bolted between the first sliders (13), and the surface of the L-shaped sliding plate (14) is rotatably connected to one end of the rotating shaft (8). The surface of the L-shaped sliding plate (14) is rotatably connected to a screw (15), and the screw (15) is threadedly connected to the inner wall of the second fixed shell (11).

3. The tray placement mechanism for processing semiconductor wafers according to claim 1, characterized in that, The fixing mechanism (6) includes a fixing block (16), which is bolted to the surface of the first fixing shell (2). A turntable (17) is fixedly sleeved on the surface of the winding drum (3), and the turntable (17) is rotatably sleeved with the inner wall of the fixing block (16). Multiple limiting heads (18) are slidably sleeved on the inner wall of the fixing block (16). A spring (19) is provided between the limiting head (18) and the inner wall of the fixing block (16). Multiple limiting grooves (20) are opened on the surface of the turntable (17), and the limiting head (18) is engaged with the limiting groove (20).

4. The tray placement mechanism for processing semiconductor wafers according to claim 1, characterized in that, Both ends of the slide bar (5) are bolted to a second slider (21), and the surface of the second slider (21) is slidably connected to a second groove (22), and the second groove (22) is opened on the inner wall of the cabinet (1).

5. The tray placement mechanism for processing semiconductor wafers according to claim 1, characterized in that, A handwheel (23) is fixedly sleeved at one end of the rotating shaft (8).

6. The tray placement mechanism for processing semiconductor wafers according to claim 2, characterized in that, An adjusting head (24) is welded to one end of the screw (15).

7. The tray placement mechanism for processing semiconductor wafers according to claim 2, characterized in that, The screw (15) is threaded with a nut (25).

8. The tray placement mechanism for processing semiconductor wafers according to claim 1, characterized in that, The bottom of the placement cabinet (1) is bolted with multiple casters (26).

Citation Information

Patent Citations

  • Material rack and wafer or disc storage mechanism

    CN215827190U