A tilt immersion lithography fixing device

Abstract

The utility model discloses a kind of oblique soaking type etching fixing devices, comprising: etching basket, clamping mechanism, oblique drive mechanism and rotary drive mechanism;Clamping mechanism is set in etching basket, for fixed substrate;Oblique drive mechanism is connected with clamping mechanism, for driving clamping mechanism rotates around a horizontal axis, so that the substrate being clamped is immersed in processing liquid with non-perpendicular to the surface of liquid inclination posture;Rotary drive mechanism is connected with clamping mechanism, for clamping mechanism reciprocating swing around a vertical axis.This device is combined by oblique immersion and rotary swing, so that etching liquid can more evenly, fully contact substrate surface, thereby improve the uniformity and consistency of etching, avoid the problem of local etching deficiency or etching residue.

Description

Technical Field

[0001] This utility model relates to the field of glass substrate etching technology, specifically to an inclined immersion etching fixing device. Background Technology

[0002] In the processing of substrates (such as silicon wafers and glass substrates) for industries such as microelectronics, optoelectronics, and flat panel displays, wet chemical etching is a critical step. Currently, the industry commonly uses a method of vertically immersing the substrates into the etching tank for batch processing.

[0003] For example, patent CN203960050U discloses a glass substrate etching tank. This glass substrate etching tank includes a housing with sidewalls and a bottom. The bottom and sidewalls cooperate to form a receiving cavity with an opening at the top for holding etching solution. An inlet pipe is also laid within the receiving cavity, adjacent to the bottom of the housing. A first nozzle is provided on the side of the inlet pipe facing the opening. The etching solution enters the receiving cavity through the first nozzle of the inlet pipe, and the glass substrate enters the receiving cavity through the opening and is confined to the side of the inlet pipe facing the opening for etching.

[0004] However, this traditional vertical immersion method has significant drawbacks: when the substrate is inserted vertically or horizontally into the etching tank, the liquid cannot smoothly displace the air in the contact area between the substrate surface and the liquid surface, easily forming a large number of attached bubbles on the substrate surface, especially in areas with fine patterns, edges, or grooves. These bubbles can obstruct effective contact between the etching solution and the substrate, leading to insufficient etching in certain areas or the formation of etching residues, which seriously affects the dimensional accuracy and electrical performance of the product. Utility Model Content

[0005] The purpose of this invention is to overcome the above-mentioned technical deficiencies and propose an inclined immersion etching fixing device to solve the technical problem in the prior art where air bubbles adhere to the surface of the substrate due to vertical or horizontal entry into the etching tank, resulting in local insufficient etching or etching residue, which affects the dimensional accuracy and electrical performance of the product.

[0006] To achieve the above-mentioned technical objectives, the present invention adopts the following technical solution: This utility model provides an inclined immersion etching and fixing device, including an etching basket, a clamping mechanism, an inclined driving mechanism, and a rotary driving mechanism; the clamping mechanism is disposed in the etching basket for fixing the substrate; the inclined driving mechanism is connected to the clamping mechanism for driving the clamping mechanism to rotate around a horizontal axis, so that the clamped substrate is immersed in the processing liquid in an inclined posture that is not perpendicular to the liquid surface; the rotary driving mechanism is connected to the clamping mechanism for driving the clamping mechanism to reciprocate around a vertical axis.

[0007] In some embodiments, the tilting drive mechanism drives the clamping mechanism to tilt at an angle ranging from 10° to 80°.

[0008] In some embodiments, the clamping mechanism includes a mounting frame, a clamping drive, and a clamping plate. A clamping area is formed on the inner side of the mounting frame. The clamping drive is disposed on the mounting frame, and its drive end is connected to the clamping plate to drive the clamping plate to move within the clamping area to clamp or release the substrate.

[0009] In some embodiments, two sets of clamping drive members and clamping plates are provided, which are symmetrically arranged on both sides of the clamping area of ​​the mounting frame.

[0010] In some embodiments, the clamping surface of the clamping plate is provided with two parallel limiting protrusions, and a limiting groove for accommodating the edge of the substrate is formed between the two limiting protrusions.

[0011] In some embodiments, the mounting bracket has a vertical state and an inclined etching working state under the drive of the tilting drive mechanism; when the mounting bracket is in the vertical state, a clearance is reserved between the bottom of the mounting bracket and the bottom wall of the etching basket; when the mounting bracket is rotated to the etching working state, the bottom of the mounting bracket partially contacts the bottom wall of the etching basket.

[0012] In some embodiments, the tilting drive mechanism includes a fixed base and a first rotary drive member. The fixed base is rotatably mounted inside the etching basket, and the first rotary drive member is mounted on the fixed base. Its output end is connected to the clamping mechanism for driving the clamping mechanism to rotate about a horizontal axis.

[0013] In some embodiments, multiple sets of the clamping mechanism and the tilting drive mechanism are provided and arranged side by side along the length direction of the etching basket.

[0014] In some embodiments, the rotary drive mechanism includes a second rotary drive member and a transmission assembly. The second rotary drive member is connected to the fixed base of each of the tilting drive mechanisms through the transmission assembly to transmit power to each of the clamping mechanisms and drive each of the clamping mechanisms to swing synchronously around a vertical axis.

[0015] In some embodiments, the first rotary drive and the second rotary drive are servo motors or stepper motors.

[0016] Compared with existing technologies, the tilted immersion etching fixture provided by this invention achieves bubble-free initial wetting and continuous, uniform dynamic etching through the synergistic effect of tilted immersion and reciprocating oscillation. The tilted immersion method allows the liquid to rise smoothly from bottom to top and expel air, fundamentally solving the problem of air bubble encapsulation when the substrate is immersed in the liquid; while the reciprocating oscillation around the vertical axis generates alternating, dead-angle-free stirring of the liquid layer on the substrate surface, effectively promoting the exchange of etching solution and the removal of by-products, ensuring the uniformity and consistency of etching, avoiding the problems of insufficient etching or etching residue in certain areas, thereby improving the dimensional accuracy and electrical performance of the product. Attached Figure Description

[0017] Figure 1 This is a three-dimensional structural schematic diagram of the inclined immersion etching and fixing device provided in this embodiment of the utility model; Figure 2 This is a schematic diagram of the main cross-sectional structure of the inclined immersion etching and fixing device provided in this embodiment of the present invention; Figure 3 This is a top view of the initial state of the inclined immersion etching and fixing device provided in this embodiment of the present invention. Figure 4 This is a top view of the tilting immersion etching fixing device provided in this embodiment of the present invention, showing the rotating drive mechanism driving the clamping mechanism to swing. Figure 5 This is a schematic diagram of the transmission component of the inclined immersion etching fixing device provided in this embodiment of the utility model.

[0018] Explanation of reference numerals in the attached figures: 1. Etching basket; 2. Clamping mechanism; 21. Mounting bracket; 22. Clamping drive component; 23. Clamping plate; 24. Limiting protrusion; 3. Tilting drive mechanism; 31. Fixed base; 32. First rotary drive component; 4. Rotary drive mechanism; 41. Fixed plate; 42. Second rotary drive component; 43. Transmission assembly; 431. Driving pulley; 432. Driven pulley; 433. Transmission belt; 5. Substrate. Detailed Implementation

[0019] To make the objectives, technical solutions, and advantages of this utility model clearer, the present utility model will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present utility model and are not intended to limit the present utility model.

[0020] To address the technical problem of air bubbles adhering to the surface of the substrate when it enters the etching tank vertically or horizontally, resulting in insufficient etching or etching residue in certain areas and affecting the dimensional accuracy and electrical performance of the product, this invention provides an inclined immersion etching fixing device. By combining inclined immersion with rotational oscillation, the etching solution can contact the substrate surface more evenly and fully during the etching process, thereby improving the uniformity and consistency of etching and avoiding the problems of insufficient etching or etching residue in certain areas.

[0021] Please see Figure 1 The inclined immersion etching and fixing device includes: an etching basket 1, a clamping mechanism 2, an inclined driving mechanism 3, and a rotary driving mechanism 4; the clamping mechanism 2 is disposed in the etching basket 1 and is used to fix the substrate 5; the inclined driving mechanism 3 is connected to the clamping mechanism 2 and is used to drive the clamping mechanism 2 to rotate around a horizontal axis, so that the clamped substrate 5 is immersed in the processing liquid in an inclined posture that is not perpendicular to the liquid surface; the rotary driving mechanism 4 is connected to the clamping mechanism 2 and is used to drive the clamping mechanism 2 to swing back and forth around a vertical axis.

[0022] In this device, the substrate 5 can be clamped by the clamping mechanism 2, and the tilting drive mechanism 3 can drive the clamping mechanism 2 to rotate around a horizontal axis, allowing the substrate 5 to be immersed in the etching solution in an tilted posture during the etching process. Under the action of the rotation drive mechanism 4, it can also oscillate back and forth around a vertical axis during the etching process. This design effectively promotes the smooth replacement of air in the contact area between the substrate 5 surface and the liquid surface, significantly reducing the adhesion of air bubbles on the substrate 5 surface, especially in areas with fine patterns, edges, and grooves. Through the combination of tilting immersion and rotational oscillation, the etching solution can contact the substrate 5 surface more evenly and fully, thereby improving the uniformity and consistency of etching, avoiding problems such as insufficient etching or etching residue, and ultimately improving the dimensional accuracy and electrical performance of the product.

[0023] It should be noted that the etching basket 1 in this solution is an etching frame structure that can be hoisted or transferred as a whole. The basket body of the etching basket 1 is made of corrosion-resistant material, and its side walls and bottom walls are designed with dense flow holes to ensure that the etching solution can flow in and out freely and quickly, avoiding dead zones. Inside the etching basket 1, multiple sets of clamping and driving units are arranged side by side along its length. Each set of units includes a tilting driving mechanism 3 and a clamping mechanism 2. This allows it to simultaneously etch multiple substrates 5, and because each unit works independently, a failure in one set of units will not affect the normal operation of other units.

[0024] Please see Figure 1 and Figure 2In some possible embodiments, the clamping mechanism 2 includes a clamping drive 22 and a mounting frame 21 driven by the clamping drive 22. A clamping area is formed on the inner side of the mounting frame 21. Two sets of clamping drive 22 and clamping plates 23 are symmetrically arranged on both sides of this clamping area. The clamping drive 22 is a cylinder or hydraulic cylinder, etc. The cylinder body of the clamping drive 22 is fixed to the mounting frame 21, and its piston rod end is connected to the clamping plate 23. Two parallel limiting protrusions 24 are provided on the clamping surface of the clamping plate 23, forming a limiting groove between them. The protrusion thickness is 0.5mm-3mm, used to engage with the edge of the substrate 5, thereby achieving stable clamping of the substrate 5.

[0025] Furthermore, in some possible embodiments, the mounting bracket 21 is designed to have two states when driven. When in the vertical state, sufficient clearance is provided between the bottom of the mounting bracket 21 and the bottom wall of the etching basket 1, which not only facilitates automatic loading and unloading by the robotic arm but also ensures a more compact structure for the etching basket 1 during movement or storage. When the first rotary drive 32 drives the mounting bracket 21 to rotate around the horizontal axis to a preset tilt angle, the mounting bracket 21 enters the etching working state. At this time, its bottom will contact the bottom wall of the etching basket 1, forming a stable support point to resist the fluid forces and inertia generated when swinging in the etching fluid.

[0026] Please see Figure 1 and Figure 2 In some possible embodiments, the tilting drive mechanism 3 includes a fixed base 31 rotatably mounted on the etching basket 1 via a bearing seat, and a first rotary drive 32 mounted on the fixed base 31. The first rotary drive 32 is preferably a waterproof servo motor or a stepper motor. The tilting drive mechanism 3 drives the clamping mechanism 2 to tilt at angles ranging from 10° to 80°.

[0027] Please see Figures 1 to 5 In some possible embodiments, the rotary drive mechanism 4 includes a fixed plate 41, a second rotary drive member 42, and a transmission assembly 43. Multiple fixed plates 41 are provided and each corresponds to a mounting base. The second rotary drive member 42 is preferably a waterproof servo motor or stepper motor, and is connected to multiple fixed bases 31 simultaneously via the transmission assembly 43 and the fixed plates 41. When the second rotary drive member 42 is activated, the transmission assembly 43 drives multiple fixed bases 31 to synchronously reciprocate around their own vertical axes at small angles (e.g., ±20 degrees), thereby causing multiple mounting frames 21 and the substrates 5 clamped on them to swing together, achieving dynamic stirring of the etching solution on the surface of the substrate 5.

[0028] In one preferred embodiment, the transmission assembly 43 is preferably a belt drive structure, which includes a driving pulley 431, a plurality of driven pulleys 432, and a transmission belt 433 surrounding adjacent pulleys. The driving pulley 431 is connected to the output shaft of the second rotary drive member 42, and the driven pulleys 432 are connected to the fixed base 31. When the second rotary drive member 42 is activated, the driving pulley 431 rotates accordingly, driving the plurality of driven pulleys 432 to rotate synchronously via the transmission belt 433. Since the driven pulleys 432 are connected to the fixed base 31, the fixed base 31 will reciprocate around the vertical axis at a small angle along with the driven pulleys 432.

[0029] The tilted immersion etching fixture provided by this invention achieves bubble-free initial wetting and continuous, uniform dynamic etching through the synergistic effect of tilted immersion and reciprocating oscillation. The tilted immersion method allows the liquid to rise smoothly from bottom to top and expel air, fundamentally solving the problem of air bubble encapsulation when the substrate 5 is immersed in the liquid; while the reciprocating oscillation around the vertical axis generates alternating, dead-angle-free stirring of the liquid layer on the surface of the substrate 5, effectively promoting the exchange of etching solution and the removal of by-products, ensuring the uniformity and consistency of etching, avoiding the problems of insufficient etching or etching residue in certain areas, thereby improving the dimensional accuracy and electrical performance of the product.

[0030] In the description of this application, it should be noted that the terms "upper" and "lower," etc., indicating the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application. Unless otherwise expressly specified and limited, the terms "installed," "connected," and "linked" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication between two elements. For those skilled in the art, the specific meaning of the above terms in this application can be understood according to the specific circumstances.

[0031] It should be noted that in this application, relational terms such as "first" and "second" are used merely to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.

[0032] The specific embodiments of this utility model described above do not constitute a limitation on the scope of protection of this utility model. Any other corresponding changes and modifications made based on the technical concept of this utility model should be included within the scope of protection of the claims of this utility model.

Claims

1. A tilt immersion lithography fixation device, characterized by, The application relates to a substrate etching device, which comprises: an etching basket; a clamping mechanism arranged in the etching basket and used for fixing a substrate; a tilting driving mechanism connected with the clamping mechanism and used for driving the clamping mechanism to rotate around a horizontal axis so that the clamped substrate is immersed in a processing liquid in a tilting posture which is not perpendicular to the liquid surface; a rotating driving mechanism connected with the clamping mechanism and used for driving the clamping mechanism to reciprocally swing around a vertical axis.

2. The tilt-and-dip immersion etching fixture of claim 1, wherein, The tilting angle of the clamping mechanism driven by the tilting driving mechanism ranges from 10 to 80 degrees.

3. The tilt-and-dip immersion etching fixture of claim 1, wherein, The clamping mechanism comprises a mounting frame, a clamping driving element and a clamping plate, the inner side of the mounting frame is formed with a clamping area, the clamping driving element is arranged on the mounting frame, and the driving end of the clamping driving element is connected with the clamping plate and used for driving the clamping plate to move in the clamping area so as to clamp or release the substrate.

4. The tilt-and-dip immersion etching fixture of claim 3, wherein, The clamping driving element and the clamping plate are arranged in two groups and symmetrically arranged on both sides of the clamping area of the mounting frame.

5. The tilt-and-dip immersion etching fixture of claim 3 or 4, wherein, The clamping surface of the clamping plate is provided with two parallel limiting convex edges, and a limiting groove for accommodating the edge of the substrate is formed between the two limiting convex edges.

6. The tilt-and-dip immersion etching fixture of claim 3, wherein, The mounting frame has a vertical state and an etching working state in the tilting driving of the tilting driving mechanism; when the mounting frame is in the vertical state, an avoiding gap is reserved between the bottom of the mounting frame and the bottom wall of the etching basket; when the mounting frame is rotated to the etching working state, the bottom of the mounting frame is partially in contact with the bottom wall of the etching basket.

7. The tilt-and-dip immersion etching fixture of claim 1, wherein, The tilting driving mechanism comprises a fixed base and a first rotating driving element, the fixed base is rotationally installed in the etching basket, and the first rotating driving element is installed on the fixed base and connected with the clamping mechanism at the output end and used for driving the clamping mechanism to rotate around a horizontal axis.

8. The tilt-and-dip immersion etching fixture of claim 7, wherein, The clamping mechanism and the tilting driving mechanism are arranged in multiple groups and arranged in parallel along the length direction of the etching basket.

9. The tilt-and-dip immersion etching fixture of claim 8, wherein, The rotating driving mechanism comprises a second rotating driving element and a transmission assembly, the second rotating driving element is connected with the fixed base of each tilting driving mechanism through the transmission assembly so as to transmit power to each clamping mechanism and drive each clamping mechanism to synchronously swing around a vertical axis.

10. The tilt-and-dip immersion etching fixture of claim 9, wherein, The first rotating driving element and the second rotating driving element are servo motors or step motors.

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