A small vacuum gauge anti-coating device for PVD and CVD processes

Abstract

The utility model provides a small -size vacuum gauge anti -plating device for PVD, CVD process relates to semiconductor equipment technical field. Its both ends are suitable for connecting to vacuum gauge and process chamber, include: buffer pipeline and set up first connecting end and second connecting end of buffer pipeline both ends, set up spiral buffer structure in buffer pipeline to reduce the probability that gas molecule in process chamber enters vacuum gauge. Through this scheme to improve the service life of vacuum gauge, and promote the precision of vacuum gauge measurement.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor equipment technology, and more specifically, to a small vacuum-sealed coating device for PVD and CVD processes. Background Technology

[0002] In vacuum coating processes such as PVD and CVD, vacuum gauges are critical measuring elements, and their measurement accuracy directly affects the quality of process control. Existing vacuum gauge anti-coating devices commonly employ two structural forms: right-angle bend type and bent solenoid type. The right-angle bend type blocks coating material deposition by using multiple right-angle bends, but this structure has significant drawbacks: insufficient right-angle bends result in poor anti-coating effect; increasing the number of bends increases the device size and generates significant gas flow resistance, affecting not only the accuracy of the vacuum gauge readings but also causing phase differences in the pressure curve, severely impacting the pressure control accuracy during the process. The bent solenoid type anti-coating device typically uses a metal spiral or spring-shaped EP tube. This structure faces several problems in practical applications: firstly, it is difficult to manufacture and requires advanced manufacturing processes; secondly, due to the limitation of the bending radius, the size of this type of device is often difficult to miniaturize; furthermore, this structure has low space utilization during equipment installation, hindering compact equipment layout. These technical defects severely limit the effectiveness and reliability of vacuum gauges in coating processes. Utility Model Content

[0003] This utility model discloses a small vacuum-controlled coating device for PVD and CVD processes to solve the above-mentioned technical problems.

[0004] The present invention adopts the following solution: This application provides a small vacuum gauge anti-coating device for PVD and CVD processes, with its two ends adapted to be connected to a vacuum gauge and a process chamber, respectively. It includes a buffer pipe and a first connection end and a second connection end disposed at both ends of the buffer pipe. The buffer pipe is provided with a spiral buffer structure to reduce the probability of gas molecules in the process chamber entering the vacuum gauge.

[0005] Furthermore, the spiral buffer structure includes a continuous spiral baffle plate extending along the length of the buffer pipe. The periphery of the spiral baffle plate is fixed to the inner wall of the buffer pipe, and a single channel with multiple spirals is formed inside the buffer pipe to extend the travel distance of the gas components through the buffer pipe.

[0006] Furthermore, the spiral buffer structure is fixed inside the buffer pipe by welding.

[0007] Furthermore, the first connecting end and the second connecting end are detachably installed at both ends of the buffer pipe to facilitate replacement of the buffer pipe.

[0008] Furthermore, the first connection end and the second connection end are VCR connectors, or KF flanges, or CF flanges.

[0009] Beneficial effects: This application provides a small vacuum gauge anti-coating device and its spiral buffer structure for PVD and CVD processes. By setting the spiral buffer structure to extend the gas molecule path and increase the flow resistance, the probability of process gas molecules in the process chamber diffusing into the vacuum gauge is reduced. At the same time, the compact design achieves miniaturization, which has the advantages of compact structure and excellent anti-coating effect. Attached Figure Description

[0010] Figure 1 This is a cross-sectional structural schematic diagram of a small vacuum-sealed coating device for PVD and CVD processes according to an embodiment of the present invention. Figure 2 This is a front structural schematic diagram of a small vacuum-sealed coating device for PVD and CVD processes according to an embodiment of the present invention. Figure 3 This is an isometric view of a small vacuum-sealed coating device for PVD and CVD processes according to an embodiment of the present invention. Reference numerals: 1. Buffer pipe; 2. Spiral buffer structure; 3. First connecting end; 4. Second connecting end. Detailed Implementation

[0011] Combination Figures 1 to 3 As shown, this embodiment provides a small vacuum gauge anti-coating device for PVD and CVD processes. Its two ends are respectively adapted to be connected to the vacuum gauge and the process chamber. It includes: a buffer pipe 1 and a first connecting end 3 and a second connecting end 4 disposed at both ends of the buffer pipe 1. The buffer pipe 1 is provided with a spiral buffer structure 2 to reduce the probability of gas molecules in the process chamber entering the vacuum gauge.

[0012] This application proposes an anti-coating device connecting a vacuum gauge and a process chamber at both ends, comprising a buffer pipe 1 and connecting ends at both ends, with a spiral buffer structure 2 installed inside the buffer pipe 1. This structure reduces the probability of gas molecules entering the vacuum gauge by extending the movement path of gas molecules. The buffer pipe 1 refers to a tubular structure of a predetermined length, which can be made of stainless steel or aluminum alloy tubing. This pipe serves as a gas transmission channel, providing installation space for the spiral structure. The first connecting end 3 and the second connecting end 4 refer to interface components respectively located at both ends of the buffer pipe 1, which can be in the form of VCR connectors, KF flanges, or CF flanges, achieving a sealed connection with the vacuum gauge and the process chamber through threads or clamps. This design facilitates rapid installation and disassembly of the device in the system. The spiral buffer structure 2 refers to a continuous spiral flow guiding component extending along the axial direction of the pipe, which can be made of thin-walled metal plate formed by spinning and then welded to the inner wall of the pipe. This structure forms a single-threaded spiral channel inside the pipe, forcing gas molecules to move along the spiral path, increasing the number of collisions with the pipe wall, thereby allowing gas molecules to preferentially coat the spiral buffer structure 2, reducing the probability of gas molecules entering the vacuum gauge, or reducing the speed at which gas molecules enter the vacuum gauge, and improving the service life of the vacuum gauge.

[0013] When the gas in the process chamber carrying the coating material diffuses towards the vacuum gauge, the gas molecules are forced to move along the spiral channel after entering buffer pipe 1. The continuous curved surface of the spiral structure guides the gas molecules to make a gentle turn, reducing local flow resistance compared to right-angle bends and helping to improve the accuracy of the vacuum gauge readings. The total length of the spiral channel is much greater than the straight length of the pipe, and the gas molecules must collide with the pipe wall multiple times to pass through the pipe. During the collision process, the coating material is gradually deposited on the inner wall of the pipe. Since the cross-sectional area of ​​the spiral channel remains constant, the gas flow resistance is significantly lower than that of multiple right-angle bends, thus reducing interference with vacuum measurement. The spiral structure provides a longer gas path for the same pipe length while maintaining a compact size. The pre-formed spiral plate welded together reduces the manufacturing difficulty. In addition, the continuous curved surface design of the spiral channel avoids the turbulence phenomenon common in bent structures, which is conducive to maintaining a stable airflow state. By extending the residence time of gas molecules in the pipe, the probability of coating material deposition is increased while maintaining low gas flow resistance. The overall structure of the device is compact and suitable for installation environments with limited space for process equipment. The continuous curved surface design of the spiral structure balances the anti-plating effect and the measurement accuracy requirements, solving the contradiction between volume and flow efficiency in traditional right-angle bends.

[0014] In this embodiment, the spiral buffer structure 2 includes a continuous spiral baffle plate extending along the length of the buffer pipe 1. The circumference of the spiral baffle plate is fixed to the inner wall of the buffer pipe 1, forming a single channel with multiple spiral turns inside the buffer pipe 1 to extend the travel distance of the gas components through the buffer pipe 1 and increase the contact area. The spiral baffle plate refers to a continuous spiral structure extending along the pipe axis. Circumferential fixing refers to the connection method between the edge of the spiral baffle plate and the inner wall of the pipe, which can be achieved using a ring welding process. Its function is to ensure no gap between the spiral structure and the inner wall of the pipe through full circumferential fixing. The single channel with multiple spiral turns refers to the continuous and unbranched spiral flow channel formed by the spiral baffle plate inside the pipe. This can be achieved by adjusting the pitch and number of turns, increasing the contact area between the gas and the pipe wall by extending the gas path. The spiral baffle plate extends along the inner wall of the pipe to form a continuous spiral structure. After gas molecules enter the buffer pipe 1 from the process chamber, they need to travel multiple turns along the spiral path to reach the vacuum gauge. As gas molecules move within the spiral channel, they collide multiple times with the inner wall of the pipe, causing some of the coating material to be adsorbed onto the inner wall, thus reducing the probability of entering the vacuum gauge. Because the spiral baffle plate is fixed to the inner wall of the pipe around its entire circumference, the gas cannot pass directly through the lateral gaps and must flow along the spiral path.

[0015] Compared to existing technologies, conventional bent solenoids, which use metal spirals or spring-shaped EP tubes, suffer from limited bending radii leading to larger dimensions. This solution, however, uses a continuous spiral baffle plate directly fixed to the inner wall of the pipe, enabling multiple spiral paths within a smaller space. Existing right-angle bend devices require multiple right-angle bends, while this solution, with its continuous spiral structure, can create a longer gas path within the same volume.

[0016] In a preferred embodiment, the first connecting end 3 and the second connecting end 4 are detachably installed at both ends of the buffer pipe 1 to facilitate replacement of the buffer pipe 1. Detachable installation means that the connecting end and the buffer pipe 1 are connected by a separable mechanical connection, specifically through a threaded connection, snap-lock, or flange mating structure. When the buffer pipe 1 needs to be replaced, it can be quickly separated by disconnecting the connection. Standardized interfaces can be machined at both ends of the buffer pipe 1, for example, external threads or flanges can be provided at the pipe ends, while corresponding internal threads or flange mating surfaces can be provided inside the connecting end. When maintenance or replacement is required, the connecting end can be separated from the pipe by rotating the threaded structure or loosening the flange bolts. This design allows for the individual replacement of the buffer pipe 1 with the spiral air-blocking structure, realizing a modular design of the buffer pipe 1. While ensuring airtightness, it significantly reduces the complexity of maintenance operations and avoids the situation where the entire device must be replaced due to coating residue affecting the accuracy of the vacuum gauge.

[0017] In this embodiment, the first connecting end 3 and the second connecting end 4 are VCR joints, KF flanges, or CF flanges. A VCR joint refers to a pipe joint sealed with a metal gasket, specifically using an inner and outer conical surface mating structure, where the metal gasket deforms under pressure to form a vacuum seal. A KF flange refers to a quick-release flange fixed with elastic clamps, specifically achieving a sealing connection through the compression of a rubber sealing ring with the flange. A CF flange refers to a knife-edge flange sealed with a copper gasket, specifically achieving an ultra-high vacuum seal through the plastic deformation of the copper gasket caused by bolt pre-tightening force. By configuring standardized connection interfaces at both ends of the buffer pipe 1, the VCR joint is suitable for high-purity gas transmission scenarios, and its metal sealing structure prevents rubber material release and contamination of the vacuum environment; the KF flange achieves quick assembly and disassembly through elastic clamps, suitable for equipment maintenance under medium and low vacuum conditions; the CF flange's copper gasket sealing method can withstand high-temperature baking, meeting the requirements of ultra-high vacuum systems. The connection end uses replaceable standardized connectors between the process chamber and the vacuum gauge. During maintenance, the components can be separated simply by loosening the clamps or removing the bolts, without damaging the pipeline structure or using complicated tools, which significantly improves equipment maintenance efficiency.

[0018] The above-described embodiments can effectively improve the service life and measurement accuracy of vacuum gauges, and facilitate replacement.

[0019] It should be understood that the above are only preferred embodiments of the present utility model, and the protection scope of the present utility model is not limited to the above embodiments. All technical solutions that fall within the scope of the present utility model are protected by the present utility model.

[0020] The accompanying drawings used in the above description of the embodiments only show some embodiments of the present invention and should not be regarded as a limitation of the scope. For those skilled in the art, other related drawings can be obtained from these drawings without creative effort.

Claims

1. A small vacuum gauge anti-coating device for PVD and CVD processes, wherein its two ends are respectively adapted to be connected to a vacuum gauge and a process chamber, characterized in that, include: The buffer pipe includes a first connection end and a second connection end located at both ends of the buffer pipe. The buffer pipe is equipped with a spiral buffer structure to reduce the probability of gas molecules entering the vacuum gauge within the process chamber.

2. The small vacuum-sealed coating apparatus for PVD and CVD processes according to claim 1, characterized in that, The spiral buffer structure includes a continuous spiral baffle plate extending along the length of the buffer pipe. The circumference of the spiral baffle plate is fixed to the inner wall of the buffer pipe, and a single channel with multiple spirals is formed inside the buffer pipe to extend the travel distance of the gas components through the buffer pipe.

3. The small vacuum-sealed coating apparatus for PVD and CVD processes according to claim 2, characterized in that, The spiral buffer structure is fixed inside the buffer pipe by welding.

4. The small vacuum-sealed coating apparatus for PVD and CVD processes according to claim 2, characterized in that, The first connecting end and the second connecting end are detachably installed at both ends of the buffer pipe to facilitate replacement of the buffer pipe.

5. The small vacuum-sealed coating apparatus for PVD and CVD processes according to claim 1, characterized in that, The first connection end and the second connection end adopt VCR connector, or KF flange, or CF flange.

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