A rotating device for use in an ALD process chamber, an ALD apparatus

Abstract

The utility model provides a kind of rotating device for ALD process chamber, ALD equipment, it is related to vacuum structure technical field. Including the pedestal of being installed in process chamber, inner rotor being installed on pedestal, and the bearing of connecting the inner rotor with pedestal, the shaft seal of being suitable for forming dynamic seal with the inner rotor is installed above the bearing;The bottom of the pedestal is formed with pressure relief groove, so that the gas inside the sealed chamber formed by the pedestal and inner rotor is discharged when being pumped down, to balance internal pressure. A rotating structure that can be stably operated in the ALD equipment process chamber without inner and outer cavity structure is provided by the present scheme, with long service life.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor equipment technology, and more specifically, to a rotating device and an ALD device for use in an ALD process chamber. Background Technology

[0002] There are two main technical approaches to the rotating devices inside the process chamber of existing industrial ALD (Alternating Current Deposition) equipment: traditional bearing rotating devices and rotating devices with shaft seals that rely on internal and external cavity structures. While traditional bearing rotating devices are simple in structure, they have significant drawbacks in the ALD process environment. Because the ALD process requires the alternating introduction of different precursors, these precursors can easily seep into moving parts such as bearings, leading to coating contamination. To address this issue, existing technologies typically employ methods such as creating complex labyrinth channels and reducing gap sizes to increase the flow resistance of precursor penetration. However, this method only delays the coating process and does not fundamentally solve the problem. Furthermore, the labyrinth structure has high manufacturing costs and strict precision requirements, resulting in a large structural load, limited service life, and complex maintenance for the overall device.

[0003] While another type of rotary device relying on an internal and external cavity structure with a shaft seal has solved the precursor contamination problem to some extent, it has serious limitations. When the internal cavity is pumped to the low-pressure state required by the process, the external cavity must be depressurized simultaneously; otherwise, the pressure difference between the internal and external cavities will cause excessive stress on the shaft seal. In actual operation, the close contact and rotation between the shaft seal and the rotating shaft generates a large amount of frictional heat, which seriously affects the service life of the shaft seal. More importantly, this internal and external cavity structure design cannot be applied to single-cavity ALD equipment, greatly limiting its application range. In addition, existing rotary devices generally lack effective particulate matter collection and pressure balancing mechanisms, and their performance is prone to degradation due to particulate accumulation and pressure imbalance during long-term operation. Utility Model Content

[0004] This utility model discloses a rotating device and its improved structure for use in an ALD process chamber, which has the advantages of effectively balancing the internal pressure of the sealed chamber, reducing the stress on the shaft seal, extending the service life, and being suitable for single-chamber ALD equipment.

[0005] The present invention adopts the following solution: A rotating device for use in an ALD process chamber includes a base installed in the process chamber, an inner rotor mounted on the base, and a bearing connecting the inner rotor and the base. A shaft seal suitable for forming a dynamic seal with the inner rotor is installed above the bearing. A pressure relief groove is formed at the bottom of the base to allow gas inside the sealed chamber formed by the base and the inner rotor to be discharged during vacuuming, so as to balance the internal pressure.

[0006] Furthermore, the base is concealed within the process chamber.

[0007] Furthermore, a dust collection trough is formed within the sealed cavity, and the dust collection trough is located below the bearing to collect frictional particles generated by the shaft seal during operation.

[0008] Furthermore, the sealed chamber has an inclined surface facing the ash collection trough to increase the collection area and prevent particulate matter from flying out due to the internal airflow during extraction.

[0009] Furthermore, the base is provided with an anti-plating protective cover.

[0010] Furthermore, a labyrinthine venting groove is provided at the bottom of the base to balance the internal and external pressures, thereby preventing the precursor from seeping into the process chamber.

[0011] Furthermore, the shaft seal is made of PTFE material.

[0012] Furthermore, the bearing may be a ceramic bearing, a deep groove ball bearing, a thrust ball bearing, or a tapered roller bearing.

[0013] This utility model also provides an ALD device, including the aforementioned rotating device for use in the ALD process chamber.

[0014] Beneficial effects: This application provides a rotating device and its improved structure for use in an ALD process chamber, including a base installed in the process chamber, an inner rotor installed on the base, and a bearing connecting the inner rotor and the base. A shaft seal suitable for forming a dynamic seal with the inner rotor is installed above the bearing. A pressure relief groove is formed at the bottom of the base to allow gas inside the sealed chamber formed by the base and the inner rotor to be discharged during vacuuming, so as to balance the internal pressure. Pressure self-balancing is achieved through the pressure relief groove and the dependence on the inner and outer cavity structures is avoided. It has the advantages of effectively balancing the internal pressure of the sealed chamber, reducing the stress on the shaft seal, extending the service life, and being suitable for single-cavity ALD equipment. Attached Figure Description

[0015] Figure 1 This is a cross-sectional structural schematic diagram of a rotating device used in an ALD process chamber according to an embodiment of the present invention; Figure 2 This is a partially enlarged structural schematic diagram of a rotating device used in an ALD process chamber according to an embodiment of the present invention; Figure 3 This is a schematic diagram of the bottom of the base of a rotating device used in an ALD process chamber according to an embodiment of the present invention; Figure 4 This is a schematic diagram of the external structure of a rotating device used in an ALD process chamber according to an embodiment of the present invention; Figure reference numerals: process chamber 1, base 2, ash collection trough 21, inclined surface 22, pressure relief trough 23, labyrinth exhaust trough 24, inner rotor 3, sealed chamber 4, bearing 5, shaft seal 6, anti-plating cover 7. Detailed Implementation

[0016] Combination Figures 1 to 4 As shown, this embodiment provides an ALD device, including a rotating device for use within an ALD process chamber. The rotating device for use within the ALD process chamber includes a base 2 installed within the process chamber 1, an inner rotor 3 mounted on the base 2, and a bearing 5 connecting the inner rotor 3 and the base 2. A shaft seal 6, suitable for forming a dynamic seal with the inner rotor 3, is installed above the bearing 5. A pressure relief groove 23 is formed at the bottom of the base 2 to allow gas to escape from the sealed chamber 4 formed by the base 2 and the inner rotor 3 during vacuuming, thereby balancing the internal pressure.

[0017] In this embodiment, the base 2 is a fixed platform that supports the rotating components. Its bottom contour is adapted to the shape of the process chamber 1 to establish a stable mounting reference surface. The inner rotor 3 is a moving component that rotates relative to the base 2, and its central through-hole enables the installation and positioning of the wafer carrier. The bearing 5 is a mechanical element that supports the rotational motion. Specifically, it can be a high-temperature resistant ceramic bearing 5, or a rolling bearing 5 or a sliding bearing 5, with its inner and outer rings respectively mating with the base 2 and the inner rotor 3. The shaft seal 6 is a sealing component that prevents gas leakage. It is disposed between the base 2 and the inner rotor 3 and is located above the bearing 5. The pressure relief groove 23 refers to the gas passage that runs through the base 2 body. For example, it can be in the form of an annular groove or a labyrinth exhaust structure. It is used to establish a pressure balance path between the sealed chamber 4 and the external space. When the process chamber 1 is evacuated, the pressure relief groove 23 can ensure that the gas inside the sealed chamber 4 formed by the base 2 and the inner rotor 3 can be discharged in time to balance the internal pressure. This avoids the pressure inside the shaft seal 6 causing the shaft seal 6 to stick tightly to the outer wall of the rotor, resulting in the accumulation of frictional heat in the shaft seal 6 and affecting its service life. The shaft seal 6 described in this embodiment can be made of PTFE material. This material has high temperature resistance and can maintain structural stability in the vacuum environment of the process chamber 1. At the same time, its self-lubricating properties can reduce the coefficient of friction of the contact surface with the inner rotor 3.

[0018] Continue to combine Figure 1 and Figure 4As shown, in this embodiment, the base 2 is concealed within the process chamber 1. Concealed installation can be achieved by embedding the base 2 inside the chamber wall of the process chamber 1 or by using a flange structure for hidden installation. The process chamber 1 refers to a sealed cavity used in atomic layer deposition (ALD) processes. The base 2 is integrated with the process chamber 1 through concealed installation. During installation, the base 2 is embedded inside the chamber wall or fixed via a flange structure, ensuring that the outer surface of the base 2 is flush with the inner wall of the chamber, avoiding the formation of steps or gaps due to exposed structures. This installation method eliminates the need for additional exposed support components between the base 2 and the chamber, thereby reducing the structural complexity within the process chamber 1. During vacuuming, the continuous planar structure of the base 2 and the chamber wall reduces gas flow resistance and avoids localized eddies or pressure fluctuations caused by exposed components.

[0019] Combination Figures 1 to 2As shown, in a preferred embodiment, a dust collection trough 21 is formed within the sealed chamber 4. The dust collection trough 21 is located below the bearing 5 to collect friction particles generated by the shaft seal 6 during operation. The dust collection trough 21 refers to a groove structure, such as an annular groove, provided within the sealed chamber 4 to accommodate solid particles generated by the friction between the shaft seal 6 and the inner rotor 3. These friction particles are debris or powder generated by contact wear during the relative movement of the shaft seal 6 and the inner rotor 3, and are collected directionally by the dust collection trough 21. During the dynamic sealing process between the shaft seal 6 and the inner rotor 3, the friction-generated particles settle downwards due to gravity. The dust collection trough 21, located below the bearing 5, directly receives the falling particles, preventing them from entering the process chamber 1. In a preferred embodiment, a further inclined surface 22 structure within the sealed chamber 4 guides the particles into the dust collection trough 21, while simultaneously increasing the collection efficiency by expanding the trough's coverage area. Specifically, an inclined surface 22 facing the dust collection trough 21 is formed within the sealed chamber 4 to increase the collection area. This inclined surface 22 also prevents particulate matter from being ejected due to internal airflow during extraction. The inclined surface extends to the edge of the dust collection trough 21, allowing frictional particles to slide along the inclined surface 22 into the trough 21. During extraction, the airflow within the sealed chamber 4 may carry frictional particles upwards. The inclined surface 22 expands the collection coverage of the dust collection trough 21, allowing particles to slide into the trough 21 under gravity. Simultaneously, the inclined direction of the inclined surface 22 forms a blocking relationship with the airflow direction, weakening the carrying effect of the airflow on the particles and preventing particles from escaping the sealed chamber 4 with the airflow. For example, the inclined surface 22 can be continuously distributed circumferentially around the dust collection trough 21, forming a ring-shaped guide structure, further limiting the diffusion path of the particles. This solution actively guides particulate matter into the dust collection trough 21 using the inclined surface 22, and utilizes the tilt angle of the inclined surface 22 to block the airflow carrying particulate matter, significantly improving the particulate matter collection effect. This solves the problem of bearing contamination caused by particulate matter scattering during the extraction process, reduces equipment failures caused by particulate matter accumulation, and lowers maintenance frequency. The combined design of the inclined surface 22 and the dust collection trough 21 achieves directional collection and blocking of friction products without the need for additional power devices.

[0020] In a preferred embodiment, a protective cover 7 is provided on the outside of the base 2. The protective cover 7 is an isolation structure covering the outer surface of the base 2, which can be made of stainless steel or aluminum alloy into a plate-shaped shell. Its function is to prevent the precursor vapor in the process chamber 1 from contacting the surface of the base 2, thereby slowing down the coating reaction and formation of a deposition layer on the surface of the metal base 2. The cover can be fixed to the base 2 by bolts or snap-fit ​​connection, which facilitates disassembly, cleaning or replacement.

[0021] Combination Figures 1 to 3As shown, in one embodiment, a labyrinthine exhaust groove 24 is provided at the bottom of the base 2 to reduce the heat generation of the shaft seal 6 and prevent the process chamber precursor from seeping in and generating reactants that could damage the bearing 5. The labyrinthine exhaust groove 24 refers to an exhaust structure with a complex path, specifically achieved through a meandering groove design. By extending the gas flow path, the flow resistance is increased, thereby slowing the gas flow rate and reducing heat accumulation in the shaft seal 6 area. The process chamber precursor seeping in and generating reactants refers to the precursor material entering the sealed chamber 4 containing the bearing 5 through the sealing gap during the ALD process, reacting chemically with the surface of the bearing 5 to generate deposits. Specifically, this manifests as the adhesion of metal oxides or nitrides to the raceway of the bearing 5, leading to increased rotational resistance or jamming failure of the bearing 5. An exhaust groove with a multi-stage bending structure is machined at the bottom of the base 2, requiring the gas to undergo multiple directional changes after entering the exhaust groove from the sealed chamber 4 before being discharged. This structure allows the gas to slowly discharge during vacuuming to balance the pressure, while simultaneously reducing the flow rate by extending the gas flow path and maintaining pressure balance between the sealed chamber 4 and the inside and outside of the process chamber 1. In addition, the complex path of the labyrinthine exhaust channel 24 increases the resistance to the permeation of the precursor material into the sealed chamber 4, making it difficult for process gas to enter the bearing 5 region, thereby preventing reactants from depositing on the surface of the bearing 5.

[0022] In this embodiment, a pressure relief groove 23 is provided at the bottom of the base 2 to discharge the gas inside the sealed chamber 4. Simultaneously, a labyrinthine exhaust groove 24 is machined at the bottom of the base 2 to limit the infiltration of the precursor. This avoids the problem of frictional heating of the shaft seal 6 caused by the pressure difference between the inner and outer cavities, allowing the rotating device to operate without relying on the inner and outer cavity structures to balance the internal pressure. It should be noted that in this embodiment, the inner rotor 3 can be connected to an external motor or driven by a magnetohydrodynamic device.

[0023] Through the above technical solutions, this application can extend the continuous operating cycle of bearing 5 in ALD process chamber 1, reduce the frequency of downtime maintenance caused by coating jamming or particle accumulation, and meet the needs of different pressure conditions and speed conditions by adapting and selecting various types of bearing 5, so as to achieve stable operation without relying on the internal and external cavity pressure balance structure.

[0024] It should be understood that the above are only preferred embodiments of the present utility model, and the protection scope of the present utility model is not limited to the above embodiments. All technical solutions that fall within the scope of the present utility model are protected by the present utility model.

[0025] The accompanying drawings used in the above description of the embodiments only show some embodiments of the present invention and should not be regarded as a limitation of the scope. For those skilled in the art, other related drawings can be obtained from these drawings without creative effort.

Claims

1. A rotating device for use in an ALD process chamber, characterized in that, It includes a base installed in the process chamber, an inner rotor mounted on the base, and a bearing connecting the inner rotor and the base. A shaft seal suitable for forming a dynamic seal with the inner rotor is installed above the bearing. A pressure relief groove is formed at the bottom of the base to allow gas inside the sealed chamber formed by the base and the inner rotor to be discharged during vacuuming, so as to balance the internal pressure.

2. The rotating device for use in an ALD process chamber according to claim 1, characterized in that, The base is concealed within the process chamber.

3. The rotating device for use in an ALD process chamber according to claim 1, characterized in that, A dust collection trough is formed in the sealed chamber, and the dust collection trough is located below the bearing to collect the friction particles produced by the shaft seal during operation.

4. The rotating device for use in an ALD process chamber according to claim 3, characterized in that, The sealed chamber has an inclined surface facing the ash collection trough to increase the collection area and prevent particulate matter from flying out due to the internal airflow during extraction.

5. The rotating device for use in an ALD process chamber according to claim 1, characterized in that, The base is provided with an anti-plating protective cover.

6. The rotating device for use in an ALD process chamber according to claim 3, characterized in that, The base has a labyrinth-style exhaust groove at its bottom to balance the internal and external pressures, thereby preventing the precursor from seeping into the process chamber.

7. The rotating device for use in an ALD process chamber according to claim 1, characterized in that, The shaft seal is made of PTFE material.

8. The rotating device for use in an ALD process chamber according to claim 1, characterized in that, The bearing is a ceramic bearing, or a deep groove ball bearing, or a thrust ball bearing, or a tapered roller bearing.

9. An ALD device, characterized in that, Includes the rotating device for use in the ALD process chamber as described in any one of claims 1-8.

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