A double-sided coating carrier and an ALD coating device

Abstract

The utility model discloses a kind of double-sided coating carrier and ALD coating equipment, including boat body, upper support rod and lower support rod, the upper support rod is set in the upper portion of boat body, lower support rod is set in the lower portion of boat body;Several insertion slots are equipped on the lower support rod, the insertion slot bottom is equipped with independent first insertion slot and second insertion slot, the first insertion slot is used to insert and place one of two silicon wafers in the insertion slot, the second insertion slot is used to insert and place another one of two silicon wafers in the insertion slot;Upper support rod side is equipped with several tooth slot corresponding with insertion slot, the tooth slot is equipped with partition, the partition is used to realize the mutual separation of the upper portion of two silicon wafers.The utility model has the characteristics of compact structure, convenient to use and high reliability, realizes single-slot double-insertion double-sided coating, improves the efficiency of silicon wafer coating, and guarantees the production quality of silicon wafer.

Description

Technical Field

[0001] This utility model relates to the field of photovoltaic cell manufacturing technology, specifically to a double-sided coating carrier and ALD coating equipment. Background Technology

[0002] In the fabrication of crystalline silicon solar cells, alumina films, due to their excellent passivation effect, have become the preferred passivation material for passivating N-type silicon substrates and P-type doped regions. Alumina is generally prepared using the ALD (Alternating Discharge) method. ALD deposition can be further divided into two methods: time-dependent deposition and space-dependent deposition. In the current industry, the time-dependent deposition method is widely used in the fabrication of the front alumina film in TOPCon cells due to its advantages of higher throughput and lower cost. Conventional TOPCon cells typically use double-sided front alumina deposition to passivate the front P-type emitter. With the upgrading and iteration of battery technology, the poly-finger technology on the back of TOPCon cells, as well as the technology based on the back interdigitated (BC) platform, both require double-sided alumina deposition as a passivation layer. Therefore, there is an urgent need to develop a carrier capable of double-sided deposition on silicon wafers. Utility Model Content

[0003] The technical problem to be solved by this utility model is to address the shortcomings of existing coating carriers that are difficult to meet the needs of mass production of silicon wafers, and to provide a double-sided coating carrier and ALD coating equipment that is compact in structure, easy to use and conducive to improving production capacity.

[0004] To solve the above-mentioned technical problems, the technical solution adopted by this utility model is as follows: A double-sided coating carrier includes a boat body, an upper support rod, and a lower support rod. The upper support rod is disposed on the upper part of the boat body, and the lower support rod is disposed on the lower part of the boat body. The lower support rod is provided with a plurality of insertion slots, and the bottom of each insertion slot is provided with an independent first slot and a second slot. The first slot is used to insert one of two silicon wafers in the insertion slot, and the second slot is used to insert the other of the two silicon wafers in the insertion slot. The side of the upper support rod is provided with a plurality of toothed grooves corresponding to the insertion slots, and the toothed grooves are provided with partitions to separate the upper parts of the two silicon wafers.

[0005] As a further improvement of this utility model, the bottom of the insertion slot is provided with a dividing protrusion, which is used to divide the bottom of the insertion slot into an independent first slot and a second slot.

[0006] As a further improvement of this utility model, the cross-section of the dividing protrusion is semi-circular, trapezoidal, or triangular.

[0007] As a further improvement of this utility model, the cross-sectional width of the tooth groove is greater than the cross-sectional width of the insertion groove.

[0008] As a further improvement of this utility model, both sides of the tooth groove are inclined surfaces, and the width of the bottom of the tooth groove is smaller than the width of the top of the tooth groove.

[0009] As a further improvement of this utility model, both sides of the insertion slot are inclined surfaces, and the silicon wafer is in contact with the side walls of the insertion slot.

[0010] As a further improvement of this utility model, several of the insertion slots are distributed along the central axis of the lower support rod.

[0011] As a further improvement of this utility model, the distance between the partition and the two side walls of the tooth groove is 0.8 to 1.4 mm.

[0012] As a further improvement of this utility model, the width of the tooth groove is 1.8 to 3.6 mm, and the width of the insertion slot is 1.2 to 3.0 mm.

[0013] As a general technical concept, this utility model also provides an ALD coating equipment, including the above-mentioned double-sided coating carrier.

[0014] Compared with the prior art, the advantages of this utility model are: 1. The double-sided coating carrier of this utility model has several insertion slots on the lower support rod, and independent first and second slots at the bottom of the insertion slots. One of two silicon wafers is inserted into the first slot, and the other of the two silicon wafers is inserted into the second slot, thus realizing double wafer insertion in a single slot. At the same time, several toothed grooves corresponding to the insertion slots are set on the side of the upper support rod, and partitions are set in the toothed grooves to divide the toothed grooves into two parts, thus separating the upper parts of the two silicon wafers. Through the cooperation of the insertion slots and the toothed grooves, the bottom and top parts of the two silicon wafers can be effectively isolated, preventing the two silicon wafers from sticking together. This realizes double insertion in a single slot for double-sided coating, and ensures uniform coating around the entire surface of the silicon wafer, improving the efficiency of silicon wafer coating and ensuring the production quality of silicon wafers.

[0015] 2. The ALD coating equipment of this utility model includes the above-mentioned double-sided coating carrier, and therefore also has the above-mentioned advantages. Attached Figure Description

[0016] Figure 1 This is a schematic diagram illustrating the structural principle of the double-sided coating carrier in a specific embodiment of this utility model; Figure 2 This is a schematic diagram of the structural principle after the insert is installed in a specific embodiment of this utility model; Figure 3 for Figure 2 A magnified view of a portion of point A in the middle; Figure 4 for Figure 3A magnified view of a portion of point B; where Figure (a) is a 3D view and Figure (b) is a front view; Figure 5 for Figure 3 A magnified view of a portion of point C; where Figure (a) is a 3D view and Figure (b) is a front view; Figure 6 This is a schematic diagram of the structural principle from another perspective after the insert is placed in a specific embodiment of this utility model; Legend: 1. Boat body; 2. Upper support rod; 21. Gear groove; 22. Partition; 3. Lower support rod; 31. Insertion slot; 32. Separating protrusion; 33. First slot; 34. Second slot; 4. Silicon wafer. Detailed Implementation

[0017] The present invention will be further described below with reference to the accompanying drawings and specific preferred embodiments, but this does not limit the scope of protection of the present invention.

[0018] In the description of this utility model, it should be understood that the terms "side", "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc., indicating the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model.

[0019] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this utility model, "multiple" means two or more, unless otherwise explicitly specified.

[0020] Example like Figure 1 , Figure 2 and Figure 3As shown, the double-sided coating carrier of this utility model includes a boat body 1, an upper support rod 2, and a lower support rod 3. The upper support rod 2 is disposed on the upper part of the boat body 1, and the lower support rod 3 is disposed on the lower part of the boat body 1. The top of the lower support rod 3 is provided with several insertion slots 31, and the several insertion slots 31 are distributed along the central axis of the lower support rod 3. The bottom of the insertion slot 31 is provided with independent first slot 33 and second slot 34. The first slot 33 is used to insert one of the two silicon wafers 4 in the insertion slot 31, and the second slot 34 is used to insert the other of the two silicon wafers 4 in the insertion slot 31. The side of the upper support rod 2 is provided with several toothed grooves 21 corresponding to the insertion slots 31. The toothed grooves 21 are provided with partitions 22, which are used to separate the upper parts of the two silicon wafers 4 from each other.

[0021] like Figure 5 As shown, the bottom of the insertion slot 31 is provided with a dividing protrusion 32, which is used to divide the bottom of the insertion slot 31 into an independent first slot 33 and a second slot 34. By setting the dividing protrusion 32, it is ensured that the bottoms of the two silicon wafers 4 are separated, ensuring that there is a certain gap between the two silicon wafers 4.

[0022] Furthermore, in this embodiment, the cross-section of the separating protrusion 32 is set to semi-circular, and the distance from both ends of the separating protrusion 32 to the two sides of the insertion slot 31 is 0.2-1.2 mm, preferably 0.5-1 mm, to ensure that the two silicon wafers 4 to be coated are effectively separated. In other embodiments, the cross-section of the separating protrusion 32 can also be set to trapezoidal or triangular, as long as it can ensure that the two silicon wafers 4 to be coated are effectively separated.

[0023] In this embodiment, several insertion slots 31 are provided on the lower support rod 3, and independent first slots 33 and second slots 34 are provided at the bottom of the insertion slots 31. One of the two silicon wafers 4 is inserted into the first slot 33, and the other of the two silicon wafers 4 is inserted into the second slot 34, thus realizing double wafer insertion in a single slot. At the same time, several toothed grooves 21 corresponding to the insertion slots 31 are provided on the side of the upper support rod 2, and partitions 22 are provided in the toothed grooves 21. The partitions 22 divide the toothed grooves 21 into two parts, thus separating the upper parts of the two silicon wafers 4. Through the cooperation of the insertion slots 31 and the toothed grooves 21, the bottom and top parts of the two silicon wafers 4 can be effectively isolated, preventing the two silicon wafers 4 from sticking together. This achieves double insertion in a single slot and double-sided coating, and ensures uniform coating on the entire surface of the silicon wafers 4, improving the coating efficiency of the silicon wafers 4 and ensuring the production quality of the silicon wafers 4.

[0024] like Figure 4 and Figure 5As shown, the cross-sectional width of the toothed groove 21 is greater than the cross-sectional width of the insertion groove 31. Further, the width of the toothed groove 21 is 1.8 to 3.6 mm, preferably 1.5 to 2.5 mm; the width of the insertion groove 31 is 1.2 to 3.0 mm, preferably 2 to 3 mm.

[0025] like Figure 4 As shown, both sides of the groove 21 are inclined surfaces, and the width of the bottom of the groove 21 is smaller than the width of the top of the groove 21. The groove 21 is a tapered groove that is wider at the top and narrower at the bottom. The distance between the partition 22 and the two sides of the groove 21 is 0.8 to 1.4 mm to ensure that the silicon wafer 4 has enough space to be inserted into the groove 21, and to avoid scratches or collisions with the partition during the insertion process, which could cause microcracks or fragments.

[0026] like Figure 5 As shown, both sides of the insertion slot 31 are inclined surfaces, and the silicon wafer 4 is attached to the side wall of the insertion slot 31.

[0027] In this embodiment, the size of the groove 21 is slightly larger than the size of the insertion slot 31, and the edges of both the groove 21 and the insertion slot 31 form a certain angle with the vertical plane. Furthermore, the groove 21 has a partition 22 in the middle, and the insertion slot 31 has a dividing protrusion 32 in the middle, ensuring that the silicon wafer does not completely adhere within the groove 21 and the insertion slot 31. Figure 6 As shown, this facilitates subsequent full-surface coating of alumina.

[0028] When inserting silicon wafer 4, the two wafers are not completely attached and a certain gap is maintained between them. Under the action of the suction cup, the two wafers enter from both sides of the tooth groove 21, fall on the upper support rod 2, and are inserted into the insertion slot 31 of the lower support rod 3. The upper ends of the two silicon wafers 4 in the same tooth groove 21 will be separated at a certain angle, and there is also a partition 22 in the middle of the tooth groove 21 to prevent the wafers from being attached together after subsequent insertion. The lower end of the silicon wafer 4 is also separated by a partition protrusion 32 to ensure that the two wafers are not attached together.

[0029] In this embodiment, an ALD coating apparatus is also provided, including the aforementioned double-sided coating carrier. The ALD coating apparatus of this embodiment can insert two silicon wafers 4 into a single insertion slot 31 without complete bonding between the two wafers, achieving uniform coating across the entire surface of the silicon wafers 4, significantly improving production capacity.

[0030] The above description is merely a preferred embodiment of this utility model. The protection scope of this utility model is not limited to the above embodiments. All technical solutions falling within the scope of this utility model's concept are protected. It should be noted that for those skilled in the art, any improvements and modifications made without departing from the principle of this utility model should also be considered within the protection scope of this utility model.

Claims

1. A double-sided coating carrier, characterized in that, The system includes a boat body (1), an upper support rod (2), and a lower support rod (3). The upper support rod (2) is located on the upper part of the boat body (1), and the lower support rod (3) is located on the lower part of the boat body (1). The lower support rod (3) is provided with several insertion slots (31). The bottom of the insertion slots (31) is provided with independent first slots (33) and second slots (34). The first slot (33) is used to insert one of the two silicon wafers (4) in the insertion slot (31), and the second slot (34) is used to insert the other of the two silicon wafers (4) in the insertion slot (31). The side of the upper support rod (2) is provided with several toothed grooves (21) corresponding to the insertion slots (31). The toothed grooves (21) are provided with partitions (22). The partitions (22) are used to separate the upper parts of the two silicon wafers (4).

2. The double-sided coating carrier according to claim 1, characterized in that, The bottom of the insertion slot (31) is provided with a dividing protrusion (32), which is used to divide the bottom of the insertion slot (31) into an independent first slot (33) and a second slot (34).

3. The double-sided coating carrier according to claim 2, characterized in that, The cross-section of the dividing protrusion (32) is semi-circular, trapezoidal, or triangular.

4. The double-sided coating carrier according to claim 1, characterized in that, The cross-sectional width of the tooth groove (21) is greater than the cross-sectional width of the insertion groove (31).

5. The double-sided coating carrier according to claim 1, characterized in that, Both sides of the tooth groove (21) are inclined surfaces, and the width of the bottom of the tooth groove (21) is smaller than the width of the top of the tooth groove (21).

6. The double-sided coating carrier according to claim 1, characterized in that, Both sides of the insertion slot (31) are inclined surfaces, and the silicon wafer (4) is attached to the side wall of the insertion slot (31).

7. The double-sided coating carrier according to any one of claims 1 to 6, characterized in that, Several of the insertion slots (31) are distributed along the central axis of the lower support rod (3).

8. The double-sided coating carrier according to any one of claims 1 to 6, characterized in that, The distance between the partition (22) and the two side walls of the tooth groove (21) is 0.8 to 1.4 mm.

9. The double-sided coating carrier according to any one of claims 1 to 6, characterized in that, The width of the toothed groove (21) is 1.8 to 3.6 mm, and the width of the insertion groove (31) is 1.2 to 3.0 mm.

10. An ALD coating equipment, characterized in that, Includes the double-sided coated carrier as described in any one of claims 1 to 9.

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