Single crystal furnace and exhaust device thereof

Abstract

A single crystal furnace and an exhaust device thereof, the exhaust device comprising an outer tube, an inner tube and a cover, the inner tube having a first tube section and a second tube section; the first tube section being detachably sleeved in the outer tube, one end of the first tube section being an exhaust port, the other end being in communication with the second tube section; the second tube section being exposed outside the outer tube, a side wall of the second tube section being provided with an air inlet; the cover being arranged at an end of the second tube section away from the first tube section. The application does not need to remove the thermal field structure above the exhaust device, only needs to separate the connection between the inner tube and the outer tube to take out the inner tube for cleaning or replacement, simplifies the maintenance process of the exhaust device, reduces the labor input and time cost, significantly reduces the production loss caused by equipment downtime, and at the same time guarantees the long-term stable operation of the exhaust device, provides a continuous and reliable gas environment regulation basis for crystal growth.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor technology, and more specifically to a single crystal furnace and its exhaust device. Background Technology

[0002] As a channel for venting the gas environment inside a single crystal furnace, the exhaust pipe is usually installed vertically at the bottom of the hot zone of the single crystal furnace. By guiding the exhaust gas downwards, it maintains and regulates the clean, low-pressure or inert protective atmosphere required inside the furnace, thus ensuring stable crystal growth.

[0003] During crystal growth, oxides are generated. When these oxides flow through the exhaust pipe with the waste gas, they tend to deposit on the inner wall of the exhaust pipe because they are far from the high-temperature area of ​​the thermal field. This phenomenon is particularly significant during the growth of heavily doped single crystals. Once the exhaust pipe becomes blocked due to deposition, the pressure inside the furnace cannot be precisely controlled, which in turn affects the quality of crystal growth.

[0004] In related technologies, such as Figure 1 As shown, the exhaust pipe 110 of the single crystal furnace 100 mostly adopts an integrated hollow cylindrical structure, guiding the exhaust gas to be discharged vertically through a single longitudinal channel. When oxides are deposited on the inner wall of the pipe, the thermal field structure above the exhaust pipe 110 (such as crucible assembly, heater, etc.) must be completely removed before the exhaust pipe 110 can be taken out for cleaning or replacement. This not only makes the maintenance process cumbersome, but also consumes a lot of manpower and time. Utility Model Content

[0005] The utility model description section introduces a series of simplified concepts, which will be further explained in detail in the detailed description section. This utility model description section is not intended to limit the key features and essential technical features of the claimed technical solution, nor is it intended to determine the scope of protection of the claimed technical solution.

[0006] To address the existing problems, this utility model provides an exhaust device for a single crystal furnace, the exhaust device comprising: outer tube; The inner tube has a first pipe section and a second pipe section; the first pipe section is detachably sleeved inside the outer tube, and one end of the first pipe section is an exhaust port, and the other end is connected to the second pipe section; the second pipe section is exposed outside the outer tube, and an air inlet is provided on the side wall of the second pipe section; A cover is disposed at the end of the second pipe segment away from the first pipe segment.

[0007] In some embodiments of this application, the air inlet is configured to restrict the airflow in the single crystal furnace to enter the air inlet only along a first direction, and the first direction is perpendicular to the path of the airflow in the single crystal furnace to the exhaust device.

[0008] In some embodiments of this application, the sidewall of the second pipe section is provided with a plurality of air inlets, and the plurality of air inlets are distributed along the circumference of the second pipe section.

[0009] In some embodiments of this application, along the first pipe segment from one end near the second pipe segment toward the exhaust port, the diameter of the first pipe segment gradually decreases, and the diameter of the outer pipe gradually decreases synchronously.

[0010] In some embodiments of this application, the semi-cone angle of the first pipe segment is 10°~20°, and the semi-cone angle of the outer pipe is consistent with the semi-cone angle of the first pipe segment.

[0011] In some embodiments of this application, the inner wall of the first pipe section is provided with an anti-deposition coating.

[0012] In some embodiments of this application, the cover and the second pipe segment are detachably connected.

[0013] In some embodiments of this application, the cover includes a cover plate and a heat-conducting element disposed on the side of the cover plate facing the inner tube, and when the cover is disposed at the end of the second tube segment away from the first tube segment, the end of the heat-conducting element away from the cover plate extends into the interior of the first tube segment.

[0014] In some embodiments of this application, the cover plate has a first connecting portion on the side facing the second pipe segment, and the end of the second pipe segment away from the first pipe segment has a second connecting portion that matches the first connecting portion. The cover plate is connected by the cooperation of the first connecting portion and the second connecting portion and is detachably assembled to the end of the second pipe segment away from the first pipe segment.

[0015] According to another aspect of this application, a single crystal furnace is provided, the single crystal furnace comprising: Furnace body; The exhaust device described in any one of the above-mentioned methods is disposed on the bottom wall of the furnace body.

[0016] The single crystal furnace and its exhaust system disclosed in this application adopt a split-type structural design, with the inner and outer tubes being detachable and assembled. The inner tube is divided into a first section and a second section. When oxide deposition occurs on the inner wall of the inner tube, it is not necessary to remove the thermal field structure above the exhaust system. Only the connection between the inner and outer tubes needs to be separated to remove the inner tube for cleaning or replacement. This simplifies the maintenance process of the exhaust system, reduces manpower and time costs, significantly reduces production losses caused by equipment downtime, and ensures the long-term stable operation of the exhaust system, providing a continuous and reliable basis for gas environment control for crystal growth. Attached Figure Description

[0017] The following drawings, which are incorporated herein by reference as part of this invention, are provided for understanding the invention. The drawings illustrate embodiments of the invention and their descriptions, serving to explain the principles of the invention.

[0018] In the attached image: Figure 1 A schematic diagram of the structure of the single crystal furnace and its exhaust device in the related technology is shown.

[0019] Figure 2 A schematic diagram of the structure of a single crystal furnace and its exhaust device according to a specific embodiment of the present invention is shown.

[0020] Figure 3 A cross-sectional view of an exhaust device according to a specific embodiment of the present invention is shown.

[0021] Figure 4 A schematic diagram of the outer tube according to a specific embodiment of the present invention is shown.

[0022] Figure 5 A schematic diagram of the inner tube according to a specific embodiment of the present invention is shown.

[0023] Figure 6 A schematic diagram of the cover body according to a specific embodiment of the present invention is shown.

[0024] Figure 7 A schematic diagram is shown in the related technology, illustrating that exhaust gas enters the exhaust pipe via a vertical path that is straight up and down.

[0025] Figure 8 This diagram illustrates a specific embodiment of the present invention where the airflow in a single crystal furnace enters the inlet only along a first direction. Detailed Implementation

[0026] In the following description, numerous specific details are set forth in order to provide a more thorough understanding of the present invention. However, it will be apparent to those skilled in the art that the present invention can be practiced without one or more of these details. In other instances, certain technical features well-known in the art have not been described in order to avoid confusion with the present invention.

[0027] It should be understood that this invention can be embodied in various forms and should not be construed as being limited to the embodiments set forth herein. Rather, providing these embodiments will make the disclosure thorough and complete, and will fully convey the scope of this invention to those skilled in the art. In the drawings, for clarity, the dimensions of layers and regions, as well as their relative dimensions, may be exaggerated. The same reference numerals denote the same elements throughout.

[0028] It should be understood that when an element or layer is referred to as "on," "adjacent to," "connected to," or "coupled to" other elements or layers, it may be directly on, adjacent to, connected to, or coupled to other elements or layers, or there may be intervening elements or layers. Conversely, when an element is referred to as "directly on," "directly adjacent to," "directly connected to," or "directly coupled to" other elements or layers, there are no intervening elements or layers. It should be understood that although the terms first, second, third, etc., may be used to describe various elements, components, areas, layers, and / or portions, these elements, components, areas, layers, and / or portions should not be limited by these terms. These terms are only used to distinguish one element, component, area, layer, or portion from another element, component, area, layer, or portion. Therefore, without departing from the teachings of this utility model, the first element, component, area, layer, or portion discussed below may be referred to as the second element, component, area, layer, or portion.

[0029] Spatial relation terms such as “below,” “under,” “below,” “below,” “above,” “above,” etc., are used herein for convenience of description to describe the relationship between one element or feature shown in the figure and other elements or features. It should be understood that, in addition to the orientation shown in the figure, spatial relation terms are intended to also include different orientations of the device in use and operation. For example, if the device in the figure is flipped, then the element or feature described as “below” or “below” other elements or features will be oriented “above” other elements or features. Therefore, the exemplary terms “below” and “under” can include both above and below orientations. The device may be otherwise oriented (rotated 90 degrees or otherwise) and the spatial descriptive terms used herein will be interpreted accordingly.

[0030] The terminology used herein is for the purpose of describing particular embodiments only and is not intended to limit the scope of the invention. When used herein, the singular forms “a,” “an,” and “the” are also intended to include the plural forms unless the context clearly indicates otherwise. It should also be understood that the terms “comprising” and / or “including,” when used in this specification, identify the presence of the stated features, integers, steps, operations, elements, and / or components, but do not exclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and / or groups. When used herein, the term “and / or” includes any and all combinations of the associated listed items.

[0031] To fully understand this application, detailed steps and structures will be presented in the following description to illustrate the technical solutions proposed in this application. Preferred embodiments of this application are described in detail below; however, in addition to these detailed descriptions, this application may have other implementation methods.

[0032] The following is for reference. Figures 2-6 , Figure 8 This application describes an exhaust device 210 for a single crystal furnace 200 according to an embodiment of the present application. The exhaust device 210 includes an outer tube 211, an inner tube 212, and a cover 213. The inner tube 212 has a first tube segment 2121 and a second tube segment 2122. The first tube segment 2121 is detachably fitted inside the outer tube 211, and one end of the first tube segment 2121 is an exhaust port, while the other end is connected to the second tube segment 2122. The second tube segment 2122 is exposed outside the outer tube 211, and an air inlet is provided on the side wall of the second tube segment 2122. The cover 213 is disposed at the end of the second tube segment 2122 away from the first tube segment 2121.

[0033] In actual use, the exhaust device 210 is first installed on the single crystal furnace 200. The specific steps are as follows: First, the outer tube 211 is fixedly installed on the bottom wall of the single crystal furnace 200, that is, the preset installation position below the internal thermal field structure of the single crystal furnace 200; then, the first section 2121 of the inner tube 212 is axially inserted into the inner tube 211, ensuring that the exhaust port of the first section 2121 faces the outside of the single crystal furnace 200, while the second section 2122 of the inner tube 212 is naturally exposed to the outside of the outer tube 211, and the air inlet of the side wall of the second section 2122 is located in the gas flow area inside the furnace; the cover 213 is set at the end of the second section 2122 away from the first section 2121.

[0034] After the single crystal furnace 200 is started and running, the exhaust gas inside the furnace enters the inner tube 212 chamber through the air inlet on the side wall of the second pipe section 2122, flows through the second pipe section 2122 and the first pipe section 2121 in sequence along the internal channel of the inner tube 212, and is finally discharged to the outside of the furnace through the exhaust port at the end of the first pipe section 2121, thereby achieving the control of the gas environment inside the furnace.

[0035] When the inner tube 212 needs to be cleaned or replaced, since the inner tube 212 and the outer tube 211 are detachably connected, there is no need to remove the outer tube 211 and the upper hot zone. The connection between the inner tube 212 and the outer tube 211 can be directly disconnected and the inner tube 212 can be pulled out as a whole. Then, the pulled-out inner tube 212 can be cleaned in a targeted manner, or a new inner tube 212 can be directly replaced. After cleaning or replacement, the assembly process described above is followed to reinstall the inner tube 212 into the outer tube 211 and install the cover 213 to restore the exhaust device 210 to its working state.

[0036] The exhaust device 210 in this embodiment adopts a split structure design, with the inner tube 212 and the outer tube 211 being detachable and assembleable. The inner tube 212 is divided into a first tube section 2121 and a second tube section 2122. When oxide deposition occurs on the inner wall of the inner tube 212, it is not necessary to remove the thermal field structure above the exhaust device 210. Only the connection between the inner tube 212 and the outer tube 211 needs to be separated to remove the inner tube 212 for cleaning or replacement. This simplifies the maintenance process of the exhaust device 210, reduces manpower and time costs, significantly reduces production losses caused by equipment downtime, and ensures the long-term stable operation of the exhaust device 210, providing a continuous and reliable gas environment control basis for crystal growth.

[0037] Furthermore, in traditional methods, the thermal field structure must be dismantled to remove the integrated exhaust pipe. After cleaning, while reassembling the exhaust pipe, additional thermal field calcination is required—high-temperature calcination restores the temperature uniformity and cleanliness within the thermal field to ensure the subsequent crystal growth environment meets standards. This series of operations is not only cumbersome but also time-consuming, during which the single crystal furnace cannot operate, directly shortening the effective production time and affecting overall production volume.

[0038] The exhaust device 210 of this application adopts a split design of "fixed outer tube 211 and detachable inner tube 212". When cleaning or maintenance is required, there is no need to remove the hot zone structure above it. Only the inner tube 212 needs to be pulled out to complete the operation. This design greatly reduces the frequency of disassembly and reassembly of the hot zone structure, thereby extending the hot zone cleaning cycle (i.e., the interval between overall disassembly and cleaning of the hot zone structure), reducing the downtime caused by hot zone maintenance, effectively increasing the effective production time of the single crystal furnace 200, and ultimately increasing the production capacity.

[0039] In some embodiments, such as Figure 2 As shown, the outer tube 211 is fixedly installed on the bottom wall of the single crystal furnace 200. Its function is to provide stable support for the inner tube 212, ensuring that the inner tube 212 maintains its axial positioning during the exhaust process and preventing displacement. This structure optimizes the maintenance convenience of the exhaust device 210: when the inner tube 212 needs cleaning, repair, or replacement due to long-term use causing deposits on the inner wall or wear and tear on components, it is not necessary to remove the outer tube 211 fixed to the furnace body. Only the connection between the outer tube 211 and the inner tube 212 needs to be separated, and the inner tube 212 and the cover 213 can be directly removed, greatly simplifying the operation process and shortening the maintenance time.

[0040] In terms of material properties, the outer tube 211 needs to be made of a high-temperature resistant and deformation-resistant material to adapt to the high-temperature environment at the bottom of the hot zone of the single crystal furnace 200 and maintain structural stability over a long period of time. The specific material can be selected according to the actual working conditions and is not limited here.

[0041] In terms of size design, the length of the outer tube 211 can be set to 50mm-300mm. This range can meet the effective support length requirements of the inner tube 212 and adapt to the installation space limitations at the bottom of the single crystal furnace 200. Of course, depending on the structural differences of different models of single crystal furnace 200, the length of the outer tube 211 can also be flexibly adjusted to other suitable sizes, and there is no strict limitation on this.

[0042] In some embodiments, the inner tube 212 also needs to be made of a high-temperature resistant and deformation-resistant material. Since the inner tube 212 is in direct contact with the high-temperature exhaust gas discharged from the hot zone, the high-temperature resistant properties can prevent the material from softening or melting due to high temperature, while the deformation-resistant properties can ensure that the inner tube 212 maintains the preset tube diameter and structural shape for a long time, ensuring that the exhaust channel is stable and unobstructed, and meeting the requirements of long-term continuous operation of the single crystal furnace 200.

[0043] It should also be pointed out that, such as Figure 7 As shown in the related technology, the exhaust gas in the single crystal furnace 100 enters the exhaust pipe 110 in a straight vertical path, which easily forms airflow turbulence at the bottom of the furnace body. During the process of the vertical airflow entering the exhaust pipe 110, it is easy to generate local eddies due to direct impact, which leads to the instability of the gas flow direction at the bottom of the furnace body. In particular, airflow disturbance is formed in the inlet area of ​​the exhaust pipe 110, which disrupts the stability of the temperature and pressure fields inside the furnace.

[0044] like Figure 5 and Figure 8 As shown, in this embodiment, by setting the air inlet on the side wall of the second pipe section 2122 and using the cover 213 to close the end of the second pipe section 2122 away from the first pipe section 2121, the airflow entry path is structurally forcibly changed, so that the air inlet restricts the airflow in the single crystal furnace 200 to enter the air inlet only along the first direction, and the first direction is perpendicular to the path of the airflow in the single crystal furnace 200 to the exhaust device 210.

[0045] The path of airflow from the single crystal furnace 200 to the exhaust device 210 refers to the direction in which waste gases such as oxides and volatiles generated during crystal growth flow towards the exhaust device 210 at the bottom of the hot zone under the guidance of the pressure difference and airflow within the furnace. This path is typically longitudinal along the furnace axis, with the first direction perpendicular to it being transverse. Here, "perpendicular" encompasses both strictly vertical and nearly vertical situations; the specific angle can be flexibly adjusted according to the actual airflow distribution characteristics within the furnace and is not limited thereto.

[0046] Specifically, the cover 213 blocks the exhaust gas that would otherwise flow vertically downwards, allowing it to enter the inner tube 212 laterally only through the air inlet on the side wall of the second pipe section 2122. This change in airflow direction from longitudinal to lateral effectively guides the exhaust gas to flow smoothly into the exhaust device 210 along a lateral path, avoiding vortex interference during traditional longitudinal air intake, improving the stability of the airflow direction at the bottom of the furnace, and enhancing the pressure consistency at the bottom of the furnace cavity. Stable airflow and uniform pressure at the bottom of the furnace maintain the stability of the temperature gradient in the crystal growth region, reducing local temperature fluctuations caused by airflow disturbances, thus providing a continuously stable environment for crystal growth and ultimately improving the stability and consistency of crystal growth quality.

[0047] In some embodiments, such as Figure 5 As shown, the sidewall of the second pipe section 2122 is provided with multiple air inlets, and the multiple air inlets are distributed along the circumference of the second pipe section 2122.

[0048] Specifically, multiple air inlets are provided on the side wall of the second pipe section 2122, which can effectively expand the air intake coverage range, allowing the exhaust gas in the furnace to enter the inner pipe 212 simultaneously from multiple directions around the second pipe section 2122, avoiding the problem of local airflow concentration that may be caused by a single air inlet, while weakening the vortex interference caused by airflow disturbance.

[0049] The distribution of the multiple air inlets along the circumference of the second pipe section 2122 is not limited; they can be uniformly or non-uniformly distributed. Regarding the axial direction of the second pipe section 2122, the multiple air inlets can be symmetrically or asymmetrically distributed. The design can be flexibly adjusted according to the airflow characteristics and exhaust requirements in the furnace, and no specific limitations are imposed on this.

[0050] Taking the example of multiple air inlets evenly distributed around the second pipe section 2122, the multiple air inlets evenly distributed around the circumference can guide the exhaust gas to smoothly flow into the inner pipe 212 from different lateral paths, further weakening the vortex effect generated by the airflow impact, making the airflow distribution at the bottom of the furnace body more balanced, improving the consistency of the furnace cavity pressure during the exhaust process, and thus creating a more stable gas environment for the crystal growth area.

[0051] For example, the side wall of the second pipe section 2122 is provided with 2 to 5 air inlets. The 2 to 5 air inlets can be evenly or unevenly distributed along the circumference of the second pipe section 2122. The axial distribution of the second pipe section 2122 is symmetrical or asymmetrical, etc., and there is no limitation on this.

[0052] For example, the sidewall of the second pipe section 2122 is provided with 2 to 5 air inlets. The distribution of these air inlets can be flexibly selected, such as uniform distribution, non-uniform distribution, symmetrical distribution, asymmetrical distribution, etc., to adapt to the exhaust gas diffusion path under different thermal field structures. The specific distribution form is not limited here.

[0053] Regarding the design of the air intake, the height of the air intake on the second pipe section 2122 can be set to 30mm-60mm. Of course, it can also be adjusted to other suitable heights according to actual exhaust requirements, and there is no limitation on this.

[0054] In some embodiments, such as Figures 3-5 As shown, along the first pipe section 2121 from the end near the second pipe section 2122 toward the exhaust port, the diameter of the first pipe section 2121 gradually decreases, and the diameter of the outer pipe 211 gradually decreases synchronously, so that the first pipe section 2121 and the outer pipe 211 form a coaxial structure with a diameter that gradually changes in the same direction.

[0055] On the one hand, the structure forms a tapered channel in the exhaust path by directionally reducing the diameter of the first pipe section 2121, which can accelerate the flow velocity of the exhaust gas in the first pipe section 2121, reduce the deposition of oxides in the exhaust gas on the inner wall of the first pipe section 2121, promote the full discharge of oxide impurities from the single crystal furnace 200, and reduce the risk of pipe blockage. On the other hand, the synchronous tapering of the diameters of the first pipe section 2121 and the outer pipe 211 can improve the structural compactness of the exhaust device 210 and better adapt to the installation space requirements at the bottom of the hot zone of the single crystal furnace 200.

[0056] For example, such as Figure 5 As shown, the semi-cone angle of the first pipe section 2121 is 10°~20°, and the semi-cone angle of the outer pipe 211 is the same as that of the first pipe section 2121.

[0057] As the diameters of the first pipe section 2121 and the outer pipe 211 gradually decrease along the exhaust direction (i.e., from the end near the second pipe section 2122 to the exhaust port), the cross-section of the pipe body will form a continuously transitioning conical or quasi-conical shape from large to small. At this time, the acute angle formed between the pipe body axis (i.e., the centerline of the pipe body) and the sidewall contour line (i.e., the generatrix) is the semi-cone angle. The smaller this angle, the gentler the slope of the pipe diameter reduction; the larger the angle, the steeper the slope of the diameter reduction. In this embodiment, the semi-cone angle is limited to 10°~20°. This allows for a moderately tapered structure that satisfies the need to increase exhaust gas velocity and reduce oxide deposition, while avoiding an excessively large angle leading to overly steep pipe walls and increased airflow impact, or an excessively small angle resulting in an overly long pipe body and excessive installation space. This angle range is a key parameter for balancing exhaust efficiency and structural adaptability.

[0058] In some embodiments, the inner wall of the first pipe section 2121 is provided with an anti-deposition coating.

[0059] Since the first pipe section 2121 is the channel for exhaust gas from the furnace, the oxide impurities carried in the exhaust gas are prone to sublimation due to temperature changes during the flow process, and then adhere to the inner wall of the first pipe section 2121 to form deposits. Long-term accumulation may lead to a reduction in the inner diameter of the pipe, an increase in exhaust resistance, and even a risk of blockage.

[0060] The anti-deposition coating reduces the adhesion between oxides and the inner wall of the first pipe section 2121, thereby reducing the amount of impurities deposited on the pipe wall. At the same time, combined with the accelerated airflow formed by the gradual change in the diameter of the first pipe section 2121, it can further carry out the incompletely attached oxide impurities out of the pipe in a timely manner, effectively ensuring the long-term smooth exhaust of the first pipe section 2121, avoiding abnormal furnace pressure caused by pipe blockage, maintaining the environmental stability of the crystal growth area, and providing support for improving the quality of crystal growth.

[0061] Of course, this application does not exclude the possibility that the inner wall of the second pipe section 2122 is also provided with an anti-deposition coating.

[0062] In some embodiments, the cover 213 and the second pipe section 2122 are detachably connected. This connection method is more suitable for scenarios that require frequent maintenance: when the inner pipe 212 has oxide deposits due to long-term use, or when the anti-deposition coating needs to be replaced, the inner pipe 212 can be removed from the outer pipe 211, and maintenance operations can be easily carried out by separating the cover 213 and the second pipe section 2122.

[0063] In other embodiments, the cover 213 and the second pipe section 2122 may be connected in a non-detachable manner. This connection method is suitable for operating conditions with low maintenance frequency, and the fixed structure can enhance the connection stability of the two and meet the requirements for long-term stable operation.

[0064] The specific connection method to be selected should be flexibly determined based on the actual operation of the single crystal furnace 200, and this application does not impose any restrictions on it.

[0065] In some embodiments, such as Figure 6 As shown, the cover 213 includes a cover plate 2131 and a heat-conducting element 2132 disposed on the side of the cover plate 2131 facing the inner tube 212. When the cover 213 is disposed at the end of the second tube segment 2122 away from the first tube segment 2121, the end of the heat-conducting element 2132 away from the cover plate 2131 extends into the interior of the first tube segment 2121.

[0066] This embodiment does not limit the specific material of the cover 213. When actually selected, it must meet the usage environment requirements of the bottom of the hot zone of the single crystal furnace 200. Graphite or other materials with high temperature resistance and deformation resistance can usually be used. At the same time, the material of the cover 213 must have good thermal conductivity to support its heat transfer function and adapt to the anti-deposition design requirements of the exhaust device 210.

[0067] The cover plate 2131 of the cover body 213 mainly serves a dual function of airflow guidance and heat transfer: In terms of airflow control, the cover plate 2131 closes the end of the second pipe section 2122 away from the first pipe section 2121, forcing the exhaust gas to enter the inner pipe 212 only through the air inlet on the side wall of the second pipe section 2122, avoiding airflow turbulence caused by longitudinal straight discharge; In terms of heat transfer, because the cover plate 2131 is close to the heat field, it can absorb heat through its own thermal conductivity and transfer the heat to the inside of the inner pipe 212 through the heat-conducting component 2132 of the cover body 213.

[0068] One end of the heat-conducting component 2132 is located on the side of the cover plate 2131 facing the inner tube 212, and the other end extends into the interior of the first tube section 2121 (it must first pass through the interior of the second tube section 2122). Its function is to regulate the internal temperature of the inner tube 212 through heat conduction. When the oxide generated during crystal growth flows through the inner tube 212 with the exhaust gas, it is easy to deposit on the inner wall of the inner tube 212 because it is far away from the high-temperature area of ​​the thermal field. The heat-conducting component 2132 can transfer the heat at the cover plate 2131 to the interior of the inner tube 212, increase the internal temperature of the inner tube 212, reduce the deposition of oxides on the inner wall of the inner tube 212, further ensure the smooth air intake, and improve the long-term stable operation capability of the exhaust device 210.

[0069] The structural form of the heat-conducting component 2132 can be flexibly selected according to the inner diameter of the inner tube 212, the airflow distribution inside the inner tube 212 and the heat conduction requirements. For example, it can be cylindrical, or other suitable shapes such as polygonal prisms or frustums can be selected. The specific shape needs to be determined in combination with the actual application scenario, and there is no limitation on it.

[0070] For example, the heat-conducting element 2132 can be configured as a cylinder, with its axis coinciding with the central axis of the cover plate 2131 (i.e., located at the center of the cover plate 2131). In terms of dimensional parameters, the diameter of the cylindrical heat-conducting element 2132 can be set to 10mm-20mm. This range can ensure sufficient heat conduction cross-sectional area to meet heat transfer requirements while avoiding the encroachment of the exhaust channel of the inner tube 212 due to excessive diameter. Its length can be set to 50mm-300mm. This range can be adapted to first tube sections 2121 of different lengths, ensuring that the heat-conducting element 2132 extends into the first tube section 2121 to effectively regulate the internal temperature. The specific dimensions can be flexibly adjusted according to the structure of the inner tube 212 and the heat conduction requirements.

[0071] In some embodiments, the cover plate 2131 has a first connecting portion on the side facing the second pipe segment 2122, and the end of the second pipe segment 2122 away from the first pipe segment 2121 has a second connecting portion that matches the first connecting portion. The cover plate 2131 is connected by the cooperation of the first connecting portion and the second connecting portion and is detachably mounted on the end of the second pipe segment 2122 away from the first pipe segment 2121.

[0072] Specifically, the cover plate 2131 is connected by the first connecting part and the second connecting part, and is installed at the end of the second pipe section 2122 away from the first pipe section 2121, which ensures a tight connection between the two and prevents exhaust gas from leaking from the connection. The detachable design of the cover plate 2131 and the first pipe section 2121 can meet maintenance needs: after long-term use, oxide deposits are easily accumulated inside the inner pipe 212. By separating the first and second connecting parts, the cover plate 2131 can be easily removed, and then the inner wall of the inner pipe 212 can be cleaned.

[0073] The aforementioned detachable connection can be achieved through various adaptable structures, such as threaded connections (i.e., one of the first connecting parts and the second connecting part is an internal thread, and the other is a matching external thread). The specific connection form can be flexibly selected according to actual assembly requirements, and there are no limitations on it.

[0074] According to another aspect of this application, a single crystal furnace is provided. The single crystal furnace includes a furnace body and an exhaust device, the exhaust device being disposed on the bottom wall of the furnace body, i.e., in a pre-set mounting position below the internal thermal field structure of the single crystal furnace.

[0075] The exhaust device can be the exhaust device 210 mentioned above, which can be referred to in the above description and will not be repeated here.

[0076] In summary, the single crystal furnace and its exhaust device according to the embodiments of this application adopt a split structure design, with the inner tube and outer tube being detachable and assembleable, and the inner tube being divided into a first tube section and a second tube section. When oxide deposition occurs on the inner wall of the inner tube, it is not necessary to remove the thermal field structure above the exhaust device; only the connection between the inner tube and the outer tube needs to be separated to remove the inner tube for cleaning or replacement. This simplifies the maintenance process of the exhaust device, reduces manpower input and time costs, significantly reduces production losses caused by equipment downtime, and ensures long-term stable operation of the exhaust device, providing a continuous and reliable basis for gas environment control for crystal growth.

[0077] Although exemplary embodiments have been described herein with reference to the accompanying drawings, it should be understood that the above exemplary embodiments are merely illustrative and are not intended to limit the scope of this application. Various changes and modifications can be made therein by those skilled in the art without departing from the scope and spirit of this application. All such changes and modifications are intended to be included within the scope of this application as claimed in the appended claims.

[0078] Similarly, it should be understood that, in order to simplify this application and aid in understanding one or more aspects of the application, various features of this application may sometimes be grouped together in a single embodiment, figure, or description thereof in the description of exemplary embodiments of this application. However, this approach should not be construed as reflecting an intention that the claimed application requires more features than are expressly recited in each claim. Rather, as reflected in the corresponding claims, the point of application is that the corresponding technical problem can be solved with fewer features than all of a single disclosed embodiment. Therefore, the claims following the detailed description are hereby expressly incorporated into that detailed description, wherein each claim itself is a separate embodiment of this application.

[0079] Furthermore, those skilled in the art will understand that although some embodiments described herein include certain features but not others included in other embodiments, combinations of features from different embodiments are intended to be within the scope of this application and form different embodiments. For example, in the claims, any one of the claimed embodiments can be used in any combination.

[0080] It should be noted that the above embodiments are illustrative of this application and not limiting of it, and that those skilled in the art can devise alternative embodiments without departing from the scope of the appended claims. In the claims, any reference signs placed between parentheses should not be construed as limiting the claims. The use of the words first, second, and third, etc., does not indicate any order. These words can be interpreted as names.

Claims

1. An exhaust device for a single crystal furnace, characterized in that, The exhaust device includes: outer tube; The inner tube has a first pipe section and a second pipe section; the first pipe section is detachably sleeved inside the outer tube, and one end of the first pipe section is an exhaust port, and the other end is connected to the second pipe section; the second pipe section is exposed outside the outer tube, and an air inlet is provided on the side wall of the second pipe section; A cover is disposed at the end of the second pipe segment away from the first pipe segment.

2. The exhaust device as described in claim 1, characterized in that, The air inlet is configured to restrict the airflow in the single crystal furnace to enter the air inlet only along a first direction, and the first direction is perpendicular to the path of the airflow in the single crystal furnace to the exhaust device.

3. The exhaust device as described in claim 1, characterized in that, The second pipe section has multiple air inlets on its sidewall, and the multiple air inlets are distributed circumferentially along the second pipe section.

4. The exhaust device as described in claim 1, characterized in that, Along the first pipe segment from the end closest to the second pipe segment toward the exhaust port, the diameter of the first pipe segment gradually decreases, and the diameter of the outer pipe gradually decreases synchronously.

5. The exhaust device as described in claim 4, characterized in that, The semi-cone angle of the first pipe section is 10°~20°, and the semi-cone angle of the outer pipe is the same as that of the first pipe section.

6. The exhaust device as claimed in claim 1, characterized in that, The inner wall of the first pipe section is provided with an anti-deposition coating.

7. The exhaust device as claimed in claim 1, characterized in that, The cover and the second pipe section are detachably connected.

8. The exhaust device as claimed in claim 1, characterized in that, The cover includes a cover plate and a heat-conducting element disposed on the side of the cover plate facing the inner tube. When the cover is disposed at the end of the second tube segment away from the first tube segment, the end of the heat-conducting element away from the cover plate extends into the interior of the first tube segment.

9. The exhaust device as described in claim 8, characterized in that, The cover plate has a first connecting part on the side facing the second pipe section, and the end of the second pipe section away from the first pipe section has a second connecting part that matches the first connecting part. The cover plate is connected by the cooperation of the first connecting part and the second connecting part and is detachably assembled to the end of the second pipe section away from the first pipe section.

10. A single crystal furnace, characterized in that, The single crystal furnace includes: Furnace body; The exhaust device as described in any one of claims 1 to 9 is disposed on the bottom wall of the furnace body.

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