A mask device for preventing back splash of developer and a developing machine

Abstract

The utility model provides a prevent the mask device and developing machine of development liquid back splash, through setting the baffle on the leak container, baffle opening size is less than the container opening size, when simulating spraying to the leak container through the nozzle crossing baffle opening, the back splash development liquid is sheltered by the baffle, and then avoids the back splash of development liquid to the wafer and leads to the bubble defect of wafer surface, improves the production yield. In addition, set up the connecting base between the leak container and the baffle, and the leak container and connecting base recess connection, connecting base and baffle recess connection, benefit the quick installation between three, change.

Description

Technical Field

[0001] This utility model belongs to the field of semiconductor manufacturing and relates to a masking device and a developing machine for preventing developer splashing. Background Technology

[0002] In the semiconductor manufacturing industry, photolithography plays an important role, and development has a great influence on the photolithography process. In order to avoid crystal contamination caused by the developer not flowing in the pipeline during the development process, the nozzle is simulated in the drain tank before the developer is sprayed onto the wafer (dummy discharge) to avoid crystal contamination in the pipeline.

[0003] However, when the nozzle simulates spraying in the receiving tank, the developer splashes out of the receiving tank when it hits the side wall and bottom of the receiving tank, and then falls onto the wafer surface, forming bubble defects on the wafer surface, which affects the yield.

[0004] Therefore, how to provide a masking device and a developing machine to prevent developer splashing, so as to avoid the yield reduction caused by developer splashing during simulated spraying, has become a technical problem that urgently needs to be solved by those skilled in the art. Utility Model Content

[0005] In view of the shortcomings of the prior art described above, the purpose of this utility model is to provide a masking device and a developing machine to prevent developer splashing, so as to solve the problem of reduced yield caused by developer splashing onto the wafer surface during simulated spraying in the prior art.

[0006] To achieve the above and other related objectives, this utility model provides a shielding device for preventing developer splashing, comprising:

[0007] A leak-proof container, wherein the top of the leak-proof container is provided with a container opening;

[0008] A baffle is installed on the top of the leak-receiving container, and the baffle has an opening, the size of which is smaller than the size of the container opening;

[0009] The nozzle can spray developer solution into the leak-receiving container through the baffle opening, and the developer solution splashed back when it hits the side wall or bottom of the leak-receiving container is blocked by the baffle.

[0010] Optionally, it also includes a connecting base located between the leak-receiving container and the baffle, wherein the connecting base has a connecting base opening, and the developer sprayed by the nozzle can pass through the connecting base opening and the container opening and fall into the leak-receiving container.

[0011] Optionally, the top of the connecting base is provided with a baffle mounting groove for mounting the baffle on the connecting base, and the bottom of the connecting base is provided with a base mounting groove for mounting the connecting base on the leak-proof container.

[0012] Optionally, the shape of the baffle opening is circular or polygonal.

[0013] Optionally, after the nozzle passes through the baffle opening, the distance between the nozzle and the baffle opening is 0.5mm to 1mm.

[0014] Optionally, the bottom of the leak-collecting container is funnel-shaped.

[0015] Optionally, the bottom of the leak-collecting container is provided with a drain port for discharging the developer sprayed into the leak-collecting container.

[0016] This utility model also provides a developing machine, which includes the shielding device for preventing developer splashing as described in any of the above claims.

[0017] As described above, in the shielding device and developing machine for preventing developer backsplashing of this utility model, a baffle is provided on the drip-receiving container. The size of the baffle opening is smaller than the container opening. When the nozzle passes through the baffle opening to simulate spraying onto the drip-receiving container, the backsplashed developer is blocked by the baffle, thereby preventing developer from backsplashing onto the wafer and causing bubble defects on the wafer surface, thus improving production yield. In addition, a connecting base is provided between the drip-receiving container and the baffle. The drip-receiving container and the connecting base are connected by a groove, and the connecting base and the baffle are connected by a groove, which facilitates quick installation and replacement of the three components. Attached Figure Description

[0018] Figure 1 The diagram shows the developer splashed onto the wafer surface.

[0019] Figure 2 The image shown is a cross-sectional view of a first type of masking device for preventing developer splashing in an embodiment of this utility model.

[0020] Figure 3 The image shown is an exploded view of the first type of shielding device for preventing developer splashing in an embodiment of this utility model.

[0021] Figure 4 The image shown is an exploded view of a second type of shielding device for preventing developer splashing in an embodiment of this utility model.

[0022] Component labeling: 1-Nozzle, 2-Leakage container, 21-Leakage container protrusion, 3-Wafer, 4-Baffle, 41-Baffle protrusion, 5-Connecting base, 51-Baffle mounting groove, 52-Base mounting groove. Detailed Implementation

[0023] like Figure 1 As shown, when nozzle 1 simulates spraying in the drip container 2, the developer splashes back onto the surface of wafer 3 after hitting the drip container 2, which will cause bubble defects on the surface of wafer 3 and reduce production yield. The purpose of this application is to prevent developer from splashing onto the surface of wafer 3 during simulated spraying and improve production yield.

[0024] The following specific examples illustrate the implementation of this utility model. Those skilled in the art can easily understand other advantages and effects of this utility model from the content disclosed in this specification. This utility model can also be implemented or applied through other different specific embodiments, and various details in this specification can also be modified or changed based on different viewpoints and applications without departing from the spirit of this utility model.

[0025] It should be emphasized that the term "including / comprises" as used herein refers to the presence of a feature, whole, step, or component, but does not exclude the presence or addition of one or more other features, wholes, steps, or components.

[0026] In the detailed description of the embodiments of this utility model, for ease of explanation, the cross-sectional views illustrating the device structure may be partially enlarged and not to the usual scale. Furthermore, the schematic diagrams are merely examples and should not limit the scope of protection of this utility model. In actual manufacturing, the three-dimensional spatial dimensions of length, width, and depth should be included.

[0027] In the context of this application, the structure described above the first feature may include embodiments in which the first feature and the second feature are in direct contact, or embodiments in which an additional feature is disposed between the first feature and the second feature, such that the first feature and the second feature may not be in direct contact.

[0028] Please see Figures 2 to 4 It should be noted that the illustrations provided in this embodiment are only schematic representations of the basic concept of this utility model. Therefore, the drawings only show the components related to this utility model and are not drawn according to the actual number, shape and size of the components. In actual implementation, the form, quantity and proportion of each component can be arbitrarily changed, and the layout of the components may also be more complex.

[0029] This embodiment provides a masking device to prevent developer splashing. Please refer to [link / reference]. Figure 2 and Figure 3The shielding device for preventing developer splashing includes a leak-receiving container 2 and a baffle 4. The leak-receiving container 2 has a container opening at its top. The baffle 4 is installed on the top of the leak-receiving container 2 and has a baffle opening. The size of the baffle opening is smaller than the size of the container opening. The nozzle 1 can spray developer into the leak-receiving container 2 through the baffle opening. When the developer hits the side wall or bottom of the leak-receiving container 2, the splashed developer is blocked by the baffle 4.

[0030] As an example, the leak-proof container 2 includes adjacent side portions and bottom portions, and the leak-proof container 2 does not have a top portion to form the container opening.

[0031] As an example, the bottom of the drip-collecting container 2 is funnel-shaped, which saves space while receiving the developer over the largest possible area. In addition, the bottom of the drip-collecting container 2 is provided with a drain port (not shown in the figure) for discharging the developer sprayed into the drip-collecting container 2 by the nozzle 1. By discharging the developer in the drip-collecting container 2, excessive accumulation of developer in the drip-collecting container 2 can be avoided, which would aggravate splashing.

[0032] As an example, the size of the baffle opening is as small as possible to prevent backsplashing developer from splashing out of the baffle opening.

[0033] As an example, after the nozzle 1 passes through the baffle opening, the distance between the nozzle 1 and the baffle opening is 0.5mm to 1mm. This does not affect the movement of the nozzle 1 within the baffle opening while preventing splashed developer from exiting the baffle opening. Specifically, the distance between the nozzle 1 and the baffle opening can be 0.5mm, 0.6mm, 0.7mm, 0.8mm, 0.9mm, 1mm, etc., selected according to requirements.

[0034] As an example, the shape of the baffle opening can be circular or polygonal, etc., selected according to requirements to adapt to different nozzle 1 shapes.

[0035] As an example, in this embodiment, the shielding device for preventing developer splashing further includes a connecting base 5, which is located between the leak-receiving container 2 and the baffle 4. The connecting base 5 is provided with a connecting base opening, and the developer sprayed by the nozzle 1 can pass through the connecting base opening and the container opening and fall into the leak-receiving container 2.

[0036] As an example, the top of the connecting base 5 is provided with a baffle mounting groove 51, which is used to install the baffle 4 onto the connecting base 5. Specifically, in this embodiment, the baffle mounting groove 51 is located on the top periphery of the connecting base 5, and the bottom of the baffle 4 is provided with a baffle protrusion 41 that matches the baffle mounting groove 51. The baffle protrusion 41 and the baffle mounting groove 51 cooperate to install the baffle 4 onto the connecting base 5.

[0037] As an example, the bottom of the connecting base 5 is provided with a base mounting groove 52, which is used to install the connecting base 5 onto the leak-receiving container 2. Specifically, in this embodiment, the base mounting groove 52 is located on the bottom periphery of the connecting base 5, and the top of the leak-receiving container 2 is provided with a leak-receiving container protrusion 21 that matches the base mounting groove 52. The leak-receiving container protrusion 21 and the base mounting groove 52 cooperate to install the connecting base 5 onto the leak-receiving container 2.

[0038] As an example, such as Figure 4 As shown, in another example, the baffle mounting groove 51 can also be provided on the top inner circumference of the connecting base 5, and the base mounting groove 52 can be provided on the bottom inner circumference of the connecting base 5. The choice can be made according to the requirements and is not limited to this embodiment.

[0039] In order for the nozzle 1 to spray the developing solution through the opening of the baffle, the height of the baffle 4 needs to be designed according to the set position of the nozzle 1. To avoid the baffle 4 being too large, the connecting base 5 can be used to support the baffle 4.

[0040] As an example, by setting the connecting base 5, the baffle 4 is raised, providing more spray space. It should be noted that, since the connecting base 5 is provided between the baffle 4 and the receiving container 2, during the simulated spraying process of the nozzle 1, the splashed developer may also be blocked by the side wall of the connecting base 5.

[0041] As an example, the connecting base 5 and the leak-proof container 2 are connected by a groove, and the connecting base 5 and the baffle 4 are connected by a groove, which facilitates quick installation and replacement of the three components.

[0042] As an example, in another example, the connecting base 5 may not be provided, that is, the baffle 4 may be directly installed on the top of the leak-proof container 2, which also falls within the protection scope of this utility model.

[0043] This embodiment also provides a developing machine, which includes the shielding device described above for preventing developer splashing.

[0044] In summary, the shielding device and developing machine for preventing developer backsplashing of this invention, by setting a baffle on the drip-receiving container with an opening smaller than the container opening, allows the nozzle to simulate spraying through the baffle opening into the drip-receiving container. The backsplashed developer is blocked by the baffle, thus preventing backsplashing onto the wafer and causing bubble defects on the wafer surface, thereby improving production yield. Furthermore, a connecting base is provided between the drip-receiving container and the baffle, with the drip-receiving container and the connecting base connected by a groove, and the connecting base and the baffle connected by a groove, facilitating quick installation and replacement of all three components. Therefore, this invention effectively overcomes the various shortcomings of the prior art and has high industrial applicability.

[0045] The above embodiments are merely illustrative of the principles and effects of this utility model and are not intended to limit the scope of this utility model. Any person skilled in the art can modify or alter the above embodiments without departing from the spirit and scope of this utility model. Therefore, all equivalent modifications or alterations made by those skilled in the art without departing from the spirit and technical concept disclosed in this utility model should still be covered by the claims of this utility model.

Claims

1. A masking device for preventing developer splashing, characterized in that, include: A leak-proof container, wherein the top of the leak-proof container is provided with a container opening; A baffle is installed on the top of the leak-receiving container, and the baffle has an opening, the size of which is smaller than the size of the container opening; The nozzle can spray developer solution into the leak-receiving container through the baffle opening, and the developer solution splashed back when it hits the side wall or bottom of the leak-receiving container is blocked by the baffle.

2. The shielding device for preventing developer splashing according to claim 1, characterized in that: It also includes a connecting base located between the leak-receiving container and the baffle, wherein the connecting base has a connecting base opening, and the developing solution sprayed from the nozzle can pass through the connecting base opening and the container opening and fall into the leak-receiving container.

3. The shielding device for preventing developer splashing according to claim 2, characterized in that: The top of the connecting base is provided with a baffle mounting groove for mounting the baffle on the connecting base, and the bottom of the connecting base is provided with a base mounting groove for mounting the connecting base on the leak-proof container.

4. The shielding device for preventing developer splashing according to claim 1, characterized in that: The shape of the baffle opening is circular or polygonal.

5. The shielding device for preventing developer splashing according to claim 1, characterized in that: After the nozzle passes through the baffle opening, the distance between the nozzle and the baffle opening is 0.5mm to 1mm.

6. The shielding device for preventing developer splashing according to claim 1, characterized in that: The bottom of the leak-collecting container is funnel-shaped.

7. The shielding device for preventing developer splashing according to claim 6, characterized in that: The bottom of the leak-collecting container is provided with a drain port for discharging the developer solution sprayed into the leak-collecting container.

8. A developing machine, characterized in that: The developing machine includes a shielding device for preventing developer splashing as described in any one of claims 1-7.

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