Rack for cleaning single crystal silicon wafers

Abstract

The utility model relates to the field of cleaning frame, especially for monocrystalline silicon wafer's cleaning frame, it includes: outer frame, the inner frame of sliding connection in the outer frame, detachable fixed connection in the inner frame top's fixed link is used for with the inner frame cooperation and restricts monocrystalline silicon wafer in the inner frame, and fixed link uses fixed part and is fixed with the inner frame, set up in the outer frame is used for driving the vibration assembly of inner frame vibration, set up in the inner frame in mounting panel, mounting panel equidistance arrangement sets up in the inner frame, and the space of inner frame is divided into the partition area thicker than monocrystalline silicon wafer, sliding connection in the both sides of mounting panel's clamping arm is used for with monocrystalline silicon wafer steady clamping restriction between mounting panel, fixed connection between mounting panel and clamping arm's first spring, the contact roller of rotation connection on clamping arm. The utility model sets up vibration cooperation immersion washing process, and the flowability and impact force of cleaning fluid are enhanced, and the removal efficiency of pollutant is improved, and the dead angle of cleaning is reduced, and the cleaning uniformity and overall effect are improved.

Description

Technical Field

[0001] This utility model relates to the field of cleaning racks, and more particularly to a cleaning rack for monocrystalline silicon wafers. Background Technology

[0002] Monocrystalline silicon wafers are the core material for manufacturing semiconductor devices and solar cells, and their surface cleanliness has a decisive impact on product performance and yield. During the production process, silicon wafers must be thoroughly cleaned to remove surface particles, organic residues, metal ions, and other contaminants to prevent residual contaminants from affecting product performance.

[0003] Currently, there are two main methods for handling contaminants: rinsing, which uses a spray device to continuously flow cleaning fluid over the silicon wafer surface, using fluid impact to remove contaminants; however, the contact time between the fluid and the silicon wafer is too short, resulting in insufficient chemical reaction. To meet process requirements, a large amount of cleaning fluid is often required, which is not only costly but also increases the burden of wastewater treatment. Immersion, on the other hand, uses a immersion device to submerge the silicon wafer in cleaning fluid, relying on chemical reagents to remove impurities. However, due to the physical force, the cleaning cycle is longer, the efficiency is low, and the ability to remove firmly attached particulate contaminants is limited, resulting in uneven cleaning effects. Utility Model Content

[0004] This invention provides a cleaning rack for monocrystalline silicon wafers that can improve cleaning effect and efficiency, aiming to ensure the cleaning quality of monocrystalline silicon wafers while achieving both resource conservation and improved cleaning efficiency.

[0005] The technical solution is as follows: a cleaning rack for monocrystalline silicon wafers, comprising: an outer frame; an inner frame slidably connected within the outer frame; a fixing rod detachably and fixedly connected to the top of the inner frame for cooperating with the inner frame to confine the monocrystalline silicon wafer within the inner frame, the fixing rod being fixed to the inner frame using fasteners; a vibration assembly mounted on the outer frame for driving the inner frame to vibrate; mounting plates mounted on the inner frame, the mounting plates being equidistantly arranged in the inner frame to divide the space of the inner frame into partitions thicker than the monocrystalline silicon wafer; clamping arms slidably connected to both sides of the mounting plates for stably clamping and confining the monocrystalline silicon wafer between the mounting plates; a first spring fixedly connected between the mounting plate and the clamping arms; and contact rollers rotatably connected to the clamping arms.

[0006] As an improvement to the above solution, the fastener is specifically a pin, through which the fixing rod is fixed to the inner frame by plugging. The fixing rod is provided with a row of equally spaced insertion holes.

[0007] As an improvement to the above solution, the vibration assembly includes: a motor fixedly connected to the outer frame; at least two sets of convex shafts rotatably connected to the outer frame, with their flanges contacting the inner frame, and the output end of the motor being coaxially fixed with one of the convex shafts; a pulley assembly disposed between the two sets of convex shafts; and a third spring fixedly connected between the outer frame and the inner frame.

[0008] As an improvement to the above solution, the mounting plate is slidably connected to the inner frame, and the cleaning rack further includes: a second spring fixedly connected between the inner frame and the mounting plate; and a stop rod fixedly connected to the outer frame, the stop rod being restricted on the mounting plate to constrain the displacement of the mounting plate.

[0009] As an improvement to the above solution, the cleaning rack also includes handles fixedly connected to both sides of the outer frame.

[0010] As an improvement to the above solution, the cleaning rack further includes an anti-slip pad fixedly connected to the bottom of the outer frame.

[0011] This invention enhances the fluidity and impact of the cleaning solution by incorporating vibration into the immersion process, thereby improving contaminant removal efficiency, reducing cleaning dead zones, and enhancing cleaning uniformity and overall effectiveness. It is compatible with various sizes of monocrystalline silicon wafers, improving versatility and operational flexibility. The invention achieves flexible clamping and rolling of the wafers, effectively preventing scratches or collision damage to the surface of the monocrystalline silicon wafers during loading, unloading, and vibration, ensuring the safety of the wafer processing. The vibration component used in this invention can uniformly transmit force to each monocrystalline silicon wafer, achieving a thorough and uniform cleaning effect without dead zones, effectively improving the consistency of cleaning quality. By limiting the displacement of the mounting plate, this invention avoids the contact roller continuously obstructing the same area of ​​the monocrystalline silicon wafer surface, ensuring that the cleaning solution can act comprehensively and evenly on the entire surface of the monocrystalline silicon wafer, effectively improving the cleaning coverage and consistency. Attached Figure Description

[0012] Figure 1 This is a schematic diagram of the overall structure of this utility model.

[0013] Figure 2 This is a cross-sectional view of the overall structure of this utility model.

[0014] Figure 3 This is a cross-sectional view showing the connection relationship between the mounting plate, clamping arm, and contact roller of this utility model.

[0015] The labels in the diagram are as follows: 1. Outer frame, 2. Inner frame, 3. Mounting plate, 4. Clamping arm, 5. First spring, 6. Contact roller, 7. Second spring, 8. Fixing rod, 9. Pin, 10. Motor, 11. Shaft, 12. Pulley assembly, 13. Third spring, 14. Abutment rod, 15. Handle, 16. Anti-slip pad. Detailed Implementation

[0016] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0017] Example: A cleaning rack for monocrystalline silicon wafers, such as Figures 1-3 As shown, it includes: an outer frame 1, which is placed in an immersion tank during use; an inner frame 2 that is slidably installed inside the outer frame 1; a fixing rod 8 that is detachably fixed to the top of the inner frame 2, used to cooperate with the inner frame 2 to confine the monocrystalline silicon wafer within the inner frame 2. The fixing rod 8 is fixed to the inner frame 2 using a fastener, specifically a pin 9, through which the fixing rod 8 is plugged into the inner frame 2. The fixing rod 8 is provided with a row of equidistantly arranged insertion holes to accommodate monocrystalline silicon wafers of different sizes; a vibration assembly provided on the outer frame 1 for driving the vibration of the inner frame 2; and a vibration component provided on the inner frame 2. The mounting plates 3 are arranged equidistantly in the inner frame 2, dividing the space of the inner frame 2 into partitions thicker than the monocrystalline silicon wafers. Clamping arms 4 are slidably mounted on both sides of the mounting plates 3 to stably clamp and restrict the monocrystalline silicon wafers between the mounting plates 3, so as to avoid collisions with the mounting plates 3 during vibration and damage. A first spring 5 is fixedly mounted between the mounting plates 3 and the clamping arms 4. A contact roller 6 is rotated and mounted on the clamping arms 4 to assist the smooth loading of the monocrystalline silicon wafers through rolling contact, avoiding friction damage during the loading of the monocrystalline silicon wafers.

[0018] During operation, first remove the fixing parts and remove the fixing rod 8. Insert the monocrystalline silicon wafers one by one into the clamping arms 4 between each mounting plate 3. At this time, under the action of the first spring 5, the clamping arms 4 automatically clamp the monocrystalline silicon wafers to achieve flexible fixation. After completion, reinstall the fixing rod 8 to further restrict the movement of the monocrystalline silicon wafers and stably confine them in the inner frame 2. Then, place the cleaning rack into the immersion tank, inject cleaning fluid until it completely submerges the monocrystalline silicon wafers, start the vibration component, and control the vibration of the inner frame 2 to make the cleaning fluid generate a violent impact on the monocrystalline silicon wafers, thereby improving the cleaning efficiency and effect.

[0019] This cleaning rack enhances the fluidity and impact of the cleaning solution through a vibration-assisted immersion process, improving contaminant removal efficiency, reducing cleaning dead zones, and enhancing cleaning uniformity and overall effectiveness. This cleaning rack is compatible with various sizes of monocrystalline silicon wafers, increasing versatility and operational flexibility. The rack features flexible clamping and rolling wafer loading, effectively preventing scratches or collision damage to the surface of the monocrystalline silicon wafers during loading, unloading, and vibration, ensuring the safety of monocrystalline silicon wafer processing.

[0020] like Figure 2As shown, the vibration assembly includes: a motor 10 fixedly installed inside the outer frame 1; two sets of convex shafts 11 rotatably installed inside the outer frame 1, with their flanges contacting the inner frame 2, and the output end of the motor 10 being coaxially fixed with one of the convex shafts 11 to provide driving force for its rotation; a pulley assembly 12 installed between the two sets of convex shafts 11 to realize power transmission; and a third spring 13 fixedly installed between the outer frame 1 and the inner frame 2 to provide restoring force.

[0021] The motor 10 is started, and the cam shaft 11 is rotated so that its flange periodically squeezes the inner frame 2 to generate displacement. The third spring 13 controls the inner frame 2 to reset, thus realizing high-frequency low-amplitude vibration of the inner frame 2. This vibration mode can transmit the force evenly to each monocrystalline silicon wafer, thereby achieving a clean effect without dead corners and with uniformity during the cleaning process, effectively improving the consistency of cleaning quality.

[0022] like Figures 1-3 As shown, the mounting plate 3 is slidably mounted on the inner frame 2, and also includes: a second spring 7 fixedly mounted between the inner frame 2 and the mounting plate 3; and a stop rod 14 fixedly mounted on the outer frame 1, the stop rod 14 being restricted to the upper part of the mounting plate 3 to constrain the mounting plate 3 so that it does not move with the inner frame 2.

[0023] When the inner frame 2 vibrates under the drive of the vibration component, the mounting plate 3 remains stationary due to the restriction of the abutment rod 14, thereby causing relative movement between the monocrystalline silicon wafer and the clamping arm 4 and the contact roller 6. This prevents the contact roller 6 from continuously blocking the same area on the surface of the monocrystalline silicon wafer, ensuring that the cleaning fluid can act on the entire surface of the monocrystalline silicon wafer comprehensively and evenly, effectively improving the cleaning coverage and consistency of this cleaning rack.

[0024] like Figure 2 As shown, it also includes: handles 15 fixedly installed on both sides of the outer frame 1 to facilitate the handling and transfer of this cleaning rack; and anti-slip pads 16 fixedly installed at the bottom of the outer frame 1 to increase the stability of this cleaning rack when placed in the immersion tank.

[0025] The above embodiments are merely preferred embodiments of the present utility model and are not intended to limit the scope of the present utility model. Therefore, all equivalent changes made based on the content described in the claims of the present utility model should be included within the scope of the claims of the present utility model.

Claims

1. A cleaning rack for monocrystalline silicon wafers, characterized in that, include: Outer frame (1); inner frame (2) slidably connected to the outer frame (1); fixing rod (8) detachably fixedly connected to the top of the inner frame (2) for cooperating with the inner frame (2) to restrict the monocrystalline silicon wafer in the inner frame (2), the fixing rod (8) is fixed to the inner frame (2) using a fastener; vibration assembly set on the outer frame (1) for driving the inner frame (2) to vibrate; mounting plate (3) set in the inner frame (2), the mounting plates (3) are equidistantly arranged in the inner frame (2) to divide the space of the inner frame (2) into partitions thicker than the monocrystalline silicon wafer; clamping arms (4) slidably connected to both sides of the mounting plate (3) for stably clamping and restricting the monocrystalline silicon wafer between the mounting plates (3); first spring (5) fixedly connected between the mounting plate (3) and the clamping arm (4); contact roller (6) rotatably connected to the clamping arm (4).

2. The cleaning rack for monocrystalline silicon wafers as described in claim 1, characterized in that, The fastener is a pin (9), and the fixing rod (8) will be fixed to the inner frame (2) by plugging it in. The fixing rod (8) is provided with a row of equally spaced insertion holes.

3. The cleaning rack for monocrystalline silicon wafers as described in claim 1, characterized in that, The vibration assembly includes: a motor (10) fixedly connected inside the outer frame (1); at least two sets of convex shafts (11) rotatably connected inside the outer frame (1), with their flanges in contact with the inner frame (2), and the output end of the motor (10) being coaxially fixed with one of the convex shafts (11); a pulley assembly (12) disposed between the two sets of convex shafts (11); and a third spring (13) fixedly connected between the outer frame (1) and the inner frame (2).

4. The cleaning rack for monocrystalline silicon wafers as described in claim 1, characterized in that, The mounting plate (3) is slidably connected to the inner frame (2). The cleaning rack also includes: a second spring (7) fixedly connected between the inner frame (2) and the mounting plate (3); and a stop rod (14) fixedly connected to the outer frame (1). The stop rod (14) is restricted to the mounting plate (3) and is used to constrain the displacement of the mounting plate (3).

5. The cleaning rack for monocrystalline silicon wafers as described in claim 1, characterized in that, The cleaning rack also includes handles (15) that are fixedly connected to both sides of the outer frame (1).

6. The cleaning rack for monocrystalline silicon wafers as described in claim 1, characterized in that, The cleaning rack also includes an anti-slip pad (16) fixedly connected to the bottom of the outer frame (1).

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