Base station and cleaning system

Abstract

The embodiment of the present application provides a base station and a cleaning system, the base station comprising a base and a placing component, the base being formed with a cleaning pool and a liquid discharge mechanism, the liquid discharge mechanism having a first liquid discharge channel and a liquid discharge power component, and being used for discharging the cleaning pool, the placing component comprising a placing position, a second liquid discharge channel, a first cavity and a second cavity, wherein the placing position is used for placing a cleaning device, the first cavity is used for receiving liquid in the cleaning device, the second cavity is communicated with the first cavity to receive the liquid in the first cavity, and the liquid in the cleaning pool is discharged to the second cavity through the first liquid discharge channel under the driving of the liquid discharge power component, so as to clean the second cavity and discharge the base station through the second liquid discharge channel. In this way, not only the residual sewage and stains in the base station can be cleaned, but also the liquid in the cleaning pool can be used to clean the inside of the base station through the first liquid discharge channel, and the liquid can be reused to save water sources.

Description

Technical Field

[0001] This utility model relates to the field of household appliance technology, and in particular to a base station and cleaning system for a cleaning device. Background Technology

[0002] With the continuous improvement of living standards, modern consumers have increasingly higher requirements for the quality of household cleaning equipment. Currently, cleaning equipment is generally equipped with a base station that is used in conjunction with the equipment. The base station not only meets the charging and placement functions of the cleaning equipment, but also automatically and efficiently cleans the equipment to keep it in a clean state.

[0003] In most common base stations, the focus is only on the cleaning function of the cleaning equipment, while neglecting the cleaning and maintenance of the base station itself. As a result, after the cleaning equipment is cleaned, residual sewage and stains will accumulate inside the base station. If not cleaned for a long time, they may even produce odors, which seriously affect the user experience. Utility Model Content

[0004] To address the above problems, this utility model proposes a base station, which includes: The base has a cleaning pool and a drainage mechanism. The drainage mechanism has a first drainage channel and is used to drain the cleaning pool so as to drain at least a portion of the liquid in the cleaning pool. The placement component has a placement position and a second drainage channel, and is provided with a first cavity, a second cavity and a switch structure. The first cavity is used to receive the liquid discharged by the cleaning equipment when the cleaning equipment is placed in the placement position. The first cavity is connected to the second cavity through the switch structure so that the liquid carried in the first cavity can flow to the second cavity through the switch structure. The second cavity is connected to the first drainage channel and the second drainage channel. The drainage mechanism is also equipped with a drainage power component, which provides power for the liquid flow in the first drainage channel so that at least part of the liquid in the cleaning tank is discharged into the second cavity through the first drainage channel, and the liquid in the second cavity can be discharged through the second drainage channel.

[0005] In one embodiment, the placement component is provided with a conductive component opposite to the placement position, and the first cavity is also formed with a liquid guide port. The conductive component is used to cooperate with the cleaning device when the cleaning device is placed in the placement position to introduce liquid in the cleaning device into the first cavity through the liquid guide port.

[0006] In one embodiment, the input port of the first drainage channel is connected to the cleaning tank, and the output port of the first drainage channel is connected to the second cavity; The placement component also includes a baffle, which is disposed in the second cavity and is opposite to the output port of the first drainage channel.

[0007] In one embodiment, the switch structure can unidirectionally conduct liquid flowing from the first cavity to the second cavity.

[0008] In one embodiment, the cleaning tank has an opening through which the mop head can enter the cleaning tank; The opening and the bottom of the cleaning pool away from the opening have a first distance L1. When the cleaning equipment is placed in the placement position, the top of the mop head near the opening and the bottom of the cleaning pool have a second distance L2. The first distance L1 and the second distance L2 satisfy that L2≤L1.

[0009] In one embodiment, the base includes a liquid supply mechanism disposed around the cleaning tank for supplying liquid to the cleaning tank, and the liquid supply mechanism is close to the opening of the cleaning tank so that at least a portion of the cleaning tank is rinsed during the liquid supply process.

[0010] In one embodiment, the drainage power component includes a centrifugal drainage pump.

[0011] In one embodiment, the base station further includes a charging component and a communication component, which are disposed on the placement component and at least partially exposed thereon. In this configuration, when the cleaning equipment is placed in the placement component, the communication component is used to communicate with the cleaning equipment via signals, and the charging component is used to charge the cleaning equipment.

[0012] In one embodiment, the placement component includes a connection portion for connecting with a cleaning adapter, a first cavity is formed in the connection portion, and the connection portion forms a third cavity isolated from the first cavity, wherein a charging component is disposed in the third cavity.

[0013] This utility model also proposes a cleaning system, including cleaning equipment and the base station described in any of the above embodiments.

[0014] This application provides a base station, which includes a base and a placement component. The base has a cleaning tank and a drainage mechanism. The drainage mechanism has a first drainage channel and a drainage power component for draining liquid from the cleaning tank. The placement component includes a placement position, a second drainage channel, a first cavity, and a second cavity. The placement position is used to place cleaning equipment. The first cavity is used to receive liquid from the cleaning equipment. The second cavity is connected to the first cavity to receive liquid from the first cavity. Under the drive of the drainage power component, the liquid in the cleaning tank is discharged through the first drainage channel to the second cavity to clean the second cavity and is then discharged from the base station through the second drainage channel. This configuration not only cleans residual sewage and stains inside the base station but also allows for the reuse of liquid from the cleaning tank for cleaning the interior of the base station through the first drainage channel, thus saving water resources. Attached Figure Description

[0015] To more clearly illustrate the technical solutions of the embodiments of this application, the drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0016] Figure 1 This is a schematic diagram of the structure of the base station and cleaning equipment provided in the embodiments of this application; Figure 2 This is a three-dimensional structural diagram of the base station provided in the embodiments of this application; Figure 3 This is a cross-sectional structural diagram of the base station provided in an embodiment of this application; Figure 4 This is a schematic diagram of the internal flow path of the base station and cleaning equipment provided in the embodiments of this application.

[0017] Explanation of reference numerals in the attached figures: 10. Base station; 11. Placement component; 111. Placement position; 112. Second drainage channel; 113. First cavity; 1131. Liquid guide port; 114. Second cavity; 1141. Stop; 115. Switch structure; 116. Conducting component; 117. Charging component; 118. Communication component; 119. Third cavity; 12. Base; 121. Cleaning tank; 1211. Opening; 124. Liquid replenishment port; 122. Drainage mechanism; 1221. First drainage channel; 1222. Drainage power component; 1223. Input port; 1224. Output port; 123. Liquid supply mechanism; 1321. Tank; 1232. Liquid supply port; 20. Cleaning equipment; 21. Tractor head.

[0018] The realization of the objective, functional features and advantages of the present invention will be further explained in conjunction with the embodiments and with reference to the accompanying drawings. Detailed Implementation The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0019] In the description of this application, unless otherwise expressly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection between two components. Those skilled in the art can understand the specific meaning of the above terms in this application based on the specific circumstances.

[0020] It is understood that descriptions involving "first," "second," etc., are for descriptive purposes only and should not be construed as indicating or implying their relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined with "first" or "second" may explicitly or implicitly include at least one of those features.

[0021] The following detailed description of some embodiments of this application is provided in conjunction with the accompanying drawings. Unless otherwise specified, the following embodiments and features can be combined with each other.

[0022] Please see Figure 1 and Figure 3 , Figure 1 This is a schematic diagram of the structure of the base station and cleaning equipment provided in the embodiments of this application. Figure 2 This is a three-dimensional structural diagram of the base station provided in the embodiments of this application. Figure 3 This is a cross-sectional structural diagram of the base station provided in an embodiment of this application.

[0023] like Figures 1 to 3 As shown, in some embodiments, the base station 10 can be used to clean the head 21 of the cleaning equipment 20, which has a wastewater tank for storing cleaning wastewater. The cleaning equipment 20 collects wastewater from the cleaning process into the wastewater tank through the head 21.

[0024] The base station 10 includes a base 12 and a placement component 11. The base 12 forms a cleaning pool 121 and is provided with a drainage mechanism 122. The cleaning pool 121 is used to clean the auger 21 of the cleaning equipment 20. The drainage mechanism 122 is located at the bottom of the cleaning pool 121 and forms a first drainage channel 1221. The first drainage channel 1221 is used to drain liquid from the cleaning pool 121 so that at least a portion of the liquid in the cleaning pool 121 is discharged from the cleaning pool 121 through the first drainage channel 1221.

[0025] The placement component 11 has a placement position 111 and a second drainage channel 112, wherein the placement position 111 is used to place the cleaning equipment 20 and to place the mop head 21 of the cleaning equipment 20 in the cleaning pool 121.

[0026] The placement component 11 also includes a first cavity 113, a second cavity 114, and a switch structure 115. The first cavity 113 is used to receive the liquid discharged from the sewage tank of the cleaning equipment 20 when the cleaning equipment 20 is placed in the placement position 111. The first cavity 113 is connected to the second cavity 114 through the switch structure 115 so that the liquid carried in the first cavity 113 can flow to the second cavity 114 through the switch structure 115. The second cavity 114 is connected to the first drainage channel 1221 and the second drainage channel 112. One end of the second drainage channel 112 is connected to the second cavity 114, and the other end of the second drainage channel 112 is connected to the outside of the base station 10 so as to discharge the liquid in the second cavity 114 to the outside of the base station 10.

[0027] The drainage mechanism 122 is also provided with a drainage power component 1222, which provides power for the liquid flow in the first drainage channel 1221 so that at least part of the liquid in the cleaning tank 121 is discharged into the second cavity 114 through the first drainage channel 1221, and the liquid in the second cavity 114 can be discharged through the second drainage channel 112.

[0028] Please see Figure 4 , Figure 4 This is a schematic diagram of the internal flow path of the base station and cleaning equipment provided in the embodiments of this application.

[0029] like Figure 4 As shown, the liquid in the cleaning device 20 flows into the second cavity 114 through the first cavity 113, the liquid in the cleaning pool 121 flows into the second cavity 114 through the first drain channel 1221, and the liquid accumulated in the second cavity 114 is discharged to the outside of the base station 10 through the second drain channel 112.

[0030] With this configuration, the first cavity 113 receives the liquid discharged from the sewage tank of the cleaning device 20. The liquid flows from the first cavity 113 into the second cavity 114 and finally exits the base station 10 through the second drainage channel 112. Then, the first drainage channel 1221 discharges the liquid from the cleaning tank 121 to the second cavity 114 through the drainage power component 1222, and exits the base station 10 through the second drainage channel 112. This cleans the second cavity 114 and the second drainage channel 112, not only cleaning the sewage and stains remaining inside the base station 10, but also allowing the liquid from the cleaning tank 121 to be used for cleaning the inside of the base station 10 through the first drainage channel 1221. This also enables the reuse of the liquid to save water and reduce the amount of water required for cleaning the base station 10.

[0031] In some embodiments, the wastewater tank of the cleaning device 20 has an opening and closing mechanism, which has a switchable first state and a second state. In the first state, the wastewater tank is kept sealed, and in the second state, the wastewater in the wastewater tank is discharged through the opening and closing mechanism.

[0032] The placement component 11 is provided with a connecting component 116 opposite to the placement position 111, and the first cavity 113 is also formed with a liquid guide port 1131. The connecting component 116 is used to cooperate with the opening and closing mechanism of the cleaning equipment 20 when the cleaning equipment 20 is placed in the placement position 111, so that the opening and closing mechanism switches from the first state to the second state, and the liquid in the sewage tank of the cleaning equipment 20 is introduced into the first cavity 113 through the liquid guide port 1131.

[0033] In some embodiments, the opening and closing mechanism includes a drain opening 1211 and a movable rotating component located at the drain opening 1211. The guiding component 116 is a support component corresponding to the rotating component. When the cleaning device 20 is placed in the placement position 111, the support component contacts the rotating component and causes the rotating component to move away, so that the liquid in the sewage tank flows out through the drain opening 1211.

[0034] This configuration allows the liquid in the wastewater tank of the cleaning device 20 to flow out to the first cavity 113 when the cleaning device 20 is placed in the placement position 111. It also has a simple structure and is easy to maintain.

[0035] In some embodiments, the first drainage channel 1221 has an input port 1223 and an output port 1224. The input port 1223 of the first drainage channel 1221 is connected to the cleaning tank 121, and the output port 1224 of the first drainage channel 1221 is connected to the second cavity 114, so that the liquid in the cleaning tank 121 can be discharged to the second cavity 114 through the first drainage channel 1221.

[0036] The placement component 11 also includes a baffle 1141, which is disposed in the second cavity 114 and is opposite to the output port 1224 of the first drain channel 1221. This causes the liquid discharged from the output port 1224 of the first drain channel 1221 to impact the baffle 1141, which is positioned opposite to the output port 1224, thereby causing the liquid discharged from the output port 1224 to be dispersed and splashed onto the second cavity 114.

[0037] By setting the baffle 1141, the liquid discharged from the output port 1224 of the first drainage channel 1221 is dispersed during the process of being discharged into the second cavity 114, thereby splashing onto the entire second cavity 114, thus improving the cleaning efficiency and cleaning effect of the second cavity 114.

[0038] In some embodiments, the drainage power component 1222 may be disposed at at least one of the input port 1223 and the output port 1224.

[0039] In some embodiments, the switch structure 115 can unidirectionally conduct liquid flowing from the first chamber 113 to the second chamber 114, allowing liquid to flow from the first chamber 113 to the second chamber 114. During the cleaning process, liquid is discharged from the output port 1224 of the first drain channel 1221 into the second liquid chamber 114, preventing liquid from entering the first chamber 113 from the second chamber 114, thus reducing the impact on the cleaning equipment 20 and the first chamber 113. The switch structure 115 includes, but is not limited to, a one-way valve, a solenoid valve, and a mechanical mechanism.

[0040] In one embodiment, the switch structure 115 can be a unidirectional movable baffle, disposed at the outer end of the first cavity 113 and located inside the second cavity 114, and covering the opening 1211 that connects the first cavity 113 and the second cavity 114. During the process of discharging liquid from the first cavity 113 to the second cavity 114, the liquid impacts the switch structure 115, causing the switch structure 115 to move away from the first cavity 113, so that the first cavity 113 and the second cavity 114 are connected. When the first cavity 113 stops discharging liquid to the second cavity 114, the switch structure 115 returns to its original position to prevent the liquid in the second cavity 114 from entering the first cavity 113.

[0041] In some embodiments, the cleaning tank 121 has an opening 1211 through which the tractor head 21 enters the cleaning tank 121; The opening 1211 and the bottom of the cleaning pool 121 away from the opening 1211 have a first distance L1. When the cleaning equipment 20 is placed in the placement position 111, the top of the mop head 21 near the opening 1211 and the bottom of the cleaning pool 121 have a second distance L2. The first distance L1 and the second distance L2 satisfy that L2≤L1.

[0042] This design ensures that the depth of the cleaning pool 121 is greater than the height of the mop head 21. Therefore, when the cleaning device 20 is placed in the placement position 111, the liquid in the cleaning pool 121 can completely submerge the mop head 21, allowing the liquid in the cleaning pool 121 to thoroughly soak and clean the mop head 21, greatly improving the cleaning effect.

[0043] In some embodiments, the base 12 includes a liquid supply mechanism 123 which is disposed around the cleaning tank 121 for supplying liquid to the cleaning tank 121, and the liquid supply mechanism 123 is close to the opening 1211 of the cleaning tank 121 so that at least a portion of the cleaning tank 121 is rinsed during the process of the liquid supply mechanism 123 supplying liquid to the cleaning tank 121.

[0044] In one embodiment, the liquid supply mechanism 123 has a tank 1321 surrounding the cleaning pool 121, and a liquid supply port 1232 inside the tank 1321. During the operation of the liquid supply mechanism 123, the liquid supply port 1232 first supplies liquid into the tank 1321, so that the liquid fills the tank 1321 and overflows from the tank 1321, thereby causing the liquid to fall from the surrounding tank 1321 into the cleaning pool 121.

[0045] It is understood that the liquid supply mechanism 123 of the cleaning tank 121 is arranged around the tank, so that the liquid supply mechanism 123 continuously supplies liquid during and after the cleaning process. The liquid flows out from the liquid supply mechanism 123 and flows through the side walls and bottom of the cleaning tank 121, thereby flushing away the residual sewage and stains after cleaning, achieving the effect of automatic cleaning of the cleaning tank 121. This arrangement allows the liquid supply mechanism 123 to clean the cleaning tank 121 during the liquid supply process, eliminating the need for additional cleaning devices and reducing the cost required for the base station 10.

[0046] In some embodiments, the drainage power unit 1222 is a centrifugal drainage pump, which allows the liquid to be discharged quickly as it is pumped from the cleaning tank 121 to the second chamber 114, and reduces the occurrence of solid blockage in the pipe.

[0047] In some embodiments, the base station 10 further includes a charging component 117 and a communication component 118, which are disposed on the placement component 11 and are at least partially exposed on the placement component 11. When the cleaning device 20 is placed on the placement component 11, the charging component 117 is used to charge the cleaning device 20, and the communication component 118 is used to communicate with the cleaning device 20 to enable the base station 10 and the cleaning device 20 to cooperate to complete various functions, including but not limited to cleaning the mop head 21, discharging sewage, and replenishing clean water.

[0048] In some embodiments, the placement component 11 includes a connection portion for connecting with a cleaning adapter, a first cavity 113 is formed in the connection portion, and the connection portion forms a third cavity 119 that is isolated from the first cavity 113, and a charging component 117 is disposed in the third cavity 119.

[0049] The third cavity 119 is isolated from the first cavity 113, so that during the process of the cleaning device 20 discharging liquid into the first cavity 113, the charging component 117 located in the third cavity 119 is protected from the liquid discharge, so as to protect the charging component 117, including the other electronic components of the base station 10, thereby ensuring the normal operation of the base station 10.

[0050] In some embodiments, the base station 10 has a liquid replenishment port 124 for communicating with the cleaning device 20 when the cleaning device 20 is placed on the placement component 11 and for replenishing liquid into the cleaning device 20.

[0051] In one embodiment, a replenishment port 124 is provided on the placement component 11 for replenishing the cleaning device 20 with the water required for cleaning.

[0052] This utility model also proposes a cleaning system, including a cleaning device 20 and a base station 10 as described in any of the above embodiments.

[0053] It should be understood that the terminology used in this specification is for the purpose of describing particular embodiments only and is not intended to limit the scope of the application. As used in this specification and the appended claims, the singular forms “a,” “an,” and “the” are intended to include the plural forms unless the context clearly indicates otherwise.

[0054] It should also be understood that the term "and / or" as used in this specification and the appended claims refers to any combination and all possible combinations of one or more of the associated listed items, and includes such combinations. It should be noted that, herein, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or system that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or system. Without further limitation, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or system that includes that element.

[0055] The sequence numbers of the embodiments in this application are for descriptive purposes only and do not represent the superiority or inferiority of the embodiments. The above descriptions are merely specific implementations of this application, but the scope of protection of this application is not limited thereto. Any person skilled in the art can easily conceive of various equivalent modifications or substitutions within the technical scope disclosed in this application, and these modifications or substitutions should all be covered within the scope of protection of this application. Therefore, the scope of protection of this application should be determined by the scope of the claims.

Claims

1. A base station for cleaning the tractor head of a cleaning equipment, characterized in that, The base station includes: A base, wherein a cleaning pool is formed on the base, and a draining mechanism is provided on the base, wherein the draining mechanism forms a first draining channel and is used to drain the cleaning pool so as to drain at least a portion of the liquid in the cleaning pool. The placement component has a placement position and a second drainage channel, and is provided with a first cavity, a second cavity and a switch structure. The first cavity is used to receive liquid discharged by the cleaning equipment when the cleaning equipment is placed in the placement position. The first cavity is connected to the second cavity through the switch structure so that the liquid carried in the first cavity can flow to the second cavity through the switch structure. The second cavity is connected to the first drainage channel and the second drainage channel. The drainage mechanism is further provided with a drainage power component, which is used to provide power for the liquid flow in the first drainage channel, so that at least part of the liquid in the cleaning tank is discharged into the second cavity through the first drainage channel, and the liquid in the second cavity can be discharged through the second drainage channel.

2. The base station as described in claim 1, characterized in that, The placement component is provided with a conductive component opposite to the placement position, and the first cavity is also formed with a liquid guide port. The conductive component is used to cooperate with the cleaning device when the cleaning device is placed in the placement position to introduce the liquid in the cleaning device into the first cavity through the liquid guide port.

3. The base station as described in claim 1, characterized in that, The input port of the first drainage channel is connected to the cleaning tank, and the output port of the first drainage channel is connected to the second cavity; The placement component further includes a baffle, which is disposed in the second cavity and is opposite to the output port of the first drainage channel.

4. The base station as described in claim 3, characterized in that, The switch structure allows unidirectional flow of liquid from the first cavity to the second cavity.

5. The base station as described in claim 1, characterized in that, The cleaning tank has an opening through which the mop head can enter the cleaning tank; The opening and the bottom of the cleaning pool away from the opening have a first distance L1. When the cleaning equipment is placed in the placement position, the top of the mop head near the opening and the bottom of the cleaning pool have a second distance L2. The first distance L1 and the second distance L2 satisfy that L2≤L1.

6. The base station as described in claim 1, characterized in that, The base includes a liquid supply mechanism disposed around the cleaning tank for supplying liquid to the cleaning tank, and the liquid supply mechanism is close to the opening of the cleaning tank so that at least a portion of the cleaning tank is rinsed during the liquid supply process.

7. The base station as described in claim 1, characterized in that, The drainage power component includes a centrifugal drainage pump.

8. The base station as described in claim 1, characterized in that, The base station also includes a charging component and a communication component, which are disposed on the placement component and at least partially exposed thereon. When the cleaning device is placed on the placement component, the communication component is used to interact with the cleaning device via signals, and the charging component is used to charge the cleaning device.

9. The base station as described in claim 8, characterized in that, The placement component includes a connection portion for connecting with a cleaning adapter, the first cavity is formed in the connection portion, and the connection portion forms a third cavity isolated from the first cavity, the charging component being disposed in the third cavity.

10. A cleaning system, characterized in that, The cleaning system includes: the cleaning equipment and the base station as described in any one of claims 1-9.

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