A semiconductor etching apparatus facilitating cleaning of etching solution

Abstract

The utility model discloses a kind of semiconductor etching equipment facilitating cleaning etching liquid, it is related to etching liquid recovery technical field, including etching machine main body, the lower end of etching machine main body is fixedly connected with bottom frame, the bottom of etching machine main body is connected with effluent pipe, the effluent pipe is through bottom frame and fixedly connected with barrel cover, the lower end of barrel cover is detachably connected with filter cartridge, the inside of filter cartridge is equipped with filter mechanism, the lower end of filter cartridge is equipped with the drive mechanism connected with filter mechanism. The utility model breaks through the limitation that traditional filter screen relies on manual cleaning by self-cleaning mechanism driven by centrifugal force, significantly reduces the frequency of downtime, greatly prolongs the interval time of filter piece each time to take out and clean, simultaneously avoids the etching liquid flow rate attenuation caused by filter pore blockage, guarantees long-term stability of filtration efficiency, and realizes overall quick disassembly, greatly shortens equipment maintenance cycle, reduces production line interruption time.

Description

Technical Field

[0001] This utility model relates to the field of etching solution recovery technology, and in particular to a semiconductor etching device that facilitates the cleaning of etching solution. Background Technology

[0002] In the semiconductor manufacturing industry, etching is a crucial process that directly determines the precision and quality of semiconductor chips. The etching solution, as a key medium in the etching process, has a decisive impact on the etching effect due to its stability and purity. During etching, the etching solution continuously reacts with the semiconductor material, generating a large number of impurity particles. If these impurities are not removed promptly and effectively, they will severely affect the flow rate and etching uniformity of the etching solution, thereby reducing etching precision and leading to a decrease in chip yield.

[0003] In traditional semiconductor etching equipment, the filtration of impurities in the etching solution mainly relies on the filter screen structure. However, this traditional filter screen has several significant drawbacks. First, traditional filter screens are usually flat, and impurities easily and quickly accumulate on their surface, causing blockage and affecting filtration. Furthermore, cleaning traditional filter screens typically requires manual operation. Operators have to frequently stop the machine to remove the filter screen for cleaning. This not only increases the labor intensity of workers but also severely impacts production efficiency due to frequent downtime. Therefore, there is a need to design a semiconductor etching equipment that facilitates the cleaning of the etching solution. Utility Model Content

[0004] The purpose of this invention is to address the shortcomings of existing technologies by proposing a semiconductor etching device that facilitates the cleaning of etching solutions.

[0005] To achieve the above objectives, the present invention adopts the following technical solution:

[0006] A semiconductor etching apparatus for easy cleaning of etching solution includes an etching machine body, a bottom frame fixedly connected to the lower end of the etching machine body, an outlet pipe connected to the bottom of the etching machine body, the outlet pipe passing through the bottom frame and fixedly connected to a cylinder cover, a filter cylinder detachably connected to the lower end of the cylinder cover, a filtration mechanism provided inside the filter cylinder, and a drive mechanism connected to the filtration mechanism provided at the lower end of the filter cylinder.

[0007] As a further improvement of this utility model, the cylinder cover is screwed onto the upper end of the filter cylinder.

[0008] As a further improvement of this utility model, the filtration mechanism includes a filter element disposed inside the filter cylinder, a surrounding cylinder fixedly connected to the side wall of the filter element, the filter element being cylindrical in shape and having a conical top structure, a connecting sleeve fixedly connected to the inner top wall of the filter element, and a slot provided at the lower end of the connecting sleeve.

[0009] As a further improvement of this utility model, the driving mechanism includes a rotating shaft that passes through the lower end of the filter cylinder. The rotating shaft is rotatably connected to the filter cylinder through a sealed bearing. A plug that mates with a slot is fixedly connected to the upper end of the rotating shaft. A motor is installed at the lower end of the filter cylinder, and the output shaft of the motor is fixedly connected to the lower end of the rotating shaft.

[0010] As a further improvement of this utility model, a storage box is provided on the inner bottom wall of the bottom frame, a connecting pipe is connected between the storage box and the filter cylinder, and a reuse pipe is connected to the side wall of the storage box.

[0011] As a further improvement of this utility model, a lifting ring is fixedly connected to the upper end of the filter element.

[0012] The beneficial effects of this utility model are:

[0013] Through a centrifugal force-driven self-cleaning mechanism, impurities are automatically thrown off the filter element surface and concentrated in the gap area between the filter element and the surrounding cylinder. This design breaks through the limitations of traditional filter screens that rely on manual cleaning, significantly reducing the frequency of downtime. This eliminates the need to frequently remove the filter element for operation, greatly extending the interval between each cleaning of the filter element. At the same time, it avoids the attenuation of the etching solution flow rate caused by the blockage of the filter pores, ensuring long-term stable filtration efficiency.

[0014] The threaded connection between the cover and the filter cartridge, along with the lifting ring on the top of the filter element, enables quick assembly and disassembly, significantly shortening the equipment maintenance cycle and reducing production line downtime. Attached Figure Description

[0015] Figure 1 This is a schematic diagram of the structure of a semiconductor etching device that facilitates the cleaning of etching solution according to this utility model;

[0016] Figure 2 This is a schematic diagram of the filter element, casing, and connecting sleeve of a semiconductor etching device that facilitates cleaning of etching solution, as proposed in this utility model.

[0017] Figure 3 This is a cross-sectional structural diagram of the filter element, casing, connecting sleeve, slot, and lifting ring of a semiconductor etching device that facilitates cleaning of etching solution, as proposed in this utility model.

[0018] Figure 4 This is a schematic diagram of the motor, shaft, and insert of a semiconductor etching device that facilitates cleaning of etching solution, as proposed in this utility model.

[0019] In the diagram: 1. Etching machine body, 2. Base frame, 3. Outflow pipe, 4. Cylinder cover, 5. Filter cylinder, 6. Motor, 7. Connecting pipe, 8. Storage box, 9. Reuse pipe, 10. Surrounding cylinder, 11. Filter element, 12. Connecting sleeve, 13. Slot, 14. Lifting ring, 15. Rotating shaft, 16. Insert block. Detailed Implementation

[0020] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present utility model. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments.

[0021] Reference Figures 1-4 A semiconductor etching device for easy cleaning of etching solution includes an etching machine body 1. A bottom frame 2 is fixedly connected to the lower end of the etching machine body 1. An outflow pipe 3 is connected to the bottom of the etching machine body 1. The outflow pipe 3 passes through the bottom frame 2 and is fixedly connected to a cylinder cover 4. A filter cylinder 5 is detachably connected to the lower end of the cylinder cover 4. The cylinder cover 4 is screwed to the upper end of the filter cylinder 5, which facilitates the separation of the filter cylinder 5 from the cylinder cover 4 and facilitates the cleaning of the inside of the filter cylinder 5. A filtration mechanism is provided inside the filter cylinder 5. The etching solution generated by the etching machine body 1 flows into the filter cylinder 5 through the outflow pipe 3. After filtration by the filtration mechanism, it enters the storage tank 8 through the connecting pipe 7 for storage. A drive mechanism connected to the filtration mechanism is provided at the lower end of the filter cylinder 5. The storage tank 8 is provided on the inner bottom wall of the bottom frame 2. A connecting pipe 7, which is a flexible hose, is connected between the storage tank 8 and the filter cylinder 5. A reuse pipe 9 is connected to the side wall of the storage tank 8. The etching machine body 1 is connected to the reuse pipe 9. The reuse pipe 9 can supply the filtration solution in the storage tank 8 to the etching machine body 1 for use.

[0022] In this utility model, the filtration mechanism includes a filter element 11 disposed inside the filter cylinder 5. A surrounding cylinder 10 is fixedly connected to the side wall of the filter element 11. The filter element 11 is cylindrical in shape, and the top of the filter element 11 is conical. A connecting sleeve 12 is fixedly connected to the inner top wall of the filter element 11. A slot 13 is provided at the lower end of the connecting sleeve 12. A lifting ring 14 is fixedly connected to the upper end of the filter element 11. The lifting ring 14 makes it easy to remove the filter element 11 from inside the filter cylinder 5 for cleaning or replacement.

[0023] The drive mechanism includes a rotating shaft 15 that passes through the lower end of the filter cylinder 5. The rotating shaft 15 is rotatably connected to the filter cylinder 5 through a sealed bearing. The upper end of the rotating shaft 15 is fixedly connected to a plug 16 that mates with a slot 13. A motor 6 is installed at the lower end of the filter cylinder 5. The output shaft of the motor 6 is fixedly connected to the lower end of the rotating shaft 15. By starting the motor 6, the rotating shaft 15 is driven to rotate. The rotating shaft 15 can drive the plug 16 and the connecting sleeve 12 to rotate, thereby driving the filter element 11 to rotate. By utilizing the centrifugal force, impurities on the filter element 11 can be thrown away to the edge, so that the impurities are between the edge of the filter element 11 and the surrounding cylinder 10, achieving a self-cleaning effect of the filter element 11. This eliminates the need to frequently remove the filter element 11 for operation, greatly extending the interval between each cleaning of the filter element 11.

[0024] In use, the etching solution produced by the etching machine body 1 flows into the interior of the filter cylinder 5 through the outflow pipe 3. The etching solution first contacts the top conical structure of the filter element 11 and flows downward. After being filtered by the filter element 11, it enters the area between the filter element 11 and the surrounding cylinder 10. The impurities trapped by the filter element 11 adhere to its surface. The filtered etching solution enters the storage tank 8 through the connecting pipe 7 for storage. The reuse pipe 9 transports the filtered etching solution in the storage tank 8 back to the etching machine body 1 for recycling. During the filtration process, the motor 6 is started to drive the rotating shaft 15 to rotate. The insert 16 at the upper end of the rotating shaft 15 is inserted into the slot 13 at the lower end of the connecting sleeve 12 to drive the connecting sleeve 12 to rotate, thereby driving the entire filter element 11 to rotate. Through centrifugal force, the impurities attached to the surface of the filter element 11 are thrown to the area between the edge of the filter element 11 and the surrounding cylinder 10, realizing the self-cleaning of the filter element 11. When deep cleaning or replacement is required, the screw connection between the cylinder cover 4 and the filter cylinder 5 can be separated, and the filter element 11 can be taken out from the inside of the filter cylinder 5 through the lifting ring 14 for operation.

[0025] The above are merely preferred embodiments of this utility model, but the scope of protection of this utility model is not limited thereto. Any equivalent substitutions or modifications made by those skilled in the art within the scope of the technology disclosed in this utility model, based on the technical solution and inventive concept of this utility model, should be included within the scope of protection of this utility model.

Claims

1. A semiconductor etching apparatus for easy cleaning of etching solution, comprising an etching machine body (1), characterized in that, The lower end of the etching machine body (1) is fixedly connected to a bottom frame (2). The bottom of the etching machine body (1) is connected to an outlet pipe (3). The outlet pipe (3) passes through the bottom frame (2) and is fixedly connected to a cylinder cover (4). The lower end of the cylinder cover (4) is detachably connected to a filter cylinder (5). The filter cylinder (5) is equipped with a filter mechanism inside. The lower end of the filter cylinder (5) is equipped with a drive mechanism connected to the filter mechanism.

2. The semiconductor etching apparatus for easy cleaning of etching solution according to claim 1, characterized in that, The cap (4) is screwed onto the upper end of the filter cylinder (5).

3. The semiconductor etching apparatus for easy cleaning of etching solution according to claim 1, characterized in that, The filtration mechanism includes a filter element (11) disposed inside the filter cylinder (5). A surrounding cylinder (10) is fixedly connected to the side wall of the filter element (11). The filter element (11) is cylindrical in shape, and the top of the filter element (11) is conical. A connecting sleeve (12) is fixedly connected to the inner top wall of the filter element (11). The lower end of the connecting sleeve (12) is provided with a slot (13).

4. A semiconductor etching apparatus for easy cleaning of etching solution according to claim 3, characterized in that, The drive mechanism includes a rotating shaft (15) that passes through the lower end of the filter cylinder (5). The rotating shaft (15) is rotatably connected to the filter cylinder (5) through a sealed bearing. The upper end of the rotating shaft (15) is fixedly connected to a plug (16) that mates with a slot (13). The lower end of the filter cylinder (5) is equipped with a motor (6), and the output shaft of the motor (6) is fixedly connected to the lower end of the rotating shaft (15).

5. A semiconductor etching apparatus for easy cleaning of etching solution according to claim 1, characterized in that, A storage box (8) is provided on the inner bottom wall of the bottom frame (2), and a connecting pipe (7) is connected between the storage box (8) and the filter cylinder (5). A reuse pipe (9) is connected to the side wall of the storage box (8).

6. A semiconductor etching apparatus for easy cleaning of etching solution according to claim 3, characterized in that, The upper end of the filter element (11) is fixedly connected to a lifting ring (14).

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