A device for removing mechanical impurities from m-trifluoromethylacetophenone
Patent Information
- Application Number
- CN202522309305.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-10-31
- Publication Date
- 2026-09-25
- Estimated Expiration
- 2035-10-31
AI Technical Summary
[0005]针对上述现有技术,本实用新型要解决的技术问题是现有设备原料过滤环节中缺乏有效预处理,其内磁性杂质随原料在罐内流动时,会因设备运行产生的振动和液体冲刷不断撞击罐壁与内部构件,长期作用下造成罐内磨损,不仅缩短设备使用寿命,还可能因磨损产生新的碎屑,形成二次污染,且需频繁停机清理,影响生产连续性
[0014]综上,本方案中设备启动后,间三氟甲基苯乙酮原料首先进入除杂设备罐中并贯穿辅助进液组件的注液搅液管道,辅助进液组件的螺旋导流叶片杆可搅拌原料,打破杂质团聚体,使原料均匀流入预处理组件,提升后续处理效果,预处理组件的环形电性导轨驱动联动强磁外部条杆,带动内部金属层环动圈转动,配合多组旋转交错的电性磁棒形成动态磁场网,全面吸附铁磁性杂质,提高杂质分离效率,降低罐内磨损以及停机风险,设备组件的粗过滤仓拦截较大颗粒杂质,细过滤仓通过多级滤芯清除细微杂质,超声波过滤仓完成深度过滤,确保产品纯度,各组件协同运作,实现从原料预处理到深度过滤的连续流程,减少人工干预,提升生产效率,同时杂质可通过辅助杂质下料组件及时排出,避免堆积影响设备运行,整体装置结构合理,适用范围广,能满足高质量生产需求。
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Figure CN224793039U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to a device for removing mechanical impurities, and more particularly to a device for removing mechanical impurities from m-trifluoromethylacetophenone, which is applied in the field of impurity removal devices. Background Technology
[0002] The device for removing mechanical impurities from m-trifluoromethylacetophenone integrates various physical separation methods such as sedimentation, filtration, and centrifugation. Based on the differences in physical properties such as density and particle size between mechanical impurities and m-trifluoromethylacetophenone, it achieves efficient separation of the two.
[0003] Chinese patent CN218320839U discloses a device for removing mechanical impurities from steam condensate. This invention obtains condensate free of mechanical impurities through strong magnetic adsorption and filtration, thereby improving the purification effect of condensate. The purification of condensate makes it recyclable, thus improving the utilization rate of condensate.
[0004] The existing equipment lacks effective pretreatment in the raw material filtration process. When the magnetic impurities flow with the raw materials in the tank, they will continuously impact the tank wall and internal components due to the vibration generated by the operation of the equipment and the scouring of the liquid. Over time, this will cause wear inside the tank, which will not only shorten the service life of the equipment, but may also generate new debris due to wear, resulting in secondary pollution. In addition, it requires frequent shutdowns for cleaning, which will affect the continuity of production. Utility Model Content
[0005] The technical problem that this utility model aims to solve in view of the above-mentioned prior art is that the existing equipment lacks effective pretreatment in the raw material filtration process. When the magnetic impurities in the tank flow with the raw materials, they will continuously impact the tank wall and internal components due to the vibration generated by the operation of the equipment and the scouring of the liquid. Under long-term action, this will cause wear inside the tank, which will not only shorten the service life of the equipment, but may also generate new debris due to wear, resulting in secondary pollution. In addition, it requires frequent shutdowns for cleaning, which will affect the continuity of production.
[0006] To address the aforementioned problems, this utility model provides a device for removing mechanical impurities from m-trifluoromethylacetophenone, comprising an equipment assembly. A pretreatment assembly is located on the upper inner side of the equipment assembly, an auxiliary liquid inlet assembly is located on the left side of the pretreatment assembly, and an auxiliary impurity discharge assembly is located below the pretreatment assembly. The equipment assembly includes a purification tank, with a coarse filtration chamber fixedly connected to its upper end, a fine filtration chamber fixedly connected to its lower end, and an ultrasonic filtration chamber fixedly connected to its lower end. The pretreatment assembly includes a double-layered outer jacketed tube located within the coarse filtration chamber. An injection pipe communicating with the coarse filtration chamber is fixedly connected to the inner end of the double-layered outer jacketed tube. Two annular electrical guide rails are fixedly connected to the inner end of the double-layered outer jacketed tube, and a linkage strong magnetic external bar is installed at the output end of the two annular electrical guide rails. Multiple internal metal layer rotating rings are rotatably connected to the inner end of the injection pipe, and multiple sets of electric magnetic rods are fixedly connected to the inner end of the internal metal layer rotating rings.
[0007] In the aforementioned apparatus for removing mechanical impurities from m-trifluoromethyl acetophenone, this solution can efficiently remove mechanical impurities from m-trifluoromethyl acetophenone. The annular electric guide rail of the pretreatment component drives the strong magnetic external bar to fully adsorb ferromagnetic impurities, thereby improving impurity separation efficiency and reducing wear inside the tank and the risk of downtime.
[0008] As a further improvement of this application, multiple internal metal layer rings are arranged horizontally in sequence, and multiple sets of electric magnetic rods are arranged in a rotating and staggered manner.
[0009] As a further improvement to this application, the linkage strong magnetic outer bar and multiple internal metal layer rings are magnetically connected, and the auxiliary liquid inlet assembly includes a liquid injection and stirring pipe.
[0010] As a further improvement of this application, the liquid injection and stirring pipe is fixedly connected to the left side of the liquid injection pipe, and a spiral guide vane rod is fixedly connected to the inner end of the liquid injection and stirring pipe.
[0011] As another improvement of this application, the spiral guide vane rod is located on the left side of multiple internal metal layer rings, and the auxiliary impurity discharge assembly includes a vertical impurity discharge pipe.
[0012] As another improvement of this application, the vertical impurity outlet tube is fixedly connected below multiple internal metal layer rings, and the lower inner wall of the injection pipe is fixedly connected with a horizontal matching strip, and the upper end of the horizontal matching strip is fixedly connected with an infrared adhering substance sensor.
[0013] As another improvement of this application, multiple infrared attachment sensors are located directly below the corresponding internal metal layer circulator, and solenoid valve blocks are fixedly connected to the upper end of the vertical impurity outlet pipe and the right end of the liquid injection pipe.
[0014] In summary, after the equipment starts up, the m-trifluoromethyl acetophenone raw material first enters the impurity removal tank and passes through the injection and stirring pipe of the auxiliary liquid inlet component. The spiral guide vane rod of the auxiliary liquid inlet component can stir the raw material, break up impurity agglomerates, and make the raw material flow evenly into the pretreatment component, improving the subsequent treatment effect. The annular electric guide rail of the pretreatment component drives the linkage strong magnetic external bar rod, which drives the internal metal layer ring to rotate. With the help of multiple sets of rotating and interlaced electric magnetic rods, a dynamic magnetic field network is formed to comprehensively adsorb ferromagnetic impurities, improve impurity separation efficiency, reduce wear inside the tank and the risk of downtime. The coarse filtration chamber of the equipment components intercepts larger particulate impurities, the fine filtration chamber removes fine impurities through multi-stage filter elements, and the ultrasonic filtration chamber completes deep filtration to ensure product purity. All components work together to realize a continuous process from raw material pretreatment to deep filtration, reduce manual intervention, and improve production efficiency. At the same time, impurities can be discharged in time through the auxiliary impurity discharge component to avoid accumulation and affect equipment operation. The overall device has a reasonable structure, a wide range of applications, and can meet the needs of high-quality production. Attached Figure Description
[0015] Figure 1 This is an isometric view of the device assembly according to the first embodiment of this application; Figure 2 This is a structural diagram of the preprocessing component according to the first embodiment of this application; Figure 3 This is a structural diagram of the injection pipeline according to the first embodiment of this application; Figure 4 This is a structural diagram of the liquid injection and stirring pipeline according to the first embodiment of this application; Figure 5 This is a structural diagram showing the installation state of multiple internal metal layer rings in the first embodiment of this application; Figure 6 This is a structural diagram of a single internal metal layer ring in the first embodiment of this application; Figure 7 This is a structural diagram of the auxiliary impurity feeding component according to the second embodiment of this application.
[0016] Explanation of the labels in the diagram: 1. Equipment Components; 100. Impurity Removal Tank; 101. Coarse Filtration Chamber; 102. Fine Filtration Chamber; 103. Ultrasonic Filtration Chamber; 2. Pretreatment Components; 200. Liquid Injection Pipe; 201. Double-Layer External Jacket Pipe; 202. Annular Electrical Guide Rail; 203. Linked Strong Magnetic External Bar; 204. Internal Metal Layer Circulating Ring; 205. Electrical Magnetic Rod; 3. Auxiliary Liquid Inlet Components; 300. Liquid Injection and Stirring Pipe; 301. Spiral Guide Blade Rod; 4. Auxiliary Impurity Discharge Components; 400. Solenoid Valve Block; 401. Vertical Impurity Discharge Pipe; 402. Horizontal Matching Bar; 403. Infrared Adhesion Sensor. Detailed Implementation
[0017] The two embodiments of this application will be described in detail below with reference to the accompanying drawings.
[0018] First implementation method: Figures 1-6 An apparatus for removing mechanical impurities from m-trifluoromethylacetophenone is shown. It includes a device assembly 1, a pretreatment assembly 2 located on the upper inner side of the device assembly 1, an auxiliary liquid inlet assembly 3 located on the left side of the pretreatment assembly 2, and an auxiliary impurity discharge assembly 4 located below the pretreatment assembly 2. The device assembly 1 includes a removal tank 100, a coarse filter chamber 101 fixedly connected to the upper end of the removal tank 100, a fine filter chamber 102 fixedly connected to the lower end of the coarse filter chamber 101, a fine filter chamber 102 fixedly connected to the lower end of the fine filter chamber 102, and an ultrasonic filter chamber 103 fixedly connected to the lower end of the fine filter chamber 102. The pretreatment assembly 2 includes a double-layered outer clamp. The double-layered outer jacketed tube 201 is located inside the coarse filtration chamber 101. The inner end of the double-layered outer jacketed tube 201 is fixedly connected to a liquid injection pipe 200 that communicates with the coarse filtration chamber 101. The inner end of the double-layered outer jacketed tube 201 is fixedly connected to two annular electric guide rails 202, which can be HGR20 type annular linear guide rails. The output ends of the two annular electric guide rails 202 are equipped with linkage strong magnetic external bars 203. The inner end of the liquid injection pipe 200 is rotatably connected to multiple internal metal layer rings 204. The inner end of the internal metal layer rings 204 is fixedly connected to multiple sets of electric magnetic rods 205, which can be rare earth permanent magnet rods with a diameter of 15mm.
[0019] Multiple internal metal layer rings 204 are arranged horizontally in sequence, and multiple sets of electric magnetic rods 205 are arranged in a rotating and staggered manner. The linkage strong magnetic outer bar 203 and multiple internal metal layer rings 204 are magnetically connected.
[0020] The auxiliary liquid inlet assembly 3 includes a liquid injection and stirring pipe 300, which is fixedly connected to the left side of the liquid injection pipe 200. A spiral guide vane rod 301 is fixedly connected to the inner end of the liquid injection and stirring pipe 300. The spiral guide vane rod 301 is located on the left side of multiple internal metal layer rings 204.
[0021] Figures 1-6The diagram shows that after the equipment is started, the raw material of m-trifluoromethyl acetophenone first enters the impurity removal equipment tank 100 and passes through the liquid injection and stirring pipe 300 of the auxiliary liquid inlet component 3. The fixed spiral guide vane rod 301 inside the pipe has a continuous spiral structure. When the raw material flows through, it is cut and diverted by the vane and pushed along the spiral trajectory. This not only breaks up any impurity agglomerates that may exist in the raw material, but also makes the raw material flow rate uniform and stable, avoiding uneven distribution of impurities caused by local turbulence. Since the spiral guide vane rod 301 is located on the left side of the multiple internal metal layer rings 204, the raw material after stirring can enter the liquid injection pipe 200 of the pretreatment component 2 in a stable state, creating uniform material conditions for subsequent impurity adsorption.
[0022] After the raw material enters the injection pipe 200, the pretreatment component 2 starts to work. The double-layered outer jacket pipe 201 serves as a support structure. The two annular electric guide rails 202 inside the pipe are energized to generate a driving magnetic field, which drives the linkage strong magnetic external bar 203 installed at the output end to move along the annular trajectory. Because the linkage strong magnetic external bar 203 is magnetically coupled with multiple internal metal layer annular rings 204, the horizontally arranged internal metal layer annular rings 204 rotate synchronously in the injection pipe 200. The rotation speed can be adjusted by the current of the annular electric guide rail 202. At this time, multiple sets of electric magnetic rods 205 fixed at the inner end of the internal metal layer annular rings 204 rotate with the annular rings. The sets of magnetic rods are arranged in a staggered rotation, with the angle between adjacent sets of magnetic rods being 30 degrees. A dynamic staggered magnetic field network is formed in the pipe. Ferromagnetic mechanical impurities in the raw material, such as iron filings and magnetic metal particles, are adsorbed onto the surface of the electric magnetic rods 205 under the action of the magnetic field force, while non-magnetic impurities continue to flow under the push of the raw material, achieving preliminary separation and reducing wear inside the tank and the risk of downtime.
[0023] The pretreated raw material enters the impurity removal equipment tank 100 through the connection between the liquid injection pipe 200 and the coarse filtration chamber 101 in the equipment component 1. It is first initially filtered by the coarse filtration chamber 101, and then flows into the fine filtration chamber 102 at the lower end. The multi-stage setting of the fine filtration chamber 102 further intercepts fine impurities. Finally, it enters the ultrasonic filtration chamber 103 to complete deep filtration. The ultrasonic filtration chamber 103 is equipped with a 28kHz ultrasonic generator, which can generate high-frequency vibration to assist filtration, so that fine impurities are removed from the liquid and the filtration accuracy is improved.
[0024] Second implementation method: Figure 2 , Figure 7This invention discloses an apparatus for removing mechanical impurities from m-trifluoromethylacetophenone. The auxiliary impurity discharge assembly 4 includes a vertical impurity discharge pipe 401, which is fixedly connected below multiple internal metal-layered annular rings 204. A transverse matching strip 402 is fixedly connected to the lower inner wall of the injection pipe 200. An infrared adhering substance sensor 403 is fixedly connected to the upper end of the transverse matching strip 402. An E3F-DS30C4 type diffuse reflection infrared sensor can be used. When the infrared adhering substance sensor 403 detects an impurity accumulation ≥5mm, it automatically triggers the solenoid valve block 400. When the impurity removal program is started, the solenoid valve block 400 at the upper end of the vertical impurity discharge pipe 401 of the auxiliary impurity discharge component 4 opens, the solenoid valve block 400 at the right end of the liquid injection pipe 200 closes, the linkage strong magnetic external bar 203 is de-energized, and the impurities slide into the vertical impurity discharge pipe 401 along the horizontal matching bar 402 and are discharged, completing the impurity cleaning. After the cleaning is completed, the solenoid valve block 400 resets, and the device continues to operate. It can be used as an optional accessory for scenarios with high requirements for the timeliness of impurity cleaning, and is suitable for situations with large fluctuations in impurity content. It can flexibly deal with the situation of sudden increase in impurities and prevent impurities from accumulating and affecting the filtration effect.
[0025] In light of current practical needs, the above-described embodiments adopted in this application are not limited to these. Any changes made within the scope of knowledge possessed by those skilled in the art without departing from the concept of this application still fall within the protection scope of this utility model.
Claims
1. An apparatus for removing mechanical impurities from m-trifluoromethylacetophenone, characterized in that: The device includes a device assembly (1), a pretreatment assembly (2) on the upper inner side of the device assembly (1), an auxiliary liquid inlet assembly (3) on the left side of the pretreatment assembly (2), and an auxiliary impurity discharge assembly (4) below the pretreatment assembly (2). The device assembly (1) includes a purification tank (100), a coarse filter chamber (101) fixedly connected to the upper end of the purification tank (100), a fine filter chamber (102) fixedly connected to the lower end of the coarse filter chamber (101), a fine filter chamber (102) fixedly connected to the lower end of the fine filter chamber (102), and an ultrasonic filter chamber (103) fixedly connected to the lower end of the fine filter chamber (102). Component (2) includes a double-layered outer jacketed tube (201), which is located inside the coarse filtration chamber (101). The inner end of the double-layered outer jacketed tube (201) is fixedly connected to a liquid injection pipe (200) that communicates with the coarse filtration chamber (101). The inner end of the double-layered outer jacketed tube (201) is fixedly connected to two annular electric guide rails (202). The output ends of the two annular electric guide rails (202) are equipped with linkage strong magnetic external bars (203). The inner end of the liquid injection pipe (200) is rotatably connected to multiple internal metal layer rings (204). The inner end of the internal metal layer rings (204) is fixedly connected to multiple sets of electric magnetic rods (205).
2. The apparatus for removing mechanical impurities from m-trifluoromethylacetophenone according to claim 1, characterized in that: The multiple internal metal layer rings (204) are arranged horizontally in sequence, and the multiple sets of electric magnetic rods (205) are arranged in a rotating and staggered manner.
3. The apparatus for removing mechanical impurities from m-trifluoromethylacetophenone according to claim 1, characterized in that: The linkage strong magnetic outer bar (203) and multiple internal metal layer rings (204) are magnetically connected, and the auxiliary liquid inlet assembly (3) includes a liquid injection and stirring pipe (300).
4. The apparatus for removing mechanical impurities from m-trifluoromethylacetophenone according to claim 3, characterized in that: The liquid injection and stirring pipe (300) is fixedly connected to the left side of the liquid injection pipe (200), and a spiral guide vane rod (301) is fixedly connected to the inner end of the liquid injection and stirring pipe (300).
5. The apparatus for removing mechanical impurities from m-trifluoromethylacetophenone according to claim 4, characterized in that: The spiral guide vane rod (301) is located on the left side of multiple internal metal layer rings (204), and the auxiliary impurity discharge assembly (4) includes a vertical impurity discharge pipe (401).
6. The apparatus for removing mechanical impurities from m-trifluoromethylacetophenone according to claim 5, characterized in that: The vertical impurity outlet tube (401) is fixedly connected below multiple internal metal layer rings (204), and a horizontal matching strip (402) is fixedly connected to the lower inner wall of the liquid injection pipe (200). An infrared adhering object sensor (403) is fixedly connected to the upper end of the horizontal matching strip (402).
7. The apparatus for removing mechanical impurities from m-trifluoromethylacetophenone according to claim 6, characterized in that: Multiple infrared adhering object sensors (403) are located directly below the corresponding internal metal layer ring (204), and electromagnetic valve blocks (400) are fixedly connected to the upper end of the vertical impurity outlet pipe (401) and the right end of the liquid injection pipe (200).
Citation Information
Patent Citations
Device for removing mechanical impurities in condensate water
CN218320839U