Air purifier for HVPE wafer taking cabin

Abstract

The utility model discloses an air purifier for HVPE piece taking cabin, include: rectangular frame (1), side panel (2), the side panel installs at three sides of rectangular frame, and the clearance is left between side panel and ground, curtain (3), the curtain installs at another side of rectangular frame, HVPE piece taking cabin window (4), the HVPE piece taking cabin window is set up on a side panel for the HVPE piece taking cabin and is used for extending into rectangular frame, FFU fan (5), the FFU fan is established at the top of rectangular frame, filter core (6), the filter core is installed between FFU fan and the top of rectangular frame. The utility model has the beneficial effect that the technical demand of the cleanliness aspect when promoting up and down piece operation is improved, to improve gallium nitride wafer growth quality, and when the cover is opened, the produced particle is avoided to contaminate wafer piece, to satisfy the long piece need of higher requirement.

Description

Technical Field

[0001] This utility model relates to the field of gallium nitride production technology, and in particular to an air purifier for HVPE wafer handling chambers. Background Technology

[0002] The main principle of HVPE growth of nitrides is as follows: using metallic gallium as the group III gallium source, ammonia (NH3) as the group V nitrogen source, and hydrogen chloride (HCl) as the reactant gas, carried by a carrier gas (hydrogen or nitrogen), the gas passes through a gallium boat and reacts chemically with the metallic gallium to generate gallium chloride (GaCl). Then, carried by the carrier gas (hydrogen or nitrogen), it reacts with NH3 above the substrate to generate GaN, which is then deposited on the substrate. Hydride vapor phase epitaxy equipment is a compound growth process equipment, mainly used to epitaxially grow a thick film or crystal such as GaAs or GaN on the substrate surface in a high-temperature environment using hydride gases such as H2 and HCl. Because gallium nitride substrate wafers require a process when being picked up and placed into the HVPE equipment cavity (removed from the wafer box and placed into the wafer picking chamber of the HVPE equipment), as disclosed in the exhaust device for HVPE equipment for GaN growth disclosed in Chinese Utility Model Patent Publication No. CN222024560U, which discloses a wafer picking chamber (equivalent to a wafer picking compartment), particulate contamination can easily occur during this process, causing the wafers to be scrapped due to particulate contamination.

[0003] Chinese invention patent publication CN120720675A discloses an air filter for removing formaldehyde dust indoors, comprising a housing, an inlet pipe fixedly connected to one end of the housing, an outlet pipe fixedly connected to the other end of the housing, a filter screen fixedly connected to the end of the housing near the inlet pipe, and a modified activated carbon filter element fixedly connected to the end of the housing near the outlet pipe. A protective box is fixedly connected to the top of the housing, and a motor is fixedly installed inside the protective box. A suction mechanism is provided on one side of the filter screen to draw outside air into the housing in conjunction with the motor's activation. A guide mechanism is provided on one side of the modified activated carbon filter element to evenly direct air towards the filter element in conjunction with the motor's activation. However, this filter is not suitable for HVPE (High-Voltage, High-Pressure) filter elements. Utility Model Content

[0004] The technical problem to be solved by this invention is that existing HVPE wafers are easily contaminated by exposure to the external environment during wafer retrieval. To address this, an air purifier for HVPE wafer retrieval chambers is provided.

[0005] The technical solution of this utility model is: an air purifier for an HVPE film collection chamber, comprising: a rectangular frame; side panels, the side panels being installed on three sides of the rectangular frame, with gaps between the side panels and the ground; a curtain, the curtain being installed on another side of the rectangular frame; an HVPE film collection chamber window, the HVPE film collection chamber window being opened on a side panel for allowing the HVPE film collection chamber to extend into the rectangular frame; an FFU fan, the FFU fan being located at the top of the rectangular frame; and a filter element, the filter element being installed between the FFU fan and the top of the rectangular frame.

[0006] The improvement to the above solution is that a sealing ring is provided between the connection surface of the filter element and the FFU fan.

[0007] A further improvement to the above solution is that an opening is provided at the bottom of a side panel opposite to the curtain, and the curtain is installed inside the opening.

[0008] A further improvement to the above solution is that baffles are installed at the four corners of the filter element and the FFU fan.

[0009] Another improvement to the above solution is that a silicone pad is fitted between the baffle, the filter element, and the FFU fan.

[0010] Another improvement to the above scheme is that the bottom four corners of the rectangular frame are equipped with casters.

[0011] The side panel described in the above scheme is an acrylic sheet.

[0012] The beneficial effects of this invention are to improve the technical requirements for cleanliness during wafer loading and unloading operations, thereby improving the growth quality of gallium nitride wafers, and to prevent the generated particles from contaminating the wafers during wafer unloading, so as to meet the needs of longer wafers with higher requirements. Attached Figure Description

[0013] Figure 1 This is a schematic diagram of the present invention; In the diagram, 1. Rectangular frame, 2. Side panel, 3. Curtain, 4. HVPE film pick-up compartment window, 5. FFU fan, 6. Filter element, 7. Sealing ring, 8. Baffle, 9. Casters. Detailed Implementation

[0014] The technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this utility model, and not all of them. Based on the embodiments of this utility model, all other embodiments implemented by those skilled in the art without creative effort are within the protection scope of this utility model.

[0015] like Figure 1As shown, this utility model includes: a rectangular frame 1; side panels 2, which are installed on three sides of the rectangular frame, with gaps between the side panels and the ground; a curtain 3, which is installed on the other side of the rectangular frame; an HVPE film collection chamber window 4, which is opened on a side panel for the HVPE film collection chamber to extend into the rectangular frame; an FFU fan 5, which is located at the top of the rectangular frame; and a filter element 6, which is installed between the FFU fan and the top of the rectangular frame.

[0016] The rectangular frame, three side panels, and curtain form a relatively enclosed space. When it is necessary to retrieve films from the upper and lower parts of the screen, this utility model is moved next to the HVPE equipment, so that the HVPE film retrieval chamber extends into the rectangular frame from the HVPE film retrieval chamber window. The FFU fan is then activated to draw in outside air, which is filtered by the filter element and enters the relatively enclosed space. Finally, the air flows away from the gap between the side panel and the ground. This utility model can achieve a Class 100 environment, eliminating the need to place the HVPE equipment in a Class 100 production workshop or to upgrade a Class 1 million cleanroom to a Class 100 production workshop, thus greatly saving on upgrade costs.

[0017] In a preferred embodiment of this invention, a sealing ring 7 is provided between the connection surface of the filter element and the FFU fan. The sealing ring can prevent the intake air from escaping from the gap between the connection surface of the filter element and the FFU fan.

[0018] As a preferred embodiment of this utility model, an opening is provided at the bottom of one side panel opposite to the curtain, and the curtain is installed in the opening, which increases the operating space and allows access to the rectangular frame from both sides.

[0019] In a preferred embodiment of this invention, baffles 8 are installed at the four corners of the filter element and the FFU fan. When the FFU fan starts, vibration occurs; to prevent relative displacement between the filter element and the rectangular frame, the baffles restrict their relative movement. More preferably, a silicone pad is fitted between the baffle and the filter element and the FFU fan as a damping buffer to absorb vibration.

[0020] As a preferred embodiment of this utility model, the bottom four corners of the rectangular frame are equipped with casters 9, which facilitate flexible movement to the designated workstation. The casters are preferably omnidirectional casters.

[0021] The rectangular frame of this utility model can be made of aluminum profile, which is lightweight and sturdy. The side panel is made of acrylic sheet, which has good transparency and allows observation of the interior of the rectangular frame.

[0022] The above embodiments can be combined arbitrarily as needed, and as long as the resulting solutions do not conflict, they all fall within the protection scope of this utility model.

Claims

1. An air purifier for HVPE film handling chamber, characterized by: include: A rectangular frame (1); side panels (2), wherein the side panels are installed on three sides of the rectangular frame and a gap is left between the side panels and the ground; A curtain (3) is installed on the other side of the rectangular frame; an HVPE film collection chamber window (4) is opened on a side panel for the HVPE film collection chamber to extend into the rectangular frame; an FFU fan (5) is located at the top of the rectangular frame; and a filter element (6) is installed between the FFU fan and the top of the rectangular frame.

2. The air purifier for the HVPE film collection chamber as described in claim 1, characterized in that: A sealing ring (7) is provided between the filter element and the FFU fan connection surface.

3. The air purifier for the HVPE film collection chamber as described in claim 1, characterized in that: An opening is provided at the bottom of one side panel opposite to the curtain, and the curtain is installed inside the opening.

4. The air purifier for the HVPE film collection chamber as described in claim 1, characterized in that: The filter element and the FFU fan are equipped with baffles (8) at the four corners.

5. The air purifier for the HVPE film collection chamber as described in claim 4, characterized in that: A silicone pad is fitted between the baffle, the filter element, and the FFU fan.

6. The air purifier for the HVPE film collection chamber as described in claim 1, characterized in that: The rectangular frame is equipped with four casters (9) at the bottom corners.

7. The air purifier for the HVPE film collection chamber as described in claim 1, characterized in that: The side panel is made of acrylic sheet.

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