A high pressure spray type thick photoresist removing device for fine lines

Abstract

The utility model discloses a high pressure spray formula thick photoresist removal device for thin line, related thick photoresist removal technical field, including water tank, the top of water tank is provided with water mist removal mechanism, and water mist removal mechanism includes support frame, and the top of water tank is provided with support frame, and the bottom of support frame is provided with guide rail, and the bottom of guide rail is provided with support plate. The utility model discloses a water mist removal mechanism's setting can reach the action of the water mist produced during working removal, in the use, through starting first motor and demister, drive demister to remove the water mist of water tank one side, can avoid because the water mist is difficult to remove, and the water mist is produced when spraying more, and the water mist will be the line of sight of staff blocked, makes staff unable to grasp the removal progress and situation, and then possibly need to interrupt the spraying process to grasp the situation of work progress appears, guarantees the practicality of this thick photoresist removal device.

Description

Technical Field

[0001] This utility model relates to the field of thick photoresist removal technology, specifically a high-pressure spray-type thick photoresist removal device for fine lines. Background Technology

[0002] In large-scale integrated circuit manufacturing, wafer cleaning is a crucial process. With the increasing integration of devices, the requirements for contamination control are also higher. Cleaning must not only remove particulate and chemical contaminants without damaging the wafer surface, but also be safe, simple, economical, and environmentally friendly. Liquid jet cleaning is a commonly used method that uses high-pressure jet cleaning liquid onto the wafer surface to remove particles and photoresist.

[0003] Most currently used thick photoresist removal devices have difficulty removing the water mist generated during the spraying process. If the water mist is difficult to remove, it will result in a large amount of water mist being generated during spraying, which will obstruct the operator's vision and make it impossible for the operator to grasp the removal progress and situation. This may lead to the need to interrupt the spraying process to monitor the work progress, making the thick photoresist removal device less practical. Utility Model Content

[0004] The purpose of this invention is to provide a high-voltage spray-type thick photoresist removal device for thin lines, so as to solve the problems raised in the prior art.

[0005] To achieve the above objectives, this utility model provides the following technical solution: a high-pressure spray-type thick photoresist removal device for thin lines, comprising a water tank, a demisting mechanism on the top of the water tank, the demisting mechanism comprising a support frame, a guide rail on the bottom of the support frame, a support plate on the bottom of the guide rail, one side of the support plate being fixedly connected to one side of the water tank, and a lifting plate on the outside of the guide rail.

[0006] As a preferred technical solution, a fixing block is provided on one side of the lifting plate, a first support plate is provided on one side of the water tank, and a first motor is provided on the top of the first support plate.

[0007] As a preferred technical solution, the output shaft of the first motor is connected to the first motor shaft via a coupling, and a rotating plate is provided at one end of the first motor shaft.

[0008] As a preferred technical solution, a moving rod is provided on one side of the rotating plate, and a connecting plate is provided at one end of the lifting plate.

[0009] As a preferred technical solution, a demister is provided on one side of the connecting plate, and a suction nozzle is provided on one side of the demister.

[0010] As a preferred technical solution, the top of the water tank is provided with a cover plate, the top of the cover plate is provided with a handle, the top of the water tank is provided with a pump body, the top of the pump body is provided with a water supply pipe, and the bottom of the water supply pipe is provided with a nozzle.

[0011] As a preferred technical solution, a stirring mechanism is provided on the other side of the water tank, and the stirring mechanism includes a second support plate.

[0012] As a preferred technical solution, a second motor is provided on the top of the second tray, the output shaft of the second motor is connected to a second motor shaft through a coupling, the outer wall of the second motor shaft is connected through to the other side of the water tank, and a stirring blade is provided on the outer wall of the second motor shaft.

[0013] Compared with the prior art, the beneficial effects of this utility model are: 1. This utility model, through the setting of a demisting mechanism, can remove the water mist generated during operation. In use, by starting the first motor and the demisting device, the demisting device is driven to remove the water mist on one side of the water tank. This can avoid the situation where the water mist is difficult to remove, resulting in a large amount of water mist during spraying, which would obstruct the operator's vision and prevent the operator from monitoring the removal progress and situation. This could lead to the need to interrupt the spraying process to monitor the work progress, thus ensuring the practicality of the thick light-blocking removal device.

[0014] 2. This utility model, through the setting of the stirring mechanism, can achieve the function of stirring the liquid inside the water tank. During use, by starting the second motor to drive the stirring blade to rotate, the stirring blade stirs the liquid inside the water tank. This can avoid the situation where the light resist remover remains still for a long time due to the difficulty in stirring the liquid inside the water tank, causing the components to separate and settle, or causing excessive local dissolution of light resist and a decrease in concentration, resulting in different concentrations of light resist remover in different areas, thus affecting the light resist removal effect. This ensures the working effect of the device. Attached Figure Description

[0015] Figure 1 This is a three-dimensional structural diagram of the present utility model; Figure 2 This is a schematic diagram of the water mist removal mechanism of this utility model; Figure 3 This is a schematic diagram of the connection structure between the rotating plate and the moving rod of this utility model; Figure 4 This is a schematic diagram of the stirring mechanism of this utility model.

[0016] The components include: 1. Water tank; 2. Demisting mechanism; 201. Support frame; 202. Guide rail; 203. Support plate; 204. Lifting plate; 205. Fixing block; 206. First support plate; 207. First motor; 208. First motor shaft; 209. Rotating plate; 210. Moving rod; 211. Connecting plate; 212. Demister; 213. Suction nozzle; 3. Stirring mechanism; 301. Second support plate; 302. Second motor; 303. Second motor shaft; 304. Stirring blade; 4. Cover plate; 5. Handle; 6. Pump body; 7. Water supply pipe; 8. Nozzle. Detailed Implementation

[0017] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0018] Example: Figure 1 As shown, the present invention provides the following technical solution, including a water tank 1, a demisting mechanism 2 on the top of the water tank 1, a cover plate 4 on the top of the water tank 1, a handle 5 on the top of the cover plate 4, a pump body 6 on the top of the water tank 1, a water supply pipe 7 at the top of the pump body 6, a nozzle 8 at the bottom of the water supply pipe 7, and a stirring mechanism 3 on the other side of the water tank 1.

[0019] When this device is needed to remove thick photoresist, first open the cover plate 4 by using handle 5, add the photoresist remover into the water tank 1, and after adding the liquid, the liquid needs to be continuously stirred to prevent the local concentration from being too high or too low. The stirring mechanism 3 is used to continuously stir the liquid to prevent the local concentration from being too high or too low. Then, start the pump body 6 so that the pump body 6 discharges the liquid in the water tank 1 into the nozzle 8 through the water pipe 7. The liquid is sprayed out through the nozzle 8 to remove the thick photoresist. During the process of removing the thick photoresist, it is necessary to remove the water mist to prevent the excessive water mist from obstructing the operator's vision. The water mist is removed by the de-misting mechanism 2 to complete the work.

[0020] like Figure 1 , Figure 2 and Figure 3As shown, a demisting mechanism 2 is provided on the top of the water tank 1. The demisting mechanism 2 includes a support frame 201. The support frame 201 is provided on the top of the water tank 1. A guide rail 202 is provided at the bottom of the support frame 201. A support plate 203 is provided at the bottom of the guide rail 202. One side of the support plate 203 is fixedly connected to one side of the water tank 1. A lifting plate 204 is provided outside the guide rail 202. A fixing block 205 is provided on one side of the lifting plate 204. A first support plate 206 is provided on one side of the water tank 1. A first motor 207 is provided on the top of the first support plate 206. The output shaft of the first motor 207 is connected to a first motor shaft 208 through a coupling. A rotating plate 209 is provided at one end of the first motor shaft 208. A moving rod 210 is provided on one side of the rotating plate 209. A connecting plate 211 is provided at one end of the lifting plate 204. A demister 212 is provided on one side of the connecting plate 211. A suction nozzle 213 is provided on one side of the demister 212.

[0021] In the process of removing thick light obscuration, water mist needs to be removed to prevent excessive water mist from obstructing the operator's vision. At this time, the demister 212 is activated, and the demister 212 sucks in the water mist through the suction nozzle 213. Then, the first motor 207 is activated, causing the first motor shaft 208 to rotate. The first motor shaft 208 drives the rotating plate 209 to rotate, and the rotating plate 209 drives the moving rod 210 to perform circular motion. The moving rod 210 drives the lifting plate 204 to move up and down repeatedly through the fixed block 205 on the lifting plate 204. The lifting plate 204 drives the connecting plate 211 to move up and down repeatedly. During the lifting and lowering of the connecting plate 211, the sliding of the lifting plate 204 outside the guide rail 202 makes the lifting and lowering of the connecting plate 211 more stable and smooth. The connecting plate 211 drives the demister 212 to move up and down repeatedly, completely removing the water mist on one side of the water tank 1, thus completing the demisting work.

[0022] like Figure 1 and Figure 4 As shown, a stirring mechanism 3 is provided on the other side of the water tank 1. The stirring mechanism 3 includes a second support plate 301. A second motor 302 is provided on the top of the second support plate 301. The output shaft of the second motor 302 is connected to a second motor shaft 303 through a coupling. The outer wall of the second motor shaft 303 is connected through to the other side of the water tank 1. A stirring blade 304 is provided on the outer wall of the second motor shaft 303.

[0023] After adding the liquid, it is necessary to continuously stir the liquid to prevent the local concentration from being too high or too low. At this time, the second motor 302 is started, which drives the second motor shaft 303 to start rotating. The second motor shaft 303 drives the stirring blade 304 to start rotating, so that the stirring blade 304 stirs and mixes the liquid inside the water tank 1, thereby completing the stirring work.

[0024] The working principle of this utility model is as follows: When this device is needed to remove thick photoresist, firstly, open the cover plate 4 through handle 5 and add the photoresist remover into the water tank 1. After adding the liquid, the liquid needs to be continuously stirred to prevent local concentrations from being too high or too low. At this time, start the second motor 302, which drives the second motor shaft 303 to rotate. The second motor shaft 303 drives the stirring blade 304 to rotate, so that the stirring blade 304 stirs and mixes the liquid inside the water tank 1, thereby completing the stirring work. Then, start the pump body 6, which discharges the liquid in the water tank 1 into the nozzle 8 through the water pipe 7. The liquid is sprayed out through the nozzle 8 to remove the thick photoresist. During the removal of thick photoresist, it is necessary to remove the water mist to prevent excessive water mist from obstructing the operator's vision. Start the demister 212, which draws in and removes water mist through the suction nozzle 213. Then, start the first motor 207, which drives the first motor shaft 208 to rotate. The first motor shaft 208 drives the rotating plate 209 to rotate, and the rotating plate 209 drives the moving rod 210 to make circular motion. The moving rod 210 drives the lifting plate 204 to move up and down repeatedly through the fixed block 205 on the lifting plate 204. The lifting plate 204 drives the connecting plate 211 to move up and down repeatedly. During the lifting and lowering of the connecting plate 211, the sliding of the lifting plate 204 outside the guide rail 202 makes the lifting and lowering of the connecting plate 211 more stable and smooth. The connecting plate 211 drives the demister 212 to move up and down repeatedly, completely removing the water mist on one side of the water tank 1, thus completing the demisting work.

[0025] It will be apparent to those skilled in the art that this invention is not limited to the details of the exemplary embodiments described above, and that it can be implemented in other specific forms without departing from the spirit or essential characteristics of this invention. Therefore, the embodiments should be considered illustrative and non-limiting in all respects, and the scope of this invention is defined by the appended claims rather than the foregoing description. Thus, it is intended that all variations falling within the meaning and scope of equivalents of the claims be included within this invention. No reference numerals in the claims should be construed as limiting the scope of the claims.

Claims

1. A high-voltage spray-type thick photoresist removal device for thin lines, comprising a water tank (1), characterized in that: The top of the water tank (1) is provided with a de-misting mechanism (2). The de-misting mechanism (2) includes a support frame (201). The top of the water tank (1) is provided with a support frame (201). The bottom of the support frame (201) is provided with a guide rail (202). The bottom of the guide rail (202) is provided with a support plate (203). One side of the support plate (203) is fixedly connected to one side of the water tank (1). The outside of the guide rail (202) is provided with a lifting plate (204).

2. The high-voltage spray-type thick photoresist removal device for fine lines according to claim 1, characterized in that: A fixing block (205) is provided on one side of the lifting plate (204), a first support plate (206) is provided on one side of the water tank (1), and a first motor (207) is provided on the top of the first support plate (206).

3. The high-voltage spray-type thick photoresist removal device for fine lines according to claim 2, characterized in that: The output shaft of the first motor (207) is connected to the first motor shaft (208) via a coupling, and a rotating plate (209) is provided at one end of the first motor shaft (208).

4. The high-voltage spray-type thick photoresist removal device for fine lines according to claim 3, characterized in that: A movable rod (210) is provided on one side of the rotating plate (209), and a connecting plate (211) is provided at one end of the lifting plate (204).

5. A high-voltage spray-type thick photoresist removal device for fine lines according to claim 4, characterized in that: A demister (212) is provided on one side of the connecting plate (211), and a suction nozzle (213) is provided on one side of the demister (212).

6. A high-voltage spray-type thick photoresist removal device for fine lines according to claim 5, characterized in that: The top of the water tank (1) is provided with a cover plate (4), the top of the cover plate (4) is provided with a handle (5), the top of the water tank (1) is provided with a pump body (6), the top of the pump body (6) is provided with a water supply pipe (7), and the bottom of the water supply pipe (7) is provided with a nozzle (8).

7. A high-voltage spray-type thick photoresist removal device for fine lines according to claim 1, characterized in that: A stirring mechanism (3) is provided on the other side of the water tank (1). The stirring mechanism (3) includes a second tray (301).

8. A high-voltage spray-type thick photoresist removal device for fine lines according to claim 7, characterized in that: The top of the second pallet (301) is provided with a second motor (302), the output shaft of the second motor (302) is connected to a second motor shaft (303) through a coupling, the outer wall of the second motor shaft (303) is connected through to the other side of the water tank (1), and the outer wall of the second motor shaft (303) is provided with a stirring blade (304).

Images