Solar cell screen printing front-end automatic dirt removal device

CN224794050UActive Publication Date: 2026-09-25CECEP SOLAR ENERGY TECH (ZHENJIANG) CO LTD
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Patent Information

Application Number
CN202521541592.8
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2025-07-22
Publication Date
2026-09-25
Estimated Expiration
2035-07-22

AI Technical Summary

Technical Problem

[0002]太阳能电池丝网印刷正、背面栅线过程中,硅片印刷表面需要干净、无异物,但现有的一些生产企业的生产过程中,自动化、清洁化程度还不是太高,只有简单的风扇降温除尘装置,对前道工艺残留的氮化硅粉末、氧化铝粉末等以及其他生产过程中带有的附着物无法去除,实际会导致:1、硅片表面粉末及其他附着物在印刷过程中影响银浆与硅片的接触,外观导致印刷缺印、鼓包,外观及EL有断栅、黑斑等影响;2、印刷不良,导致电池片转化效率偏低;3、网版与异物挤压造成破损及爆版,生产成本大大增加;4、网版崩裂,对网版造成损失,银浆也会损耗,这就需要印刷固定安排人力进行观察,但人工操排查分析异物来源存在很多不稳定因素,耗时耗力,不能准确把握,并不能完全解决,需停线打扫卫生,降低生产产量

Benefits of technology

[0012]有益效果:本申请具有以下优点:本申请的除污装置,设置在丝网印刷工序前端,对丝网印刷前的硅片表面进行除污,对硅片表面覆盖式清扫和吸尘,有效去除硅片表面异物,可以提高后续印刷质量,通过自动控制,实现自动操作除污,提高设备的自动化程度,生产效率提高,降低成本。

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses a solar cell silk screen printing front end automatic dirt removal device, and the roller brush is hung in the lower side of the support board with its roll shaft, the conveying belt is located below the lower end point of the bristle sweeping surface of the roller brush, the silicon wafer is placed on the conveying belt and is conveyed, the bristle acts on the upper surface of the silicon wafer and sweeps, the baffle is vertically installed in the lower side of the support board, the baffle is located at the front side of the rotating direction of the roller brush, and the lower side of the baffle has a gap with the upper surface of the silicon wafer, the dust collector is arranged between the roller brush and the baffle, and the dust collection head faces the upper surface of the silicon wafer. The dirt removal device of the application is arranged at the front end of the silk screen printing process, the surface of the silicon wafer before silk screen printing is cleaned, the silicon wafer surface is covered and cleaned and dusted, foreign matters on the surface of the silicon wafer are effectively removed, the subsequent printing quality can be improved, automatic operation and dirt removal are realized through automatic control, the degree of automation of the equipment is improved, the production efficiency is improved, and the cost is reduced.
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Description

Technical Field

[0001] This utility model relates to solar cell production equipment, and in particular to a device for removing contaminants from the surface of silicon wafers before screen printing. Background Technology

[0002] During the screen printing of front and back grid lines for solar cells, the silicon wafer printing surface needs to be clean and free of foreign objects. However, the automation and cleanliness levels of some existing manufacturers are not high enough. They only have simple fan cooling and dust removal devices, which cannot remove residual silicon nitride powder, alumina powder, and other adhering substances from previous processes. This can lead to the following problems: 1. Powder and other adhering substances on the silicon wafer surface affect the contact between the silver paste and the silicon wafer during printing, resulting in missing prints, bulging, broken grids, and black spots on the appearance and EL (electrode photocell); 2. Poor printing leads to lower cell conversion efficiency; 3. The screen is damaged or burst due to the squeezing of foreign objects, greatly increasing production costs; 4. The screen breaks, causing damage to the screen and loss of silver paste. This requires a fixed number of personnel to observe the process, but manual inspection and analysis of the source of foreign objects is subject to many unstable factors, is time-consuming and labor-intensive, cannot be accurately grasped, and cannot completely solve the problem. It is necessary to stop the line for cleaning and reduce production output. Utility Model Content

[0003] Purpose of this utility model: The purpose of this application is to provide an automatic decontamination device for the front end of screen printing of solar cells, which removes large particles and sticky powder and other foreign matter remaining on the surface of silicon wafers from the previous screen printing process.

[0004] Technical Solution: An automatic decontamination device for the front end of solar cell screen printing includes a support plate, a roller brush, a vacuum cleaner, a baffle, and a conveyor belt. The roller brush is suspended and connected to the support plate below its roller shaft. The conveyor belt is located below the lower end of the brush bristles of the roller brush. Silicon wafers are placed on the conveyor belt and conveyed. The brush bristles clean the upper surface of the silicon wafer. The baffle is vertically installed below the support plate and is located in front of the roller brush in the direction of rotation. There is a gap between the lower side of the baffle and the upper surface of the silicon wafer. The vacuum cleaner head is disposed between the roller brush and the baffle, and the vacuum cleaner head faces the upper surface of the silicon wafer.

[0005] Furthermore, the dust suction head is elongated, with its length direction aligned with the width direction of the silicon wafer conveying process. Dust conveying hoses are connected to both sides of the dust suction head, and these hoses are connected to a dust storage box mounted on the support plate.

[0006] Furthermore, it also includes sensors mounted on the support plate, which provide feedback on the silicon wafer entering the decontamination working area.

[0007] Furthermore, the rotation direction of the roller brush is opposite to the conveying direction of the conveyor belt, which controls the swept foreign objects within a limited range for dust collection, blocks and gathers the foreign objects, prevents the spread of dust, and collects the foreign objects by the dust collection head as much as possible, thereby improving the dust collection effect after cleaning and contributing to a cleaner production environment and reducing secondary pollution.

[0008] Furthermore, the roller brush is connected to a speed-regulating motor.

[0009] Furthermore, both ends of the roller shaft are connected to the bracket via bearings, and the bracket is hoisted and connected to the support plate.

[0010] Furthermore, the brush bristles are soft, ensuring no scratches are left on the silicon wafer surface when cleaning.

[0011] Furthermore, the width of the brush bristles, the width of the suction head, and the width of the baffle are all greater than the width of the silicon wafer conveyor, covering the width of the silicon wafer when passing through, thereby improving the cleaning and suction effect.

[0012] Beneficial effects: The present application has the following advantages: The decontamination device of the present application is set at the front end of the screen printing process to decontaminate the surface of the silicon wafer before screen printing. It performs a comprehensive cleaning and dust extraction on the surface of the silicon wafer, effectively removing foreign objects from the surface of the silicon wafer, which can improve the quality of subsequent printing. Through automatic control, it realizes automatic operation of decontamination, improves the automation level of the equipment, increases production efficiency, and reduces costs. Attached Figure Description

[0013] Figure 1 This is a schematic diagram of the decontamination device structure;

[0014] Figure 2 for Figure 1 The right view. Detailed Implementation

[0015] The present application will be further explained below with reference to the accompanying drawings and specific embodiments.

[0016] An automatic decontamination device for the front end of screen printing of solar cells, as shown in the attached document. Figure 1 , 2 As shown, it includes a support plate 1, a roller brush 2, a vacuum cleaner 3, a baffle 4, a conveyor belt 5, and a sensor 6.

[0017] Support plate 1 adopts a flat plate structure and can be supported by columns to form a working area below support plate 1.

[0018] The roller brush 2 includes a roller shaft 21, bristles 22, and a roller 24, as well as a support 23. Bearings are installed at both ends of the roller shaft 21. The lower end of the support 23 is fixed to the outer ring of the bearings, and the upper end of the support 23 is fixed to the support plate 1, thereby suspending and connecting the roller brush 2 below the support plate 1. The roller shaft 21 is connected to the inner ring of the bearings, and the rotation of the support 23 and the roller shaft 21 does not interfere with each other. The roller brush 2 is connected to a motor and driven to rotate by the motor, which can be a speed-regulating motor.

[0019] The conveyor belt 5 is located below the roller brush 2, specifically below the lower end of the brush surface of the roller 24 where the bristles 22 sweep. The silicon wafer 7 is placed on the conveyor belt 5 and conveyed. The bristles 22 on the roller brush 2 clean the upper surface of the silicon wafer 7 as it is conveyed horizontally and the roller brush 2 rotates, continuously cleaning the upper surface of the silicon wafer 7. The bristles 22 are soft, resulting in no scratches on the silicon wafer surface. The conveying direction of the conveyor belt 5 is opposite to the rotation direction of the roller brush 2. Figure 1 As shown, the roller brush 2 rotates counterclockwise, and the conveyor belt 5 moves to the left.

[0020] The baffle 4 is vertically installed below the support plate 1. The baffle 4 is located in front of the rotation direction of the roller brush 2. The width direction of the baffle 4 is consistent with the width direction of the silicon wafer 7. There is a gap between the baffle 4 and the roller brush 2 for the placement of the vacuum cleaner head 31 of the vacuum cleaner 3. There is a gap between the lower side of the baffle 4 and the upper surface of the silicon wafer 7. The gap should be as small as possible so as not to scratch the upper surface of the silicon wafer 7.

[0021] The dust suction head 31 is elongated, with its length aligned with the width of the silicon wafer 7 being conveyed. The suction port of the dust suction head 31 faces the upper surface of the silicon wafer 7. Dust conveying hoses 32 are connected to both sides of the dust suction head 31, and the dust conveying hoses 32 are connected to the dust storage box 33 mounted on the support plate 1.

[0022] Sensor 6 is mounted on support plate 1. Sensor 6 is associated with feedback silicon wafer 7 entering the decontamination working area. Sensor 6 can also be integrated with a camera to record images in real time and provide associated feedback.

[0023] As attached Figure 1As shown, silicon wafer 7 is conveyed to the left by conveyor belt 5. When the silicon wafer is about to enter the cleaning working area of ​​brush 22, sensor 6 can provide signal feedback, such as starting the roller brush to rotate, starting the vacuum cleaner to work, or adjusting the standby vacuum cleaner to work. When the left end of silicon wafer 7 reaches the lower end of the brush surface of brush 22, brush 22 acts on the upper surface of silicon wafer 7 to clean it. The roller brush 2 rotates counterclockwise to sweep the foreign objects cleaned from the upper surface of silicon wafer 7 to the right, that is, towards the dust head 31 and baffle 4. The dust head 31 sucks them away in time and transports them to the dust collection box 33 through the dust conveying hose 32. The baffle 4 is on the right side of the dust head 31 and can block and gather foreign objects facing the baffle to prevent dust and other particles from spreading. It collects foreign objects by the dust head as much as possible, improves the dust collection effect after cleaning, and is conducive to the cleanliness of the production environment and reduces secondary pollution. As the silicon wafer continues to move to the left, the area that has been cleaned gradually increases and moves away from the roller brush.

[0024] To improve the cleaning and dust collection effect, the width of the brush surface 22 on the roller 24, the width of the dust collection head 31, and the width of the baffle 4 are all greater than the width L of the silicon wafer 7 being conveyed.

[0025] The decontamination device of this application can be automatically controlled by a PLC or similar system to achieve automated decontamination. It can also be linked to adjust the roller brush speed and the suction power of the vacuum cleaner. Installed at the front end of the screen printing process, this decontamination device comprehensively decontaminates the silicon wafer surface before screen printing, improving printing quality, preventing grid breakage, ink leakage, bulging, and plate bursting, extending the lifespan of the fine grid, increasing equipment automation, improving production efficiency, and reducing costs.

Claims

1. An automatic decontamination device for the front end of screen printing of solar cells, characterized in that: The assembly includes a support plate (1), a roller brush (2), a vacuum cleaner (3), a baffle (4), and a conveyor belt (5). The roller brush (2) is suspended and connected to the support plate (1) below its roller shaft (21). The conveyor belt (5) is located below the lower end of the brush bristles (22) of the roller brush (2). The silicon wafer is placed on the conveyor belt (5) for conveying. The brush bristles (22) act on the upper surface of the silicon wafer for cleaning. The baffle (4) is vertically installed below the support plate (1). The baffle (4) is located in front of the roller brush (2) in the direction of rotation. There is a gap between the lower side of the baffle (4) and the upper surface of the silicon wafer. The vacuum cleaner (3) has a suction head (31) between the roller brush (2) and the baffle (4). The suction head (31) faces the upper surface of the silicon wafer.

2. The automatic decontamination device for the front end of solar cell screen printing according to claim 1, characterized in that: The dust suction head (31) is long and narrow, and the length direction of the dust suction head (31) is consistent with the width direction of the silicon wafer conveying. The dust suction head (31) is connected to the dust conveying hose (32) on both sides, and the dust conveying hose (32) is connected to the dust storage box (33) installed on the support plate (1).

3. The automatic decontamination device for the front end of solar cell screen printing according to claim 1, characterized in that: It also includes a sensor (6) installed on the support plate (1), which provides feedback on the silicon wafer entering the decontamination working area.

4. The automatic decontamination device for the front end of solar cell screen printing according to claim 1, characterized in that: The rotation direction of the roller brush (2) is opposite to the conveying direction of the conveyor belt (5).

5. The automatic decontamination device for the front end of solar cell screen printing according to claim 1, characterized in that: The roller brush (2) is connected to the speed-regulating motor.

6. The automatic decontamination device for the front end of solar cell screen printing according to claim 1, characterized in that: The roller shaft (21) is connected to the bracket (23) at both ends by bearings, and the bracket (23) is hoisted to the support plate (1).

7. The automatic decontamination device for the front end of solar cell screen printing according to claim 1, characterized in that: The bristles (22) are soft bristles.

8. The automatic decontamination device for the front end of solar cell screen printing according to claim 1, characterized in that: The width of the brush bristles (22), the width of the suction head (31), and the width of the baffle (4) are all greater than the width of the silicon wafer being transported.