Wafer cleaning nozzle mechanical arm structure

Abstract

The utility model discloses a wafer cleaning shower nozzle mechanical arm structure, including arm body, speed reducer motor, cylinder, splash guard and transmission shaft, the splash guard is fixed in support frame and covers the top of speed reducer motor, cylinder, its surface extension forms first protective sleeve, the arm body rear portion downward extension forms the second protective sleeve of being located first protective sleeve radial outside, and transmission shaft passes through first protective sleeve and enters second protective sleeve and with second protective sleeve adjustable connection, the speed reducer motor is located on cylinder slide platform, and the cylinder is fixed in support frame, the utility model discloses through splash guard blocking liquid contact drive component, first, second protective sleeve double -wrap transmission shaft prevents liquid infiltration motor, and arm body position is adjustable, can promote drive component protection level, prolong equipment life, strengthen structural adaptability, is applicable to wafer cleaning scene.

Description

Technical Field

[0001] This utility model belongs to the field of semiconductor manufacturing technology, and in particular relates to a robotic arm structure for a wafer cleaning nozzle. Background Technology

[0002] In semiconductor manufacturing, wafer cleaning is a crucial step in ensuring chip yield. It primarily utilizes a robotic arm to drive a cleaning nozzle, enabling precise spraying, rotation, or lifting movements on the wafer surface to remove particulate impurities, chemical residues, and other contaminants. The robotic arm's drive system (typically including a geared motor and cylinders) is a core component, and its operational stability directly impacts cleaning accuracy and equipment lifespan.

[0003] However, existing wafer cleaning nozzle robotic arms lack effective liquid protection structures in practical applications: deionized water, HF acid, SC1 / SC2 and other chemical reagents are often used in the cleaning process. Liquids can easily come into contact with the drive components of the robotic arm, such as motors and cylinders, through splashing and dripping, leading to component corrosion, short circuits or mechanical failures, which seriously affect the reliability of equipment operation. Utility Model Content

[0004] Based on this, and in response to the aforementioned technical problems, a wafer cleaning nozzle robotic arm structure is provided.

[0005] The technical solution adopted in this utility model is as follows:

[0006] A wafer cleaning nozzle robotic arm structure includes an arm body and a geared motor and a cylinder for driving the arm body to rotate horizontally and move vertically, respectively. The structure is characterized by further including a splash guard and a drive shaft. The splash guard is fixed to a support frame and covers the support frame, the geared motor, and the cylinder. Its upper surface forms an upwardly extending first protective sleeve. The rear part of the arm body forms a downwardly extending second protective sleeve to the radially outer side of the first protective sleeve. The drive shaft is connected to the reducer of the geared motor and extends upward through the first protective sleeve and into the second protective sleeve. The second protective sleeve is adjustablely connected to the top of the drive shaft. The geared motor is mounted on the slide of the cylinder, and the cylinder is fixed to the support frame.

[0007] The beneficial effects of this utility model are as follows:

[0008] 1. Improve the protection level of drive components and extend the service life of equipment.

[0009] The splash guard is fixed to the support frame and covers the geared motor, cylinder and support frame. It can effectively prevent splashed liquids (such as chemical reagents, deionized water, etc.) from directly contacting the drive components during the cleaning process, avoid corrosion, short circuit or mechanical jamming of the motor and cylinder due to liquid erosion, significantly reduce the equipment failure rate and extend the service life of core components.

[0010] 2. Double-sealed drive shaft to prevent liquid from seeping into the motor.

[0011] The first protective sleeve extending from the upper surface of the splash guard, together with the second protective sleeve extending downward from the rear of the arm (located radially outside the first protective sleeve), constitutes a double-wrap structure for the drive shaft, which can effectively prevent liquid from seeping into the motor through the gaps on the surface of the drive shaft, thereby improving the safety and stability of the motor operation.

[0012] 3. Flexible and adjustable structure to adapt to diverse cleaning needs.

[0013] The second protective sleeve is connected to the top of the drive shaft in an adjustable front-to-back position. This allows for flexible adjustment of the arm's position according to different wafer sizes and the movement trajectory requirements of the cleaning nozzles. This optimizes the spray range and accuracy of the nozzles, enhances the equipment's adaptability to diverse cleaning processes, and strengthens the versatility of the robotic arm. Attached Figure Description

[0014] The present invention will now be described in detail with reference to the accompanying drawings and specific embodiments:

[0015] Figure 1 A three-dimensional structural diagram of a wafer cleaning nozzle robotic arm structure provided for an embodiment of this utility model. Figure 1 ;

[0016] Figure 2 A three-dimensional structural diagram of a wafer cleaning nozzle robotic arm structure provided for an embodiment of this utility model. Figure 2 ;

[0017] Figure 3 A three-dimensional structural diagram of a wafer cleaning nozzle robotic arm structure provided for an embodiment of this utility model. Figure 3 ;

[0018] Figure 4 An exploded view of a wafer cleaning nozzle robotic arm structure provided in an embodiment of this utility model;

[0019] Figure 5 This is an exploded view of the connection structure between the drive shaft and the arm body in an embodiment of this utility model. Detailed Implementation

[0020] The embodiments of this utility model will be described below with reference to the accompanying drawings. It should be noted that the embodiments described in this specification are not exhaustive and do not represent the only embodiments of this utility model. The following corresponding embodiments are only for clearly illustrating the utility model content of this patent and are not intended to limit its implementation. For those skilled in the art, different variations and modifications can be made based on the described embodiments. Any obvious variations or modifications that fall within the technical concept and utility model content of this utility model are also within the protection scope of this utility model.

[0021] like Figure 1 and Figure 5 As shown in the figure, this application provides a wafer cleaning nozzle robotic arm structure, including a support frame 1100, a cylinder 1200, a geared motor 1300, a splash guard 1400, a transmission shaft 1500, and an arm body 1600.

[0022] like Figure 1-4 As shown, the support frame 1100 includes a cylinder fixing plate 1110, a base plate fixing plate 1120, a side base plate fixing plate 1130, a motor fixing plate 1140, and a motor support plate 1150.

[0023] The cylinder fixing plate 1110 and the base plate fixing plate 1120 are arranged vertically. The upper end of the cylinder fixing plate 1110 forms two upwardly extending support columns 1111. The base plate fixing plate 1120 is fixed to the back of the cylinder fixing plate 1110 by bolts, and its side is connected to the side base plate fixing plate 1130 by bolts. The side base plate fixing plate 1130 is connected and fixed to the machine base by bolts. The L-shaped fixing method makes the fixing more reliable, reduces motor vibration, and improves the stability of the rotation process.

[0024] Cylinder 1200 and geared motor 1300 are used to drive boom 1600 to lift and rotate horizontally, respectively. Cylinder 1200 is fixed to the front of cylinder mounting plate 1110 by bolts and is limited by cylinder limit block 1210 and reduced by hydraulic damper 1220. Motor mounting plate 1140 is arranged horizontally and fixed to the upper end of slide of cylinder 1200 by bolts. Motor support plate 1150 is arranged vertically and fixed to the front of slide by bolts, and its upper end is connected to motor mounting plate 1140 by bolts. The main body 1310 of geared motor 1300 is fixed to the front of motor support plate 1150 by bolts, and its reducer 1320 is fixed to motor mounting plate 1140 by bolts.

[0025] The motor mounting plate 1140 is equivalent to a cantilever beam. The longer the cantilever, the greater the deflection. Under the condition of constant load, the depth of the cantilever beam can be reduced to reduce strain.

[0026] A vertical mounting plate 1141 is fixed to the motor mounting plate 1140 by bolts, and a horizontal static limit plate 1141a is fixed to the mounting plate 1141 by bolts.

[0027] The rotary flange 1321 of the reducer 1320 has a sensing part (not shown in the figure) on its circumferential surface, and the upper end face of the reducer 1320 has a photoelectric switch 1322 that cooperates with the sensing part to determine the rotation origin of the drive shaft 1500.

[0028] like Figure 5 As shown, the splash guard 1400 is fixed on two support columns 1111 and covers the support frame 1100, cylinder 1200 and geared motor 1300. It is used to prevent splashed liquid from directly contacting the drive components (motor and cylinder) during the cleaning process. The upper surface of the splash guard 1400 forms an upwardly extending first protective sleeve 1410.

[0029] The drive shaft 1500 is arranged vertically, passing upward through the first protective sleeve 1410, and has a connecting flange 1510 at its lower part. (See attached image) Figure 1 , Figure 3 and Figure 4 The connecting flange 1510 is connected to the rotating flange 1321 on the reducer 1320. For example... Figure 3 and Figure 4 As shown, the connecting flange 1510 has a radially protruding dynamic limiting part 1511, which cooperates with the static limiting plate 1141a to limit the rotation angle of the transmission shaft 1500 (not exceeding 90° in this embodiment). In the event of a failure of the photoelectric switch 1322 and the geared motor 1300, the arm body 1600 is prevented from rotating continuously and colliding with other mechanisms inside the cavity.

[0030] In this embodiment, the drive shaft 1500 is composed of two plastic layers and a metal layer located between the two plastic layers in the radial direction.

[0031] like Figure 5 As shown, a thick section 1520 is formed at the top of the drive shaft 1500. A thickening block 1530 is fixed to the upper end face of the thick section 1520 by four bolts 1521. The cross-section of the thickening block 1530 is circular, concentric with the thick section 1520 and with an outer diameter larger than that of the thick section 1520. The upper surface edge of the thickening block 1530 has four evenly distributed threaded holes 1531. A slide rail 1532 along the front-back direction of the arm body 1600 is also formed in the middle of the upper surface of the thickening block 1530.

[0032] The arm body 1600 is plate-shaped, and a second protective sleeve 1610 is formed at its rear, extending radially outward to the upper part of the first protective sleeve 1410. This is equivalent to not contacting the upper part of the first protective sleeve 1410, while allowing the drive shaft 1500 to pass through the second protective sleeve 1610. The above structure can enclose the drive shaft 1500 and prevent liquid from flowing into the motor from the drive shaft 1500.

[0033] The inner surface of the top of the second protective sleeve 1610 is fixed with a metal connecting piece 1620 by two bolts 1540. The top of the second protective sleeve 1610 has four first waist-shaped holes 1611 along the front and rear direction of the arm body 1600. The four first waist-shaped holes 1611 are evenly arranged along the top edge of the second protective sleeve 1610. In order to increase or decrease strength, the four first waist-shaped holes 1611 are set on the cross-shaped protrusion.

[0034] The metal connecting piece 1620 has four second oblong holes 1621. The four second oblong holes 1621 are evenly arranged along the edge of the metal connecting piece 1620 and correspond one-to-one with the four first oblong holes 1611. The second protective sleeve 1610 is connected to the four threaded holes 1531 on the upper surface of the thickening block 1530 through the first oblong holes 1611, the second oblong holes 1621 and four bolts 1550 in the vertical direction. Loosening the four bolts 1540 can adjust the position of the second protective sleeve 1610 back and forth, that is, adjust the back and forth position of the arm 1600.

[0035] The metal connecting piece 1620 also has a groove 1622 in the middle that slides back and forth with the slide rail 1532 of the thickened block 1530.

[0036] In order to seal the first oblong hole 1611, the second oblong hole 1621, and the bolt hole where the bolt 1540 is located, the top of the second protective sleeve 1610 is also provided with a sealing cover 1612, which is fixed to the top of the second protective sleeve 1610 by plastic screws.

[0037] In this embodiment, the exposed splash guard 1400 and arm 1600 are both made of plastic.

[0038] As can be seen from the above, the wafer cleaning nozzle robotic arm structure provided in this application embodiment has the following beneficial effects:

[0039] 1. Improve the protection level of drive components and extend the service life of equipment.

[0040] The splash guard is fixed to the support frame and covers the geared motor, cylinder and support frame. It can effectively prevent splashed liquids (such as chemical reagents, deionized water, etc.) from directly contacting the drive components during the cleaning process, avoid corrosion, short circuit or mechanical jamming of the motor and cylinder due to liquid erosion, significantly reduce the equipment failure rate and extend the service life of core components.

[0041] 2. Double-sealed drive shaft to prevent liquid from seeping into the motor.

[0042] The first protective sleeve extending from the upper surface of the splash guard, together with the second protective sleeve extending downward from the rear of the arm (located radially outside the first protective sleeve), constitutes a double-wrap structure for the drive shaft, which can effectively prevent liquid from seeping into the motor through the gaps on the surface of the drive shaft, thereby improving the safety and stability of the motor operation.

[0043] 3. Flexible and adjustable structure to adapt to diverse cleaning needs.

[0044] The second protective sleeve is connected to the top of the drive shaft in an adjustable front-to-back position. This allows for flexible adjustment of the arm's position according to different wafer sizes and the movement trajectory requirements of the cleaning nozzles. This optimizes the spray range and accuracy of the nozzles, enhances the equipment's adaptability to diverse cleaning processes, and strengthens the versatility of the robotic arm.

[0045] Obviously, those skilled in the art can make various modifications and variations to this application without departing from the scope of this application. Therefore, if such modifications and variations fall within the scope of the claims of this application and their equivalents, this application also intends to include such modifications and variations.

Claims

1. A robotic arm structure for a wafer cleaning nozzle, comprising an arm body and a geared motor and a cylinder for driving the arm body to rotate horizontally and to move vertically, characterized in that, It also includes a splash guard and a drive shaft. The splash guard is fixed on the support frame and covers the support frame, the geared motor, and the cylinder. Its upper surface forms an upwardly extending first protective sleeve. The rear part of the arm body forms a downwardly extending second protective sleeve to the radially outer side of the first protective sleeve. The drive shaft is connected to the reducer of the geared motor and extends upward through the first protective sleeve and into the second protective sleeve. The second protective sleeve is adjustablely connected to the top of the drive shaft. The geared motor is mounted on the slide of the cylinder, and the cylinder is fixed on the support frame.

2. The wafer cleaning nozzle robotic arm structure according to claim 1, characterized in that, The top of the second protective sleeve has a first waist-shaped hole along the front-rear direction of the arm body. The second protective sleeve is connected to the top of the drive shaft in an adjustable position via the first waist-shaped hole and bolts in the up-down direction.

3. The wafer cleaning nozzle robotic arm structure according to claim 2, characterized in that, A metal connecting piece is fixed to the inner surface of the top of the second protective sleeve. The metal connecting piece has a second waist-shaped hole that corresponds to the first waist-shaped hole. The second protective sleeve is connected to the top of the drive shaft in an adjustable manner through the first waist-shaped hole, the second waist-shaped hole, and bolts in the up-down direction.

4. The wafer cleaning nozzle robotic arm structure according to claim 3, characterized in that, There are four of each of the first and second waist-shaped holes, which are evenly distributed on the top edge of the second protective sleeve and the edge of the metal connecting piece, respectively. A thickening block located below the metal connecting piece is fixed to the top of the drive shaft. The second protective sleeve is connected to the thickening block in an adjustable manner through the first waist-shaped hole, the second waist-shaped hole, and bolts in the up and down direction.

5. The wafer cleaning nozzle robotic arm structure according to claim 4, characterized in that, The metal connecting piece and the thickened block slide in a back-and-forth fit.

6. The wafer cleaning nozzle robotic arm structure according to claim 2, characterized in that, The top of the second protective sleeve is also provided with a sealing cap for sealing the first and second oblong holes.

7. The wafer cleaning nozzle robotic arm structure according to claim 1, characterized in that, The support frame includes a cylinder fixing plate, a base plate fixing plate, a side base plate fixing plate, a motor fixing plate, and a motor support plate. The cylinder fixing plate and the base plate fixing plate are arranged vertically. The base plate fixing plate is fixed to the back of the cylinder fixing plate, and its side is connected to the side base plate fixing plate. The side base plate fixing plate is connected to the machine base. The cylinder is fixed to the front of the cylinder fixing plate. The motor fixing plate is arranged horizontally and fixed to the upper end of the cylinder's slide. The motor support plate is arranged vertically, fixed to the front of the slide, and its upper end is connected to the motor fixing plate. The main body of the geared motor is fixed to the front of the motor support plate, and its reducer is fixed to the motor fixing plate. The lower part of the transmission shaft has a connecting flange, which is connected to the rotating flange on the reducer.

8. The wafer cleaning nozzle robotic arm structure according to claim 7, characterized in that, The upper end of the cylinder fixing plate forms an upwardly extending support column, and the splash guard is fixed on the support column.

9. The wafer cleaning nozzle robotic arm structure according to claim 7, characterized in that, The connecting flange has a radially protruding dynamic limiting part, the motor fixing plate is provided with a vertical mounting plate, and the mounting plate is provided with a static limiting plate for cooperating with the dynamic limiting part to limit the rotation angle of the transmission shaft.

10. The wafer cleaning nozzle robotic arm structure according to claim 7, characterized in that, The rotating flange has a sensing element on its circumferential surface, and the upper end face of the reducer has a photoelectric switch that cooperates with the sensing element.

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