Precursor storage device and process equipment

Abstract

The present disclosure relates to the technical field of semiconductor and photovoltaic, and particularly relates to a precursor storage device and process equipment, which solves the problem of high difficulty and high risk coefficient in replacing the liquid level detection piece which needs to be inserted into the interior in the related art. The precursor storage device comprises a tank body, a liquid level meter, a liquid supply assembly and a control assembly, the tank body has a detection area, the liquid level meter is arranged at a position corresponding to the detection area outside the tank body, the liquid level meter can detect the liquid level height of the liquid in the containing space from the outside of the tank body through the detection area, the liquid supply assembly is arranged in the tank body, the control assembly is electrically connected with the liquid level meter and the liquid supply assembly respectively, and the control assembly is configured to control the opening or closing of the liquid supply assembly according to the liquid level height detected by the liquid level meter. The precursor storage device and process equipment provided by the present disclosure solve the problem of high difficulty and high risk coefficient in replacing the liquid level detection piece which needs to be inserted into the interior.

Description

Technical Field

[0001] This disclosure relates to the fields of semiconductor and photovoltaic technology, and in particular to a precursor memory device and process equipment. Background Technology

[0002] In the manufacturing process of photovoltaic or semiconductor products, process equipment is used to coat the surface of silicon wafers. When coating silicon wafers using this equipment, one or more precursors are introduced into a high-temperature furnace via a gas supply system to react with the silicon wafer and form the desired film. The gas supply system initially stores the precursors in liquid form in a storage tube, and the liquid level is monitored by a built-in level sensor. However, if the level sensor malfunctions and the liquid stored in the tube is a hazardous chemical solution, replacing the level sensor becomes very difficult and carries a high risk. Utility Model Content

[0003] In view of this, the present disclosure provides a precursor storage device and process equipment to solve the problem that the liquid level detection device needs to be inserted into the interior, which makes replacement difficult and poses a high risk.

[0004] In a first aspect, one embodiment of this disclosure provides a precursor storage device, comprising: a tank having a accommodating space configured to accommodate liquid, the tank having a detection area; a level gauge disposed outside the tank at a position corresponding to the detection area, the level gauge being capable of detecting the liquid level height in the accommodating space from outside the tank through the detection area; a liquid supply assembly disposed in the tank, the liquid supply assembly having a liquid inlet pipe extending into the accommodating space, the liquid supply assembly being configured to supply liquid into the accommodating space from the liquid inlet pipe; and a control assembly electrically connected to the level gauge and the liquid supply assembly respectively, the control assembly being configured to control the liquid supply assembly to open or close according to the liquid level height detected by the level gauge.

[0005] In some embodiments, the tank includes: a body having a receiving cavity; a cover plate covering the opening of the receiving cavity to enclose and form a receiving space, the cover plate having a detection area, a level gauge being detachably connected to the cover plate, and the probe of the level gauge being opposite to the detection area.

[0006] In some embodiments, the tank has a minimum liquid level height and a preset liquid level height. Along the extension direction of the tank, the preset liquid level height is above the minimum liquid level height. When the level gauge detects that the liquid level height is less than or equal to the minimum liquid level height, it generates a liquid replenishment signal. The control component controls the liquid supply component to fill the accommodating space with liquid up to the preset liquid level height according to the liquid replenishment signal.

[0007] In some embodiments, it further includes: a gas supply assembly disposed in the tank, the gas supply assembly being electrically connected to the control assembly, and the gas supply assembly being configured to fill the accommodating space with gas.

[0008] In some embodiments, the gas supply assembly includes: an inlet pipe extending at least partially into the accommodating space, the inlet pipe being configured to introduce gas into the accommodating space; and at least one jet pipe communicating with the inlet pipe, the jet pipe being located within the accommodating space, the jet pipe extending perpendicular to the extending direction of the tank body, and the jet pipe having a plurality of communicating vents along its extending direction, the plurality of vents being spaced apart, and the vents of the jet pipe being lower than or equal to the minimum liquid level height along the extending direction of the tank body.

[0009] In some embodiments, the diameter of each vent is between 0.8 mm and 1.5 mm, and / or, multiple vents are arranged at equal intervals, and / or, the distance between two adjacent vents is between 10 mm and 15 mm, and / or, the vents face the bottom wall of the tank, and / or, the number of jet lines includes two or more, and multiple jet lines are arranged crosswise and interconnected in a direction perpendicular to the extension of the tank.

[0010] In some embodiments, the inner surface of the bottom wall of the tank that encloses the accommodating space is a concave arc surface.

[0011] In some embodiments, the level gauge is configured as a radar level gauge, and / or the tank body is provided with a viewing window, and the area corresponding to the viewing window forms a detection area.

[0012] In some embodiments, it further includes: a gas outlet assembly disposed in the tank, the gas outlet assembly being electrically connected to the control assembly, the gas outlet assembly being configured to discharge gas from the containment space into the furnace cavity of the process furnace.

[0013] Secondly, embodiments of this disclosure provide a process apparatus, including: a process furnace having a furnace cavity, the process furnace being configured to process sheets within the furnace cavity; and a precursor storage device described above, disposed on one side of the process furnace, the precursor storage device being configured to supply gas to the furnace cavity.

[0014] The precursor storage device and process equipment provided in this disclosure, through a level gauge installed outside the tank and a control component electrically connected to the level gauge and the liquid supply assembly, allows the control component to detect the liquid level in the tank in real time based on the external level gauge, facilitating timely replenishment of the liquid in the tank. In the event of a level gauge malfunction or contamination of the liquid in the tank, the external level gauge facilitates maintenance and replacement by personnel, improving loading and unloading efficiency, reducing downtime, and ultimately increasing production efficiency.

[0015] In addition, by using a level gauge installed outside the tank, this embodiment of the present disclosure can prevent workers from coming into contact with the highly hazardous chemical solutions stored inside the tank when the level gauge malfunctions and needs to be repaired or replaced, thus improving safety performance. Attached Figure Description

[0016] The above and other objects, features, and advantages of this disclosure will become more apparent from the more detailed description of the embodiments thereof in conjunction with the accompanying drawings. The drawings are provided to further illustrate the embodiments of this disclosure and form part of the specification. They are used together with the embodiments of this disclosure to explain the disclosure and do not constitute a limitation thereof. In the drawings, the same reference numerals generally represent the same components or steps.

[0017] Figure 1 The diagram shown is a simplified schematic of a process equipment provided in an embodiment of this disclosure.

[0018] Figure 2 The image shown is a perspective view of a precursor storage device provided in an embodiment of this disclosure.

[0019] Figure 3 As shown Figure 2 A partial enlarged view of part A in the precursor storage device shown.

[0020] Figure 4 The image shown is a front view of a precursor storage device provided in an embodiment of this disclosure.

[0021] Figure 5 The image shown is a front view of an air jet pipe provided in an embodiment of this disclosure.

[0022] Figure 6 The figure shown is a cross-sectional view of an air jet pipe provided in an embodiment of this disclosure.

[0023] Figure 7 The figure shown is a cross-sectional view of a jet pipe provided in another embodiment of this disclosure.

[0024] Figure 8 The figure shown is a cross-sectional view of a jet pipe provided in another embodiment of this disclosure.

[0025] Figure label: 100. Process equipment; 10. Precursor storage device; 1. Tank; 1a. Containment space; 1b. Detection area; 1c. Preset liquid level height; 1d. Minimum liquid level height; 11. Body; 11a. Arc-shaped surface; 12. Cover plate; 2. Liquid level gauge; 21. Probe; 3. Liquid supply assembly; 31. Liquid inlet pipe; 4. Gas supply assembly; 41. Gas inlet pipe; 42. Gas jet pipe; 421. Air hole; 5. Gas outlet assembly; 10a. Power supply equipment; 20. Process furnace; 20a. Furnace cavity; 30. Gas storage device; 40. Sheet; X. First direction; Y. Second direction; Z. Vertical direction. Detailed Implementation

[0026] The technical solutions of the embodiments of this disclosure will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this disclosure, and not all embodiments. Based on the embodiments of this disclosure, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this disclosure.

[0027] Figure 1 The diagram shown is a simplified schematic of a process equipment provided in an embodiment of this disclosure. Figure 2 The image shown is a perspective view of a precursor storage device provided in an embodiment of this disclosure. Figure 3 As shown Figure 2 A partial enlarged view of part A in the precursor storage device shown. Figure 4 The image shown is a front view of a precursor storage device provided in an embodiment of this disclosure. Arrow X points to a first direction, arrow Y points to a second direction, and arrow Z points to a vertical direction, which is also the extension direction of the tank 1 and the axial direction of the tank 1.

[0028] This disclosure provides a precursor storage device, such as... Figures 1 to 4 It is applied to process equipment 100, which includes process furnace 20 and a power supply device 10a connected to furnace cavity 20a of process furnace 20. The furnace cavity 20a of process furnace 20 is configured to accommodate sheet 40, and the power supply device 10a is configured to provide one or more precursors to the furnace cavity 20a as a gas source for the reaction of sheet 40 in the furnace cavity 20a.

[0029] It is understood that the process furnace 20 can be a reaction furnace for coating the surface of the sheet 40. The reaction furnace can be, for example, a high-temperature oxidation furnace, a low-pressure chemical vapor deposition (LPCVD) furnace, an atmospheric pressure chemical vapor deposition (APCVD) furnace, an atomic layer deposition (ALD) furnace, etc., without specific limitation. In this embodiment, the process furnace 20 is an ALD furnace.

[0030] Optionally, the sheet 40 can be a solar cell, which needs to be processed through different steps to become a usable solar cell product. The shape of the solar cell can be, for example, rectangular, square, circular, etc., without specific limitations.

[0031] Optionally, multiple sheets 40 can be supported on a boat structure, and the boat structure supporting multiple sheets 40 can be placed as a whole in the furnace cavity 20a for coating the surfaces of the multiple sheets 40 to be coated, thereby improving coating efficiency.

[0032] It is understandable that the process furnace 20 may also include heating components, support components, etc., which will not be described in detail.

[0033] The power supply device 10a includes a precursor storage device 10 and a gas storage device 30 connected to each other. The gas storage device 30 can store nitrogen gas, and the precursor storage device 10 stores liquid, which can be a chemical solution used to coat the surface of the sheet 40. The precursor storage device 10 is connected to the gas inlet of the process furnace 20. Nitrogen gas from the gas storage device 30 can enter the precursor storage device 10. After the introduced nitrogen gas and solution form saturated vapor carrying the precursor chemical solution under heating environment, the precursor storage device 10 enters the process furnace 20 through the gas inlet to coat the surface of the sheet 40 to be coated.

[0034] It is understandable that, in order to meet the coating requirements, the chemical solution stored in the precursor storage device 10 is a high-risk chemical solution. During the coating process, the solution stored in the precursor storage device 10 is continuously consumed. To ensure safety, automatic replenishment of the solution in the precursor storage device 10 is generally achieved through automated control. Specifically, the precursor storage device 10 includes a tank 1, a level gauge 2, a liquid supply assembly 3, and a control assembly. The tank 1 has a containing space 1a configured to contain liquid. The tank 1 has a detection area 1b. The level gauge 2 is located outside the tank 1 at a position corresponding to the detection area 1b. The level gauge 2 can detect the liquid level in the containing space 1a from outside the tank 1 through the detection area 1b. The liquid supply assembly 3 is located in the tank 1 and has an inlet pipe 31 extending into the containing space 1a. The liquid supply assembly 3 is configured to supply liquid into the containing space 1a from the inlet pipe 31. The control assembly is electrically connected to the level gauge 2 and the liquid supply assembly 3, respectively. The control assembly is configured to control the liquid supply assembly 3 to open or close according to the liquid level detected by the level gauge 2.

[0035] The precursor storage device provided in this embodiment includes a level gauge 2 installed outside the tank 1 and a control component electrically connecting the level gauge 2 and the liquid supply assembly 3. The control component can detect the liquid level in the tank 1 in real time based on the external level gauge 2, so as to replenish the liquid in the tank 1 in a timely manner. When the level gauge 2 malfunctions or the liquid in the tank 1 is contaminated, the external level gauge 2 facilitates maintenance and replacement by personnel, improves loading and unloading efficiency, reduces downtime, and thus improves production efficiency.

[0036] In addition, by using a level gauge 2 installed outside the tank 1, this embodiment of the present disclosure can prevent workers from coming into contact with the high-risk chemical solution stored in the tank 1 when the level gauge 2 malfunctions and needs to be repaired or replaced, thus improving safety performance.

[0037] Optionally, the control component may include an electrically connected controller and a processor. The processor is configured to process various received signals and generate corresponding control signals to feed back to the controller. The controller is configured to receive the liquid level signal from the level gauge 2 and transmit it to the processor for data processing, and is also configured to receive the control signal from the processor and control the liquid supply component 3 to replenish or stop replenishing the tank 1. No further details are provided.

[0038] Optionally, the tank body 1 may be provided with a circular cylindrical structure, and the accommodating space 1a of the tank body 1 is provided as a cylindrical chamber with an axis extending in the vertical direction Z.

[0039] In some optional embodiments, the liquid supply assembly 3 includes a first switching valve and a liquid inlet pipe 31 connected together. The liquid inlet pipe 31 extends at least partially into the accommodating space 1a. The liquid supply assembly 3 also includes a liquid supply device, which is connected or disconnected from the liquid inlet pipe 31 through the first switching valve. The liquid supply device stores a large amount of liquid. The first switching valve is electrically connected to a control assembly, which can control the opening and closing of the first switching valve to replenish liquid into the accommodating space 1a or stop replenishing liquid through the liquid inlet pipe 31.

[0040] Optionally, the first switching valve can be configured as an electric valve, a pneumatic valve, etc., without specific limitations.

[0041] In some embodiments, such as Figure 4 The tank 1 includes a body 11 and a cover plate 12. The body 11 has a receiving cavity, and the cover plate 12 closes to the opening of the receiving cavity to enclose and form a receiving space 1a. The cover plate 12 is provided with a detection area 1b. A level gauge 2 is detachably connected to the cover plate 12, and the probe 21 of the level gauge 2 is opposite to the detection area 1b. When the level gauge 2 is detachably connected to the cover plate 12, the probe 21 of the level gauge 2 is located directly above the liquid in the receiving space 1a, and the probe 21 is located directly above the detection area 1b. The level gauge 2 can detect the height of the probe 21 in the vertical direction Z to the liquid surface in real time through the detection area 1b, thereby determining the liquid level height in the receiving space 1a.

[0042] Optionally, a bracket may be provided on the cover plate 12, and the level gauge 2 may be detachably connected to the bracket for easy replacement of the level gauge 2.

[0043] Optionally, the level gauge 2 can be configured as a radar level gauge. In other embodiments, the level gauge 2 can also be configured as other level detection devices capable of detecting the liquid level height within the accommodating space 1a from the outside, without specific limitations.

[0044] Optionally, the cover plate 12 may be provided with a viewing window, and the area corresponding to the viewing window forms a detection area 1b. The viewing window may be a glass plate that is detachably connected to the opening position of the cover plate 12. The glass plate may be a downwardly concave arc structure or a flat plate structure. The shape and size of the glass plate may be adaptively adjusted according to actual needs. In addition, the distance from the probe 21 to the viewing window may also be adaptively adjusted according to actual needs, as long as the pulse emitted from the probe 21 can pass through the viewing window and be reflected to the liquid surface, so as to determine the liquid level height based on the detected distance from the probe 21 to the liquid surface.

[0045] It is understandable that the viewing window can also be made of other materials that are heat-resistant, not easily deformed, and transparent, and is not limited to glass.

[0046] Optionally, the body 11 and the cover plate 12 can be detachably connected or made into an integral structure, without specific limitations.

[0047] It is understood that the liquid supply assembly 3 can be mounted on the cover plate 12, and the liquid inlet pipe 31 extends through the cover plate 12 into the accommodating space 1a. The liquid inlet pipe 31 can extend vertically from the side of the cover plate 12 along the Z direction to a position close to the bottom wall of the main body 11, thereby reducing fluctuations in the liquid surface within the accommodating space 1a during the replenishment process. Optionally, the diameter of the liquid inlet pipe 31 can be adaptively adjusted according to actual needs, and the distance from the end of the liquid inlet pipe 31 facing the bottom wall of the main body 11 to the bottom wall can also be adaptively adjusted according to actual needs, without specific limitations.

[0048] In some optional embodiments, the tank 1 is provided with a minimum liquid level height 1d and a preset liquid level height 1c. Along the extension direction of the tank 1, the preset liquid level height 1c is located above the minimum liquid level height 1d. When the level gauge 2 detects that the liquid level is less than or equal to the minimum liquid level height 1d, it generates a liquid replenishment signal. The control component controls the liquid supply component 3 to fill the accommodating space 1a with liquid up to the preset liquid level height 1c according to the liquid replenishment signal. The preset liquid level height 1c is the highest liquid level height pre-set in the accommodating space 1a, and the minimum liquid level height 1d is the lowest liquid level height pre-set in the accommodating space 1a, so as to realize automatic liquid replenishment.

[0049] In some alternative embodiments, such as Figure 2 and Figure 4The inner surface of the bottom wall of the tank 1, which encloses the accommodating space 1a, is set as a downwardly concave arc-shaped surface 11a. The arc-shaped surface 11a can be a hemispherical surface, with the axis of the hemispherical surface coinciding with the axis of the tank 1. During the process of emptying the liquid in the tank 1, less liquid can accumulate towards the center of the tank 1, reducing liquid residue. It is understood that the control component can have an emptying mode, in which even if the level gauge 2 detects that the liquid level is lower than the minimum liquid level height 1d, it will not control the liquid supply component 3 to start replenishing liquid.

[0050] Figure 5 The image shown is a front view of an air jet pipe provided in an embodiment of this disclosure. Figure 6 The figure shown is a cross-sectional view of an air jet pipe provided in an embodiment of this disclosure. Figure 7 The figure shown is a cross-sectional view of a jet pipe provided in another embodiment of this disclosure. Figure 8 The figure shown is a cross-sectional view of a jet pipe provided in another embodiment of this disclosure.

[0051] In some embodiments, such as Figure 2 , Figure 3 as well as Figures 5 to 8 The precursor storage device 10 also includes a gas supply assembly 4, which is disposed in the tank 1 and electrically connected to a control assembly. The gas supply assembly 4 is configured to fill the accommodating space 1a with gas. Specifically, the gas supply assembly 4 is detachably connected to the cover plate 12. The gas supply assembly 4 includes a communicating second switching valve and a gas supply pipe assembly, at least a portion of which extends into the accommodating space 1a. The gas supply pipe assembly is connected to a gas storage device 30, which is connected to or disconnected from the gas supply assembly 4 via the second switching valve. The gas storage device 30 stores a large amount of gas, such as nitrogen. The second switching valve is electrically connected to the control assembly, which can control the opening and closing of the second switching valve to fill the accommodating space 1a with nitrogen via the gas supply pipe assembly to mix with the liquid and generate saturated vapor carrying the precursor chemical solution.

[0052] Optionally, the second switching valve can be configured as an electric valve, a pneumatic valve, etc., without specific limitations.

[0053] In some alternative embodiments, such as Figure 2 and Figure 3The gas supply pipe assembly includes an inlet pipe 41 and at least one jet pipe 42 connected to each other. A second switch valve is disposed on a cover plate 12 outside the accommodating space 1a. The second switch valve is connected to the inlet pipe 41. The inlet pipe 41 extends at least partially into the accommodating space 1a from the side of the cover plate 12. The inlet pipe 41 is configured to introduce gas into the accommodating space 1a. The jet pipe 42 is connected to the inlet pipe 41. The jet pipe 42 is located inside the accommodating space 1a. The extension direction of the jet pipe 42 is perpendicular to the extension direction of the tank body 1. Along the extension direction of the jet pipe 42, the pipe wall of the jet pipe 42 is provided with a plurality of interconnected air holes 421. The plurality of air holes 421 are arranged at intervals. Along the extension direction of the tank body 1, the air holes 421 of the jet pipe 42 are lower than or equal to the minimum liquid level height 1d. By positioning the vent 421 of the jet pipe 42 at a position lower than or equal to the lowest liquid level height 1d, the gas ejected from the vent 421 remains below the liquid surface, thereby generating saturated vapor carrying the precursor chemical solution. Furthermore, by positioning the extension direction of the jet pipe 42 perpendicular to the extension direction of the tank 1, the vent 421 is dispersed, causing the ejected gas to be dispersed in different areas. This improves the rate of generating saturated vapor carrying the precursor chemical solution, resulting in better source carrying capacity.

[0054] Optionally, the jet pipe 42 is located near the axis of the tank 1 and near the bottom wall of the main body 11. This allows the air hole 421 to be located below the liquid surface even when there is little liquid in the tank 1, which is beneficial for emptying the liquid in the tank 1.

[0055] Optionally, the diameter of each pore 421 is between 0.8 mm and 1.5 mm, so that nitrogen gas can enter the liquid in the form of dispersed small bubbles, thereby achieving a better source carrying effect. Furthermore, introducing nitrogen gas into the liquid in the form of dispersed small bubbles reduces surface ripples and improves the accuracy of liquid level detection. For example, the diameter of the pore 421 can be set to 0.8 mm, 1 mm, 1.5 mm, etc.

[0056] Optionally, the shape of the cross-section of the pore 421 can also be set to square, elliptical, etc., which can be adapted to actual needs without specific limitations.

[0057] In some alternative embodiments, such as Figures 5 to 8 A single exhaust port 421 may be provided along the circumferential direction of the jet pipe 42, or multiple exhaust ports 421 may be provided at intervals. Each row includes multiple exhaust ports 421 arranged at intervals along the extension direction of the jet pipe 42.

[0058] Optionally, the vent 421 faces the bottom wall of the main body 11 (i.e., the bottom wall of the tank 1), so that the gas ejected from the vent 421 can be directed towards the bottom wall of the main body 11, thus achieving a better source-carrying effect even when the liquid in the tank 1 is low. Figure 8 When an exhaust port 421 is provided, the exhaust port 421 can be located directly below the jet pipe 42, that is, the exhaust port 421 is directly opposite the bottom wall of the body 11, or it can be tilted at a certain angle relative to the axis of the tank 1, that is, the exhaust port 421 is tilted downwards towards the bottom wall of the body 11. Figure 6 and Figure 7 When multiple exhaust ports 421 are provided, the multiple exhaust ports 421 are located in the area of ​​the jet pipe 42 facing the bottom wall of the main body 11. The specific arrangement can be adapted to the actual needs and is not specifically limited.

[0059] Optionally, such as Figure 5 Along the extension direction of the jet pipe 42, multiple air holes 421 in each row are arranged at equal intervals.

[0060] Optionally, such as Figure 5 The spacing L between two adjacent vents 421 in the same row is between 10mm and 15mm, such as 10mm, 12mm, 15mm, etc.

[0061] In some alternative embodiments, such as Figure 3 The number of jet lines 42 may include one, two or more. When the number of jet lines 42 includes two or more, the multiple jet lines 42 are arranged crosswise and interconnected in the extension direction perpendicular to the tank body 1 (i.e., the radial direction of the tank body 1) so that nitrogen can be dispersed.

[0062] For example, when there are two jet pipes 42, one jet pipe 42 extends along a first direction X and the other jet pipe 42 extends along a second direction Y. The plane formed by the first direction X and the second direction Y is parallel to the radial direction of the tank body 1, and the two jet pipes 42 intersect to form a cross-shaped structure. In other embodiments, when there are three jet pipes 42, the multiple jet pipes 42 intersect to form a star-shaped structure. This can be adapted according to actual needs and is not specifically limited.

[0063] It should be emphasized that the number and arrangement of the jet pipes 42, as well as the arrangement of the air holes 421 in the jet pipes 42, can be adapted to actual needs and are not specifically limited.

[0064] In some embodiments, such as Figure 2The precursor storage device 10 also includes a gas venting assembly 5, which is disposed in the tank 1 and electrically connected to a control assembly. The gas venting assembly 5 is configured to vent the gas in the containment space 1a to the furnace chamber 20a of the process furnace 20. Specifically, the gas venting assembly 5 includes a third switching valve and a gas venting pipeline connected in series. The gas venting pipeline extends at least partially into the containment space 1a. The gas venting assembly 5 is connected to the furnace chamber 20a of the process circuit. The third switching valve is electrically connected to the control assembly, which can control the opening and closing of the third switching valve to provide saturated vapor carrying the precursor chemical solution to the furnace chamber 20a via the gas venting pipeline or to stop providing saturated vapor carrying the precursor chemical solution.

[0065] Optionally, the third switching valve can be configured as an electric valve, a pneumatic valve, etc., without specific limitations.

[0066] Optionally, the third switch valve is detachably connected to the cover plate 12 and located outside the accommodating space 1a. The vent pipe extends through the cover plate 12 into the accommodating space 1a, and the end of the vent pipe located inside the accommodating space 1a is vertically higher than the preset liquid level height 1c, so that the saturated vapor of the precursor chemical solution generated in the tank 1 can be smoothly discharged.

[0067] This disclosure also provides a process apparatus, such as... Figure 1 The process equipment 100 includes a process furnace 20 and a precursor storage device 10. The process furnace 20 has a furnace cavity 20a and is configured to process the sheet 40 in the furnace cavity 20a. The precursor storage device 10 is disposed on one side of the process furnace 20 and is configured to supply gas (saturated vapor carrying precursor chemical solution) to the furnace cavity 20a.

[0068] It is understood that the precursor storage device 10 and the cooperation between the precursor storage device 10 and the process furnace 20 can be referred to the relevant descriptions of the above embodiments, and will not be repeated here.

[0069] In the embodiments of this disclosure, unless otherwise specified, the connection can be a detachable connection using bolts and nuts, screws, clips, magnetic attraction, etc. In some connections where there is no particular requirement for a detachable fit, a non-detachable connection can be achieved through welding, bonding, or other methods.

[0070] The basic principles of this disclosure have been described above with reference to specific embodiments. However, it should be noted that the advantages, benefits, and effects mentioned in this disclosure are merely examples and not limitations, and should not be considered as essential features of each embodiment of this disclosure. Furthermore, the specific details disclosed above are for illustrative and facilitative purposes only, and are not limitations. These details do not limit the scope of this disclosure to the necessity of employing the aforementioned specific details for implementation.

[0071] The block diagrams of devices, apparatuses, devices, and systems disclosed herein are merely illustrative examples and are not intended to require or imply that they must be connected, arranged, or configured in the manner shown in the block diagrams. As those skilled in the art will recognize, these devices, apparatuses, devices, and systems can be connected, arranged, and configured in any manner. Words such as “comprising,” “including,” “having,” etc., are open-ended terms meaning “including but not limited to,” and are used interchangeably with them. The terms “or” and “and” as used herein refer to the terms “and / or,” and are used interchangeably with them unless the context clearly indicates otherwise. The term “such as” as used herein refers to the phrase “such as but not limited to,” and is used interchangeably with it.

[0072] It should also be noted that in the apparatus, devices, and methods of this disclosure, the components or steps can be disassembled and / or recombined. These disassemblies and / or recombinations should be considered as equivalent solutions to this disclosure.

[0073] The above description of the disclosed aspects is provided to enable any person skilled in the art to make or use this disclosure. Various modifications to these aspects will be readily apparent to those skilled in the art, and the general principles defined herein may be applied to other aspects without departing from the scope of this disclosure. Therefore, this disclosure is not intended to be limited to the aspects shown herein, but rather to be carried out within the widest scope consistent with the principles and novel features disclosed herein.

[0074] The above description has been given for purposes of illustration and description. Furthermore, this description is not intended to limit the embodiments of this disclosure to the forms disclosed herein. Although numerous exemplary aspects and embodiments have been discussed above, those skilled in the art will recognize certain variations, modifications, alterations, additions, and sub-combinations therein.

Claims

1. A precursor storage device, characterized in that, include: The tank has a accommodating space configured to hold liquid, and the tank has a detection area; A level gauge is installed outside the tank at a position corresponding to the detection area. The level gauge can detect the liquid level height in the containment space from outside the tank through the detection area. A liquid supply assembly is disposed in the tank body, the liquid supply assembly having a liquid inlet pipe extending into the accommodating space, the liquid supply assembly being configured to supply liquid from the liquid inlet pipe into the accommodating space; A control component is electrically connected to the level gauge and the liquid supply component, respectively, and the control component is configured to control the opening or closing of the liquid supply component based on the liquid level height detected by the level gauge.

2. The precursor storage device according to claim 1, characterized in that, The tank includes: The main body has a accommodating cavity; A cover plate is fitted over the opening of the accommodating cavity to enclose and form the accommodating space. The cover plate is provided with the detection area. The level gauge is detachably connected to the cover plate, and the probe of the level gauge is opposite to the detection area.

3. The precursor storage device according to claim 1, characterized in that, The tank has a minimum liquid level height and a preset liquid level height. Along the extension direction of the tank, the preset liquid level height is located above the minimum liquid level height. When the level gauge detects that the liquid level is less than or equal to the minimum liquid level, it generates a liquid replenishment signal. The control component controls the liquid supply component to fill the accommodating space with liquid up to the preset liquid level according to the liquid replenishment signal.

4. The precursor storage device according to claim 3, characterized in that, Also includes: A gas supply assembly is disposed in the tank body, the gas supply assembly is electrically connected to the control assembly, and the gas supply assembly is configured to fill the accommodating space with gas.

5. The precursor storage device according to claim 4, characterized in that, The gas supply assembly includes: An intake pipe, at least partially extending into the accommodating space, is configured to introduce gas into the accommodating space; At least one jet pipe is connected to the air inlet pipe. The jet pipe is located within the accommodating space. The extension direction of the jet pipe is perpendicular to the extension direction of the tank body. Along the extension direction of the jet pipe, the pipe wall of the jet pipe is provided with a plurality of interconnected air holes. The plurality of air holes are arranged at intervals. Along the extension direction of the tank body, the air holes of the jet pipe are lower than or equal to the minimum liquid level height.

6. The precursor storage device according to claim 5, characterized in that, The diameter of each of the vents is between 0.8 mm and 1.5 mm, and / or, multiple vents are arranged at equal intervals, and / or, the distance between two adjacent vents is between 10 mm and 15 mm, and / or, the vents face the bottom wall of the tank; and / or, the number of the jet pipes includes two or more, and multiple jet pipes are arranged crosswise and interconnected in the extension direction perpendicular to the tank.

7. The precursor storage device according to any one of claims 1-6, characterized in that, The inner surface of the bottom wall of the tank that encloses the accommodating space is a downwardly concave arc-shaped surface.

8. The precursor storage device according to any one of claims 1-6, characterized in that, The level gauge is configured as a radar level gauge, and / or the tank body is provided with a viewing window, and the area corresponding to the viewing window forms the detection area.

9. The precursor storage device according to any one of claims 1-6, characterized in that, Also includes: A gas outlet assembly is disposed in the tank body, the gas outlet assembly is electrically connected to the control assembly, and the gas outlet assembly is configured to export the gas in the containment space to the furnace cavity of the process furnace.

10. A process equipment, characterized in that, include: A process furnace having a furnace cavity, the process furnace being configured to process sheets within the furnace cavity; The precursor storage device according to any one of claims 1 to 9 is disposed on one side of the process furnace, and the precursor storage device is configured to supply gas to the furnace cavity.

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