Ultra-pure water treatment system for new energy vehicle thermal management liquid

Abstract

The utility model relates to the technical field of ultrapure water preparation, disclose a ultrapure water treatment system for new energy automobile heat management liquid, including first placing rack, second placing rack, first placing rack is used to place reverse osmosis membrane filter device, first high pressure pump, second high pressure pump, second placing rack is used to place EDI electrolytic device, water pump, electric cabinet, first placing rack includes first pedestal and first support frame, first pedestal includes a plurality of first support columns of row and column arrangement, a plurality of first support legs are arranged at the interval of row and column on first pedestal, the height of first support leg is greater than pipeline diameter, first pedestal is placed on ground through first support leg, first pedestal is used to place first high pressure pump, second high pressure pump. The utility model can reasonably layout and reduce the floor area, can prevent pipeline rupture, avoid the influence continuous supply of ultrapure water.

Description

Technical Field

[0001] This utility model relates to the technical field, specifically to an ultrapure water treatment system for thermal management fluid in new energy vehicles. Background Technology

[0002] The ultrapure water treatment system includes a raw water tank, a coarse filter, a reverse osmosis membrane filtration device, an intermediate water tank, an electro-deionization device (also known as an EDI electrolysis device), and a storage tank. The reverse osmosis membrane filtration device is used for two-stage filtration and includes a first-stage reverse osmosis membrane element and a second-stage reverse osmosis membrane element. The raw water tank, coarse filter, first-stage reverse osmosis membrane element, intermediate water tank, second-stage reverse osmosis membrane element, EDI electrolysis device, and storage tank are connected in sequence to produce ultrapure water. A first high-pressure pump is installed between the coarse filter and the first-stage reverse osmosis membrane element, a second high-pressure pump is installed between the intermediate water tank and the second-stage reverse osmosis membrane element, and a water pump is installed between the EDI electrolysis device and the storage tank.

[0003] In existing ultrapure water treatment systems, the placement of equipment and management of pipelines often lack a unified layout. For example, reverse osmosis membrane filtration devices, high-pressure pumps, EDI electrolysis devices, water pumps, and other equipment are scattered, which not only takes up a large area, but also sometimes leaves water stains on the factory floor. Equipment in ultrapure water treatment systems is prone to damage or performance degradation due to contact with water. Moreover, due to the lack of effective support and restraint, pipelines are prone to displacement, deformation, or even rupture during system operation due to factors such as vibration and pressure changes, resulting in water leakage and system shutdown for maintenance, which affects the continuous supply of ultrapure water. Utility Model Content

[0004] In order to overcome the shortcomings of the existing technology, the purpose of this utility model is to provide an ultrapure water treatment system for thermal management fluid in new energy vehicles, which has a reasonable layout to reduce the floor space, can prevent pipe rupture, and avoid affecting the continuous supply of ultrapure water.

[0005] The technical solution adopted by this utility model is as follows: an ultrapure water treatment system for thermal management fluid of new energy vehicles, including a first placement rack and a second placement rack. The first placement rack is used to place a reverse osmosis membrane filter device, a first high-pressure pump, and a second high-pressure pump. The first placement rack is also used to provide support and limit the pipeline. The second placement rack is used to place an EDI electrolysis device, a water pump, and an electrical control box. The second placement rack is also used to provide support and limit the pipeline.

[0006] Explanation: A stable DC power supply is required during operation. The control box can rectify and filter the input AC power supply to convert it into a DC power supply suitable for the operation of the EDI electrolysis device. It can also adjust the output voltage and current according to the needs of the EDI electrolysis device to ensure stable operation of the EDI electrolysis device under different operating conditions. The operation of the EDI electrolysis device can be started or stopped by the main power switch in the control box.

[0007] Compared with the prior art, the beneficial effects of this utility model are as follows: This utility model, through the setting of a first and a second placement rack, enables a reasonable layout of equipment in the ultrapure water treatment system, reducing the floor space occupied and installation steps, preventing pipe rupture, and avoiding disruption to the continuous supply of ultrapure water. The specific analysis is as follows: 1) Currently, the first and second high-pressure pumps are scattered outside the reverse osmosis membrane filter device. Placing the first high-pressure pump, the second high-pressure pump, and the reverse osmosis membrane filter device on the first placement rack limits their positions, placing them in designated locations for centralized management, reducing floor space occupied. Furthermore, the first placement rack provides support and limits for the pipes, ensuring the pipes are always within the rack, allowing for pipe management and preventing displacement, deformation, or rupture due to vibration, pressure changes, etc., thus ensuring continuous ultrapure water production; 2) The electrical control box, water pump, and EDI electrolysis device are uniformly placed on the second placement rack, allowing for better control of the electrical control box, water pump, and EDI electrolysis device. The electrolysis unit location provides both support and limiting. Through the second placement rack, the electrical control box can be placed closer to the EDI electrolysis unit, which can greatly shorten the length of power transmission lines and control signal lines, improve power transmission efficiency, and ensure that the EDI electrolysis unit receives a stable and accurate power supply and control signal. It can simplify the layout and connection of the lines, reduce installation time and difficulty, and in subsequent maintenance and repair, technicians can more easily check the line connection status, quickly locate and solve electrical faults, improve maintenance efficiency, optimize the spatial layout of the equipment, reduce the floor space occupied between equipment, and improve space utilization. The second placement rack can also provide support and limiting for the pipelines, preventing the pipelines from shifting, deforming, or breaking due to factors such as vibration and pressure changes, and ensuring the continuous production of ultrapure water; 3) There is no need to install support bases for each piece of equipment in the ultrapure water treatment system. The equipment in the ultrapure water treatment system can be placed directly on the corresponding placement rack, reducing installation steps.

[0008] As a preferred embodiment of the present utility model, the first placement frame includes a first base and a first support frame. The first base includes multiple first support columns arranged in rows and columns. Multiple first legs are arranged at intervals on the first base. The height of the first legs is greater than the diameter of the pipe. The first base is placed on the ground through the first legs. The first base is used to place the first high-pressure pump and the second high-pressure pump. The first support frame is connected to the first base. The first support frame is used to place the reverse osmosis membrane filter device. The outer edge of the first support frame is located inside the outer edge of the first base. The pipe is located between the outer edge of the first support frame and the outer edge of the first base. The pipe on the first base is welded to the first base. The first high-pressure pump and the second high-pressure pump are located on one side of the first base, and the first support frame is located on the other side of the first base.

[0009] Beneficial effects: Multiple first supports create a gap between the first base and the ground, facilitating pipe passage. This allows the pipes between the first high-pressure pump, the reverse osmosis membrane filter, and the second high-pressure pump to be laid out within the outer edge of the first mounting frame. The first and second high-pressure pumps are located on one side of the first base, while the first support frame is located on the other side. This allows for a more rational layout of the pipes between the first high-pressure pump, the reverse osmosis membrane filter, and the second high-pressure pump. For example, the pipes between the first high-pressure pump and the reverse osmosis membrane filter, and the pipes between the second high-pressure pump and the reverse osmosis membrane filter, can be located on opposite sides of the first support frame. The pipes on the first base are welded to the first base, increasing the stability of the pipe position and preventing displacement, deformation, or breakage due to vibration, pressure changes, etc. It also eliminates the need to damage the factory floor, allowing for pipe installation on the factory floor.

[0010] In a preferred embodiment of the present invention, the first placement frame further includes an auxiliary support component for providing support for the first high-pressure pump or the second high-pressure pump. The auxiliary support component includes a first support plate and second support plates located on both sides of the first support plate and in the same direction. The upper surface of the first support plate and the upper surface of the first base are located on the same horizontal plane. Both second support plates are provided with threaded holes. The second support plates are threadedly connected to connecting columns through the threaded holes. The connecting columns can abut against the inner wall of the first support column.

[0011] Beneficial effects: Since the first base is formed by multiple rows and columns of first support columns, the distance between two adjacent first support columns may be too large, or additional first support columns may need to be welded to improve the stability of the first high-pressure pump, thus reducing the distance between adjacent first support columns. Connection holes also need to be provided on the first base to allow the first high-pressure pump to be connected to the first base with bolts. In order to reduce the modification and additional processing of the first base and ensure the support strength of the first base, the auxiliary support component can flexibly and easily provide support for the first high-pressure pump or the second high-pressure pump. By abutting against the inner wall of the first support column, it can provide support for the first high-pressure pump or the second high-pressure pump without permanent modification to the first base. Moreover, the modular nature of the auxiliary support component allows it to be quickly disassembled and replaced in subsequent maintenance.

[0012] As a preferred embodiment of the present invention, the second placement frame includes a second base and a second support frame. The second base includes multiple second support columns arranged in rows and columns. Multiple second legs are arranged at intervals on the second base. The height of the second legs is greater than the diameter of the pipe. The second base is placed on the ground by the second legs. The second base is used to place water pumps and EDI electrolysis devices. The second support frame is connected to the second base. The second support frame is used to place the electrical control box, which is located above the EDI electrolysis device. The second support frame and the second base enclose a first space for limiting the pipe. The electrical control box is located on one side of the first space, and the pipe located above the second base is welded to the second base.

[0013] Beneficial effects: Multiple second supports allow a gap between the second base and the ground, positioning the piping between the water pump and the EDI electrolysis unit within the outer edge of the second mounting frame. The electrical control box, located on the second support frame, is kept away from the factory ground, preventing contact with water and ensuring safe operation. The electrical control box is close to the EDI electrolysis unit, allowing signals collected by sensors in the unit to be quickly transmitted to the control box. Control commands issued by the control box can also quickly reach the actuators of the EDI electrolysis unit, achieving rapid and accurate control response. This avoids control errors caused by signal transmission delays and reduces electromagnetic interference to the circuitry, improving system reliability and safety.

[0014] In a preferred embodiment of this utility model, the heights of both the first and second placement racks are between 1.8 meters and 2 meters.

[0015] Beneficial effects: It allows technicians to check the status of each piece of equipment in a timely manner, ensuring that technicians do not need to use additional auxiliary tools when conducting daily inspections, maintenance or replacement of parts, reducing labor intensity and improving work efficiency. Attached Figure Description

[0016] Figure 1 This is a schematic diagram of the structure of the first and second placement racks in the ultrapure water treatment system for thermal management fluid of new energy vehicles according to this utility model; Figure 2 This is a structural schematic diagram of the first and second placement racks from another angle in the ultrapure water treatment system for thermal management fluid of new energy vehicles according to this utility model; Figure 3 This is a structural schematic diagram of the first and second placement racks at another angle in the ultrapure water treatment system for thermal management fluid of new energy vehicles according to this utility model; Figure 4 This is a schematic diagram of the structure of the first placement rack in the ultrapure water treatment system for thermal management fluid of new energy vehicles according to this utility model; Figure 5This is a structural schematic diagram of the auxiliary support component used in the ultrapure water treatment system for thermal management fluid in new energy vehicles. Detailed Implementation

[0017] Typical embodiments embodying the features and advantages of this utility model will be specifically described in the following description. It should be understood that this utility model can have various variations in different embodiments, all of which do not depart from the scope of this utility model, and the descriptions and illustrations therein are for illustrative purposes only and not intended to limit this utility model.

[0018] In the description of this application, the terms "first," "second," "side," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the structure referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application.

[0019] The present invention will now be described in detail with reference to the accompanying drawings and embodiments.

[0020] The reference numerals in the attached drawings include: 1. Reverse osmosis membrane filtration device; 2. EDI electrolysis device; 3. First high-pressure pump; 4. Second high-pressure pump; 501. First base; 502. First support frame; 503. First support column; 504. First support plate; 505. Second support plate; 506. Threaded hole; 507. Connecting column; 508. Second base; 601. Second support frame; 602. Second support column; 603. Second support column; 604. Second support leg; 7. Electrical control box; 8. Water pump; 9. First space.

[0021] An ultrapure water treatment system for thermal management fluid in new energy vehicles includes a raw water tank, a coarse filter, a reverse osmosis membrane filtration device 1, an intermediate water tank, an EDI electrolysis device 2, a storage tank, a first rack, and a second rack. The reverse osmosis membrane filtration device 1 is used for two-stage filtration and includes a first-stage reverse osmosis membrane element and a second-stage reverse osmosis membrane element. The raw water tank, coarse filter, first-stage reverse osmosis membrane element of reverse osmosis membrane filtration device 1, intermediate water tank, second-stage reverse osmosis membrane element of reverse osmosis membrane filtration device 1, EDI electrolysis device 2, and storage tank are connected in sequence to produce ultrapure water. Figure 1 As shown, a first high-pressure pump 3 is installed between the coarse filter and the first-stage reverse osmosis membrane element in the reverse osmosis membrane filtration device 1, such as... Figure 2 As shown, a second high-pressure pump 4 is installed between the intermediate water tank and the second-stage reverse osmosis membrane element in the reverse osmosis membrane filtration device 1, such as... Figure 3As shown, a water pump 8 is provided between the EDI electrolysis device 2 and the storage tank. The first placement rack is used to place the reverse osmosis membrane filter device 1, the first high-pressure pump 3, and the second high-pressure pump 4. The first placement rack is also used to provide support and limit the pipeline. The second placement rack is used to place the EDI electrolysis device 2, the water pump 8, and the electrical control box 7. The second placement rack is also used to provide support and limit the pipeline.

[0022] The height of both the first and second placement racks is between 1.8 meters and 2 meters.

[0023] In this embodiment, the preparation of ultrapure water is a prior art technique, and can be referenced in the patent document with patent publication number CN213623688U.

[0024] like Figure 1 As shown, the first placement frame includes a first base 501 and a first support frame 502, as well as an auxiliary support member for providing support for the first high-pressure pump 3 or the second high-pressure pump 4. The first base 501 includes multiple rows of first support columns 503, which are arranged in rows to form the first base 501.

[0025] The first base 501 is provided with multiple first legs 504 at intervals. The height of the first legs 504 is greater than the diameter of the pipe. The first base 501 is placed on the ground by the first legs 504. The first base 501 is used to place the first high-pressure pump 3 and the second high-pressure pump 4.

[0026] The first support frame 502 is connected to the first base 501. The first support frame 502 is used to place the reverse osmosis membrane filter device 1. In this embodiment, the first support frame 502 includes four vertically placed vertical beams. Multiple horizontal beams are provided between the two vertical beams arranged along the width direction of the first base 501. The reverse osmosis membrane element is placed on the first support frame 502 through the horizontal beams.

[0027] The outer edge of the first support frame 502 is located inside the outer edge of the first base 501. The pipe is located between the outer edge of the first support frame 502 and the outer edge of the first base 501. The pipe on the first base 501 is welded to the first base 501. The first high-pressure pump 3 and the second high-pressure pump 4 are located on one side of the first base 501, and the first support frame 502 is located on the other side of the first base 501.

[0028] like Figure 4 , 5As shown, the auxiliary support includes a first support plate 505 and second support plates 506 located on both sides of the first support plate 505 and in the same direction. The upper surface of the first support plate 505 and the upper surface of the first base 501 are on the same horizontal plane. Both second support plates 506 are provided with threaded holes 507. In this embodiment, threaded holes can be symmetrically provided on the second support plates 506. The second support plates 506 are threadedly connected to connecting posts 508 through the threaded holes 507. The connecting posts 508 can abut against the inner wall of the first support post 503.

[0029] In this embodiment, the first support plate 505 is provided with a connection hole, and the high-pressure pump is bolted to the first support plate 505 through the connection hole, eliminating the need to provide a through hole on the first base 501, thus ensuring the support strength of the first base 501.

[0030] The second placement frame includes a second base 601 and a second support frame 602. The second base 601 includes multiple rows of second support columns 603 arranged in columns. The second base 601 is enclosed by multiple rows of second support columns 603. Multiple second legs 604 are arranged at intervals on the second base 601. The height of the second legs 604 is greater than the diameter of the pipe. The second base 601 is placed on the ground by the second legs 604. The second base 601 is used to place the water pump 8 and the EDI electrolysis device 2.

[0031] like Figure 2 , 3 As shown, the second support frame 602 is connected to the second base 601. The second support frame 602 is used to place the electrical control box 7. The electrical control box 7 is located above the EDI electrolysis device 2. The second support frame 602 and the second base 601 enclose a first space 9 for limiting the pipe. The electrical control box 7 is located on one side of the first space 9. The pipe located above the second base 601 is welded to the second base 601.

[0032] The above embodiments are merely preferred embodiments of this utility model and should not be construed as limiting the scope of protection of this utility model. Any non-substantial changes and substitutions made by those skilled in the art based on this utility model shall fall within the scope of protection claimed by this utility model.

Claims

1. An ultrapure water treatment system for thermal management fluid in new energy vehicles, characterized in that: It includes a first placement rack and a second placement rack. The first placement rack is used to place the reverse osmosis membrane filtration device, the first high-pressure pump, and the second high-pressure pump. The first placement rack is also used to provide support and limit the pipeline. The second placement rack is used to place the EDI electrolysis device, the water pump, and the electrical control box. The second placement rack is also used to provide support and limit the pipeline.

2. The ultrapure water treatment system for thermal management fluid in new energy vehicles according to claim 1, characterized in that: The first placement frame includes a first base and a first support frame. The first base includes multiple first support columns arranged in rows and columns. Multiple first legs are arranged at intervals on the first base. The height of the first legs is greater than the diameter of the pipe. The first base is placed on the ground through the first legs. The first base is used to place the first high-pressure pump and the second high-pressure pump. The first support frame is connected to the first base. The first support frame is used to place the reverse osmosis membrane filter device. The outer edge of the first support frame is located inside the outer edge of the first base. The pipe is located between the outer edge of the first support frame and the outer edge of the first base. The pipe on the first base is welded to the first base. The first high-pressure pump and the second high-pressure pump are located on one side of the first base, and the first support frame is located on the other side of the first base.

3. The ultrapure water treatment system for thermal management fluid in new energy vehicles according to claim 2, characterized in that: The first mounting frame also includes auxiliary support components for providing support for the first high-pressure pump or the second high-pressure pump. The auxiliary support components include a first support plate and second support plates located on both sides of the first support plate and in the same direction. The upper surface of the first support plate and the upper surface of the first base are located on the same horizontal plane. Both second support plates are provided with threaded holes. The second support plates are threadedly connected to connecting columns through the threaded holes. The connecting columns can abut against the inner wall of the first support column.

4. The ultrapure water treatment system for thermal management fluid in new energy vehicles according to claim 1, characterized in that: The second placement frame includes a second base and a second support frame. The second base includes multiple second support columns arranged in rows and columns. Multiple second legs are arranged at intervals on the second base. The height of the second legs is greater than the pipe diameter. The second base is placed on the ground by the second legs. The second base is used to place water pumps and EDI electrolysis devices. The second support frame is connected to the second base. The second support frame is used to place the electrical control box, which is located above the EDI electrolysis device. The second support frame and the second base enclose a first space for limiting the pipe. The electrical control box is located on one side of the first space, and the pipe located above the second base is welded to the second base.

5. The ultrapure water treatment system for thermal management fluid in new energy vehicles according to claim 1, characterized in that: The height of both the first and second placement racks is between 1.8 meters and 2 meters.

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