Ion bombardment cleaning assembly and vacuum coating feed chamber

Abstract

The utility model belongs to vacuum coating field field, specifically relates to a kind of ion bombardment cleaning assembly and vacuum coating feed cavity. Wherein ion bombardment cleaning assembly includes the power supply part, conducting part and ion bombardment part that are sequentially arranged;Ion bombardment part includes the protection plate and ion bombardment plate that are sequentially arranged along the direction of power supply part to ion bombardment part, and the projection of protection plate towards ion bombardment plate direction fully covers ion bombardment plate;Power supply part is used to provide radio frequency power supply to ion bombardment plate through conducting part, so that high-voltage electron or ion is generated on ion bombardment plate, and the substrate in vacuum coating feed cavity is ion cleaned. The ion bombardment cleaning assembly is strongly and uniformly bombarded and cleaned to the substrate surface, effectively removes contaminant and oxide layer, and significantly improves film base bonding force.

Description

Technical Field

[0001] This utility model belongs to the field of vacuum coating, specifically relating to an ion bombardment cleaning component and a vacuum coating feed chamber. Background Technology

[0002] Ion bombardment cleaning is an optional pretreatment process before vacuum coating. It utilizes high-energy ions generated by glow discharge to bombard the substrate surface, effectively removing physically adsorbed contaminants and chemically adsorbed oxides, and significantly increasing surface energy, thereby greatly enhancing film adhesion. However, traditional ion source or electrode designs typically expose them directly within the process chamber. While bombarding the substrate with high-energy ions, the electrodes themselves and the chamber are inevitably bombarded and sputtered, causing corrosion. More seriously, sputtered electrode material atoms contaminate the chamber walls and substrate, forming difficult-to-remove defects. This secondary contamination effect contradicts the original purpose of cleaning. Therefore, developing a long-life, highly stable ion bombardment cleaning assembly that can efficiently generate plasma while effectively protecting the electrodes and chamber from contamination has become a long-standing technical challenge in this field. Utility Model Content

[0003] The technical problem to be solved by this utility model is to provide an ion bombardment cleaning component and a vacuum coating feed chamber that balances efficient cleaning and equipment protection through a protective plate design.

[0004] This utility model also provides an ion bombardment cleaning assembly, comprising a power supply unit, a conductive unit, and an ion bombardment unit arranged sequentially. The power supply unit is located outside the vacuum coating feed chamber, the ion bombardment unit is located inside the cavity assembly of the vacuum coating feed chamber, and the conductive part passes through the cavity assembly of the vacuum coating feed chamber to electrically connect the power supply unit and the ion bombardment unit. The ion bombardment section includes a protective plate and an ion bombardment plate arranged sequentially along the direction from the power supply section to the ion bombardment section, and the projection of the protective plate toward the ion bombardment plate completely covers the ion bombardment plate. The power supply unit is used to provide radio frequency power to the ion bombardment plate through the conductive part, so that high voltage electrons or ions are generated on the ion bombardment plate to perform ion cleaning on the substrate in the vacuum coating feed chamber.

[0005] Furthermore, the ion bombardment plate includes a frame and a metal mesh covering the frame.

[0006] Furthermore, the power supply unit includes a shielding cover, a conductive blind plate, and an insulation device; The conductive blind plate is fixed inside the shielding cover by an insulating device, and the conductive blind plate is used to connect to the power supply.

[0007] Furthermore, the conductive part includes a conductive post connecting the conductive blind plate and the ion bombardment plate, and an insulating sleeve disposed outside the conductive post.

[0008] Furthermore, a small shaft is provided at the end of the conductive post near the ion bombardment plate; A through hole is provided between the protective plate and the ion bombardment plate, and the protective plate and the ion bombardment plate are detachably and fastened to the small shaft through the through hole.

[0009] Furthermore, the ion bombardment section also includes several isolation columns for separating the ion bombardment plate and the protective plate; One end of the isolation column is detachably and fixedly connected to the ion bombardment plate, and the other end is detachably and fixedly connected to the protective plate.

[0010] This utility model also provides a vacuum coating feed chamber, characterized in that it includes a chamber assembly and an ion bombardment cleaning assembly disposed within the chamber assembly.

[0011] Furthermore, the vacuum coating feed chamber also includes a temperature equalization heating component disposed within the chamber assembly and disposed opposite to the ion bombardment cleaning assembly.

[0012] Furthermore, the vacuum coating feed chamber also includes a transmission assembly disposed within the chamber assembly, the transmission assembly being used to transport the substrate along the surface direction of the substrate. The uniform temperature heating component and the ion bombardment cleaning component are respectively located on both sides of the conveying path of the transmission component.

[0013] The ion bombardment cleaning assembly provided by this invention has the following beneficial effects: The power supply unit is located outside the cavity of the cavity assembly and electrically connected via a dedicated conductive part. This ensures that high-power radio frequency energy can be efficiently and stably transmitted to the ion bombardment plate inside the cavity assembly, avoiding interference from the internal environment and temperature of the cavity. The ion bombardment plate directly faces the substrate and can efficiently ionize process gases in a low-vacuum environment, generating uniform, high-density plasma. This plasma powerfully and uniformly bombards and cleans the substrate surface, effectively removing contaminants and oxide layers, and significantly improving film-substrate adhesion.

[0014] The ion bombardment plate generates a strong glow discharge under high-voltage radio frequency. The shielding plate completely blocks high-speed sputtered metal particles (from the ion bombardment plate and the substrate) from directly impacting and depositing onto the cavity wall of the cavity assembly. This fundamentally prevents the cavity wall from being damaged by sputtering erosion. More importantly, it completely avoids sputtering of the cavity assembly's metal material to contaminate the substrate, thus ensuring the extremely high purity and quality of the coated product.

[0015] In addition, the flat protective plate helps to form a more uniform electric field and plasma distribution in front of it, thereby making the ion bombardment cleaning process on the substrate surface more consistent and without dead corners, avoiding localized cleaning that is too strong or too weak. Attached Figure Description

[0016] Appendix Figure 1 This is a schematic diagram of the first angle structure of the vacuum coating feed chamber in this utility model; Appendix Figure 2 This is a schematic diagram of the second angle structure of the vacuum coating feed chamber in this utility model; Appendix Figure 3 This is a schematic diagram of the vacuum coating feed chamber at the first angle in this utility model; Appendix Figure 4 This is a second-angle explosion diagram of the vacuum coating feed chamber in this utility model; Appendix Figure 5 This is a schematic diagram of the cavity assembly in this utility model; Appendix Figure 6 This is a schematic diagram of the structure of the cavity door assembly of this utility model; Appendix Figure 7 This is a front view of the ion bombardment cleaning assembly of this utility model; Appendix Figure 8 For the appendix Figure 7 Sectional view along line AA; Appendix Figure 9 This is a right view of the ion bombardment cleaning assembly of this utility model; Appendix Figure 10 This is an exploded view of the uniform temperature heating component in this utility model; Appendix Figure 11 This is a schematic diagram of the structure of the feed compartment door assembly in this utility model; Appendix Figure 12 This is a top view of the feed compartment door assembly in this utility model; Appendix Figure 13 For the appendix Figure 12 Sectional view along the BB direction.

[0017] In the diagram, 1-Cavity assembly; 101-Cavity; 1011-Inlet; 1012-Outlet; 1013-Maintenance port; 102-Atmospheric confirmer; 103-Low vacuum gauge; 104-High vacuum gauge; 105-Glass window; 106-Void breaking assembly; 2-Cavity door assembly; 3-Transmission roller mechanism; 4-Platform assembly; 5-Roughing assembly; 6-Transition chamber door assembly; 7-Inlet chamber door assembly; 701-Guide rail; 702-Door panel assembly; 7021-Door panel; 7022-Pressure drive mechanism; 7023-Door core; 703-Door opening and closing drive assembly; 8-Uniform temperature heating assembly; 801-Mounting base; 8011-Mounting plate; 8012-Side plate; 802-Uniform temperature protection plate; 803-Heating tube; 8 04-Support column; 9-Magnetic permeability assembly; 10-Ion bombardment cleaning assembly; 1001-Power supply unit; 10011-Shielding cover; 10012-Conductive blind plate; 10013-Insulating pad; 1002-Conductive part; 10021-Conductive column; 100211-Small shaft; 10022-Insulating sleeve; 1003-Ion bombardment unit; 10031-Protective plate; 10032-Ion bombardment plate; 100321-Frame; 100322-Metal mesh; 10033-Isolation column; 11-Substrate mounting bracket; 1101-Rod; 1102-Magnetic block; 1103-Mounting groove; 12-Substrate; 13-High vacuum assembly; 1301-Molecular pump; 1302-Vacuum channel; 1303-Instrument valve. Detailed Implementation

[0018] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0019] It should be noted that all directional indicators (such as up, down, left, right, front, back, etc.) in this utility model embodiment are only used to explain the relative positional relationship and movement of each component in a certain specific posture (as shown in the figure). If the specific posture changes, the directional indicator will also change accordingly.

[0020] Furthermore, in this utility model, the use of terms such as "first," "second," etc., is for descriptive purposes only and should not be construed as indicating or implying their relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this utility model, "multiple" means at least two, such as two, three, etc., unless otherwise explicitly specified.

[0021] In this utility model, unless otherwise explicitly specified and limited, the terms "connection," "fixed," etc., should be interpreted broadly. For example, "fixed" can mean a fixed connection, a detachable connection, or an integral part; it can mean a mechanical connection, an electrical connection, a physical connection, or a wireless communication connection; it can mean a direct connection or an indirect connection through an intermediate medium; it can mean the internal connection of two components or the interaction between two components, unless otherwise explicitly limited. Those skilled in the art can understand the specific meaning of the above terms in this utility model according to the specific circumstances.

[0022] Furthermore, the technical solutions of the various embodiments of this utility model can be combined with each other, but only if they are based on the ability of those skilled in the art to implement them. When the combination of technical solutions is contradictory or cannot be implemented, it should be considered that such combination of technical solutions does not exist and is not within the scope of protection claimed by this utility model.

[0023] As attached Figure 1 -Appendix Figure 13 As shown, this utility model provides an ion bombardment cleaning assembly 10, which includes a power supply unit 1001, a conductive unit 1002 and an ion bombardment unit 1003 arranged in sequence. The power supply unit 1001 is disposed outside the vacuum coating feed chamber, the ion bombardment unit 1003 is disposed inside the cavity assembly 1 of the vacuum coating feed chamber, and the conductive unit 1002 passes through the cavity assembly 1 of the vacuum coating feed chamber and is used to electrically connect the power supply unit 1001 and the ion bombardment unit 1003. The ion bombardment unit 1003 includes a protective plate 10031 and an ion bombardment plate 10032 arranged sequentially along the direction from the power supply unit 1001 to the ion bombardment unit 1003. The projection of the protective plate 10031 toward the ion bombardment plate 10032 completely covers the ion bombardment plate 10032. The power supply unit 1001 is used to provide radio frequency power to the ion bombardment plate 10032 through the conductive part 1002, so that high voltage electrons or ions are generated on the ion bombardment plate 10032 to perform ion cleaning on the substrate 12 in the vacuum coating feed chamber.

[0024] The ion bombardment cleaning assembly 10 provided by this utility model has the following beneficial effects: The power supply unit 1001 is located outside the cavity 101 of the cavity assembly 1 and is electrically connected through a dedicated conductive part 1002. This ensures that high-power radio frequency energy can be efficiently and stably transmitted to the ion bombardment plate 10032 inside the cavity assembly 1, avoiding interference from the environment and temperature inside the cavity 101. The ion bombardment plate 10032 directly faces the substrate 12 and can efficiently ionize the process gas in a low vacuum environment to generate uniform, high-density plasma. This plasma powerfully and uniformly bombards and cleans the surface of the substrate 12, effectively removing contaminants and oxide layers, and significantly improving the adhesion between the film and the substrate.

[0025] The ion bombardment plate 10032 generates a strong glow discharge under high-voltage radio frequency. The shielding plate 10031 completely blocks the high-speed sputtered metal particles (from the ion bombardment plate 10032 and the substrate 12) from directly impacting and depositing onto the wall surface of the cavity 101 of the cavity assembly 1. This fundamentally prevents the wall surface of the cavity 101 from being damaged by sputtering erosion. More importantly, it completely avoids the metal material of the cavity assembly 1 from contaminating the substrate 12 after sputtering, thereby ensuring the extremely high purity and quality of the coated product.

[0026] In addition, the flat protective plate 10031 helps to form a more uniform electric field and plasma distribution in front of it, thereby making the ion bombardment cleaning process on the surface of the substrate 12 more consistent and without dead corners, avoiding localized cleaning that is too strong or too weak.

[0027] In one embodiment, the ion bombardment plate 10032 includes a frame 100321 and a metal mesh 100322 covering the frame 100321.

[0028] In this embodiment, the mesh structure and regular holes of the metal mesh 100322 can ensure a uniform electric field distribution on its entire surface, thereby exciting a uniform and stable plasma density. This avoids the uneven discharge phenomenon caused by the electric field concentration at the edge of the flat electrode, and enables the substrate 12 surface to obtain a consistent and dead-angle-free ion bombardment cleaning effect.

[0029] Compared to using a solid metal plate of the same area, the 100322 metal mesh structure significantly reduces material usage, component weight, and production costs while ensuring sufficient structural strength and conductivity, and also reduces the load on the entire support structure.

[0030] The mesh structure helps to dissipate the heat generated during ion bombardment to the surrounding environment more quickly, preventing the electrodes from deforming or degrading due to local overheating, and ensuring the thermal stability and service life of the bombardment plate under long-term operation.

[0031] The robust frame 100321 provides reliable support and a fixed boundary for the flexible or unformable metal mesh 100322, making the entire ion bombardment plate 10032 a rigid, monolithic module that can be quickly and smoothly installed and positioned via the mounting points on the frame 100321. It also facilitates replacement of the entire metal mesh if it is partially damaged.

[0032] In one embodiment, the power supply unit 1001 includes a shield 10011, a conductive blind plate 10012, and an insulation device; The conductive blind plate 10012 is fixed inside the shielding cover 10011 by an insulating device. The conductive blind plate 10012 is used to connect to a power source. The insulating device includes insulating pads 10013 disposed on the inner and outer sides of the conductive blind plate 10012.

[0033] In this embodiment, the shield 10011 completely encloses the high-voltage conductive parts, effectively preventing personnel from accidentally touching high-voltage electricity. The inner and outer insulating pads 10013 constitute double electrical isolation, ensuring that the conductive blind plate 10012 is completely insulated from the shield 10011 and the external environment, fundamentally eliminating the risk of high-voltage breakdown and short circuit, and achieving the highest level of electrical safety. At the same time, the shield 10011 structure protects the internal electrical connection points and insulation devices from contamination and corrosion by dust, oil, moisture and other factors in the environment, maintaining their long-term insulation performance and reliability, and is especially suitable for complex industrial environments.

[0034] In one embodiment, the conductive part 1002 includes a conductive post 10021 connecting the conductive blind plate 10012 and the ion bombardment plate 10032 and an insulating sleeve 10022 disposed outside the conductive post 10021.

[0035] In this embodiment, the insulating sleeve 10022 completely isolates the high-voltage conductive post 10021 from the wall of the cavity assembly 1. This fundamentally eliminates the risk of high-voltage short circuit to ground, ensuring the safety of the equipment and operators.

[0036] In one embodiment, a small shaft 100211 is provided at the end of the conductive post 10021 near the ion bombardment plate 10032; A through hole is provided between the protective plate 10031 and the ion bombardment plate 10032. The protective plate 10031 and the ion bombardment plate 10032 are detachably and fastened to the small shaft 100211 through the through hole.

[0037] In this embodiment, it is ensured that the protective plate 10031 and the ion bombardment plate 10032 can be quickly and accurately concentrically aligned with the conductive post 10021 during installation. Simultaneously, it ensures that a large-area, low-resistance, reliable electrical contact is formed between the end faces of the ion bombardment plate 10032 and the conductive post 10021, avoiding localized overheating, arcing, or power loss due to poor contact, and guaranteeing efficient and stable transmission of radio frequency energy to the ion bombardment plate 10032.

[0038] In one embodiment, it also includes a plurality of isolation columns 10033 for separating the ion bombardment plate 10032 and the protective plate 10031; One end of the isolation column 10033 is detachably and fixedly connected to the ion bombardment plate 10032, and the other end is detachably and fixedly connected to the protective plate 10031.

[0039] In this embodiment, by adding a detachable isolation column 10033, a precise and constant gap is formed and maintained between the ion bombardment plate 10032 and the protective plate 10031. This effectively prevents the two from short-circuiting due to thermal deformation or electric field attraction, ensuring a stable and uniform distribution of the plasma field. At the same time, this structure is easy to disassemble, which greatly facilitates the subsequent individual cleaning or replacement and maintenance of the two plates.

[0040] Preferably, one end of the isolation column 10033 is fixed to the cavity 101 of the cavity assembly 1. In this case, the isolation column 10033 not only fixes the relative gap between the ion bombardment plate 10032 and the protective plate 10031, but also stably fixes the ion bombardment plate 10032 and the protective plate 10031 to the cavity assembly 1. It should be noted that when the ion bombardment cleaning assembly 10 is installed in the cavity door assembly 2, one end of the isolation column 10033 is fixed to the cavity door assembly 2.

[0041] This utility model also provides a vacuum coating feed chamber, including a chamber assembly 1 and the aforementioned ion bombardment cleaning assembly 10 disposed within the chamber assembly 1.

[0042] In one embodiment, a uniform heating component 8 is further included, which is disposed within the cavity assembly 1 and is disposed opposite to the ion bombardment cleaning assembly 10.

[0043] This invention integrates the ion bombardment cleaning component 10 and the uniform temperature heating component 8 into the same feeding chamber, thereby enabling simultaneous heating, degassing, and ion cleaning activation of both sides of the substrate 12.

[0044] In one embodiment, a transmission assembly disposed within the cavity assembly 1 is further included, the transmission assembly being used to transport the substrate 12 along the surface direction of the substrate 12; The uniform temperature heating component 8 and the ion bombardment cleaning component 10 are respectively arranged on both sides of the conveying path of the transmission component.

[0045] This layout allows the substrate 12 to be uniformly heated and ion-cleaned on both sides simultaneously during the conveying process, ensuring a high degree of consistency and efficiency in the pretreatment effect, while optimizing the utilization of the cavity space and simplifying the equipment structure.

[0046] This utility model also provides a vacuum coating feed chamber, including a chamber assembly 1, a transmission assembly, a uniform heating assembly 8, an ion bombardment cleaning assembly 10, and a vacuum pumping assembly; the ion bombardment cleaning assembly 10 can be referred to the above description. The transmission assembly is disposed inside the cavity assembly 1 and is used to transport the substrate 12 along the plate surface direction of the substrate 12. The cavity assembly 1 is provided with a feed chamber door assembly 7 upstream of the transmission assembly and a transition chamber door assembly 6 downstream of the transmission assembly. The transition chamber door assembly 6 is used to connect the vacuum coating chamber. The uniform temperature heating component 8 and the ion bombardment cleaning component 10 are respectively arranged on both sides of the conveying path of the transmission component. The uniform temperature heating component 8 is used to uniformly heat the surface of the substrate 12, and the ion bombardment cleaning component 10 is used to ion clean the surface of the substrate 12. The vacuum pumping assembly is used to evacuate the cavity assembly 1.

[0047] The vacuum coating feed chamber provided by this utility model integrates functions such as uniform heating, ion cleaning, vacuum preparation, and continuous transmission, realizing efficient and high-quality pretreatment of the substrate 12. Its beneficial effects include the following aspects: The uniform and stable preheating of the substrate 12 by the uniform heating component 8 eliminates the temperature gradient on the surface of the substrate 12, providing an ideal thermal environment for subsequent coating; combined with the ion bombardment cleaning component 10, contaminants and oxides on the surface of the substrate 12 can be thoroughly removed, significantly improving the adhesion and density of the film and reducing coating defects. The coordinated design of the transmission assembly, the feed chamber assembly 7, and the transition chamber assembly 6 enables the continuous and automated conveying of the substrate 12 in a vacuum environment, avoiding efficiency loss and contamination risks caused by frequent vacuum breaking, and significantly improving production cycle time and equipment utilization. The vacuum assembly can quickly and stably evacuate the cavity 101 of the cavity assembly 1 to the required vacuum level, providing a stable low-pressure environment for heating and cleaning processes; the symmetrical arrangement of uniform heating and ion cleaning ensures the uniformity of the treatment on both sides of the substrate, making it particularly suitable for thin film preparation with high surface quality requirements.

[0048] This utility model also provides a feeding method for the above-mentioned vacuum coating feeding chamber, comprising the following steps: S1, close the transition chamber door assembly 6, and isolate the cavity assembly 1 and the vacuum coating cavity; S2, open the feeding chamber door assembly 7, feed the substrate mounting frame 11 with substrate 12 onto the transmission assembly, and the transmission assembly transports the substrate mounting frame 11 into the cavity assembly 1; S3, close the feed chamber door assembly 7, the vacuum assembly evacuates the cavity assembly 1 from atmospheric state to high vacuum state, and then injects protective gas (e.g. argon) into the cavity assembly 1 to low vacuum state; S4, the uniform heating component 8 heats the substrate 12 uniformly, and the ion bombardment cleaning component 10 performs ion cleaning on the substrate 12. At this time, the ion bombardment cleaning component 10 operates in a low vacuum state filled with protective gas. S5, the vacuum pumping component pumps the cavity component 1 from a low vacuum state to a high vacuum state, and at the same time removes the gas after the ion bombardment cleaning component 10 in the cavity component 1, so that the vacuum degree of the cavity component 1 and the vacuum coating cavity are consistent. S6, open the transition chamber door assembly 6, the transmission assembly transports the substrate mounting frame 11 into the vacuum coating chamber, close the transition chamber door assembly 6, and the loading is completed.

[0049] The feeding method of this vacuum coating feed chamber has the following advantages: A two-stage vacuuming strategy (S3 and S5) is adopted, first low vacuum and then high vacuum, with heating and cleaning processes (S4) embedded between each stage. This avoids the potential for gas outgassing and contamination caused by heating and cleaning under high vacuum, and minimizes the time required for high vacuum evacuation, greatly improving overall process efficiency. The coordinated switching logic of the feed chamber assembly 7 and the transition chamber assembly 6 ensures that the vacuum environment of the vacuum coating chamber is always unaffected by the feed process, guaranteeing the stability of the core process.

[0050] This method enables strictly controlled, cycle-based production. While a batch of substrates 12 is being heated, cleaned, and evacuated into a high vacuum within the feeding chamber, the main coating chamber can simultaneously coat the previous batch of substrates 12, allowing for parallel processing. This parallel operation mode of pretreatment and coating eliminates waiting time, maximizing the efficiency of continuous equipment operation, making it particularly suitable for large-scale industrial production.

[0051] The homogenization heating and ion bombardment cleaning are performed after low vacuum evacuation and before high vacuum evacuation (S4). Heating in a low vacuum environment allows for a more gradual release and removal of adsorbed moisture and gas from the substrate 12, avoiding the violent outgassing or even defects that can occur with sudden high temperature and high vacuum. Ion cleaning is performed in a clean low vacuum environment, resulting in better performance. This process ensures that the surface condition (temperature, cleanliness) of each substrate 12 is highly consistent before entering the coating chamber, laying a solid foundation for obtaining highly repeatable coating quality.

[0052] In one embodiment, the uniform temperature heating component 8 includes a mounting base 801, a uniform temperature protection plate 802, and a plurality of heating tubes 803; Several heating tubes 803 are evenly arranged on the mounting base 801. The temperature equalization protection plate 802 is set parallel to the mounting base 801 and has a gap between it and the mounting base 801. The projection of the temperature equalization protection plate 802 toward the mounting base 801 fully covers all the heating tubes 803. The mounting base 801 is provided with a reflective layer for reflecting thermal radiation on the side near the temperature equalization protection plate 802. The temperature equalization protection plate 802 is positioned facing the ion bombardment cleaning assembly 10.

[0053] In this embodiment, the temperature uniformity protection plate 802 efficiently conducts and redistributes the heat from the discrete-point heating tubes 803 on its back side, making it a planar radiation source. This allows heat to radiate to the surface of the substrate 12 in an extremely uniform manner, completely eliminating the risk of localized overheating caused by direct radiation from the heating tubes 803, ensuring a high degree of temperature uniformity on the surface of the substrate 12 (temperature difference can be controlled within a very small range), and providing a crucial prerequisite for subsequent high-quality coating.

[0054] The reflective layer (typically a highly reflective metal, such as SUS304 mirror stainless steel, or a ceramic coating) on ​​the mounting base 801 efficiently reflects the heat radiated backward by the heating tube 803, thereby reducing heat loss to the cavity structure through the mounting base 801. This not only significantly improves heating efficiency and reduces energy consumption but also protects the equipment behind the mounting base from high temperatures. The temperature equalization protection plate 802 directly isolates the heating tube 803 from contaminants that may be released from the substrate 12 and from the bombardment of the ion bombardment cleaning assembly 10, greatly extending the service life of the heating tube 803 and reducing maintenance frequency and costs.

[0055] This structure creates a stable and controllable thermal environment. The heat capacity of the temperature equalization protection plate 802 acts as a thermal buffer, reducing temperature fluctuations that may be caused by power fluctuations in the heating element 803, making temperature control more stable and precise. At the same time, it separates the high-temperature heating element 803 from the relatively low-temperature substrate 12, preventing thermal stress damage or deformation that may occur to the substrate 12 due to direct exposure to excessively high-temperature heat sources, making it suitable for handling various sensitive substrates 12.

[0056] The spacing between the temperature equalization protection plate 802 and the mounting base 801 facilitates the observation of the status and operation of the heating tube 803 by the staff.

[0057] In one embodiment, the temperature equalization protection plate 802 is made of a thermally conductive material.

[0058] In this embodiment, the temperature uniform protection plate 802 made of high thermal conductivity material can quickly transform the point or line heat source generated by the back heating tube 803 into a planar heat source with a highly uniform surface temperature through its own extremely high lateral thermal conductivity.

[0059] In one embodiment, a support assembly is also included for securing the temperature equalization protection plate 802 to the mounting base 801; The support assembly includes a plurality of support columns 804, one end of which is detachably and fixedly connected to the temperature equalization protection plate 802, and the other end is detachably and fixedly connected to the mounting base 801.

[0060] In this embodiment, when it is necessary to clean contaminants on the back of the temperature equalization protection plate 802, replace the heating tube 803 below, or inspect the mounting base 801, the entire temperature equalization protection plate 802 can be safely and conveniently removed simply by disassembling the connections (such as bolts) at both ends of the support column 804. This avoids complex overall disassembly, making the originally tedious and time-consuming maintenance work simple and quick, significantly shortening equipment maintenance downtime, and reducing labor costs and operational risks.

[0061] In one embodiment, the mounting base 801 includes a mounting plate 8011 and a side plate 8012 surrounding the side of the mounting plate 8011; The temperature equalization protection plate 802 and the side plate 8012 are spaced apart from the mounting plate 8011. In this embodiment, the mounting plate 8011 and the side plate 8012 together form a box with an open top. This structure, when combined with the temperature equalization protection plate 802, forms a nearly enclosed internal cavity for the heater. This structure effectively confines the heat radiation generated by the heating tube 803 within this cavity, greatly reducing unnecessary heat loss to other spaces in the cavity 101. The side plate 8012 blocks heat radiation and convection to the surroundings, while the reflective layer on the mounting plate 8011 effectively reflects downward heat radiation, thus concentrating and efficiently heating the temperature equalization protection plate 802, significantly reducing the heating power requirement and achieving energy-saving effects.

[0062] In one embodiment, the temperature equalization protection plate 802 and the mounting plate 8011 are the same size. That is, the projection of the temperature equalization protection plate 802 toward the mounting base 801 fully covers the mounting plate 8011.

[0063] This utility model also provides a vacuum coating feed chamber, including a chamber assembly 1 and the aforementioned temperature equalization heating assembly 8 disposed within the chamber assembly 1.

[0064] In one embodiment, it further includes an ion bombardment cleaning component 10 disposed within the cavity assembly 1 and disposed opposite to the uniform heating assembly 8.

[0065] The vacuum coating feed chamber provided by this utility model integrates the high-performance uniform temperature heating component 8 and the ion bombardment cleaning component 10 arranged opposite to it, realizing the synergy and spatial integration of the two pretreatment processes of heating and cleaning. At the same time, the uniform temperature protection plate 802 of the uniform temperature heating component 8 can also block the bombardment and damage caused by the ion bombardment cleaning component 10 to the heating tube 803. That is, the uniform temperature protection plate 802 is used to ensure that the temperature of multiple heating tubes 803 is uniformly applied to the substrate 12, and can also protect the heating tubes 803 from damage caused by the ion bombardment cleaning component 10.

[0066] In one embodiment, a transmission assembly disposed within the cavity assembly 1 is further included, the transmission assembly being used to transport the substrate 12 along the surface direction of the substrate 12; The uniform temperature heating component 8 and the ion bombardment cleaning component 10 are respectively arranged on both sides of the conveying path of the transmission component.

[0067] In this embodiment, by placing the uniform heating component 8 and the ion bombardment cleaning component 10 on both sides of the conveying path of the transmission component, the substrate 12 is simultaneously heated and cleaned on both sides during uniform speed passage. This ensures high uniformity and consistency of the substrate pretreatment on both sides, completely eliminating quality differences that may be caused by single-sided or sequential processing. At the same time, integrating two key processes into the same station significantly shortens the process time, improves production efficiency, and the compact layout optimizes the space utilization of the cavity 101.

[0068] In one embodiment, a cavity door assembly 2 is also included, which is disposed on the side wall of the cavity assembly 1 between the feed door assembly 7 and the transition door assembly 6; The ion bombardment cleaning assembly 10 is mounted on the cavity door assembly 2.

[0069] In this embodiment, by setting the cavity door assembly 2, when maintenance or cleaning of the protective plate 10031 is required, the operation can be carried out directly by simply opening the cavity door assembly 2 on the side wall, without the need for technicians to enter the narrow cavity 101 or to disassemble the entire equipment on a large scale. This greatly reduces the difficulty, time cost, and safety risks of maintenance work, minimizes equipment downtime, and improves the overall utilization rate of the equipment.

[0070] In one embodiment, the vacuum assembly includes a coarse vacuum assembly 5 connected to the cavity assembly 1 and a high vacuum assembly 13 disposed on the cavity door assembly 2.

[0071] In this embodiment, the roughing assembly 5 (such as a mechanical pump or a Roots pump assembly) is responsible for rapidly pumping the cavity 101 of the cavity assembly 1 from atmospheric pressure to a low vacuum (e.g., 10). 5 -10 Pa) overcomes atmospheric load with high efficiency; then the high vacuum pumping component 13 takes over, responsible for overcoming surface outgassing and further increasing the vacuum level from low vacuum to the high vacuum required by the process (e.g., 10-10 Pa). - 4 This division of labor avoids the losses and risks associated with starting the high-vacuum pumping component 13 under high pressure, significantly improves pumping efficiency, shortens the overall vacuuming time, and increases production cycle time.

[0072] In one embodiment, the high vacuum assembly 13 includes a molecular pump 1301 and a vacuum channel 1302 arranged in sequence. A gate valve 1303 is provided on the vacuum channel 1302, and the other end of the vacuum channel 1302 passes through the cavity door assembly 2.

[0073] In this embodiment, the entire high-vacuum assembly 13, including the molecular pump 1301 and the gate valve 1303, is integrated onto the openable chamber door assembly 2. This greatly facilitates the maintenance of the high-vacuum assembly 13.

[0074] In one embodiment, the feed compartment door assembly 7 includes a guide rail 701, a door panel assembly 702, and a door opening and closing drive assembly 703; The guide rail 701 is disposed on one side of the inlet 1011 of the cavity assembly 1; The door panel assembly 702 includes a door panel 7021 slidably disposed on a guide rail 701, a pressing drive mechanism 7022 disposed on the door panel 7021, and a door core 7023 disposed on the output end of the pressing drive mechanism 7022. The door opening / closing drive assembly 703 is used to drive the door panel assembly 702 away from or aligned with the inlet 1011 of the cavity assembly 1; the pressing drive mechanism 7022 is used to drive the door core 7023 to press against or leave the inlet 1011 of the cavity assembly 1 after the door panel assembly 702 is aligned with the inlet 1011 of the cavity assembly 1. A sealing ring that mates with the door core 7023 is provided on the inlet 1011 of the cavity assembly 1.

[0075] In this embodiment, the feed compartment door assembly 7 and the door panel assembly 702 first slide as a whole under the action of the door opening and closing drive assembly 703, precisely aligning with the opening and completing the initial positioning. Subsequently, the independent pressing drive mechanism 7022 drives the relatively small door core 7023 to perform the final pressing and sealing. This design allows a larger and more precise force to be applied to the door core 7023, enabling it to be evenly and forcefully pressed against the sealing ring of the feed inlet 1011 of the cavity, greatly improving the reliability and consistency of the seal, effectively ensuring the vacuum degree of the cavity 101, and preventing the occurrence of micro-leakage.

[0076] Traditional one-piece doors are directly pressed together, which can easily lead to wear or cutting of the sealing ring due to misalignment or friction. In this embodiment, the door panel 7021 undertakes the functions of sliding and coarse positioning, avoiding frictional wear with the sealing ring. The pressing movement of the door core 7023 is a linear movement perpendicular to the sealing surface, with almost no shear friction, thereby maximizing the protection of the sealing ring, ensuring sealing performance, and extending the service life of the equipment.

[0077] In one embodiment, the transmission assembly includes a transmission roller mechanism 3 assembly disposed at the bottom of the cavity assembly 1 and a magnetic induction assembly 9 assembly disposed at the top of the cavity assembly 1. It also includes a substrate mounting frame 11 for mounting the substrate 12. The bottom of the substrate mounting frame 11 is provided with a rod 1101 for cooperating with the transmission roller mechanism 3, and the top of the substrate mounting frame 11 is provided with a magnetic block 1102 for cooperating with the magnetic guide assembly 9. The substrate mounting frame 11 has a mounting groove 1103 in the middle, and the substrate 12 is clamped in the mounting groove 1103 by a clamp.

[0078] In this embodiment, a magnetic levitation drive principle is adopted, which involves the interaction between the top magnetic guide component 9 and the magnetic block 1102 on the substrate mounting bracket 11. Combined with the cooperation of the transmission roller mechanism 3 and the rod body 1101, the movement of the substrate mounting bracket 11 within the cavity is achieved without any mechanical gears, chains, or other traditional contact transmissions. This eliminates particulate contaminants generated by friction and greatly improves the cleanliness within the cavity 101.

[0079] The design of the mounting slot 1103 and the clamp ensures that the substrate 12 is firmly clamped, while also ensuring the uniformity of the coating during cleaning and heating of the substrate 12.

[0080] In one embodiment, the cavity assembly 1 includes a cavity 101, a monitoring device disposed on the cavity 101 for monitoring the cavity 101 and a venting assembly 106, and the cavity 101 is also provided with a cooling water channel for cooling the cavity 101.

[0081] The monitoring device includes an atmospheric confirmation gauge 102, a low vacuum gauge 103, and a high vacuum gauge 104 in the monitoring chamber 101. The atmospheric confirmation gauge 102 is used to confirm whether the chamber reaches the standard atmospheric pressure after the vacuum is broken. The low vacuum gauge 103 is used to confirm and display the vacuum level from the atmospheric level to the low vacuum level. The high vacuum gauge 104 is used to confirm and display the vacuum level from the low vacuum level to the high vacuum level.

[0082] The cavity assembly 1 also includes a glass window 105 for observing ion bombardment glow.

[0083] The cavity assembly 1 also includes a protective gas inlet for introducing protective gas into the cavity 101.

[0084] The cavity 101 includes an inlet 1011 and an outlet 1012 disposed opposite to each other, and also includes a maintenance port 1013 on the side. The inlet door assembly 7 is used to control the opening and closing of the inlet 1011, the slide valve assembly 6 is used to control the opening and closing of the outlet 1012, and the cavity door assembly 2 is used to control the opening and closing of the maintenance port 1013.

[0085] Preferably, the cavity 101 is fixedly mounted on the frame assembly 4.

[0086] The above description is merely an embodiment and does not constitute any limitation on this utility model. Any person skilled in the art can make many possible variations, modifications, or alterations to the technical solution of this utility model without departing from its scope. Therefore, any simple modifications, equivalent changes, and alterations made to the above embodiments based on the technical essence of this utility model, without departing from its scope, should fall within the protection scope of this utility model.

Claims

1. An ion bombardment cleaning assembly, characterized in that, It includes a power supply unit (1001), a conductive unit (1002), and an ion bombardment unit (1003) arranged sequentially. The power supply unit (1001) is disposed outside the vacuum coating feed chamber, the ion bombardment unit (1003) is disposed inside the cavity assembly (1) of the vacuum coating feed chamber, and the conductive part (1002) passes through the cavity assembly (1) of the vacuum coating feed chamber for electrically connecting the power supply unit (1001) and the ion bombardment unit (1003). The ion bombardment unit (1003) includes a protective plate (10031) and an ion bombardment plate (10032) arranged sequentially along the direction from the power supply unit (1001) to the ion bombardment unit (1003). The projection of the protective plate (10031) toward the ion bombardment plate (10032) completely covers the ion bombardment plate (10032). The power supply unit (1001) is used to provide radio frequency power to the ion bombardment plate (10032) through the conductive part (1002), so that high voltage electrons or ions are generated on the ion bombardment plate (10032) to perform ion cleaning on the substrate (12) in the vacuum coating feed chamber.

2. The ion bombardment cleaning assembly as described in claim 1, characterized in that, The ion bombardment plate (10032) includes a frame (100321) and a metal mesh (100322) covering the frame (100321).

3. The ion bombardment cleaning assembly as described in claim 1, characterized in that, The power supply unit (1001) includes a shield (10011), a conductive blind plate (10012), and an insulation device; The conductive blind plate (10012) is fixed inside the shield (10011) by an insulating device, and the conductive blind plate (10012) is used to connect to the power supply.

4. The ion bombardment cleaning assembly as described in claim 3, characterized in that, The conductive part (1002) includes a conductive post (10021) connecting the conductive blind plate (10012) and the ion bombardment plate (10032) and an insulating sleeve (10022) disposed outside the conductive post (10021).

5. The ion bombardment cleaning assembly as described in claim 4, characterized in that, A small shaft (100211) is provided at the end of the conductive post (10021) near the ion bombardment plate (10032). A through hole is provided between the protective plate (10031) and the ion bombardment plate (10032), and the protective plate (10031) and the ion bombardment plate (10032) are detachably and fastened to the small shaft (100211) through the through hole.

6. The ion bombardment cleaning assembly as described in claim 1, characterized in that, It also includes several isolation columns (10033) for separating the ion bombardment plate (10032) and the protective plate (10031). One end of the isolation column (10033) is detachably and fixedly connected to the ion bombardment plate (10032), and the other end is detachably and fixedly connected to the protective plate (10031).

7. A vacuum coating feed chamber, characterized in that, It includes a cavity assembly (1) and an ion bombardment cleaning assembly (10) as described in any one of claims 1-6 disposed within the cavity assembly (1).

8. The vacuum coating feed chamber as described in claim 7, characterized in that, It also includes a uniform heating component (8) disposed within the cavity assembly (1) and disposed opposite to the ion bombardment cleaning assembly (10).

9. The vacuum coating feed chamber as described in claim 8, characterized in that, It also includes a transmission assembly disposed within the cavity assembly (1), the transmission assembly being used to transport the substrate (12) along the plate surface direction of the substrate (12). The uniform temperature heating component (8) and the ion bombardment cleaning component (10) are respectively arranged on both sides of the conveying path of the transmission component.

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