Chemical vapor deposition apparatus

Abstract

The utility model discloses a chemical vapor deposition equipment, including conductive deposition box and conductive box door, and the deposition box has the deposition cavity, and the side surface of conductive deposition box is equipped with the mouth of the box that links to the deposition cavity, and the conductive box door can be movably connected in the conductive deposition box, and the conductive box door can open to open the mouth of the box or can cover the mouth of the box, and the side of conductive box door is equipped with insulating sealing ring and elastic conductive strip, and the elastic conductive strip is parallel with insulating sealing ring and is located the outside of the center of insulating sealing ring away from the mouth of the box, when the conductive box door covers the mouth of the box, and insulating sealing ring surrounds the mouth of the box and is sealed and abuts to the conductive deposition box, and the elastic conductive strip is elastically abutted to the conductive deposition box, so that the conductive box door and the conductive deposition box can be more stably electrically conducted through the elastic conductive strip, in the process of using the chemical vapor deposition equipment to carry out chemical vapor deposition to the substrate, the distribution of electric field is more uniform, to make the chemical vapor deposition effect of chemical vapor deposition equipment more uniform.

Description

Technical Field

[0001] This utility model relates to the field of display panel manufacturing technology, and in particular to a chemical vapor deposition apparatus. Background Technology

[0002] In the manufacturing process of display panels, chemical vapor deposition equipment is required to perform chemical vapor deposition on the substrate, such as... Figure 1 As shown, specifically, a chemical vapor deposition (CVD) apparatus typically includes a conductive deposition chamber 1' and a conductive chamber door 2'. The conductive chamber door 2' is equipped with an insulating sealing ring 20', which can cover the opening 11' of the conductive deposition chamber 1' and ensure that the insulating sealing ring 20' is sealed against the conductive deposition chamber 1'.

[0003] In the process of performing chemical vapor deposition (CVD) on a substrate using a chemical vapor deposition (CVD) apparatus, the electrodes of the CVD apparatus are energized to create an electric field within the conductive deposition chamber 1'. This electric field ionizes the source gas to form plasma, which is then used as an energy source to activate the reactive gas and achieve CVD deposition. Theoretically, during this process, the conductive deposition chamber 1' and the conductive chamber door 2', due to their conductivity, also influence the electric field, allowing it to be distributed more uniformly near the surfaces of the conductive deposition chamber 1' and the conductive chamber door 2'.

[0004] However, because an insulating sealing ring 20' is pressed between the conductive box door 2' and the conductive deposition box 1', electrical conduction between them is difficult. In other words, the conductive box door 2' acts as an insulator connected to the conductive deposition box 1'. Consequently, during the chemical vapor deposition process on the substrate using chemical vapor deposition equipment, the electric field generated inside the conductive deposition box 1' is difficult to approach the conductive box door 2'. Operators can observe an electric arc forming around the conductive box door 2' inside the conductive deposition box 1'. In other words, it is difficult to achieve the theoretically achievable effect of a relatively uniform electric field distribution near the surfaces of the conductive deposition box 1' and the conductive box door 2'. Figure 1 The electric arc traversing the conductive box door 2' is illustrated by a dashed line. Figure 1 The vertical direction refers to the vertical direction along the direction of gravity when the chemical vapor deposition equipment is in actual use. This can lead to insufficient plasmaification of the source gas near the conductive door 2', resulting in uneven chemical vapor deposition. Utility Model Content

[0005] The purpose of this invention is to provide a chemical vapor deposition (CVD) device that enables effective electrical conduction between the conductive box door and the conductive deposition box, thereby making the CVD process more uniform.

[0006] To achieve this objective, the present invention adopts the following technical solution:

[0007] A chemical vapor deposition apparatus is provided, comprising:

[0008] A conductive deposition box, the conductive deposition box having a deposition chamber, and one side surface of the conductive deposition box having an opening communicating with the deposition chamber; and,

[0009] A conductive box door is movably connected to the conductive deposition box, and the conductive box door can be opened to open the box opening or can be closed. An insulating sealing ring and an elastic conductive strip are provided on one side of the conductive box door. The elastic conductive strip is arranged parallel to the adjacent insulating sealing ring and is located outside the center of the insulating sealing ring away from the box opening. When the conductive box door closes the box opening, the insulating sealing ring surrounds the box opening and seals against the conductive deposition box, and the elastic conductive strip elastically abuts against the conductive deposition box.

[0010] In one embodiment, when the insulating sealing ring and the elastic conductive strip are not subjected to additional external forces, the protrusion height of the elastic conductive strip protruding from one surface of the conductive box door is h1, and the protrusion height of the insulating sealing ring protruding from the same surface of the conductive box door is h2, where h1 > h2; and / or,

[0011] The elastic coefficient of the elastic conductive strip is less than that of the insulating sealing ring.

[0012] In one embodiment, the elastic conductive strip is spaced apart from the insulating sealing ring.

[0013] In one embodiment, at least one side of the insulating sealing ring is provided with a plurality of elastic conductive strips arranged at radial intervals along the insulating sealing ring.

[0014] In one embodiment, the elastic conductive strip is a spiral tube structure formed by spirally extending conductive sheets.

[0015] In one embodiment, the chemical vapor deposition apparatus includes a plurality of the elastic conductive strips, and the elastic conductive strips are respectively provided on at least two opposite sides of the insulating sealing ring; or,

[0016] The elastic conductive strip is arranged around the insulating sealing ring.

[0017] In one embodiment, the conductive box door is provided with a mounting groove, and the elastic conductive strip is partially engaged with the mounting groove.

[0018] In one embodiment, the setting groove has two opposing sidewalls, each of which is provided with a first protrusion extending along the length direction of the setting groove. The elastic conductive strip is provided with a second protrusion on both sides of the two sidewalls, the length direction of which is parallel to the extension direction of the elastic conductive strip. The first protrusion confines the second protrusion between the first protrusion and the bottom of the setting groove.

[0019] In one embodiment, a plurality of second protrusions are provided on one side of the elastic conductive strip, and the plurality of second protrusions are arranged at intervals along the extending direction of the elastic conductive strip; and / or,

[0020] When the elastic conductive strip is not subjected to additional external force, the second convex strip is spaced apart from the adjacent sidewall.

[0021] In one embodiment, the chemical vapor deposition apparatus further includes a drive unit connected between the conductive door and the conductive deposition chamber, the drive unit being capable of driving the conductive door to switch between an open state to expose the chamber opening and a closed state.

[0022] The beneficial effects of this utility model are:

[0023] This invention relates to a chemical vapor deposition (CVD) apparatus. By providing an elastic conductive strip on the outer periphery of the insulating sealing ring of the conductive chamber door, and when the conductive chamber door seals the opening of the conductive deposition chamber (i.e., the insulating sealing ring surrounds the opening and seals against the conductive deposition chamber), the elastic conductive strip elastically abuts against the conductive deposition chamber. This allows the conductive chamber door and the conductive deposition chamber to be stably electrically connected through the elastic conductive strip. Consequently, during the CVD process on the substrate, the electric field generated within the deposition chamber is distributed closer to the conductive chamber door. In other words, the electric field distribution is more uniform, resulting in a more uniform CVD deposition process. Attached Figure Description

[0024] Figure 1 A schematic diagram of a chemical vapor deposition apparatus provided for the prior art;

[0025] Figure 2 This is a schematic diagram of the chemical vapor deposition equipment described in the embodiment;

[0026] Figure 3 This is a partial cross-sectional view of the conductive box door, insulating sealing ring, and elastic conductive strip described in the embodiment;

[0027] Figure 4 This is a three-dimensional structural diagram of the elastic conductive strip (with a second protrusion) described in the embodiment;

[0028] Figure 5 This is a schematic diagram of a structure of the conductive box door, insulating sealing ring, and elastic conductive strip described in the embodiment;

[0029] Figure 6 This is another structural schematic diagram of the conductive box door, insulating sealing ring, and elastic conductive strip described in the embodiment.

[0030] Figure 1 middle:

[0031] 1' Conductive deposition box; 11' Box opening;

[0032] 2', Conductive box door; 20', Insulating sealing ring.

[0033] Figures 2 to 6 middle:

[0034] 1. Conductive deposition box; 10. Deposition chamber; 11. Box opening;

[0035] 2. Conductive box door; 20. Insulating sealing ring; 21. Elastic conductive strip; 210. Second convex strip; 22. Setting groove; 221. Side wall; 222. First convex strip. Detailed Implementation

[0036] The present invention will now be described in further detail with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present invention and not intended to limit it. Furthermore, it should be noted that, for ease of description, the accompanying drawings show only the parts relevant to the present invention, not the entire structure.

[0037] In the description of this utility model, unless otherwise explicitly specified and limited, the terms "connected," "linked," and "fixed" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0038] In this invention, unless otherwise explicitly specified and limited, "above" or "below" the second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of the second feature includes the first feature directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature includes the first feature directly below or diagonally below the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0039] In the description of this embodiment, the terms "upper," "lower," "right," etc., refer to the orientation or positional relationship shown in the accompanying drawings. They are used only for ease of description and simplification of operation, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model. In addition, the terms "first" and "second" are only used for distinction in description and have no special meaning.

[0040] like Figure 2 As shown, this embodiment provides a chemical vapor deposition apparatus, including a conductive deposition chamber 1 and a conductive chamber door 2. The conductive deposition chamber 1 has a deposition chamber 10, and one side surface of the conductive deposition chamber 1 is provided with a chamber opening 11 communicating with the deposition chamber 10. The conductive chamber door 2 is movably connected to the conductive deposition chamber 1, and the conductive chamber door 2 can be opened to open the chamber opening 11, or can be closed to close the chamber opening 11. One side of the conductive chamber door 2 is provided with an insulating sealing ring 20 and an elastic conductive strip 21. The elastic conductive strip 21 is arranged parallel to the adjacent insulating sealing ring 20 and is located on the outer side of the insulating sealing ring 20 away from the center of the chamber opening 11. When the conductive chamber door 2 closes the chamber opening 11, the insulating sealing ring 20 surrounds the chamber opening 11 (that is, the chamber opening 11 is located within the inner circle of the insulating sealing ring 20), and the insulating sealing ring 20 seals against the conductive deposition chamber 1. The elastic conductive strip 21 elastically abuts against the conductive deposition chamber 1. Figure 2 The vertical direction refers to the vertical direction along the direction of gravity when the chemical vapor deposition equipment is in actual use, that is, Figure 2 This is a cross-sectional view of the chemical vapor deposition apparatus from the side view of the conductive deposition chamber 1 without the chamber opening 11.

[0041] By providing an elastic conductive strip 21 on the outer periphery of the insulating sealing ring 20 of the conductive box door 2, and when the conductive box door 2 covers the opening 11 of the conductive deposition box 1, that is, when the insulating sealing ring 20 surrounds the opening 11 and seals against the conductive deposition box 1, the elastic conductive strip 21 elastically abuts against the conductive deposition box 1. Thus, the conductive box door 2 and the conductive deposition box 1 can be electrically connected more stably through the elastic conductive strip 21. In the process of using chemical vapor deposition equipment to perform chemical vapor deposition on the substrate, the electric field formed in the deposition chamber 10 can be distributed to a position close to the conductive box door 2. In other words, the distribution of the electric field can be more uniform, so that the chemical vapor deposition effect of the chemical vapor deposition equipment can be more uniform.

[0042] The insulating sealing ring 20 may be made of materials including but not limited to rubber and silicone.

[0043] Please combine Figure 3 As shown, optionally, when the insulating sealing ring 20 and the elastic conductive strip 21 are not subjected to additional external force, the protrusion height of the elastic conductive strip 21 protruding from one surface of the conductive box door 2 is h1, and the protrusion height of the insulating sealing ring 20 protruding from the same surface of the conductive box door 2 is h2, h1>h2. Thus, when the insulating sealing ring 20 seals against the conductive deposition box 1, the elastic conductive strip 21 can also stably and elastically abut against the conductive deposition box 1, so that during the operation of the chemical vapor deposition equipment, the electric field formed in the deposition chamber 10 can be stably maintained in a relatively uniform distribution state.

[0044] Optionally, the elastic coefficient of the elastic conductive strip 21 is less than that of the insulating sealing ring 20. This prevents excessive pressing force from being applied to the elastic conductive strip 21 to cause deformation, thus ensuring the conductive box door 2 remains sealed against the conductive deposition box 1. Especially when the insulating sealing ring 20 and the elastic conductive strip 21 are not subjected to additional external forces, and the protrusion height h1 of the elastic conductive strip 21 is higher than the protrusion height h2 of the insulating sealing ring 20, the elastic compression amplitude of the elastic conductive strip 21 is greater than that of the insulating sealing ring 20 when it is sealed against the conductive deposition box 1, and the elastic conductive strip 21 is also elastically against the conductive deposition box 1. Therefore, this arrangement allows for a smaller force to be applied to the elastic conductive strip 21 even when its elastic compression amplitude is large.

[0045] Please combine Figure 4As shown, optionally, the elastic conductive strip 21 is a spiral tube structure formed by the spiral extension of conductive thin sheets. Thus, the elastic conductive strip 21 has good elasticity in the direction perpendicular to its own length. On the one hand, it is convenient to flexibly adjust the extension direction of the elastic conductive strip 21 so that the elastic conductive strip 21 extends along the outside of the insulating sealing ring 20. On the other hand, the elastic conductive strip 21 can be in stable elastic contact with the conductive deposition box 1 under pressure.

[0046] In other embodiments, the elastic conductive strip 21 may also be other conductive structures that are elastic along the relative direction between the conductive deposition box 1 and the conductive box door 2, specifically including but not limited to structures such as springs, springs, and spring tubes.

[0047] Optionally, the conductive box door 2 is provided with a mounting groove 22, and the elastic conductive strip 21 is partially engaged with the mounting groove 22. This simplifies the installation and removal of the elastic conductive strip 21 and restricts the position of the elastic conductive strip 21 by the mounting groove 22, thereby limiting the relative posture between the elastic conductive strip 21 and the insulating sealing ring 20. This helps the elastic conductive strip 21 to remain stably in the posture of elastically abutting against the conductive deposition box 1 when the insulating sealing ring 20 is sealingly abutting against the conductive deposition box 1. Furthermore, the groove wall of the mounting groove 22 provides a larger surface area, resulting in a larger effective electrical connection area between the elastic conductive strip 21 and the conductive box door 2.

[0048] Optionally, the setting groove 22 has two opposing sidewalls 221. Each sidewall 221 is provided with a first protrusion 222 extending along the extension direction of the setting groove 22. The elastic conductive strip 21 is provided with a second protrusion 210 extending along its own extension direction on both sides facing the two sidewalls 221. The first protrusion 222 confines the second protrusion 210 between the first protrusion 222 and the bottom of the setting groove 22, thereby making it difficult for the elastic conductive strip 21 to detach from the setting groove 22. At the same time, during installation, only a force needs to be applied to the elastic conductive strip 21 to deform it, so that the second protrusions 210 on both sides of the elastic conductive strip 21 come closer together. This allows part of the elastic conductive strip 21 and the two second protrusions 210 to pass through the opening between the two first protrusions 222 and enter the setting groove 22. Then, the additional force is removed, and the elastic conductive strip 21 returns to its original shape, while the second protrusions 210 are confined between the first protrusion 222 and the bottom of the setting groove 22. The installation operation is simple.

[0049] Optionally, a plurality of second protrusions 210 are provided on one side of the elastic conductive strip 21. The plurality of second protrusions 210 are arranged at intervals along the extension direction of the elastic conductive strip 21, thereby reducing the obstruction effect of the second protrusions 210 on the bending deformation of the elastic conductive strip 21, so as to flexibly adjust the extension direction of the elastic conductive strip 21.

[0050] Optionally, when the elastic conductive strip 21 is not subjected to additional external force, the second protrusion 210 is spaced apart from the adjacent sidewall 221, so that when the elastic conductive strip 21 is squeezed by external force, the gap between the second protrusion 210 and the adjacent sidewall 221 can provide a certain deformation space.

[0051] In other embodiments, the elastic conductive strip 21 can also be connected to the conductive box door 2 by means including but not limited to welding or conductive adhesive bonding.

[0052] Optionally, the elastic conductive strip 21 and the insulating sealing ring 20 are spaced apart, so that when the elastic conductive strip 21 and the insulating sealing ring 20 are compressed and undergo elastic deformation, there is a certain space between the elastic conductive strip 21 and the insulating sealing ring 20 for the elastic conductive strip 21 and the insulating sealing ring 20 to fill, so as to avoid the elastic conductive strip 21 and the insulating sealing ring 20 abutting each other and hindering the elastic deformation process of the two, thereby avoiding the situation that one of the elastic conductive strip 21 and the insulating sealing ring 20 is difficult to maintain a stable abutment against the conductive deposition box 1.

[0053] Optionally, a plurality of elastic conductive strips 21 are provided on at least one side of the insulating sealing ring 20, arranged radially at intervals along the insulating sealing ring 20. In this way, by increasing the number of elastic conductive strips 21, the effective electrical conduction area between the conductive deposition box 1 and the conductive box door 2 can be increased, thereby reducing the resistivity between the conductive deposition box 1 and the conductive box door 2, thereby improving the utilization efficiency of electric field energy and reducing the energy consumption of the chemical vapor deposition equipment.

[0054] It should be noted that the "radial direction of the insulating sealing ring 20" mentioned above specifically refers to the radial direction of the insulating sealing ring 20 as a whole, that is, the radial direction of the ring-shaped structure formed by the insulating sealing ring 20, and not the radial direction of a local cross-section of the insulating sealing ring 20.

[0055] Please combine Figure 5As shown, in an optional embodiment, the chemical vapor deposition apparatus includes multiple elastic conductive strips 21. At least two opposite sides of the insulating sealing ring 20 are provided with elastic conductive strips 21, allowing for flexible adjustment of the distribution of the elastic conductive strips 21 according to usage requirements. For example, if there is limited space on one side of the insulating sealing ring 20, the elastic conductive strip 21 may not be provided on that side, but rather on opposite sides of the insulating sealing ring 20 where there is more space. Simultaneously, by providing elastic conductive strips 21 on opposite sides of the insulating sealing ring 20, the points where the conductive box door 2 and the conductive deposition box 1 are electrically connected through the elastic conductive strips 21 are not too concentrated, facilitating current flow at various locations on the conductive box door 2 and enabling the electric field to be distributed close to each location on the conductive box door 2.

[0056] Furthermore, when there is a large space available on one side of the insulating sealing ring 20, as described in the aforementioned technical solution, a plurality of elastic conductive strips 21 arranged at radial intervals along the insulating sealing ring 20 can be provided on that side of the insulating sealing ring 20.

[0057] Please combine Figure 6 As shown, in another optional embodiment, the elastic conductive strip 21 is arranged around the insulating sealing ring 20, and the ends of the elastic conductive strip 21 are connected to each other, so that the distribution range of the electrical conduction position between the conductive deposition box 1 and the conductive box door 2 is larger, so as to avoid the electrical conduction position between the conductive deposition box 1 and the conductive box door 2 being too concentrated, which is conducive to further improving the uniformity of the electric field distribution in the deposition cavity 10.

[0058] When there is sufficient space around the insulating sealing ring 20, multiple elastic conductive strips 21 can optionally be provided around the insulating sealing ring 20. The multiple elastic conductive strips 21 are arranged sequentially and at intervals from the insulating sealing ring 20 to the outer periphery to increase the effective electrical conduction area between the conductive deposition box 1 and the conductive box door 2.

[0059] Please see again Figure 2 Optionally, the chemical vapor deposition apparatus also includes a drive unit (not shown in the figure), which is connected between the conductive door 2 and the conductive deposition chamber 1. The drive unit can drive the conductive door 2 to switch between an open state with the chamber opening 11 and a closed state with the chamber opening 11, thereby enabling the conductive door 2 to open and close automatically.

[0060] Specifically, the driving component may include, but is not limited to, at least one of linear motors, rotary motors, swing motors, cylinders, and robotic arms.

[0061] Preferably, the driving member is at least capable of driving the conductive box door 2 to move in the relative direction between the conductive box door 2 and the conductive deposition box 1, so that the conductive box door 2 can cover the box opening 11, or can be opened to open the box opening 11. Furthermore, the driving member is also at least capable of driving the conductive box door 2 to move to a position offset from the box opening 11, that is, capable of driving the conductive box door 2 to move so that the projection of the conductive box door 2 on the conductive deposition box 1 in the relative direction between the conductive box door 2 and the conductive deposition box 1 is offset from the box opening 11, so as to avoid the conductive box door 2 from obstructing the operation of placing and removing the substrate in the deposition chamber 10.

[0062] In addition, chemical vapor deposition equipment also includes any existing electrode, ion emitter, etc., used to achieve ionization of source gas, which will not be described in detail here.

[0063] Obviously, the above embodiments of this utility model are merely examples for clearly illustrating the present utility model, and are not intended to limit the implementation of the present utility model. Those skilled in the art can make various obvious changes, readjustments, and substitutions without departing from the protection scope of this utility model. It is neither necessary nor possible to exhaustively describe all embodiments here. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of this utility model should be included within the protection scope of the claims of this utility model.

Claims

1. A chemical vapor deposition apparatus, characterized in that, include: A conductive deposition box, wherein the conductive deposition box has a deposition chamber, and one side surface of the conductive deposition box is provided with a box opening communicating with the deposition chamber; as well as, A conductive box door is movably connected to the conductive deposition box, and the conductive box door can be opened to open the box opening or can be closed. An insulating sealing ring and an elastic conductive strip are provided on one side of the conductive box door. The elastic conductive strip is arranged parallel to the adjacent insulating sealing ring and is located outside the center of the insulating sealing ring away from the box opening. When the conductive box door closes the box opening, the insulating sealing ring surrounds the box opening and seals against the conductive deposition box, and the elastic conductive strip elastically abuts against the conductive deposition box.

2. The chemical vapor deposition apparatus according to claim 1, characterized in that, When the insulating sealing ring and the elastic conductive strip are not subjected to additional external forces, the protrusion height of the elastic conductive strip protruding from one surface of the conductive box door is h1, and the protrusion height of the insulating sealing ring protruding from the same surface of the conductive box door is h2, where h1 > h2; and / or, The elastic coefficient of the elastic conductive strip is less than that of the insulating sealing ring.

3. The chemical vapor deposition apparatus according to claim 1, characterized in that, The elastic conductive strip is spaced apart from the insulating sealing ring.

4. The chemical vapor deposition apparatus according to claim 1, characterized in that, A plurality of elastic conductive strips are provided on at least one side of the insulating sealing ring, arranged at radial intervals along the insulating sealing ring.

5. The chemical vapor deposition apparatus according to claim 1, characterized in that, The elastic conductive strip is a spiral tube structure formed by spiral extension of conductive thin sheets.

6. The chemical vapor deposition apparatus according to any one of claims 1-5, characterized in that, The chemical vapor deposition apparatus includes a plurality of the aforementioned elastic conductive strips, and the elastic conductive strips are respectively provided on at least two opposite sides of the insulating sealing ring; or... The elastic conductive strip is arranged around the insulating sealing ring.

7. The chemical vapor deposition apparatus according to any one of claims 1-5, characterized in that, The conductive box door is provided with a setting groove, and the elastic conductive strip is partially engaged with the setting groove.

8. The chemical vapor deposition apparatus according to claim 7, characterized in that, The setting groove has two opposing sidewalls, each of which is provided with a first protrusion extending along the length direction of the setting groove. The elastic conductive strip is provided with a second protrusion on both sides facing the two sidewalls, the length direction of which is parallel to the extension direction of the elastic conductive strip. The first protrusion limits the second protrusion between the first protrusion and the bottom of the setting groove.

9. The chemical vapor deposition apparatus according to claim 8, characterized in that, One side of the elastic conductive strip is provided with a plurality of second protrusions, and the plurality of second protrusions are arranged at intervals along the extending direction of the elastic conductive strip; and / or, When the elastic conductive strip is not subjected to additional external force, the second convex strip is spaced apart from the adjacent sidewall.

10. The chemical vapor deposition apparatus according to any one of claims 1-5, characterized in that, The chemical vapor deposition apparatus also includes a drive unit connected between the conductive door and the conductive deposition chamber, the drive unit being capable of driving the conductive door to switch between an open state to expose the chamber opening and a closed state to cover the chamber opening.

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