A structure for improving stability of a chemical source process in a tank

Abstract

The utility model discloses a kind of structure for improving the stability of chemical source process in tank, comprising: liquid container, liquid level detection structure, control structure, stirring structure;The liquid container is equipped with import and export, one end of the stirring structure is inserted in the liquid container, the liquid level detection structure is connected with the control structure;The control structure is connected with the stirring structure. The structure of the utility model can realize the stability of chemical source process in tank, to solve in long time running process, with the consumption of liquid precursor leading to liquid level drop and the increase of space in container upper, influence precursor's vapor pressure and conveying efficiency, and then the adverse effect on the stability of atomic layer deposition process and film quality is produced.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor technology, and in particular to a structure for improving the stability of in-tank chemical source processes. Background Technology

[0002] Atomic Layer Deposition (ALD) is an advanced thin-film deposition technique characterized by the layer-by-layer construction of materials through a series of self-limiting reaction steps. The ALD process mainly involves a cycle of the following four basic steps: First, a first reactive gas or vapor is introduced into the reaction chamber, causing it to chemically adsorb onto the substrate surface until saturation. Next, an inert gas is used to remove any unreacted first reactive gas or vapor and its byproducts, ensuring the purity of subsequent steps. Then, a second reactive gas is introduced into the chamber, reacting chemically with the previously adsorbed first reactive source to form an atomic layer of the desired material. Finally, the chamber is purged again with an inert gas to remove any remaining second reactive gas and generated byproducts. This cycle can be repeated hundreds or even thousands of times, depending on the desired film thickness. In some ALD devices, liquid or solid precursors are used to generate the aforementioned reactive gases, and these precursors are carried out of the container and transported to the reaction chamber by a carrier gas.

[0003] However, during prolonged operation, as the consumption of precursors increases, the liquid level of the precursor gradually decreases, leading to an increase in the overhead space within the container. This change affects the precursor vapor pressure and transport efficiency, thus impacting the overall process performance.

[0004] Therefore, it is necessary to design a new structure to improve the stability of the in-tank chemical source process, in order to address the adverse effects on the stability of the atomic layer deposition process and the film quality caused by the decrease in liquid level and the increase in the upper space inside the container due to the consumption of liquid precursors during long-term operation. Utility Model Content

[0005] The purpose of this invention is to overcome the shortcomings of the prior art and provide a structure that improves the stability of the in-tank chemical source process.

[0006] To solve the above-mentioned technical problems, the purpose of this utility model is achieved through the following technical solution: providing a structure for improving the stability of in-tank chemical source processes, including: a liquid container, a liquid level detection structure, a control structure, and a stirring structure; the liquid container is provided with an inlet and an outlet, one end of the stirring structure is inserted into the liquid container, the liquid level detection structure is connected to the control structure; the control structure is connected to the stirring structure.

[0007] The further technical solution is as follows: the stirring structure includes a motor controller, a stirring shaft, a stirring motor, and stirring blades. One end of the stirring shaft is connected to the stirring motor, and the other end of the stirring shaft is inserted into the liquid container. The stirring blades are connected to the other end of the stirring shaft inserted into the liquid container. The stirring motor is connected to the motor controller.

[0008] The further technical solution is as follows: the motor controller is connected to the control structure, and the stirring motor, the motor controller and the control structure are respectively connected to the upper end of the liquid container.

[0009] The further technical solution is as follows: the control structure includes a whole machine controller.

[0010] The further technical solution is as follows: the liquid level detection structure includes a liquid level sensor.

[0011] The further technical solution is as follows: the liquid container is provided with a level gauge port, and the level sensor is inserted into the level gauge port.

[0012] A further technical solution includes a baffle installed inside the liquid container, and the baffle is located below the inlet.

[0013] A further technical solution is that the baffle is provided with a central hole aligned with the inlet.

[0014] The further technical solution is that the baffle has several openings.

[0015] A further technical solution is as follows: the baffle has several protrusions on the side near the inlet, and the protrusions are welded to the inner wall of the liquid container.

[0016] The advantages of this invention compared to existing technologies are as follows: By integrating a liquid container, a liquid level detection structure, a control structure, and a stirring structure into one unit, this invention effectively manages the drop in liquid level and the increase in overhead space within the container caused by the consumption of liquid precursors during long-term operation. Specifically, the system utilizes the liquid level detection structure to monitor changes in liquid level in real time and feeds this information back to the control structure. The control structure then adjusts the operating state of the stirring structure based on the liquid level data to maintain a stable gas-liquid interface and saturated vapor pressure. A baffle is installed at the inlet to guide the carrier gas to be evenly dispersed on the liquid surface, increasing the mixing efficiency between the gas and the precursor while reducing liquid surface disturbance and eddy current generation. This ensures that even with a reduction in the amount of liquid precursor, consistent delivery efficiency and vapor pressure levels are maintained, thereby guaranteeing the stability of the atomic layer deposition process and that the film quality remains unaffected. This design solves the process instability problem caused by liquid level fluctuations in traditional methods, providing a reliable guarantee for achieving efficient and high-quality film deposition.

[0017] The present invention will be further described below with reference to the accompanying drawings and specific embodiments. Attached Figure Description

[0018] To more clearly illustrate the technical solutions of the embodiments of this utility model, the drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0019] Figure 1 A front view schematic diagram of a structure for improving the stability of in-tank chemical source processes, provided as an embodiment of this utility model; Figure 2 A top view schematic diagram of a structure for improving the stability of in-tank chemical source processes, provided as an embodiment of this utility model; Figure 3 A cross-sectional view of a structure for improving the stability of in-tank chemical source processes, provided as an embodiment of this utility model. Figure 1 ; Figure 4 A cross-sectional view of a structure for improving the stability of in-tank chemical source processes, provided as an embodiment of this utility model. Figure 2 ; Figure 5 A three-dimensional structural diagram of the baffle provided in an embodiment of this utility model; Figure 6 A side view of the baffle provided in an embodiment of this utility model; Explanation of the markings in the image: 10. Liquid container; 11. Inlet; 12. Outlet; 20. Stirring shaft; 21. Stirring motor; 22. Stirring blades; 30. Baffle; 31. Opening; 32. Protrusion. Detailed Implementation

[0020] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of the present utility model.

[0021] It should be understood that, when used in this specification and the appended claims, the terms "comprising" and "including" indicate the presence of the described features, integrals, steps, operations, elements and / or components, but do not exclude the presence or addition of one or more other features, integrals, steps, operations, elements, components and / or collections thereof.

[0022] It should also be understood that the terminology used in this specification is for the purpose of describing particular embodiments only and is not intended to limit the scope of the invention. As used in this specification and the appended claims, the singular forms “a,” “an,” and “the” are intended to include the plural forms unless the context clearly indicates otherwise.

[0023] It should also be further understood that the term "and / or" as used in this specification and the appended claims refers to any combination of one or more of the associated listed items and all possible combinations, and includes such combinations.

[0024] Atomic layer deposition (ALD) is an advanced thin-film deposition technique that builds materials layer by layer through a self-limiting reaction process. It mainly includes four cyclic steps: introducing a first reactive gas and allowing it to chemically adsorb onto the substrate surface until saturation; removing unreacted gases and byproducts with an inert gas; introducing a second reactive gas to react with the adsorbed first reactive gas to form an atomic layer; and purging again with an inert gas to remove remaining gases and byproducts. This process can be repeated multiple times as needed to achieve the target film thickness. However, during long-term operation, as the consumption of liquid precursor increases and the liquid level drops, the overhead space within the container increases, affecting the precursor vapor pressure and transport efficiency, thus adversely impacting process stability and film quality.

[0025] Therefore, this utility model provides a structure to improve the stability of the in-tank chemical source process, thereby improving the stability of the in-tank chemical source process and solving the problem that during long-term operation, the consumption of liquid precursors leads to a drop in liquid level and an increase in the upper space inside the container, which affects the vapor pressure and transport efficiency of the precursors, and thus has an adverse effect on the stability of the atomic layer deposition process and the film quality.

[0026] Specifically, a structure to improve the stability of in-tank chemical source processes addresses the issues of liquid level drop and increased overhead space caused by liquid precursor consumption during long-term operation through the coordinated operation of a liquid container 10, a liquid level detection structure, a control structure, and a stirring structure. Specific measures include: using a liquid level sensor to monitor the liquid level and adjusting operating parameters via a controller; installing a stirring motor 21 to drive stirring blades 22 to maintain uniform liquid mixing and prevent changes in liquid level from affecting precursor vapor pressure and transport efficiency; and installing a baffle 30 below the inlet 11 inside the liquid container 10, with openings 31 and a central hole design to help evenly distribute newly added liquid and reduce impact on the existing liquid level, while the protrusion 32 welded to the inner wall of the container ensures the stability of the baffle 30. This series of designs effectively maintains the consistency of precursor supply, thereby ensuring the stability of the atomic layer deposition process and the quality of the thin film.

[0027] To better understand the above technical solutions, the following will provide a detailed explanation of the technical solutions in conjunction with the accompanying drawings and specific implementation methods.

[0028] Please see Figures 1 to 4 A structure for improving the stability of in-tank chemical source processes includes: a liquid container 10, a liquid level detection structure, a control structure, and a stirring structure; the liquid container 10 is provided with an inlet 11 and an outlet 12, one end of the stirring structure is inserted into the liquid container 10, the liquid level detection structure is connected to the control structure, and the control structure is connected to the stirring structure.

[0029] In this embodiment, the liquid container 10 is the main part for storing the chemical source. It is equipped with an inlet 11 and an outlet 12 for adding and discharging the chemical source. The liquid container 10, also known as a cylinder, is internally designed to most effectively mix the carrier gas, such as Ar, with the precursor to ensure that they are uniformly and thoroughly mixed.

[0030] The liquid level detection structure includes one or more liquid level sensors mounted on the liquid container 10 to monitor the liquid level of the chemical source within the container in real time. This information is crucial for maintaining stable process conditions because adjustments are required to maintain stable saturated vapor pressure as the total liquid volume decreases.

[0031] The level controller receives information from the level detection structure and automatically adjusts the operating status of the stirring motor 21 according to changes in the level. The overall controller coordinates the work of each component to ensure efficient and stable operation of the entire system.

[0032] One end of the stirring shaft 20 is connected to the stirring motor 21, and the other end is inserted into the liquid container 10 and equipped with stirring blades 22. When the liquid level in the liquid container 10 decreases, the control system starts the stirring motor 21, which increases the movement speed / vaporization efficiency of gas molecules by rotating the stirring blades 22, thereby allowing Ar to mix more thoroughly and evenly with the chemical source under the action of the saturated vapor pressure in the cylinder. In addition, a baffle 30 with an opening 31 is provided above the liquid surface at the inlet 11 of the liquid container 10. This helps to improve the flow of Ar carrier gas, making it contact the chemical source more evenly, while reducing the impact disturbance on the liquid surface and preventing the generation of eddies or turbulence.

[0033] In summary, this structure achieves the goal of improving the stability of the in-tank chemical source process through precise liquid level control, effective gas mixing, and optimized gas flow patterns, ensuring stable process conditions and high-quality thin film deposition even during long-term operation.

[0034] In one embodiment, please refer to Figure 4 The above-mentioned stirring structure includes a motor controller, a stirring shaft 20, a stirring motor 21, and stirring blades 22. One end of the stirring shaft 20 is connected to the stirring motor 21, and the other end of the stirring shaft 20 is inserted into the liquid container 10. The stirring blades 22 are connected to the other end of the stirring shaft 20 inserted into the liquid container 10. The stirring motor 21 is connected to the motor controller.

[0035] In this embodiment, the motor controller is responsible for receiving instructions from the control structure and precisely adjusting the speed and operating mode of the stirring motor 21 according to these instructions, thereby achieving fine control of the stirring process.

[0036] As the core component connecting the stirring motor 21 and the stirring blades 22, the stirring shaft 20 must not only withstand mechanical stress but also ensure rotational stability and sealing within the liquid container 10. One end of the shaft is connected to the stirring motor 21, and the other end is inserted into the liquid container 10.

[0037] The stirring motor 21 provides the power source to drive the stirring shaft 20 and the stirring blades 22 attached thereto to rotate. The motor needs to have sufficient power and durability to meet the requirements of long-term operation.

[0038] The stirring blades 22 are located inside the liquid container 10 and are driven to rotate by the stirring shaft 20, thus mixing the chemical sources. Fluid dynamics principles must be considered during the design process to ensure optimal mixing.

[0039] In one embodiment, the motor controller is connected to the control structure, and the stirring motor 21, the motor controller, and the control structure are respectively connected to the upper end of the liquid container 10.

[0040] The mixing motor 21 and the motor controller are connected by an electrical circuit, enabling the motor controller to monitor and adjust the working status of the mixing motor 21 in real time.

[0041] Stirring motor 21, motor controller and control structure: All three are located at the top of liquid container 10. This layout facilitates maintenance and management, and also reduces the impact on the internal space of the container.

[0042] In one embodiment, the control structure described above includes a system controller. As the brain of the entire system, the system controller is responsible not only for coordinating the work of various components such as the level detection structure and the stirring structure, but also for processing data from sensors and making corresponding decisions to maintain the stability of the process conditions.

[0043] In one embodiment, the liquid level detection structure described above includes a liquid level sensor. This sensor is used to monitor changes in the liquid level within the liquid container 10. Its accuracy directly affects the system's response speed and accuracy.

[0044] In one embodiment, please refer to Figure 2 The liquid container 10 is equipped with a level gauge port 13, and a level sensor is inserted into the level gauge port 13. The level sensor is inserted into the specially designed level gauge port 13 on the liquid container 10, which ensures the accuracy of the measurement and facilitates the installation and calibration of the sensor.

[0045] To ensure that the level sensor can accurately detect the liquid level, the liquid container 10 is equipped with a dedicated level gauge port 13. This design allows the level sensor to be directly inserted into the liquid without altering the overall sealing or structural strength of the container.

[0046] In summary, through its meticulously designed stirring structure, precise liquid level monitoring mechanism, and intelligent control system, this system can maintain stable operation in complex chemical processes, improving production efficiency and product quality. Furthermore, the rational component layout also considers convenience and safety in actual operation.

[0047] In one embodiment, please refer to Figure 3 The aforementioned structure for improving the stability of the chemical source process in the tank also includes a baffle 30, which is installed inside the liquid container 10 and is located below the inlet 11.

[0048] In one embodiment, the baffle 30 is provided with a central hole aligned with the inlet 11.

[0049] In one embodiment, please refer to Figure 5 and Figure 6 The aforementioned baffle 30 has several openings 31.

[0050] In one embodiment, please refer to Figure 5 and Figure 6 The baffle 30 mentioned above has several protrusions 32 on the side near the inlet 11, and the protrusions 32 are welded to the inner wall of the liquid container 10.

[0051] Baffle 30 is installed inside the liquid container 10, below the inlet 11. This layout effectively guides the flow path of the carrier gas after it enters the cylinder, allowing the gas to be more evenly distributed throughout the container, thereby improving the contact efficiency with the chemical source.

[0052] The baffle 30 has a central hole with a diameter of 7.7 mm that is aligned with the inlet 11. This design ensures that the carrier gas can flow directly and centrally to the liquid surface, while reducing efficiency losses caused by excessive airflow dispersion.

[0053] In addition to the central orifice, the baffle 30 is also provided with several small holes with a diameter of 0.7 mm. These small holes help to disperse the airflow, making it more evenly distributed on the liquid surface, further improving the mixing uniformity of the gas and chemical source, while also reducing the possible local high-pressure or low-pressure areas.

[0054] Several protrusions 32 are provided on the side near the inlet 11, and these protrusions 32 are welded to the inner wall of the liquid container 10. This design not only increases the stability of the baffle 30, but also plays a certain role in guiding the flow, helping the airflow to pass through the baffle 30 more smoothly.

[0055] The distance between the lower end face of the baffle 30 and the bottom of the liquid container 10 is set at 122 mm, while the distance between the bottom of the stirring structure and the bottom of the liquid container 10 is 110 mm. This design ensures that the baffle 30 will not interfere with the operation of the stirring device, while effectively guiding the airflow.

[0056] The diameter of baffle 30 is 60mm, and the cross-sectional area is 0.011m². 2 This size satisfies the airflow requirements without taking up too much space or affecting the function of other components.

[0057] After the carrier gas enters the liquid container 10, the rotating stirring blades 22 increase the velocity of gas molecules and vaporization efficiency. During this process, the carrier gas and precursor are thoroughly mixed due to the saturated vapor pressure. Furthermore, the presence of the baffle 30 significantly improves the airflow distribution, reduces impact disturbances at the liquid surface, and prevents eddies or turbulence. As the total liquid volume decreases, the stirring device continues to operate, increasing the pressure by raising the velocity of gas molecules, thereby regulating the saturated vapor pressure within the cylinder to maintain it within a stable range.

[0058] The liquid level controller is used to monitor the changes in liquid level in the liquid container 10 in real time and adjust the working status of the stirring motor 21 as needed.

[0059] In addition, the above structure also includes a temperature controller, which is connected to the overall controller.

[0060] The temperature controller ensures that the temperature conditions meet the requirements throughout the operation, avoiding the impact of temperature fluctuations on the efficiency of the chemical reaction.

[0061] The overall controller, as the core control unit, is responsible for coordinating the work of each part and maintaining the stable operation of the entire system.

[0062] In summary, this embodiment, by introducing a specially designed baffle 30, not only improves the uniformity of gas mixing with the precursor, but also effectively reduces unstable factors during operation, which is of great significance for improving chemical production efficiency and product quality.

[0063] The aforementioned structure for improving the stability of in-tank chemical source processes integrates a liquid container 10, a liquid level detection structure, a control structure, and a stirring structure into one unit. This enables effective management of liquid level drops and increased overhead space within the container due to the consumption of liquid precursors during long-term operation. Specifically, the system utilizes the liquid level detection structure to monitor changes in liquid level in real time and feeds this information back to the control structure. The control structure then adjusts the operating state of the stirring structure based on the liquid level data to maintain a stable gas-liquid interface and saturated vapor pressure. A baffle 30 is installed at the inlet 11 to guide the carrier gas to be evenly dispersed on the liquid surface, increasing the mixing efficiency between the gas and the precursor while reducing liquid surface disturbance and eddy current generation. This ensures that even with a reduction in the amount of liquid precursor, consistent delivery efficiency and vapor pressure levels are maintained, thereby guaranteeing the stability of the atomic layer deposition process and ensuring that film quality remains unaffected. This design solves the process instability problem caused by liquid level fluctuations in traditional methods, providing a reliable guarantee for achieving efficient and high-quality film deposition.

[0064] The above description is merely a specific embodiment of this utility model, but the protection scope of this utility model is not limited thereto. Any person skilled in the art can easily conceive of various equivalent modifications or substitutions within the technical scope disclosed in this utility model, and these modifications or substitutions should all be covered within the protection scope of this utility model. Therefore, the protection scope of this utility model should be determined by the scope of the claims.

Claims

1. A structure for improving the stability of in-tank chemical source processes, characterized in that, include: The liquid container includes a liquid level detection structure, a control structure, and a stirring structure. The liquid container has an inlet and an outlet. One end of the stirring structure is inserted into the liquid container. The liquid level detection structure is connected to the control structure. The control structure is also connected to the stirring structure.

2. The structure for improving the stability of in-tank chemical source processes according to claim 1, characterized in that, The stirring structure includes a motor controller, a stirring shaft, a stirring motor, and stirring blades. One end of the stirring shaft is connected to the stirring motor, and the other end of the stirring shaft is inserted into the liquid container. The stirring blades are connected to the end of the stirring shaft inserted into the liquid container. The stirring motor is connected to the motor controller.

3. The structure for improving the stability of in-tank chemical source processes according to claim 2, characterized in that, The motor controller is connected to the control structure, and the stirring motor, the motor controller, and the control structure are respectively connected to the upper end of the liquid container.

4. The structure for improving the stability of in-tank chemical source processes according to claim 1, characterized in that, The control structure includes a whole machine controller.

5. The structure for improving the stability of in-tank chemical source processes according to claim 1, characterized in that, The liquid level detection structure includes a liquid level sensor.

6. The structure for improving the stability of in-tank chemical source processes according to claim 5, characterized in that, The liquid container is equipped with a level gauge port, and the level sensor is inserted into the level gauge port.

7. The structure for improving the stability of in-tank chemical source processes according to claim 1, characterized in that, It also includes a baffle installed inside the liquid container and located below the inlet.

8. The structure for improving the stability of in-tank chemical source processes according to claim 7, characterized in that, The baffle plate has a central hole aligned with the inlet.

9. The structure for improving the stability of in-tank chemical source processes according to claim 7, characterized in that, The baffle plate has several openings.

10. The structure for improving the stability of in-tank chemical source processes according to claim 7, characterized in that, The baffle has several protrusions on the side near the inlet, and the protrusions are welded to the inner wall of the liquid container.

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