An annealing apparatus for optoelectronic crystalline materials

Abstract

The utility model discloses a kind of photoelectric crystal material annealing device, belong to crystal processing equipment technical field, including annealing furnace and the material rack of slidingly being placed in the inside of annealing furnace, the transverse outer surface of the material rack is distributed with multiple bulkheads, adjusting assembly is cooperatively arranged in material rack outer wall and bulkhead inside, adjusting assembly includes rack, catch, pull rod, sliding column, first spring and guide rod, rack is fixed in material rack outer wall, catch is slidably connected in bulkhead inner wall and is engaged with rack, bulkhead outer wall is equipped with the support assembly that is composed of support block, fixed column, limit block and second spring. The utility model realizes the quick adjustment and positioning of bulkhead spacing by adjusting assembly, improves the adaptation force to different specifications crystals, using the multi-point elastic suspension design of support assembly, make support block flexible adhesion crystal surface, absorb thermal expansion stress when high-temperature annealing, avoid that crystal produces indentation and micro crack, improve annealing yield.

Description

Technical Field

[0001] This utility model relates to the field of crystal processing equipment technology, and in particular to an annealing device for optoelectronic crystal materials. Background Technology

[0002] After growth and molding, optoelectronic crystal materials often have significant residual thermal stress and structural defects, which must be eliminated and improved through high-temperature annealing to enhance the optical uniformity and physical properties of the crystal. During the annealing process, a specialized rack is typically used to separate and support multiple optoelectronic crystal materials before they are pushed into an annealing furnace for prolonged heat treatment.

[0003] Existing optoelectronic crystal annealing racks typically use welded or bolted fixed structures to mount the partitions onto the rack base, resulting in a single, unchangeable spacing between the partitions. However, optoelectronic crystal materials from different batches or to meet different customer requirements vary significantly in thickness and shape. Fixed-spacing racks cannot flexibly accommodate crystals of various sizes, necessitating frequent replacements of different sized dedicated racks in the production workshop. This severely impacts equipment versatility, significantly affecting production efficiency and increasing manufacturing costs.

[0004] Furthermore, traditional material racks typically use rigid, flat metal plates for direct support of the partitions. When photoelectric crystal materials are placed between these partitions and subjected to high-temperature heating in an annealing furnace, both the crystal material and the metal partitions undergo significant thermal expansion. Because the partition surfaces are in rigid contact and lack buffer space, the crystals experience intense compressive stress against the outer walls of the partitions during expansion. This stress cannot be effectively released, easily leading to severe indentations, scratches, or even internal microcracks on the surface of the photoelectric crystals, rendering them unusable.

[0005] Therefore, this invention proposes an annealing device for optoelectronic crystal materials to address the shortcomings of existing technologies. Utility Model Content

[0006] To overcome the above shortcomings, this utility model provides an annealing device for optoelectronic crystal materials, which aims to improve the problems in the existing technology, such as the fixed spacing of the partitions in the optoelectronic crystal annealing rack being unable to adapt to crystals of different specifications, and the rigid contact support being prone to indentation and microcrack damage to the crystals due to high-temperature thermal expansion and compression.

[0007] To achieve the above objectives, this utility model provides an annealing device for optoelectronic crystal materials, comprising: an annealing furnace, a material rack slidably placed inside the annealing furnace, and a plurality of partitions distributed on the transverse outer surface of the material rack.

[0008] The outer wall of the partition is provided with a support assembly, which includes a support block, a fixing column, a limiting block and a second spring. The adjustment assembly includes a rack, a locking tooth, a pull rod, a sliding column, a first spring and a guide rod.

[0009] Furthermore, the rack is fixedly connected to the outer wall of the material rack, the locking teeth are slidably connected to the inner wall of the partition, and the locking teeth engage with the rack. The pull rod is fixedly connected to the sliding column, the sliding column is fixedly connected to the locking teeth, and the locking teeth are fixedly connected to the guide rod. Both the sliding column and the guide rod are slidably engaged with the inner wall of the partition. The first spring is sleeved on the outer wall of the sliding column. A support assembly is provided on the outer wall of the partition. The support assembly includes a support block, a fixed column, a limiting block, and a second spring. The fixed column is fixedly connected to the outer wall of the partition. The limiting block is fixedly connected to the end of the fixed column. The support block is sleeved on the outer wall of the fixed column, and the support block is slidably connected to the outer wall of the fixed column. The second spring is disposed on the inner wall of the support block. The limiting block cooperates with the support block to compress and limit the second spring.

[0010] Preferably, the sliding column is fixedly connected to the top of the pull rod, the locking tooth is fixedly connected to the top of the sliding column, and the pull rod passes through and extends to the outside of the partition.

[0011] Preferably, the guide rod is fixedly connected to the bottom of the locking tooth, and the guide rod slides synchronously with the locking tooth on the inner wall of the partition.

[0012] Preferably, the two ends of the first spring abut against the outer surface of the locking tooth and the inner wall of the partition, respectively.

[0013] Preferably, the partition plate is in sliding engagement with the outer wall of the material rack and the rack.

[0014] Preferably, the direction of movement of the locking teeth on the inner wall of the partition is perpendicular to the direction of movement of the partition on the outer wall of the rack.

[0015] This utility model has the following beneficial effects: 1. In this utility model, by setting an adjustment assembly consisting of a rack, a toothed tooth, a pull rod, a sliding column, a first spring, and a guide rod in cooperation between the outer wall of the material rack and the inside of the partition, the problem of the fixed spacing of the partition of the annealing material rack in the prior art being unable to adapt to crystal materials of different specifications is solved. The technical effect of being able to quickly and stably slide and adjust the spacing of the partition and accurately position it is achieved, which greatly improves the versatility and changeover efficiency of the annealing device.

[0016] 2. This utility model solves the problem that traditional rigid partitions are prone to crystal damage due to compressive stress caused by high-temperature thermal expansion when a multi-point elastic support assembly consisting of a support block, a fixing column, a limiting block, and a second spring is set on the outer wall of the partition. This achieves the technical effect of multi-point flexible adaptive suspension support for photoelectric crystals, effectively absorbing thermal expansion stress, avoiding indentation and micro-cracks in the crystals, thereby improving the annealing quality and yield of photoelectric crystals. Attached Figure Description

[0017] Figure label: Figure 1 This is a perspective view of an annealing apparatus for photoelectric crystal materials proposed in this utility model; Figure 2 This is a schematic diagram of the material rack of an annealing device for optoelectronic crystal materials proposed in this utility model; Figure 3 for Figure 2 Enlarged view of point A in the middle; Figure 4 This is a schematic diagram of the partition plate of an annealing device for optoelectronic crystal materials proposed in this utility model; Figure 5 for Figure 4 Enlarged view of point B in the middle.

[0018] Legend: 1. Annealing furnace; 2. Adjustment assembly; 201. Rack; 202. Gear; 203. Pull rod; 204. Sliding column; 205. First spring; 206. Guide rod; 3. Support assembly; 301. Support block; 302. Fixed column; 303. Limiting block; 304. Second spring; 4. Material rack; 5. Partition plate. Detailed Implementation

[0019] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0020] Reference Figures 1-5 This utility model provides an annealing device for optoelectronic crystal materials, which aims to solve the problems of the fixed spacing of the partition plates of the existing optoelectronic crystal annealing rack, which cannot be adapted to materials of different specifications, and the rigid support is prone to crystal damage due to thermal expansion stress.

[0021] The photoelectric crystal material annealing device includes an annealing furnace 1 and a material rack 4 that slides inside the annealing furnace 1. The annealing furnace 1 serves as the core carrier that provides a high-temperature heat treatment environment for the entire device, while the material rack 4 is used to carry the photoelectric crystal material and move it in and out of the annealing furnace 1 for batch processing.

[0022] To solve the above-mentioned technical problems, the core of the technical solution of this embodiment is that the photoelectric crystal material annealing device further includes a partition 5. The top of the material rack 4 is provided with a partition 5. An adjustment component 2 is provided between the outer wall of the material rack 4 and the interior of the partition 5. The adjustment component 2 includes a rack 201, a locking tooth 202, a pull rod 203, a sliding column 204, a first spring 205, and a guide rod 206. The rack 201 is fixedly connected to the outer wall of the material rack 4. The locking tooth 202 is slidably connected to the inner wall of the partition 5, and the locking tooth 202 is engaged with the rack 201. The pull rod 203 is fixedly connected to the sliding column 204. The sliding column 204 is fixedly connected to the locking tooth 202. The locking tooth 202 is fixedly connected to the guide rod 206. The sliding column 204 and the guide rod 206 are also fixedly connected. All components slide against the inner wall of the partition 5. The first spring 205 is sleeved on the outer wall of the sliding column 204. The adjustment component 2 receives external power input through the pull rod 203, which drives the locking tooth 202 to slide linearly and retract within the space inside the partition 5. This releases the mechanical engagement and locking state between the locking tooth 202 and the rack 201, allowing the partition 5 to slide freely on the material rack 4 to change the spacing between them. In the assembled and adjusted state, the dual-axis sliding guide structure of the sliding column 204 and the guide rod 206 ensures the high stability and anti-deflection capability of the locking tooth 202 during the reciprocating motion of compressing the first spring 205, completely avoiding the risk of jamming and torsional failure that can easily occur in a single moving part under high temperature and complex environment.

[0023] Based on the above embodiments, the present invention may further include the following preferred technical solutions: As a preferred embodiment, in order to ensure that the external adjustment action can be smoothly transmitted to the internal locking mechanism, the sliding column 204 is fixedly connected to the top of the pull rod 203, the locking tooth 202 is fixedly connected to the top of the sliding column 204, the pull rod 203 passes through and extends to the outside of the partition 5, and the operator can directly drive the overall component to move by applying a pulling force to the pull rod 203 extending to the outside of the partition 5. As another preferred embodiment, in order to further improve the guiding accuracy of the sliding adjustment process and prevent the mechanism from tilting under force, the guide rod 206 is fixedly connected to the bottom of the tooth 202, and the guide rod 206 slides synchronously with the tooth 202 on the inner wall of the partition 5. This parallel double-track layout makes the force distribution more uniform. As another preferred embodiment, in order to ensure that the mechanism has a stable and reliable automatic reset and rebound capability after unlocking, the two ends of the first spring 205 abut against the outer surface of the locking tooth 202 and the inner wall of the partition 5, respectively. When the tension applied to the pull rod 203 is removed, the first spring 205 releases the accumulated elastic potential energy and forcefully pushes the locking tooth 202 to re-embed into the tooth gap of the rack 201 to complete the positioning. As another preferred embodiment, in order to solve the problem of rigid bonding and pressure damage of crystal materials under high temperature environment, a support component 3 is provided on the outer wall of the partition 5. The support component 3 includes a support block 301, a fixing column 302, a limiting block 303 and a second spring 304. The fixing column 302 is fixedly connected to the outer wall of the partition 5, the limiting block 303 is fixedly connected to the end of the fixing column 302, the support block 301 is sleeved on the outer wall of the fixing column 302 and the support block 301 is slidably connected to the outer wall of the fixing column 302, and the second spring 304 is provided on the inner wall of the support block 301. The limiting block 303 cooperates with the support block 301 to compress and limit the second spring 304. Through this multi-point elastic suspension arrangement, the photoelectric crystal material under high temperature can squeeze the support block 301 outward and force the second spring 304 to contract when thermal expansion occurs, thereby adaptively absorbing and resolving the fatal expansion and compression stress. As another preferred embodiment, in order to ensure that the partition 5 can move in a wide range of stepless adjustable distance in the length direction of the material rack 4, the partition 5 is slidably engaged with the material rack 4 and the outer wall of the rack 201. At the same time, the moving direction of the locking tooth 202 on the inner wall of the partition 5 is perpendicular to the moving direction of the partition 5 on the outer wall of the material rack 4. This orthogonal motion trajectory design isolates the interference of translational resistance on the locking state from the perspective of physical mechanics, and improves the overall structural rigidity and dimensional stability of the annealing device when it is subjected to high temperature load.

[0024] Working principle: When the annealing space needs to be adjusted according to different specifications of photoelectric crystal materials, the pull rod 203 is pulled outward to start the movement. Since the pull rod 203 is fixedly connected to the sliding column 204 and the locking tooth 202, the locking tooth 202 overcomes the elastic force of the first spring 205 and slides into the partition 5. The guide rod 206 slides synchronously to provide precise guidance, so that the locking tooth 202 disengages from the locking constraint of the rack 201. Then, the partition 5 is pushed to slide on the material rack 4 and the outer wall of the rack 201 to the predetermined spacing position. The pull rod 203 is released, the first spring 205 rebounds and pushes the locking tooth 202 to reset and re-engage with the rack 201, thereby achieving efficient adjustment of the spacing; when the photoelectric crystal... When the bulk material is placed between the partitions 5, the crystal surface comes into contact with the support block 301. Under the influence of gravity and subsequent high-temperature thermal expansion, the crystal squeezes the support block 301 to slide on the outer wall of the fixed column 302. The limiting block 303 cooperates to compress the second spring 304. The elastic reaction force of the second spring 304 keeps the support block 301 flexibly attached to the crystal surface. This multi-point suspended flexible support structure effectively resists and absorbs the compressive stress generated by high-temperature thermal expansion, thereby preventing the crystal material from being damaged by indentation or microcracks. By adjusting the synergistic effect of the component 2 and the support component 3, the problem of poor equipment versatility and easy crystal damage in the prior art is solved.

Claims

1. An annealing apparatus for photoelectric crystal materials, comprising: Annealing furnace (1), and material rack (4) that is slidably placed inside the annealing furnace (1); The material rack (4) is characterized in that multiple partitions (5) are distributed on the transverse outer surface of the material rack (4), and an adjustment component (2) is provided in cooperation with the inner part of the partition (5) on the outer wall of the material rack (4). The adjustment component (2) includes a rack (201), a tooth (202), a pull rod (203), a sliding column (204), a first spring (205), and a guide rod (206). The rack (201) is fixedly connected to the outer wall of the material rack (4), the locking tooth (202) is slidably connected to the inner wall of the partition (5), and the locking tooth (202) engages with the rack (201); the pull rod (203) is fixedly connected to the sliding column (204), the sliding column (204) is fixedly connected to the locking tooth (202), and the locking tooth (202) is fixedly connected to the guide rod (206); both the sliding column (204) and the guide rod (206) slide in cooperation with the inner wall of the partition (5), the first spring (205) is sleeved on the outer wall of the sliding column (204), and the outer wall of the partition (5) is provided with a support assembly (3). The support assembly (3) includes a support block (301), a fixed column (302), a limiting block (303), and a second spring (304). The fixed column (302) is fixedly connected to the outer wall of the partition (5), and the limiting block (303) is fixedly connected to the end of the fixed column (302). The support block (301) is sleeved on the outer wall of the fixed column (302), and the support block (301) is slidably connected to the outer wall of the fixed column (302). The second spring (304) is disposed on the inner wall of the support block (301), and the limiting block (303) cooperates with the support block (301) to compress and limit the second spring (304).

2. The photoelectric crystal material annealing apparatus according to claim 1, characterized in that, The sliding column (204) is fixedly connected to the top of the pull rod (203), the locking tooth (202) is fixedly connected to the top of the sliding column (204), and the pull rod (203) passes through and extends to the outside of the partition (5).

3. The photoelectric crystal material annealing apparatus according to claim 1, characterized in that, The guide rod (206) is fixedly connected to the bottom of the tooth (202), and the guide rod (206) slides synchronously with the tooth (202) on the inner wall of the partition (5).

4. The photoelectric crystal material annealing apparatus according to claim 1, characterized in that, The two ends of the first spring (205) abut against the outer surface of the tooth (202) and the inner wall of the partition (5), respectively.

5. The photoelectric crystal material annealing apparatus according to claim 1, characterized in that, The partition (5) is in sliding fit with the outer wall of the material rack (4) and the rack (201).

6. The photoelectric crystal material annealing apparatus according to claim 1, characterized in that, The direction of movement of the pawl (202) on the inner wall of the partition (5) is perpendicular to the direction of movement of the partition (5) on the outer wall of the rack (4).

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