A positioning stage

Abstract

The utility model discloses a positioning platform, including substrate, be equipped with center hole on the substrate, be equipped with a plurality of adsorption structure on the substrate located center hole outer periphery, be equipped with the positioning wheel of right angle distribution on the substrate located adsorption structure periphery, be equipped with the drive mechanism of right angle distribution on the substrate opposite positioning wheel, still be equipped with a plurality of containing groove with center hole intercommunication on the substrate, all be equipped with plane calibration mechanism in each containing groove. Realized the integration of the parallelism adjustment of photolithography board positioning and wafer position, and the positioning speed of photolithography board is fast, and the precision is high, and simultaneously, effectively guaranteed the parallelism of wafer and photolithography board, laid the foundation for high quality to carry out exposure, photoetching etc. Process, and, compact, high integration, small volume.

Description

Technical Field

[0001] This utility model belongs to the field of photolithography positioning technology, and in particular relates to a positioning platform. Background Technology

[0002] Currently, in wafer exposure and photolithography processes, the photomask is a crucial auxiliary component. During operation, the photomask needs to be positioned to ensure that its relative position to the wafer remains fixed throughout the exposure and photolithography process. Currently, positioning the photomask requires the coordinated work of multiple devices, resulting in a complex structure, numerous steps, slow positioning speed, low efficiency, and difficulty in guaranteeing positioning accuracy. At the same time, a large amount of space needs to be reserved for the coordinated operation of the devices. Utility Model Content

[0003] This invention provides a positioning stage to achieve rapid positioning of photolithography plates.

[0004] To solve the above-mentioned technical problems, the technical solution of this utility model is: a positioning platform, including a base plate, a central hole on the base plate, a plurality of adsorption structures on the base plate located around the central hole, positioning wheels arranged at right angles on the base plate located around the adsorption structures, and a driving mechanism arranged at right angles on the base plate opposite to the positioning wheels.

[0005] The substrate is also provided with a plurality of receiving slots communicating with the central hole, and each receiving slot is provided with a plane calibration mechanism.

[0006] As an improvement, the planar calibration mechanism includes a calibration plate located within the receiving slot, the calibration plate having a calibration ball; the calibration plate is driven by a first linear drive element.

[0007] As a further improvement, the first linear drive element is a pneumatic element and is disposed within the substrate, which also has an air passage.

[0008] As a further improvement, a notch is provided on the outer wall of the substrate, and the notch is connected to the air passage.

[0009] As an improvement, the adsorption structure includes a square boss integrally formed on the substrate, and the central hole passes through the boss;

[0010] Each corner of the boss is provided with a recessed air chamber, and the substrate located in the air chamber is provided with an air hole, which communicates with an air channel provided on the substrate.

[0011] As a further improvement, the substrate located in the air chamber is provided with a plurality of protruding partition strips.

[0012] As a further improvement, the positioning wheels are distributed on the outer side of one right-angled side of the boss, and mounting seats are provided on the outer side of the opposite right-angled side, with the driving mechanism provided on each mounting seat.

[0013] As a further improvement, the drive mechanism includes a second linear drive element fixedly mounted on the mounting base, the drive end of the second linear drive element being hinged to a swing seat, and the swing seat being rotatably mounted on the mounting base;

[0014] A drive wheel is rotatably mounted on the swing seat, and an arc-shaped positioning groove is provided on the base plate at the position corresponding to the drive wheel.

[0015] As a further improvement, positioning bevels are provided on both opposite end faces of the substrate.

[0016] As a further improvement, the positioning inclined surface is provided in three parts and arranged in a triangular pattern.

[0017] After adopting the above technical solution, the effect of this utility model is:

[0018] The positioning stage includes a substrate with a central hole. Multiple adsorption structures are located on the substrate surrounding the central hole. Positioning wheels are arranged at right angles on the substrate surrounding the adsorption structures. A driving mechanism is arranged at right angles on the substrate opposite the positioning wheels. The substrate also has multiple receiving slots communicating with the central hole, each containing a plane calibration mechanism. Based on this structure, in use, the photomask is first placed on the substrate. Then, the driving mechanism actuates and pushes the photomask towards the positioning wheels. Once the photomask contacts all the right-angled positioning wheels, its positioning is complete. The adsorption structures then hold the photomask in place and maintain its position. During this process, the rotation of the positioning wheels reduces resistance and friction during photomask positioning, improving positioning smoothness. Simultaneously, the plane calibration mechanism adjusts the flatness of the wafer carrier to ensure the parallelism between the wafer and the photomask, guaranteeing subsequent exposure and lithography processes.

[0019] In summary, this positioning stage integrates the positioning of the photomask and the adjustment of the parallelism of the wafer, and achieves fast and accurate positioning of the photomask. At the same time, it effectively ensures the parallelism of the wafer and the photomask, laying the foundation for high-quality exposure, photolithography and other processes. Moreover, the positioning stage is compact, highly integrated and small in size.

[0020] The planar calibration mechanism includes a calibration plate located in the receiving groove, with calibration balls on the calibration plate. The calibration plate is driven by a first linear drive element, which drives the calibration plate to extend or retract within the receiving groove. When retracted, it does not affect normal operation. When extended, it uses the calibration balls to perform point-contact calibration with the carrier on which the wafer is placed (i.e., the planarity calibration is completed after the end face of the carrier contacts all the calibration balls). The structure is simple, the planarity calibration accuracy is high, and it can be completed quickly.

[0021] Since the first linear drive element is a pneumatic element and is located inside the substrate, and the substrate also has an air passage, it can not only reduce the space occupancy rate, but also prevent mutual interference during operation.

[0022] Because there are notches on the outer wall of the substrate, and the notches are connected to the air passage, connectors that are connected to the air passage can be arranged through the notches, which can also improve the compactness of the arrangement and save space.

[0023] The adsorption structure includes a square boss integrally formed on the substrate, with a central hole passing through the boss; each corner of the boss is provided with a recessed air chamber, and the substrate inside the air chamber is provided with an air hole, which is connected to an air channel provided on the substrate. Thus, the boss can raise the placement height of the photomask, making it easier for the driving mechanism to fully contact the photomask and push it; through the cooperation of the air chamber, air hole and air channel, the negative pressure is used to pick up the photomask, resulting in good adsorption effect and strong fixation of the photomask position.

[0024] Because the substrate located in the gas chamber has multiple protruding partition strips, the partition strips facilitate the uniform distribution of gas in the gas chamber, which helps to improve the adsorption effect on the photomask.

[0025] Because the positioning wheels are distributed on the outside of one right-angled side of the boss, and mounting seats are provided on the outside of the opposite right-angled side, and each mounting seat is equipped with a driving mechanism, the photomask is surrounded on all four sides without any displacement.

[0026] Since the driving mechanism includes a second linear driving element fixedly mounted on the mounting base, and a swing seat is hinged to the driving end of the second linear driving element, the swing seat is rotatably mounted on the mounting base; a driving wheel is rotatably mounted on the swing seat, and an arc-shaped positioning groove is provided on the substrate corresponding to the driving wheel, so that when the photomask is pushed, the second linear driving element drives the swing seat to swing, the swing seat drives the driving wheel to move along the positioning groove and push the photomask until it abuts against the positioning wheel, thereby realizing the four-sided encircling positioning of the photomask. The structure is simple and the positioning is fast.

[0027] Since there are three positioning bevels on the two opposite end faces of the substrate, arranged in a triangular pattern, the substrate can be quickly positioned on the equipment. Attached Figure Description

[0028] The present invention will be further described below with reference to the accompanying drawings and embodiments.

[0029] Figure 1 This is a schematic diagram of the structure of this utility model;

[0030] Figure 2 yes Figure 1 Enlarged view of A in the middle;

[0031] Figure 3 yes Figure 1 A sectional view;

[0032] Figure 4 yes Figure 3 Enlarged view of B in the middle;

[0033] Wherein, 1-substrate; 101-center hole; 102-receiving groove; 103-air passage; 104-notch; 105-positioning groove; 106-positioning slope; 2-positioning wheel; 3-calibration plate; 301-calibration ball; 302-first linear drive element; 4-bore; 401-air chamber; 402-air hole; 403-separator; 5-mounting base; 501-second linear drive element; 502-swinging base; 503-drive wheel. Detailed Implementation

[0034] The present invention will be further described in detail below through specific embodiments.

[0035] like Figures 1 to 3 As shown, a positioning platform includes a base plate 1 with a central hole 101. Multiple adsorption structures are provided on the base plate 1 around the central hole 101. Positioning wheels 2 are arranged at right angles on the base plate 1 surrounding the adsorption structures. Driving mechanisms are arranged at right angles on the base plate 1 opposite to the positioning wheels 2. The base plate 1 also has multiple receiving grooves 102 communicating with the central hole 101, and each receiving groove 102 has a plane calibration mechanism.

[0036] The planar calibration mechanism includes a calibration plate 3 located within a receiving groove 102. The calibration plate 3 has a calibration ball 301 mounted on it, and the calibration plate 301 is driven by a first linear drive element 302. In this embodiment, the first linear drive element 302 is a pneumatic element (e.g., a cylinder) and is disposed within the base plate 1 (see [reference]). Figure 4 The substrate 1 is also provided with an air passage 103 that is connected to the air source. Preferably, the calibration plate 3 is provided with three plates arranged in a circumferential array. The outer wall of the substrate 1 is provided with a notch 104 that is connected to the air passage 103.

[0037] like Figure 2As shown, the adsorption structure includes a square boss 4 integrally formed on the substrate 1, and the central hole 101 passes through the boss 4; each corner of the boss 4 is provided with a recessed air chamber 401, and the substrate 1 located in the air chamber 401 is provided with an air hole 402, which communicates with an air channel (not shown in the figure) provided on the substrate 1; preferably, the substrate 1 located in the air chamber 401 is provided with a plurality of protruding partition strips 403, and the height of the partition strips 403 is the same as the height of the air chamber 401.

[0038] In this design, the positioning wheels 2 are distributed on the outer side of one right-angled side of the boss 4, and mounting seats 5 are provided on the outer side of the opposite right-angled side. Each mounting seat 5 is provided with a driving mechanism. The driving mechanism includes a second linear driving element 501 (such as a cylinder) fixedly mounted on the mounting seat 5. The driving end of the second linear driving element 501 is hinged to a swing seat 502, which is rotatably mounted on the mounting seat 5. A driving wheel 503 is rotatably mounted on the swing seat 502, and an arc-shaped positioning groove 105 is provided on the base plate 1 at the position corresponding to the driving wheel 503.

[0039] The substrate 1 has a positioning slope 106 on each of its two opposite end faces. The positioning slope 106 extends inwardly from the upper surface to the lower surface of the substrate 1. There are three positioning slopes 106, which are distributed in a triangular pattern.

[0040] The above-described embodiments are merely preferred embodiments of the present utility model and are not intended to limit the scope of the present utility model. Any modifications and alterations to the technical solution of the present utility model without departing from its design spirit shall fall within the protection scope defined by the claims of the present utility model.

Claims

1. A positioning stage, comprising a substrate, characterized in that: The substrate has a central hole, and multiple adsorption structures are provided on the substrate around the central hole. Positioning wheels are provided on the substrate around the adsorption structures at right angles, and driving mechanisms are provided on the substrate opposite to the positioning wheels at right angles. The substrate is also provided with a plurality of receiving slots communicating with the central hole, and each receiving slot is provided with a plane calibration mechanism.

2. The positioning platform as described in claim 1, characterized in that: The planar calibration mechanism includes a calibration plate located within the receiving slot, and a calibration ball is provided on the calibration plate; the calibration plate is driven by a first linear drive element.

3. The positioning platform as described in claim 2, characterized in that: The first linear drive element is a pneumatic element and is disposed within the substrate, which also has an air passage.

4. The positioning platform as described in claim 3, characterized in that: The substrate has a notch on its outer wall, and the notch is connected to the air passage.

5. The positioning platform as described in claim 1, characterized in that: The adsorption structure includes a square boss integrally formed on the substrate, and the central hole passes through the boss. Each corner of the boss is provided with a recessed air chamber, and the substrate located in the air chamber is provided with an air hole, which communicates with an air channel provided on the substrate.

6. The positioning platform as described in claim 5, characterized in that: The substrate located in the air chamber is provided with a plurality of protruding partition strips.

7. The positioning platform as described in claim 5, characterized in that: The positioning wheels are distributed on the outer side of one right-angled side of the boss, and mounting seats are provided on the outer side of the opposite right-angled side. Each mounting seat is provided with the driving mechanism.

8. The positioning platform as described in claim 7, characterized in that: The driving mechanism includes a second linear driving element fixedly mounted on the mounting base, and a swing seat is hinged to the driving end of the second linear driving element. The swing seat is rotatably mounted on the mounting base. A drive wheel is rotatably mounted on the swing seat, and an arc-shaped positioning groove is provided on the base plate at the position corresponding to the drive wheel.

9. The positioning platform as described in any one of claims 1 to 8, characterized in that: The substrate has positioning bevels on both opposite end faces.

10. The positioning platform as described in claim 9, characterized in that: The positioning ramps are provided in three ways and are arranged in a triangle.

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