Processing device and processing apparatus

Abstract

The application discloses a processing device and a processing equipment, relates to the technical field of semiconductor processing, and solves the problem that oxygen is difficult to be effectively removed. The processing device comprises a shell and a gas path mechanism. The shell is provided with a first chamber and a first isolation door. The first isolation door is used for allowing a workpiece to enter or exit the first chamber. The gas path mechanism comprises a first gas inlet pipeline and a switching assembly. The first gas inlet pipeline comprises a first opening part. The first opening part is used for releasing a gas medium into the first chamber. The switching assembly is arranged corresponding to the first opening part. The switching assembly is used for setting the direction of the first opening part for releasing the gas medium as a first direction or a second direction. The second direction has an included angle with the first direction. At least in the case that the first isolation door is opened, the switching assembly sets the direction of the first opening part for releasing the gas medium as the first direction. The processing device of the application is used for processing a wafer. The gas medium released along the first direction forms a gas curtain covering at least part of the first isolation door.

Description

Technical Field

[0001] This application relates to, but is not limited to, the field of semiconductor processing, and particularly to a processing apparatus and processing equipment. Background Technology

[0002] Some special processes of the rapid thermal annealing machine have high requirements for the oxygen content of the first chamber. In particular, oxygen from the external environment can easily diffuse into the first chamber during the wafer transfer process. The entire process can only begin after the oxygen content in the first chamber has been reduced to a suitable level. Therefore, the shorter the time to reduce the oxygen content, the higher the wafer yield of the machine.

[0003] In related technologies, airflow effects are easily formed in the first chamber, introducing impurities such as air from the external environment into the first chamber, and oxygen is difficult to remove effectively in a short time. Utility Model Content

[0004] The processing apparatus and equipment provided in this application have the technical advantage of being able to quickly remove oxygen and improve production efficiency, which is specifically achieved through the following solutions:

[0005] In a first aspect, embodiments of this application provide a processing apparatus, including a housing and a gas path mechanism. The housing is provided with a first chamber and a first isolation door, the first isolation door being used for a workpiece to be processed to enter or exit the first chamber. The gas path mechanism includes a first air inlet pipe and a switching component. The first air inlet pipe includes a first opening, the first opening being used to release a gaseous medium into the first chamber. The switching component is provided corresponding to the first opening, and the switching component is used to set the direction of the gaseous medium released from the first opening to a first direction or a second direction. The second direction has an angle with the first direction. At least when the first isolation door is open, the switching component switches the direction of the gaseous medium released from the first opening to the first direction, and the gaseous medium released along the first direction forms an air curtain covering at least part of the first isolation door.

[0006] The processing apparatus provided in this application includes a housing and a gas path mechanism. The housing has a first chamber and a first isolation door. The first chamber can accommodate a workpiece to be processed. The first isolation door is open to allow the workpiece to enter or exit the first chamber, and closed to isolate the first chamber from the external environment. The gas path mechanism can deliver the gas medium required for processing into the first chamber. The gas path mechanism includes a first inlet pipe and a switching component. The first inlet pipe includes a first opening that releases the gas medium into the first chamber. The switching component is disposed corresponding to the first opening and can switch the direction of gas medium release from the first opening. The gas medium released from the first opening along a first direction forms an air curtain covering the first isolation door. This air curtain helps isolate the first chamber from the external environment when the first isolation door is open, reducing the possibility of external impurities entering the first chamber. The switching component can also switch the direction of gas medium release from the first opening to a second direction. The second direction has an angle with the first direction, and the gas medium released along the second direction has less impact on the gas medium flow field during processing, thus facilitating processing. Compared with related technologies where impurities are easily introduced when the first isolation door is opened, the processing apparatus of this application embodiment, by setting a first opening and a switching component, and by adjusting the direction of the gas medium released from the first opening through the switching component, forms an air curtain when the first isolation door is open. This effectively isolates the first chamber from the external environment, so as to maintain the purity of the gas medium in the first chamber and save the processing efficiency caused by gas medium optimization.

[0007] In one implementation of this application, the first opening includes a first opening and a second opening, the central axis of the first opening is parallel to a first direction, and the central axis of the second opening is parallel to a second direction; the switching component includes a switching element, which is used to set one of the first opening and the second opening to an open state and to set the other of the first opening and the second opening to a closed state.

[0008] Here, a switching element is provided, which can switch one of the first opening and the second opening to an open state and the other to a closed state. When the first opening is in the open state and the second opening is in the closed state, the gas medium released from the first opening can form an air curtain at the first isolation door. When the second opening is in the open state and the first opening is in the closed state, the gas medium is released in the second direction to facilitate processing.

[0009] In one implementation of this application, the first air intake pipe further includes a main body, a first opening is movably connected to the main body, and the switching component includes a drive member for driving the first opening to move relative to the main body to change the opening orientation of the first opening.

[0010] Here, the first opening is movably connected to the main body. The driving member drives the first opening to move relative to the main body, which can change the opening orientation of the first opening so that the opening of the first opening faces a first direction to form an air curtain, or the opening of the first opening faces a second direction to facilitate processing.

[0011] In one implementation of this application, the gas path mechanism further includes a first exhaust pipe, which is used to discharge the gas medium from the first chamber. The opening of the first exhaust pipe and the opening of the first opening are respectively disposed on opposite sides of the first isolation door along a first direction, which is a vertical direction.

[0012] Here, by setting a first exhaust pipe, the opening of the first exhaust pipe and the opening of the first opening are respectively set on opposite sides of the first isolation door. When the gas medium is released in the first direction to form an air curtain in the first opening, the gas medium can easily enter the first exhaust pipe. Through the cooperation of the first exhaust pipe and the first air inlet pipe, it is easy to form an air curtain with a specific flow direction. Impurities introduced by the external environment can be quickly drawn away by the first exhaust pipe, thereby improving the isolation effect of the air curtain.

[0013] In one implementation of this application, the housing includes a first sidewall, a first isolation door is disposed on the first sidewall, and the gas passage mechanism further includes a second exhaust pipe and / or a second intake pipe, the opening of the second exhaust pipe being disposed opposite to the first sidewall; the second intake pipe is used to release the gas medium into the first chamber, and the opening of the second intake pipe and the opening of the first exhaust pipe are disposed on the same side of the first chamber.

[0014] Here, by setting a second exhaust pipe, which is opposite to the first sidewall of the first isolation door, the first and second exhaust pipes discharge gas medium from different positions and directions, so that the gas medium distribution in the first chamber is more uniform; by setting a second intake pipe, the opening of the first intake pipe and the opening of the first exhaust pipe are set on the same side of the first chamber, which can even out the gas medium distribution in the first chamber.

[0015] In one implementation of this application, the processing device further includes a valve structure and at least two pipeline structures. At least one pipeline structure is provided with a valve structure, which is used to regulate the flow rate of the gas medium in the corresponding pipeline structure. The at least two pipeline structures include a first inlet pipe and a first exhaust pipe.

[0016] Here, by setting a valve structure, the valve structure can adjust the flow rate of the gas medium in the corresponding pipeline structure. For example, the valve structure adjusts the flow rate of the gas medium in the first intake pipe and / or the first exhaust pipe to meet the processing requirements.

[0017] In one implementation of this application, the processing apparatus further includes a control circuit, which is electrically connected to the first isolation gate, the valve structure, and the switching component. The control circuit controls the operation of the switching component and / or the valve structure based on the state of the first isolation gate.

[0018] Here, by setting up a control circuit that is electrically connected to the first isolation gate, the valve structure, and the switching component, the control circuit can control the operation of the switching component and / or the valve structure based on the state of the first isolation gate, so as to make the control of the gas medium more intelligent and precise.

[0019] In one implementation of this application, the processing device further includes a sensor, which is disposed in the second exhaust pipe and located downstream of the first exhaust pipe. The sensor is used to detect the state information of the gas medium in the second exhaust pipe. The control circuit is electrically connected to the sensor and controls the operation of the switching component and / or valve structure based on the state information.

[0020] Here, by setting up a sensor located downstream of the first exhaust pipe, the sensor can comprehensively acquire the state information of the gas medium in the first and second exhaust pipes. The control circuit is electrically connected to the sensor, and the control circuit can control the action of the switching components and / or valve structure based on the state information, so as to make the control of the gas medium more intelligent and precise.

[0021] Secondly, embodiments of this application provide a processing apparatus, including the processing device of any one of the first aspects.

[0022] The processing equipment provided in this application includes the processing device of this application. By setting a first opening and a switching component, the direction of the gas medium released by the first opening is adjusted by the switching component. When the first isolation door is open, an air curtain is formed, which can effectively isolate the first chamber from the external environment, so as to maintain the purity of the gas medium in the first chamber and save the low processing efficiency caused by gas medium optimization.

[0023] In one implementation of this application, the processing equipment further includes a second chamber, and the housing is provided with a second isolation door. The second isolation door is used to transfer the workpiece to be processed between the first chamber and the second chamber. When one of the first isolation door and the second isolation door is open, the other of the first isolation door and the second isolation door is closed.

[0024] Here, by setting up a second chamber and a second isolation door, the first isolation door, which connects to the external environment, can be opened first to allow the workpiece to be placed into the first chamber. The gas medium in the first chamber can be quickly adjusted to meet the process requirements. Then, the second isolation door can be opened to allow the workpiece to be moved from the first chamber into the second chamber while isolating the external environment. This avoids the second chamber from directly contacting the external environment and reduces the possibility of external impurities entering the second chamber. Attached Figure Description

[0025] Figure 1 This is a simulation diagram of oxygen concentration distribution in related technologies;

[0026] Figure 2 This is a simulation diagram of the velocity distribution in the flow field in related technologies;

[0027] Figure 3 This is a simulation diagram of the oxygen concentration distribution in the embodiments of this application;

[0028] Figure 4 This is a simulation diagram of the flow field velocity distribution in the embodiments of this application;

[0029] Figure 5 This is a schematic diagram of the structure of the processing apparatus provided in the embodiments of this application, showing the first opening facing the second direction;

[0030] Figure 6 This is a schematic diagram of the structure of the processing apparatus provided in the embodiments of this application, showing the first opening facing the first direction;

[0031] Figure 7 A schematic diagram showing the flow direction of the gas medium in the first air inlet pipe of the processing apparatus provided in this application embodiment;

[0032] Figure 8 A schematic diagram illustrating the flow direction of the gas medium provided in an embodiment of this application;

[0033] Figure 9 This is a schematic diagram of the control circuit in the processing apparatus provided in the embodiments of this application;

[0034] Figure 10 This is a schematic diagram of the connection of the control circuit in the processing apparatus provided in the embodiments of this application;

[0035] Figure 11 This is a schematic diagram of the regulating air path in the processing apparatus provided in the embodiments of this application;

[0036] Figure 12 This is a schematic diagram of the structure of the processing equipment provided in the embodiments of this application;

[0037] Figure 13 This is a schematic diagram of the control logic of the processing apparatus provided in the embodiments of this application;

[0038] Figure 14 Comparison of simulation results of the processing apparatus provided in the embodiments of this application with related technologies Figure 1 ;

[0039] Figure 15 Comparison of simulation results of the processing apparatus provided in the embodiments of this application with related technologies Figure 2 ;

[0040] Figure 16 Comparison of simulation results of the processing apparatus provided in the embodiments of this application with related technologies Figure 3 .

[0041] Figure label:

[0042] 100 - Housing; 110 - First chamber; 120 - First isolation door; 130 - First side wall; 140 - Second chamber; 150 - Second isolation door; 200 - Air passage mechanism; 210 - First air intake pipe; 211 - First opening; 212 - Switching assembly; 220 - First exhaust pipe; 230 - Second exhaust pipe; 240 - Second air intake pipe; 300 - Sensor; 400 - Valve structure; 410 - Isolation valve; 420 - Butterfly valve; 430 - Pressure regulating valve; 440 - Exhaust structure; 500 - Control circuit; 510 - Controller; 520 - Host computer; 530 - Digital input module; 540 - Digital output module; 550 - Communication module; 600 - Transmission position; X1 - First direction; X2 - Second direction. Detailed Implementation

[0043] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the specific technical solutions of this application will be further described in detail below with reference to the accompanying drawings of the embodiments of this application. The following embodiments are used to illustrate this application, but are not intended to limit the scope of this application.

[0044] In the embodiments of this application, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the embodiments of this application, unless otherwise stated, "multiple" means two or more.

[0045] Furthermore, in the embodiments of this application, directional terms such as "upper," "lower," "left," and "right" are defined relative to the positions in which the components are schematically placed in the accompanying drawings. It should be understood that these directional terms are relative concepts, used for relative description and clarification, and can change accordingly depending on the position of the components in the accompanying drawings.

[0046] In the embodiments of this application, unless otherwise explicitly specified and limited, the term "connection" should be interpreted broadly. For example, "connection" can be a fixed connection, a detachable connection, or an integral part; it can be a direct connection or an indirect connection through an intermediate medium.

[0047] In embodiments of this application, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes that element.

[0048] In the embodiments of this application, the terms "exemplary" or "for example" are used to indicate that something is an example, illustration, or description. Any embodiment or design that is described as "exemplary" or "for example" in the embodiments of this application should not be construed as being more preferred or advantageous than other embodiments or design. Specifically, the use of the terms "exemplary" or "for example" is intended to present the relevant concepts in a specific manner.

[0049] This application provides a processing device, which may be a lithography device, etching device, deposition device, implantation device, polishing device, cleaning device, testing device, or packaging device on a semiconductor production line.

[0050] For example, the processing equipment is a rapid thermal annealing machine. Some special processes of the rapid thermal annealing machine have high requirements for the oxygen content of the first chamber. In particular, oxygen in the external environment can easily diffuse into the first chamber during the wafer transfer process. The entire process can only start after the oxygen content in the first chamber has been reduced to a suitable level. Therefore, the shorter the time to reduce the oxygen content, the higher the wafer yield of the machine.

[0051] In some technical solutions, the opening of the first chamber is located on the left side, and the air inlet pipes on the upper and lower sides of the first chamber both flow from left to right, which easily creates an airflow effect, introducing impurities such as air from the external environment into the first chamber, making it difficult to reduce the amount of oxygen entering the first chamber from the external environment; the first chamber is only purged by the air inlet at the bottom, and the oxygen entering from the left side of the first chamber needs to be discharged from the exhaust port on the right side, making it difficult for oxygen to be discharged from the first chamber quickly and effectively.

[0052] Reference Figure 1 and Figure 2Simulation results from related technologies show that the horizontal (from left to right) uniform gas inlet and the inlet located in the lower left corner create a backflow field in the left region of the first chamber, causing oxygen to be diffused and diluted, making it difficult to be effectively extracted and discharged. (Refer to...) Figure 3 and Figure 4 The simulation results of this application show that oxygen is contained near the first isolation door, and the oxygen content is low.

[0053] Therefore, embodiments of this application also provide a processing apparatus, referring to... Figure 5 and Figure 6 The processing device includes a housing 100 and a gas path mechanism 200. The housing 100 is provided with a first chamber 110 and a first isolation door 120. The first isolation door 120 is used to allow the workpiece to enter or exit the first chamber 110. The gas path mechanism 200 includes a first air inlet pipe 210 and a switching component 212. The first air inlet pipe 210 includes a first opening 211, which is used to release a gas medium into the first chamber 110. The switching component 212 is provided corresponding to the first opening 211 and is used to set the direction of the gas medium released from the first opening 211 to a first direction X1 or a second direction X2. The second direction X2 has an angle with the first direction X1. At least when the first isolation door 120 is open, the switching component 212 sets the direction of the gas medium released from the first opening 211 to the first direction X1, and the gas medium released along the first direction X1 forms an air curtain covering at least part of the first isolation door 120.

[0054] In some examples, the housing 100 is made of a metallic material, such as 316L stainless steel. The housing 100 can be a hollow cylindrical structure with a first chamber 110 formed inside. In some examples, the first chamber 110 serves as a processing chamber, and processing mechanisms such as process kits are provided inside the first chamber 110. In other examples, the first chamber 110 serves as a transfer chamber connecting the processing chamber.

[0055] In some examples, the housing 100 is provided with a first opening that connects the first chamber 110 to the external environment. A first isolation door 120 is provided corresponding to the first opening. The first isolation door 120 can move relative to the housing 100 to open or close the first opening. When the first isolation door 120 is open, the first chamber 110 is connected to the outside. When the first isolation door 120 is closed, the first chamber 110 is isolated from the external environment.

[0056] In some examples, the workpiece to be processed is a wafer, which undergoes processing within the processing chamber. The workpiece to be processed can also be a semi-finished material in the wafer processing process.

[0057] In some examples, the gas medium is the gas required for processing and protection when the workpiece is processed. The gas medium can be a single gas or a mixture of multiple different gases. For example, the gas medium delivered from the first inlet pipe 210 to the first chamber 110 is nitrogen, and the gas medium in the first chamber 110 and that needs to be discharged includes nitrogen and other impurity gases.

[0058] In some examples, the first intake pipe 210 is used to introduce a gaseous medium, such as PN2 (high-purity nitrogen), into the first chamber 110. The first intake pipe 210 is kept open in order to maintain the gas pressure in the first chamber 110.

[0059] In some examples, the first intake duct 210 is made of a metal material, such as 316L stainless steel, and the first intake duct 210 may be 1 / 4” in size.

[0060] In some examples, the first opening 211 being adjacent to the first isolation door 120 means that the first opening 211 is located near the first isolation door 120, and there is no other component blocking the first opening 211 and the first isolation door 120.

[0061] In some examples, the first isolation door 120 adopts a slit valve, which has a good sealing effect. When the first isolation door 120 is open, it connects the first chamber 110 with the external environment. When the first isolation door 120 is closed, it isolates the first chamber 110 from the external environment. When the workpiece to be processed is processed in the first chamber 110, the first isolation door 120 must be in the closed state.

[0062] In some examples, during the transfer of the workpiece (i.e., the workpiece enters or exits the first chamber 110), the first isolation door 120 is opened, and the switching component 212 sets the direction of the gas medium released from the first opening 211 to a first direction X1. For example, the airflow flows from top to bottom. The gas medium released from the first opening 211 forms an air curtain at the location of the first isolation door 120, flowing along the first direction X1 and covering the first isolation door 120. The air curtain blocks and guides the external gas to flow along the first direction X1. When the transfer of the workpiece is completed, the first isolation door 120 is closed. When the oxygen concentration in the first chamber 110 reaches a preset concentration, the switching component 212 sets the direction of the gas medium released from the first opening 211 to a second direction X2. For example, the airflow flows from left to right to achieve discharge.

[0063] In some examples, the first direction X1 is perpendicular to the opening axis of the first isolation door 120; in other examples, the first direction X1 forms an acute or obtuse angle with the opening axis of the first isolation door 120. The first direction X1 extends from one edge of the first isolation door 120 to the other edge. For example, the first direction X1 is the vertically downward direction of the first chamber 110.

[0064] In some examples, the second direction X2 is perpendicular to the first direction X1; in other examples, the second direction X2 and the first direction X1 form an acute or obtuse angle. For example, the second direction X2 is the horizontal direction of the first chamber 110.

[0065] The technical solution provided in this application embodiment includes a processing device comprising a housing 100 and a gas passage mechanism 200. The housing 100 is provided with a first chamber 110 and a first isolation door 120. The first chamber 110 can accommodate the workpiece to be processed. The first isolation door 120 is opened to allow the workpiece to enter or exit the first chamber 110. The first isolation door 120 is closed to isolate the first chamber 110 from the external environment. The gas passage mechanism 200 can deliver the gas medium required for processing into the first chamber 110.

[0066] Based on this, the gas path mechanism 200 includes a first air inlet pipe 210 and a switching component 212. The first air inlet pipe 210 includes a first opening 211, which can release a gas medium into the first chamber 110. The switching component 212 is provided corresponding to the first opening 211 and can set the direction in which the first opening 211 releases the gas medium. The first opening 211 releases the gas medium along a first direction X1, and the gas medium released along the first direction X1 forms an air curtain covering the first isolation door 120. The air curtain helps to isolate the first chamber 110 from the external environment when the first isolation door 120 is open, reducing the possibility of external impurities entering the first chamber 110. The switching component 212 can also set the direction in which the first opening 211 releases the gas medium to a second direction X2. The second direction X2 has an angle with the first direction X1. The gas medium released along the second direction X2 has less impact on the gas medium flow field during the processing, so as to facilitate processing.

[0067] Reference Figure 3 and Figure 4 Compared with the related technologies where impurities are easily introduced when the first isolation door 120 is opened, the processing apparatus of this application embodiment, by setting a first opening 211 and a switching component 212, and by adjusting the direction of the gas medium released by the first opening 211 through the switching component 212, forms an air curtain when the first isolation door 120 is open. This can effectively isolate the first chamber 110 from the external environment, so as to maintain the purity of the gas medium in the first chamber 110 and save the low processing efficiency caused by gas medium optimization.

[0068] In some embodiments of this application, the first opening 211 includes a first opening and a second opening, the central axis of the first opening is parallel to a first direction X1, and the central axis of the second opening is parallel to a second direction X2; the switching component 212 includes a switching member, which is used to set one of the first opening and the second opening to an open state and to set the other of the first opening and the second opening to a closed state.

[0069] In some examples, the converter is movably connected to the first opening 211, and the converter can be moved to a position that blocks the first opening and opens the second opening, or the converter can be moved to a position that blocks the second opening and opens the first opening.

[0070] In some examples, the first intake pipe 210 includes two sub-pipes, which correspond to the first opening and the second opening, respectively. The switching element is an on / off valve disposed in the sub-pipe, which closes when one on / off valve is open.

[0071] The technical solution provided in this application embodiment includes a conversion component that can set one of the first opening and the second opening to an open state and the other to a closed state. When the first opening is open and the second opening is closed, the gas medium released from the first opening 211 can form an air curtain in the first isolation door 120. When the second opening is open and the first opening is closed, the gas medium is released along the second direction X2 to facilitate processing.

[0072] In some embodiments of this application, the first air intake pipe 210 further includes a main body, a first opening 211 is movably connected to the main body, and the switching component 212 includes a drive member for driving the first opening 211 to move relative to the main body to change the opening orientation of the first opening 211.

[0073] In some examples, the first opening 211 is rotatably connected to the main body; in other examples, the first opening 211 is slidably connected to the main body; and in still other examples, the first opening 211 is flexibly connected to the main body via a bellows or the like.

[0074] In some examples, the drive element includes a motor, such as a servo motor or a stepper motor; in other examples, the drive element includes a telescopic cylinder, such as a pneumatic cylinder or a hydraulic cylinder.

[0075] The technical solution provided in this application embodiment is that the first opening 211 is movably connected to the main body. The driving member drives the first opening 211 to move relative to the main body, which can change the opening orientation of the first opening 211 so that the opening orientation of the first opening 211 in the first direction X1 forms an air curtain, or the opening orientation of the first opening 211 in the second direction X2 is convenient for processing.

[0076] Reference Figure 7 In some examples, the first air intake pipe 210 includes a flow equalization plate, which is a disc-shaped structure with multiple uniform air holes. The first opening 211 is disposed on the flow equalization plate. The flow equalization plate can form a uniform and controllable air curtain and can also generate a uniform airflow along the second direction X2 to meet the processing requirements.

[0077] Reference Figure 5 , Figure 6 and Figure 8 In some embodiments of this application, the gas path mechanism 200 further includes a first exhaust pipe 220, which is used to discharge the gas medium from the first chamber 110. The opening of the first exhaust pipe 220 and the opening of the first opening 211 are respectively disposed on opposite sides of the first isolation door 120 along the first direction X1, where the first direction X1 is vertical.

[0078] In some examples, the gas medium in the first chamber 110 is driven by a pressure difference. Specifically, when there is active gas flow (e.g., exhaust from the first exhaust pipe 220), a certain negative pressure zone is formed at the rear end relative to the adjacent gas along the gas flow direction, which will carry the adjacent gas with it.

[0079] In some examples, the first opening 211 opens toward the bottom of the first chamber 110 along the first direction X1, and the opening of the first exhaust pipe 220 opens toward the top of the first chamber 110.

[0080] In some examples, when the direction of the gas medium released from the first opening 211 changes to the first direction X1, the released gas medium is under high pressure compared to the external gas. Combined with the elongated structure of the flow equalizer, an air curtain effect is formed through the slit jet, causing the gas medium on both sides to form an air curtain flowing along the first direction X1, blocking the interior and exterior of the chamber and slowing down the interaction of airflow between the interior and exterior. Opening the first exhaust pipe 220 provided with the first opening 211 further facilitates the formation of the air curtain, guiding the gas medium on both sides to be discharged from the first exhaust pipe 220.

[0081] The technical solution provided in this application embodiment, by setting a first exhaust pipe 220, with the opening of the first exhaust pipe 220 and the opening of the first opening 211 respectively located on opposite sides of the first isolation door 120, when the first opening 211 releases gas medium along the first direction X1 to form an air curtain, the gas medium can easily enter the first exhaust pipe 220. Through the cooperation of the first exhaust pipe 220 and the first air inlet pipe 210, it is easy to form an air curtain with a specific flow direction. Impurities introduced by the external environment can be quickly drawn away by the first exhaust pipe 220, thereby improving the isolation effect of the air curtain.

[0082] Reference Figure 5 and Figure 6 In some embodiments of this application, the housing 100 includes a first sidewall 130, a first isolation door 120 is disposed on the first sidewall 130, and the gas passage mechanism 200 further includes a second exhaust pipe 230 and / or a second intake pipe 240, the opening of the second exhaust pipe 230 being disposed opposite to the first sidewall 130; and / or, the second intake pipe 240 is used to release a gaseous medium into the first chamber 110, and the opening of the second intake pipe 240 and the opening of the first exhaust pipe 220 are disposed on the same side of the first chamber 110.

[0083] In some examples, the first opening 211 is disposed on the first sidewall 130 and located above the first isolation door 120, and the opening of the first exhaust pipe 220 is located below the first isolation door 120, so as to facilitate the release of gas medium from the first opening 211 along the first direction X1 to form an air curtain. When the first opening 211 releases gas medium along the second direction X2, it facilitates the flow of gas medium toward the opening of the second exhaust pipe 230.

[0084] In some examples, the first exhaust pipe 220 and the second exhaust pipe 230 are respectively connected to the plant exhaust system; in other examples, the second exhaust pipe 230 is connected to the first exhaust pipe 220 so that the gaseous medium discharged from the first exhaust pipe 220 and the second exhaust pipe 230 can be centrally processed.

[0085] In some examples, the second intake pipe 240 is used to introduce a gaseous medium, such as PN2 (high-purity nitrogen), into the first chamber 110. The second intake pipe 240 can be made of the same material and size as the first intake pipe 210. The second intake pipe 240 is mainly used for purging the bottom of the first chamber 110 to reduce the possibility of oxygen deposition at the bottom of the first chamber 110.

[0086] In some examples, the openings of the second intake pipe 240 and the first exhaust pipe 220 are both located on the bottom wall of the first chamber 110, and the distance between the opening of the second intake pipe 240 and the first side wall 130 is greater than the distance between the opening of the first exhaust pipe 220 and the first side wall 130.

[0087] The technical solution provided in this application embodiment, by setting a second exhaust pipe 230, with the second exhaust pipe 230 opposite to the first sidewall 130 of the first isolation door 120, allows the first exhaust pipe 220 and the second exhaust pipe 230 to discharge gas medium from different positions and directions, so that the gas medium distribution in the first chamber 110 is more uniform; by setting a second air inlet pipe 240, with the opening of the first air inlet pipe 210 and the opening of the first exhaust pipe 220 located on the same side of the first chamber 110, the gas medium distribution in the first chamber 110 can be homogenized.

[0088] Reference Figure 5 and Figure 6 In some embodiments of this application, the processing apparatus further includes a valve structure 400 and at least two pipeline structures. At least one pipeline structure is provided with the valve structure 400, which is used to regulate the flow rate of the gas medium in the corresponding pipeline structure. The at least two pipeline structures include a first air inlet pipe 210 and a first exhaust pipe 220.

[0089] In some examples, valve structure 400 includes an isolation valve 410, which can be a ball valve. The ball valve opens under gas pressure and automatically closes when there is no gas pressure, exhibiting fast response and good sealing performance. For example, isolation valve 410 is located in the first exhaust pipe 220. Isolation valve 410 can connect or isolate the upstream and downstream of the valve. When the first isolation valve 120 is open, isolation valve 410 opens; when the oxygen concentration in the first chamber 110 reaches a preset concentration, isolation valve 410 closes.

[0090] In some examples, valve structure 400 includes a butterfly valve 420, which can monitor the pressure in the first chamber 110 in real time and control the pressure by changing the valve angle; it has a fast response rate, high accuracy, and is suitable for normal pressure environments. For example, butterfly valve 420 is located in the second exhaust pipe 230 and downstream of the first exhaust pipe 220. Butterfly valve 420 can influence the flow velocity of the gas medium by changing its angle, thereby controlling the gas pressure in the first chamber 110.

[0091] In some examples, valve structure 400 includes a mass flow controller (MFC) 510, which functions to detect, measure, and control the gas medium. For example, the first inlet pipe 210 and the second inlet pipe 240 are each equipped with an MFC.

[0092] In some examples, the gas passage of valve structure 400 is controlled by an isolation solenoid valve, which can be a pilot-operated two-position three-way solenoid valve.

[0093] In some examples, the gas passage of the first isolation door 120 is controlled by a door solenoid valve, which can be a dual-electrically controlled pilot-operated two-position four-way solenoid valve.

[0094] The technical solution provided in this application embodiment, by setting a valve structure 400, can adjust the flow rate of the gas medium in the corresponding pipeline structure. For example, the valve structure 400 adjusts the flow rate of the gas medium in the first intake pipe 210 and / or the first exhaust pipe 220 to adapt to processing requirements.

[0095] Reference Figure 9 , Figure 10 and Figure 11 In some embodiments of this application, the processing apparatus further includes a control circuit 500, which is electrically connected to the first isolation gate 120, the valve structure 400 and the switching component 212, respectively. The control circuit 500 controls the operation of the switching component 212 and / or the valve structure 400 based on the state of the first isolation gate 120.

[0096] In some examples, the control circuit 500 includes a host computer 520, a controller 510, a data transmission layer, and an execution and feedback layer. The data transmission layer includes an input module, a digital output module 540, and a communication module 550. The controller 510 is connected to the host computer 520. The digital input module 530, the digital output module 540, and the communication module 550 are all connected to the controller 510. The execution and feedback layer includes a position sensor, an MFC, a sensor 300, and an actuator.

[0097] The host computer 520 includes human-machine interface software. It displays the real-time status signals of each sensor 300 and has a window for receiving user commands. The host computer 520 can transmit user commands to the controller 510. The controller 510 acquires software and underlying module information from the host computer 520 and issues commands or transmits status signals according to program logic. The data transmission layer is used to acquire underlying data and control unit command signals, connecting the controller 510 with the underlying sensor status. The execution and feedback layer is used to provide feedback on sensor signals and execute the actions of various pneumatic, electric, and other actuators.

[0098] In some examples, the digital input module 530 is also connected to position sensors to detect whether each valve structure 400 and the first isolation gate 120 are in position. Position sensors include, but are not limited to, isolation valve open position sensor T11, isolation valve closed position sensor T12, first isolation gate open position sensor T21, and first isolation gate closed position sensor T22.

[0099] In some examples, the communication module 550 connects the MFC and the sensor 300, and the controller 510 obtains the detection information of the MFC and controls the MFC to regulate the flow rate of the gas medium through the communication module 550; the controller 510 obtains the oxygen concentration through the sensor 300.

[0100] In some examples, the digital output module 540 is also connected to actuators so that the controller 510 can drive the actuators to operate. The actuators include, but are not limited to, the first isolation gate actuation solenoid valve F1 and the isolation valve actuation solenoid valve F2.

[0101] In some examples, both the isolation valve 410 and the first isolation gate 120 are located in the regulating air path. The solenoid valve of the first isolation gate 120 is used to control the opening and closing of the circuit containing the first isolation gate 120 or to set the flow direction in the regulating air path. The solenoid valve of the isolation valve 410 is used to control the opening and closing of the circuit containing the isolation valve 410 or to set the flow direction in the regulating air path.

[0102] In some examples, the regulating air passage is also provided with an exhaust structure 440, which includes a quick exhaust valve and a muffler, and the exhaust structure 440 is located at the position of the isolation valve 410 and / or the solenoid valve.

[0103] In some examples, the regulating gas path includes an inlet end connected to the gas supply device, where a pressure regulating valve 430 is installed. Downstream of the pressure regulating valve 430 are two branches. One branch is equipped with an isolation valve 410, which is both an actuating solenoid valve and an isolation valve 410. The other branch is equipped with a first isolation gate 120, which is both an actuating solenoid valve and a first isolation gate 120. For example, when solenoid valve KA1 is energized, the first isolation gate 120 opens; when solenoid valve KA2 is energized, the first isolation gate 120 closes; and when solenoid valve KA3 is energized, the air intake of isolation valve 410 is opened.

[0104] The technical solution provided in this application embodiment, by setting up a control circuit 500, which is electrically connected to the first isolation gate 120, the valve structure 400 and the switching component 212, allows the control circuit 500 to control the operation of the switching component 212 and / or the valve structure 400 based on the state of the first isolation gate 120, so as to make the control of the gas medium more intelligent and precise.

[0105] Reference Figure 5 , Figure 6 , Figure 9 and Figure 10In some embodiments of this application, the processing apparatus further includes a sensor 300, which is disposed in the second exhaust pipe 230 and located downstream of the first exhaust pipe 220. The sensor 300 is used to detect the state information of the gas medium in the second exhaust pipe 230. The control circuit 500 is electrically connected to the sensor 300 and controls the switching component 212 and / or the valve structure 400 to operate based on the state information.

[0106] In some examples, sensor 300 includes an oxygen analyzer for real-time detection of oxygen concentration within the first chamber 110.

[0107] In some examples, the control circuit 500 controls the valve structure 400 of the second intake pipe 240 and the first exhaust pipe 220 to close based on the oxygen concentration detected by the sensor 300 reaching a preset concentration, controls the switching component 212 to set the direction of the gas medium released from the first opening 211 to the second direction X2, and controls the valve structure 400 in the second exhaust pipe 230 to perform pressure control operation.

[0108] The technical solution provided in this application embodiment, by setting a sensor 300, which is located downstream of the first exhaust pipe 220, can comprehensively acquire the state information of the gas medium in the first exhaust pipe 220 and the second exhaust pipe 230. The control circuit 500 is electrically connected to the sensor 300, and the control circuit 500 can control the action of the switching component 212 and / or the valve structure 400 based on the state information, so as to make the control of the gas medium more intelligent and precise.

[0109] Reference Figure 12 In some embodiments of this application, the processing equipment includes the processing apparatus of the embodiments of this application.

[0110] In some examples, the production equipment includes a gas treatment mechanism, with both the first exhaust pipe 220 and the second exhaust pipe 230 connected to the gas treatment mechanism, which is used for the recovery and harmless treatment of waste gas discharged from the first chamber 110.

[0111] The technical solution provided in this application embodiment includes a processing device according to this application embodiment. By setting a first opening 211 and a switching component 212, the direction of the gas medium released by the first opening 211 is adjusted by the switching component 212. When the first isolation door 120 is open, an air curtain is formed, which can effectively isolate the first chamber 110 from the external environment, so as to maintain the purity of the gas medium in the first chamber 110 and save the low processing efficiency caused by gas medium optimization.

[0112] Reference Figure 12In some embodiments of this application, the processing equipment further includes a second chamber 140, and the housing 100 is provided with a second isolation door 150. The second isolation door 150 is used to transfer the workpiece to be processed between the first chamber 110 and the second chamber 140. When one of the first isolation door 120 and the second isolation door 150 is open, the other of the first isolation door 120 and the second isolation door 150 is closed.

[0113] In some examples, both the first isolation door 120 and the second isolation door 150 employ gap valves, providing a good sealing effect. In some examples, the second chamber 140 is a processing chamber equipped with a processing mechanism, and the first chamber 110 is a transfer chamber. The second chamber 140 can be located within the housing 100. That is, the housing 100 is provided with both the first chamber 110 and the second chamber 140.

[0114] In some examples, the housing 100 is provided with a second opening that connects the first chamber 110 and the second chamber 140. A second isolation door 150 is provided corresponding to the second opening and can move relative to the housing 100 to open or close the second opening. When the second isolation door 150 is open, the first chamber 110 and the second chamber 140 are connected. When the second isolation door 150 is closed, the first chamber 110 and the second chamber 140 are isolated.

[0115] In some examples, there are multiple second chambers 140, and each of the multiple second chambers 140 is connected to the first chamber 110 through a second isolation door 150. For example, the multiple second chambers 140 include chamber 140-1 and chamber 140-2.

[0116] In some examples, a first chamber 110 is positioned between a transfer station 600 and a second chamber 140, with the transfer station 600 used to place workpieces awaiting delivery into the first chamber 110d.

[0117] In some examples, the processing equipment includes a robot arm for transferring the workpiece to be processed into the first chamber 110 or the second chamber 140, and for removing the workpiece from the first chamber 110 or the second chamber 140, i.e., the robot arm is used to perform wafer pick-up / place-on actions.

[0118] The technical solution provided in this application embodiment, by setting a second chamber 140 and a second isolation door 150, allows the first isolation door 120, which connects to the external environment, to be opened first so that the workpiece to be processed can be placed into the first chamber 110. The gas medium in the first chamber 110 can be quickly adjusted to meet the process requirements. Then, the second isolation door 150 can be opened so that the workpiece to be processed can be moved from the first chamber 110 into the second chamber 140 while isolating the external environment. This avoids the second chamber 140 from directly contacting the external environment, thereby reducing the possibility of external impurities entering the second chamber 140.

[0119] Reference Figure 13 In some embodiments, the controller 510 controls the processing equipment based on the following steps:

[0120] Step S10: Confirm that the first isolation door 120 meets the preconditions for opening, that is, the robot arm is in a state that can perform the action of picking up / placing the workpiece to be processed;

[0121] Step S20: Control the first isolation door 120 to open, control the switching component 212 to set the direction of the gas medium released from the first opening 211 to the first direction X1, and control the valve structure 400 of the first exhaust pipe 220, the first intake pipe 210 and the second intake pipe 240 to open.

[0122] Step S30: If all actions in step S20 trigger the execution completion signal, control the robot arm to perform the wafer pick-up / place-on action;

[0123] Step S40: Confirm that the robotic arm has completed its action, control the first isolation door 120 to perform the closing action, and set the first isolation door 120 to the closed state;

[0124] Step S50: Confirm that the first isolation door 120 has triggered the closed position signal, control the sensor 300 (oxygen analyzer) to detect the oxygen concentration in real time, and start timing;

[0125] Step S60: When the timing is within the preset duration range and the oxygen concentration reaches the preset concentration, control the valve structure 400 of the second intake pipe 240 and the first exhaust pipe 220 to close, control the switching component 212 to set the direction of the gas medium released from the first opening 211 to the second direction X2, and control the valve structure 400 in the second exhaust pipe 230 to perform pressure control operation.

[0126] Step S70: If all actions in step S60 trigger the execution completion signal, the control machining mechanism executes the process on the workpiece to be machined in the first chamber 110.

[0127] The processing apparatus and processing equipment of this application embodiment can reduce the oxygen concentration in the first chamber 110 when the first isolation door 120 is closed, reduce the oxygen purging time, shorten the process formulation time, and improve the yield of the processing equipment. (Refer to...) Figure 14 , Figure 15 and Figure 16When the first isolation door 120 is open (opening time is 0 to 15 seconds), the oxygen content in the first chamber 110 in the related technologies is significantly higher, and oxygen molecules are distributed throughout the entire first chamber 110. In the present application's technical solution, under the guidance of an air curtain along the first direction X1 and bottom air extraction, external oxygen is concentrated near the first isolation door 120. After the first isolation door 120 is closed (simulating complete closure of the first isolation door 120 at 15 seconds), the oxygen content remaining in the first chamber 110 in the related technologies is significantly higher, with an oxygen concentration >3.5 mol / m³ (approximately 85 ppm). In the present application's technical solution, the oxygen concentration is <1.5 mol / m³ (approximately 36 ppm). The comparison shows that the present application's technical solution can significantly reduce the oxygen concentration remaining in the first chamber 110 when the first isolation door 120 is closed. At 36 seconds, the oxygen concentration in the first chamber 110 of the present application is already far below 20 ppm, while the oxygen concentration in the first chamber 110 of the related technologies remains at 50 ppm.

[0128] The sequence numbers of the embodiments in this application are merely for description and do not represent the superiority or inferiority of the embodiments, nor do they limit the patent scope of this application. Any equivalent structural or procedural transformations made using the content of this application's specification and drawings, or direct or indirect applications in other related technical fields, are similarly included within the patent protection scope of this application.

Claims

1. A processing apparatus, characterized in that, include: The housing is provided with a first chamber and a first isolation door, the first isolation door being used to allow the workpiece to enter or exit the first chamber; A gas path mechanism includes a first air inlet pipe and a switching component. The first air inlet pipe includes a first opening for releasing a gaseous medium into a first chamber. The switching component is disposed corresponding to the first opening and is used to set the direction in which the gaseous medium is released from the first opening to a first direction or a second direction. The second direction forms an angle with the first direction. At least when the first isolation door is open, the switching component sets the direction in which the gas medium is released from the first opening to the first direction, and the gas medium released along the first direction forms an air curtain covering at least part of the first isolation door.

2. The processing apparatus according to claim 1, characterized in that, The first opening includes a first opening and a second opening, wherein the central axis of the first opening is parallel to the first direction, and the central axis of the second opening is parallel to the second direction; The switching component includes a converter, which is used to set one of the first opening and the second opening to an open state and to set the other of the first opening and the second opening to a closed state.

3. The processing apparatus according to claim 1, characterized in that, The first intake duct further includes a main body, and the first opening is movably connected to the main body. The switching component includes a drive member, which is used to drive the first opening to move relative to the main body to change the opening orientation of the first opening.

4. The processing apparatus according to any one of claims 1 to 3, characterized in that, The gas path mechanism further includes a first exhaust pipe, which is used to discharge the gas medium from the first chamber. The opening of the first exhaust pipe and the opening of the first opening are respectively located on opposite sides of the first isolation door along the first direction, where the first direction is vertical.

5. The processing apparatus according to claim 4, characterized in that, The housing includes a first sidewall, the first isolation door is disposed on the first sidewall, and the air passage mechanism further includes: A second exhaust pipe, the opening of which is disposed opposite to the first sidewall; and / or, A second intake pipe is used to release the gas medium into the first chamber, and the opening of the second intake pipe and the opening of the first exhaust pipe are located on the same side of the first chamber.

6. The processing apparatus according to claim 5, characterized in that, It also includes a valve structure and at least two pipeline structures, at least one of the pipeline structures being provided with the valve structure, the valve structure being used to regulate the flow rate of the gas medium in the corresponding pipeline structure; The at least two pipeline structures include the first intake pipe and the first exhaust pipe.

7. The processing apparatus according to claim 6, characterized in that, It also includes a control circuit, which is electrically connected to the first isolation gate, the valve structure and the switching component, respectively. The control circuit controls the operation of the switching component and / or the valve structure based on the state of the first isolation gate.

8. The processing apparatus according to claim 7, characterized in that, It also includes a sensor disposed in the second exhaust pipe and located downstream of the first exhaust pipe. The sensor is used to detect the state information of the gas medium in the second exhaust pipe. The control circuit is electrically connected to the sensor and controls the operation of the switching component and / or the valve structure based on the state information.

9. A processing equipment, characterized in that, The processing apparatus includes any one of claims 1 to 8.

10. The processing equipment according to claim 9, characterized in that, It also includes a second chamber, the housing being provided with a second isolation door, the second isolation door being used to transfer the workpiece to be processed between the first chamber and the second chamber, wherein if one of the first isolation door and the second isolation door is open, the other of the first isolation door and the second isolation door is closed.

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