Wafer adjusting device

Abstract

The utility model discloses a wafer adjusting device, including fixed frame, the fixed frame is in the sleeve, and fixedly installed intermediate link frame, the intermediate link frame is in the sleeve and is equipped with the adjusting frame, the outer wall of adjusting frame with the inner wall of intermediate link frame is spherical surface cooperation, just be equipped with air suction type fixed structure between intermediate link frame with adjusting frame. When adjusting in Z axle direction, the end of adjusting frame will with the reference component arranged above it and carry out the resistance, in the process of abutting, through the spherical surface cooperation of adjusting frame and intermediate link frame, adjusting frame will slide in the intermediate link frame, until the end surface of adjusting frame with reference component parallel, then through air suction type fixed structure to the fixed adjusting frame. Simple structure, parallelism adjustment is quick, convenient, and the fixed reliable, stable after adjusting, realized the plane position adjustment of wafer and with the purpose of photolithography board keeps parallel state, laid the foundation for guaranteeing exposure, photolithography etc. Process effect and product quality.

Description

Technical Field

[0001] This utility model belongs to the field of parallelism adjustment technology, and in particular relates to a wafer adjustment device. Background Technology

[0002] Currently, in wafer exposure and other processes, the wafer is directly transferred to a fixed stage, and then its position in the XYZ directions is adjusted by a fine-tuning device below the stage before exposure and other processes can be performed. The drawbacks of this method are:

[0003] A photomask is placed above the fixed stage. Whether the wafer and the photomask are parallel cannot be guaranteed, which affects the effect of processes such as exposure and photolithography, and thus affects the quality of the final product. Utility Model Content

[0004] This invention provides a wafer adjustment device to adjust the planar position of the wafer and maintain it in parallel with the photomask.

[0005] To solve the above-mentioned technical problems, the technical solution of this utility model is: a wafer adjustment device, including a fixing frame, an intermediate connecting frame is fitted and fixedly installed inside the fixing frame, an adjustment frame is fitted inside the intermediate connecting frame, the outer wall of the adjustment frame and the inner wall of the intermediate connecting frame are spherically fitted, and a gas suction fixing structure is provided between the intermediate connecting frame and the adjustment frame.

[0006] As an improvement, the air suction fixing structure includes an air groove disposed on the inner wall of the intermediate connecting frame, the air groove extending circumferentially along the inner wall of the intermediate connecting frame;

[0007] The intermediate connecting frame is also provided with a first air intake hole that communicates with the air groove.

[0008] As a further improvement, both the adjusting frame and the fixed frame are hollow structures, and an elastic support and adjusting mechanism is provided between the adjusting frame and the fixed frame.

[0009] As a further improvement, the elastic support adjustment mechanism includes an adjustment plate disposed on the adjustment frame and a connecting plate disposed on the fixed frame. A plurality of support columns are arranged circumferentially between the adjustment plate and the connecting plate, and each end of the support column is provided with a limiting retaining ring.

[0010] Two bushings are fitted on the support column located between the adjusting plate and the connecting plate, and an elastic element is fitted on the support column between the two bushings;

[0011] A movable adjustment structure is provided between the bushing, the support column and the adjustment disc near the adjustment disc.

[0012] As a further improvement, the movable adjustment structure includes a spherical protrusion disposed on the adjustment disc, the spherical protrusion engaging with the spherical surface of the bushing;

[0013] The adjusting plate has a through hole for the support column to pass through, and the diameter of the through hole is larger than the diameter of the support column.

[0014] As a further improvement, the spherical protrusion is integrally formed on the adjusting plate, the adjusting plate is integrally formed on the adjusting frame, and the connecting plate is integrally formed on the fixing frame.

[0015] As a further improvement, the support column is provided with three columns arranged in a circular array.

[0016] As a further improvement, a baffle is mounted on the fixing frame, the baffle being arranged on the side away from the adjusting frame.

[0017] As a further improvement, the inner wall of the adjustment frame is provided with a plurality of first air pipe connectors, and the end face of the adjustment frame is provided with a second air inlet, the second air inlet being connected to the first air pipe connectors.

[0018] As a further improvement, a second air pipe connector is installed at the end of the intermediate connecting frame located within the fixed frame, and the second air pipe connector is connected to the first air inlet.

[0019] After adopting the above technical solution, the effect of this utility model is:

[0020] The adjustment device includes a fixed frame, an intermediate connecting frame housed and fixedly installed within the fixed frame, and an adjusting frame housed within the intermediate connecting frame. The outer wall of the adjusting frame and the inner wall of the intermediate connecting frame have a spherical fit, and a pneumatic suction fixing structure is provided between the intermediate connecting frame and the adjusting frame. Based on this structure, the adjustment device is fixed on a fine-tuning platform during use and adjusted in three directions (XYZ). During Z-axis adjustment, the end of the adjusting frame abuts against a reference component (in the wafer exposure process, the reference component is the photomask frame) arranged above it. During this abutment process, the adjusting frame slides within the intermediate connecting frame through the spherical fit between the adjusting frame and the intermediate connecting frame until the end face of the adjusting frame is parallel to the reference component. Then, the pneumatic suction fixing structure fixes the adjusting frame. In summary, this adjustment device has a simple structure, allows for quick and convenient parallelism adjustment, and provides reliable and stable fixation after adjustment. This achieves the goal of adjusting the planar position of the wafer and maintaining its parallelism with the photomask, laying the foundation for ensuring the effectiveness of exposure, photolithography, and other processes and the quality of the product.

[0021] The air suction fixing structure includes an air groove on the inner wall of the intermediate connecting frame, which extends circumferentially along the inner wall of the intermediate connecting frame. The intermediate connecting frame is also provided with a first air suction hole that communicates with the air groove. Thus, when fixing the adjusting frame, the air groove and the first air suction hole work together to generate negative pressure in the air groove and perform negative pressure adsorption on the adjusting frame, so that the adjusting frame maintains a reliable and stable fixing effect during operation.

[0022] Since both the adjusting frame and the fixed frame are hollow structures, and an elastic support adjustment mechanism is provided between the adjusting frame and the fixed frame, the weight is effectively reduced through the hollow structure, which is conducive to the adjustment of the adjusting frame; the elastic support adjustment mechanism supports the adjusting frame, and at the same time, it can provide elastic buffering when the adjusting frame comes into contact with the reference component, which plays a role in safety protection.

[0023] The elastic support adjustment mechanism includes an adjustment plate mounted on an adjustment frame and a connecting plate mounted on a fixed frame. Multiple support columns are circumferentially arranged between the adjustment plate and the connecting plate, with limit rings at both ends of each support column. Two bushings are fitted onto the support column between the adjustment plate and the connecting plate, and an elastic element is fitted onto the support column between the two bushings. A movable adjustment structure is provided between the bushings near the adjustment plate, the support columns, and the adjustment plate. This allows for elastic buffering and support through the interaction of the support columns, the bushings fitted on them, and the elastic element. The movable adjustment structure enables the adjustment plate to move automatically during position adjustment, avoiding rigid connections that could affect the adjustment of the plate's position.

[0024] The movable adjustment structure includes a spherical protrusion on the adjustment plate, which mates with the spherical surface of the bushing. The adjustment plate has a through hole for the support column to pass through, and the diameter of the through hole is larger than the diameter of the support column. This large-diameter through hole prevents interference between the support column and the adjustment plate when the adjustment plate moves, and also provides room for the movement of the adjustment plate. At the same time, the spherical protrusion mates with the spherical surface of the bushing, and the fit changes accordingly as the adjustment plate moves. This not only effectively provides elastic support, but also prevents interference with any other components during the adjustment process.

[0025] Because the spherical protrusion is integrally formed on the adjusting plate, the adjusting plate is integrally formed on the adjusting frame, and the connecting plate is integrally formed on the fixed frame, the integrally formed structure not only ensures structural strength but also ensures long-term stability of the cooperation between them during operation.

[0026] Because the support columns are arranged in a three-column array, the support effect is not only guaranteed, but the structure is also effectively simplified.

[0027] Because the fixed frame is equipped with a baffle plate, which is located on the side away from the adjustment frame, the baffle plate can block the support column and prevent the support column from detaching or falling off due to vibration during operation, thus effectively ensuring the stability of the working position of the support column.

[0028] Because the inner wall of the adjustment frame is equipped with multiple first air pipe connectors, and the end face of the adjustment frame is equipped with a second air suction hole, which is connected to the first air pipe connector, the wafer or the carrier supporting the wafer is picked up through the second air suction hole. By arranging the first air pipe connectors in the adjustment frame, the air pipes connected to the first air pipe connectors are also located in the adjustment frame and the fixed frame. The overall structure is simple and not messy, and effectively avoids the problem of air pipes interfering with other structures during operation.

[0029] Because a second air pipe connector is installed at the end of the intermediate connecting frame located within the fixed frame, and the second air pipe connector is connected to the first air inlet, the air pipe connected to the second air pipe connector is also located within the fixed frame through the second air pipe connector arranged within the fixed frame. The overall structure is simple and uncluttered, and effectively avoids the problem of interference between the air pipe and other structures during operation. Attached Figure Description

[0030] The present invention will be further described below with reference to the accompanying drawings and embodiments.

[0031] Figure 1 This is a schematic diagram of the structure of this utility model;

[0032] Figure 2 yes Figure 1 A structural diagram from another angle;

[0033] Figure 3 yes Figure 1 A sectional view;

[0034] Figure 4 yes Figure 3 Schematic diagram of the intermediate connecting frame;

[0035] Figure 5 yes Figure 3 Enlarged view of A in the middle;

[0036] Among them, 1-fixed frame; 101-connecting plate; 2-intermediate connecting frame; 201-air groove; 202-first air intake hole; 203-second air pipe connector; 3-adjusting frame; 301-adjusting plate; 302-support column; 303-limiting retaining ring; 304-shaft sleeve; 305-elastic element; 306-spherical protrusion; 307-through hole; 308-first air pipe connector; 309-second air intake hole; 4-movable adjustment structure; 5-baffle plate. Detailed Implementation

[0037] The present invention will be further described in detail below through specific embodiments.

[0038] like Figures 1 to 3 As shown, a wafer adjustment device includes a fixing frame 1, within which an intermediate connecting frame 2 is fitted and fixedly installed. An adjusting frame 3 is fitted inside the intermediate connecting frame 2. The outer wall of the adjusting frame 3 and the inner wall of the intermediate connecting frame 2 are spherically fitted (i.e., both the outer wall of the adjusting frame 3 and the inner wall of the intermediate connecting frame 2 have spherical surfaces). A pneumatic suction fixing structure is provided between the intermediate connecting frame 2 and the adjusting frame 3. Preferably, the fixing frame 1, the adjusting frame 3, and the intermediate connecting frame 2 are all cylindrical hollow structures, and an elastic support adjustment mechanism is provided between the adjusting frame 3 and the fixing frame 1.

[0039] The air suction type fixing structure includes an air groove 201 disposed on the inner wall of the intermediate connecting frame 2, the air groove 201 extending circumferentially along the inner wall of the intermediate connecting frame 2; the intermediate connecting frame 2 is also provided with a first air suction hole 202 communicating with the air groove 201 (see Figure 4 The second air pipe connector 203 is installed at the end of the intermediate connecting frame 2 located in the fixed frame 1. The second air pipe connector 203 is connected to the first air inlet 202.

[0040] The elastic support adjustment mechanism includes an adjustment plate 301 integrally formed on the adjustment frame 3 and a connecting plate 101 integrally formed on the fixed frame 1. Multiple support columns 302 are arranged circumferentially between the adjustment plate 301 and the connecting plate 101. Each end of the support column 302 is provided with a limiting retaining ring 303. The limiting retaining ring 303 can also be a bolt, screw or other connecting component threaded onto the support column 302. In this solution, there are three support columns 302 arranged in a circular array. Two bushings 304 are fitted on the support column 302 located between the adjustment plate 301 and the connecting plate 101. An elastic element 305 (such as a tension spring) is fitted on the support column 302 between the two bushings 304. A movable adjustment structure 4 is provided between the bushings 304, the support columns 302 and the adjustment plate 301 near the adjustment plate 301.

[0041] The adjustable structure 4 includes a spherical protrusion 306 integrally formed on the adjusting disc 301, which spherically mates with the bushing 304; the adjusting disc 301 has a through hole 307 for the support column 302 to pass through, and the diameter of the through hole 307 is larger than the diameter of the support column 302 (see...). Figure 5 ).

[0042] In this scheme, a baffle 5 is installed on the fixed frame 1, and the baffle 5 is arranged on the side away from the adjusting frame 3; a plurality of first air pipe connectors 308 are provided on the inner wall of the adjusting frame 3, and a second air inlet 309 is provided on the end face of the adjusting frame 3, and the second air inlet 309 is connected to the first air pipe connectors 308.

[0043] The above-described embodiments are merely preferred embodiments of the present utility model and are not intended to limit the scope of the present utility model. Any modifications and alterations to the technical solution of the present utility model without departing from its design spirit shall fall within the protection scope defined by the claims of the present utility model.

Claims

1. A wafer adjustment device, comprising a fixing frame, characterized in that: An intermediate connecting frame is fitted inside and fixedly installed within the fixed frame. An adjusting frame is fitted inside the intermediate connecting frame. The outer wall of the adjusting frame and the inner wall of the intermediate connecting frame are spherically fitted. An air suction fixing structure is provided between the intermediate connecting frame and the adjusting frame.

2. The adjustment device as described in claim 1, characterized in that: The air suction type fixing structure includes an air groove disposed on the inner wall of the intermediate connecting frame, and the air groove extends circumferentially along the inner wall of the intermediate connecting frame; The intermediate connecting frame is also provided with a first air intake hole that communicates with the air groove.

3. The adjustment device as described in claim 2, characterized in that: Both the adjusting frame and the fixed frame are hollow structures, and an elastic support and adjusting mechanism is provided between the adjusting frame and the fixed frame.

4. The adjustment device as described in claim 3, characterized in that: The elastic support adjustment mechanism includes an adjustment plate disposed on the adjustment frame and a connecting plate disposed on the fixed frame. Multiple support columns are arranged circumferentially between the adjustment plate and the connecting plate, and each support column is provided with a limiting retaining ring at both ends. Two bushings are fitted on the support column located between the adjusting plate and the connecting plate, and an elastic element is fitted on the support column between the two bushings; A movable adjustment structure is provided between the bushing, the support column and the adjustment disc near the adjustment disc.

5. The adjustment device as described in claim 4, characterized in that: The movable adjustment structure includes a spherical protrusion disposed on the adjustment disk, the spherical protrusion cooperating with the spherical surface of the bushing; The adjusting plate has a through hole for the support column to pass through, and the diameter of the through hole is larger than the diameter of the support column.

6. The adjusting device as described in claim 5, characterized in that: The spherical protrusion is integrally formed on the adjusting plate, the adjusting plate is integrally formed on the adjusting frame, and the connecting plate is integrally formed on the fixing frame.

7. The adjusting device as described in claim 4, characterized in that: The support column consists of three columns arranged in a circular array.

8. The adjusting device as described in claim 7, characterized in that: A baffle is mounted on the fixed frame, and the baffle is arranged on the side away from the adjusting frame.

9. The adjusting device as described in claim 3, characterized in that: The inner wall of the adjustment frame is provided with a plurality of first air pipe connectors, and the end face of the adjustment frame is provided with a second air inlet, which is connected to the first air pipe connectors.

10. The adjustment device as described in claim 3, characterized in that: A second air pipe connector is installed at the end of the intermediate connecting frame located within the fixed frame, and the second air pipe connector is connected to the first air inlet.

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