Semiconductor cleaning solution circulation filtering apparatus

Abstract

The utility model discloses a semiconductor cleaning solution circulation filtering equipment belongs to semiconductor cleaning device technical field, including semiconductor cleaning solution filtering mechanism, semiconductor cleaning mechanism and vibrating mechanism, the semiconductor cleaning solution filtering mechanism includes semiconductor filter frame, the inner wall of semiconductor filter frame is connected with two supporting plates, through the double filtration structure of coarse filter screen and fine filter screen, can intercept the impurity in cleaning solution layer by layer, guarantees the cleanliness of cleaning solution, satisfies semiconductor cleaning demand, the filter screen and the placing frame are all provided with handle or handle, and the quick dismounting cleaning of convenience reduces maintenance time -consuming, improves equipment use flexibility, and the spray head of semiconductor cleaning mechanism is evenly distributed cleaning solution through the flow divider, can all -round spray to semiconductor, avoids local cleaning not to be thorough, and simultaneously, cleaning solution can recycle, reduces resource waste, reduces the liquid consumable cost of semiconductor processing, meets the demand of energy -conserving and environment -protecting.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor cleaning device technology, specifically a semiconductor cleaning fluid circulation filtration device. Background Technology

[0002] Semiconductor wafer cleaning equipment is one of the most crucial and frequently used pieces of equipment in the chip manufacturing process. It plays an irreplaceable role in ensuring chip yield, improving performance, and enhancing reliability. As chip manufacturing processes continue to shrink, the requirements for cleaning processes have become increasingly stringent, reaching near-atomic levels.

[0003] However, most current semiconductor cleaning fluid circulation filtration equipment uses a single filter screen to filter the cleaning fluid, resulting in unsatisfactory filtration effects. Moreover, the filter screen is mostly fixed inside the filtration equipment, making it impossible for users to disassemble and replace it. After prolonged use, a large amount of impurities accumulate on the surface of the filter screen, which affects the equipment's filtration effect on the cleaning fluid. Therefore, those skilled in the art have provided a semiconductor cleaning fluid circulation filtration equipment to solve the problems mentioned in the background art. Utility Model Content

[0004] The purpose of this invention is to provide a semiconductor cleaning fluid circulation filtration device to solve the problems mentioned in the background art.

[0005] To achieve the above objectives, this utility model provides the following technical solution:

[0006] A semiconductor cleaning fluid circulation filtration device includes a semiconductor cleaning fluid filtration mechanism, a semiconductor cleaning mechanism, and a vibration mechanism. The semiconductor cleaning fluid filtration mechanism includes a semiconductor filter frame. The inner wall of the semiconductor filter frame is connected to two support plates. A placement frame is placed on the upper surface of the two support plates. The inner bottom wall of the placement frame has water-permeable holes arranged at equal intervals. The inner wall of the semiconductor filter frame is connected to two sets of support plates. A coarse filter screen is placed on the upper surface of one set of support plates, and a fine filter screen is placed on the upper surface of the other set of support plates. A drain pipe is connected to the bottom surface of the semiconductor filter frame. A box cover is hinged to the upper surface of the semiconductor filter frame.

[0007] As a further improvement of this utility model: the upper surface of the placement frame is connected to two handles, the upper surface of the fine filter screen and the upper surface of the coarse filter screen are both connected to two handles, and the outer surface of the drain pipe is equipped with a valve.

[0008] As a further improvement of this utility model: the vibration mechanism includes a base, and two sets of springs are connected to the upper surface of the base.

[0009] As a further improvement of this utility model: one end of each set of springs is connected to a fixing plate, and the sides of the two fixing plates that are close to each other are connected to the semiconductor filter frame.

[0010] As a further improvement of this utility model: the upper surface of the base is connected to two sets of limiting tubes, each of the limiting tubes is fitted with a limiting rod inside, one end of each set of limiting rods is connected to a fixing plate, and a vibration motor is installed on the bottom surface of both fixing plates.

[0011] As a further embodiment of this utility model: the semiconductor cleaning mechanism includes an infusion pump, the input end of which is connected to a water pump pipe, the end of which is away from the infusion pump is connected to a semiconductor filter frame, and the bottom surface of the infusion pump is connected to a base.

[0012] As a further improvement of this utility model: the output end of the infusion pump is connected to a water outlet pipe, and the end of the water outlet pipe away from the infusion pump is connected to two water guide pipes.

[0013] As a further embodiment of this utility model: one end of each of the two water pipes is connected to a diverter, and the two diverters are connected to equally spaced nozzles on their sides that are close to each other. The front and back of the semiconductor filter frame are connected to a connecting plate, and the upper surface of the two connecting plates is connected to the diverter.

[0014] Compared with the prior art, the beneficial effects of this utility model are:

[0015] This semiconductor cleaning fluid circulation filtration equipment utilizes a dual filtration structure with coarse and fine filters to progressively intercept impurities in the cleaning fluid, ensuring its cleanliness and meeting semiconductor cleaning requirements. Both the filters and the placement frame are equipped with handles for easy and quick disassembly and cleaning, reducing maintenance time and enhancing equipment flexibility. The cleaning fluid is evenly distributed via a distributor through the nozzles of the semiconductor cleaning mechanism, allowing for comprehensive spraying of the semiconductor and preventing incomplete cleaning in certain areas. Simultaneously, the cleaning fluid can be recycled, reducing resource waste and lowering the cost of liquid consumables in semiconductor processing, thus meeting energy conservation and environmental protection requirements. Attached Figure Description

[0016] Figure 1 A three-dimensional structural diagram of a semiconductor cleaning fluid circulation filtration device;

[0017] Figure 2 Side view of a semiconductor cleaning fluid circulation filtration device;

[0018] Figure 3 A top view of the placement frame of the semiconductor cleaning fluid circulation filtration equipment;

[0019] Figure 4This is a cross-sectional view of the fixed frame in a semiconductor cleaning fluid circulation filtration device.

[0020] In the diagram: 1. Semiconductor cleaning fluid filtration mechanism; 101. Semiconductor filter frame; 102. Tray; 103. Placement frame; 104. Water permeable hole; 105. Handle; 106. Support plate; 107. Fine filter screen; 108. Coarse filter screen; 109. Handle; 110. Drain pipe; 111. Valve; 2. Semiconductor cleaning mechanism; 201. Infusion pump; 202. Water outlet pipe; 203. Water suction pipe; 204. Water guide pipe; 205. Connecting plate; 206. Diverter; 207. Nozzle; 3. Vibration mechanism; 301. Base; 302. Limiting tube; 303. Fixing plate; 304. Vibration motor; 305. Spring; 306. Limiting rod; 4. Box cover. Detailed Implementation

[0021] Please see Figures 1-4 In this embodiment of the utility model, the semiconductor cleaning fluid circulation filtration device includes a semiconductor cleaning fluid filtration mechanism 1, a semiconductor cleaning mechanism 2, and a vibration mechanism 3. The semiconductor cleaning fluid filtration mechanism 1 includes a semiconductor filter frame 101. The inner wall of the semiconductor filter frame 101 is connected to two support plates 102. The upper surface of the two support plates 102 is shared by a placement frame 103. The inner bottom wall of the placement frame 103 is provided with water-permeable holes 104 arranged at equal intervals. The inner wall of the semiconductor filter frame 101 is connected to two sets of support plates 106. The upper surface of one set of support plates 106 is provided with a coarse filter screen 108, and the upper surface of the other set of support plates 106 is provided with a fine filter screen 107. The bottom surface of the semiconductor filter frame 101 is connected to a drain pipe 110. The upper surface of the semiconductor filter frame 101 is hinged to a box cover 4. This not only improves the filtration effect of the cleaning fluid, but also allows the cleaning fluid to circulate and improves the cleaning effect of the semiconductor.

[0022] Two handles 105 are connected to the upper surface of the placement frame 103. Two handles 109 are connected to the upper surfaces of the fine filter screen 107 and the coarse filter screen 108. A valve 111 is installed on the outer surface of the drain pipe 110. The vibration mechanism 3 includes a base 301. Two sets of springs 305 are connected to the upper surface of the base 301. One end of each set of springs 305 is connected to a fixing plate 303. The sides of the two fixing plates 303 that are close to each other are connected to the semiconductor filter frame 101. Two sets of limiting tubes 302 are connected to the upper surface of the base 301. A limiting rod 306 is sleeved inside each limiting tube 302. One end of each set of limiting rods 306 is connected to the fixing plate 303. A vibration motor 304 is installed on the bottom surface of the two fixing plates 303. This not only makes it convenient for people to replace and clean the coarse filter screen 108 and the fine filter screen 107, but also enables the equipment to drive the placement frame 103 to vibrate, thereby improving the cleaning effect of the equipment on the semiconductor.

[0023] The semiconductor cleaning mechanism 2 includes an infusion pump 201. The input end of the infusion pump 201 is connected to a water suction pipe 203. The end of the water suction pipe 203 away from the infusion pump 201 is connected to the semiconductor filter frame 101. The bottom surface of the infusion pump 201 is connected to the base 301. The output end of the infusion pump 201 is connected to an outlet pipe 202. The end of the outlet pipe 202 away from the infusion pump 201 is connected to two water guide pipes 204. One end of each of the two water guide pipes 204 is connected to a distributor 206. The sides of the two distributors 206 that are close to each other are connected to nozzles 207 arranged at equal intervals. The front and back of the semiconductor filter frame 101 are connected to connecting plates 205. The upper surfaces of the two connecting plates 205 are connected to the distributors 206. This not only enables the equipment to automatically clean the semiconductor, but also allows the cleaning solution to circulate.

[0024] The working principle of this utility model is as follows: Before cleaning, the staff can open the box cover 4, put the semiconductor into the semiconductor placement frame 103, close the box cover 4 and start the equipment.

[0025] The infusion pump 201 of the semiconductor cleaning mechanism 2 draws the cleaning liquid from the semiconductor filter frame 101 through the water pumping pipe 203, delivers it to the water guide pipe 204 through the water outlet pipe 202, and then distributes it to the nozzle 207 by the distributor 206. The nozzle 207 sprays the semiconductor evenly to achieve the cleaning operation of the semiconductor.

[0026] The cleaning fluid carrying impurities falls through the water-permeable holes 104 of the placement frame 103. First, it passes through the coarse filter screen 108 to filter large particles of impurities, and then through the fine filter screen 107 to filter small particles of impurities. At the same time, the vibration motor 304 of the vibration mechanism 3 is started, which drives the fixed plate 303 and the semiconductor filter frame 101 to vibrate, so as to prevent impurities from clogging the filter screen. The limiting tube 302 and the limiting rod 306 ensure stable vibration.

[0027] The filtered cleaning solution remains at the bottom of the semiconductor filter frame 101 and can be drawn back by the infusion pump 201 for recycling. When it needs to be discharged, simply open the valve 111 of the drain pipe 110. After a long period of use, staff can use the handle 105 and the handle 109 to take out the fine filter screen 107 and the coarse filter screen 108 respectively to replace or clean them.

[0028] The above description is merely a preferred embodiment of this utility model, but the scope of protection of this utility model is not limited thereto. Any equivalent substitutions or modifications made by those skilled in the art within the technical scope disclosed in this utility model, based on the technical solution and inventive concept of this utility model, should be included within the scope of protection of this utility model. It is obvious to those skilled in the art that this utility model is not limited to the details of the above exemplary embodiments, and that it can be implemented in other specific forms without departing from the spirit or basic characteristics of this utility model. Therefore, the embodiments should be considered exemplary and non-limiting in all respects. The scope of this utility model is defined by the appended claims rather than the foregoing description, and thus all variations falling within the meaning and scope of equivalent elements of the claims are intended to be included within this utility model. No reference numerals in the claims should be construed as limiting the scope of the claims.

Claims

1. A semiconductor cleaning fluid circulation filtration device, characterized in that, The device includes a semiconductor cleaning fluid filtration mechanism (1), a semiconductor cleaning mechanism (2), and a vibration mechanism (3). The semiconductor cleaning fluid filtration mechanism (1) includes a semiconductor filter frame (101). The inner wall of the semiconductor filter frame (101) is connected to two trays (102). The upper surfaces of the two trays (102) are shared by a placement frame (103). The inner bottom wall of the placement frame (103) is provided with water-permeable holes (104) arranged at equal intervals. The inner wall of the semiconductor filter frame (101) is connected to two sets of support plates (106). The upper surface of one set of support plates (106) is provided with a coarse filter screen (108), and the upper surface of the other set of support plates (106) is provided with a fine filter screen (107). The bottom surface of the semiconductor filter frame (101) is connected to a drain pipe (110). The upper surface of the semiconductor filter frame (101) is hinged to a box cover (4).

2. The semiconductor cleaning fluid circulation filtration device according to claim 1, characterized in that, The upper surface of the placement frame (103) is connected to two handles (105), the upper surface of the fine filter (107) and the upper surface of the coarse filter (108) are both connected to two handles (109), and the outer surface of the drain pipe (110) is equipped with a valve (111).

3. The semiconductor cleaning fluid circulation filtration device according to claim 1, characterized in that, The vibration mechanism (3) includes a base (301), and two sets of springs (305) are connected to the upper surface of the base (301).

4. The semiconductor cleaning fluid circulation filtration device according to claim 3, characterized in that, Each set of springs (305) has a fixing plate (303) connected to one end, and the two fixing plates (303) are connected to the semiconductor filter frame (101) on their sides that are close to each other.

5. The semiconductor cleaning fluid circulation filtration device according to claim 3, characterized in that, The upper surface of the base (301) is connected to two sets of limiting tubes (302). Each limiting tube (302) is fitted with a limiting rod (306). One end of each limiting rod (306) is connected to a fixing plate (303). A vibration motor (304) is installed on the bottom surface of both fixing plates (303).

6. The semiconductor cleaning fluid circulation filtration device according to claim 1, characterized in that, The semiconductor cleaning mechanism (2) includes an infusion pump (201), the input end of which is connected to a water pump pipe (203), the end of which is away from the infusion pump (201) is connected to a semiconductor filter frame (101), and the bottom surface of the infusion pump (201) is connected to a base (301).

7. The semiconductor cleaning fluid circulation filtration device according to claim 6, characterized in that, The output end of the infusion pump (201) is connected to a water outlet pipe (202), and the end of the water outlet pipe (202) away from the infusion pump (201) is connected to two water guide pipes (204).

8. The semiconductor cleaning fluid circulation filtration device according to claim 7, characterized in that, One end of each of the two water pipes (204) is connected to a diverter (206), and the two diverters (206) are connected to equally spaced nozzles (207) on their adjacent sides. The front and back of the semiconductor filter frame (101) are connected to a connecting plate (205), and the upper surfaces of the two connecting plates (205) are connected to the diverter (206).

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