Commutator wire hooking part polishing device
Patent Information
- Application Number
- CN202522104653.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-09-29
- Publication Date
- 2026-09-29
- Estimated Expiration
- 2035-09-29
AI Technical Summary
若外侧面存在起伏、波纹或明显的定向纹理,受力将沿不规则路径迁移:一方面导致拉断张力偏大且波动,另一方面易引起断裂位置漂移、断口毛糙,甚至在绕挂与牵引过程中对漆包层造成刮擦风险,影响批量一致性与整机可靠性
[0025](三)本实用新型的有益效果:通过旋转承载工位使换向器绕轴旋转并形成外露的环形加工区,配合抛光轮在径向受控进给建立带状接触,能够在一次装夹中依次处理全部导线挂接部外侧面,接触带与单位压力可重复设定,平整度一致性显著提升。稳定的带状去除抑制定向纹理与局部起伏,外侧面质量均匀,从而使断线所需张力降低并趋于稳定,断裂位置更易受控,同时减少对漆包层的非期望擦伤风险。
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Figure CN224809167U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of commutator manufacturing technology, specifically to a commutator wire connection polishing device and a commutator. Background Technology
[0002] As a crucial component of the motor, the commutator's lead wire coupling at the winding end is responsible for breaking the lead wire tangentially along the outer periphery of the cylinder. The flatness of the outer surface of this part, as well as the geometric clarity of the two outer boundary lines formed by its intersection with adjacent sides, directly affects the required tensile force for wire breakage, the controllability of the breakage location, and the consistency of the fracture morphology. If the outer surface has undulations, ripples, or obvious directional textures, the force will migrate along an irregular path: on the one hand, this leads to a larger and fluctuating tensile tension; on the other hand, it easily causes the breakage location to drift, the fracture surface to become rough, and even poses a risk of scratching the enameled layer during winding and traction, affecting batch consistency and overall machine reliability.
[0003] Existing manufacturing processes typically include sheet metal forming, rolling and closing, insulation construction, and outward forming. Due to factors such as material flow, clamping and cleaning methods, and tooling wear, the aforementioned outer surfaces are prone to flatness mismatch and surface texture accumulation during mass production, making it difficult to directly meet the requirements for stable wire breakage. Therefore, it is necessary to configure a specialized device at the end of the production process capable of performing strip surface treatment on the outer surfaces of the wire connection points. This would enable the outer surfaces to achieve repeatable flatness and edge clarity, thereby reducing tensile tension, improving the consistency of breakage locations, and protecting the insulation layer, thus meeting the cycle time and quality control requirements of the production line. Utility Model Content
[0004] (i) The technical problem to be solved by this utility model is that existing production lines lack standardized processing equipment for the outer side of the commutator wire connector, making it difficult to stably expose the outer side and perform controllable strip processing under annular positional relationship. This results in the flatness of the outer side and the geometric clarity of the two outer boundary lines being difficult to guarantee, which leads to the large and fluctuating tension required for wire breakage, the difficulty in controlling the breakage position, and the potential risk of scratching the enameled layer.
[0005] (II) Technical Solution To solve the above-mentioned technical problems, this utility model provides a polishing device for the commutator wire coupling part, used to polish the outer surface of the commutator wire coupling part, including: Base; A rotating bearing component is erected on the base, including a rotatable bearing shaft and a rotating bearing station located at the top of the bearing shaft. The commutator to be polished is fitted onto the rotating bearing station with its axial mounting hole and rotates around the bearing shaft, so that the outer side of the wire connection part is in the exposed annular processing area. A polishing wheel assembly is disposed on one side of the rotating support member, including a polishing wheel and a feeding mechanism for moving the polishing wheel forward and backward along a radial direction pointing towards or away from the rotating support position. The circumferential outer edge of the polishing wheel forms a polishing ring that contacts the outer surface of the wire connection part, so that when the commutator rotates, the outer surfaces of multiple wire connection parts sequentially contact the polishing ring to complete the polishing.
[0006] By setting a rotating bearing component on the base, the commutator is fitted with its axial mounting hole onto the rotating bearing station at the top of the bearing shaft and rotates around the shaft. This creates a continuous, exposed annular machining area on the outer surface of the wire connection portion. A polishing wheel assembly is arranged laterally in this machining area, and its circumferential outer edge forms a polishing ring that establishes a stable band-like contact with the outer surface under the radial advance and retraction of the feed mechanism. This structural relationship transforms the discrete outer surfaces of multiple wire connections into a periodic path that passes through the same contact band as the workpiece rotates. All outer surfaces can be processed sequentially in a single clamping operation. The bandwidth and unit pressure are determined by the radial feed and can be repeatedly reproduced, avoiding the problem of inconsistent contact geometry and pressure distribution under manual or general tooling conditions. This results in controllable flatness and surface consistency on the outer surface.
[0007] Under the same clamping and contact conditions, the force and removal amount on the outer surface of the wire connection remain uniform along the circumferential direction. The two outer boundary lines formed by the intersection of the outer surface and adjacent surfaces thus have clearer geometric boundaries, reducing the tension required for wire breakage and minimizing fluctuations, making the breakage location more controllable. Simultaneously, the strip-shaped contact avoids localized point pressure and irregular dragging, reducing the risk of unintended scratches on the enameled coating. The entire equipment is supported by a base, with the relative positions of the rotating bearing station and polishing wheel assembly fixed, reducing quality drift caused by clamping errors and structural conformity. It is suitable for placement at the end of the production process to perform consistent treatment on the outer surface, meeting the requirements of mass production for cycle time and stability.
[0008] According to one embodiment of the present invention, a first polishing station and a second polishing station are arranged side by side on the base, and each polishing station includes the rotating support member and a polishing wheel assembly correspondingly disposed on one side of the rotating support member.
[0009] The two polishing stations, arranged side by side, use the same base as their dimensional reference. The rotating carrier and its corresponding polishing wheel assembly work in a fixed relative relationship, allowing for the replication of consistent contact geometry and feed paths between the two stations. This reduces batch-to-batch deviations caused by installation position drift, stiffness differences, or thermal deformation. Simultaneously, different carrier shaft speeds or polishing wheel feed rates can be set at each station to create two separate processes with varying strip removal intensities (such as leveling-finishing). This achieves higher consistency in outer surface flatness and edge sharpness without altering the structure.
[0010] According to one embodiment of the present invention, the bearing shafts of the first polishing station and the second polishing station rotate in opposite directions during polishing.
[0011] The two-station bearing shafts are set to rotate in opposite directions during polishing, so that the tangential relative movement between the outer side of the wire connection and the polishing ring is opposite in the two processes. Mechanistically, this can cross-cut and smooth out the fine grooves and micro-steps left by single-direction polishing, suppress the material smearing caused by directional texture and "dragging", and avoid the edge being locally rounded. At the same time, because the tangential shearing in opposite directions has an averaging effect on the undulations caused by small jumps or slight eccentricity, it can reduce the influence of circumferential unevenness and local high points on the surface morphology, making the outer surface flatness more consistent and the edge lines clearer and more stable.
[0012] According to one embodiment of the present invention, the base is provided with a gripper-type pick-and-place unit, which is configured to pick up and place a reversing device from the loading and unloading station, and to fit the reversing device with its axial mounting hole onto the rotating bearing station to realize the loading and unloading of the polishing station.
[0013] The gripper-type pick-and-place unit uses the axial mounting hole as the sole clamping and positioning reference. It directly picks up and places items from the loading / unloading station and places them onto the rotating bearing station, eliminating manual gripping and visual alignment, and reducing clamping errors and collision risks caused by human swinging and skewing. The pick-and-place path, stroke, and speed can be preset to be constant, with high repeatability, avoiding the wire hook-and-loop parts and outer surfaces from being gripped or laterally rubbed. The clamping posture is automatically corrected by the hole-axis coaxial relationship, and it is a pure axial insertion when entering the station, reducing the probability of jamming and secondary adjustments, thereby improving loading and positioning accuracy, shortening cycle time, and stabilizing batch quality.
[0014] According to one embodiment of the present invention, a conveying mechanism is provided extending along the first polishing station and the second polishing station on the base; a first loading / unloading position and a second loading / unloading position are respectively provided on the conveying mechanism at positions corresponding to the first polishing station and the second polishing station; a corresponding gripper-type pick-and-place unit is provided at each polishing station, the gripper-type pick-and-place unit is located on one side of the conveying mechanism, the rotating bearing is located on the opposite side of the conveying mechanism, and the gripper-type pick-and-place unit has a pick-and-place stroke that spans the conveying mechanism, and is used to complete the loading or unloading between the conveying mechanism and the rotating bearing station when the commutator is conveyed to the corresponding loading / unloading position.
[0015] The conveying mechanism is arranged along the two polishing stations, with first and second loading / unloading positions at corresponding locations, creating a clear cycle transfer point for the workpiece between the two stations. Whenever a commutator is conveyed to the corresponding loading / unloading position, a gripper-type pick-and-place unit located on one side of the conveying mechanism directly docks between the loading / unloading position and the opposite rotating bearing station by crossing the stroke. Both loading and unloading are axially sleeved, without contacting the surface of the wire connection part. Thus, during the processing at the first polishing station, the conveying mechanism can simultaneously pre-place the next workpiece at its loading / unloading position, and the second polishing station can also complete pick-and-place and processing in parallel, with processes staggered and not waiting for each other. After the commutator has completed the first polishing, it is clamped back to the conveying mechanism and sequentially conveyed to the second loading / unloading position, where it is again sleeved by the corresponding gripper to the second polishing station, forming a stable closed loop of "loading—processing—returning—transfer—reloading". This layout decouples the cycle times of the two workstations, reduces idle time by utilizing the intermediate buffer provided by the conveyor mechanism, and has a fixed pick-and-place path and a clear docking position, reducing surface damage and clamping deviations caused by manual handling and lateral rubbing. This improves throughput and batch consistency while ensuring that the outer surface is not touched.
[0016] According to one embodiment of the present invention, the polishing wheel is a blade-type polishing wheel, which is formed by fixing several sheet-shaped abrasive blades around the wheel core. The end edges of the blades together form a polishing ring that contacts the outer side of the wire connection part.
[0017] The blade-type polishing wheel consists of multiple abrasive blades arranged circumferentially. The polishing ring formed by the blade edges provides a banded contact with controllable bandwidth and uniform unit pressure distribution when in contact with the outer surface of the wire connection. The blades are elastic and compliant, adapting to minor undulations without over-cutting, thus achieving smoothing of the outer surface with minimal and uniform removal, reducing the risk of rounding caused by local grooves and "dragging edges". The gaps between the blades facilitate chip removal and gas-liquid medium exchange, suppressing chip accumulation and surface heating, maintaining abrasive sharpness and stable removal rate. The multiple micro-cutting edges at the ends work in overlapping paths, forming a continuous and consistent polishing trajectory even when the workpiece rotates around its axis. This allows the same polishing ring to act sequentially on the outer surface of each wire connection, outputting consistent flatness and surface texture. Compared to rigid integral wheels, the blade structure is more tolerant of slight eccentricity and runout, and the banded contact is less likely to generate peak pressure. Therefore, while maintaining processing efficiency, it is more conducive to protecting the geometric clarity and continuity of the outer boundary line, balancing batch stability and edge quality.
[0018] According to one embodiment of the present invention, the commutator wire coupling polishing device further includes a dressing mechanism acting on the polishing wheel, which is disposed on the back side of the working side of the polishing wheel. The dressing end of the dressing mechanism is located within the stroke range of the feed mechanism to grind or dress the polishing ring.
[0019] The dressing mechanism is located on the back side of the polishing wheel's working side, with its dressing end within the stroke coverage of the feed mechanism. The polishing wheel can approach the dressing end and establish contact via the controlled feed mechanism without changing its clamping posture, thereby utilizing the same feed axis to generate a stable and repeatable pressure to grind or dress the polishing ring. This arrangement allows uneven edge wear (such as central depression, unilateral wear, or localized warping) that occurs after long-term operation of the polishing ring to be eliminated online as needed, restoring the ring's roundness and bandwidth consistency, maintaining a constant strip-shaped contact geometry with the outer surface of the wire connection, and preventing unit pressure concentration and stripe repetition caused by contact strip deformation. The dressing process requires no additional repositioning or repeated alignment, avoiding the superposition of secondary clamping errors and shortening downtime. The dressed polishing ring provides uniform edge micro-cutting edges and stable chip removal conditions in subsequent processing, reducing the risk of edge rounding caused by "edge dragging," and continuously ensuring the flatness of the outer surface and the geometric clarity and continuity of the two outer boundary lines.
[0020] According to one embodiment of the present invention, the trimming mechanism includes a trimming advance and retreat device, which is configured to drive the trimming end to move forward and backward in a direction pointing towards the blade-type polishing wheel; the feed direction of the trimming advance and retreat device overlaps with the feed direction of the feed mechanism of the polishing wheel assembly and matches its stroke range.
[0021] The dressing mechanism uses a dressing advance and retraction device to drive the dressing end to move forward and backward along the direction pointing to the blade-type polishing wheel. Its feed direction overlaps with the feed direction of the polishing wheel assembly's feed mechanism and matches its stroke range, thus allowing dressing and polishing to share the same spatial feed reference and stroke boundary. The consistency of the feed direction avoids tool setting deviations and repeated alignments caused by different axis systems. The dressing end can directly act on the end edge within the strip-shaped contact geometric coordinate system established by the polishing ring, achieving online grinding or dressing consistent with the machining posture. The matching stroke range ensures that the dressing end can cover the effective working area of the polishing ring, contacting the most concentrated wear areas as needed. Through this arrangement, the roundness, bandwidth, and end edge straightness of the polishing ring can be quickly restored within the machining cycle interval. The unit pressure and tangential velocity distribution of the contact strip remain stable, reducing stripe repetition, localized temperature rise, and "dragging" rounding caused by end edge deformation, thereby continuously maintaining the flatness of the outer surface of the wire connection and the geometric clarity of the two outer boundary lines.
[0022] According to one embodiment of this utility model, the dressing end of the dressing mechanism is provided with a replaceable wear-resistant plate for contacting the polishing ring belt for dressing. The replaceable wear-resistant plate at the dressing end ensures that the contact interface with the polishing ring belt has a stable geometric reference and wear-resistant bearing capacity: under the constant pressure established by the feeding mechanism, the wear-resistant plate uniformly grinds the end edge in a surface or line contact manner, avoiding localized scratches and geometric erosion caused by hard contact; when the wear-resistant plate wears down to the point of affecting the dressing accuracy, it can be quickly replaced, eliminating the need for disassembly and realignment of the entire mechanism, reducing downtime, and maintaining the consistency of the ring belt's roundness, bandwidth, and end edge straightness after dressing.
[0023] This utility model also provides a commutator, including: The cylinder has multiple wire hanging parts spaced at intervals along the circumferential direction at the opening edge; The outer surface of the wire connector is a polished strip. The polished strip intersects with the adjacent sides on both sides of the wire connection portion to form two sharp edges for breaking the rotor winding lead wire.
[0024] By forming a polished strip on the outside of the wire connection and creating two geometrically clear sharp edges on the adjacent side, the commutator can stably constrain the force at the winding end to the predetermined edge line. The fracture initiation position is clear, the required tensile tension is smaller, and the fluctuation is reduced. The fracture morphology is neat, and the wire breakage direction can be repeatedly achieved along the tangent of the outer periphery of the cylinder, while effectively reducing the risk of scratching the enameled coating. As a result, the wire breaking operation is more labor-saving and controllable, and the batch consistency and adaptability to the cycle time of automated production lines are significantly improved.
[0025] (III) Beneficial effects of this utility model: By rotating the bearing station, the commutator rotates around the axis to form an exposed annular processing area. Combined with a polishing wheel, radially controlled feed establishes a strip-like contact, allowing for sequential processing of the outer surfaces of all wire connections in a single clamping operation. The contact strip and unit pressure can be repeatedly set, significantly improving flatness consistency. Stable strip removal suppresses directional textures and local undulations, resulting in uniform outer surface quality. This reduces and stabilizes the tension required for wire breakage, making the breakage location more controllable and minimizing the risk of undesirable scratches on the enameled layer. Attached Figure Description
[0026] To more clearly illustrate the specific embodiments of this utility model or the technical solutions in the prior art, the drawings used in the description of the specific embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of this utility model. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.
[0027] Figure 1A three-dimensional structural schematic diagram of a commutator wire coupling polishing device provided in one embodiment of this utility model; Figure 2 A schematic diagram of the planar structure of a commutator wire coupling polishing device provided in one embodiment of this utility model; Figure 3 This is a three-dimensional structural diagram of the assembly and separation of the rotating bearing and the commutator according to one embodiment of the present invention; Figure 4 This is a three-dimensional structural diagram of a commutator provided in one embodiment of the present invention.
[0028] Icons: 1. Base; 2. Rotating bearing component; 21. Bearing shaft; 22. Rotating bearing station; 3. Polishing wheel assembly; 31. Polishing wheel; 32. Feeding mechanism; 4. Gripper-type pick-and-place unit; 41. Gripper; 42. Horizontal movement unit; 43. Vertical movement unit; 5. Conveying mechanism; 6. Dressing mechanism; 61. Dressing advance and retreat device; 62. Dressing end; 621. Wear-resistant plate; 10. Commutator; 101. Wire connection part; 102. Outer surface; 103. Sharp edge; 104. Cylinder. Detailed Implementation
[0029] To better understand the above-mentioned objectives, features, and advantages of this utility model, the present utility model will be further described in detail below with reference to the accompanying drawings and specific embodiments. Unless otherwise specified, the embodiments and features described in these embodiments can be combined with each other. Obviously, the described embodiments are only some, not all, of the embodiments of this utility model. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this utility model. Specific implementation examples: like Figures 1 to 3 As shown, this embodiment provides a polishing device for the wire connection part 101 of a commutator 10, including a main base 1, a rotating bearing 2, a polishing wheel assembly 3, a gripper-type pick-and-place unit 4, and a dressing mechanism 6 for the polishing wheel 31.
[0031] The base 1 is an integral support structure, consisting of an integrated support platform and four support legs. The support platform serves as the installation and positioning plane, and can be made of cast iron or welded steel plate. In this embodiment, a welded steel plate platform is used, and positioning holes, T-slots, and stops are provided on the platform surface to ensure the assembly posture and repeatability of subsequent units. The support legs are equipped with adjustable leveling components, which facilitates quick leveling, vibration control, and improved system rigidity after installation. The support platform has reserved mounting positions for the rotating bearing component 2, polishing wheel assembly 3, gripper-type pick-and-place unit 4, and dressing mechanism 6. The relevant holes are arranged with a common reference to ensure the long-term stability of the relative relationships of each unit.
[0032] Rotary bearing components 2 are erected side-by-side on the support platform, forming the first and second polishing stations. The bearing shaft 21 is vertically arranged and can be driven by a servo motor, a stepper motor, or a motor + reducer. In this embodiment, a stepper motor is used to achieve programmable speed and controllable start / stop. A rotary bearing station 22 is set at the top of the bearing shaft 21. The rotary bearing station 22 is an outwardly protruding insert structure with an inlet chamfer at the front end and an end face positioning shoulder at the rear. It achieves quick fitting and limiting based on the axial mounting hole. To prevent lifting under high load, an elastic clamp or conical friction anti-reverse mechanism can be configured between the insert and the workpiece end face. In this embodiment, an end face positioning shoulder is used in conjunction with an elastic clamping ring to ensure both loading and unloading efficiency and axial stability under polishing load. After the commutator 10 is fitted onto the rotating bearing station 22 with the axial mounting hole, it rotates around the bearing shaft 21. As a result, the outer side 102 of the wire connection part 101 forms a continuously exposed annular processing area in the circumferential direction, which facilitates the establishment of a contact band with a constant bandwidth.
[0033] The polishing wheel assembly 3 is positioned on the side of each rotating support 2, forming a "one station, one polishing wheel" structure. The polishing wheel 31 can be a blade-type polishing wheel 31 or a fiber composite wheel. In this embodiment, a blade-type polishing wheel 31 is used, which is formed by fixing several abrasive blades along the circumference of the wheel core. The end edges of the blades together form a polishing ring that contacts the outer surface 102 of the wire connection part 101. The feed mechanism 32 is used to advance and retreat the polishing wheel 31 radially towards or away from the rotating support station 22. The feed can be implemented as a ball screw slide, a guide rail + cylinder module, etc. In this embodiment, an electric ball screw slide is used to accurately set the contact bandwidth and unit pressure. The rotation direction of the polishing wheel 31 is set so that the tangential velocity component at the contact point points downward, so that a downward friction component is applied to the workpiece at the contact line during polishing, further pressing the workpiece against the rotating support station 22, and preventing lifting or loosening when the cutting load changes. The feed endpoint is constrained by both the stroke limit and the position detection to ensure that the polishing ring forms a stable strip-shaped contact within the annular processing area and does not cross over to the adjacent side.
[0034] The first and second polishing stations are arranged side by side on the base 1, with the bearing shafts 21 of the two stations set to rotate in opposite directions during polishing. Thus, the outer surface 102 of the wire connector 101 undergoes strip polishing in the first tangential direction at the first station, and then undergoes polishing in the opposite tangential direction at the second station, achieving a combination of facing and back-to-back effects. The fine directional textures and local steps generated by unidirectional polishing are cross-cut and smoothed in the second process, resulting in a smoother strip polished surface with clear and continuous sharp edges 103 on both sides. The two stations have independently set rotation speeds and feed rates, allowing for reuse of different specifications of commutators 10 and facilitating the "leveling-finishing" process arrangement within the production cycle.
[0035] A conveying mechanism 5 is installed on the base 1 along the direction of the two polishing stations. The conveying mechanism 5 is a continuously operating conveyor belt structure used to transport the commutator 10 between the stations and form a first loading / unloading position and a second loading / unloading position at the corresponding positions. The loading / unloading positions are determined by positioning blocks and stop cycles, so that the commutator 10 is in a uniform posture and uniform spacing on the belt surface waiting to be picked up and placed. The conveying mechanism 5 only undertakes the functions of transportation and temporary storage and does not participate in clamping.
[0036] Each polishing station's conveyor mechanism 5 has a gripper-type pick-and-place unit 4 on one side and a rotating support unit 2 on the other side, arranged opposite each other. The gripper-type pick-and-place unit 4 has a pick-and-place stroke that spans the conveyor mechanism 5. Its end gripper 41 can cross the conveyor belt from one side and reach the rotating support station 22 on the opposite side, realizing direct docking between the conveyor belt and the rotating support station 22, avoiding intermediate transfer and lateral dragging. The two sets of pick-and-place units serve the first and second polishing stations respectively. They have the same structure and action logic and can operate independently to match the cycle time of their respective stations.
[0037] A conveyor mechanism 5 is arranged on the base 1 along the direction of the two polishing stations. The conveyor mechanism 5 is a belt conveyor structure, i.e., a conveyor belt, used to move and buffer the commutator 10 between the two polishing stations, and to form the first and second loading and unloading positions corresponding to the two stations. The conveyor belt can be a belt type or a chain plate type. This embodiment uses a belt type conveyor belt. The belt surface is provided with positioning blocks and stop beats, so that the commutator 10 waits for clamping in a uniform posture at the designated position. The conveyor belt only undertakes the functions of transportation and temporary storage, and does not participate in clamping.
[0038] The gripper 41 of the gripper-type pick-and-place unit 4 spans above the conveyor belt. The gripper 41 has a self-centering structure, and its claw surface matches the outer circle of the commutator 10. After closing, it clamps the outer circle with a uniform radial force and restricts the end face sway. Its working stroke is always within the space above the belt surface and does not cross the conveyor belt to the other side. The pick-and-place unit also includes a combination of a horizontal moving unit 42 and a vertical moving unit 43 that drives the gripper 41: the horizontal moving unit 42 moves laterally along a guide rail perpendicular to the belt running direction; the vertical moving unit 43 inserts and picks up and down along a vertical direction in the same direction as the bearing shaft 21. The two units superimposed can realize a continuous action of "gripping from above - moving laterally to the work position - axially fitting - returning to above the belt".
[0039] During the loading process, the conveyor belt transports the commutator 10 and stops it at the corresponding loading / unloading position. The gripper 41 descends above the belt surface and self-centers to grip the outer circle, then lifts off the belt surface and moves laterally to the rotating bearing station 22 arranged on the same side as the conveyor belt. It then descends vertically to align with the protruding rod, places the commutator 10 into the rotating bearing station 22 through the axial mounting hole, releases the gripper, and returns to the belt surface to wait. The unloading process is the reverse: the gripper is lifted above the station, returns laterally to the loading / unloading position above the conveyor belt, descends back to the belt surface, and releases the gripper. The entire loading / unloading trajectory is completed above the conveyor belt, without crossing the belt to the other side, ensuring that the outer side 102 of the wire hook 101 does not contact the belt edge or other components, while simplifying protection and cycle control.
[0040] A dressing mechanism 6 is arranged on the back side of the working side of the polishing wheel 31, with its dressing end 62 in a radial position relative to the polishing ring. The mounting base where the dressing end 62 is located shares the same mounting reference surface and height reference as the polishing wheel assembly 3, so that the dressing end 62 is within the stroke coverage range of the feed mechanism 32 of the polishing wheel 31. When the polishing operation is completed or when required by the cycle, the polishing wheel 31 only needs to be retracted from the workpiece along the original radial direction by the feed mechanism 32 and then fed to the back side to establish controlled contact with the dressing end 62, so as to grind or dress the polishing ring without changing the clamps or realigning.
[0041] Preferably, the dressing mechanism 6 further includes a dressing advance / retreat device 61, which is configured to drive the dressing end 62 to move forward and backward along the direction pointing to the blade-type polishing wheel 31. The driving method can be an electric lead screw slide or a pneumatic linear module. In this embodiment, an electric lead screw slide is used. The movement direction of the dressing slide overlaps with the feed direction of the feed mechanism 32 of the polishing wheel assembly 3 and matches its stroke range. The parallel and collinear arrangement of the two allows dressing and polishing to share the same spatial coordinates and feed reference, and the dressing posture and polishing posture are naturally consistent. The dressing slide is guided by a linear guide rail, and the end is equipped with a stroke limit and origin detection. During dressing, the polishing wheel 31 retracts to the safe position, and the dressing slide is forward to a predetermined position to establish constant pressure contact. After dressing is completed, both axes retract to avoid interference with the workpiece and the conveying path.
[0042] The dressing end 62 is equipped with a replaceable wear-resistant plate 621 for direct contact with the polishing ring for dressing. The wear-resistant plate 621 is mounted on a detachable clamping seat, with quick locking and positioning pin double limiting, which facilitates rapid replacement after wear and maintains the consistency of dressing geometry; its working surface is a flat surface or an equivalent micro-arc surface, which can perform surface contact or line contact dressing of uneven wear on the end edge of the polishing ring, eliminate central depression, unilateral wear and local warping, and restore the ring's roundness, width and end edge straightness to the set state, thereby maintaining the stability of the pressure distribution and tangential speed distribution of the polishing contact band, and ensuring the consistency of the flatness of the strip polishing surface and the geometric clarity of the two sharp edges 103 during long-term operation.
[0043] like Figure 4 As shown, the commutator 10, after polishing, has a basic body consisting of a cylindrical body 104. Multiple wire connection parts 101 are spaced apart along the circumferential direction at the opening edge of the cylindrical body. These wire connection parts 101 are evenly spaced on the circumference and have a basically consistent axial height. The outer surface 102 of each wire connection part 101 is polished in a strip-like contact process to form a strip-like polished surface. This strip-like polished surface extends along the length of the wire connection part 101, with uniform bandwidth, fine surface texture, and a continuous contact trajectory tangential to the circumference, ensuring that the outer surface 102 of each unit has a consistent morphology on the circumference.
[0044] The polished strip intersects with the adjacent sides of the wire connection portion 101 on both sides, forming two geometrically clear sharp edges 103 at the intersection. The two sharp edges 103 extend substantially continuously from the end edge of the wire connection portion 101 to the root, with a straight line and a clear boundary change. They are used as the breakage boundary of the rotor winding lead at the end of the winding, so that the lead breaks stably at the predetermined edge when pulled along the tangential direction of the outer periphery of the cylinder 104.
[0045] The polishing process of the wire connection part 101 of the commutator 10 is as follows: First, the conveying mechanism 5 transports the commutator 10 to the corresponding loading and unloading positions. The gripper-type pick-and-place unit 4 clamps the commutator 10 above the belt surface and fits it into the rotating bearing position 22 of the first polishing station through the axial mounting hole. The bearing shaft 21 starts, and the polishing wheel assembly 3 feeds radially to establish a belt-like contact between the polishing ring and the exposed annular processing area, completing the belt-like polishing in the first direction. Subsequently, the gripper-type pick-and-place unit 4 removes the commutator 10 from the first polishing station and places it back into the conveying mechanism 5. After being transported to the second loading and unloading position, it is clamped again in the second polishing station. Under the condition of the bearing shaft 21 turning in the opposite direction, the polishing wheel assembly 3 repeatedly feeds and makes belt-like contact, completing the polishing in the opposite tangential direction to the previous process, realizing the facing-back combination leveling. Afterward, the polishing wheel 31 briefly contacts the dressing end 62 of the dressing mechanism 6 on the back side to complete the online grinding and restore the geometry of the polishing ring for the next cycle. Finally, the gripper-type pick-and-place unit 4 removes the polished commutator 10 from the second polishing station and returns it to the conveyor mechanism 5, resulting in a product with a strip-shaped polished surface on the outer side 102 and clear and continuous sharp edges 103 on both sides. The entire process can process all wire connection parts 101 in sequence with one clamping sequence, ensuring the flatness and consistency of sharp edges 103.
[0046] The above are preferred embodiments of this application, and are not intended to limit the scope of protection of this application. Therefore, all equivalent changes made to the structure, shape and principle of this application should be covered within the scope of protection of this application.
Claims
1. A polishing device for commutator wire coupling, characterized in that, include Base; A rotating bearing component is erected on the base, including a rotatable bearing shaft and a rotating bearing station located at the top of the bearing shaft. The commutator to be polished is fitted onto the rotating bearing station with its axial mounting hole and rotates around the bearing shaft, so that the outer side of the wire connection part is in the exposed annular processing area. A polishing wheel assembly is disposed on one side of the rotating support member, including a polishing wheel and a feeding mechanism for moving the polishing wheel forward and backward along a radial direction pointing towards or away from the rotating support position. The circumferential outer edge of the polishing wheel forms a polishing ring that contacts the outer surface of the wire connection part, so that when the commutator rotates, the outer surfaces of multiple wire connection parts sequentially contact the polishing ring to complete the polishing.
2. The commutator wire coupling polishing equipment according to claim 1, characterized in that, The base is provided with a first polishing station and a second polishing station side by side. Each polishing station includes the rotating support component and a polishing wheel assembly correspondingly disposed on one side of the rotating support component.
3. The commutator wire coupling polishing equipment according to claim 2, characterized in that, The bearing shafts of the first polishing station and the second polishing station rotate in opposite directions during polishing.
4. The commutator wire coupling polishing equipment according to claim 3, characterized in that, The base is provided with a gripper-type pick-and-place unit, which is configured to pick up and place the commutator from the loading and unloading station, and to fit the commutator into the rotating bearing station with its axial mounting hole, so as to realize the loading and unloading of the polishing station.
5. The commutator wire coupling polishing equipment according to claim 4, characterized in that, A conveying mechanism extends along the first and second polishing stations on the base. A first loading / unloading position and a second loading / unloading position are respectively provided on the conveying mechanism at positions corresponding to the first and second polishing stations. A corresponding gripper-type pick-and-place unit is provided at each polishing station. The gripper-type pick-and-place unit is located on one side of the conveying mechanism, and the rotating bearing is located on the opposite side of the conveying mechanism. The gripper-type pick-and-place unit has a pick-and-place stroke that spans the conveying mechanism, and is used to complete loading or unloading between the conveying mechanism and the rotating bearing station when the commutator is conveyed to the corresponding loading / unloading position.
6. The commutator wire coupling polishing device according to any one of claims 1 to 5, characterized in that, The polishing wheel is a blade-type polishing wheel, which is formed by fixing several abrasive blades along the circumference of the wheel core. The end edges of the blades together form a polishing ring that contacts the outer side of the wire connection part.
7. The commutator wire coupling polishing equipment according to claim 6, characterized in that, It also includes a dressing mechanism that acts on the polishing wheel, which is located on the back side of the working side of the polishing wheel. The dressing end of the dressing mechanism is located within the stroke range of the feed mechanism to grind or dress the polishing ring.
8. The commutator wire coupling polishing equipment according to claim 7, characterized in that, The dressing mechanism includes a dressing advance and retreat device, which is configured to drive the dressing end to move forward and backward in the direction pointing towards the blade-type polishing wheel; the feed direction of the dressing advance and retreat device overlaps with the feed direction of the feed mechanism of the polishing wheel assembly and matches its stroke range.
9. The commutator wire coupling polishing device according to claim 7, characterized in that, The dressing mechanism has a replaceable wear-resistant plate on its dressing end, which is used to contact the polishing ring for dressing.