Ultra-pure water toc deep removal treatment system
Patent Information
- Application Number
- CN202522163015.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-10-13
- Publication Date
- 2026-09-29
- Estimated Expiration
- 2035-10-13
AI Technical Summary
[0002]目前对于超纯水处理工艺包括有预处理、反渗透、EDI、抛光树脂四大部分，反渗透的RO膜对小分子有机物截留率仅 50%~80%，EDI 与抛光树脂对有机物几乎无去除能力，导致最终产水 TOC 超标
[0015]本实用新型的有益效果是：利用多介质过滤器、活性炭过滤器以及保安过滤器的配合，进行预处理，解决了大颗粒、余氯、有机物” 基础污染，保护核心膜元件；接着，通过反渗透组件、第一紫外 TOC 除碳仪、第一0.22μm微滤器的配合，进行大幅脱盐并精准去除小分子有机物，适配深度脱盐需求；再利用EDI装置、氮封水箱、抛光混床、紫外灯杀菌装置的撇和，实现离子与 TOC 的极致控制，同时规避二次污染、保障无菌性，最终产出符合高端需求的超纯水，分层净化，实现水质逐步升级，且本申请的第一TOC除碳仪设置在EDI和抛光混床之前，为 EDI 和抛光混床 “减负”，保障超纯水纯度。
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Figure CN224812399U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to an ultrapure water TOC deep removal treatment system. Background Technology
[0002] Currently, ultrapure water treatment processes consist of four main parts: pretreatment, reverse osmosis, EDI, and polishing resin. Reverse osmosis (RO) membranes only retain 50%–80% of small-molecule organic matter, while EDI and polishing resin have almost no removal capacity for organic matter, leading to excessive TOC levels in the final product water. Furthermore, while the combination of pretreatment and single-stage reverse osmosis can remove most impurities, its control over trace salts, small-molecule organic matter, and residual chlorine is limited, directly impacting the lifespan of subsequent equipment and the purity of the product water. Utility Model Content
[0003] To overcome the above-mentioned shortcomings, the purpose of this utility model is to provide an ultrapure water TOC deep removal treatment system for removing total organic carbon (TOC) and ensuring the purity of the produced water.
[0004] To achieve the above objectives, the technical solution adopted by this utility model is: an ultrapure water TOC deep removal treatment system, comprising:
[0005] Raw water tank, used to store raw water to be treated;
[0006] A filter assembly is connected to a raw water pump, and the filter assembly includes a multi-media filter, an activated carbon filter, and a security filter connected in sequence.
[0007] The outlet of the security filter is connected to the inlet of the reverse osmosis assembly via a primary high-pressure pump;
[0008] A pure water tank, the inlet of which is connected to the outlet of the reverse osmosis component, is used to store primary pure water that has been filtered and treated by reverse osmosis.
[0009] The first TOC decarbonization device has its inlet connected to the outlet of the pure water tank.
[0010] The first 0.22μm microfilter is connected to the outlet of the first TOC decarbonization instrument via an EDI booster pump;
[0011] The EDI device has its inlet connected to the outlet of a first 0.22μm microfilter for deep desalination, purifying primary pure water into ultrapure water.
[0012] A nitrogen-sealed water tank, the inlet of which is connected to the outlet of the EDI device;
[0013] The polishing mixed bed has its outlet connected to the inlet of the nitrogen-sealed water tank via a pure water pump.
[0014] An ultraviolet lamp sterilization device is connected to the outlet of the polishing mixing bed.
[0015] The beneficial effects of this utility model are as follows: Pretreatment is performed using a combination of multi-media filters, activated carbon filters, and security filters, solving the basic pollution problems of large particles, residual chlorine, and organic matter, and protecting the core membrane elements. Then, through the combination of reverse osmosis components, a first ultraviolet TOC decarbonizer, and a first 0.22μm microfilter, significant desalination and precise removal of small molecule organic matter are achieved, meeting the requirements for deep desalination. Furthermore, the use of an EDI device, a nitrogen-sealed water tank, a polishing mixed bed, and an ultraviolet sterilization device achieves ultimate control of ions and TOC, while avoiding secondary pollution and ensuring sterility. Ultimately, ultrapure water meeting high-end requirements is produced through stratified purification, achieving gradual upgrades in water quality. Moreover, the first TOC decarbonizer in this application is placed before the EDI and polishing mixed bed, reducing the burden on the EDI and polishing mixed bed and ensuring the purity of the ultrapure water.
[0016] Preferably, it also includes a second TOC decarbonization device, which is installed between the polishing mixing bed and the ultraviolet lamp sterilization device.
[0017] Preferably, the reverse osmosis assembly employs a two-stage reverse osmosis system, comprising a first-stage reverse osmosis system, an intermediate water tank, a second-stage high-pressure pump, and a second-stage reverse osmosis system connected in sequence. Both the first-stage and second-stage reverse osmosis systems are connected to an RO cleaning system. This application utilizes a progressive desalination and purification method, significantly improving the purity of the produced water, reducing pollutant residues, and providing high-quality feed water for subsequent advanced treatment units (such as EDI and polishing mixed bed), ultimately achieving a balance between process stability, water quality compliance, and economic efficiency.
[0018] Preferably, the number of membrane elements in the secondary reverse osmosis is 1 / 3 to 1 / 2 of the number of membrane elements in the primary reverse osmosis. In this application, the primary reverse osmosis membrane elements perform high-load coarse desalination, requiring a large number of membrane elements to resist fouling and maintain flux; while the secondary RO, with its "low-load fine desalination," only requires a small number of membrane elements to meet the needs.
[0019] Preferably, the membrane elements for the first-stage and second-stage reverse osmosis are any one of BW30-400IG, BW30FR-400 / 34, TML20N-400, TFC8040-FR-400, and BW30-440i.
[0020] Preferably, it further includes a second 0.22μm microfilter connected to the outlet of the ultraviolet lamp sterilization.
[0021] Preferably, the polishing mixing bed is connected to at least two polishing resin tanks, and the at least two polishing resin tanks are arranged in parallel. Attached Figure Description
[0022] Figure 1 This is a schematic diagram of this embodiment.
[0023] In the attached diagram: 1. Raw water tank; 2. Multi-media filter; 3. Activated carbon filter; 4. Security filter; 5. First-stage high-pressure pump; 6. First-stage reverse osmosis; 7. Intermediate water tank; 8. Second-stage high-pressure pump; 9. Second-stage reverse osmosis; 10. Pure water tank; 11. First TOC decarbonization device; 12. First 0.22μm microfilter; 13. EDI booster pump; 14. EDI device; 15. Nitrogen-sealed water tank; 16. Polishing mixed bed; 17. Second TOC decarbonization device; 18. Ultraviolet sterilization device; 19. Second 0.22μm microfilter; 20. Raw water pump; 21. Pure water pump; 22. RO cleaning system. Detailed Implementation
[0024] The preferred embodiments of the present invention will now be described in detail with reference to the accompanying drawings, so that the advantages and features of the present invention can be more easily understood by those skilled in the art, thereby making a clearer and more definite definition of the scope of protection of the present invention.
[0025] See Figure 1 As shown, this embodiment discloses an ultrapure water TOC deep removal treatment system, including:
[0026] Raw water tank 1 is used to store raw water to be treated;
[0027] The filter assembly is connected to the raw water pump 20. The filter assembly includes a multi-media filter 2, an activated carbon filter 3, and a security filter 4 connected in sequence.
[0028] The outlet of the security filter 4 of the reverse osmosis module is connected to the inlet of the reverse osmosis module via a first-stage high-pressure pump 5;
[0029] Pure water tank 10, the inlet of pure water tank 10 is connected to the outlet of reverse osmosis component, and is used to store primary pure water that has been filtered and treated by reverse osmosis;
[0030] The first TOC decarbonation device 11 has its inlet connected to the outlet of the pure water tank 10. It is used to decompose small molecule organic matter and colloidal organic matter in the water into inorganic products such as CO2 and H2O, thereby reducing the TOC content of the produced water.
[0031] The first 0.22μm microfilter 12 is connected to the outlet of the first TOC decarbonizer 11 via an EDI booster pump 13; it can effectively trap microorganisms, organic oxidation residues and tiny particles that may remain after ultraviolet TOC decarbonization.
[0032] EDI device 14, the inlet of EDI device 14 is connected to the outlet of the first 0.22μm microfilter 12 for deep desalination, purifying primary pure water into ultrapure water;
[0033] Nitrogen-sealed water tank 15, the inlet of which is connected to the outlet of EDI device 14; although the ultrapure water produced by EDI has extremely high purity (almost no impurities), it is also very susceptible to external contamination, especially when in contact with air, it will absorb CO2 (converted into HCO3⁻, CO3²⁻), dust particles and microorganisms from the air, causing the resistivity to drop rapidly (e.g. from 18 MΩ・cm to below 10 MΩ・cm). Nitrogen-sealed water tank 15 can isolate air: high-purity nitrogen (an inert gas that does not react with water) is filled into the top space of the tank to form a "nitrogen protective layer" to prevent air from entering the tank and contacting the ultrapure water, and can also maintain stable pressure;
[0034] The outlet of the polishing mixed bed 16 and the nitrogen-sealed water tank 15 is connected to the inlet of the polishing mixed bed 16 through a pure water pump 21; this is used to remove trace ions remaining from EDI in the polishing mixed bed 16.
[0035] The second TOC decarbonizer 17 is located at the outlet of the polishing mixed bed 16. Due to the slow release of organic matter adsorbed by the resin or the slight air infiltration (introducing CO2 or small molecule organic matter) from the nitrogen-sealed water tank 15, the TOC in the produced water may rebound slightly. The second TOC decarbonizer 17 can accurately intercept these "trace TOCs" and reduce them to the lower limit of ppb or even ppt, thus achieving "ultra-pure water TOC ultimate control".
[0036] The ultraviolet (UV) sterilization device 18 is connected to the outlet of the polishing mixed bed 16. Although the first 0.22μm microfilter 12 has intercepted most bacteria, "filterable microorganisms" or a small number of microorganisms that may grow due to minor contamination in the nitrogen-sealed water tank 15 and pipelines may still exist in the ultrapure water system. The UVC used in this application can penetrate the cell membrane of microorganisms, preventing them from replicating and multiplying, and the sterilization rate can reach over 99.99%.
[0037] The reverse osmosis assembly in this embodiment employs a two-stage reverse osmosis system, comprising a first-stage reverse osmosis unit 6, an intermediate water tank 7, a second-stage high-pressure pump 8, and a second-stage reverse osmosis unit 9 connected in sequence. Both the first-stage and second-stage reverse osmosis units 6 and 9 are connected to an RO cleaning system 22. This application utilizes a progressive desalination and purification method, significantly improving the purity of the produced water, reducing contaminant residue, and providing high-quality feed water for subsequent advanced treatment units. The RO cleaning system 22 can also backwash the RO membrane when not in use.
[0038] In this embodiment, the number of membrane elements in the secondary reverse osmosis stage 9 is 1 / 3 to 1 / 2 of the number of membrane elements in the primary reverse osmosis stage 6. The membrane elements in the primary reverse osmosis stage 6 can be any one of Dow BW30-400IG, DuPont BW30FR-400 / 34, Toray TML20N-400, Koch TFC8040-FR-400, or Dow BW30-440i. Similarly, the membrane elements in the secondary reverse osmosis stage 9 can also be any one of Dow BW30-400IG, DuPont BW30FR-400 / 34, Toray TML20N-400, Koch TFC8040-FR-400, or Dow BW30-440i.
[0039] The Dow BW30-400IG membrane element has a desalination rate of up to 99.5% and a water production capacity of 40 m³ / d.
[0040] DuPont BW30FR-400 / 34 is named for its effective membrane area of 37 square meters, stable desalination rate of up to 99.5%, and minimum desalination rate of no less than 99.0%, which is comparable to the desalination rate of Dow BW30-400IG.
[0041] Toray TML20N-400: Effective membrane area is 400 square feet, water production capacity is 10200 GPD, and desalination rate is 99.7%, which is higher than that of Dow BW30-400IG;
[0042] Koch TFC8040-FR-400: Utilizing proprietary antifouling membrane technology, it exhibits excellent antifouling, fouling resistance, and washability in applications where raw water is rich in microorganisms and organic contaminants. It operates at low pressure, offers good desalination performance, high permeate flow, and excellent desalination rate and operational stability. The cleaning pH range is 1-13, ensuring consistently stable performance even under harsh operating conditions.
[0043] Dow BW30-440i: Compared with BW30-400IG, under the same operating pressure and high desalination rate, it produces 10% more water than BW30-400 element, with a permeate flow rate of 43 m³ / d and a stable desalination rate of 99.5%.
[0044] This embodiment also includes a second 0.22μm microfilter 19, which is connected to the outlet of the ultraviolet lamp sterilization device 18. The second 0.22μm microfilter 19, as the final physical barrier, is located after ultraviolet sterilization and is used to intercept tiny impurities that may be generated in the preceding steps, ensuring that the final water product is free of particles and microbial debris.
[0045] In some working conditions, a 150L polishing mixing bed 16 is generally used, but the amount of polishing resin is insufficient. In this embodiment, the polishing mixing bed 16 is connected to at least two polishing resin tanks, and the at least two polishing resin tanks are set in parallel. The amount of polishing resin in each polishing mixing bed 16 is 150L.
[0046] In this embodiment, both the first TOC decarbonizer 11 and the second TOC decarbonizer 17 employ ultraviolet (UV) light. The oxidation efficiency of the UV decarbonizer relies on the synergistic effect of two types of UV light: 254nm and 185nm. The main function of 254nm UV light is to activate oxygen or auxiliary oxidants in the water and excite organic pollutant molecules in the water, causing their chemical bonds to break, preparing for further oxidation. Simultaneously, 254nm UV light can also directly kill some microorganisms, reducing the interference of biological organic carbon on detection. The core function of 185nm UV light is to directly photolyze H2O, generating hydroxyl radicals. Because hydroxyl radicals are highly reactive substances with extremely strong oxidizing power, they can non-selectively and completely oxidize and decompose organic carbon compounds in water into CO2 and water (H2O). Compared to using a single wavelength of UV light, the combined wavelength design achieves efficient and complete oxidation of organic carbon in water.
[0047] The above embodiments are only for illustrating the technical concept and features of this utility model. Their purpose is to enable those skilled in the art to understand the content of this utility model and implement it. They cannot be used to limit the protection scope of this utility model. All equivalent changes or modifications made in accordance with the spirit and essence of this utility model should be covered within the protection scope of this utility model.
Claims
1. A TOC deep removal treatment system for ultrapure water, characterized in that: include: Raw water tank, used to store raw water to be treated; A filter assembly is connected to a raw water pump, and the filter assembly includes a multi-media filter, an activated carbon filter, and a security filter connected in sequence. The outlet of the security filter is connected to the inlet of the reverse osmosis assembly via a primary high-pressure pump; A pure water tank, the inlet of which is connected to the outlet of the reverse osmosis component, is used to store primary pure water that has been filtered and treated by reverse osmosis. The first TOC decarbonization device has its inlet connected to the outlet of the pure water tank. The first 0.22μm microfilter is connected to the outlet of the first TOC decarbonization instrument via an EDI booster pump; The EDI device has its inlet connected to the outlet of a first 0.22μm microfilter; A nitrogen-sealed water tank, the inlet of which is connected to the outlet of the EDI device; The polishing mixed bed has its outlet connected to the inlet of the nitrogen-sealed water tank via a pure water pump. An ultraviolet lamp sterilization device is connected to the outlet of the polishing mixing bed.
2. The ultrapure water TOC deep removal treatment system according to claim 1, characterized in that: It also includes a second TOC decarbonization device, which is installed between the polishing mixing bed and the ultraviolet lamp sterilization device.
3. The ultrapure water TOC deep removal treatment system according to claim 1, characterized in that: The reverse osmosis assembly adopts a two-stage reverse osmosis system, including a first-stage reverse osmosis system, an intermediate water tank, a second-stage high-pressure pump, and a second-stage reverse osmosis system connected in sequence. Both the first-stage and second-stage reverse osmosis systems are connected to an RO cleaning system.
4. The ultrapure water TOC deep removal treatment system according to claim 3, characterized in that: The number of membrane elements in the secondary reverse osmosis is 1 / 3 to 1 / 2 of the number of membrane elements in the primary reverse osmosis.
5. The ultrapure water TOC deep removal treatment system according to claim 3, characterized in that: The membrane elements for the first-stage and second-stage reverse osmosis are any one of BW30-400IG, BW30FR-400 / 34, TML20N-400, TFC8040-FR-400, and BW30-440i.
6. The ultrapure water TOC deep removal treatment system according to claim 1, characterized in that: It also includes a second 0.22μm microfilter, which is connected to the outlet of the ultraviolet lamp sterilization device.
7. The ultrapure water TOC deep removal treatment system according to claim 1, characterized in that: The polishing mixing bed is connected to at least two polishing resin tanks, and the at least two polishing resin tanks are arranged in parallel.