Low-reflective coated glass

Abstract

The utility model discloses a kind of low reflection coated glass, including glass substrate, the side of glass substrate is sequentially provided with first layer film, second layer film, third layer film, fourth layer film, fifth layer film, sixth layer film, seventh layer film, eighth layer film, ninth layer film, tenth layer film, eleventh layer film and twelfth layer film from inside to outside;First layer film, third layer film and twelfth layer film are silicon nitride layer, second layer film, seventh layer film and tenth layer film are nickel-chromium alloy plating, fourth layer film and eleventh layer film are zinc-aluminum oxide layer, fifth layer film and ninth layer film are silver plating, sixth layer film is copper plating, eighth layer film is zinc-tin oxide layer.A layer of NiCr film layer is increased in first layer matrix layer and third layer dielectric layer, the purpose is to reduce reflection and reduce transmission, while improving the performance parameter of glass, it has higher reflectivity to near infrared, it has very low transmittance to ultraviolet, it has better heat preservation effect in room.

Description

Technical Field

[0001] This utility model relates to the field of glass technology, and in particular to a low-reflection coated glass. Background Technology

[0002] With the development of technology and the demands of specific markets, there is a need for products with low reflectivity, low transmittance, and high performance parameters for glass in order to reduce light pollution. Current film structures are insufficient to meet market demands. Currently, LOW-E glass is produced by depositing metal elements onto glass using magnetron sputtering in a high-vacuum environment, resulting in ten film layers. These include a glass substrate, a first dielectric layer, a first seed layer, a first silver layer, a copper layer, a silver protective layer, a second seed layer, a second silver layer, a silver protective layer, a third seed layer, and a top protective layer. Each layer is formed using magnetron sputtering.

[0003] This structural design, while producing double-silver products that meet the requirements of low reflection and low transmittance, results in poor performance, with a high U-value and shading coefficient, and poor thermal insulation. For example, patent CN118206296A discloses a low-reflection, medium-low transmittance gray double-silver low-emissivity coated glass and insulated glass. The coated glass, from bottom to top, comprises: a glass substrate, an absorbing interference layer, a first dielectric layer, a first silver layer, a first silver protective layer, a second dielectric layer, a second silver layer, a second silver protective layer, a third dielectric layer, and an outer protective layer. The absorbing interference layer comprises a first interference layer, a first absorption layer, and a second interference layer stacked sequentially, or the absorbing interference layer comprises a first interference layer, a first absorption layer, a second interference layer, a second absorption layer, and a third interference layer stacked sequentially. Utility Model Content

[0004] To address the shortcomings of existing technologies, this invention provides a low-reflection coated glass that, while meeting the requirements for low reflection, also exhibits good heat insulation and a low shading coefficient.

[0005] To solve the above-mentioned technical problems, the technical solution adopted by this utility model is as follows:

[0006] The low-reflection coated glass includes a glass substrate. From the inside out, one side of the glass substrate is provided with a first layer, a second layer, a third layer, a fourth layer, a fifth layer, a sixth layer, a seventh layer, an eighth layer, a ninth layer, a tenth layer, an eleventh layer, and a twelfth layer. The first, third, and twelfth layers are all silicon nitride layers; the second, seventh, and tenth layers are all nickel-chromium alloy plating layers; the fourth and eleventh layers are zinc-aluminum oxide layers; the fifth and ninth layers are both silver plating layers; the sixth layer is a copper plating layer; and the eighth layer is a zinc-tin oxide layer.

[0007] Preferred or further:

[0008] The thickness of the first layer is 25-30 nm, the thickness of the third layer is 20-35 nm, and the thickness of the twelfth layer is 35-50 nm.

[0009] The thickness of the second layer is 15-20 nm, the thickness of the seventh layer is 11-13 nm, and the thickness of the tenth layer is 10-25 nm.

[0010] The thickness of the fourth layer is 6-10 nm, and the thickness of the eleventh layer is 5-9 nm.

[0011] The thickness of the fifth layer is 10-18 nm, and the thickness of the ninth layer is 25-30 nm.

[0012] The thickness of the sixth layer is in the range of 10-15 nm.

[0013] The thickness of the eighth layer is in the range of 50-100 nm.

[0014] Compared with the prior art, this utility model has the following advantages:

[0015] The low-reflection coated glass has a reasonable film layer design. An additional NiCr film layer is added between the first matrix layer and the third dielectric layer. Its function is to reduce reflection and transmittance, while improving the performance parameters of the glass. It has a high reflectivity for near-infrared rays and a very low transmittance for ultraviolet rays. Compared with the original film layer structure, it has a lower surface resistance and better heat preservation effect indoors. Attached Figure Description

[0016] The following is a brief explanation of the contents of each of the accompanying drawings and the markings in the drawings:

[0017] Figure 1 This is a schematic diagram of the glass film structure of this utility model. Detailed Implementation

[0018] The specific embodiments of this utility model will be further described in detail below with reference to the accompanying drawings and through the description of the examples.

[0019] like Figure 1 As shown, the low-reflection coated glass includes a glass substrate, and a first layer, a second layer, a third layer, a fourth layer, a fifth layer, a sixth layer, a seventh layer, an eighth layer, a ninth layer, a tenth layer, an eleventh layer, and a twelfth layer are sequentially disposed on one side of the glass substrate from the inside out.

[0020] The first, third, and twelfth layers are all silicon nitride layers; the second, seventh, and tenth layers are all nickel-chromium alloy plating layers; the fourth and eleventh layers are zinc-aluminum oxide layers; the fifth and ninth layers are both silver plating layers; the sixth layer is a copper plating layer; and the eighth layer is a zinc-tin oxide layer.

[0021] In this invention, a NiCr film layer is added between the first film matrix layer and the third film medium layer. Its function is to reduce reflection and transmittance, while improving the performance parameters of the glass. It has a high reflectivity for near-infrared rays and a very low transmittance for ultraviolet rays. Compared with the original film structure, it has a lower surface resistance and better heat preservation effect indoors.

[0022] Further:

[0023] The thickness of the first film ranges from 25 to 30 nm, the thickness of the third film ranges from 20 to 35 nm, and the thickness of the twelfth film ranges from 35 to 50 nm.

[0024] The thickness of the second film ranges from 15 to 20 nm, the thickness of the seventh film ranges from 11 to 13 nm, and the thickness of the tenth film ranges from 10 to 25 nm.

[0025] The thickness of the fourth layer is 6-10 nm, and the thickness of the eleventh layer is 5-9 nm.

[0026] The thickness of the fifth layer is 10-18 nm, and the thickness of the ninth layer is 25-30 nm.

[0027] The thickness of the sixth layer is 10-15 nm.

[0028] The thickness of the eighth layer is 50-100 nm.

[0029] The thickness of each of the above-mentioned film layers is set reasonably, which improves the performance parameters of the glass, has a high reflectivity for near-infrared rays, a very low transmittance for ultraviolet rays, and a better heat preservation effect indoors.

[0030] Example 1:

[0031] Glass conveying speed V = 450 cm / min

[0032] The first film is SiN; a SiN crystalline film is generated using Ar gas as the sputtering gas and N2 gas as the reactant gas to serve as the substrate dielectric layer; (film thickness 26-27 nm).

[0033] The second film is NiCr; Ar gas is used for sputtering; (film thickness 15-15.5 nm)

[0034] The third film is SiN; a SiN crystalline film is generated using Ar gas as the sputtering gas and N2 gas as the reactant gas to serve as the substrate dielectric layer; (film thickness 21-22 nm).

[0035] The fourth layer is ZnAlO; a ZnAlO crystalline film is generated using Ar gas as the sputtering gas and O2 gas as the reactant gas to serve as the refractive layer; (film thickness 7-8 nm).

[0036] The fifth film is Ag; Ar gas is used as the sputtering gas, with an Ar gas dosage of 1000; (film thickness 11-11.5 nm).

[0037] The sixth film is Cu; Ar gas is used as the sputtering gas (film thickness 11.5-12 nm).

[0038] The seventh film is NiCr; Ar gas is used for sputtering; (film thickness 11.8-12.5 nm)

[0039] The eighth layer is ZnSnO; a ZnSnO crystalline film is generated as a refractive layer using Ar gas as the sputtering gas and O2 gas as the reactant gas; (film thickness 85-90nm).

[0040] The ninth film is Ag; Ar gas is used for sputtering; (film thickness 27-28 nm)

[0041] The tenth film is NiCr; Ar gas is used for sputtering; (film thickness 21-22 nm)

[0042] The eleventh layer is ZnAlO; a ZnAlO crystalline film is generated as a refractive layer using Ar gas as the sputtering gas and O2 gas as the reactant gas; (film thickness 6-7 nm).

[0043] The twelfth layer is SiN; an outermost dielectric layer is formed by sputtering Ar gas and reacting N2 gas to create a SiN crystalline film (film thickness 36-37nm).

[0044] Example 2:

[0045] Glass conveying speed V = 450 cm / min

[0046] The first film is SiN; a SiN crystalline film is generated using Ar gas as the sputtering gas and N2 gas as the reactant gas to serve as the substrate dielectric layer; (film thickness 27-29 nm).

[0047] The second film is NiCr; Ar gas is used for sputtering (film thickness 18-19 nm).

[0048] The third film is SiN; a SiN crystalline film is generated using Ar gas as the sputtering gas and N2 gas as the reactant gas to serve as the substrate dielectric layer; (film thickness 30-31nm).

[0049] The fourth layer is ZnAlO; a ZnAlO crystalline film is generated using Ar gas as the sputtering gas and O2 gas as the reactant gas to serve as the refractive layer; (film thickness 7-8 nm).

[0050] The fifth film is Ag; Ar gas is used as the sputtering gas, with an Ar gas dosage of 1000; (film thickness 15-16 nm).

[0051] The sixth film is made of Cu; Ar gas is used as the sputtering gas (film thickness 12-13 nm).

[0052] The seventh film is NiCr; Ar gas is used for sputtering; (film thickness 10-10.8 nm)

[0053] The eighth film is ZnSnO; a ZnSnO crystalline film is generated as a refractive layer using Ar gas as the sputtering gas and O2 gas as the reactant gas; (film thickness 70-72nm).

[0054] The ninth film is Ag; Ar gas is used for sputtering; (film thickness 28-29 nm)

[0055] The tenth film is NiCr; Ar gas is used for sputtering; (film thickness 10.5-11.5 nm)

[0056] The eleventh layer is ZnAlO; a ZnAlO crystalline film is generated as a refractive layer using Ar gas as the sputtering gas and O2 gas as the reactant gas; (film thickness 7-8 nm).

[0057] The twelfth layer is SiN; an outermost dielectric layer is formed by sputtering Ar gas and reacting N2 gas to create a SiN crystalline film (film thickness 45-47nm).

[0058] Table 1: Comparison of glass performance parameters between the two embodiments;

[0059] Example 1 44 12 7 1.67 0.33 Example 2 41 10 7 1.66 0.31

[0060] Examples of existing technologies:

[0061] Glass conveying speed V = 450 cm / min

[0062] The first film is SiN (film thickness 58-60nm).

[0063] The second film is ZnAlO (film thickness 7-9 nm).

[0064] The third film is Ag (film thickness 15-16 nm).

[0065] The fourth layer is Cu (film thickness 12-13 nm).

[0066] The fifth film is NiCr (film thickness 10-10.5 nm).

[0067] The sixth layer is ZnSnO (film thickness 70-72 nm).

[0068] The seventh layer is Ag (film thickness 28.5-29 nm).

[0069] The eighth film is NiCr (film thickness 10.5-11 nm).

[0070] The ninth layer is ZnAlO (film thickness 7-8 nm).

[0071] The tenth layer is SiN (film thickness 45-47nm).

[0072] This structural design produces double-silver products that, while meeting the requirements for low reflection and low transmittance, have poor performance, with a high U-value and shading coefficient, and poor heat insulation, failing to meet customer requirements.

[0073] Table 2: Existing glass performance parameters;

[0074] Example 1 43 13 7 1.74 0.38

[0075] The above description is only a preferred embodiment of the present utility model. The above technical features can be arbitrarily combined to form multiple embodiments of the present utility model.

[0076] The present invention has been described above with reference to the accompanying drawings. Obviously, the specific implementation of the present invention is not limited to the above-described manner. Any non-substantial improvements made using the concept and technical solution of the present invention, or the direct application of the concept and technical solution of the present invention to other situations without modification, are all within the protection scope of the present invention.

Claims

1. A low-reflection coated glass, comprising a glass substrate, characterized in that: One side of the glass substrate is provided with a first film, a second film, a third film, a fourth film, a fifth film, a sixth film, a seventh film, an eighth film, a ninth film, a tenth film, an eleventh film, and a twelfth film in sequence from the inside out; the first film, the third film, and the twelfth film are all silicon nitride layers, the second film, the seventh film, and the tenth film are all nickel-chromium alloy plating layers, the fourth film and the eleventh film are zinc-aluminum oxide layers, the fifth film and the ninth film are both silver plating layers, the sixth film is a copper plating layer, and the eighth film is a zinc-tin oxide layer; The thickness of the first film ranges from 25 to 30 nm, the thickness of the third film ranges from 20 to 35 nm, and the thickness of the twelfth film ranges from 35 to 50 nm; the thickness of the second film ranges from 15 to 20 nm, the thickness of the seventh film ranges from 11 to 13 nm, and the thickness of the tenth film ranges from 10 to 25 nm; the thickness of the fourth film ranges from 6 to 10 nm, and the thickness of the eleventh film ranges from 5 to 9 nm; the thickness of the fifth film ranges from 10 to 18 nm, and the thickness of the ninth film ranges from 25 to 30 nm; the thickness of the sixth film ranges from 10 to 15 nm; and the thickness of the eighth film ranges from 50 to 100 nm.

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