A semiconductor device process cavity security lock system

Abstract

The utility model belongs to the technical field of semiconductor equipment, concretely is a kind of semiconductor equipment process cavity safety lock system, including locking ring, pneumatic lock, lock head pole, gas pressure supply source, gas control tee valve, manual switch valve.The first main pipeline connection end of gas control tee valve is connected with pneumatic lock by pipeline, the second main pipeline connection end of gas control tee valve is connected with gas pressure supply source by pipeline, the third main pipeline connection end of gas control tee valve is connected with one end of manual switch valve by pipeline, the other end of manual switch valve is connected with plant exhaust pipe by pipeline.The utility model can realize manual control slow unlocking, can form appropriate operation time-consuming process to reach safety limit, can reduce equipment safety hidden danger, improve safety reliability, also can guarantee the cleanliness level inside and outside semiconductor equipment cavity, improve product yield, help to improve semiconductor equipment appearance upgrade.

Description

Technical Field

[0001] This utility model belongs to the field of semiconductor equipment technology, specifically a semiconductor equipment process cavity safety locking system. Background Technology

[0002] During the operation of semiconductor equipment, there are situations where it is necessary to open the process cavity to perform inspections, adjustments, and maintenance on the inside of the cavity. In some cases, the door panel on the process cavity is generally designed to flip outward relative to the process cavity.

[0003] The standard operating procedure for opening the process chamber of existing semiconductor equipment includes: confirming that all moving parts inside the process chamber are stationary, activating the shut-off function of the equipment's safety sensors, and then opening the semiconductor equipment's process chamber. Opening and unlocking requires a certain amount of time. During this period, hazardous gases released from the hazardous chemicals inside the process chamber can be purged through the equipment's own exhaust system to ensure the complete removal of hazardous chemicals from the process chamber. However, if the process chamber is accidentally opened prematurely, there is a possibility of hazardous gases escaping to the outside of the equipment, posing a risk of injury to personnel.

[0004] There are generally two types of safety systems for opening the process cavity doors in existing semiconductor equipment.

[0005] The first type: The semiconductor equipment process cavity door structure uses an electromagnetic sensor to achieve relative locking between the door structure and the frame. Before opening the cavity, the electromagnetic induction sensor is unlocked by operating the sensor control system on the semiconductor equipment itself, allowing the process cavity door structure to be opened. The limitation of this process cavity door structure safety system is that the control method of the electromagnetic sensor relies excessively on the reliability of the equipment's electrical system. Once the electrical system fails without alarm indication, the safety system loses its protective effect. Furthermore, because the locking action of the electromagnetic sensor is achieved by being energized, the sensor itself becomes a heat source, dissipating additional heat, which can be a cause of process failure for the semiconductor equipment itself. Moreover, the unlocking method of the electromagnetic sensor is instantaneous, failing to establish the necessary operational time, making it difficult for operators to determine the subsequent opening timing and whether hazardous chemical gases in the process cavity have been completely vented.

[0006] The second type involves a threaded lock designed for the semiconductor equipment process chamber door structure. This lock is achieved through the tightening of a screw and nut, locking the process chamber door structure relative to the frame. The limitation of this design is that, while meeting the requirement for complete venting of hazardous chemical gases from the process chamber, the threaded structure must also meet length requirements to accommodate necessary operational delays. This type of structure cannot meet the high operational convenience requirements of semiconductor equipment, and the friction from the threaded structure can cause excessive airborne particles, potentially leading to process failures. Utility Model Content

[0007] To address the aforementioned problems, the purpose of this utility model is to provide a safety locking system for semiconductor equipment process cavities.

[0008] The objective of this utility model is achieved through the following technical solution: A safety locking system for a semiconductor equipment process cavity includes a locking ring, a pneumatic lock, a locking rod, a pneumatic supply source, a pneumatically controlled three-way valve, and a manually operated valve. The locking ring is installed on the corresponding outward-opening door of the process cavity; The pneumatic lock has a telescopic drive end, and the lock head rod is fixed to the telescopic drive end of the pneumatic lock. The pneumatic three-way valve has three main pipeline connection ends. The first main pipeline connection end of the pneumatic three-way valve is connected to the pneumatic lock via a pipeline. The second main pipeline connection end of the pneumatic three-way valve is connected to the air pressure supply source via a pipeline. The third main pipeline connection end of the pneumatic three-way valve is connected to one end of the manual switch valve via a pipeline. The other end of the manual switch valve is connected to the plant exhaust pipe via a pipeline. The pneumatic three-way valve is controlled by an external air pressure station, and the manual switch valve is normally closed. The first main pipeline connection end of the pneumatic three-way valve is connected to the second main pipeline connection end. The air pressure supply source provides positive pressure gas to the pneumatic lock, driving the extension drive end of the pneumatic lock to extend. The lock rod is inserted into the locking ring to achieve the locking effect of the outward opening door of the process cavity. The first main pipeline connection end of the pneumatic three-way valve is connected to the third main pipeline connection end, and the air pressure supply source no longer supplies positive pressure gas to the pneumatic lock. When the manual switch valve is closed, the gas pressure in the pneumatic lock remains unchanged, and the pneumatic lock remains extended. After the manual switch valve is opened, the positive pressure gas in the pneumatic lock is gradually discharged to the plant exhaust pipe through the pneumatic three-way valve and the manual switch valve. During this process, the telescopic drive end of the pneumatic lock gradually retracts, and the lock rod gradually exits the locking ring, thereby achieving the unlocking effect of the outward-opening door of the process chamber.

[0009] A pressure reducing valve is installed on the pipeline between the air pressure supply source and the second main pipeline connection end of the pneumatic three-way valve.

[0010] The pressure reducing valve is connected to a pressure gauge.

[0011] A flow regulating valve is installed on the pipeline between the other end of the manual switch valve and the plant exhaust pipe.

[0012] A three-way connector is provided on the pipeline between the first main pipeline connection end of the pneumatic three-way valve and the pneumatic lock. The three-way connector is connected to the first main pipeline connection end of the pneumatic three-way valve and the pneumatic lock, respectively. The three-way connector is also connected to the detection end of an electronic pressure gauge.

[0013] The pneumatic lock includes a piston cavity, a piston rod, a piston head, a pipe connector, and a spring. One end of the piston rod is located inside the piston cavity, and the other end of the piston rod extends out of the piston cavity and serves as the extension and retraction drive end of the pneumatic lock, fixedly connected to the lock head rod. The piston head is located in the middle of the piston rod, inside the piston cavity, and divides the internal space of the piston cavity into two spaces, space A and space B. Space A is located on the side of the piston head away from the lock head rod, and space B is located on the side of the piston head closer to the lock head rod. The pipe connector is located on the piston cavity and communicates with space A of the piston cavity. The pipe connector is used to connect to the pipeline connected to the first main pipeline connection end of the pneumatic three-way valve. The spring is sleeved on the outside of the piston rod located in space B of the piston cavity. One end of the spring abuts against the inner side of the piston cavity, and the other end of the spring abuts against the piston head.

[0014] The piston chamber is installed on the outside of the process chamber, and the air pressure supply source, the air-controlled three-way valve, and the manual switch valve are all located on the outside of the process chamber.

[0015] The axial centerline of the piston rod is parallel to or collinear with the axial centerline of the lock rod.

[0016] One end of the piston rod is located in space A of the piston cavity, and a position detection head is provided on one end of the piston rod; a plurality of position detection sensors are provided on the piston cavity along the length direction of the piston rod, which are used in conjunction with the position detection head, and the detection end of each position detection sensor extends into space A of the piston cavity.

[0017] The position detection sensor is provided with at least three sensors; when the position detection sensor located on the side closest to the lock rod detects the position detection head, the telescopic drive end of the pneumatic lock extends to a preset limit position; when the position detection sensor located on the side furthest from the lock rod detects the position detection head, the telescopic drive end of the pneumatic lock retracts to a preset limit position; the position detection sensor located in the middle position is used to detect the specific position of the position detection head during the telescopic process.

[0018] The advantages and positive effects of this utility model are as follows: This invention, through the coordinated arrangement of a locking ring, pneumatic lock, locking rod, air pressure supply source, pneumatic three-way valve, and manual switching valve, enables manual control of slow unlocking. It can form a suitable operation time process to achieve safety limits, meet the mandatory requirements of SEMI standards, reduce equipment safety hazards, improve safety and reliability, ensure the cleanliness level of the inside and outside of the semiconductor equipment cavity, improve product yield, and help improve the appearance of semiconductor equipment. Attached Figure Description

[0019] Figure 1 This is a schematic diagram illustrating the overall setup principle of this utility model; Figure 2 This is a schematic diagram of the pneumatic lock of this utility model.

[0020] In the diagram: 1 is the pneumatic lock, 101 is the piston chamber, 1011 is space A, 1012 is space B, 102 is the piston rod, 103 is the piston head, 104 is the pipe joint, 105 is the spring, 106 is the position detection head, and 107 is the position detection sensor. 2 is the locking rod, 3 is the air pressure supply source, 4 is the air-controlled three-way valve, 5 is the manual switch valve, 6 is the pressure reducing valve, 7 is the pressure gauge, 8 is the flow regulating valve, 9 is the three-way connector, and 10 is the electronic air pressure gauge. 001 is the outward-opening door of the process chamber, 0011 is the locking ring, 002 is the plant exhaust pipe, and 003 is the process chamber frame. Detailed Implementation

[0021] The following is in conjunction with the appendix Figures 1-2 The present invention will be described in further detail.

[0022] A semiconductor equipment process cavity security locking system, such as Figures 1-2 As shown, this embodiment includes a locking ring 0011, a pneumatic lock 1, a lock rod 2, a pneumatic supply source 3, a pneumatic three-way valve 4, and a manual switch valve 5.

[0023] The locking ring 0011 is disposed on the corresponding outward-opening door 001 of the process cavity. In this embodiment, as shown... Figure 1As shown, the outward-opening door 001 of the process cavity is generally hinged to the upper part of the process cavity frame 003, thereby achieving basic fixation of the outward-opening door 001 and allowing it to flip relative to the process cavity frame 003. The locking ring 0011 is located at the lower end of the corresponding outward-opening door 001. The pneumatic lock 1 has a telescopic drive end, and the lock head rod 2 can be fixed to the telescopic drive end of the pneumatic lock 1 with screws.

[0024] The pneumatic three-way valve 4 has three main pipeline connection ends. The first main pipeline connection end of the pneumatic three-way valve 4 is connected to the pneumatic lock 1 via a pipeline. The second main pipeline connection end of the pneumatic three-way valve 4 is connected to the air pressure supply source 3 via a pipeline. The third main pipeline connection end of the pneumatic three-way valve 4 is connected to one end of the manual switch valve 5 via a pipeline. The other end of the manual switch valve 5 is connected to the plant exhaust pipe 002 via a pipeline. In this embodiment, the air pressure supply source 3 is set up using existing technology, such as an air pump; the pneumatic three-way valve 4 is a commercially available product, and its operation is controlled by an external air pressure station. The external air pressure station is set up using existing technology, and its operation is controlled by the overall semiconductor equipment system; the manual switch valve 5 is a commercially available product, and it is normally closed when the equipment is put into use; the plant exhaust pipe 002 is set up using existing technology.

[0025] Specifically, in this embodiment, a pressure reducing valve 6 is installed on the pipeline between the air pressure supply source 3 and the second main pipeline connection end of the pneumatic three-way valve 4, and a pressure gauge 7 is connected to the pressure reducing valve 6. In this embodiment, a flow regulating valve 8 is installed on the pipeline between the other end of the manual switch valve 5 and the plant exhaust pipe 002. A three-way connector 9 is installed on the pipeline between the first main pipeline connection end of the pneumatic three-way valve 4 and the pneumatic lock 1. The three-way connector 9 is connected to the first main pipeline connection end of the pneumatic three-way valve 4 and the pneumatic lock 1, respectively. The three-way connector 9 is also connected to the detection end of an electronic pressure gauge 10. In this embodiment, the pressure reducing valve 6, pressure gauge 7, flow regulating valve 8, three-way connector 9, and electronic pressure gauge 10 are all commercially available products. The pressure reducing valve 6 and flow regulating valve 8 can be manually adjustable products, while the electronic pressure gauge 10 is connected and communicates with the overall semiconductor equipment system. The pressure of the gas supplied from the air pressure source 3 to the pneumatic lock 1 can be regulated by adjusting the pressure reducing valve 6. The pressure gauge 7 displays the pressure of the gas supplied from the air pressure source 3 to the pneumatic lock 1. The gas discharge rate in the pneumatic lock 1 can be adjusted by adjusting the flow regulating valve 8 to achieve an appropriate operating time, preventing the exhaust time (i.e., unlocking time) from being too long or too short. The appropriate operating time can be determined through testing before use. After the equipment is put into normal operation, the exhaust time (i.e., unlocking time) of each opening of the manual switch valve 5 remains basically fixed.

[0026] Specifically, such as Figure 2As shown, in this embodiment, the pneumatic lock 1 includes a piston cavity 101, a piston rod 102, a piston head 103, a pipe joint 104, and a spring 105. One end of the piston rod 102 is located inside the piston cavity 101, and the other end of the piston rod 102 extends out of the piston cavity 101 and serves as the extension and retraction drive end of the pneumatic lock 1, fixedly connected to the lock rod 2. The piston head 103 is located in the middle of the piston rod 102, inside the piston cavity 101, and divides the internal space of the piston cavity 101 into two spaces: space A 1011 and space B 1012. Space A 1011 is located on the side of the piston head 103 away from the lock rod 2, and space B 1012 is located on the side of the piston head 103 closer to the lock rod 2. The pipe connector 104 is provided on the piston cavity 101 and communicates with space A 1011 of the piston cavity 101. The pipe connector 104 is used to connect the pipe that is connected to the first main pipeline connection end of the pneumatic three-way valve 4. The spring 105 is sleeved in space B of the piston cavity 101. On the outer side of piston rod 102 in 1012, one end of spring 105 abuts against the inner side of piston chamber 101, and the other end of spring 105 abuts against piston head 103. In use, positive pressure gas supplied by pneumatic supply source 3 is injected into space A 1011 through pneumatic control three-way valve 4 and pipe connector 104, thereby pushing piston rod 102 to move and compressing spring 105, causing piston rod 102 to extend. When positive pressure gas needs to be discharged, it is gradually discharged from space A 1011 through pipe connector 104, pneumatic control three-way valve 4, and manual switch valve 5 to the plant exhaust pipe 002. At this time, spring 105 pushes piston head 103 to reset piston rod 102. The axial center line of piston rod 102 is collinear with the axial center line of locking rod 2 for ease of installation and to ensure that locking rod 2 can accurately insert into locking ring 0011.

[0027] In this embodiment, the piston cavity 101 is installed on the outside of the process cavity. The air pressure supply source 3, the air-controlled three-way valve 4, and the manual switch valve 5 are all located on the outside of the process cavity to avoid affecting the inside of the process cavity.

[0028] In this embodiment, one end of the piston rod 102 is located in space A 1011 of the piston cavity 101, and a position detection head 106 is provided on one end of the piston rod 102. In this embodiment, each position detection sensor 107 is connected to the overall control system of the semiconductor device. Each position detection sensor 107 can be a commercially available contact switch product, which generates relatively little heat. Three position detection sensors 107 are provided on the piston cavity 101 along the length direction of the piston rod 102, which cooperate with the position detection head 106. The detection end of each position detection sensor 107 extends into space A 1011 of the piston cavity 101. When the position detection sensor 107 located on the side closest to the lock rod 2 detects the position detection head 106, the telescopic drive end of the pneumatic lock 1 extends to a preset limit position. When the position detection sensor 107 located on the side furthest from the lock rod 2 detects the position detection head 106, the telescopic drive end of the pneumatic lock 1 retracts to the preset limit position. The position detection sensor 107, located in the middle position, is used to detect the specific position of the position detection head 106 during the extension and retraction process. In this embodiment, the position detection sensors 107 are configured to provide real-time feedback on the position of the piston rod 102. Furthermore, the signals detected by each position detection sensor 107 can be compared with the data measured by the electronic pressure gauge 10 to enable the overall system control of the semiconductor equipment to determine whether the pneumatic lock 1 is in normal working condition. If the comparison result indicates that it is unsafe, the first main pipeline connection end of the pneumatic three-way valve 4 will be immediately connected to the second main pipeline connection end to lock it into a positive pressure gas supply state, that is, to maintain the locking of the process chamber external flip door 001, thereby ensuring the safety of personnel and equipment.

[0029] Working principle: When the equipment is used for the first time, the first main pipeline connection end of the pneumatic three-way valve 4 is connected to the second main pipeline connection end. The air pressure supply source 3 provides positive pressure gas to the pneumatic lock 1, which drives the extension drive end of the pneumatic lock 1 to extend. The lock rod 2 is inserted into the locking ring 0011, thereby achieving the locking effect on the external flip door 001 of the process chamber.

[0030] When the equipment is in normal working condition, the first main pipeline connection end of the pneumatic three-way valve 4 can be connected to the third main pipeline connection end, and the air pressure supply source 3 can no longer supply positive pressure gas to the pneumatic lock 1. At this time, the manual switch valve 5 is in the closed state, the gas pressure in the pneumatic lock 1 remains unchanged, and the pneumatic lock 1 remains in the extended state.

[0031] When it is necessary to open the process chamber external flip door 001, after the manual switch valve 5 is opened, the positive pressure gas in the pneumatic lock 1 is gradually discharged to the plant exhaust pipe 002 through the pneumatic three-way valve 4 and the manual switch valve 5. During this process, the telescopic drive end of the pneumatic lock 1 gradually retracts according to the predetermined operation time process, and the lock rod 2 gradually and slowly exits the locking ring 0011, thereby achieving the unlocking effect of the process chamber external flip door 001.

Claims

1. A safety locking system for a semiconductor equipment process cavity, characterized in that: Includes locking ring (0011), pneumatic lock (1), lock rod (2), air pressure supply source (3), pneumatic three-way valve (4), and manual switch valve (5); The locking ring (0011) is disposed on the corresponding outward-opening door (001) of the process cavity; The pneumatic lock (1) has a telescopic drive end, and the lock head rod (2) is fixed to the telescopic drive end of the pneumatic lock (1); The pneumatic three-way valve (4) has three main pipeline connection ends. The first main pipeline connection end of the pneumatic three-way valve (4) is connected to the pneumatic lock (1) through a pipeline. The second main pipeline connection end of the pneumatic three-way valve (4) is connected to the air pressure supply source (3) through a pipeline. The third main pipeline connection end of the pneumatic three-way valve (4) is connected to one end of the manual switch valve (5) through a pipeline. The other end of the manual switch valve (5) is connected to the plant exhaust pipe (002) through a pipeline. The pneumatic three-way valve (4) is controlled by an external air pressure station, and the manual switch valve (5) is normally closed. The first main pipeline connection end of the pneumatic three-way valve (4) is connected to the second main pipeline connection end. The air pressure supply source (3) provides positive pressure gas to the pneumatic lock (1) and drives the telescopic drive end of the pneumatic lock (1) to extend. The lock rod (2) is inserted into the locking ring (0011) to achieve the locking effect of the outward flip door (001) of the process cavity. The first main pipeline connection end of the pneumatic three-way valve (4) is connected to the third main pipeline connection end, and the pneumatic pressure supply source (3) no longer supplies positive pressure gas to the pneumatic lock (1); when the manual switch valve (5) is closed, the gas pressure in the pneumatic lock (1) remains unchanged, and the pneumatic lock (1) remains extended; after the manual switch valve (5) is opened, the positive pressure gas in the pneumatic lock (1) is gradually discharged to the plant exhaust pipe (002) through the pneumatic three-way valve (4) and the manual switch valve (5). During this process, the telescopic drive end of the pneumatic lock (1) gradually retracts, and the lock rod (2) gradually exits the locking ring (0011) to achieve the unlocking effect of the external flip door (001) of the process cavity.

2. The semiconductor equipment process cavity safety locking system according to claim 1, characterized in that: A pressure reducing valve (6) is provided on the pipeline between the air pressure supply source (3) and the second main pipeline connection end of the pneumatic three-way valve (4).

3. A semiconductor equipment process cavity safety locking system according to claim 2, characterized in that: The pressure reducing valve (6) is connected to a pressure gauge (7).

4. A semiconductor equipment process cavity safety locking system according to claim 1, characterized in that: A flow regulating valve (8) is provided on the pipeline between the other end of the manual switch valve (5) and the plant exhaust pipe (002).

5. A semiconductor equipment process cavity safety locking system according to claim 1, characterized in that: A three-way connector (9) is provided on the pipeline between the first main pipeline connection end of the pneumatic three-way valve (4) and the pneumatic lock (1). The three-way connector (9) is connected to the first main pipeline connection end of the pneumatic three-way valve (4) and the pneumatic lock (1) respectively. The three-way connector (9) is also connected to the detection end of an electronic pressure gauge (10).

6. A semiconductor equipment process cavity safety locking system according to claim 1, characterized in that: The pneumatic lock (1) includes a piston cavity (101), a piston rod (102), a piston head (103), a pipe joint (104), and a spring (105). One end of the piston rod (102) is located inside the piston cavity (101), and the other end of the piston rod (102) extends out of the piston cavity (101) and serves as the extension and retraction drive end of the pneumatic lock (1) and is fixedly connected to the lock head rod (2). The piston head (103) is located in the middle of the piston rod (102). The piston head (103) is located inside the piston cavity (101) and divides the internal space of the piston cavity (101) into two spaces: space A (1011) and space B (1012). Space A (1011) is located at the piston head. The space B (1012) is located on the side of the piston head (103) away from the locking rod (2), the space B (1012) is located on the side of the piston head (103) close to the locking rod (2), the pipe joint (104) is disposed on the piston cavity (101) and connected to the space A (1011) of the piston cavity (101), the pipe joint (104) is used to connect the pipe connected to the first main pipeline connection end of the pneumatic three-way valve (4), the spring (105) is sleeved on the outside of the piston rod (102) located in the space B (1012) of the piston cavity (101), one end of the spring (105) abuts against the inner side of the piston cavity (101), and the other end of the spring (105) abuts against the piston head (103).

7. A semiconductor equipment process cavity safety locking system according to claim 6, characterized in that: The piston cavity (101) is installed on the outside of the process cavity, and the air pressure supply source (3), the air-controlled three-way valve (4), and the manual switch valve (5) are all located on the outside of the process cavity.

8. A semiconductor equipment process cavity safety locking system according to claim 6, characterized in that: The axial centerline of the piston rod (102) is parallel or collinear with the axial centerline of the lock rod (2).

9. A semiconductor equipment process cavity safety locking system according to claim 6, characterized in that: One end of the piston rod (102) is located in space A (1011) of the piston cavity (101), and a position detection head (106) is provided on one end of the piston rod (102); a plurality of position detection sensors (107) are provided on the piston cavity (101) along the length direction of the piston rod (102) to cooperate with the position detection head (106), and the detection end of each position detection sensor (107) extends into space A (1011) of the piston cavity (101).

10. A semiconductor equipment process cavity safety locking system according to claim 9, characterized in that: At least three position detection sensors (107) are provided; when the position detection sensor (107) located closest to the lock rod (2) detects the position detection head (106), the telescopic drive end of the pneumatic lock (1) extends to a preset limit position; when the position detection sensor (107) located furthest from the lock rod (2) detects the position detection head (106), the telescopic drive end of the pneumatic lock (1) retracts to a preset limit position; the position detection sensor (107) located in the middle position is used to detect the specific position of the position detection head (106) during the telescopic process.

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