Quality detection and supply pipeline system of wafer polishing liquid mixing tank

Abstract

The utility model provides a kind of wafer polishing liquid mixing tank's quality detection and supply pipeline system that can flexibly deploy conveying path, include: main tank body, filter, supply tank, product inspection module and the pipeline of intercommunication each component, wherein, main tank body can accommodate liquid;Filter is used to filter the size of particle in liquid, filter out oversized particle to avoid scratch wafer;Supply tank is used to temporarily store liquid to adjust the liquid amount in pipeline system;And product inspection module is used to detect the chemical composition and nature of liquid.The utility model is formed by valve control cooperation each component and forms various different function's loop, such as: the short circulation loop of increasing liquid uniformity;Filtering loop of filtering oversized particle in liquid;And product inspection loop of detecting the chemical composition and nature of liquid.

Description

[0001] This utility model claims priority to a Taiwan patent application filed on December 24, 2024, with application number 113214203. Technical Field

[0002] This utility model relates to the field of semiconductor piping, and in particular to a quality inspection and supply piping system for a wafer polishing slurry mixing tank with a flexibly adjustable delivery path. Background Technology

[0003] In semiconductor manufacturing, the surface flatness of a wafer can be affected by the stacking of different materials. Furthermore, the unevenness in the height of the stacked materials accumulates errors, impacting the precision of subsequent photolithography or etching processes and reducing the yield of high-precision wafer products. Therefore, Chemical Mechanical Polishing (CMP) is commonly used to smooth the wafer surface and reduce the accumulated errors caused by different processes. To protect the microstructure of the wafer surface stacks, different chemical components are added to the polishing slurry in chemical polishing to soften or dissolve the target materials, reducing the mechanical stress required during polishing and thus minimizing the pressure needed to avoid wafer damage.

[0004] However, the chemical components and abrasive particles added to the polishing slurry may deteriorate or precipitate over time, resulting in poor quality slurry supplied to the machine and affecting the effectiveness of chemical polishing. In addition, dead zones in the pipelines supplying the polishing slurry can also affect its quality, increase localized unevenness, and reduce pipeline lifespan.

[0005] In view of the shortcomings of known grinding fluid pipelines, such as the deterioration of chemical composition of grinding fluid during the process or the precipitation of grinding particles affecting the quality of grinding fluid; and the dead water zone in the delivery pipeline, which reduces the pipeline life and the uniformity of grinding fluid, this utility model actively and continuously develops a utility model that can improve the above problems. Utility Model Content

[0006] The main objective of this invention is to reduce stagnant water zones and uneven water distribution in pipelines by combining different transport paths. Furthermore, by combining these paths, the grinding fluid can be transported from the main tank to a filter, supply tank, or quality inspection module. After testing, it can be returned to the main tank or the supply tank for storage as needed to ensure the quality of the grinding fluid.

[0007] The secondary objective of this invention is that both the main tank and the supply tank can deliver the grinding fluid to the quality inspection module for testing to control the quality of the grinding fluid, thereby reducing the possibility of grinding fluid that does not meet quality standards due to long-term storage being delivered to the machine. The supply tank can be further divided into a main supply tank and a backup supply tank, and the supply tanks can also transfer grinding fluid to each other, and each can independently deliver the grinding fluid to the quality inspection module for testing.

[0008] This utility model discloses a quality inspection and supply pipeline system for a wafer polishing slurry mixing tank, comprising: a main tank body, a filter, a supply tank, a quality inspection module, and pipelines connecting the various components. The main tank body can hold liquid and includes: a main tank return port, a main tank outlet, a main tank check valve, and a main tank pump. The main tank check valve is connected to the main tank outlet and can control the liquid flow rate. The main tank pump is connected to the main tank check valve and provides the power for the liquid to flow in the pipeline. The filter is used to filter out particles of varying sizes in the liquid, removing excessively large particles to prevent scratching the wafer. The supply tank temporarily stores liquid to regulate the liquid volume in the pipeline system. The quality inspection module detects the chemical composition and properties of the liquid.

[0009] In a preferred embodiment of this utility model, after the liquid enters the pipeline from the main tank outlet, it can directly flow back to the main tank return port, forming a short circulation transport path, which makes the liquid composition more uniform.

[0010] In a preferred embodiment of this utility model, after the liquid enters the pipeline from the main tank outlet, it is transferred to the filter through a valve to form a filtration and conveying path, which is used to filter out excessively large particles in the liquid and prevent the wafer from being scratched by the particles.

[0011] In a preferred embodiment of this invention, the liquid enters the pipeline from the main tank outlet and is then transferred to a supply tank via a valve to store the mixed and filtered liquid. The liquid can be supplied back into the pipeline system according to process requirements.

[0012] In a preferred embodiment of this utility model, after the liquid enters the pipeline from the main tank outlet, it is transferred to the quality inspection module through a valve to form a quality inspection conveying path for detecting the content of various chemical properties or components in the liquid.

[0013] In a preferred embodiment of this utility model, the quality inspection module includes a first detection unit, a second detection unit, and a third detection unit. The first detection unit is connected in series in the pipeline to directly detect the chemical properties or component content of the liquid, and the measured liquid is recycled back into the pipeline. The second or third detection unit is connected to the pipeline for sampling to measure the chemical properties or component content of the liquid, and the measured liquid is not recycled.

[0014] In a preferred embodiment of this utility model, the supply tank includes: a supply tank return port, a supply tank outlet, a supply tank check valve, and a supply tank pump. Liquid stored in the supply tank can enter the pipeline from the supply tank outlet, be transferred to the quality inspection module for testing via the valve, and then return to the supply tank from the supply tank return port.

[0015] In a preferred embodiment of the present invention, the supply tank includes a main supply tank and a backup supply tank, wherein the main supply tank and the backup supply tank are independent of each other and are connected to each other by pipelines.

[0016] In a preferred embodiment of this utility model, the liquid in the main supply tank enters the pipeline through the outlet of the main supply tank, and is transferred to the backup supply tank return port through the valve, thereby adjusting the liquid levels in the main supply tank and the backup supply tank.

[0017] In a preferred embodiment of this utility model, the liquid in the backup supply tank can also enter the pipeline through the outlet of the backup supply tank, and be transferred to the return port of the main supply tank through the valve and enter the main supply tank. Attached Figure Description

[0018] Figure 1 This is a schematic diagram of the pipeline system architecture according to an embodiment of the present utility model;

[0019] Figure 2 This is a schematic diagram of the first circuit according to an embodiment of the present utility model;

[0020] Figure 3 This is a schematic diagram of the second circuit in an embodiment of the present invention;

[0021] Figure 4 This is a schematic diagram of the third circuit in an embodiment of the present invention;

[0022] Figure 5 This is a schematic diagram of the fourth A circuit according to an embodiment of the present invention;

[0023] Figure 6 This is a schematic diagram of the fourth B circuit in an embodiment of the present invention;

[0024] Figure 7 This is a schematic diagram of the fourth C-circuit of this utility model embodiment; and

[0025] Figure 8 This is a schematic diagram of the fifth circuit in an embodiment of the present invention.

[0026] Symbol explanation:

[0027] 1: Main tank body;

[0028] 11: Main tank valve;

[0029] 12: Main channel outlet;

[0030] 13: Main tank check valve;

[0031] 14: Main tank pump;

[0032] 2: Filter;

[0033] 3: Quality Inspection Module;

[0034] 31: First detection unit;

[0035] 32: Second detection unit;

[0036] 33: Third detection unit;

[0037] 41: Main supply tank;

[0038] 411: Main supply tank valve;

[0039] 412: Main supply tank outlet;

[0040] 413: Main supply tank check valve;

[0041] 414: Main supply tank pump;

[0042] 42: Backup supply tank;

[0043] 421: Spare supply tank valve;

[0044] 422: Backup supply tank outlet;

[0045] 423: Standby supply tank check valve;

[0046] 424: Standby supply tank pump;

[0047] 501: First valve;

[0048] 502: Second valve;

[0049] 503: Third valve;

[0050] 504: Fourth valve;

[0051] 505: Fifth valve;

[0052] 506: Sixth valve;

[0053] 507: Seventh valve;

[0054] 508: Eighth valve;

[0055] 509: Ninth valve;

[0056] 510: The tenth valve;

[0057] 511: Eleventh valve;

[0058] 512: Twelfth valve. Detailed Implementation

[0059] To facilitate understanding of this utility model, it will be described in detail below with reference to the accompanying drawings and embodiments. The drawings show some, but not all, embodiments of this utility model. This utility model can be implemented in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided to provide a more thorough and complete understanding of the disclosure of this utility model. All other embodiments obtained by those skilled in the art based on the embodiments of this utility model without any inventive effort are within the scope of protection of this utility model.

[0060] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in this specification is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention.

[0061] Figures 1 to 8 This is a schematic diagram of an embodiment of the present utility model, as shown below. Figure 1 As shown in the schematic diagram of the pipeline system architecture of this utility model embodiment, the quality inspection and supply pipeline system of the wafer polishing slurry mixing tank of this utility model includes: a main tank body 1, a filter 2, a supply tank, a quality inspection module 3, and pipelines connecting each component. The main tank body 1 can hold liquid and includes: a main tank return port (not shown), a main tank outlet 12, a main tank one-way valve 13, and a main tank pump 14. The main tank body 1 is a mixing and stirring tank for the polishing slurry. The main tank one-way valve 13 is connected to the main tank outlet 12 and can control the flow rate of the liquid. The main tank pump 14 is connected to the main tank one-way valve 13 and provides the power for the liquid to flow in the pipeline. The filter 2 is used to filter the particle size in the liquid, filtering out excessively large particles to avoid scratching the wafer. The supply tank temporarily stores the mixed liquid for subsequent delivery to the distribution valve box for final use on the polishing machine. The quality inspection module 3 detects the chemical composition and properties of the liquid.

[0062] like Figure 2 As shown in the schematic diagram of the first loop of this utility model embodiment, liquid enters the pipeline from the main tank outlet 12 and sequentially passes through the main tank check valve 13, the main tank pump 14, the first valve 501, and the second valve 502. The liquid then returns to the main tank body 1 through the main tank return port. The short-circuit return of the liquid from the main tank outlet 12 to the main tank return port makes the substances in the liquid more uniform.

[0063] like Figure 3As shown in the second circuit diagram of this embodiment, liquid enters the pipeline from the main tank outlet 12 and sequentially passes through the main tank check valve 13, the main tank pump 14, the first valve 501, the second valve 502, the third valve 503, and the filter 2. Then, after the main tank valve 11 is opened, the liquid returns to the main tank body 1 through the main tank return port. The filter 2 removes excessively large particles, preventing them from scratching the wafer during the grinding process.

[0064] Preferably, multiple filters 2 can be connected in parallel or in series to increase filtration efficiency or effect.

[0065] like Figure 4 As shown in the schematic diagram of the third circuit of this utility model embodiment, the liquid enters the pipeline from the main tank outlet 12 and passes sequentially through the main tank check valve 13, the main tank pump 14, the first valve 501, the second valve 502 and the third valve 503. Then, the liquid is selected to enter the main supply tank 41 or the backup supply tank 42 for storage by the main supply tank valve 411 or the backup supply tank valve 421.

[0066] like Figure 5 As shown in the schematic diagram of the fourth A circuit of this utility model embodiment, the liquid enters the pipeline from the main tank outlet 12, passes through the main tank check valve 13, the main tank pump 14, the fourth valve 504 and the fifth valve 505 in sequence, and then enters the quality inspection module 3 for testing. After that, the liquid returns to the main tank body 1 through the main tank return port after the tenth valve 510 is opened.

[0067] like Figure 6 and Figure 7 As shown, the supply tanks also include a main supply tank 41 and a backup supply tank 42. The main supply tank 41 includes a main supply tank return port (not shown), a main supply tank outlet 412, a main supply tank check valve 413, and a main supply tank pump 414; the backup supply tank 42 includes a backup supply tank return port (not shown), a backup supply tank outlet 422, a backup supply tank check valve 423, and a backup supply tank pump 424. The main supply tank 41 and the backup supply tank 42 are independent of each other and are connected by pipelines.

[0068] like Figure 6 As shown in the schematic diagram of the fourth B circuit of this utility model embodiment, the liquid enters the pipeline from the main supply tank outlet 412, and sequentially passes through the main supply tank check valve 413, the main supply tank pump 414, the sixth valve 506 and the fifth valve 505. The liquid then enters the quality inspection module 3 for testing. After that, the liquid returns to the main supply tank 41 through the main supply tank return port after the eleventh valve 511 is opened.

[0069] like Figure 7As shown in the schematic diagram of the fourth C-loop of this utility model embodiment, the liquid enters the pipeline from the outlet 422 of the backup supply tank, passes through the backup supply tank check valve 423, the backup supply tank pump 424, the seventh valve 507 and the fifth valve 505 in sequence, and then enters the quality inspection module 3 for testing. After that, the liquid returns to the backup supply tank 42 through the backup supply tank return port after the twelfth valve 512 is opened.

[0070] Specifically, the fourth A, fourth B, and fourth C circuits all use the quality inspection module 3 to detect whether the chemical properties or component content of the liquid meet the standards in order to maintain the quality of the grinding slurry.

[0071] In addition, the quality inspection module 3 includes a first detection unit 31, a second detection unit 32, and a third detection unit 33. The first detection unit 31 is connected in series in the pipeline to directly detect the chemical properties or component content of the liquid, and the measured liquid is recycled back into the pipeline. The second detection unit 32 or the third detection unit 33 is connected to the pipeline for sampling to measure the chemical properties or component content of the liquid, and the measured liquid is not recycled.

[0072] Furthermore, the liquid entering the quality inspection module 3 will first be detected by the first detection unit 31, and then guided to the second detection unit 32 for detection through the eighth valve 508; or it can flow directly back to the main tank 1, the main supply tank 41, or the backup supply tank 42 after passing through the eighth valve 508. The liquid can also enter the third detection unit 33 for detection through the ninth valve 509 after passing through the eighth valve 508.

[0073] Preferably, the first detection unit 31 can be a hydrometer or a conductivity meter.

[0074] Preferably, the second detection unit 32 can be a pH meter.

[0075] Preferably, the third detection unit 33 can be a hydrogen peroxide concentration meter (ATRS).

[0076] Preferably, the second valve 502, the third valve 503, and the fifth valve 505 can be three-way valves.

[0077] like Figure 8 As shown in the fifth circuit diagram of this utility model embodiment, the liquid in the main supply tank 41 enters the pipeline through the main supply tank outlet 412, passes sequentially through the main supply tank check valve 413, the main supply tank pump 414, the sixth valve 506 and the fifth valve 505, and then enters the backup supply tank 42 from the backup supply tank return port, thereby adjusting the liquid levels in the main supply tank 41 and the backup supply tank 42.

[0078] like Figure 8As shown, the liquid in the backup supply tank 42 enters the pipeline through the backup supply tank outlet 422, passes sequentially through the backup supply tank check valve 423, the backup supply tank pump 424, the seventh valve 507 and the fifth valve 505, and then enters the main supply tank 41 from the main supply tank return port, thereby adjusting the liquid levels in the main supply tank 41 and the backup supply tank 42.

[0079] The embodiments described above are merely preferred embodiments of the present invention, and while the descriptions are specific and detailed, they should not be construed as limiting the scope of the present invention. It should be noted that those skilled in the art can make various changes and modifications without departing from the concept of the present invention, and these all fall within the protection scope of the present invention.

Claims

1. A quality inspection and supply pipeline system for a wafer polishing slurry mixing tank, characterized in that, include: One pipeline connects a main tank, a filter, a supply tank, and a quality inspection module; The main tank is used to contain a liquid and includes: a main tank return port, a main tank outlet, a main tank check valve, and a main tank pump. The main tank check valve is connected to the main tank outlet; and The main tank pump is connected to the main tank check valve to provide power for the flow of the liquid; The liquid originates from the main tank outlet via the pipeline, passes sequentially through the main tank check valve, the main tank pump, a first valve, and a second valve, and then returns to the main tank body through the main tank return port. The liquid enters the pipeline from the main tank outlet, passes sequentially through the main tank check valve, the main tank pump, the first valve, the second valve, the third valve, and the filter, and then returns to the main tank body through the main tank return port. The liquid enters the pipeline from the main tank outlet, passes sequentially through the main tank check valve, the main tank pump, the first valve, the second valve, and the third valve, and then enters the supply tank for storage; and The liquid enters the pipeline from the main tank outlet, passes sequentially through the main tank check valve, the main tank pump, a fourth valve, and a fifth valve, and then enters the quality inspection module for testing. After that, it returns to the main tank body through the main tank return port.

2. The quality inspection and supply pipeline system for the wafer polishing slurry mixing tank according to claim 1, characterized in that, The supply tank includes: a supply tank return port, a supply tank outlet, a supply tank check valve, and a supply tank pump; The liquid in the supply tank enters the pipeline from the supply tank outlet, passes sequentially through the supply tank check valve, the supply tank pump, and the fifth valve, and then enters the quality inspection module for testing. After that, it returns to the supply tank through the supply tank return port.

3. The quality inspection and supply pipeline system for the wafer polishing slurry mixing tank according to claim 2, characterized in that, The supply tank includes: a main supply tank and a backup supply tank; The main supply tank includes: a main supply tank return port, a main supply tank outlet, a main supply tank check valve, and a main supply tank pump; and The backup supply tank includes: a backup supply tank return port, a backup supply tank outlet, a backup supply tank check valve, and a backup supply tank pump; The main supply tank and the backup supply tank are independent of each other and are connected by the pipeline.

4. The quality inspection and supply pipeline system for the wafer polishing slurry mixing tank according to claim 3, characterized in that, The liquid in the main supply tank enters the pipeline through the outlet of the main supply tank, passes sequentially through the main supply tank check valve, the main supply tank pump, a sixth valve and the fifth valve, and then enters the backup supply tank from the return port of the backup supply tank, thereby adjusting the liquid levels in the main supply tank and the backup supply tank.

5. The quality inspection and supply pipeline system for the wafer polishing slurry mixing tank according to claim 3, characterized in that, The liquid in the backup supply tank enters the pipeline through the backup supply tank outlet, passes sequentially through the backup supply tank check valve, the backup supply tank pump, a seventh valve, and the fifth valve, and then enters the main supply tank from the main supply tank return port, thereby adjusting the liquid levels in the main supply tank and the backup supply tank.

6. The quality inspection and supply pipeline system for the wafer polishing slurry mixing tank according to any one of claims 1 to 5, characterized in that, The second valve, the third valve, and the fifth valve are three-way valves.

7. The quality inspection and supply pipeline system for the wafer polishing slurry mixing tank according to claim 3, characterized in that, The quality inspection module includes a first detection unit, and the pipeline is connected to an eighth valve after connecting the first detection unit; After the liquid enters the quality inspection module, it is inspected by the first detection unit and then discharged through the eighth valve back to the main tank, the main supply tank, or the backup supply tank.

8. The quality inspection and supply pipeline system for the wafer polishing slurry mixing tank according to claim 7, characterized in that, The quality inspection module also includes a second detection unit, through which the liquid enters the second detection unit for detection via the eighth valve.

9. The quality inspection and supply pipeline system for the wafer polishing slurry mixing tank according to claim 8, characterized in that, The quality inspection module also includes a third detection unit, and the liquid is diverted to the third detection unit via a ninth valve after passing through the eighth valve.

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