A photoresist reactor with an antireflection coating

Abstract

The utility model relates to the field of photoresist production technology discloses a photoresist reaction kettle with antireflection coating, including reaction kettle structure, heating assembly, agitating structure and discharge structure, heating assembly sets up at the outside of reaction kettle structure, agitating structure sets up at the inside of reaction kettle structure, and discharge structure sets up at the bottom of reaction kettle structure, and reaction kettle structure includes kettle body, and heating assembly includes shell, and shell fixedly sets up on the outer wall of kettle body, and the side top end fixed setting of shell is set up water inlet, and the bottom fixed setting of the side away from water inlet of shell is provided with water outlet, and the inner wall fixed setting of shell is provided with electric heating wire, and the outer wall fixed mounting of shell is provided with controller, and controller is electrically connected to electric heating wire, and the top end detachable installation of controller is provided with sealing cover, the utility model discloses the heating assembly and agitating structure of setting, can with even heat conduction mode act on kettle body, avoid the local temperature of kettle to rise or temperature difference too big.

Description

Technical Field

[0001] This utility model relates to the field of photoresist production technology, and in particular to a photoresist reactor with an anti-reflective coating. Background Technology

[0002] Photoresist is widely used in semiconductor manufacturing, microelectronic devices, and the production of precision optical components. The reaction vessel is typically made of highly corrosion-resistant materials, capable of withstanding reactions in high-temperature and chemically corrosive environments. To improve the performance of photoresist, especially its control over light reflection during photolithography, the surface of the photoresist reaction vessel is often coated with an anti-reflective coating. This coating effectively reduces interference from reflected light, thereby improving image quality and the precision of the photolithography process.

[0003] In existing technologies, directly heating the reaction vessel can easily lead to localized excessively high or low temperatures, which cannot accurately match the stringent temperature requirements of 365nm line photoresist. This may result in insufficient reaction of raw materials, unbalanced reaction rates, or even damage to the optical properties and chemical stability of the photoresist, affecting the reaction effect of subsequent raw materials. Utility Model Content

[0004] In view of the fact that the existing direct heating reaction vessels are prone to local overheating or underheating, which cannot accurately match the strict temperature requirements of 365nm line photoresist, and may cause insufficient reaction of raw materials, unbalanced reaction rate, or even damage to the optical properties and chemical stability of photoresist, affecting the reaction effect of subsequent raw materials, this utility model is proposed.

[0005] To solve the above-mentioned technical problems, this utility model provides the following technical solution: a photoresist reactor with an anti-reflective coating, comprising a reactor structure, a heating component, a stirring structure, and a discharge structure. The heating component is disposed on the outside of the reactor structure, the stirring structure is disposed inside the reactor structure, and the discharge structure is disposed at the bottom of the reactor structure. The reactor structure includes a reactor body, and the heating component includes a shell. The shell is fixedly disposed on the outer wall of the reactor body. A water inlet is fixedly disposed at the top of one side of the shell, and a water outlet is fixedly disposed at the bottom of the side of the shell away from the water inlet. A heating wire is fixedly disposed on the inner wall of the shell, and a controller is fixedly installed on the outer wall of the shell. The controller is electrically connected to the heating wire, and a sealing cover is detachably installed at the top of the controller.

[0006] As a preferred embodiment of the photoresist reactor with anti-reflective coating described in this utility model, the reactor structure includes a support frame and a top cover. The support frame is fixedly installed at the bottom of the reactor body. An anti-reflective coating of ArF is provided on the inner wall of the reactor body. The top cover is located at the top of the reactor body and is detachably connected to the reactor body by bolts. The top of the top cover is symmetrically provided with inlets, and the inlets are connected to the interior of the reactor body.

[0007] As a preferred embodiment of the photoresist reactor with anti-reflective coating described in this utility model, the stirring structure includes a rotating shaft and a motor. The rotating shaft is rotatably mounted on the top cover and extends into the interior of the reactor body. Several stirring blades are fixedly mounted on the rotating shaft. The motor is fixedly mounted on the top of the top cover, and the motor shaft of the motor is fixedly connected to the top of the rotating shaft.

[0008] In a preferred embodiment of the photoresist reactor with anti-reflective coating described in this utility model, crossbars are symmetrically fixed on the rotating shaft, and scrapers are fixedly installed on the crossbars.

[0009] As a preferred embodiment of the photoresist reactor with anti-reflective coating described in this utility model, the discharge structure includes a discharge pipe and a pump. The discharge pipe is fixedly installed at the bottom of the reactor body and communicates with the interior of the reactor body. An electromagnetic valve is fixedly installed on the discharge pipe.

[0010] In a preferred embodiment of the photoresist reactor with anti-reflective coating described in this utility model, the inlet end of the pump is connected to the discharge pipe, and the outlet end of the pump is fixedly connected to the discharge pipe.

[0011] The beneficial effects of this utility model are: 1. Through the set heating components and stirring structure, the controller regulates the heating wire to heat up and act on the reactor body in a uniform way after heating. This avoids sudden temperature rise or excessive temperature difference in local areas inside the reactor, maintains the set reaction temperature, and ensures that the photoresist completes the reaction in a stable environment. This effectively guarantees the optical uniformity and photolithography accuracy of the finished product. At the same time, the motor drives the rotating shaft to drive the stirring blades to stir, and the scraper removes the raw material sticking to the reactor wall, preventing the raw material from being separated due to static stratification, which affects the fullness of the reaction. 2. Through the designed discharge structure, by opening the solenoid valve on the discharge pipe, the pump can provide stable power for discharge, quickly transporting the finished product through the discharge pipe to the discharge pipe, improving discharge efficiency, reducing the amount of residue in the reactor, and reducing raw material waste. Attached Figure Description

[0012] To more clearly illustrate the technical solutions of the embodiments of this utility model, the drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort. Wherein: Figure 1 This is a three-dimensional structural diagram of the present invention; Figure 2 This is a schematic diagram of the reaction vessel structure of this utility model; Figure 3 This is a schematic diagram of the heating component of this utility model; Figure 4 This is a schematic diagram of the stirring structure of this utility model; Figure 5 for Figure 2 A magnified view of part A.

[0013] Explanation of reference numerals in the attached figures: 1. Reactor structure; 11. Reactor body; 12. Support frame; 13. Top cover; 14. Feed inlet; 2. Heating components; 201. Outer shell; 202. Water inlet; 203. Water outlet; 204. Sealing cover; 205. Controller; 206. Heating wire; 3. Stirring structure; 301. Rotating shaft; 302. Motor; 303. Stirring blades; 304. Crossbar; 305. Scraper; 4. Discharge structure; 41. Discharge pipe; 42. Solenoid valve; 43. Pump; 44. Discharge pipe. Detailed Implementation

[0014] To make the above-mentioned objectives, features and advantages of this utility model more apparent and understandable, the specific embodiments of this utility model will be described in detail below with reference to the accompanying drawings.

[0015] Example

[0016] Refer to attached figure Figure 1 - Appendix Figure 5This is the first embodiment of the present invention, which provides a photoresist reactor with an anti-reflective coating, including a reactor structure 1, a heating component 2, a stirring structure 3, and a discharge structure 4. The heating component 2 is disposed on the outside of the reactor structure 1, the stirring structure 3 is disposed on the inside of the reactor structure 1, and the discharge structure 4 is disposed on the bottom of the reactor structure 1. The reactor structure 1 includes a reactor body 11, a support frame 12, and a top cover 13. The support frame 12 is fixedly installed on the bottom of the reactor body 11 and supports the reactor body 11. The inner wall of the reactor body 11 is provided with an anti-reflective coating of ArF. The top cover 13 is disposed on the top of the reactor body 11 and is detachably connected to the reactor body 11 by bolts. The top of the top cover 13 is symmetrically provided with inlets 14, which are connected to the inside of the reactor body 11.

[0017] The heating assembly 2 includes a housing 201, which is fixedly mounted on the outer wall of the vessel 11. A water inlet 202 is fixedly mounted on the top side of the housing 201, and a water outlet 203 is fixedly mounted on the bottom side of the housing 201 away from the water inlet 202. Water is added to the water inlet 202, and water enters between the housing 201 and the vessel 11. Water can be discharged through the water outlet 203. A heating wire 206 is fixedly mounted on the inner wall of the housing 201, and a controller 205 is fixedly mounted on the outer wall of the housing 201. The controller 205 is electrically connected to the heating wire 206, and a sealing cover 204 is detachably mounted on the top of the controller 205.

[0018] The stirring structure 3 includes a rotating shaft 301 and a motor 302. The rotating shaft 301 is rotatably mounted on the top cover 13 and extends into the interior of the vessel body 11. Several stirring blades 303 are fixedly mounted on the rotating shaft 301. Crossbars 304 are symmetrically fixedly mounted on the rotating shaft 301. Scrapers 305 are fixedly mounted on the crossbars 304. The scrapers 305 are in contact with the inner wall of the vessel body 11. The motor 302 is fixedly mounted on the top of the top cover 13, and the motor shaft of the motor 302 is fixedly connected to the top of the rotating shaft 301.

[0019] The discharge structure 4 includes a discharge pipe 41 and a pump 43. The discharge pipe 41 is fixedly installed at the bottom of the vessel body 11 and is connected to the interior of the vessel body 11. A solenoid valve 42 is fixedly installed on the discharge pipe 41. The inlet end of the pump 43 is connected to the discharge pipe 41, and the outlet end of the pump 43 is fixedly connected to the discharge pipe 44.

[0020] During use, 365nm line photoresist raw material is first added into the vessel body 11 through the feed port 14. The ArF anti-reflective coating on the inner wall of the vessel body 11 can reduce light reflection and avoid affecting the optical performance and reaction stability of the 365nm line photoresist. Water is injected between the outer shell 201 and the vessel body 11 through the water inlet 202. The temperature suitable for the reaction of the 365nm line photoresist is set by the controller 205. The controller 205 supplies power to the heating wire 206 to heat the water, thereby heating the vessel body 11 in a water bath.

[0021] Start motor 302, which drives shaft 301 to rotate. Stirring blades 303 on shaft 301 stir the 365nm line photoresist raw material. Scraper 305 on crossbar 304 scrapes off the raw material adhering to the inner wall of reactor 11 to ensure uniform mixing and sufficient reaction. After the 365nm line photoresist reaction is complete, open solenoid valve 42 on discharge pipe 41 and start pump 43 to discharge the finished 365nm line photoresist in reactor 11 through discharge pipe 41 and pump 43 to discharge through discharge pipe 44.

[0022] It should be noted that the above embodiments are only used to illustrate the technical solution of this utility model and are not intended to limit it. Although this utility model has been described in detail with reference to preferred embodiments, those skilled in the art should understand that modifications or equivalent substitutions can be made to the technical solution of this utility model without departing from the spirit and scope of the technical solution of this utility model, and all such modifications or substitutions should be covered within the scope of the claims of this utility model.

Claims

1. A photoresist reactor with an anti-reflective coating, characterized in that: The reactor includes a reactor structure (1), a heating assembly (2), a stirring structure (3), and a discharge structure (4). The heating assembly (2) is located on the outside of the reactor structure (1), the stirring structure (3) is located inside the reactor structure (1), and the discharge structure (4) is located at the bottom of the reactor structure (1). The reactor structure (1) includes a reactor body (11), and the heating assembly (2) includes a shell (201). The shell (201) is fixedly mounted on the outer wall of the reactor body (11). A water inlet (202) is fixedly provided at the top of one side of the outer shell (201), and a water outlet (203) is fixedly provided at the bottom of the side of the outer shell (201) away from the water inlet (202). A heating wire (206) is fixedly provided on the inner wall of the outer shell (201), and a controller (205) is fixedly installed on the outer wall of the outer shell (201). The controller (205) is electrically connected to the heating wire (206), and a sealing cover (204) can be detachably installed at the top of the controller (205).

2. The photoresist reactor with an anti-reflective coating according to claim 1, characterized in that: The reactor structure (1) includes a support frame (12) and a top cover (13). The support frame (12) is fixedly installed at the bottom of the reactor body (11). The inner wall of the reactor body (11) is provided with an anti-reflective coating of ArF. The top cover (13) is located at the top of the reactor body (11). The top cover (13) is detachably connected to the reactor body (11) by bolts. The top of the top cover (13) is symmetrically provided with inlet ports (14). The inlet ports (14) are connected to the interior of the reactor body (11).

3. The photoresist reactor with an anti-reflective coating according to claim 2, characterized in that: The stirring structure (3) includes a rotating shaft (301) and a motor (302). The rotating shaft (301) is rotatably mounted on the top cover (13) and extends into the interior of the vessel body (11). Several stirring blades (303) are fixedly mounted on the rotating shaft (301). The motor (302) is fixedly mounted on the top of the top cover (13), and the motor shaft of the motor (302) is fixedly connected to the top of the rotating shaft (301).

4. The photoresist reactor with an anti-reflective coating according to claim 3, characterized in that: A crossbar (304) is symmetrically fixed on the rotating shaft (301), and a scraper (305) is fixedly installed on the crossbar (304).

5. The photoresist reactor with an anti-reflective coating according to claim 1, characterized in that: The discharge structure (4) includes a discharge pipe (41) and a pump (43). The discharge pipe (41) is fixedly installed at the bottom of the vessel body (11) and is connected to the interior of the vessel body (11). A solenoid valve (42) is fixedly installed on the discharge pipe (41).

6. The photoresist reactor with an anti-reflective coating according to claim 5, characterized in that: The inlet end of the pump (43) is connected to the discharge pipe (41), and the outlet end of the pump (43) is fixedly connected to the discharge pipe (44).

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