Adsorption pad for liquid crystal screen polishing machine

Abstract

The utility model discloses a adsorption pad for liquid crystal screen polishing machine relates to liquid crystal screen processing equipment technical field, including elastic adsorption layer, the bottom of elastic adsorption layer is equipped with vacuum adsorption layer, the bottom of vacuum adsorption layer is equipped with antistatic isolation layer, the bottom of antistatic isolation layer is equipped with heat conducting support layer, the bottom of heat conducting support layer is installed with buckle mechanism, the utility model discloses through elastic adsorption layer, vacuum adsorption layer, antistatic isolation layer and heat conducting support layer cooperation uses, through the surface micropore design of elastic adsorption layer can buffer protection screen, through vacuum flow guiding layer can ensure fixed stability, through antistatic isolation layer, can effectively lead away static electricity, through heat conducting support layer can quick heat dissipation, through the synergies of multiple structures, the stability, security and efficiency of liquid crystal screen polishing have been improved significantly, and then facilitate the use of personnel.

Description

Technical Field

[0001] This utility model relates to the technical field of LCD screen processing equipment, specifically to an adsorption pad used in an LCD screen polishing machine. Background Technology

[0002] In the LCD screen production process, the polishing stage has strict requirements for parameters such as screen flatness and light transmittance. By using an adsorption pad and adopting a vacuum adsorption method, the screen can be fixed without damage.

[0003] Vacuum adsorption using adsorption pads can fix LCD screens. Existing adsorption pads generally only fix them by vacuum adsorption alone, lacking a buffer protection structure. This makes thin, flexible LCD screens easy to break during polishing. At the same time, static electricity accumulation and poor heat dissipation will affect product yield and make them inconvenient for personnel to use. Utility Model Content

[0004] (a) Technical problems to be solved This invention provides an adsorption pad for a liquid crystal screen polishing machine, aiming to solve the problems mentioned in the background art.

[0005] (II) Technical Solution To achieve the above objectives, this utility model provides the following technical solution: an adsorption pad for a liquid crystal screen polishing machine, comprising an elastic adsorption layer, a vacuum adsorption layer at the bottom of the elastic adsorption layer, an antistatic isolation layer at the bottom of the vacuum adsorption layer, a thermally conductive support layer at the bottom of the antistatic isolation layer, and a snap-fit ​​mechanism installed at the bottom of the thermally conductive support layer.

[0006] As a preferred technical solution of this application, the surface of the elastic adsorption layer is provided with suction cups, and multiple sets of suction cups are distributed equidistantly around the circumference.

[0007] As a preferred technical solution of this application, the bottom of the elastic adsorption layer is provided with silicone elastic columns at equal intervals, and the bottom end of the silicone elastic columns is connected to the vacuum adsorption layer.

[0008] As a preferred technical solution of this application, the vacuum adsorption layer has a vacuum channel inside, an interface is provided on one side of the vacuum channel, and an anti-static isolation layer is connected to the bottom of the vacuum adsorption layer.

[0009] As a preferred technical solution of this application, the antistatic isolation layer includes an electrostatic dissipation layer disposed at the bottom of the vacuum adsorption layer, a conductive layer is disposed at the bottom of the electrostatic dissipation layer, and a thermally conductive support layer is connected to the bottom of the conductive layer.

[0010] As a preferred technical solution of this application, the thermally conductive support layer is provided with a heat dissipation channel inside, and a buckle mechanism is connected to the bottom of the thermally conductive support layer.

[0011] As a preferred technical solution of this application, the buckling mechanism includes a connecting block disposed at the bottom of the thermally conductive support layer, and the bottom of the connecting block is provided with a conical buckle.

[0012] (III) Beneficial Effects This invention utilizes an elastic adsorption layer, a vacuum adsorption layer, an antistatic isolation layer, and a thermally conductive support layer in combination. The microporous design on the surface of the elastic adsorption layer buffers and protects the screen, the vacuum conduit layer ensures stable fixation, the antistatic isolation layer effectively conducts static electricity, and the thermally conductive support layer allows for rapid heat dissipation. Through the synergistic effect of these multiple structures, the stability, safety, and efficiency of LCD screen polishing are significantly improved, thus facilitating user operation. Attached Figure Description

[0013] Figure 1 This is a front perspective view of the present utility model; Figure 2 This is a top perspective view of the present invention; Figure 3 This is a schematic diagram of the internal structure of the front part of this utility model; Figure 4 This is a schematic diagram of the elastic adsorption layer structure of this utility model; Figure 5 This utility model Figure 3 A magnified schematic diagram of part A in the diagram.

[0014] In the diagram: 1. Elastic adsorption layer; 101. Silicone elastic column; 102. Suction cup; 2. Vacuum adsorption layer; 201. Vacuum channel; 202. Interface; 3. Antistatic isolation layer; 301. Static dissipation layer; 302. Conductive layer; 4. Thermally conductive support layer; 401. Heat dissipation channel; 5. Snap-on mechanism; 501. Connecting block; 502. Conical snap-on. Detailed Implementation

[0015] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0016] The technical solution of this utility model will be further described in detail below with reference to the accompanying drawings and specific embodiments; Example: The present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments. Please refer to the accompanying drawings. Figures 1 to 5Please refer to the adsorption pad for LCD screen polishing machines provided in this application. Figure 1 and Figure 2 It includes an elastic adsorption layer 1, a vacuum adsorption layer 2 at the bottom of the elastic adsorption layer 1, an antistatic isolation layer 3 at the bottom of the vacuum adsorption layer 2, a thermally conductive support layer 4 at the bottom of the antistatic isolation layer 3, and a snap-fit ​​mechanism 5 installed at the bottom of the thermally conductive support layer 4. Specifically, the elastic adsorption layer 1 is made of silicone. When the LCD screen is placed on the elastic adsorption layer 1, the layer undergoes slight deformation due to the screen's gravity and subsequent vacuum adsorption force. Its surface can closely adhere to the flat or slightly curved surface of the LCD screen, avoiding screen scratches caused by rigid contact. Simultaneously, the cushioning effect of the elastic material disperses localized pressure during the polishing process, reducing the risk of screen deformation due to uneven force. The vacuum adsorption layer 2 is located at the bottom of the elastic adsorption layer 1. Through the negative pressure environment formed inside, the negative pressure is transmitted to the back of the LCD screen through the tiny pores of the elastic adsorption layer 1, firmly adsorbing the LCD screen onto the surface of the elastic adsorption layer 1. Meanwhile, the anti-static barrier... The release layer 3 can quickly conduct static electricity away through conductive paths, preventing static electricity from accumulating on the screen surface. It can also prevent static electricity from attracting dust and impurities in the air and contaminating the polished surface, and protect the sensitive electronic components inside the LCD screen from electrostatic breakdown damage. The thermal support layer 4 is made of aluminum alloy. Some of the heat generated during the polishing process is transferred to the vacuum adsorption layer 2 through the elastic adsorption layer 1, and then conducted to the thermal support layer 4 through the anti-static isolation layer 3. The thermal support layer 4 can quickly diffuse and conduct the heat to the outside of the polishing machine worktable, avoiding thermal deformation or performance damage caused by local heat accumulation on the screen. The bottom buckle mechanism 5 is used to stably fix the adsorption pad on the polishing machine worktable.

[0017] Please refer to this carefully. Figure 1 and Figure 2 The surface of the elastic adsorption layer 1 is provided with suction cups 102, and multiple sets of suction cups 102 are distributed equidistantly in a circle.

[0018] Please refer to this carefully. Figure 3 and Figure 4 The bottom of the elastic adsorption layer 1 is provided with silicone elastic columns 101 at equal intervals, and the bottom end of the silicone elastic columns 101 is connected to the vacuum adsorption layer 2.

[0019] Please refer to this carefully. Figure 2 and Figure 5 The vacuum adsorption layer 2 has a vacuum channel 201 inside, and an interface 202 is provided on one side of the vacuum channel 201. The bottom of the vacuum adsorption layer 2 is connected to an anti-static isolation layer 3.

[0020] Specifically, to achieve stable adsorption of the LCD screen, the suction cups 102 evenly distributed around the circumference of the elastic adsorption layer 1 are key to initial adhesion. When the LCD screen is placed on the adsorption pad, the suction cups 102 make close contact with the screen surface through their own elastic deformation, forming an initial seal and reducing relative sliding between the screen and the adsorption layer during polishing. Simultaneously, the silicone elastic pillars 101 evenly spaced at the bottom of the elastic adsorption layer 1 can adapt to the thickness and curvature of the LCD screen, compensating for differences in screen shape through elastic expansion and contraction, ensuring the adhesion between the suction cups 102 and the screen surface, and avoiding screen scratches or local gaps caused by rigid contact. The vacuum adsorption layer 2 is connected to the elastic adsorption layer 1 through the silicone elastic pillars 101. During use, interface 202... Connected to an external vacuum pump via pipeline, the air in the vacuum channel 201 is rapidly extracted after the vacuum pump is started, creating a negative pressure environment. The negative pressure is transmitted to the elastic adsorption layer 1 through the gaps between the silicone elastic pillars 101, further reducing the internal pressure of the suction cup 102, thereby enhancing the adsorption force of the suction cup 102 on the LCD screen. The antistatic isolation layer 3 connected to the bottom of the vacuum adsorption layer 2 provides electrostatic protection. During the polishing process, the friction between the LCD screen and the elastic adsorption layer 1 will generate static electricity. The antistatic isolation layer 3 conducts the static electricity away quickly through its own conductivity, preventing the accumulation of static electricity on the screen surface and avoiding the adsorption of dust and impurities in the air to contaminate the polished surface. It can also protect the sensitive electronic components inside the LCD screen from electrostatic breakdown damage, providing safety protection for the polishing process.

[0021] Please refer to this carefully. Figure 5 The antistatic isolation layer 3 includes an electrostatic dissipation layer 301 disposed at the bottom of the vacuum adsorption layer 2, a conductive layer 302 disposed at the bottom of the electrostatic dissipation layer 301, and a thermally conductive support layer 4 connected to the bottom of the conductive layer 302.

[0022] Please refer to this carefully. Figure 5 The heat-conducting support layer 4 has a heat dissipation channel 401 inside, and the bottom of the heat-conducting support layer 4 is connected to a buckle mechanism 5.

[0023] Please refer to this carefully. Figure 3 The latching mechanism 5 includes a connecting block 501 disposed at the bottom of the heat-conducting support layer 4, and a conical latch 502 is provided at the bottom of the connecting block 501.

[0024] Specifically, to achieve electrostatic protection and efficient heat dissipation, the electrostatic dissipation layer 301 is made of carbon-doped silicone. When static electricity is generated due to friction between the LCD screen and the upper adsorption structure, the electrostatic dissipation layer 301 first slowly releases the high concentration of static electricity through a weak conductive path within the material, preventing instantaneous static discharge from impacting the screen's electronic components. The bottom conductive layer 302 uses a metal mesh composite film material, which can quickly conduct any residual static electricity not completely dissipated by the electrostatic dissipation layer 301 to the thermally conductive support layer 4. Then, grounding is achieved through the connection between the thermally conductive support layer 4 and the polishing machine body, effectively preventing dust adsorption or component breakdown caused by static accumulation. Internal heat dissipation mechanisms are also included. Channel 401 can be connected to the cooling system of the polishing machine worktable. During the polishing process, the heat generated by the friction between the LCD screen and the adsorption pad is transferred to the thermally conductive support layer 4 through the elastic adsorption layer 1, the vacuum adsorption layer 2, and the anti-static isolation layer 3 in sequence. The heat flows quickly and is discharged in the heat dissipation channel 401, avoiding heat accumulation in the local area of ​​the screen, which may cause thermal deformation or aging of the adsorption pad material. At the same time, the thermally conductive support layer 4 is made of aluminum alloy, which provides stable support for the upper functional layers, ensuring that the adsorption pad does not deform under the polishing pressure and ensuring uniform distribution of adsorption force. The conical buckle 502 at the bottom of the connecting block 501 is adapted to the corresponding conical groove of the polishing machine worktable.

[0025] Working principle: The conical buckle 502 at the bottom of the connecting block 501 at the bottom of the heat-conducting support layer 4 is adapted to the corresponding conical groove on the worktable. The guiding property of the conical buckle 502 is used to achieve quick alignment. After pressing, the buckle is tightly engaged. Then, the LCD screen is placed on the surface of the elastic adsorption layer 1. The silicone elastic pillars 101, which are equidistantly arranged at the bottom of the elastic adsorption layer 1, deform differently according to the thickness and curvature of the screen. The elastic expansion and contraction compensate for the shape difference, ensuring that the suction cup 102 fits tightly in all areas of the screen. Then, the external vacuum pump is started. The vacuum pump draws air from the vacuum channel 201 through the interface 202 to form a stable negative pressure environment. The negative pressure is transmitted to the elastic adsorption layer 1 through the gap between the silicone elastic pillars 101, realizing the firm fixation of the LCD screen. During the polishing process, the LCD screen and the elastic adsorption layer... The static electricity generated by friction is first slowly released through a weak conductive path via the static dissipation layer 301 of the antistatic isolation layer 3. The residual static electricity is quickly conducted to the thermal support layer 4 via the bottom conductive layer 302, and then grounded by the connection between the support layer and the polishing machine body, thus completely eliminating static electricity accumulation and preventing dust adsorption or component breakdown. The heat generated by polishing friction is transferred to the thermal support layer 4 in sequence through the elastic adsorption layer 1, the vacuum adsorption layer 2, and the antistatic isolation layer 3. The heat dissipation channel 401 inside the thermal support layer 4 is connected to the worktable cooling system, and the heat flows out quickly in the channel. After polishing is completed, the vacuum pump is turned off, the negative pressure in the vacuum adsorption layer 2 gradually disappears, the elastic adsorption layer 1 and the silicone elastic column 101 reset under their own elasticity, the adsorption force of the suction cup 102 weakens, and the screen is easily removed safely.

[0026] The above description is only a preferred embodiment of the present utility model, but the protection scope of the present utility model is not limited thereto. Any equivalent substitutions or changes made by those skilled in the art within the technical scope disclosed in the present utility model, based on the technical solution and the inventive concept of the present utility model, should be included within the protection scope of the present utility model.

Claims

1. An adsorption pad for a liquid crystal screen polishing machine, comprising an elastic adsorption layer (1), characterized in that: The bottom of the elastic adsorption layer (1) is provided with a vacuum adsorption layer (2), the bottom of the vacuum adsorption layer (2) is provided with an antistatic isolation layer (3), the bottom of the antistatic isolation layer (3) is provided with a thermally conductive support layer (4), and the bottom of the thermally conductive support layer (4) is equipped with a buckle mechanism (5).

2. The adsorption pad for a liquid crystal screen polishing machine according to claim 1, characterized in that: The surface of the elastic adsorption layer (1) is provided with suction cups (102), and multiple sets of suction cups (102) are distributed equidistantly in a circle.

3. The adsorption pad for a liquid crystal screen polishing machine according to claim 2, characterized in that: The bottom of the elastic adsorption layer (1) is provided with silicone elastic columns (101) at equal intervals, and the bottom end of the silicone elastic column (101) is connected to the vacuum adsorption layer (2).

4. The adsorption pad for a liquid crystal screen polishing machine according to claim 3, characterized in that: The vacuum adsorption layer (2) has a vacuum channel (201) inside, and an interface (202) is provided on one side of the vacuum channel (201). The bottom of the vacuum adsorption layer (2) is connected to an anti-static isolation layer (3).

5. The adsorption pad for a liquid crystal screen polishing machine according to claim 4, characterized in that: The antistatic isolation layer (3) includes an electrostatic dissipation layer (301) disposed at the bottom of the vacuum adsorption layer (2), and a heat-dissipating conductive layer (302) is disposed at the bottom of the electrostatic dissipation layer (301), and a heat-dissipating support layer (4) is connected to the bottom of the heat-dissipating conductive layer (302).

6. The adsorption pad for a liquid crystal screen polishing machine according to claim 5, characterized in that: The heat-conducting support layer (4) has a heat dissipation channel (401) inside, and a buckle mechanism (5) is connected to the bottom of the heat-conducting support layer (4).

7. The adsorption pad for a liquid crystal screen polishing machine according to claim 6, characterized in that: The buckling mechanism (5) includes a connecting block (501) disposed at the bottom of the heat-conducting support layer (4), and the bottom of the connecting block (501) is provided with a conical buckle (502).

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