Partition synchronous lifting device and semiconductor equipment

Abstract

A kind of partition synchronous lifting device and semiconductor equipment, the driving unit in partition synchronous lifting device is connected with the power input end of any one lifting unit in multiple spaced lifting units, and all power input ends of lifting unit are mechanically connected using synchronous transmission component, so that the synchronous rotation of all power input ends of lifting unit, which makes the power output end of each lifting unit synchronous rise or fall, so that the power output end drives the partition structure to rise or fall synchronously in reaction cavity, so that the partition structure keeps steady posture during lifting, and is not prone to tilt, swing or vibration due to asynchronization. Therefore, the partition synchronous lifting device improves the synchronism of lifting movement, also prevents the risk of collision or friction between partition structure and other components in cavity, which is beneficial to reduce the generation of particles.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor equipment, and more particularly to a partition synchronous lifting device and a semiconductor device. Background Technology

[0002] In the field of semiconductor manufacturing technology, vacuum processing equipment serves as a platform for performing critical processes such as wafer fabrication, thin film deposition, and etching. Vacuum processing equipment typically contains one or more reaction chambers, which fabricate precision semiconductor devices on the wafer surface by performing physical or chemical treatments on the wafer in a highly controlled vacuum environment.

[0003] To achieve specific process objectives, various precision components are deployed within the reaction chamber, including a baffle to guide chemical gases to the wafer surface. This baffle moves vertically via a lifting mechanism, precisely controlling the flow distribution of the process gases while providing the necessary working space for the robotic arm to handle wafers.

[0004] Because the partition components are relatively large, current technologies generally employ two or more lifting mechanisms for synchronous drive. However, using multiple independent lifting mechanisms to drive a single partition results in asynchronous lifting. Utility Model Content

[0005] The present invention addresses the problem of providing a synchronous lifting device for a partition and a semiconductor device for maintaining a stable posture of the partition structure during lifting.

[0006] To address the aforementioned problems, this utility model provides a synchronous lifting device for a partition, used to drive a partition structure to switch the reaction chamber in the cavity between a process state and a transmission state. The device includes: multiple spaced-apart lifting units, each lifting unit comprising a power input end and a power output end, the power output end being connected to the partition structure to drive the partition structure to rise or fall within the reaction chamber; a synchronous transmission component connected to each of the lifting units to synchronously rotate the power input ends of each lifting unit; and a drive unit connected to the power input end of any one of the multiple spaced-apart lifting units.

[0007] Optionally, the synchronous transmission component includes: pulleys, disposed at each of the power input ends of each of the lifting units; a synchronous belt, surrounding each of the pulleys; and a tensioning mechanism, in contact with the synchronous belt, for adjusting the tension of the synchronous belt.

[0008] Optionally, the synchronous belt includes a toothed surface, and the pulley has a toothed profile that meshes with the toothed surface of the synchronous belt; the tensioning mechanism includes: a tensioning seat disposed at the bottom of the lifting unit; a tensioning bracket disposed on the tensioning seat; a toothed tensioning wheel, which is position-adjustable and rotatably disposed on the tensioning bracket and meshes with the toothed surface of the synchronous belt; and a back tensioning wheel, which is position-fixed and rotatably disposed on the tensioning bracket and abuts against the back side of the outer side of the synchronous belt.

[0009] Optionally, the tensioning bracket is provided with a sliding groove; the tensioning mechanism further includes: an adjusting slider, slidably disposed on the sliding groove, the toothed tensioning wheel disposed on the adjusting slider; an adjusting bolt passing through the tensioning bracket, and the end of the rod in the adjusting bolt being fixedly connected to the adjusting slider, the screw head of the adjusting bolt being located on the side of the tensioning bracket away from the adjusting slider; and a fixing nut, located on the rod between the screw head and the tensioning bracket, for fixing the position of the toothed tensioning wheel and adjusting the position of the toothed tensioning wheel relative to the back tensioning wheel to adjust the tension amplitude of the synchronous belt.

[0010] Optionally, the tensioning mechanism and the drive unit are mounted on different lifting units.

[0011] Optionally, the tensioning bracket is disposed on the side of the timing belt away from the cavity.

[0012] Optionally, there are two back tensioning wheels, and on the tensioning bracket, the two back tensioning wheels are respectively arranged on both sides of the toothed tensioning wheel.

[0013] Optionally, the outputs of multiple lifting units are at the same horizontal position.

[0014] Optionally, the lifting unit includes: a base connected to the bottom of the cavity; a linear guide rail disposed on the base and arranged vertically; a connector disposed on the slider of the linear guide rail; and a lead screw connected to the output end of the drive unit, wherein the lead screw and the connector are rotatably engaged, and the connector moves vertically when the lead screw rotates.

[0015] Optionally, the connector is provided with a limit block; the partition synchronous lifting device further includes: an upper mechanical limit, provided on the linear guide rail, for limiting the upper limit position of the connector; and a lower mechanical limit, provided on the linear guide rail and located below the upper mechanical limit, for limiting the lower limit position of the connector.

[0016] This utility model also provides a semiconductor device, comprising: a cavity including a reaction chamber; multiple bases located in the reaction chamber; a partition structure located in the reaction chamber, the partition structure having multiple partition spaces, and each partition space accommodating at least one of the bases; and a partition synchronous lifting device located below the cavity, the power output end of the partition synchronous lifting device being connected to the partition structure for driving the partition structure to rise or fall, thereby switching the reaction chamber between a process state for independently processing wafers and a transfer state for wafer pick-and-place.

[0017] Compared with the prior art, the technical solution of this utility model embodiment has the following advantages: The drive unit of the synchronous lifting device for partitions provided in this embodiment is connected to the power input end of any one of the multiple spaced-apart lifting units, and a synchronous transmission component mechanically connects the power input ends of all lifting units. This allows the power input ends of all lifting units to rotate synchronously, resulting in synchronous rises or falls of the power output ends of each lifting unit. Consequently, the power output ends drive the partition structure to rise or fall synchronously within the reaction chamber, maintaining a stable posture during lifting and lowering, preventing tilting, swaying, or vibration caused by asynchrony. Therefore, the synchronous lifting device for partitions not only improves the synchronicity of lifting movements but also prevents the partition structure from colliding or rubbing against other components in the chamber, thus reducing the generation of particulate matter.

[0018] The semiconductor device provided in this embodiment includes: a cavity, including a reaction chamber; multiple bases located within the reaction chamber; a partition structure located within the reaction chamber, the partition structure having multiple partition spaces, each partition space accommodating at least one base; and a partition synchronous lifting device located below the cavity, the power output end of the partition synchronous lifting device being connected to the partition structure for driving the partition structure to rise or fall, switching the reaction chamber between a process state for independently processing wafers and a transfer state for wafer pick-and-place. When the partition structure descends, it divides the reaction chamber into multiple independent spaces, each process state accommodating at least one base. Processing of different wafers does not interfere with each other, allowing wafers on each base to be processed independently, which is beneficial for improving product yield. When the partition structure rises, the reaction chamber is in a transfer state, facilitating the removal of wafers from multiple bases from the reaction chamber, which is beneficial for improving wafer transfer efficiency and the reliability of the semiconductor device. Attached Figure Description

[0019] Figure 1 This is a schematic diagram of the structure of the synchronous lifting device for the middle partition of this utility model at the upper limit position; Figure 2 yes Figure 1 Schematic diagram of the cross-sectional structure at point BB; Figure 3 This is a schematic diagram of the structure of the synchronous lifting device for the middle partition in this utility model at the lower limit position; Figure 4 yes Figure 3 Schematic diagram of the cross-sectional structure at point BB; Figure 5 This is a partial isometric view of the synchronous lifting device for the middle partition of this utility model; Figure 6 This is a schematic diagram of the tensioning mechanism before tensioning in this utility model; Figure 7 This is a schematic diagram of the tensioning mechanism after tensioning in this utility model; Figure 8 This is a schematic diagram of the partition structure of this utility model. Detailed Implementation

[0020] As the background technology indicates, the technical solution of using multiple independent lifting units to drive a single partition suffers from the defect of asynchronous lifting. Due to the cumulative errors in the mechanical transmission and control system, it is difficult for multiple lifting units to maintain absolute synchronization during operation, thus causing motion loss. This asynchronous movement directly disrupts the horizontal posture of the partition, leading to instability in machine operation. More seriously, motion loss can cause the partition to collide or rub against other parts in the reaction chamber. This mechanical interference not only generates particles that directly contaminate the wafer and reduce product yield, but also causes physical damage to the partition and the lifting unit itself, ultimately significantly reducing the stability and reliability of the equipment.

[0021] To address the aforementioned technical problem, the drive unit in the synchronous lifting device for the partition provided in this embodiment is connected to the power input end of any one of the multiple spaced-apart lifting units. A synchronous transmission component mechanically connects the power input ends of all lifting units, causing them to rotate synchronously. This allows the power output ends of each lifting unit to rise or fall synchronously, thereby driving the partition structure to rise or fall synchronously within the reaction chamber. This ensures the partition structure maintains a stable posture during lifting and lowering, reducing the likelihood of tilting, swaying, or vibration due to asynchrony. Therefore, the synchronous lifting device for the partition improves the synchronicity of the lifting motion and also prevents the partition structure from colliding or rubbing against other components in the chamber, thus reducing the generation of particulate matter.

[0022] To make the above-mentioned objectives, features and advantages of the present invention more apparent and understandable, the specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

[0023] Figure 1 This is a schematic diagram of the structure of the synchronous lifting device for the middle partition of this utility model; Figure 2 yes Figure 1 Schematic diagram of the cross-sectional structure at point BB; Figure 5 This is a partial isometric view of the synchronous lifting device for the partition plate of this utility model.

[0024] The partition synchronous lifting device is used to drive the partition structure 200 (e.g. Figure 2 As shown), the reaction chamber 501 in the cavity 500 is switched between a process state and a transmission state, including: multiple spaced-apart lifting units 100, each lifting unit 100 including a power input end 101 and a power output end 102, the power output end 102 being connected to a partition structure 200 to drive the partition structure 200 to rise or fall in the reaction chamber 501; a synchronous transmission component 300, connected to each lifting unit 100, for making the power input end 101 of each lifting unit 100 rotate synchronously; and a drive unit 400, connected to the power input end 101 of any one of the multiple spaced-apart lifting units 100.

[0025] The drive unit 400 of the partition synchronous lifting device provided in this embodiment is connected to the power input end 101 of any one of the multiple spaced-apart lifting units 100, and a synchronous transmission component 300 is used to mechanically connect the power input ends 101 of all lifting units 100, so that the power input ends 101 of all lifting units 100 rotate synchronously. This causes the power output ends 102 of each lifting unit 100 to rise or fall synchronously, thereby driving the partition structure 200 to rise or fall synchronously in the reaction chamber 501. This ensures that the partition structure 200 maintains a stable posture during the lifting process and is less prone to tilting, swaying, or vibration caused by asynchrony. Therefore, the partition synchronous lifting device not only improves the synchronicity of the lifting motion, but also prevents the partition structure 200 from colliding or rubbing against other components in the chamber 500, which helps to reduce the generation of particles.

[0026] In some embodiments, the reaction chamber 501 is provided with a plurality of bases and partition structures 200, the partition structures 200 having a plurality of partition spaces, and each partition space accommodating at least one base.

[0027] As an example, the base 600 includes: a wafer carrier (not shown) for carrying a wafer; and a support (not shown) located at the bottom of the wafer carrier and in contact with the cavity 500.

[0028] A wafer carrier is a support structure for wafers during processing, providing a stable support surface to ensure the wafer is positioned correctly during the process. The support portion is located at the bottom of the wafer carrier to support it.

[0029] In this embodiment, the wafer carrier can accommodate wafers of a specific size to meet the wafer processing requirements.

[0030] In some embodiments, a plurality of phase-spaced lifting units 100 are provided. Each lifting unit 100 includes a power input end 101 and a power output end 102. The power output end 102 is connected to the partition structure 200 and drives the partition structure 200 to rise or fall in the reaction chamber 501. Multiple phase-separated lifting units 100 are provided to offer multi-point support for the large partition structure 200, thereby stabilizing the lifting of the partition structure 200. Specifically, by connecting the power output terminals 102 of each lifting unit 100 to different positions on the partition structure 200, the thrust or pull generated during the lifting process is evenly distributed on the partition structure 200, reducing the probability of structural tilting and vibration caused by single-point support. This allows the partition structure 200 to rise or fall smoothly in the reaction chamber 501, thereby enabling the switching of the reaction chamber 501 between the process state for independent wafer processing and the transfer state for wafer pick-and-place.

[0031] In some embodiments, the power output terminals 102 of the plurality of lifting units 100 are rigidly connected to the partition structure 200 at different positions. This rigid connection allows the lifting displacement of the power output terminals 102 of the lifting units 100 to be transmitted to the partition structure 200 without delay or deformation. For example, this can be achieved by bolt fixing.

[0032] In some embodiments, the lifting unit 100 is a rotary linear motion conversion component. Specifically, the lifting unit 100 includes: a base 103 (e.g., Figure 2 As shown), it is connected to the bottom of the cavity 500; linear guide 104 (as shown) Figure 1 As shown), it is set on the base 103, and the linear guide 104 is set in the vertical direction; the connecting part is set on the slider 105 of the linear guide 104 (as shown). Figure 1 (as shown) on; lead screw 106 (as shown) Figure 1 As shown), it is connected to the output end of the drive unit 400, and the lead screw 106 is rotatably engaged with the connecting member. When the lead screw 106 rotates, the connecting member moves vertically.

[0033] After receiving the rotational power from the drive unit 400, the lead screw 106, in conjunction with the rotation of the connecting member, converts the rotational motion into vertical displacement of the connecting member. Simultaneously, the linear guide rail 104 mounted on the base 103 guides and constrains the movement of the connecting member mounted on its slider 105, thus strictly limiting the movement of the connecting member to the vertical direction and preventing swaying or deflection during lifting. Therefore, under the combined action of the lead screw 106 and the linear guide rail 104, the power output end 102 of the lifting unit 100 can achieve smooth vertical lifting, enabling the partition structure 200 to move smoothly and accurately.

[0034] As an example, the base 103 is bolted to the bottom of the outside of the reaction chamber 501, providing an installation reference for the entire lifting unit 100.

[0035] As an example, the screw shaft of the lead screw 106 is driven to rotate by the drive unit 400, and a nut that mates with the screw shaft of the lead screw 106 is fixed together with a connecting member. For example, the lead screw 106 includes a ball screw, which realizes the conversion of rotary motion to linear motion by the rolling of balls.

[0036] It should be noted that the nut fixed to the connecting piece has an internal thread (not shown in the figure) for rotatable connection with the screw shaft of the lead screw 106. Specifically, the internal thread is a T-type internal thread. Compared with ordinary triangular threads, T-type internal threads have a wider tooth profile and a larger tooth angle, resulting in a larger contact area. This better reduces stress concentration, allowing T-type threads to withstand higher axial loads, which is beneficial for applications with high torque and heavy loads. In addition, T-type threads also have a self-locking function to prevent the thread from rotating due to load when the motor is not operating.

[0037] It should also be noted that the lifting unit 100 includes a lifting rod 110 (e.g., Figure 2 As shown, the top of the lifting rod 110 extends into the reaction chamber 501 and connects to the partition structure 200, while the bottom of the lifting rod 110 connects to the connecting piece. When the slider 105 of the linear guide rail 104 moves, it drives the connecting piece and the lifting rod 110 to move synchronously.

[0038] It should be noted that the power input end 101 includes one end of the lead screw 106 in the lifting unit 100, and the power output end 102 includes the top of the lifting rod 110.

[0039] The lifting unit 100 also includes a sealing tube 111, which is sleeved on the outside of the lifting rod 110. The sealing tube 111 can adjust its length along its axial direction to ensure the sealing of the reaction chamber 501 and to maintain the pressure difference isolation inside and outside the chamber 500 when the lifting rod 110 moves.

[0040] As an example, the sealing tube 111 includes a corrugated tube.

[0041] The sealing tube 111 has a first connecting end (not shown in the figure) and a second connecting end (not shown in the figure) at both ends. The first connecting end of the sealing tube 111 is fixedly and sealed to the bottom of the reaction chamber 501. The second connecting end of the sealing tube 111 is fixedly and sealed to the bottom of the lifting rod 110.

[0042] Since the first connecting end of the sealing tube 111 is fixed to the static reaction chamber 501 and the second connecting end is fixed to the dynamic lifting rod 110, the sealing tube 111 will be compressed or stretched accordingly when the lifting rod 110 moves up and down. It is by utilizing its own elastic deformation to compensate for the lifting stroke, thereby continuously ensuring the seal of the reaction chamber 501.

[0043] As an example, the linear guide 104 includes a linear rail, which is fixed vertically to the base 103, and a slider 105 is used to slide on the linear rail.

[0044] As an example, the connector is fixed to the slider 105 of the linear guide 104, and the connector has a mounting structure that is fixed to the ball screw nut.

[0045] When the drive unit 400 drives the ball screw to rotate, the nut fixed on the connector cannot rotate because it is constrained by the linear guide 104, and can only move linearly along the axis of the screw. Because the slider 105 of the linear guide 104 is fixed to the connector, the connector can only move along the vertical path of the linear guide, ultimately converting the rotation into the vertical lifting motion of the connector.

[0046] In some embodiments, a limit block (not shown in the figure) is provided on the connector; the partition synchronous lifting device further includes: an upper mechanical limit 108, which is provided on the linear guide rail 104 and is used to limit the upper limit position of the connector; and a lower mechanical limit 109, which is provided on the linear guide rail 104 and located below the upper mechanical limit 108 and is used to limit the lower limit position of the connector.

[0047] The limiting block on the connector is connected to the upper mechanical limit 108 (e.g.) Figure 1 (as shown) and lower mechanical limit 109 (as shown) Figure 1 (As shown) This works in conjunction with the lifting unit 100 to ensure its safe operation. Specifically, when the movement of the connecting member exceeds the preset safety range, the limiting block on the connecting member will collide with the corresponding upper mechanical limit 108 or lower mechanical limit 109, forcibly terminating the lifting movement, thereby preventing the partition structure 200 from colliding with the top or bottom of the cavity 500, which helps to ensure the safety and reliability of the synchronous lifting device of the cavity 500 and the partition.

[0048] As an example, the limiting block is a metal block that protrudes from the side of the connector, and the position of the limiting block can trigger the trigger points of the upper mechanical limit 108 and the lower mechanical limit 109.

[0049] As an example, the upper mechanical limit 108 and the lower mechanical limit 109 are made of impact-resistant metal and can withstand the impact force of the connector. The upper mechanical limit 108 and the lower mechanical limit 109 are fixed on the linear guide of the linear guide 104.

[0050] The partition synchronous lifting device also includes: an upper limit sensor 112 (such as...) Figure 2 As shown), it is set on the moving path of the connector and located below the upper mechanical limit 108; the lower limit sensor 113 (as shown) Figure 2 As shown), it is set on the moving path of the connector and located above the lower mechanical limit 109; the controller is connected to the upper limit sensor 112, the lower limit sensor 113 and the drive unit 400, and is used to stop the drive unit 400 from rotating when the connector passes the upper limit sensor 112 or the lower limit sensor 113.

[0051] By setting an upper limit sensor 112 and a lower limit sensor 113 on the movement path of the connector, when the connector moves near the upper limit sensor 112 or the lower limit sensor 113, the upper limit sensor 112 or the lower limit sensor 113 can detect the connector and send a stop signal to the controller, causing the drive unit 400 to stop rotating. The controller ensures that the vertical movement of the partition structure 200 is strictly limited by receiving signals from the upper limit sensor 112 and the lower limit sensor 113.

[0052] It should be noted that the upper mechanical limit 108 and lower mechanical limit 109 are designed to physically prevent excessive movement of the connector. This is a passive safety measure used to prevent the partition structure 200 from colliding with the top or bottom of the cavity 500 in the event of controller failure. The upper limit sensor 112 and lower limit sensor 113 provide an active safety control mechanism. When the connector is detected passing by, they send a control signal to the controller, causing the controller to control the drive unit 400 to decelerate and stop rotating, reducing the probability of the connector colliding with the upper mechanical limit 108 and lower mechanical limit 109.

[0053] It should be noted that the power output ends 102 of the multiple lifting units 100 are at the same horizontal position.

[0054] All the power output ends 102 of the lifting units 100 are on the same horizontal plane, which enables the partition structure 200 connected to multiple output ends to maintain a horizontal posture in the initial position and during movement, reducing or eliminating the tilting torque caused by the inconsistent height of each support point, thereby preventing the partition structure 200 from swaying or vibrating during lifting and avoiding interference or collision between the partition structure 200 and the inner wall of the reaction chamber 501 or other components.

[0055] In some embodiments, the synchronous transmission component 300 is connected to each lifting unit 100 and is used to make the power input terminal 101 of each lifting unit 100 rotate synchronously.

[0056] The synchronous transmission component 300 enables multiple lifting units 100 to move synchronously. The synchronous transmission component 300 distributes the power of a single drive unit 400 to the power input terminal 101 of each lifting unit 100. This fundamentally eliminates the asynchronous movement caused by electrical control delays or differences in motor performance between multiple independent drive sources, allowing the power output terminals 102 of each lifting unit 100 to generate synchronous linear displacement. Therefore, the synchronous transmission component 300, in conjunction with a drive unit 400, enables smooth lifting and lowering of the partition structure 200.

[0057] Specifically, the synchronous transmission component 300 includes: a pulley 301 (e.g., Figure 2 As shown), it is installed at each power input end 101 of each lifting unit 100; synchronous belt 302 (as shown) Figure 2 As shown), it is arranged around each pulley 301; tensioning mechanism 303 (as shown) Figure 2 As shown), it contacts the timing belt 302 and is used to adjust the tension of the timing belt 302.

[0058] The synchronous belt 302 engages with all the pulleys 301 to form a mechanical transmission circuit. The adjustable preload provided by the tensioning mechanism 303 to the synchronous belt 302 ensures that the teeth of the synchronous belt 302 and the tooth grooves of the pulleys 301 are always in close mesh, thereby eliminating the transmission gap between the teeth of the synchronous belt 302 and the tooth grooves of the pulleys 301, maintaining a constant transmission ratio and accurate motion transmission. Therefore, the tensioning mechanism 303 is crucial for the synchronous transmission component 300 to achieve long-term synchronous transmission, which helps improve the transmission accuracy and service life of the entire partition synchronous lifting device.

[0059] As an example, the timing belt 302 includes toothed surfaces and is a closed-loop toothed belt with a defined tooth profile and pitch. The timing belt 302 is made of rubber or polyurethane material.

[0060] As an example, pulley 301 has a tooth profile that meshes with the tooth surface described in synchronous belt 302.

[0061] When the drive unit 400 drives the power input end 101 of one of the lifting units 100 to rotate, the pulley 301 on the power input end 101 will rotate accordingly. Through the tooth meshing transmission between the pulley 301 and the synchronous belt 302, the rotation is transmitted to all other pulleys 301 in the transmission circuit without slippage.

[0062] As an example, the tooth surface on the timing belt 302 includes trapezoidal teeth or arcuate teeth, and the teeth on the timing belt 302 are used to mesh with the tooth grooves on the pulley 301.

[0063] Specifically, the tensioning mechanism 303 includes: a tensioning seat 3031, disposed at the bottom of the lifting unit 100; a tensioning bracket 3032, disposed on the tensioning seat 3031; a toothed tensioning wheel 3033, which is adjustable and rotatably disposed on the tensioning bracket 3032 and meshes with the toothed surface of the timing belt 302; and one or more back tensioning wheels 3034, which are fixed in position and rotatably disposed on the tensioning bracket 3032 and abut against the back side of the outer side of the timing belt 302.

[0064] The tensioning mechanism 303 applies preload to the synchronous belt 302 to ensure reliable meshing between the tooth surface of the synchronous belt 302 and the tooth grooves of each pulley 301, preventing tooth skipping during load start-up, load stop-up, or load changes, and improving the reliability of synchronous transmission. Specifically, through the combined action of the tooth surface tensioning pulley 3033 and the back tensioning pulley 3034, tension is applied to the synchronous belt 302 while increasing the wrap angle of the synchronous belt 302 on each pulley 301, allowing more teeth to participate in meshing transmission simultaneously, enhancing transmission torque, and improving transmission smoothness.

[0065] Tensioner 3031 is fixedly installed at the bottom of a lifting unit 100, providing a stable installation reference for tensioning mechanism 303.

[0066] The tensioning bracket 3032 is mounted on the tensioning seat 3031 and is used to mount the toothed tensioning wheel 3033 and the back tensioning wheel 3034.

[0067] It should be noted that the tensioning bracket 3032 is equipped with an adjustment mechanism, such as an adjustment screw. The position of the toothed tensioning wheel 3033 or the back tensioning wheel 3034 can be changed through the adjustment mechanism, thereby adjusting the tension applied to the timing belt 302.

[0068] As an example, the toothed tensioner 3033 is a toothed idler pulley, and the tooth profile of the toothed tensioner 3033 perfectly matches the tooth surface of the synchronous belt 302. The toothed tensioner 3033 is rotatably mounted on the tensioning bracket 3032 via bearings.

[0069] As an example, the back tensioner 3034 is a smooth idler pulley. The back tensioner 3034 is rotatably mounted on the tension bracket 3032 via bearings. The back tensioner 3034 is used to abut against the smooth back of the timing belt 302 to increase the wrap angle of the belt body on the toothed tensioner 3033, the driving pulley 301 connected to the drive unit 400, and the driven pulley 301.

[0070] Connection and Coordination: The tensioning seat 3031 is fixed to the lifting unit 100, and the tensioning bracket 3032 is pivotally connected to the tensioning seat 3031. The toothed tensioning pulley 3033 and the back tensioning pulley 3034 are both installed at the free end of the tensioning bracket 3032. During assembly, the synchronous belt 302 passes around the pulleys 301 of each lifting unit 100 according to a predetermined path and passes through the tensioning mechanism 303.

[0071] Before operation, the angle of the tensioning bracket 3032 is adjusted so that the toothed tensioning wheel 3033 presses against the toothed surface of the synchronous belt 302, while the back tensioning wheel 3034 abuts against the back of the synchronous belt 302, tightening the synchronous belt 302 to the preset tension value. During operation, the toothed surface of the synchronous belt 302 meshes with the tooth grooves of the active pulley 301 on the power input end 101 of the active lifting unit 100 and the driven pulley 301 on the power input end 101 of the driven lifting unit 100. Simultaneously, the toothed surface of the synchronous belt 302 also meshes with the toothed tensioning wheel 3033 in the tensioning mechanism 303. When the drive unit 400 drives the active pulley 301 to rotate, through the meshing of the toothed surfaces, the synchronous belt 302 is driven and causes all the driven pulleys 301 to rotate at the same angular velocity and direction, thereby precisely distributing a single power source to all lifting units 100.

[0072] As an example, the number of back tensioning rollers 3034 is two.

[0073] Compared to the case of a single back tensioner 3034, the two back tensioners 3034 increase the wrap angle of the synchronous belt 302 on the tooth surface tensioner 3033, thereby increasing the number of meshing teeth. This helps to reduce the probability of tooth skipping under high load or dynamic conditions and improves the reliability of the tensioning mechanism 303 transmission.

[0074] It should be noted that on the tensioning bracket 3032, two back tensioning pulleys 3034 are respectively arranged on both sides of the toothed tensioning pulley 3033. The path of the timing belt 302 is to first go around the lower surface of the first back tensioning pulley 3034, then around the upper surface of the toothed tensioning pulley 3033 (for toothed meshing), and finally around the lower surface of the second back tensioning pulley 3034.

[0075] In some embodiments, the tensioning bracket 3032 is located on the side of the timing belt 302 away from the cavity 500.

[0076] The tensioning bracket 3032 is used for adjusting and maintaining the tensioning mechanism 303. The tensioning bracket 3032 is located on the side of the synchronous belt 302 away from the cavity 500. That is to say, the tensioning bracket 3032 is far away from the main body of the lifting unit 100, which helps to increase the operating space for later inspection and maintenance of the tensioning mechanism 303.

[0077] Specifically, such as Figure 5 As shown, the tensioning bracket 3032 is provided with a sliding groove 3032a; the tensioning mechanism 303 further includes: an adjusting slider 3035, which is slidably disposed on the sliding groove 3032a, and the toothed tensioning wheel 3033 is disposed on the adjusting slider 3035; an adjusting bolt 3036 passes through the tensioning bracket, and the end of the rod in the adjusting bolt 3036 is fixedly connected to the adjusting slider, and the screw head of the adjusting bolt 3036 is located on the side of the tensioning bracket 3032 away from the adjusting slider 3035; a fixing nut 3037 is located on the rod between the screw head and the tensioning bracket 3032, and is used to fix the position of the toothed tensioning wheel and adjust the position of the toothed tensioning wheel relative to the back tensioning wheel to adjust the tension amplitude of the synchronous belt.

[0078] During the tensioning process, pulling the adjusting bolt 3036 causes the adjusting slider 3035, which is fixed to it, to move within the groove 3032a. Since the toothed tensioning wheel 3033 is mounted on the adjusting slider 3035, its position changes. When the adjusting slider 3035 moves away from the back tensioning wheel, the toothed tensioning wheel 3033 further presses against the synchronous belt 302, increasing the tension. When the adjusting slider 3035 moves closer to the tensioning wheel 3033, the tension decreases. Once the tension belt is adjusted to the appropriate tension, tightening the fixing nut 3037 on the adjusting bolt 3036 fixes the position of the adjusting bolt 3036 relative to the tension bracket 3032, thereby locking the position of the toothed tensioning wheel on the adjusting slider 3035 and maintaining constant tension in the synchronous belt.

[0079] like Figure 6 As shown, the tensioning mechanism 303 is in the state before adjustment, at which time there is a gap between the pulley 301 and the timing belt 302. Figure 7 The diagram shows the tension state after the adjusting slider 3035 is moved to a predetermined position by rotating the adjusting bolt 3036. In this state, the toothed tensioning wheel 3033 presses the timing belt 302, enabling synchronous transmission.

[0080] It should be noted that the tensioning bracket 3032 also includes a reset push rod 3038, which is used to penetrate the tensioning bracket 3032 from the outside and extend into the slide groove 3032a to push the toothed tensioning wheel 3033 on the adjusting slider 3035 closer to the back tensioning wheel 3034. The end of the reset push rod 3038 is used to abut against and push the adjusting slider 3035, causing the toothed tensioning wheel 3033 to move towards the back tensioning wheel, thereby relaxing the timing belt 302.

[0081] In some embodiments, the drive unit 400 is connected to the power input terminal 101 of any one of the plurality of spaced-apart lifting units 100.

[0082] The drive unit 400 outputs power to one lifting unit 100, and then distributes the power to all the lifting units 100 through the synchronous transmission component 300. This fundamentally eliminates the problem of asynchronous movement caused by motor start-stop, speed differences, or control signal delays when multiple independent drive units 400 work simultaneously, ensuring that all lifting units 100 move in unison. As an example, drive unit 400 includes a servo motor.

[0083] It should be noted that the synchronous lifting device for the partition includes: coupling 700 (e.g., Figure 1 As shown in the figure, the synchronous transmission component 300 is located between the drive unit 400 and the lifting unit 100. In the transmission direction, the synchronous transmission component 300 is located at the power input end 101 downstream of the coupling 700.

[0084] The coupling 700 connects the output shaft of the drive unit 400 and the power input end 101 of the lifting unit 100. While transmitting torque, the coupling 700 can also compensate for the slight coaxiality error between the output shaft and the power input end 101, improve the smoothness of power transmission, and extend service life.

[0085] As an example, coupling 700 includes flexible couplings, such as swivel couplings or diaphragm couplings. Specifically, one end of coupling 700 is connected to the output shaft of drive unit 400, and the other end of coupling 700 is connected to the power input end 101 of main lifting unit 100, which is the input shaft of lead screw 106.

[0086] It should be noted that the pulley 301 is mounted on the exposed lead screw 106 of the coupling 700.

[0087] During operation, the rotational power generated by the drive unit 400 is transmitted to the lead screw 106 via the coupling 700. In this process, the coupling 700 absorbs the installation error between the motor's output shaft and the lead screw 106. Subsequently, the already smoothly rotating lead screw 106 directly drives the pulley 301 fixed on it to rotate. This pulley 301 then transmits the motion to other lifting units 100 via the synchronous belt 302, achieving smooth lifting and lowering of the partition structure 200.

[0088] In some embodiments, the tensioning mechanism 303 and the drive unit 400 are disposed on different lifting units 100.

[0089] The drive unit 400, which serves as the power source, and the tensioning mechanism 303, which is responsible for adjusting the tension, are respectively set on different lifting units 100. This results in a spatially distributed layout of the main functional components of the equipment. This avoids the drive unit 400 and the tensioning mechanism 303 being too concentrated, which would cause an imbalance in the weight distribution of the entire partition synchronous lifting device. At the same time, it provides sufficient installation and heat dissipation space for the drive unit 400 and the tensioning mechanism 303, thereby improving the operational reliability of the partition synchronous lifting device.

[0090] The output shaft of the motor of the drive unit 400 is connected to the end of the left lead screw 106 (i.e., the power input end 101) via a coupling 700. A pulley 301 is fixedly mounted on the lead screw 106, serving as the driving pulley. A synchronous belt 302 surrounds the driving pulley 301 and the driven pulley 301 mounted on the lead screw 106 in the right lifting unit 100. Furthermore, a tensioning mechanism 303 is provided on the right lifting unit 100, with the synchronous belt 302 wrapped around the toothed tensioning pulley 3033 and the back tensioning pulley 3034 within the tensioning mechanism. When the drive unit 400 rotates, power is transmitted to the driving pulley 301 via the coupling 700, and the driving pulley 301 drives all driven pulleys to rotate synchronously via the synchronous belt 302. The lead screws 106 in each lifting unit 100 rotate synchronously, and through cooperation with the connecting parts, the rotational motion is converted into synchronous vertical linear motion of the connecting parts. Because the connecting parts are connected to the bottom of the lifting rod 110, the lifting rod 110 (including the power output end 102) connected to each connecting part rises and falls synchronously, thereby driving the partition structure 200 to achieve a smooth and synchronous rising and falling motion in the reaction chamber 501 of the cavity 500.

[0091] Combination Figures 1 to 5This utility model also provides a semiconductor device. The semiconductor device includes: a cavity 500, including a reaction cavity 501; a plurality of bases 600 located in the reaction cavity 501; a partition structure 200 located in the reaction cavity 501, the partition structure 200 having a plurality of partition spaces, and each partition space accommodating at least one base 600; a partition synchronous lifting device located below the cavity 500, the power output end 102 of the partition synchronous lifting device being connected to the partition structure 200 for driving the partition structure 200 to rise or fall, switching the reaction cavity 501 between multiple process states for independently processing wafers and a transfer state for wafer pick-and-place.

[0092] The semiconductor device provided in this embodiment of the invention, when the partition structure 200 is driven to descend by the partition synchronous lifting device, divides the reaction chamber 501 into multiple independent spaces. Each independent space accommodates at least one substrate 600. The processing of different wafers does not interfere with each other, allowing the wafers on each substrate 600 to be processed independently, which is beneficial to improving product yield. When the partition structure 200 is driven to rise by the partition synchronous lifting device, the reaction chamber 501 is in a transfer state, which facilitates the removal of wafers from multiple substrates 600 from the reaction chamber 501, which is beneficial to improving wafer transfer efficiency and enhancing the reliability of the semiconductor device.

[0093] The cavity 500 provides a closed or semi-closed space that can effectively isolate the external environment and protect the wafer from external contamination, providing a reaction chamber 501 for vapor deposition or plasma etching processes.

[0094] In this embodiment, the cavity 500500 is equipped with a gas flow, pressure control and temperature control system to enable precise control of the internal environment of the cavity 500500, such as air pressure, gas composition and temperature.

[0095] A wafer carrier is a support structure for wafers during processing, providing a stable support surface to ensure the wafer is positioned correctly during the process. The support portion is located at the bottom of the wafer carrier and is used to support the wafer carrier.

[0096] The partition mechanism 200 is located in the reaction chamber 501 and is arranged around the outer periphery of the base 600. For example... Figure 8 As shown, the isolation structure includes: a bracket 201, which includes a plurality of through holes 201a; a cylindrical structure 202 extending downward along the edge of the through holes 201a to form a receiving cavity for accommodating the base 600; and a flange 203 extending horizontally along the bottom of the cylindrical structure 202 toward the center of the cylindrical structure 202.

[0097] The bracket 201 provides a mounting surface for the partition mechanism 200. Multiple through holes 201a correspond one-to-one with the lower base 600. When the partition structure descends, the cylindrical structure 202 surrounds each base 600, forming physically independent partitioned spaces and preventing gas crosstalk between different process areas. The flange 203 is used to mate with the base 600 or its surrounding structure, further enhancing the sealing of the partitioned spaces and ensuring the independence of each process unit.

[0098] The top of the lifting rod 110 is provided with a power output end 102, which is located inside the reaction chamber 501 and below or to the side of the base 600. The edge of the bracket 201 of the partition structure 200 is fixedly provided on the top of the power output end 102.

[0099] As an example, the bracket 201 of the partition structure 200 is fixedly mounted on the top of the power output end 102 via threaded fasteners. Specifically, the threaded fasteners pass vertically through the mounting holes of the partition structure 200 and are screwed into the threaded holes of the power output end 102, thereby achieving a detachable connection. This connection method ensures that the partition structure 200 can rise and fall synchronously with the axial movement of the lifting rod 110, thereby changing the height position of the partition structure 200 relative to the base 600.

[0100] In some embodiments, there are two lifting units 100, both of which are located at the bottom edge of the cavity 500. One is located on the left side of the cavity 500, and the other is located on the right side of the cavity 500, so that the power output end 102 of the lifting unit 100 can be easily connected to the edge of the isolation structure.

[0101] Specifically, such as Figure 1 and Figure 2 The diagram illustrates the structure of the semiconductor device when the partition structure 200 is located at the top of the reaction chamber 501. Figure 3 and Figure 4 The diagram shows the structure of the semiconductor device when the partition structure 200 is located at the bottom limit position of the reaction chamber 501.

[0102] While the present invention has been disclosed above, it is not limited thereto. Any person skilled in the art can make various modifications and alterations without departing from the spirit and scope of the present invention; therefore, the scope of protection of the present invention should be determined by the scope defined in the claims.

Claims

1. A partition synchronous lifting device, characterized in that, Used to drive the partition structure, switching the reaction chamber in the cavity between process state and transfer state, including: Multiple phase-spaced lifting units, each lifting unit including a power input end and a power output end, the power output end being connected to the partition structure, driving the partition structure to rise or fall in the reaction chamber; A synchronous transmission component is connected to each of the lifting units and is used to make the power input ends of each of the lifting units rotate synchronously. The drive unit is connected to the power input terminal of any one of the plurality of spaced-apart lifting units.

2. The partition synchronous lifting device as described in claim 1, characterized in that, The synchronous transmission component includes: Pullers are provided at each of the power input ends of each of the lifting units; A timing belt is wound around each of the pulleys; The tensioning mechanism contacts the timing belt and is used to adjust the tension of the timing belt.

3. The partition synchronous lifting device as described in claim 2, characterized in that, The timing belt includes a toothed surface, and the pulley has a toothed profile that meshes with the toothed surface of the timing belt; The tensioning mechanism includes: a tensioning seat, disposed at the bottom of the lifting unit; The tensioning bracket is mounted on the tensioning seat; A toothed tensioning wheel is rotatably and positionably mounted on the tensioning bracket and meshes with the toothed surface of the timing belt. The back tensioning wheel is fixedly and rotatably mounted on the tensioning bracket and abuts against the back side of the outer side of the timing belt.

4. The partition synchronous lifting device as described in claim 3, characterized in that, The tensioning bracket is provided with a sliding groove; The tensioning mechanism further includes: an adjusting slider, which is slidably disposed on the slide groove, and the toothed tensioning wheel is disposed on the adjusting slider; An adjusting bolt passes through the tensioning bracket, and the end of the rod in the adjusting bolt is fixedly connected to the adjusting slider. The screw head of the adjusting bolt is located on the side of the tensioning bracket away from the adjusting slider. A fixing nut, located on the rod between the screw head and the tensioning bracket, is used to fix the position of the toothed tensioning wheel and adjust the position of the toothed tensioning wheel relative to the back tensioning wheel to adjust the tension of the timing belt.

5. The partition synchronous lifting device as described in claim 3, characterized in that, The tensioning mechanism and the drive unit are mounted on different lifting units.

6. The partition synchronous lifting device as described in claim 3, characterized in that, The tensioning bracket is located on the side of the timing belt away from the cavity.

7. The partition synchronous lifting device as described in claim 3, characterized in that, The number of back tensioning wheels is two, and on the tensioning bracket, the two back tensioning wheels are respectively arranged on both sides of the toothed tensioning wheel.

8. The partition synchronous lifting device as described in claim 1, characterized in that, The outputs of multiple lifting units are at the same horizontal position.

9. The partition synchronous lifting device as described in claim 1, characterized in that, The lifting unit includes: The base is connected to the bottom of the cavity; A linear guide rail is mounted on the base, and the linear guide rail is arranged in a vertical direction; A connector is provided on the slider of the linear guide rail; The lead screw is connected to the output end of the drive unit, and the lead screw is rotatably engaged with the connecting member. When the lead screw rotates, the connecting member moves vertically.

10. The partition synchronous lifting device as described in claim 9, characterized in that, Limiting blocks are provided on the connector; The partition synchronous lifting device further includes: an upper mechanical limit, which is set on the linear guide rail and is used to limit the upper limit position of the connecting member; The lower mechanical limit is set on the linear guide rail and located below the upper mechanical limit, and is used to limit the lower limit position of the connector.

11. A semiconductor device, characterized in that, include: Cavities, including reaction chambers; Multiple bases are located in the reaction chamber; A partition structure is located in the reaction chamber, the partition structure having multiple partition spaces, and each partition space accommodating at least one of the bases; The partition synchronous lifting device as described in any one of claims 1 to 10 is located below the cavity, and the power output end of the partition synchronous lifting device is connected to the partition structure to drive the partition structure to rise or fall, thereby switching the reaction cavity between a process state for independently processing wafers and a transfer state for wafer pick-and-place.

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