A gas extraction ring and thin film deposition apparatus

Abstract

The utility model provides a kind of air extraction ring and thin film deposition equipment.Air extraction ring is located in the lateral wall of process chamber, and its outside is surrounded by air extraction passage.A plurality of air extraction holes are distributed on air extraction ring, and at least one place of air extraction passage is equipped with air extraction port communicated with air extraction pump, for extracting air from process chamber interior via a plurality of air extraction holes.The air extraction path length from the first air extraction hole located in the first position of air extraction ring to its nearest air extraction port is greater than the air extraction path length from the second air extraction hole located in the second position of air extraction ring to its nearest air extraction port, and the first thickness of air extraction ring in the first position is greater than its second thickness in the second position.The sum of the first hole internal flow resistance generated by the first air extraction hole located in the first position and the first hole external flow resistance from the first position to its nearest air extraction port is equal to the sum of the second hole internal flow resistance generated by the second air extraction hole located in the second position and the second hole external flow resistance from the second position to its nearest air extraction port.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor manufacturing technology, and in particular to a vacuum ring and a thin film deposition apparatus. Background Technology

[0002] In high-precision manufacturing fields such as semiconductor manufacturing and optical thin film preparation, the quality of thin film deposition technology directly determines the performance and reliability of devices. The process chamber, as the core location for thin film deposition, relies heavily on the stability and uniformity of its internal gas environment to ensure film quality. The evacuation ring, as a crucial component of the process chamber's evacuation system, plays a vital role in regulating gas flow and maintaining pressure balance within the chamber, directly impacting the stability of the entire thin film deposition process.

[0003] However, in actual thin film deposition processes, the suction ring often faces the problem of circumferential suction uniformity errors during the suction process. This non-uniformity leads to significant differences in gas flow rate and pressure in different areas of the chamber, resulting in inconsistent thin film deposition rates and large deviations in thin film thickness. This seriously affects the uniformity and consistency of the thin film, thus restricting the production efficiency and quality of high-precision thin film devices.

[0004] In order to overcome the above-mentioned defects in the existing technology, there is an urgent need in the field for a gas extraction ring technology, which can optimize the flow path of gas in the circumferential direction of the chamber and reduce the uniformity error of the circumferential direction of the gas extraction ring, thereby providing a stable and uniform environment for thin film deposition and improving the uniformity and consistency of thin film products. Utility Model Content

[0005] The following provides a brief overview of one or more aspects to offer a basic understanding of them. This overview is not an exhaustive summary of all conceived aspects, nor is it intended to identify key or decisive elements of all aspects, nor to define the scope of any or all aspects. Its sole purpose is to present some concepts of one or more aspects in a simplified form as a prelude to the more detailed descriptions that follow.

[0006] To overcome the aforementioned defects in the existing technology, this utility model provides a gas extraction ring and a thin film deposition apparatus. By optimizing the gas flow path in the circumferential direction of the chamber, the uniformity error in the circumferential direction of the gas extraction ring is reduced, thereby providing a stable and uniform environment for thin film deposition and improving the uniformity and consistency of the thin film products.

[0007] Specifically, according to the first aspect of this utility model, an extraction ring is disposed on the side wall of a process chamber, and an extraction channel surrounds its outer side. The extraction ring has multiple extraction holes distributed on it, and at least one location of the extraction channel has an extraction port connected to an extraction pump for extracting air from the interior of the process chamber via the multiple extraction holes. The extraction path length from the first extraction hole located at a first position of the extraction ring to its nearest extraction port is greater than the extraction path length from the second extraction hole located at a second position of the extraction ring to its nearest extraction port. The first thickness of the extraction ring at the first position is greater than its second thickness at the second position. The sum of the internal flow resistance of the first extraction hole at the first position and the external flow resistance of the first hole from the first position to its nearest extraction port is equal to the sum of the internal flow resistance of the second extraction hole at the second position and the external flow resistance of the second hole from the second position to its nearest extraction port.

[0008] Furthermore, in some embodiments of this utility model, the first air extraction hole is a circular hole, and the flow resistance R inside the first hole is... 11 It is represented as:

[0009]

[0010] Where f is the Fanning coefficient of friction, ρ is the fluid density, h1 is the first thickness of the suction ring at the first position, d1 is the diameter of the first suction hole, and / or

[0011] The second suction port is a round hole, and the flow resistance R inside the second hole is... 21 It is represented as:

[0012]

[0013] Where f is the Fanning coefficient of friction, ρ is the fluid density, h2 is the second thickness of the suction ring at the second position, and d2 is the diameter of the second suction hole.

[0014] Furthermore, in some embodiments of this utility model, the cross-section of the air extraction channel is rectangular, and the external flow resistance R of the first hole is... 12 It is represented as:

[0015]

[0016] Where f is the Fanning friction coefficient and ρ is the fluid density. Let L1 be the hydraulic diameter of the air extraction channel, a and b be the length and width of the cross-section of the air extraction channel, respectively, and L1 be the length of the air extraction path from the first position to its nearest air extraction port.

[0017] The second orifice external flow resistance R 22 It is represented as:

[0018]

[0019] Where L2 is the length of the air extraction path from the second position to its nearest air extraction port.

[0020] Furthermore, in some embodiments of this utility model, the hydraulic diameter d of the air extraction channel is... h The diameters of the first and second air extraction holes are each more than 10 times the diameter d1 and d2 of the first air extraction hole, respectively. The length of the air extraction path from each air extraction hole to the air extraction port is between 150mm and 240mm, and the thickness of the air extraction ring at each position is between 1mm and 15mm.

[0021] Furthermore, in some embodiments of this utility model, the air extraction port is located at one point of the air extraction channel, and the thickness of the air extraction ring increases with the length of the air extraction path to the air extraction port, and increases stepwise from the second thickness to the first thickness, wherein at least one air extraction hole is provided on each thickness step.

[0022] Furthermore, in some embodiments of this utility model, each of the thickness steps is provided with a plurality of air extraction holes, wherein at least one of the air extraction holes located on the same thickness step is a countersunk hole, and the corresponding equivalent air extraction hole diameter d′ is obtained by the difference in the diameter and / or thickness of at least one countersunk section.

[0023] Furthermore, in some embodiments of this utility model, the diameter of each segment of the countersunk hole increases from the inside to the outside of the suction ring.

[0024] Furthermore, in some embodiments of this utility model, the thickness of the inner section of the countersunk hole decreases as the length of its air extraction path increases, and / or the thickness of the outer section of the countersunk hole increases as the length of its air extraction path increases.

[0025] Furthermore, in some embodiments of this utility model, the countersunk hole includes a three-section countersunk hole, wherein the diameter of the inner section of the three-section countersunk hole is 0.3mm to 0.5mm, the diameter of the middle section of the three-section countersunk hole is 0.4mm to 0.6mm, and the diameter of the outer section of the three-section countersunk hole is 0.5mm to 0.8mm.

[0026] Furthermore, the thin film deposition apparatus provided according to the second aspect of the present invention includes: a process chamber in which an extraction ring as described in any one of the first aspects of the present invention is disposed; a gas source for supplying at least one gas required for the thin film deposition process to the process chamber; and an extraction pump connected to the extraction ring for extracting exhaust gas generated by the thin film deposition process from the process chamber via the extraction ring. Attached Figure Description

[0027] The above-described features and advantages of this invention can be better understood after reading the following detailed description of the embodiments of this disclosure in conjunction with the accompanying drawings. In the drawings, the components are not necessarily drawn to scale, and components having similar related characteristics or features may have the same or similar reference numerals.

[0028] Figure 1 A schematic diagram of a thin film deposition apparatus provided according to some embodiments of the present invention is shown.

[0029] Figure 2 A schematic diagram of the structure of an air extraction ring provided according to some embodiments of the present invention is shown.

[0030] Figure 3 A structural schematic diagram of the thickness of the suction ring provided according to some embodiments of the present invention is shown.

[0031] Figure 4 A side view of a three-section countersunk hole provided according to some embodiments of the present invention is shown.

[0032] Figure Labels

[0033] 10 Process Chambers

[0034] 20. Evacuation ring

[0035] 21. Air extraction port

[0036] 22 First air extraction port

[0037] 23 Second air extraction port

[0038] 30 Exhaust Channels

[0039] 40 countersunk hole Detailed Implementation

[0040] The following specific embodiments illustrate the implementation of this utility model. Those skilled in the art can easily understand other advantages and effects of this utility model from the content disclosed in this specification. Although the description of this utility model will be presented in conjunction with preferred embodiments, this does not mean that the features of this utility model are limited to this embodiment. On the contrary, the purpose of describing the utility model in conjunction with the embodiments is to cover other options or modifications that may be derived based on the claims of this utility model. To provide a deep understanding of this utility model, many specific details will be included in the following description. This utility model may also be implemented without using these details. Furthermore, to avoid confusion or obscuring the focus of this utility model, some specific details will be omitted in the description.

[0041] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0042] Furthermore, the terms "upper," "lower," "left," "right," "top," "bottom," "horizontal," and "vertical" used in the following description should be understood as the orientations shown in the relevant paragraphs and accompanying drawings. These relative terms are for illustrative purposes only and do not imply that the described device must be manufactured or operated in a specific orientation; therefore, they should not be construed as limiting the scope of this invention.

[0043] It is understood that although terms such as "first," "second," and "third" may be used herein to describe various components, regions, layers, and / or parts, these components, regions, layers, and / or parts should not be limited by these terms, and these terms are only used to distinguish different components, regions, layers, and / or parts. Therefore, the first component, region, layer, and / or part discussed below may be referred to as the second component, region, layer, and / or part without departing from some embodiments of this utility model.

[0044] In high-precision manufacturing fields such as semiconductor manufacturing and optical thin film preparation, the quality of thin film deposition technology directly determines the performance and reliability of devices. The process chamber, as the core location for thin film deposition, relies heavily on the stability and uniformity of its internal gas environment to ensure film quality. The evacuation ring, as a crucial component of the process chamber's evacuation system, plays a vital role in regulating gas flow and maintaining pressure balance within the chamber, directly impacting the stability of the entire thin film deposition process.

[0045] However, in actual thin film deposition processes, the suction ring often faces the problem of circumferential suction uniformity errors during the suction process. This non-uniformity leads to significant differences in gas flow rate and pressure in different areas of the chamber, resulting in inconsistent thin film deposition rates and large deviations in thin film thickness. This seriously affects the uniformity and consistency of the thin film, thus restricting the production efficiency and quality of high-precision thin film devices.

[0046] To overcome the aforementioned defects in the existing technology, this utility model provides a gas extraction ring and a thin film deposition apparatus. By optimizing the gas flow path in the circumferential direction of the chamber, the uniformity error in the circumferential direction of the gas extraction ring is reduced, thereby providing a stable and uniform environment for thin film deposition and improving the uniformity and consistency of the thin film products.

[0047] In some non-limiting embodiments, the suction ring provided in the first aspect of the present invention can be configured in the thin film deposition apparatus provided in the second aspect of the present invention.

[0048] Please refer to Figure 1 , Figure 1 A schematic diagram of a thin film deposition apparatus provided according to some embodiments of the present invention is shown.

[0049] like Figure 1 As shown, the thin film deposition apparatus includes a process chamber 10, a gas source, and a vacuum pump. A vacuum ring 20 is disposed within the process chamber 10. The gas source supplies at least one gas required for the thin film deposition process to the process chamber 10. This gas includes, but is not limited to, carrier gas carrying precursors, process gas, and cleaning gas. The vacuum pump is connected to the vacuum ring 20 and is used to extract exhaust gases generated during the thin film deposition process from the process chamber 10 via the vacuum ring 20.

[0050] Please refer to the reference. Figures 1-2 , Figure 2 A schematic diagram of the structure of an air extraction ring provided according to some embodiments of the present invention is shown.

[0051] like Figure 1 As shown, the suction ring 20 is disposed on the side wall of the process chamber 10, and the suction channel 30 surrounds its outer side. The suction ring 20 has a plurality of suction holes, and at least one of the suction channels 30 is provided with a suction port 21 connected to a suction pump for evacuating air from the inside of the process chamber 10 through the plurality of suction holes.

[0052] like Figure 2 As shown, the length of the suction path from the first suction hole 22 located at the first position of the suction ring 20 to its nearest suction port 21 is greater than the length of the suction path from the second suction hole 23 located at the second position of the suction ring 20 to its nearest suction port 21. The first thickness of the suction ring 20 at the first position is greater than its second thickness at the second position. The sum of the first internal flow resistance generated by the first suction hole 22 located at the first position and the first external flow resistance generated by the first position to its nearest suction port 21 is equal to the sum of the second internal flow resistance generated by the second suction hole 23 located at the second position and the second external flow resistance generated by the second position to its nearest suction port 21.

[0053] Thus, by setting the thickness of the suction ring 20, the gas path of the suction ring can be directly adjusted. By optimizing the gas flow path in the circumferential direction of the chamber, the uniformity error in the circumferential direction of the suction ring can be reduced, thereby providing a stable and uniform environment for thin film deposition and improving the uniformity and consistency of the thin film product.

[0054] In some embodiments, the first suction port 22 can be a circular hole, and the flow resistance R inside the first hole is... 11It is represented as:

[0055]

[0056] Where f is the Fanning friction coefficient, ρ is the fluid density, h1 is the first thickness of the suction ring 20 at the first position, and d1 is the diameter of the first suction hole 22.

[0057] Accordingly, the second extraction port 23 can be a circular hole, and the flow resistance R inside the second hole is... 21 It is represented as:

[0058]

[0059] Where f is the Fanning friction coefficient, ρ is the fluid density, h2 is the second thickness of the suction ring 20 at the second position, and d2 is the diameter of the second suction hole 23.

[0060] In some embodiments, the cross-section of the air extraction channel 30 is rectangular, and the external flow resistance R of the first orifice is... 12 It is represented as:

[0061]

[0062] Where f is the Fanning friction coefficient and ρ is the fluid density. Let L1 be the hydraulic diameter of the air extraction channel 30, a and b be the length and width of the cross-section of the air extraction channel 30, respectively, and L1 be the length of the air extraction path from the first position to its nearest air extraction port 21. Here, the hydraulic diameter is the diameter of the equivalent circle of a non-circular pipe.

[0063] Accordingly, the external flow resistance R of the second orifice 22 It is represented as:

[0064]

[0065] Where L2 is the length of the air extraction path from the second position to its nearest air extraction port 21.

[0066] In some embodiments, the hydraulic diameter d of the air extraction channel 30 is... h The diameters d1 of the first suction hole 22 and d2 of the second suction hole 23 are more than 10 times each. The suction path length from each suction hole to the suction port 21 is between 150mm and 240mm, and the thickness of the suction ring 20 at each position is between 1mm and 15mm.

[0067] Those skilled in the art will understand that the hydraulic diameter d of the air extraction channel 30 hThe ratio of the diameter d1 of the first suction hole 22 and the diameter d2 of the second suction hole 23 is not limited to 10 times. It can also be selected as 10 times to 20 times, 20 times to 50 times, 50 times to 100 times, or more than 100 times, in order to reduce the influence of the change in the suction path length on the thickness of the suction ring 20, thereby reducing the difference in counterweight.

[0068] In some embodiments, the suction port 21 is located at a point in the suction channel 30, and the thickness of the suction ring 20 increases in steps from a second thickness to a first thickness as the length of the suction path to the suction port 21 increases, wherein each thickness step is provided with at least one suction hole. This allows for segmented, targeted adjustments to address minor uneven suction within the cavity.

[0069] Please refer to Figure 3 , Figure 3 A structural schematic diagram of the thickness of the suction ring provided according to some embodiments of the present invention is shown.

[0070] like Figure 3 As shown, the thickness of the suction ring 20 has a stepped, gradually changing structure. The position corresponding to the suction port 21 is the thickest point of the widened structure L of the suction ring 20, and the thickness decreases stepwise along the circumferential paths L1, L2, L5, and L4 on both sides of the suction ring 20 until the thickness of the widened structure L3 of the suction ring 20 reaches its minimum value at the farthest point from the suction port 21. Here, the lengths of L, L1, L2, L3, L4, and L5 can range from 50mm to 80mm.

[0071] Furthermore, the thickness of L can range from 5mm to 10mm. The thickness of L1 and L5 can range from 3mm to 8mm. The thickness of L2 and L4 can range from 1mm to 6mm. Here, L1 and L5 can use the same or different lengths and thicknesses, and L2 and L4 can also use the same or different thicknesses, thereby allowing for more flexible adjustment of the thickness of the suction ring 20.

[0072] Furthermore, each thickness step is provided with multiple evacuation holes, wherein at least one of the evacuation holes located on the same thickness step is a countersunk hole 40, and the corresponding equivalent evacuation hole diameter d′ is obtained by the difference in the diameter and / or thickness of at least one countersunk section. Here, the evacuation ring 20 can fine-tune the flow resistance inside the hole by setting the countersunk hole 40, thereby reducing the number of steps required and further reducing the processing difficulty.

[0073] Furthermore, the diameter of each segment of the countersunk hole 40 increases from the inside to the outside of the suction ring 20, thereby reducing the accumulation of process gas on the surface of the suction ring 20 and preventing byproducts from causing particulate contamination and clogging the suction holes.

[0074] Furthermore, the thickness of the inner section of the countersunk hole 40 decreases as the length of its air extraction path increases, and / or the thickness of the outer section of the countersunk hole 40 increases as the length of its air extraction path increases.

[0075] Please refer to Figure 4 , Figure 4 A side view of a three-section countersunk hole provided according to some embodiments of the present invention is shown.

[0076] like Figure 4 As shown, the countersunk hole 40 includes a three-section countersunk hole 40. The diameter of the inner section of the three-section countersunk hole 40 is 0.3mm to 0.5mm, the diameter of the middle section of the three-section countersunk hole 40 is 0.4mm to 0.6mm, and the diameter of the outer section of the three-section countersunk hole 40 is 0.5mm to 0.8mm.

[0077] Furthermore, the number of holes in the three-section hole is 1 / 4 to 1 / 8 of the total number of holes in the suction ring 20; the hole type in other positions is a circular through hole.

[0078] In summary, the suction ring and thin film deposition equipment provided by this utility model can reduce the uniformity error of the suction ring in the circumferential direction by optimizing the gas flow path in the chamber, thereby providing a stable and uniform environment for thin film deposition and improving the uniformity and consistency of thin film products.

[0079] Although the methods described above are illustrated and depicted as a series of actions for the sake of simplicity, it should be understood and appreciated that these methods are not limited by the order of the actions, as some actions may occur in a different order and / or concurrently with other actions from the illustrations and descriptions herein or not illustrated and described herein but which may be understood by those skilled in the art, according to one or more embodiments.

[0080] The prior description of this disclosure is provided to enable any person skilled in the art to make or use this disclosure. Various modifications to this disclosure will be apparent to those skilled in the art, and the general principles defined herein may be applied to other variations without departing from the spirit or scope of this disclosure. Therefore, this disclosure is not intended to be limited to the examples and designs described herein, but should be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A suction ring, disposed on the side wall of a process chamber, with a suction channel surrounding its outer side, wherein, The extraction ring has multiple extraction holes distributed on it, and at least one location of the extraction channel is provided with an extraction port connected to an extraction pump for extracting air from the interior of the process chamber through the multiple extraction holes. The characteristic of this feature is that... The length of the suction path from the first suction hole located at the first position of the suction ring to its nearest suction port is greater than the length of the suction path from the second suction hole located at the second position of the suction ring to its nearest suction port. The first thickness of the suction ring at the first position is greater than its second thickness at the second position. The sum of the internal flow resistance of the first suction hole at the first position and the external flow resistance of the first hole from the first position to its nearest suction port is equal to the sum of the internal flow resistance of the second suction hole at the second position and the external flow resistance of the second hole from the second position to its nearest suction port.

2. The suction ring as described in claim 1, characterized in that, The first air extraction hole is a circular hole, and the flow resistance R inside the first hole is... 11 It is represented as: Where f is the Fanning coefficient of friction, ρ is the fluid density, h1 is the first thickness of the suction ring at the first position, d1 is the diameter of the first suction hole, and / or The second suction port is a round hole, and the flow resistance R inside the second hole is... 21 It is represented as: Where f is the Fanning coefficient of friction, ρ is the fluid density, h2 is the second thickness of the suction ring at the second position, and d2 is the diameter of the second suction hole.

3. The suction ring as described in claim 2, characterized in that, The cross-section of the air extraction channel is rectangular, and the external flow resistance R of the first hole is... 12 It is represented as: Where f is the Fanning friction coefficient and ρ is the fluid density. Let L1 be the hydraulic diameter of the air extraction channel, a and b be the length and width of the cross-section of the air extraction channel, respectively, and L1 be the length of the air extraction path from the first position to its nearest air extraction port. The second orifice external flow resistance R 22 It is represented as: Where L2 is the length of the air extraction path from the second position to its nearest air extraction port.

4. The suction ring as described in claim 3, characterized in that, The hydraulic diameter d of the air extraction channel h The diameters of the first and second air extraction holes are each more than 10 times the diameter d1 and d2 of the first air extraction hole, respectively. The length of the air extraction path from each air extraction hole to the air extraction port is between 150mm and 240mm, and the thickness of the air extraction ring at each position is between 1mm and 15mm.

5. The suction ring as described in claim 2, characterized in that, The air extraction port is located at one point in the air extraction channel. The thickness of the air extraction ring increases with the length of the air extraction path to the air extraction port, and increases in steps from the second thickness to the first thickness, wherein each thickness step is provided with at least one air extraction hole.

6. The suction ring as described in claim 5, characterized in that, Each of the thickness steps is provided with a plurality of air extraction holes, wherein at least one of the air extraction holes located on the same thickness step is a countersunk hole, and the corresponding equivalent air extraction hole diameter d′ is obtained by the difference in the diameter and / or thickness of at least one countersunk section.

7. The suction ring as described in claim 6, characterized in that, The diameter of each segment of the countersunk hole increases from the inside to the outside of the suction ring.

8. The suction ring as described in claim 7, characterized in that, The thickness of the inner section of the countersunk hole decreases as the length of its air extraction path increases, and / or the thickness of the outer section of the countersunk hole increases as the length of its air extraction path increases.

9. The suction ring as described in claim 7, characterized in that, The countersunk hole includes a three-section countersunk hole, wherein the diameter of the inner section of the three-section countersunk hole is 0.3mm to 0.5mm, the diameter of the middle section of the three-section countersunk hole is 0.4mm to 0.6mm, and the diameter of the outer section of the three-section countersunk hole is 0.5mm to 0.8mm.

10. A thin film deposition apparatus, characterized in that, include: A process chamber, wherein an extraction ring as described in any one of claims 1 to 9 is provided; A gas source is used to supply at least one gas required for the thin film deposition process to the process chamber. as well as An air pump, connected to the air extraction ring, is used to extract exhaust gas generated during the thin film deposition process from the process chamber via the air extraction ring.

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